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JPH0359982B2 - - Google Patents
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JPH0359982B2 - - Google Patents

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Publication number
JPH0359982B2
JPH0359982B2 JP58097010A JP9701083A JPH0359982B2 JP H0359982 B2 JPH0359982 B2 JP H0359982B2 JP 58097010 A JP58097010 A JP 58097010A JP 9701083 A JP9701083 A JP 9701083A JP H0359982 B2 JPH0359982 B2 JP H0359982B2
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JP
Japan
Prior art keywords
molded product
metal
layer
synthetic resin
resin molded
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP58097010A
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Japanese (ja)
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JPS59223731A (en
Inventor
Susumu Kumagai
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Individual
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Individual
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Priority to JP9701083A priority Critical patent/JPS59223731A/en
Publication of JPS59223731A publication Critical patent/JPS59223731A/en
Publication of JPH0359982B2 publication Critical patent/JPH0359982B2/ja
Granted legal-status Critical Current

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  • Processes Of Treating Macromolecular Substances (AREA)
  • Treatments Of Macromolecular Shaped Articles (AREA)

Description

【発明の詳細な説明】[Detailed description of the invention]

技術分野 本発明は、合成樹脂成形品表面への金属薄膜形
成方法及び成形品に関するものであり、特に可塑
剤を多量に含む軟質PVC成形品の表面に、可塑
剤ブリードアウト防止架橋層と蒸着金属層とを同
時に与える方法及び成形品に関するものである。 従来技術 一般に、合成樹脂成形品の蒸着に於いては、蒸
着金属と当該成形品との接着性を上げる為、成形
品表面をクロム酸混液、コロナ放電、低温プラズ
マ等の方法で処理している。しかし、クロム酸混
液法に於いてはその廃液処理に問題があり、コロ
ナ放電法に於いては成形品表面に付着している汚
れ、或いは成形品内部より滲出してくる可塑剤等
の接着性阻害物質を完全に除去・防止出来ない
し、又低温プラズマ処理に於いてはその工程がプ
ラズマ処理と蒸着との2段階に分かれている為、
製品原価の面からも、また中間品の保存方法でも
問題が多い。 合成樹脂成形品のうち、特に軟質PVCを用い
たものは、その易成形性、低コスト性、高強度性
等の特徴から、広くあらゆる用途に使われてい
る。しかし、軟質PVC成形品はその成形時に於
いて、可塑剤、安定剤、充填剤、滑剤、紫外線吸
収剤、酸化防止剤、防徴剤、接着剤、顔料等を用
途に応じて添加している為、これらの添加物が成
形時の熱及び圧力に依つて、或いは、放置時に於
いては時間の経過と共に、成形品表面にブリード
アウトして来るという欠点を有している。この欠
点の為、PVCフイルムへの金属蒸着は、充分な
接着性を得ることが出来ず、又初期的に良い接着
性を示すものでも、時間の経過と共に金属が剥離
してくると言う欠陥があつた。 発明の概要 本発明は、このような問題を解決すべく鋭意検
討を重ねた結果、本発明を見出すに至つた。 本発明は、減圧下高温において発生した金属蒸
気を合成樹脂成形品表面上に蒸着して金属薄膜を
形成する方法において、前記成形品表面に無機ガ
スの低温プラズマおよび紫外光線の一方または両
方を照射しながら前記蒸着処理を施して、前記金
属薄膜の形成と同時に、前記合成樹脂成形品表層
部の樹脂を架橋させることを特徴とする、合成樹
脂成形品表面への金属薄膜形成方法を提供する。 ところで、低温プラズマ及び真空紫外光照射下
での蒸着反応機構に於いては、現在未解明の部分
も多い。しかし、本発明に於いては、紫外線が特
に重要な役割を果していると考えられる。即ち、
真空紫外光同様、低温プラズマに於いても、ガス
原子が励起状態から遷移状態へ転移す際紫外線を
発生する。これが、励起ガス原子に依る成形品表
面のスパツタ清浄化と同時に表面層での架橋を促
進していると考えられる。又、紫外線は、金属を
も透過すると言う性質を有している為、すでに金
属薄膜が形成されてしまつた成形品部分に於いて
も更に架橋が進み、完全なブリードアウト防止層
が形成される(理化学研究所監修、「プラズマ反
応による物質合成と材料処理」、アイオニクス株
式会社編集、昭和59年7月3日発行、171〜179頁
参照)。この為、本発明に依る製品の接着性は、
初期的にも又経時的に見ても、変化のない優れた
ものとなる。 発明の具体的説明 以下、この発明の詳細を説明する。 本発明の対象となる合成樹脂成形品としては、
ポリ塩化ビニル及びその共重合体成形品、ポリエ
チレン、ポリプロピレン等のポリオレフイン成形
品、ポリエステル成形品、ポリアミド、ポリイミ
ド及びその共重合体成形品、ポリウレタン成形
品、MMA,BMA等のアクリル及びその共重合
体成形品、ABS,SBR等の合成ゴム成形品等、
全ての合成樹脂の分野で適用できるが、特にポリ
塩化ビニル成形品及びABS,SBR等の合成ゴム
成形品に於いてその効果が顕著で、好ましい。
又、当該成形品であれば、その形態、製法及び配
合組成に関しては、特に制約はない。 導入する無機ガスとしては、CO,CO2,O2
N2,H2及びAr,He等の不活性ガスが挙げられ
るが、特にCO及びCOとArとの混合物が効果的
である。導入ガス量としては、器内圧力にして
10-4〜10Torrが最適であり、これより高圧とな
ると蒸着金属の推積率が極端に低下して、所定の
金属厚を得るのに長時間を要する結果となり、効
率が悪い。又、これより低圧となると励起ガス原
子に依るスパツタ清浄効果も悪く、又成形品表面
に於ける架橋効率も低下し、良好な接着性を有す
る金属被膜を得ることが不可能となる。 蒸着させる金属としては、Al,Ti等の金属導
体、ZnO,MgO等の金属酸化物、MoS等の金属
硫化物等、金属一般に関して可能であり、目的や
用途に応じて金属を選ぶことができ、特に制約を
受けるものではない。低温プラズマ処理の方法と
しては、高周波放電、マイクロ波放電、コロナ放
電等のいずれの方法に依つても良いが、特に内部
電極方式であることが望ましい。 次に第1図及び第2図を参照しながら、蒸着に
用いる装置及び条件の詳しい説明を行なう。装置
的には、高周波イオンプレーテイング装置あるい
は通常の真空蒸着装置に高周波放電用電極、直流
印加電極及びガス導入管を設置したもの(第1
図)及び高周波イオンプレーテイング装置に於い
て高周波電極の代りに水銀ランプを設置したもの
(第2図)でも良い。1は基板(陰極)、2は蒸発
槽(陽極)であり、各々の加熱温度は蒸発源、成
形品の耐熱温度に依つて決定される。又、蒸発槽
はるつぼ方式でも、電子ビーム方式でも良く、図
で示す装置に限定されるものではない。5は高周
波放電用コイルであり、最適な処理電力は50〜
500Wであり、特に50〜300Wであることが好まし
い。5′は水銀ランプであり、最適な処理電力は
100〜500W、紫外線領域は100〜250nmであり、
特に好ましくは処理電力200〜350W、紫外線領域
100〜250nmである。6は遮蔽板であり、特に材
質は選ばないが、望ましくは基板側表面を
AlMgF2等紫外線反射能を持つた金属にてコーテ
イングしてあるものが効率を高める為にも良い。
9は直流電源であり、その印加電圧は0.05〜5kV
であり、最適値は、蒸着金属に依つて決定され
る。 尚、第1図及び第2図において、3は加熱ヒー
タ、4はガス導入管、7は蒸着用試料、10はガ
スボンベ、11は高周波電源、11′は光発振回
路、12は真空ポンプ、13は熱電対である。処
