JPH0360353B2 - - Google Patents
Info
- Publication number
- JPH0360353B2 JPH0360353B2 JP14901483A JP14901483A JPH0360353B2 JP H0360353 B2 JPH0360353 B2 JP H0360353B2 JP 14901483 A JP14901483 A JP 14901483A JP 14901483 A JP14901483 A JP 14901483A JP H0360353 B2 JPH0360353 B2 JP H0360353B2
- Authority
- JP
- Japan
- Prior art keywords
- titanium
- organic
- thin film
- forming
- oxide thin
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 239000010409 thin film Substances 0.000 claims description 64
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 claims description 47
- OGIDPMRJRNCKJF-UHFFFAOYSA-N titanium oxide Inorganic materials [Ti]=O OGIDPMRJRNCKJF-UHFFFAOYSA-N 0.000 claims description 46
- 150000003609 titanium compounds Chemical class 0.000 claims description 38
- 239000010936 titanium Substances 0.000 claims description 34
- 239000000203 mixture Substances 0.000 claims description 29
- 229910052719 titanium Inorganic materials 0.000 claims description 26
- 229920000642 polymer Polymers 0.000 claims description 24
- -1 titanium alkoxides Chemical class 0.000 claims description 21
- 229940126062 Compound A Drugs 0.000 claims description 17
- NLDMNSXOCDLTTB-UHFFFAOYSA-N Heterophylliin A Natural products O1C2COC(=O)C3=CC(O)=C(O)C(O)=C3C3=C(O)C(O)=C(O)C=C3C(=O)OC2C(OC(=O)C=2C=C(O)C(O)=C(O)C=2)C(O)C1OC(=O)C1=CC(O)=C(O)C(O)=C1 NLDMNSXOCDLTTB-UHFFFAOYSA-N 0.000 claims description 17
- 229910010413 TiO 2 Inorganic materials 0.000 claims description 11
- 239000003960 organic solvent Substances 0.000 claims description 11
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 claims description 9
- 150000002894 organic compounds Chemical class 0.000 claims description 8
- 239000013522 chelant Substances 0.000 claims description 7
- 125000004432 carbon atom Chemical group C* 0.000 claims description 6
- 150000001735 carboxylic acids Chemical class 0.000 claims description 5
- 150000002430 hydrocarbons Chemical group 0.000 claims description 5
- 125000003545 alkoxy group Chemical group 0.000 claims description 4
- 125000005907 alkyl ester group Chemical group 0.000 claims description 4
- 150000001414 amino alcohols Chemical class 0.000 claims description 2
- 229940058905 antimony compound for treatment of leishmaniasis and trypanosomiasis Drugs 0.000 claims description 2
- 150000001463 antimony compounds Chemical class 0.000 claims description 2
- 150000001495 arsenic compounds Chemical class 0.000 claims description 2
