JPH0355511B2 - - Google Patents
Info
- Publication number
- JPH0355511B2 JPH0355511B2 JP31938388A JP31938388A JPH0355511B2 JP H0355511 B2 JPH0355511 B2 JP H0355511B2 JP 31938388 A JP31938388 A JP 31938388A JP 31938388 A JP31938388 A JP 31938388A JP H0355511 B2 JPH0355511 B2 JP H0355511B2
- Authority
- JP
- Japan
- Prior art keywords
- nickel
- tetra
- butylammonium
- parts
- dithiophenolate
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- -1 benzenedithiol metal complex Chemical class 0.000 claims description 21
- 229920003023 plastic Polymers 0.000 claims description 21
- 239000004033 plastic Substances 0.000 claims description 21
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 claims description 12
- KDLHZDBZIXYQEI-UHFFFAOYSA-N Palladium Chemical compound [Pd] KDLHZDBZIXYQEI-UHFFFAOYSA-N 0.000 claims description 12
- 239000006096 absorbing agent Substances 0.000 claims description 12
- 239000000203 mixture Substances 0.000 claims description 10
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical group [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 claims description 10
- WKBOTKDWSSQWDR-UHFFFAOYSA-N Bromine atom Chemical group [Br] WKBOTKDWSSQWDR-UHFFFAOYSA-N 0.000 claims description 9
- 229910052801 chlorine Inorganic materials 0.000 claims description 9
- 125000001309 chloro group Chemical group Cl* 0.000 claims description 9
- 239000000460 chlorine Substances 0.000 claims description 7
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 claims description 6
- 239000001257 hydrogen Substances 0.000 claims description 6
- 229910052739 hydrogen Inorganic materials 0.000 claims description 6
- 229910052759 nickel Inorganic materials 0.000 claims description 6
- 229910052763 palladium Inorganic materials 0.000 claims description 6
- 125000001453 quaternary ammonium group Chemical group 0.000 claims description 5
- 239000010408 film Substances 0.000 description 18
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 15
- JRNVQLOKVMWBFR-UHFFFAOYSA-N 1,2-benzenedithiol Chemical class SC1=CC=CC=C1S JRNVQLOKVMWBFR-UHFFFAOYSA-N 0.000 description 14
- 238000003786 synthesis reaction Methods 0.000 description 14
- 230000015572 biosynthetic process Effects 0.000 description 13
- 229910052751 metal Inorganic materials 0.000 description 13
- 239000002184 metal Substances 0.000 description 13
- YFUYVQWZEJRMBK-UHFFFAOYSA-N nickel(2+);tetrabutylazanium Chemical compound [Ni+2].CCCC[N+](CCCC)(CCCC)CCCC YFUYVQWZEJRMBK-UHFFFAOYSA-N 0.000 description 10
- 150000004696 coordination complex Chemical class 0.000 description 8
- 230000003287 optical effect Effects 0.000 description 7
- 239000011347 resin Substances 0.000 description 7
- 229920005989 resin Polymers 0.000 description 7
- YMWUJEATGCHHMB-UHFFFAOYSA-N Dichloromethane Chemical compound ClCCl YMWUJEATGCHHMB-UHFFFAOYSA-N 0.000 description 6
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 6
- 238000000034 method Methods 0.000 description 6
- 238000010521 absorption reaction Methods 0.000 description 5
- 238000006243 chemical reaction Methods 0.000 description 5
- 238000002844 melting Methods 0.000 description 5
- 230000008018 melting Effects 0.000 description 5
- WYURNTSHIVDZCO-UHFFFAOYSA-N Tetrahydrofuran Chemical compound C1CCOC1 WYURNTSHIVDZCO-UHFFFAOYSA-N 0.000 description 4
- 238000004458 analytical method Methods 0.000 description 4
- 238000000576 coating method Methods 0.000 description 4
- 239000013078 crystal Substances 0.000 description 4
- 238000000921 elemental analysis Methods 0.000 description 4
- 238000004519 manufacturing process Methods 0.000 description 4
- 229910052697 platinum Inorganic materials 0.000 description 4
- 239000004065 semiconductor Substances 0.000 description 4
- ZWEHNKRNPOVVGH-UHFFFAOYSA-N 2-Butanone Chemical compound CCC(C)=O ZWEHNKRNPOVVGH-UHFFFAOYSA-N 0.000 description 3
- MSSNSTXFTUNKQH-UHFFFAOYSA-N 3,4,5,6-tetrachlorobenzene-1,2-dithiol Chemical compound SC1=C(S)C(Cl)=C(Cl)C(Cl)=C1Cl MSSNSTXFTUNKQH-UHFFFAOYSA-N 0.000 description 3
- 239000011248 coating agent Substances 0.000 description 3
- 230000035945 sensitivity Effects 0.000 description 3
- DZLFLBLQUQXARW-UHFFFAOYSA-N tetrabutylammonium Chemical group CCCC[N+](CCCC)(CCCC)CCCC DZLFLBLQUQXARW-UHFFFAOYSA-N 0.000 description 3
- AJCUDWCLDWDLNY-UHFFFAOYSA-N 3,6-dichlorobenzene-1,2-dithiol Chemical compound SC1=C(S)C(Cl)=CC=C1Cl AJCUDWCLDWDLNY-UHFFFAOYSA-N 0.000 description 2
- KFZMGEQAYNKOFK-UHFFFAOYSA-N Isopropanol Chemical compound CC(C)O KFZMGEQAYNKOFK-UHFFFAOYSA-N 0.000 description 2
- 239000000020 Nitrocellulose Substances 0.000 description 2
- 229920002319 Poly(methyl acrylate) Polymers 0.000 description 2
- WCUXLLCKKVVCTQ-UHFFFAOYSA-M Potassium chloride Chemical compound [Cl-].[K+] WCUXLLCKKVVCTQ-UHFFFAOYSA-M 0.000 description 2
- 208000003464 asthenopia Diseases 0.000 description 2
- HQABUPZFAYXKJW-UHFFFAOYSA-O butylazanium Chemical compound CCCC[NH3+] HQABUPZFAYXKJW-UHFFFAOYSA-O 0.000 description 2