理時間としては、低温プラズマ雰囲気中で、蒸着
を行なう場合20〜80分が最適であり、これにより
短かい場合には成形品表面の架橋層が薄く、満足
出来る接着性、耐久性を有するものは得られない
し、これより長い場合には励起ガス分子に依る金
属表面のエツチングが進行し、平滑な表面が得ら
れない。又、真空紫外光照射下で蒸発を行なう場
合、10〜60分が最適であり、これより短かい場
合、充分な膜厚の蒸着金属層が得られないし、こ
れにより長い場合成形品そのものの樹脂劣化を招
く結果となる。 蒸着後の最終製品の形態は、特に軟質PVCに
於いて、金属表面側から見て、蒸着金属層14、
軟質PVC架橋層15及び軟質PVC16からなる
3層構造(第3図)を有し、軟質PVC架橋層が
可塑剤その他の接着性阻害物質の滲出防止層とし
て作用する。又、用途に依つては、両面に金属蒸
着層を設けても良いし、或いは片面が金属蒸着層
でもう片面が低温プラズマ処理及び/又は真空紫
外光照射のみに依る架橋層を有するものでも良
い。 このように、本発明で得られる各種蒸着成形物
は、その応用範囲、用途も広く、例えば、軟質
PVCフイルムにAlを蒸着したものは遮熱関係の
壁材、保温・保冷袋、包装用フイルム等として今
まで軟質PVCフイルムでは下可能とされた分野
にも適用されるものと考えられる。 実施例 次に本発明の実施例を示す。 実施例 1 処理サンプルとしてPVC(デンカSS−103)100
重量部、DOP(ジオクチルフタレート)60重量
部、EPS(エポキシ化大豆油)3重量部、Ba−Zn
系安定剤2部で配合調整したものを、加熱ロール
にて0.1mmのフイルムとし、これを試料とする。
この物を第1図に示した装置内の所定の位置に設
置し、いつたん器内を10-5Torrまで排気した後、
ガス導入管を通じてCO/Ar(混合比7/3)を
入れ、器内の圧力が0.05Torrに保たれるように
し、消費電力200Wにてグロー放電を行なつた。
蒸着金属としてはAlを用い、直流印加電圧200V、
基板温度80℃、るつぼ温度900℃の条件で行なつ
た。 金属とフイルムとの接着力は基盤目法にて測定
した。結果を第1表に示す。 (※注)基盤目法;表面に樹脂又は金属をコーテ
イングしたフイルムを1cm角に切り取
り、タテ・ヨコ方向各々1mm間隔に切
り込みを入れ、計100個のマスを作る。
市販のセロテープを、そのフイルムに
貼り付け、その上を荷重1Kgの金属棒
にて強く10回こすりつける。その後、
セロハンテープを剥ぎ取り、コーテイ
ング物の剥離の具合を見る。剥離の状
態は、残つたコーテイング物のマス目
の数(保持率;%)で表わす。
Technical Field The present invention relates to a method for forming a metal thin film on the surface of a synthetic resin molded product and a molded product. In particular, the present invention relates to a method for forming a metal thin film on the surface of a synthetic resin molded product, and in particular, a plasticizer bleed-out prevention crosslinked layer and a vapor-deposited metal on the surface of a soft PVC molded product containing a large amount of plasticizer. The present invention relates to a method for simultaneously applying a layer and a molded article. Prior Art Generally, when depositing synthetic resin molded products, the surface of the molded product is treated with a chromic acid mixture, corona discharge, low-temperature plasma, etc. in order to improve the adhesion between the deposited metal and the molded product. . However, in the chromic acid mixture method, there are problems in the disposal of the waste liquid, and in the corona discharge method, the adhesiveness of the dirt adhering to the surface of the molded product or the plasticizer exuding from inside the molded product is a problem. It is not possible to completely remove or prevent inhibitory substances, and in low-temperature plasma treatment, the process is divided into two stages: plasma treatment and vapor deposition.
There are many problems in terms of product costs and how to store intermediate products. Among synthetic resin molded products, those made from soft PVC are widely used in a variety of applications due to their easy moldability, low cost, and high strength. However, during molding of soft PVC molded products, plasticizers, stabilizers, fillers, lubricants, ultraviolet absorbers, antioxidants, anti-fouling agents, adhesives, pigments, etc. are added depending on the purpose. Therefore, these additives have the disadvantage that they bleed out onto the surface of the molded product due to the heat and pressure during molding or over time when left standing. Due to this drawback, it is not possible to obtain sufficient adhesion when depositing metal onto PVC film, and even if the film shows good adhesion initially, the metal may peel off over time. It was hot. Summary of the Invention The present invention was discovered as a result of intensive studies aimed at solving these problems. The present invention provides a method for forming a metal thin film by depositing metal vapor generated at high temperature under reduced pressure on the surface of a synthetic resin molded product, in which the surface of the molded product is irradiated with one or both of low-temperature plasma of an inorganic gas and ultraviolet light. The present invention provides a method for forming a metal thin film on the surface of a synthetic resin molded product, characterized in that the vapor deposition treatment is performed to crosslink the resin in the surface layer of the synthetic resin molded product at the same time as the formation of the metal thin film. By the way, there are currently many aspects of the vapor deposition reaction mechanism under low-temperature plasma and vacuum ultraviolet light irradiation that are still unknown. However, it is believed that ultraviolet light plays a particularly important role in the present invention. That is,