- 150000004718 beta keto acids Chemical class 0.000 claims description 2
- 150000001639 boron compounds Chemical class 0.000 claims description 2
- 239000003795 chemical substances by application Substances 0.000 claims description 2
- 150000002009 diols Chemical class 0.000 claims description 2
- 238000007496 glass forming Methods 0.000 claims description 2
- 229940093920 gynecological arsenic compound Drugs 0.000 claims description 2
- 150000004715 keto acids Chemical class 0.000 claims description 2
- 125000001424 substituent group Chemical group 0.000 claims description 2
- 150000004716 alpha keto acids Chemical class 0.000 claims 1
- 150000003018 phosphorus compounds Chemical class 0.000 claims 1
- 239000010408 film Substances 0.000 description 37
- 238000000576 coating method Methods 0.000 description 25
- 239000011248 coating agent Substances 0.000 description 19
- YRKCREAYFQTBPV-UHFFFAOYSA-N acetylacetone Chemical compound CC(=O)CC(C)=O YRKCREAYFQTBPV-UHFFFAOYSA-N 0.000 description 14
- 238000000034 method Methods 0.000 description 14
- 230000003287 optical effect Effects 0.000 description 14
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 12
- 239000007788 liquid Substances 0.000 description 12
- 239000000758 substrate Substances 0.000 description 11
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 10
- 229910052814 silicon oxide Inorganic materials 0.000 description 10
- 239000002738 chelating agent Substances 0.000 description 9
- 239000011229 interlayer Substances 0.000 description 7
- 229910044991 metal oxide Inorganic materials 0.000 description 7
- 150000004706 metal oxides Chemical class 0.000 description 7
- 229910004298 SiO 2 Inorganic materials 0.000 description 6
- 150000001732 carboxylic acid derivatives Chemical group 0.000 description 6
- 239000000463 material Substances 0.000 description 6
- 239000010410 layer Substances 0.000 description 5
- QTBSBXVTEAMEQO-UHFFFAOYSA-N Acetic acid Chemical compound CC(O)=O QTBSBXVTEAMEQO-UHFFFAOYSA-N 0.000 description 4
- 150000001875 compounds Chemical class 0.000 description 4
- JVTAAEKCZFNVCJ-UHFFFAOYSA-N lactic acid Chemical compound CC(O)C(O)=O JVTAAEKCZFNVCJ-UHFFFAOYSA-N 0.000 description 4
- 238000004519 manufacturing process Methods 0.000 description 4
- 238000006116 polymerization reaction Methods 0.000 description 4
- 239000002904 solvent Substances 0.000 description 4
- VXUYXOFXAQZZMF-UHFFFAOYSA-N titanium(IV) isopropoxide Chemical compound CC(C)O[Ti](OC(C)C)(OC(C)C)OC(C)C VXUYXOFXAQZZMF-UHFFFAOYSA-N 0.000 description 4