- 238000004821 distillation Methods 0.000 description 2
- 230000004313 glare Effects 0.000 description 2
- 239000011521 glass Substances 0.000 description 2
- 239000003446 ligand Substances 0.000 description 2
- 230000031700 light absorption Effects 0.000 description 2
- 239000000463 material Substances 0.000 description 2
- 229910021645 metal ion Inorganic materials 0.000 description 2
- ZUZLIXGTXQBUDC-UHFFFAOYSA-N methyltrioctylammonium Chemical group CCCCCCCC[N+](C)(CCCCCCCC)CCCCCCCC ZUZLIXGTXQBUDC-UHFFFAOYSA-N 0.000 description 2
- 150000002815 nickel Chemical group 0.000 description 2
- LAIZPRYFQUWUBN-UHFFFAOYSA-L nickel chloride hexahydrate Chemical compound O.O.O.O.O.O.[Cl-].[Cl-].[Ni+2] LAIZPRYFQUWUBN-UHFFFAOYSA-L 0.000 description 2
- 229920001220 nitrocellulos Polymers 0.000 description 2
- 230000010355 oscillation Effects 0.000 description 2
- 229920003229 poly(methyl methacrylate) Polymers 0.000 description 2
- 229920000139 polyethylene terephthalate Polymers 0.000 description 2
- 239000005020 polyethylene terephthalate Substances 0.000 description 2
- 229920000642 polymer Polymers 0.000 description 2
- 239000004926 polymethyl methacrylate Substances 0.000 description 2
- 229920000915 polyvinyl chloride Polymers 0.000 description 2
- 239000004800 polyvinyl chloride Substances 0.000 description 2
- 238000003756 stirring Methods 0.000 description 2
- 239000000758 substrate Substances 0.000 description 2
- JRMUNVKIHCOMHV-UHFFFAOYSA-M tetrabutylammonium bromide Chemical compound [Br-].CCCC[N+](CCCC)(CCCC)CCCC JRMUNVKIHCOMHV-UHFFFAOYSA-M 0.000 description 2
- YLQBMQCUIZJEEH-UHFFFAOYSA-N tetrahydrofuran Natural products C=1C=COC=1 YLQBMQCUIZJEEH-UHFFFAOYSA-N 0.000 description 2
- 238000002834 transmittance Methods 0.000 description 2
- 238000003466 welding Methods 0.000 description 2
- PCGDBWLKAYKBTN-UHFFFAOYSA-N 1,2-dithiole Chemical compound C1SSC=C1 PCGDBWLKAYKBTN-UHFFFAOYSA-N 0.000 description 1
- VZSRBBMJRBPUNF-UHFFFAOYSA-N 2-(2,3-dihydro-1H-inden-2-ylamino)-N-[3-oxo-3-(2,4,6,7-tetrahydrotriazolo[4,5-c]pyridin-5-yl)propyl]pyrimidine-5-carboxamide Chemical compound C1C(CC2=CC=CC=C12)NC1=NC=C(C=N1)C(=O)NCCC(N1CC2=C(CC1)NN=N2)=O VZSRBBMJRBPUNF-UHFFFAOYSA-N 0.000 description 1
- NDRLGEJTTIQUJP-UHFFFAOYSA-N 3,4,6-tribromobenzene-1,2-dithiol Chemical compound SC1=C(S)C(Br)=C(Br)C=C1Br NDRLGEJTTIQUJP-UHFFFAOYSA-N 0.000 description 1
- IOZGSEUZOKDYJZ-UHFFFAOYSA-N 3,4,6-trichlorobenzene-1,2-dithiol Chemical compound SC1=C(S)C(Cl)=C(Cl)C=C1Cl IOZGSEUZOKDYJZ-UHFFFAOYSA-N 0.000 description 1
- ZRJGHERVCOGHOZ-UHFFFAOYSA-N 3,6-dibromobenzene-1,2-dithiol Chemical compound SC1=C(S)C(Br)=CC=C1Br ZRJGHERVCOGHOZ-UHFFFAOYSA-N 0.000 description 1
- ZDTOSZNUKHUNAK-UHFFFAOYSA-N 3-chlorobenzene-1,2-dithiol Chemical compound SC1=CC=CC(Cl)=C1S ZDTOSZNUKHUNAK-UHFFFAOYSA-N 0.000 description 1
- NIAAGQAEVGMHPM-UHFFFAOYSA-N 4-methylbenzene-1,2-dithiol Chemical compound CC1=CC=C(S)C(S)=C1 NIAAGQAEVGMHPM-UHFFFAOYSA-N 0.000 description 1
- QGZKDVFQNNGYKY-UHFFFAOYSA-O Ammonium Chemical compound [NH4+] QGZKDVFQNNGYKY-UHFFFAOYSA-O 0.000 description 1
- 229920002284 Cellulose triacetate Polymers 0.000 description 1
- VEXZGXHMUGYJMC-UHFFFAOYSA-M Chloride anion Chemical compound [Cl-] VEXZGXHMUGYJMC-UHFFFAOYSA-M 0.000 description 1
- DGAQECJNVWCQMB-PUAWFVPOSA-M Ilexoside XXIX Chemical compound C[C@@H]1CC[C@@]2(CC[C@@]3(C(=CC[C@H]4[C@]3(CC[C@@H]5[C@@]4(CC[C@@H](C5(C)C)OS(=O)(=O)[O-])C)C)[C@@H]2[C@]1(C)O)C)C(=O)O[C@H]6[C@@H]([C@H]([C@@H]([C@H](O6)CO)O)O)O.[Na+] DGAQECJNVWCQMB-PUAWFVPOSA-M 0.000 description 1
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 1
- 229910021586 Nickel(II) chloride Inorganic materials 0.000 description 1
- 239000004698 Polyethylene Substances 0.000 description 1
- 239000004743 Polypropylene Substances 0.000 description 1
- 239000004793 Polystyrene Substances 0.000 description 1
- 229920001328 Polyvinylidene chloride Polymers 0.000 description 1
- NINIDFKCEFEMDL-UHFFFAOYSA-N Sulfur Chemical compound [S] NINIDFKCEFEMDL-UHFFFAOYSA-N 0.000 description 1
- BZHJMEDXRYGGRV-UHFFFAOYSA-N Vinyl chloride Chemical compound ClC=C BZHJMEDXRYGGRV-UHFFFAOYSA-N 0.000 description 1
- NNLVGZFZQQXQNW-ADJNRHBOSA-N [(2r,3r,4s,5r,6s)-4,5-diacetyloxy-3-[(2s,3r,4s,5r,6r)-3,4,5-triacetyloxy-6-(acetyloxymethyl)oxan-2-yl]oxy-6-[(2r,3r,4s,5r,6s)-4,5,6-triacetyloxy-2-(acetyloxymethyl)oxan-3-yl]oxyoxan-2-yl]methyl acetate Chemical compound O([C@@H]1O[C@@H]([C@H]([C@H](OC(C)=O)[C@H]1OC(C)=O)O[C@H]1[C@@H]([C@@H](OC(C)=O)[C@H](OC(C)=O)[C@@H](COC(C)=O)O1)OC(C)=O)COC(=O)C)[C@@H]1[C@@H](COC(C)=O)O[C@@H](OC(C)=O)[C@H](OC(C)=O)[C@H]1OC(C)=O NNLVGZFZQQXQNW-ADJNRHBOSA-N 0.000 description 1
- 238000000862 absorption spectrum Methods 0.000 description 1
- 150000001298 alcohols Chemical class 0.000 description 1
- 239000003513 alkali Substances 0.000 description 1
- 239000000908 ammonium hydroxide Substances 0.000 description 1
- 239000003963 antioxidant agent Substances 0.000 description 1