Similar to vacuum ultraviolet light, low-temperature plasma also generates ultraviolet light when gas atoms transition from an excited state to a transition state. This is thought to promote crosslinking in the surface layer at the same time as spatter cleaning on the surface of the molded product by the excited gas atoms. In addition, since ultraviolet rays have the property of being able to pass through metals, cross-linking will proceed further in the molded parts where a thin metal film has already been formed, forming a complete bleed-out prevention layer. (Refer to ``Synthesis and Material Processing by Plasma Reaction'', supervised by RIKEN, edited by Ionics Co., Ltd., published July 3, 1980, pp. 171-179). Therefore, the adhesiveness of the product according to the present invention is
It remains excellent both initially and over time. DETAILED DESCRIPTION OF THE INVENTION The details of this invention will be described below. The synthetic resin molded products covered by the present invention include:
Polyvinyl chloride and its copolymer molded products, polyolefin molded products such as polyethylene and polypropylene, polyester molded products, polyamide, polyimide and their copolymer molded products, polyurethane molded products, acrylics such as MMA and BMA, and their copolymers. Molded products, synthetic rubber molded products such as ABS, SBR, etc.
Although it can be applied to all fields of synthetic resins, the effect is particularly noticeable in polyvinyl chloride molded products and synthetic rubber molded products such as ABS and SBR, so it is preferable.
Moreover, as long as the molded article is the same, there are no particular restrictions regarding its form, manufacturing method, and composition. Inorganic gases to be introduced include CO, CO 2 , O 2 ,
Examples include N 2 , H 2 and inert gases such as Ar and He, but CO and a mixture of CO and Ar are particularly effective. The amount of introduced gas is based on the pressure inside the vessel.
A pressure of 10 -4 to 10 Torr is optimal; if the pressure is higher than this, the deposition rate of the deposited metal will be extremely reduced, resulting in a long time required to obtain a predetermined metal thickness, resulting in poor efficiency. Furthermore, if the pressure is lower than this, the spatter cleaning effect due to the excited gas atoms will be poor, and the crosslinking efficiency on the surface of the molded article will also be reduced, making it impossible to obtain a metal coating with good adhesion. The metal to be evaporated can be general metals such as metal conductors such as Al and Ti, metal oxides such as ZnO and MgO, and metal sulfides such as MoS, and the metal can be selected depending on the purpose and use. , there are no particular restrictions. The low-temperature plasma treatment may be performed by any method such as high frequency discharge, microwave discharge, corona discharge, etc., but an internal electrode method is particularly preferred. Next, the apparatus and conditions used for vapor deposition will be explained in detail with reference to FIGS. 1 and 2. The device is a high-frequency ion plating device or a normal vacuum evaporation device equipped with a high-frequency discharge electrode, a DC application electrode, and a gas introduction tube (the first
(Fig. 2) and a high-frequency ion plating apparatus in which a mercury lamp is installed in place of the high-frequency electrode (Fig. 2) may also be used. 1 is a substrate (cathode), 2 is an evaporation tank (anode), and the heating temperature of each is determined depending on the evaporation source and the heat resistance temperature of the molded product. Further, the evaporation tank may be of a crucible type or an electron beam type, and is not limited to the apparatus shown in the figure. 5 is a coil for high frequency discharge, and the optimum processing power is 50 ~