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 4
- 230000015572 biosynthetic process Effects 0.000 description 3
- 125000000484 butyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 3
- 125000001449 isopropyl group Chemical group [H]C([H])([H])C([H])(*)C([H])([H])[H] 0.000 description 3
- 229910052751 metal Inorganic materials 0.000 description 3
- 239000002184 metal Substances 0.000 description 3
- 238000003786 synthesis reaction Methods 0.000 description 3
- AEMRFAOFKBGASW-UHFFFAOYSA-N Glycolic acid Chemical compound OCC(O)=O AEMRFAOFKBGASW-UHFFFAOYSA-N 0.000 description 2
- WRQNANDWMGAFTP-UHFFFAOYSA-N Methylacetoacetic acid Chemical compound COC(=O)CC(C)=O WRQNANDWMGAFTP-UHFFFAOYSA-N 0.000 description 2
- GSEJCLTVZPLZKY-UHFFFAOYSA-N Triethanolamine Chemical compound OCCN(CCO)CCO GSEJCLTVZPLZKY-UHFFFAOYSA-N 0.000 description 2
- 150000001298 alcohols Chemical class 0.000 description 2
- 150000004703 alkoxides Chemical class 0.000 description 2
- FPCJKVGGYOAWIZ-UHFFFAOYSA-N butan-1-ol;titanium Chemical compound [Ti].CCCCO.CCCCO.CCCCO.CCCCO FPCJKVGGYOAWIZ-UHFFFAOYSA-N 0.000 description 2
- 239000000919 ceramic Substances 0.000 description 2
- 238000006243 chemical reaction Methods 0.000 description 2
- XBDQKXXYIPTUBI-UHFFFAOYSA-N dimethylselenoniopropionate Natural products CCC(O)=O XBDQKXXYIPTUBI-UHFFFAOYSA-N 0.000 description 2
- 238000007598 dipping method Methods 0.000 description 2
- XYIBRDXRRQCHLP-UHFFFAOYSA-N ethyl acetoacetate Chemical compound CCOC(=O)CC(C)=O XYIBRDXRRQCHLP-UHFFFAOYSA-N 0.000 description 2
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 2
- 239000011521 glass Substances 0.000 description 2
- 238000010438 heat treatment Methods 0.000 description 2
- 125000001183 hydrocarbyl group Chemical group 0.000 description 2
- 239000004310 lactic acid Substances 0.000 description 2
- 235000014655 lactic acid Nutrition 0.000 description 2
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 2
- 230000000379 polymerizing effect Effects 0.000 description 2
- 125000001436 propyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])[H] 0.000 description 2
- 239000005361 soda-lime glass Substances 0.000 description 2
- 239000007921 spray Substances 0.000 description 2
- 238000003756 stirring Methods 0.000 description 2
- OVSGBKZKXUMMHS-VGKOASNMSA-L (z)-4-oxopent-2-en-2-olate;propan-2-olate;titanium(4+) Chemical compound [Ti+4].CC(C)[O-].CC(C)[O-].C\C([O-])=C\C(C)=O.C\C([O-])=C\C(C)=O OVSGBKZKXUMMHS-VGKOASNMSA-L 0.000 description 1