- 150000004951 benzene Polymers 0.000 description 1
- JRNVQLOKVMWBFR-UHFFFAOYSA-L benzene-1,2-dithiolate Chemical compound [S-]C1=CC=CC=C1[S-] JRNVQLOKVMWBFR-UHFFFAOYSA-L 0.000 description 1
- 150000001555 benzenes Polymers 0.000 description 1
- 230000000903 blocking effect Effects 0.000 description 1
- 238000004364 calculation method Methods 0.000 description 1
- 229920002678 cellulose Polymers 0.000 description 1
- 238000012512 characterization method Methods 0.000 description 1
- 239000002131 composite material Substances 0.000 description 1
- 150000001875 compounds Chemical class 0.000 description 1
- 238000000748 compression moulding Methods 0.000 description 1
- 229920001577 copolymer Polymers 0.000 description 1
- 238000002425 crystallisation Methods 0.000 description 1
- 230000008025 crystallization Effects 0.000 description 1
- 239000006185 dispersion Substances 0.000 description 1
- 150000004662 dithiols Chemical class 0.000 description 1
- 238000001914 filtration Methods 0.000 description 1
- 238000007756 gravure coating Methods 0.000 description 1
- 238000005338 heat storage Methods 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 159000000014 iron salts Chemical class 0.000 description 1
- 238000004898 kneading Methods 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- 230000007774 longterm Effects 0.000 description 1
- 239000012046 mixed solvent Substances 0.000 description 1
- 238000002156 mixing Methods 0.000 description 1
- 238000000465 moulding Methods 0.000 description 1
- QMMRZOWCJAIUJA-UHFFFAOYSA-L nickel dichloride Chemical compound Cl[Ni]Cl QMMRZOWCJAIUJA-UHFFFAOYSA-L 0.000 description 1
- PIBWKRNGBLPSSY-UHFFFAOYSA-L palladium(II) chloride Chemical compound Cl[Pd]Cl PIBWKRNGBLPSSY-UHFFFAOYSA-L 0.000 description 1
- 125000001997 phenyl group Polymers [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 description 1
- 239000002985 plastic film Substances 0.000 description 1
- 229920006255 plastic film Polymers 0.000 description 1
- 239000004014 plasticizer Substances 0.000 description 1
- 239000003495 polar organic solvent Substances 0.000 description 1
- 239000004417 polycarbonate Substances 0.000 description 1
- 229920000515 polycarbonate Polymers 0.000 description 1
- 229920000728 polyester Polymers 0.000 description 1
- 229920000573 polyethylene Polymers 0.000 description 1
- 229920000098 polyolefin Polymers 0.000 description 1
- 229920001155 polypropylene Polymers 0.000 description 1
- 229920002223 polystyrene Polymers 0.000 description 1
- 239000005033 polyvinylidene chloride Substances 0.000 description 1
- 239000001103 potassium chloride Substances 0.000 description 1
- 235000011164 potassium chloride Nutrition 0.000 description 1
- ZOCLAPYLSUCOGI-UHFFFAOYSA-M potassium hydrosulfide Chemical compound [SH-].[K+] ZOCLAPYLSUCOGI-UHFFFAOYSA-M 0.000 description 1
- 230000005855 radiation Effects 0.000 description 1
- 239000002994 raw material Substances 0.000 description 1
- 238000001953 recrystallisation Methods 0.000 description 1
- 150000003839 salts Chemical class 0.000 description 1
- 239000011734 sodium Substances 0.000 description 1
- 229910052708 sodium Inorganic materials 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
- 239000002904 solvent Substances 0.000 description 1
- 230000003595 spectral effect Effects 0.000 description 1
- 239000003381 stabilizer Substances 0.000 description 1
- 239000011232 storage material Substances 0.000 description 1
- 239000011593 sulfur Substances 0.000 description 1
- 229910052717 sulfur Inorganic materials 0.000 description 1
- 239000010409 thin film Substances 0.000 description 1
- 229920002554 vinyl polymer Polymers 0.000 description 1
- 230000000007 visual effect Effects 0.000 description 1
Landscapes
- Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
- Compositions Of Macromolecular Compounds (AREA)
Description
本発明は、新規なハロゲン置換ベンゼンジチオ
ール金属錯体を近赤外線吸収剤として含有するプ
ラスチツク組成物に関する。
すなわち、本発明は一般式()
(式中、Xは塩素または臭素原子を、Yおよび
ZはXが塩素原子のとき、水素または塩素原子
を、Xが臭素原子のとき、水素または臭素原子
を、Nはニツケル、パラジウムまたは白金原子
を、Aは第4級アンモニウム基を示す)で表され
るハロゲン置換ベンゼンジチオール金属錯体を近
赤外線吸収剤として含有することを特徴とする近
赤外線を吸収するプラスチツク組成物を提供する
ことである。
本発明で用いる金属錯体は、具体的にはビス
(1,2,4−トリクロロ−5,6−ジチオフエ
ノレート)ニツケル−テトラ−n−ブチルアンモ
ニウム、ビス(1,4−ジクロロ−5,6−ジチ
オフエノレート)ニツケル−テトラ−n−ブチル
アンモニウム、ビス(1−クロロ−5,6−ジチ
オフエノレート)ニツケル−テトラ−n−ブチル
アンモニウムおよびこれらの金属錯体のニツケル
原子をパラジウムまたは白金にかえた錯体類なら
びに第4級アンモニウム基のテトラ−n−ブチル
アンモニウム基をテトラ−n−プロピルアンモニ
ウム基やトリオクチルメチルアンモニウム基にか
えた錯体類、またビス(1,2,4−トリブロモ
−5,6−ジチオフエノレート)ニツケル−テト
ラ−n−ブチルアンモニウム、ビス(1,4−ジ
ブロモ−5,6−ジチオフエノレート)ニツケル
−テトラ−n−ブチルアンモニウム、ビス(1−
ブロモ−5,6−ジチオフエノレート)ニツケル
−テトラ−n−ブチルアンモニウムおよびこれら
の金属錯体のニツケル原子をパラジウムまたは白
金にかえた錯体類、ならびに第4級アンモニウム
基のテトラ−n−ブチルアンモニウム基をテトラ
−n−プロピルアンモニウム基やトリオクチルメ
チルアンモニウム基にかえた錯体類である。
本発明に用いる新規なハロゲン置換オルソベン
ゼンジチオール金属錯体は、従来知られているテ
トラクロロベンゼンジチオール金属錯体にくら
べ、各種の樹脂に対して相溶性に優れ、添加割合
を増しても長期間の使用において樹脂からの結晶
化を起こさない。
既に公知の、例えばビス(1,2−ジチオフエ
ノレート)ニツケル−テトラ−n−ブチルアンモ
ニウム、ビス(1−メチル−3,4−ジチオフエ
ノレート)ニツケル−テトラ−n−ブチルアンモ
ニウム、ビス(1,2,3,4−テトラメチル−
5,6−ジチオフエノレート)ニツケル−テトラ
−n−ブチルアンモニウムおよびビス(1,2,
3,4−テトラクロロ−5,6−ジチオフエノレ