500W, particularly preferably 50 to 300W. 5' is a mercury lamp, and the optimal processing power is
100~500W, UV range is 100~250nm,
Particularly preferably processing power 200-350W, ultraviolet region
It is 100-250 nm. 6 is a shielding plate, and although the material is not particularly selected, it is preferable that the surface on the substrate side is
It is also good to use a metal coated with a metal that reflects ultraviolet rays, such as AlMgF 2 , to increase efficiency.
9 is a DC power supply, and the applied voltage is 0.05 to 5kV
The optimum value is determined depending on the metal deposited. 1 and 2, 3 is a heater, 4 is a gas introduction tube, 7 is a sample for deposition, 10 is a gas cylinder, 11 is a high frequency power source, 11' is an optical oscillation circuit, 12 is a vacuum pump, 13 is a thermocouple. The optimal processing time is 20 to 80 minutes when vapor deposition is performed in a low-temperature plasma atmosphere.If this time is short, the crosslinked layer on the surface of the molded product is thin and has satisfactory adhesion and durability. If the length is longer than this, the etching of the metal surface by the excited gas molecules will proceed, making it impossible to obtain a smooth surface. Also, when performing evaporation under vacuum ultraviolet light irradiation, the optimum time is 10 to 60 minutes; if it is shorter than this, a sufficiently thick evaporated metal layer cannot be obtained, and if it is too long, the resin of the molded product itself may be damaged. This results in deterioration. The shape of the final product after vapor deposition is, especially in soft PVC, when viewed from the metal surface side, the vapor deposited metal layer 14,
It has a three-layer structure (FIG. 3) consisting of a soft PVC crosslinked layer 15 and a soft PVC 16, and the soft PVC crosslinked layer acts as a layer to prevent plasticizers and other adhesion inhibiting substances from seeping out. Also, depending on the application, a metal vapor deposited layer may be provided on both sides, or one side may have a metal vapor deposited layer and the other side may have a crosslinked layer formed only by low temperature plasma treatment and/or vacuum ultraviolet light irradiation. . As described above, the various vapor-deposited products obtained by the present invention have a wide range of applications and uses, such as soft
It is thought that PVC films with Al deposited on them can be applied to fields that were previously considered impossible with soft PVC films, such as heat-insulating wall materials, thermal/cold bags, and packaging films. Examples Next, examples of the present invention will be shown. Example 1 PVC (Denka SS-103) 100 as a treated sample
Parts by weight, DOP (dioctyl phthalate) 60 parts by weight, EPS (epoxidized soybean oil) 3 parts by weight, Ba-Zn
The mixture adjusted with 2 parts of system stabilizer is made into a 0.1 mm film using a heated roll, and this is used as a sample.
After installing this item in the specified position in the device shown in Figure 1 and evacuating the inside of the sparge to 10 -5 Torr,
CO/Ar (mixing ratio 7/3) was introduced through the gas introduction pipe to maintain the pressure inside the vessel at 0.05 Torr, and glow discharge was performed at a power consumption of 200 W.
Al was used as the vapor-deposited metal, and the applied DC voltage was 200 V.
The experiment was carried out under conditions of a substrate temperature of 80°C and a crucible temperature of 900°C. The adhesion between the metal and the film was measured using the base method. The results are shown in Table 1. (*Note) Base method: Cut a film coated with resin or metal on the surface into 1 cm squares, and make cuts at 1 mm intervals in both the vertical and horizontal directions to make a total of 100 squares.
Attach commercially available cellophane tape to the film and rub it strongly 10 times with a metal rod weighing 1 kg. after that,
Peel off the cellophane tape and check the degree of peeling of the coating. The state of peeling is expressed by the number of squares (retention rate; %) of the remaining coating material.