- CVBUKMMMRLOKQR-UHFFFAOYSA-N 1-phenylbutane-1,3-dione Chemical compound CC(=O)CC(=O)C1=CC=CC=C1 CVBUKMMMRLOKQR-UHFFFAOYSA-N 0.000 description 1
- RWLALWYNXFYRGW-UHFFFAOYSA-N 2-Ethyl-1,3-hexanediol Chemical compound CCCC(O)C(CC)CO RWLALWYNXFYRGW-UHFFFAOYSA-N 0.000 description 1
- SDVJLFHTPKRNAH-UHFFFAOYSA-N 2-ethyl-3-ketopentanoic acid Chemical compound CCC(C(O)=O)C(=O)CC SDVJLFHTPKRNAH-UHFFFAOYSA-N 0.000 description 1
- SRLPPRVVQNACSW-UHFFFAOYSA-L 2-hydroxypropanoate;titanium(2+) Chemical compound [Ti+2].CC(O)C([O-])=O.CC(O)C([O-])=O SRLPPRVVQNACSW-UHFFFAOYSA-L 0.000 description 1
- WDJHALXBUFZDSR-UHFFFAOYSA-N Acetoacetic acid Natural products CC(=O)CC(O)=O WDJHALXBUFZDSR-UHFFFAOYSA-N 0.000 description 1
- FERIUCNNQQJTOY-UHFFFAOYSA-N Butyric acid Chemical group CCCC(O)=O FERIUCNNQQJTOY-UHFFFAOYSA-N 0.000 description 1
- KPWIZLJDXFLIAL-UHFFFAOYSA-L CC(C)O[Ti++]OC(C)C.CC(C)CCCCCCCCCCCCCCC([O-])=O.CC(C)CCCCCCCCCCCCCCC([O-])=O Chemical compound CC(C)O[Ti++]OC(C)C.CC(C)CCCCCCCCCCCCCCC([O-])=O.CC(C)CCCCCCCCCCCCCCC([O-])=O KPWIZLJDXFLIAL-UHFFFAOYSA-L 0.000 description 1
- TVTASDGODSYCJX-UHFFFAOYSA-N CCCCO[Ti](OC)(OC)OCCCC Chemical compound CCCCO[Ti](OC)(OC)OCCCC TVTASDGODSYCJX-UHFFFAOYSA-N 0.000 description 1
- MCALDHMLXICSKJ-UHFFFAOYSA-N CCO[Ti](OCC)(OC(C)C)OC(C)C Chemical compound CCO[Ti](OCC)(OC(C)C)OC(C)C MCALDHMLXICSKJ-UHFFFAOYSA-N 0.000 description 1
- 239000004215 Carbon black (E152) Substances 0.000 description 1
- OAICVXFJPJFONN-UHFFFAOYSA-N Phosphorus Chemical compound [P] OAICVXFJPJFONN-UHFFFAOYSA-N 0.000 description 1
- 235000021355 Stearic acid Nutrition 0.000 description 1
- BOTDANWDWHJENH-UHFFFAOYSA-N Tetraethyl orthosilicate Chemical compound CCO[Si](OCC)(OCC)OCC BOTDANWDWHJENH-UHFFFAOYSA-N 0.000 description 1
- 238000005299 abrasion Methods 0.000 description 1
- 125000005595 acetylacetonate group Chemical group 0.000 description 1
- 230000003667 anti-reflective effect Effects 0.000 description 1
- 238000009835 boiling Methods 0.000 description 1
- 238000005229 chemical vapour deposition Methods 0.000 description 1
- UFMZWBIQTDUYBN-UHFFFAOYSA-N cobalt dinitrate Chemical compound [Co+2].[O-][N+]([O-])=O.[O-][N+]([O-])=O UFMZWBIQTDUYBN-UHFFFAOYSA-N 0.000 description 1
- 229910001981 cobalt nitrate Inorganic materials 0.000 description 1
- 238000005260 corrosion Methods 0.000 description 1
- 230000007797 corrosion Effects 0.000 description 1