ート)ニツケル−テトラ−n−ブチルアンモニウ
ムなどのオルソ−ベンゼンジチオール金属錯体類
は、近赤外領域に特異な吸収スペクトルを示すこ
とが知られており(「Toluene−3,4−dithiol
und verwandte 1,2−Di−thiolene als
Chelatbildner fur Metalle」、モナチエフト・フ
イア・ヘミー102巻、308〜320頁、1971年および
「Characterization and Electronic Structures
of Metal Complexes Containing Benzene−
1,2−dithiolate and Related Ligands ジヤ
ーナル・オブ、ジアメリカン・ソサイエテイ88
巻、4870〜4875頁、1966年)、これらの金属錯体
は、熱安定性および耐候性に優れていること(特
開昭56−135551)から重要な近赤外線吸収剤であ
る。そのため、これらを近赤外線吸収剤としてプ
ラスチツクフイルムやプレートに練り込むか、ま
たはこれらを含有させたポリマー液を基体に塗布
して、太陽光の選択的利用を行うための製薬用フ
イルムや、まぶしさや眼球の疲労を防止する目的
でサングラス、溶接用眼鏡、航空機の窓またはテ
レビジヨンのフイルターに用いることが研究され
ている。さらに、近年、フオトダイオードが発光
ダイオードなどの光学変換素子の波長感度特性の
補償用の光学フイルターに用いる研究が行われた
り、またこれらの近赤外線吸収剤が半導体レーザ
の発振波長と合致するため、半導体レーザ光の記
録、すなわちレーザヒートモード記録用のレーザ
光の吸収蓄熱剤としても重要である。
しかしながら、従来知られているベンゼンジチ
オール類の金属錯体類は1,2,3,4−テトラ
クロロベンゼン−5,6−ジチオール(特開昭56
−135463)から誘導される金属錯体を除き、複雑
な数段階の合成反応を経て得られるものであるた
め、極めて高価なものであり、その利用には自ず
と制限がある。またテトラクロロベンゼンジチオ
ール金属錯体は、その近赤外線吸収能、熱安定
性、耐候性が優れていることと、その配位子であ
るテトラクロロベンゼンジチオールの製造法が経
済的に有利なことから実用に供されているが、近
赤外線吸収剤としてプラスチツクとともにコーテ
イングするか、プラスチツクに練り込んでフイル
ムやプレートとして使用する場合、テトラクロロ
ベンゼンジチオール金属錯体の添加量を増すと、
長時間の使用でテトラクロロベンゼンジチオール
金属錯体がプラスチツクから結晶化する現象を起
こす。例えば、コーテイング法による薄膜で高度
の近赤外線吸収能を賦与する場合に適かない。
これに対して本発明に用いるハロゲン置換ベン
ゼンジチオール金属錯体は樹脂等との相溶性が高
く、添加割合を高めても長時間の使用で樹脂から
の結晶化を起こさない。かつ、本発明のハロゲン
置換ベンゼンジチオールは後述する製造法で、工
業的に製造することができるので、経済的に有利
に近赤外線吸収剤として種々の目的に使用するこ
とができる。
すなわち、本発明に用いるハロゲン置換ベンゼ
ンジチオール金属錯体は、樹脂との相溶性が極め
て優れた近赤外線吸収剤として非常に有利なもの
である。
本発明に用いる新規なハロゲン置換ベンゼンジ
チオール金属錯体は、本発明者らによつてはじめ
て合成が可能となつた新規なハロゲン置換ベンゼ
ンジチオール、すなわち、ポリハロゲン化ベンゼ
ンと水硫化ナトリウムまたは水硫化カリウムとを
硫黄および極性有機溶媒の存在下で、鉄粉または
鉄塩類を加えて加熱反応させることにより得られ
る新規なハロゲン置換ベンゼンジチオール、具体
的には1,2,4−トリクロロベンゼン−5,6
−ジチオール、1,4−ジクロロベンゼン−5,
6−ジチオール、1−クロロベンゼン−5,6−
ジチオール、1,2,4−トリブロモベンゼン−
5,6−ジチオール、1,4−ジブロモベンゼン
−5,6−ジチオール、1−ブロモベンゼン−
5,6−ジチオール等を原料として合成すること
ができる。
すなわち、一般式()
(式中、Xは塩素または臭素原子を、Yおよび
ZはXが塩素原子のとき、水素または塩素原子
を、Xが臭素原子のとき、水素または臭素原子を
示す)で表されるハロゲン置換ベンゼンジチオー
ルを適当な溶媒に溶解または分散させ、この液
に塩化ニツケル、塩化パラジウム、塩化第2白金
酸カリウムなどのニツケル、パラジウまたは白金
イオンを供給しうる金属塩類を所定量加えてハロ
ゲン置換ベンゼンジチオールの金属錯体を生成さ
せたのち、所望の第4級アンモニウムハロゲナ
イドを所定量加えるか、または所望の第4級アン
モニウムハロゲナイドとアルカリとを反応させて
得る第4級アンモニウムヒドロキサイドを所定量
加えて反応させ、所望の新規なハロゲン置換ベン
ゼンジチオール金属錯体を得ることができる。
この製造法でハロゲン置換ベンゼンジチオール
と金属イオンを反応させる際に溶液が必要である
が、好ましくはハロゲン置換ベンゼンジチオール
を溶解し易いテトラヒドロフラン、無水エタノー
ルを用いるが、メタノール、エタノール、イソプ
ロパノールなどのアルコール類にハロゲン置換ベ
ンゼンジチオールを分散させた状態で反応を行つ
てもよい。
また、この製造法に用いるニツケル、パラジウ
ムまたは白金の金属イオンおよび第4級アンモニ
ウムイオンはハロゲン置換ベンゼンジチオール1
モル当量に対し、理論的には各々0.5モル当量を
必要とする。
本発明に用いる新規なハロゲン置換ベンゼンジ
チオール金属錯体は、従来知られているテトラク
ロロベンゼンジチオール金属錯体と同様に優れた
近赤外線吸収能、熱安定性、耐候性を有し、その
上、テトラクロロベンゼンジチオール金属錯体で
は期待できないプラスチツクに対する高度の相溶
性を有することが見出された。このため、本発明
の新規なハロゲン置換ベンゼンジチオール金属錯
体は、近赤外線吸収剤としてプラスチツク類に高
濃度に含有させることが可能であり、長時間使用
してもプラスチツクから結晶化を起こさないこと
が判つた。
この発明のおいて、一般式()で表される金
属錯体を保持するプラスチツク組成物材料として
は、透明性および機械的性質の優れたすべてのプ
ラスチツクが使用可能である。例えば、ポリエチ
レンテレフタレートで代表されるポリエステル
類、ニトロセルロース、セルローストリアセテー
トなどのセルロースエステル類、ポリエチレン、
ポリプロピレンなどのポリオレフイン類、ポリア
クリル酸メチル、ポリメタクリル酸メチルなどの
ポリアクリル樹脂、ポリ塩化ビニル、ポリ塩化ビ
ニリデン、塩化ビニル、酢酸ビニル共重合体、ポ
リスチレンなどのポリビニル類、ポリカーボネー
トなどがあり、近赤外線吸収能を賦与する目的に
合致したプラスチツクを選ぶことができる。
また、この発明における一般式()で表され
る金属錯体類のプラスチツクに対する配合割合
は、所望されるプラスチツクの種類、プラスチツ
クの厚さ、吸光性の強度により異なるが、長時間
の使用の際に、金属錯体がプラスチツクから結晶
化するのを防ぐため、およびプラスチツクの機械
物性を維持するためには約30重量%以下の添加が
望ましい。
また、この発明における近赤外線を吸収するプ
ラスチツク組成物を用いて成形する方法、すなわ
ち、一般式()で表される金属錯体をプラスチ
ツクに添加、保持させる方法としては、(1)プラス
チツク成形物の作成時にプラスチツク中に配合す
る方法、すなわち、金属錯体をプラスチツク粉末
またはペレツトに混合し、溶融して圧縮や押出成
型して所望の形状のプラスチツク成形物を得る方
法、また(2)近赤外線吸収能を賦与さるべき基材の
表面に一般式()で表される金属錯体を含むポ
リマー溶液または分散液を塗布することによつて
近赤外線吸収層を形成する方法がある。これらの
方法において、必要に応じて安定剤、可塑剤、酸
化防止剤、紫外線吸収剤等を配合してもよい。
かくして、本発明の組成物により近赤外線吸収
剤として一般式()で表される金属錯体をプラ
スチツクに高濃度に含有させることが可能とな
り、得られる近赤外線を吸収する組成物は、太陽
光の選択利用を目的とした農業用フイルム、まぶ
しさや眼球の疲労を防止する目的にサングラス、
溶接用眼鏡、航空機の窓またはテレビジヨンのフ
イルター、フオトダイオードや発光ダイオードな
どの光電変換素子の波長感度特性の補償用の光学
フイルター、さらに近赤外線領域に発振波長を有
する半導体レーザ光のヒートモード記録用媒体と
して用いることが可能である。
次に、一般式()で表される金属錯体の代表
例について、融点、吸光特性を第1表に示す。
本発明の金属錯体はこれらのみに限定されるも
のではない。
The present invention relates to a plastic composition containing a novel halogen-substituted benzenedithiol metal complex as a near-infrared absorber. That is, the present invention is based on the general formula () (In the formula, X is a chlorine or bromine atom, Y and Z are hydrogen or a chlorine atom when X is a chlorine atom, hydrogen or a bromine atom when X is a bromine atom, and N is a nickel, palladium, or platinum atom. An object of the present invention is to provide a plastic composition that absorbs near-infrared rays, characterized in that it contains a halogen-substituted benzenedithiol metal complex represented by (A represents a quaternary ammonium group) as a near-infrared absorber. Specifically, the metal complexes used in the present invention include bis(1,2,4-trichloro-5,6-dithiophenolate)nickel-tetra-n-butylammonium, bis(1,4-dichloro-5,6-dithiophenolate) -dithiophenolate) nickel-tetra-n-butylammonium, bis(1-chloro-5,6-dithiophenolate)nickel-tetra-n-butylammonium and these metal complexes by changing the nickel atom to palladium or platinum. complexes in which the tetra-n-butylammonium group of the quaternary ammonium group is replaced with a tetra-n-propylammonium group or a trioctylmethylammonium group, and bis(1,2,4-tribromo-5, 6-dithiophenolate) nickel-tetra-n-butylammonium, bis(1,4-dibromo-5,6-dithiophenolate) nickel-tetra-n-butylammonium, bis(1-