【表】 実施例 2 実施例1で用いたと同じ試料を第2図に示す装
置内の所定の位置にセツトし、器内排気後CO/
Ar(7/3)を、器内圧力にして0.05Torrとなる
様導入したのち、300Wの水銀ランプを用い波長
185nm又は254nmで紫外線処理を行なつた。蒸着
金属としてAlを用い、印加電圧200V、基板温度
80℃、るつぼ温度900℃の条件で行なつた。 接着性の評価は基盤目法で行なつたが、接着性
阻害物質の滲出影響を見る為、比較としてブリー
ド促進試験を行なつた試料についての測定も行な
う。結果を第2表に示す。 (※注)ブリード促進試験;70℃ギヤオープン中
に1週間放置する。
[Table] Example 2 The same sample used in Example 1 was set at a predetermined position in the apparatus shown in Figure 2, and after the chamber was evacuated, CO/
After introducing Ar (7/3) to an internal pressure of 0.05 Torr, the wavelength was measured using a 300W mercury lamp.
UV treatment was performed at 185 nm or 254 nm. Using Al as the vapor deposition metal, applied voltage 200V, substrate temperature
The test was carried out under conditions of 80°C and crucible temperature of 900°C. Adhesion was evaluated using the substrate method, but in order to see the influence of adhesion-inhibiting substances on leaching, we also conducted measurements on samples that had been subjected to a bleed acceleration test for comparison. The results are shown in Table 2. (*Note) Bleed acceleration test: Leave at 70℃ with gear open for one week.