- WOWBFOBYOAGEEA-UHFFFAOYSA-N diafenthiuron Chemical compound CC(C)C1=C(NC(=S)NC(C)(C)C)C(C(C)C)=CC(OC=2C=CC=CC=2)=C1 WOWBFOBYOAGEEA-UHFFFAOYSA-N 0.000 description 1
- QEHKWLKYFXJVLL-UHFFFAOYSA-N dichloro(dimethoxy)silane Chemical compound CO[Si](Cl)(Cl)OC QEHKWLKYFXJVLL-UHFFFAOYSA-N 0.000 description 1
- YQXMTBNPTAUIMR-UHFFFAOYSA-N diethyl dipropan-2-yl silicate Chemical compound CCO[Si](OCC)(OC(C)C)OC(C)C YQXMTBNPTAUIMR-UHFFFAOYSA-N 0.000 description 1
- IJKVHSBPTUYDLN-UHFFFAOYSA-N dihydroxy(oxo)silane Chemical compound O[Si](O)=O IJKVHSBPTUYDLN-UHFFFAOYSA-N 0.000 description 1
- XGZNHFPFJRZBBT-UHFFFAOYSA-N ethanol;titanium Chemical compound [Ti].CCO.CCO.CCO.CCO XGZNHFPFJRZBBT-UHFFFAOYSA-N 0.000 description 1
- 235000019439 ethyl acetate Nutrition 0.000 description 1
- 229960005082 etohexadiol Drugs 0.000 description 1
- 150000004820 halides Chemical class 0.000 description 1
- 229930195733 hydrocarbon Natural products 0.000 description 1
- 238000007654 immersion Methods 0.000 description 1
- 150000002484 inorganic compounds Chemical class 0.000 description 1
- 238000010030 laminating Methods 0.000 description 1
- 238000003475 lamination Methods 0.000 description 1
- 150000002611 lead compounds Chemical class 0.000 description 1
- 150000002739 metals Chemical class 0.000 description 1
- ZEIWWVGGEOHESL-UHFFFAOYSA-N methanol;titanium Chemical compound [Ti].OC.OC.OC.OC ZEIWWVGGEOHESL-UHFFFAOYSA-N 0.000 description 1
- 239000012046 mixed solvent Substances 0.000 description 1
- 239000000178 monomer Substances 0.000 description 1
- KBJMLQFLOWQJNF-UHFFFAOYSA-N nickel(ii) nitrate Chemical compound [Ni+2].[O-][N+]([O-])=O.[O-][N+]([O-])=O KBJMLQFLOWQJNF-UHFFFAOYSA-N 0.000 description 1
- QIQXTHQIDYTFRH-UHFFFAOYSA-N octadecanoic acid Chemical compound CCCCCCCCCCCCCCCCCC(O)=O QIQXTHQIDYTFRH-UHFFFAOYSA-N 0.000 description 1
- OQCDKBAXFALNLD-UHFFFAOYSA-N octadecanoic acid Natural products CCCCCCCC(C)CCCCCCCCC(O)=O OQCDKBAXFALNLD-UHFFFAOYSA-N 0.000 description 1
- 150000002903 organophosphorus compounds Chemical class 0.000 description 1
- 150000003961 organosilicon compounds Chemical class 0.000 description 1
- 229910052698 phosphorus Inorganic materials 0.000 description 1
- 239000011574 phosphorus Substances 0.000 description 1
- 230000000704 physical effect Effects 0.000 description 1
- 150000003112 potassium compounds Chemical class 0.000 description 1
- 238000002360 preparation method Methods 0.000 description 1
- 235000019260 propionic acid Nutrition 0.000 description 1