Bromo-5,6-dithiophenolate) nickel-tetra-n-butylammonium and complexes in which the nickel atom of these metal complexes is replaced with palladium or platinum, and tetra-n-butylammonium groups of quaternary ammonium groups These are complexes in which the compound is replaced with a tetra-n-propylammonium group or a trioctylmethylammonium group. The novel halogen-substituted orthobenzenedithiol metal complex used in the present invention has excellent compatibility with various resins compared to the conventionally known tetrachlorobenzenedithiol metal complex, and even if the addition ratio is increased, it can be used for a long period of time. Does not cause crystallization from resin. Already known, for example, bis(1,2-dithiophenolate)nickel-tetra-n-butylammonium, bis(1-methyl-3,4-dithiophenolate)nickel-tetra-n-butylammonium, bis(1-methyl-3,4-dithiophenolate)nickel-tetra-n-butylammonium, ,2,3,4-tetramethyl-
(5,6-dithiophenolate) nickel-tetra-n-butylammonium and bis(1,2,
Ortho-benzenedithiol metal complexes such as nickel-tetra-n-butylammonium (3,4-tetrachloro-5,6-dithiophenolate) are known to exhibit a unique absorption spectrum in the near-infrared region. Toluene-3,4-dithiol
und verwandte 1,2−Di−thiolene als
"Chelatbildner fur Metalle", vol. 102, pp. 308-320, 1971 and "Characterization and Electronic Structures
of Metal Complexes Containing Benzene−
1,2-dithiolate and Related Ligands Journal of the American Society 88
Vol. 4870-4875, 1966), and these metal complexes are important near-infrared absorbers because of their excellent thermal stability and weather resistance (Japanese Patent Application Laid-Open No. 135551/1983). Therefore, these materials are kneaded into plastic films or plates as near-infrared absorbers, or polymer liquids containing these materials are applied to substrates to create pharmaceutical films for selectively utilizing sunlight and for reducing glare. Research is being conducted on its use in sunglasses, welding glasses, aircraft window and television filters to prevent eye fatigue. Furthermore, in recent years, research has been conducted to use photodiodes as optical filters to compensate for the wavelength sensitivity characteristics of optical conversion elements such as light-emitting diodes, and because these near-infrared absorbers match the oscillation wavelength of semiconductor lasers, It is also important as a laser light absorbing heat storage agent for semiconductor laser light recording, ie, laser heat mode recording. However, the conventionally known metal complexes of benzenedithiols are 1,2,3,4-tetrachlorobenzene-5,6-dithiol (JP-A-56
-135463), which are obtained through a complex several-step synthesis reaction, are extremely expensive, and their use is naturally limited. In addition, tetrachlorobenzenedithiol metal complexes have been put into practical use because of their excellent near-infrared absorption ability, thermal stability, and weather resistance, and because the manufacturing method of tetrachlorobenzenedithiol, which is its ligand, is economically advantageous. However, when coating it with plastic as a near-infrared absorber or kneading it into plastic and using it as a film or plate, increasing the amount of tetrachlorobenzenedithiol metal complex added will cause
When used for a long time, the tetrachlorobenzenedithiol metal complex will crystallize from the plastic. For example, it is not suitable for imparting high near-infrared absorption ability with a thin film formed by a coating method. On the other hand, the halogen-substituted benzenedithiol metal complex used in the present invention has high compatibility with resins and the like, and does not crystallize from the resin even when used for a long time even if the addition ratio is increased. In addition, the halogen-substituted benzenedithiol of the present invention can be produced industrially by the production method described below, and therefore can be economically advantageously used as a near-infrared absorber for various purposes. That is, the halogen-substituted benzenedithiol metal complex used in the present invention is very advantageous as a near-infrared absorber having extremely excellent compatibility with resins. The novel halogen-substituted benzenedithiol metal complex used in the present invention is a novel halogen-substituted benzenedithiol that was made possible to synthesize for the first time by the present inventors, that is, a polyhalogenated benzene and sodium or potassium hydrosulfide. A novel halogen-substituted benzenedithiol, specifically 1,2,4-trichlorobenzene-5,6, obtained by heating and reacting with iron powder or iron salts in the presence of sulfur and a polar organic solvent.