【表】 実施例 3 実施例1及び2に示したAl蒸着PVCフイルム
で、グロー放電プラズマ処理及び真空紫外処理の
効果を調べる為、可塑剤溶出試験を行なう。試験
は次の手順で行なつた。先ず、Al蒸着PVCフイ
ルムのAlを、リン酸溶液で、フイルム面を傷つ
けないよう丁寧に拭き取り、溶出試験容器の底に
置く。これにヘキサン50mlを入れ、40℃にて5時
間振とうした後、ジノニルフタレートを標準とし
て、ヘキサン中に抽出されたDOPをガスクロマ
トグラフイーにて分析した。結果を第3表に示
す。
[Table] Example 3 A plasticizer elution test was conducted on the Al-deposited PVC films shown in Examples 1 and 2 to examine the effects of glow discharge plasma treatment and vacuum ultraviolet treatment. The test was conducted using the following procedure. First, carefully wipe off the Al on the Al-deposited PVC film with a phosphoric acid solution so as not to damage the film surface, and place it on the bottom of the elution test container. After adding 50 ml of hexane and shaking at 40°C for 5 hours, the DOP extracted into the hexane was analyzed by gas chromatography using dinonyl phthalate as a standard. The results are shown in Table 3.

【表】【table】

【表】【table】 【図面の簡単な説明】[Brief explanation of drawings]

第1図は本発明の方法を実施するのに有用なグ
ロー放電プラズマ処理装置の模式図、第2図は本
発明の方法を実施するのに有用な真空紫外処理装
置の模式図、第3図は本発明の方法で処理された
軟質PVC成形品の断面模式図である。 1…基板(陰極)、2…るつぼ(陽極)、3…加
熱ヒータ、4…ガス導入管、5…高周波コイル、
5′…水銀ランプ、8…蒸着用金属、9…直流電
源、14…蒸着金属層、15…架橋樹脂層、16
…樹脂層。
FIG. 1 is a schematic diagram of a glow discharge plasma processing apparatus useful for carrying out the method of the present invention, FIG. 2 is a schematic diagram of a vacuum ultraviolet processing apparatus useful for carrying out the method of the present invention, and FIG. 1 is a schematic cross-sectional view of a soft PVC molded product treated by the method of the present invention. 1... Substrate (cathode), 2... Crucible (anode), 3... Heater, 4... Gas introduction tube, 5... High frequency coil,
5'... Mercury lamp, 8... Metal for vapor deposition, 9... DC power supply, 14... Vapor deposited metal layer, 15... Crosslinked resin layer, 16
...Resin layer.