- IUVKMZGDUIUOCP-BTNSXGMBSA-N quinbolone Chemical compound O([C@H]1CC[C@H]2[C@H]3[C@@H]([C@]4(C=CC(=O)C=C4CC3)C)CC[C@@]21C)C1=CCCC1 IUVKMZGDUIUOCP-BTNSXGMBSA-N 0.000 description 1
- 239000010865 sewage Substances 0.000 description 1
- 150000003377 silicon compounds Chemical class 0.000 description 1
- 239000002356 single layer Substances 0.000 description 1
- 238000005507 spraying Methods 0.000 description 1
- 238000004544 sputter deposition Methods 0.000 description 1
- 239000008117 stearic acid Substances 0.000 description 1
- UQMOLLPKNHFRAC-UHFFFAOYSA-N tetrabutyl silicate Chemical compound CCCCO[Si](OCCCC)(OCCCC)OCCCC UQMOLLPKNHFRAC-UHFFFAOYSA-N 0.000 description 1
- LFQCEHFDDXELDD-UHFFFAOYSA-N tetramethyl orthosilicate Chemical compound CO[Si](OC)(OC)OC LFQCEHFDDXELDD-UHFFFAOYSA-N 0.000 description 1
- ZUEKXCXHTXJYAR-UHFFFAOYSA-N tetrapropan-2-yl silicate Chemical compound CC(C)O[Si](OC(C)C)(OC(C)C)OC(C)C ZUEKXCXHTXJYAR-UHFFFAOYSA-N 0.000 description 1
- 238000005979 thermal decomposition reaction Methods 0.000 description 1
- 150000003606 tin compounds Chemical class 0.000 description 1
- XJDNKRIXUMDJCW-UHFFFAOYSA-J titanium tetrachloride Chemical compound Cl[Ti](Cl)(Cl)Cl XJDNKRIXUMDJCW-UHFFFAOYSA-J 0.000 description 1
- 238000001771 vacuum deposition Methods 0.000 description 1
- 150000003752 zinc compounds Chemical class 0.000 description 1
Landscapes
- Optical Filters (AREA)
- Paints Or Removers (AREA)
Description
本発明は、酸化チタン薄膜形成用組成物に係
り、さらに詳しくは、酸化チタン薄膜と、酸化チ
タン以外の透明な金属酸化物薄膜とを多層に形成
せしめた光干渉膜の製造に用いる酸化チタン薄膜
形成用組成物および該組成物を用いる光干渉膜の
製造方法に関する。
ガラス、金属、セラミツクス等の耐熱性基板上
に形成せしめた酸化チタン薄膜は、高い透明性お
よび屈折率を有し、かつ、耐蝕性、耐摩耗性、装
飾性等に優れているため、広範な分野に利用され
ている。特に酸化チタン薄膜と、酸化ケイ素等の
低屈折率の薄膜とを交互に積層せしめた多層膜は
光干渉性を示し、その積層の態様により、光反射
膜あるいは光反射防止膜として鏡、太陽熱集熱
鏡、光学フイルター、コールドミラー、太陽電池
等に利用されている。これらの光干渉膜には、透
明度が高く、均質でかつ均一な膜厚を有し、さら
に層間密着性の良いことが要求される。たとえば
下記式(1)で表わされる膜圧の透明な薄膜を基板上
に形成せしめることにより、光反射膜を得ること
ができる。
Q=入/4n ……(1)
(ここに、Q=膜厚、n:薄膜の屈折率。入:反
射の中心となる光の波長を表す。)
基板上への酸化チタン薄膜の形成方法として、
金属チタンもしくは酸化チタン、四塩化チタン等
のチタン化合物を用いる真空蒸着法、スパツタリ
ング法、CVD法等および溶剤溶解性の有機チタ
ン化合物を含有する溶液を、スプレー法、スピン
ナー法、浸漬引上げ法、はけ塗法、印刷法等によ
り基板上に塗布した後、加熱燃成する塗布法があ
り、安価に大量に処理する方法として塗布法が採
用される。塗布法に用いる塗布液として、通常、
一般式Ti(OR)4(ここに、Rは1価の炭化水素基
を表す。)で表わされるチタンアルコキシド類、
たとえばテトライソプロポキシチタン、テトラブ
トキシチタン等の有機溶媒溶液が用いられるが、
チタンアルコキシド類は、加水分解性が大きいた
め大気中の水分を吸収して容易に加水分解し、塗
布液が白濁化、高粘度化する等、きわめて安定性
に乏しく、取扱いが困難である。
これらの欠点を改良するものとして、特開昭57
−200471号公報にはアセチルアセトン、アセト酢
酸メチル等のキレート化剤、アルコール類、酢酸
エステル類等を溶剤として用い、チタンアルコキ
シド類を安定化させた塗布液が提案されている。
しかしながら、該方法においては、塗布液の耐湿