-dithiol, 1,4-dichlorobenzene-5,
6-dithiol, 1-chlorobenzene-5,6-
dithiol, 1,2,4-tribromobenzene-
5,6-dithiol, 1,4-dibromobenzene-5,6-dithiol, 1-bromobenzene-
It can be synthesized using 5,6-dithiol or the like as a raw material. That is, the general formula () (wherein, X represents a chlorine or bromine atom, Y and Z represent a hydrogen or chlorine atom when X is a chlorine atom, and hydrogen or a bromine atom when X represents a bromine atom) Dithiol is dissolved or dispersed in a suitable solvent, and a predetermined amount of metal salts capable of supplying nickel, palladium, or platinum ions, such as nickel chloride, palladium chloride, and potassium chloride diplatinate, is added to this solution to prepare halogen-substituted benzenedithiol. After the metal complex is generated, a predetermined amount of a desired quaternary ammonium halide is added, or a predetermined amount of a quaternary ammonium hydroxide obtained by reacting a desired quaternary ammonium halide with an alkali is added. In addition, a desired novel halogen-substituted benzenedithiol metal complex can be obtained by reacting. A solution is required when reacting halogen-substituted benzenedithiol with metal ions in this production method, but tetrahydrofuran or absolute ethanol, which easily dissolves halogen-substituted benzenedithiol, is preferably used, but alcohols such as methanol, ethanol, isopropanol, etc. The reaction may be carried out in a state in which halogen-substituted benzenedithiol is dispersed in the halogen-substituted benzenedithiol. In addition, the metal ions of nickel, palladium, or platinum and quaternary ammonium ions used in this production method are halogen-substituted benzenedithiol 1
Theoretically, 0.5 molar equivalents are required for each molar equivalent. The novel halogen-substituted benzenedithiol metal complex used in the present invention has excellent near-infrared absorption ability, thermal stability, and weather resistance as well as the conventionally known tetrachlorobenzenedithiol metal complex. It has been found that it has a high degree of compatibility with plastics, which cannot be expected with metal complexes. Therefore, the novel halogen-substituted benzenedithiol metal complex of the present invention can be incorporated into plastics at high concentrations as a near-infrared absorber, and will not crystallize from plastics even after long-term use. I understand. In this invention, all plastics with excellent transparency and mechanical properties can be used as the plastic composition material holding the metal complex represented by the general formula (). For example, polyesters such as polyethylene terephthalate, cellulose esters such as nitrocellulose and cellulose triacetate, polyethylene,
These include polyolefins such as polypropylene, polyacrylic resins such as polymethyl acrylate and polymethyl methacrylate, polyvinyl chloride, polyvinylidene chloride, vinyl chloride, vinyl acetate copolymers, polyvinyls such as polystyrene, and polycarbonate. Plastics can be selected to suit the purpose of imparting infrared absorption capabilities. In addition, the blending ratio of the metal complexes represented by the general formula () to the plastic in this invention varies depending on the desired type of plastic, the thickness of the plastic, and the intensity of light absorption. It is desirable to add about 30% by weight or less to prevent the metal complex from crystallizing from the plastic and to maintain the mechanical properties of the plastic. In addition, the method of molding using a plastic composition that absorbs near-infrared rays in this invention, that is, the method of adding and retaining a metal complex represented by the general formula () to plastic, includes (1) forming a plastic molded product; (2) Near-infrared absorbing ability There is a method of forming a near-infrared absorption layer by applying a polymer solution or dispersion containing a metal complex represented by the general formula () onto the surface of a substrate to which a near-infrared absorbing layer is to be imparted. In these methods, stabilizers, plasticizers, antioxidants, ultraviolet absorbers, etc. may be added as necessary. Thus, the composition of the present invention makes it possible to incorporate the metal complex represented by the general formula () as a near-infrared absorber into plastic at a high concentration. Agricultural film for selective use, sunglasses to prevent glare and eye fatigue,
Welding glasses, aircraft window or television filters, optical filters for compensating the wavelength sensitivity characteristics of photoelectric conversion elements such as photodiodes and light emitting diodes, and heat mode recording of semiconductor laser light with an oscillation wavelength in the near-infrared region. It can be used as a medium for Next, Table 1 shows the melting points and light absorption characteristics of representative examples of metal complexes represented by the general formula (). The metal complex of the present invention is not limited to these.
【表】【table】
【表】
以下、実施例により本発明を詳しく説明する。
実施例中の部は重量部を示す。
合成例 1
1,2,4−トリクロロベンゼン−5,6−ジ
チオール9.0部をテトラヒドロフラン500部に溶解
しかきまぜながら、塩化ニツケル6水塩4.2部を
エタノール50部に溶解した液を加えると暗緑色に
変化する。次いでテトラ−n−ブチルアンモニウ
ムブロマイド6.0部を加え、2時間撹拌を続けた
のち反応液を減圧蒸留して約1/3まで濃縮した。
次いでジクロルメタンとメタノールの重量比1:
3の混合液から再結晶を行い、ビス(1,2,4
−トリクロロ−5,6−ジチオフエノレート)ニ
ツケル−テトラ−n−ブチルアンモニウム11.5部
を得た(収率80モル%)
融点 138〜140℃
元素分析値(%) (C28H38NCl6S4Niとし
て)
C H N Cl S
計算値 42.66 4.86 1.78 26.99 16.27
分析値 42.59 4.92 1.72 27.52 16.77
合成例 2
1,4−ジクロロベンゼン−5,6−ジチオー