Claims (1)

【特許請求の範囲】 1 減圧下高温において発生した金属蒸気を合成
樹脂成形品表面上に蒸着して金属薄膜を成形する
方法において、前記成形品表面に、無機ガスの低
温プラズマおよび紫外光線の一方または両方を照
射しながら前記蒸着処理を施して、前記金属薄膜
の形成と同時に、前記合成樹脂成形品表層部の樹
脂を架橋させることを特徴とする、合成樹脂成形
品表面への金属薄膜形成方法。 2 無機ガスがCOである特許請求の範囲第1項
記載の方法。 3 無機ガスがCOとArの混合物である特許請求
の範囲第1項記載の方法。 4 紫外光線の波長領域が100〜250nmである特
許請求の範囲第1項記載の方法。 5 合成樹脂成形品が軟質塩ビニル成形品である
特許請求の範囲第1項記載の方法。 6 蒸着後の製品構造が最外層より蒸着金属層/
軟質PVC架橋層/軟質PVC層の3層構造よりな
る特許請求の範囲第5項記載の方法。
[Scope of Claims] 1. A method for forming a thin metal film by depositing metal vapor generated at high temperature under reduced pressure onto the surface of a synthetic resin molded product, wherein one of a low-temperature plasma of an inorganic gas and ultraviolet light is applied to the surface of the molded product. Alternatively, a method for forming a metal thin film on the surface of a synthetic resin molded product, characterized in that the vapor deposition treatment is performed while irradiating both, and at the same time as the formation of the metal thin film, the resin on the surface layer of the synthetic resin molded product is crosslinked. . 2. The method according to claim 1, wherein the inorganic gas is CO. 3. The method according to claim 1, wherein the inorganic gas is a mixture of CO and Ar. 4. The method according to claim 1, wherein the wavelength range of the ultraviolet light is 100 to 250 nm. 5. The method according to claim 1, wherein the synthetic resin molded product is a soft vinyl chloride molded product. 6 The product structure after vapor deposition starts from the outermost layer to the vapor deposited metal layer/
The method according to claim 5, comprising a three-layer structure of a soft PVC crosslinked layer/soft PVC layer.
JP9701083A 1983-06-02 1983-06-02 Formation of thin metallic film on surface of synthetic resin molding and product obtained thereby Granted JPS59223731A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP9701083A JPS59223731A (en) 1983-06-02 1983-06-02 Formation of thin metallic film on surface of synthetic resin molding and product obtained thereby

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP9701083A JPS59223731A (en) 1983-06-02 1983-06-02 Formation of thin metallic film on surface of synthetic resin molding and product obtained thereby

Publications (2)

Publication Number Publication Date
JPS59223731A JPS59223731A (en) 1984-12-15
JPH0359982B2 true JPH0359982B2 (en) 1991-09-12

Family

ID=14180335

Family Applications (1)

Application Number Title Priority Date Filing Date
JP9701083A Granted JPS59223731A (en) 1983-06-02 1983-06-02 Formation of thin metallic film on surface of synthetic resin molding and product obtained thereby

Country Status (1)

Country Link
JP (1) JPS59223731A (en)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2597352B2 (en) * 1985-06-20 1997-04-02 インターナショナル・ビジネス・マシーンズ・コーポレーション Method for improving adhesion between metal and organic substrate
JPH0655846B2 (en) * 1990-03-09 1994-07-27 工業技術院長 Etching method for polymer moldings
JP2000273226A (en) * 1999-03-24 2000-10-03 Matsushita Electric Works Ltd Formation of metal film on resin substrate surface
JP4000368B2 (en) * 2002-09-10 2007-10-31 独立行政法人産業技術総合研究所 Method for producing polymethyl methacrylate-metal cluster composite
EP1400345A1 (en) * 2002-09-23 2004-03-24 Götz Heine Process for preparation of a plastic product

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS49128976A (en) * 1973-04-11 1974-12-10

Also Published As

Publication number Publication date
JPS59223731A (en) 1984-12-15

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