安定性は向上するものの、酸化チタン薄膜の成膜
性が悪く、また得られる酸化チタン薄膜の屈折率
も小さい。特開昭49−122520号公報には、チタン
アルコキシド類に水を加えて重合させたチタンア
ルコキド・ポリマーを含有する有機溶剤溶液を塗
布液とする提案がなされている。該発明の塗布液
は酸化チタン薄膜の成膜性には優れるが、湿度の
影響による白濁化は改良されていない。特開昭54
−43241号公報にはチアンアルコキシド類に水を
加えて重合させ、さらにアセチルアセトン等のキ
レート化剤を用いて安定化した塗布液が提案され
ている。該塗布液は対湿安定性に優れ、また、該
塗布液を用い酸化チタン薄膜の単層を形成せしめ
る場合の成膜性は優れている。しかしながら、光
干渉膜を得るために、異種の金属酸化物薄膜、た
とえば酸化ケイ素薄膜との多層膜を得る場合に、
酸化チタン薄膜と、異種金属酸化物薄膜との層間
密着性が悪い欠点を有している。
本発明は、塗布法により光干渉膜を製造するに
適した、すなわち、安定な、かつ成膜性に優れ
た、特に異種金属酸化物薄膜との層間密着性の良
好な、さらに高屈折率の酸化チタン薄膜の得られ
る酸化チタン薄膜形成用組成物を提供することを
目的とし、該組成物を用いる光干渉膜の製造方法
を提供することを別の目的とする。
本発明者等は、前記目的を達成すべく鋭意研究
を重ねた結果、イタンアルコキシド類のモノマー
と、それを重合したポリモマーとの各々をキレー
ト化剤で安定化した化合物を混合した組成物を含
有する有機溶剤溶液を塗布液として用いることに
より、膜厚の均一な、かつ、高屈折率の酸化チタ
ン薄膜が得られ、かつ、酸化ケイ素薄膜との多層
膜とした場合の層間密着性にも優れることを見い
だし、本発明を完成した。
本発明は、一般式:
Ti(OR)4 ……〔〕
(ここに、Rは炭素数1〜18の1価の炭化水素基
を表す。)
で表わされるチタンアルコキシド類のアルコキシ
基の一部または全部を、
一般式:
HOCOR′ ……〔〕
で表わされるカルボン酸類のカルボン酸残基:−
OCOR′
(ここに、R′は炭素数1〜18の1価の炭化水素
基を表す。)
および
一般式:
HX ……〔〕
で表わされるチタンとキレート環を形成し得る有
機化合物類の残基:−Xの群から選ばれた1種ま
たは2種以上で置換した有機チタン化合物A:5
ないし50重量部と、
一般式〔〕で表わされる同種または異種のチ
タンアルコキシド類を加水重合して得られるチタ
ンアルコキシド・ポリマーの置換基:−ORの一
部または全部を、一般式〔〕で表わされるカル
ボン酸の残基:−OCOR′および一般式〔〕で
表わされるチタンとキレート環を形成し得る有機
化合物類の残基:−Xの群から選ばれる1種また
は2種以上で置換した有機チタン化合物B:95な
いし50重量部とからなる混合物を含有する有機溶
剤溶液からなることを特徴とする酸化チタン薄膜
形成用組成物である。
本発明において、有機チタン化合物Aは、一般
式〔〕Ti(OR)4で表わされるチタンアルコキ
シド類たとえば、テトラメトキシチタン、テトラ
エトキシチタン、テトライソプロポキシチタン、
テトラブトキシチタン、ジエトキシジイソプロポ
キシチタン、ジメトキシジブトキシチタン等のア
ルコキシ基の一部または全部を、一般式〔〕
HOCOR′で表わされるカルボン酸類たとえば酢
酸、プロピオン酸、酪酸等のカルボン酸の残基:
−OCOR′および/または、一般式〔〕HXで表
わされるチタンとキレート環を形成し得る有機化
合物類たとえばアセチルアケトン、ベンゾイルア
セトン等のβ−ジケトン類、アセト酢酸、プロピ
オニル酪酸等のα−、または、β−ケト酸類、ケ
ト酸類のメチル、エチル、プロピル、プチル等の
低級アキルエステル類、グリコール酸、乳酸等の
オキシ酸類、オキシ酸のメチル、エチル、プロピ
ル、ブチル等の低級アルキルエステル類、ジオー
ル類、アミノアルコール類などの、キレート化剤
の残基:−Xで置換した化合物類たとえば、ジイ
ソプロポキシチタンジイソステアレート、ジイソ
ブトキシ・ビス(ラクタート)チタン、ジイソプ
ロポキシ・ビス(アセセチルアセトナト)チタ
ン、ジブトキシ・ビス(アセチルアセトナト)チ
タン等である。チタンアルコキシド類のアルコキ
シ基の一部または全部をカルボン酸残基および/
またはキレート化剤残基で置換した有機チタン化
合物Aは、チタンアルコキシドと、カルボン酸お
よび/またはキレート化剤とを、有機溶剤の存在
下または非存在下に反応させることにより容易に
製造することができる。
一方、有機チタン化合物ポリマーBは、一般式
〔〕で表わされる同種または異種のチタンアル
コキシド類に、目的とする化学量論量の水を反応
させることにより得られる重合度nが2〜50のチ
タンアルコキシドポリマーに、一般式〔〕で表
わされるカルボン酸および/または一般式〔〕
で表わされるチタンとキレート環を形成し得るキ
レート化剤を反応させることにより得られる。有
機チタン化合物ポリマーBとして、重合度nが2
〜50好ましくは2〜20のものが用いられる。
本発明において、酸化チタン薄膜形成用組成物
は、前記した有機化合物A:5〜50重量部と有機
チタン化合物ポリマーB:95〜50重量部とからな
る混合物を、酸化チタン:TiO2に換算して20重
量%以下、好ましくは1〜10重量%を含有する有
機溶剤溶液である。また、該溶液にガラス質形成
剤たとえば、無機または有機のリン化合物類、ホ
ウ素化合物類、ヒ素化合物類、アンチモン化合物
類、スズ化合物類、亜鉛化合物類、鉛化合物類、
カリウム化合物類、硝酸ニツケル、硝酸コバルト
等の1種または2種以上を添加したものも含まれ
る。有機溶剤としては、使用する有機チタン化合