ル22部をメタノール800部に懸濁させてかきまぜ
ながら、塩化ニツケル6水塩12.4部をメタノール
100部に溶解した液を加えると暗緑色に変化する。
次いでテトラ−n−ブチルアンモニウムブロマイ
ド18.3部を加え、2時間撹拌を続けたのち反応液
を減圧蒸留して約1/5に濃縮した。次いで濾過を
行い緑色の固体31部を得た。次いでジクロルメタ
ンとメタノールの重量比1:1の混合液から再結
晶を行い、ビス(1,4−ジクロロ−5,6−ジ
チオフエノレート)ニツケル−テトラ−n−ブチ
ルアンモニウム26部を得た(収率70モル%)。
融点 204〜205℃
元素分析値(%) (C28H40NCl4S4Niとし
て)
C H N Cl S
計算値 46.75 5.60 1.95 19.71 17.83
分析値 46.25 5.73 1.89 19.88 18.01
合成例 3
合成例2の1,4−ジクロロベンゼン−5,6
−ジチオール22部の代わりに1−クロロベンゼン
−5,6−ジチオール18.5部を用いる以外は合成
例2と同様に行つて、ビス(1−ジクロロ−5,
6−ジチオフエノレート)ニツケル−テトラ−n
−ブチルアンモニウム26部を得た(収率77モル
%)。
融点 125〜127℃
元素分析値(%) (C28H42NCl2S4Niとし
て)
C H N Cl S
計算値 51.70 6.51 2.15 10.90 19.72
分析値 51.55 6.67 2.13 11.02 20.10
合成例 4
合成例1の塩化ニツケル6水塩4.2部の代わり
に塩化第2白金酸カリウム7.3部を用いる以外は
合成例1と同様に行つてビス(1,2,4−トリ
クロロ−5,6−−ジチオフエノレート)ニツケ
ル−テトラ−n−ブチルアンモニウム13部を得た
(収率80モル%)。
融点 146〜147℃
元素分析値(%) (C28H38NCl6S4Ptとして)
C H N Cl S
計算値 36.37 4.14 1.51 23.01 13.87
分析値 36.40 4.18 1.49 22.98 13.96
合成例 5
合成例1の1,2,4−トリクロロベンゼン−
5,6−ジチオール9.0部の代わりに1,2,4
−トリブロモベンゼン13.3部を用いる以外、合成
例1と同様に行つてビス(1,2,4−トリブロ
モ−5,6−ジチオフエノレート)ニツケル−テ
トラ−n−ブチルアンモニウム14部を得た(収率
73モル%)。
融点 193〜196℃
元素分析値(%) (C28H38NBr6S4Niとし
て)
C H N Cl S
計算値 31.88 3.63 1.33 45.44 12.16
分析値 31.75 3.69 1.29 44.38 12.22
実施例 1
アセトン45部、トルエン45部の混合溶剤にポリ
メチルアクリレート10部を加え、これに合成例1
〜5で得た新規なハロゲン置換ベンゼンジチオー
ル金属錯体の1種又は比較のため既知のビス
(1,2,3,4−テトラクロロ−5,6−ジチ
オフエノレート)ニツケル−テトラ−n−ブチル
アンモニウムを3部加えて溶解させた。厚さ0.2
mmのポリ塩化ビニルフイルムの表面に、前記の溶
液を小型のグラビアコート機を用いて乾燥膜厚
7μmとなるように塗布したのち、70℃の熱風で乾
燥した。このフイルムを60℃の恒温槽に7日間放
置したのち、顕微鏡で観察した結果、ビス(1,
2,3,4−テトラクロロ−5,6−ジチオフエ
ノレート)ニツケル−テトラ−n−ブチルアンモ
ニウムを含むフイルムには微小な針状の結晶が散
在するのを観察できたのに対し、合成例1〜5で
得た新規なハロゲン置換ベンゼンジチオールを含
むフイルムには結晶は全く観察できなかつた。
実施例 2
合成例1〜5で得た新規なハロゲン置換ベンゼ
ンジチオールおよび比較のため、既知のビス
(1,2,3,4−テトラクロロ−5,6−ジチ
オフエノレート)ニツケル−テトラ−n−ブチル
アンモニウムの1種を3部およびニトロセルロー
ス5部をメチルエチルケトン50部に溶解させた組
成物をスピンナーを用いてポリエチレンテレフタ
レートフイルム上に塗布し、所定の条件で乾燥し
て約1μmの塗膜面を形成させた。得られたフイル
ムを60℃の恒温槽に7日間放置したのち、試験片
を光学顕微鏡で観察したところ、ビス(1,2,
3,4−テトラクロロ−5,6−ジチオフエノレ
ート)ニツケル−テトラ−n−ブチルアンモニウ
ムを含む試験片には微小な針状の結晶が散在する
のを観察できたのに対し、合成例1〜5で得た新
規なハロゲン置換ベンゼンジチオールを含む試験
片には結晶は全く観察できなかつた。
参考例 1(赤外線遮断効果)
実施例1で得たフイルムのうちビス(1,2,
4−トリクロロ−5,6−ジチオフエノレート)
ニツケル−テトラ−n−ブチルアンモニウムを用
いたフイルム(以下、フイルムAと称す)を用い
て、縦90cm、横120cm、高さ90cmの木枠の画面お
よび上面にフイルムを張り、内部に照度計(東
芝、5号照度計、ゴルチンスキー日照計および積
算照度計(東洋理化工業、PH−11型)を設置し
た。照度(単位lux)、日照量(単位cal)および
紫外、可視および赤外部の幅射量(単位mW・
min/cm2)を求め、被覆しない場合(野外)の値
を100とする相対値に換算した。
得られた結果は第2表に示すとうりで、本発明
のフイルムAは可視部の光は22%減少させるだけ
であるが、日照量を約1/2に減らす効果があつた。[Table] Hereinafter, the present invention will be explained in detail with reference to Examples.
Parts in Examples indicate parts by weight. Synthesis Example 1 When 9.0 parts of 1,2,4-trichlorobenzene-5,6-dithiol was dissolved in 500 parts of tetrahydrofuran and stirred, a solution of 4.2 parts of nickel chloride hexahydrate dissolved in 50 parts of ethanol was added, and the mixture turned dark green. Change. Next, 6.0 parts of tetra-n-butylammonium bromide was added, stirring was continued for 2 hours, and the reaction solution was concentrated to about 1/3 by distillation under reduced pressure.
Then, the weight ratio of dichloromethane and methanol was 1:
Recrystallize from the mixture of 3 and bis(1,2,4
Obtained 11.5 parts of nickel-tetra-n-butylammonium (trichloro-5,6-dithiophenolate) (yield 80 mol%) Melting point 138-140°C Elemental analysis value (%) (C 28 H 38 NCl 6 S 4 Ni) C H N Cl S Calculated value 42.66 4.86 1.78 26.99 16.27 Analytical value 42.59 4.92 1.72 27.52 16.77 Synthesis example 2 22 parts of 1,4-dichlorobenzene-5,6-dithiol were suspended in 800 parts of methanol and stirred. Meanwhile, add 12.4 parts of nickel chloride hexahydrate to methanol.
When 100 parts of the solution is added, the color changes to dark green.
Next, 18.3 parts of tetra-n-butylammonium bromide was added, and after continued stirring for 2 hours, the reaction solution was concentrated to about 1/5 by distillation under reduced pressure. Then, filtration was performed to obtain 31 parts of a green solid. Next, recrystallization was performed from a mixture of dichloromethane and methanol in a weight ratio of 1:1 to obtain 26 parts of bis(1,4-dichloro-5,6-dithiophenolate)nickel-tetra-n-butylammonium (yield rate 70 mol%). Melting point 204-205℃ Elemental analysis value (%) (as C 28 H 40 NCl 4 S 4 Ni) C H N Cl S Calculated value 46.75 5.60 1.95 19.71 17.83 Analysis value 46.25 5.73 1.89 19.88 18.01 Synthesis example 3 Synthesis example 2-1 ,4-dichlorobenzene-5,6
-Bis(1-dichloro-5,
6-dithiophenolate) nickel-tetra-n
-26 parts of butylammonium were obtained (yield 77 mol%). Melting point 125-127℃ Elemental analysis value (%) (as C 28 H 42 NCl 2 S 4 Ni) C H N Cl S Calculated value 51.70 6.51 2.15 10.90 19.72 Analysis value 51.55 6.67 2.13 11.02 20.10 Synthesis example 4 Chloride of Synthesis example 1 Bis(1,2,4-trichloro-5,6-dithiophenolate)nickel- 13 parts of tetra-n-butylammonium were obtained (yield: 80 mol%). Melting point 146-147℃ Elemental analysis value (%) (as C 28 H 38 NCl 6 S 4 Pt) C H N Cl S Calculated value 36.37 4.14 1.51 23.01 13.87 Analysis value 36.40 4.18 1.49 22.98 13.96 Synthesis example 5 Synthesis example 1-1 ,2,4-trichlorobenzene-
1,2,4 instead of 9.0 parts of 5,6-dithiol
The procedure was repeated in the same manner as in Synthesis Example 1 except that 13.3 parts of -tribromobenzene was used to obtain 14 parts of bis(1,2,4-tribromo-5,6-dithiophenolate)nickel-tetra-n-butylammonium ( yield
73 mol%). Sloring point 193-196 ° C element analysis values ( %) (C 28 H 38 NBR 6 S 4 Ni) C Hn Class calculation value 31.88 3.63 1.33 45.44 12.69 1.29 44.38 12.22 Examples Add 10 parts of polymethyl acrylate to 45 parts of mixed solvent, and add Synthesis Example 1 to this.
One of the novel halogen-substituted benzenedithiol metal complexes obtained in Steps 5 to 5 or the known bis(1,2,3,4-tetrachloro-5,6-dithiophenolate)nickel-tetra-n-butyl for comparison. Three parts of ammonium was added and dissolved. Thickness 0.2
The above solution was applied to the surface of a polyvinyl chloride film of mm size using a small gravure coating machine to a dry film thickness.
After coating to a thickness of 7 μm, it was dried with hot air at 70°C. After leaving this film in a constant temperature bath at 60°C for 7 days, it was observed under a microscope.
In the film containing nickel-tetra-n-butylammonium (2,3,4-tetrachloro-5,6-dithiophenolate), fine needle-like crystals were observed scattered, whereas in the synthesis example No crystals were observed in the films containing the novel halogen-substituted benzenedithiol obtained in Examples 1 to 5. Example 2 New halogen-substituted benzenedithiols obtained in Synthesis Examples 1 to 5 and, for comparison, the known bis(1,2,3,4-tetrachloro-5,6-dithiophenolate)nickel-tetra-n - A composition prepared by dissolving 3 parts of a type of butylammonium and 5 parts of nitrocellulose in 50 parts of methyl ethyl ketone is applied onto a polyethylene terephthalate film using a spinner and dried under specified conditions to form a coating surface of approximately 1 μm. was formed. After the obtained film was left in a constant temperature bath at 60℃ for 7 days, the test piece was observed with an optical microscope, and it was found that screws (1, 2,
In the test piece containing nickel-tetra-n-butylammonium (3,4-tetrachloro-5,6-dithiophenolate), fine needle-like crystals were observed scattered, whereas in Synthesis Example 1 No crystals were observed at all in the test piece containing the novel halogen-substituted benzenedithiol obtained in Steps 5 to 5. Reference Example 1 (Infrared blocking effect) Among the films obtained in Example 1, bis(1, 2,
4-trichloro-5,6-dithiophenolate)
Using a film made of nickel-tetra-n-butylammonium (hereinafter referred to as film A), the film was placed on the screen and top of a wooden frame measuring 90 cm long, 120 cm wide, and 90 cm high. We installed a Toshiba No. 5 illuminance meter, a Gorchinski solar irradiance meter, and an integrated illuminance meter (Toyo Rika Kogyo, model PH-11).Illuminance (unit: lux), amount of sunlight (unit: cal), and ultraviolet, visible, and infrared radiation. Amount (unit: mW・
min/cm 2 ) was calculated and converted into a relative value with the value when not covered (in the field) as 100. The results obtained are shown in Table 2. Film A of the present invention reduced visible light by only 22%, but was effective in reducing the amount of sunlight to about 1/2.
【表】
施例2の方法で調製したもの
参考例 2
実施例2で得たフイルムのうちビス(1,4−
ジクロロ−5,6−ジチオフエノレート)ニツケ
ル−テトラ−n−ブチルアンモニウムを用いたフ
イルム(以下、フイルムBと称す)の塗布面へ集
束した半導体レーザ光(GaAlAs系レーザ、
830nm、光出力5mW)直線状に掃引照射した。
レーザ照射部を電子顕微鏡で観察した結果、レー
ザ光の軌跡は極めて鮮明であり、光学顕微鏡によ
る観察では未照射部が緑色を呈しているのに対し
て、照射部は黄色に変色していることが判り、フ
イルムBでレーザ光の記録が可能なことが判つ
た。
実施例 3
ビス(1−クロロ−5,6−ジチオフエノレー
ト)ニツケル−テトラ−n−ブチルアンモニウム
0.15部およびポリメタクリル酸メチル樹脂100部
の混合物をプレス温度150度、プレス圧力280Kg/
cm2で圧縮成型して1.0mm厚の試験片を得た。得ら
れた試験片は緑色を呈し、350〜1100nmの波長領
域にうち、可視部の最大透過率は70%以上であ
り、400nm以下および800〜950nmの透過率は10
%以下であり、視感度に近い分光特性を有する光
学フイルターが得られた。[Table] Reference Example 2 Films prepared by the method of Example 2 Among the films obtained in Example 2, bis(1,4-
Semiconductor laser light (GaAlAs-based laser,
830 nm, optical output 5 mW) linearly swept irradiation.
Observation of the laser irradiated area with an electron microscope showed that the trajectory of the laser beam was extremely clear, and observation with an optical microscope showed that the unirradiated area was green, while the irradiated area turned yellow. It was found that recording with laser light was possible with Film B. Example 3 Bis(1-chloro-5,6-dithiophenolate)nickel-tetra-n-butylammonium
A mixture of 0.15 parts and 100 parts of polymethyl methacrylate resin was pressed at a temperature of 150 degrees and a pressure of 280 kg/
A test piece with a thickness of 1.0 mm was obtained by compression molding in cm2 . The obtained test piece has a green color, and the maximum transmittance in the visible region in the wavelength range of 350 to 1100 nm is 70% or more, and the transmittance in the wavelength range of 400 nm or less and 800 to 950 nm is 10%.
% or less, and an optical filter having spectral characteristics close to the visual sensitivity was obtained.
Claims (1)
ZはXが塩素原子のとき、水素または塩素原子
を、Xが臭素原子のとき、水素または臭素原子
を、Nはニツケル、パラジウムまたは白金原子
を、Aは第4級アンモニウム基を示す)で表され
るハロゲン置換ベンゼンジチオール金属錯体を含
有することを特徴とする近赤外線を吸収するプラ
スチツク組成物。[Claims] 1. As a near-infrared absorber, the general formula () (In the formula, X is a chlorine or bromine atom, Y and Z are hydrogen or a chlorine atom when X is a chlorine atom, hydrogen or a bromine atom when X is a bromine atom, and N is a nickel, palladium, or platinum atom. A plastic composition that absorbs near-infrared rays, characterized in that it contains a halogen-substituted benzenedithiol metal complex represented by the formula (A represents a quaternary ammonium group).
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP31938388A JPH02659A (en) | 1988-12-20 | 1988-12-20 | Plastic composition containing new halogen-substituted benzenedithiol/metal complex |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP31938388A JPH02659A (en) | 1988-12-20 | 1988-12-20 | Plastic composition containing new halogen-substituted benzenedithiol/metal complex |
Related Parent Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP20157481A Division JPS58105996A (en) | 1981-12-16 | 1981-12-16 | Novel halogen-substituted benzenedithiol metal complex and plastic composition containing the same |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH02659A JPH02659A (en) | 1990-01-05 |
| JPH0355511B2 true JPH0355511B2 (en) | 1991-08-23 |
Family
ID=18109545
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP31938388A Granted JPH02659A (en) | 1988-12-20 | 1988-12-20 | Plastic composition containing new halogen-substituted benzenedithiol/metal complex |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH02659A (en) |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP3206940B2 (en) * | 1991-12-16 | 2001-09-10 | ダイセル化学工業株式会社 | Near-infrared absorbing methacrylic resin composition and molded article thereof |
-
1988
- 1988-12-20 JP JP31938388A patent/JPH02659A/en active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPH02659A (en) | 1990-01-05 |
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