物Aおよび有機チタン化合物ポリマーBの双方を
溶解し得るものであれば、いずれをも使用するこ
とができるが、溶剤の揮発性、溶液の安定性、経
済性等から、沸点180℃以下の低級アルコール類、
エステル類、ケトン類、脂肪族炭化水素類、芳香
族炭化水素類およびこれらのハロゲン化物の単独
または2種以上の混合溶剤が好ましく使用され
る。
本発明において、有機チタン化合物Aと有機チ
タン化合物Bとの混合物を含有する有機溶剤溶液
を塗布液とし、ガラス、金属、セラミツクス等の
耐熱性基材に、一様な厚さに塗布し、300℃以上
の温度に1秒間〜3時間保持し、加熱分解処理す
ることにより、透明で均一な膜圧の均質な酸化チ
タン薄膜を当該耐熱性基材表面に形成することが
できる。塗布液の耐熱性基材への塗布法は、浸漬
引上げ法、スプレー法、スピンナー法、印刷法、
はけ刷り法等公知のいずれの方法をも採用できる
が、均一な膜厚の酸化チタン薄膜を形成せしめる
場合には、浸漬引上げ法が好ましい。また、300
℃以上の温度に加熱した耐熱形基材に塗布液をス
プレーして熱分解することによつても酸化チタン
薄膜を形成させることができる。
本発明において、酸化チタン薄膜と酸化チタン
以外の低屈折率の金属酸化物たとえば酸化ケイ素
の薄膜とを交互にそれぞれ所定の厚さに形成せし
め、多層膜とすることにより、光干渉膜が得られ
る。酸化ケイ素薄膜は、有機ケイ素化合物、たと
えば、テトラメトキシシラン、テトラエトキシシ
ラン、テトライソプロポキシシラン、テトラブト
キシシラン、ジエトキシジイソプロポキシシラ
ン、ジクロルジメトキシシラン等のアルコキシシ
ランおよびその誘導体を含有する有機溶剤溶液を
塗布液として、塗布法により耐熱性基材または、
酸化チタン薄膜を形成せしめた耐熱性基材に塗布
し、加熱焼成することにより形成することができ
る。たとえば、ガラス基材上にTiO2/SiO2/
TiO2三層膜、TiO2/SiO2/TiO2/SiO2/TiO2
五層膜を形成せしめることにより、光反射膜が得
られる。
本発明の酸化チタン薄膜形成用組成物は、有機
チタン化合物Aと、有機チタン化合物ポリマーB
との混合物を主成分とすることにより、下記の特
徴を有する。
(1) 安定性、特に耐湿安定性に優れる。
(2) 成膜性、特に異種金属酸化物薄膜との層間密
着性が優れている。
(3) 高屈折率の酸化チタン薄膜の得られる。
本発明において、有機チタン化合物Aの基材へ
の密着性と、有機チタン化合物ポリマーBの成膜
性とが、相乗的に作用し、高屈折率のかつ層間密
着性の優れた光干渉膜が得られるものと推察され
る。
本発明は、安定性の高い、かつ成膜性、特に異
種金属酸化物薄膜との層間密着性の優れた、か
つ、均質な高屈折率の酸化チタン薄膜の得られる
光干渉膜の製造に用いるに適した酸化チタン薄膜
形成組成物を提供するものであり、その産業的意
義は極めて大きい。
以下に、本発明を実施例によりさらに詳細に説
明する。ただし、本発明の範囲は、下記実施例に
より何等限定されるものではない。
実施例 1
有機チタン化合物Aの合成:
テトライソプロポキシチタン・Ti(OiPr)4:
42.6gをエタノール:234gに溶解しアセチルア
セトン:30gを加えて反応させ、Ti(OiPr)4の−
OiPr基の一部をアセチルアセトン残基で置換し
た有機チタン化合物A4.6gを含有するエタノー
ル溶液を調整した。(iPrはイソプロピル基を表
す。)
有機チタン化合物ポリマーBの合成:
テトライソプロポキシチタン・Ti(OiPr)4:
56.8gをエタノール:350gに溶解し、撹拌下水
3.2gを徐々に添加し重合させた。ついでこの溶
液を撹拌しながらアセチルアセトン:40gを添加
し、−OiPr基の一部がアセチルアセトン残基で置
換された重合度:n=10の有機チタン化合物ポリ
マーB:60.8gを含有するエタノール溶液を調整
した。
酸化チタン薄膜形成用組成物(塗布液)の調
製:
上記調整した有機チタン化合物Aのエタノール
溶液:30gと、有機チタン化合物ポリマーBのエ
タノール溶液:400gとを混合し、ガラス質形成
材として五酸化リン・P2O5:0.4gを添加し、
TiO2に換算した有機チタン化合物Aと有機チタ
ン化合物ポリマーBとの混合物濃度が3.6g重量
%の酸化チタン薄膜形成用組成物を調製した。
光干渉(反射)膜の製造:
上記調整した酸化チタン薄膜形成用組成物を塗
布液とし、この中に基材として良く洗浄した60mm
×120mm×1mmのソーダライムガラスを浸漬して
引上げた後、500℃の温度に加熱した電気炉中で
30分間加熱焼成し、当該基板上に酸化チタン薄膜
を形成せしめた。
形成された酸化チタン薄膜は膜厚が610Åの均
一な膜厚の透明な薄膜であり、540nmの波長の
屈折率は2.2であつた。ついで、SiO2に換算した
濃度が5.0重量%の有機ケイ素化合物を含有する
有機溶剤溶液(アトロン R NSi−500、主成
分シリケートポリマー、主溶剤酢酸エステル日本
曹達(株)製)に、上記酸化チタン薄膜を形成せしめ
た基板浸漬して引上げ、500℃の温度に加熱した
電気炉中で30分間加熱焼成し、上記形成せしめた
酸化チタン薄膜上に、酸化ケイ素薄膜を形成せし
めた。形成せしめた酸化ケイ素薄膜は、膜厚が
900Åの一様な透明な薄膜であつた。
さらに、上記酸化ケイ素薄膜を形成せしめた上
に、前記と同様にして酸化チタン薄膜、酸化ケイ
素薄膜、さらに酸化チタン薄膜を形成せしめ、
TiO2/SiO2/TiO2/SiO2/TiO2の五層膜を得
た。得られた5層膜の合計膜厚は3630Åであり、
540nmの波長の光の発射率は91%であつた。
実施例 2〜14
実施例1において、チタンアルコキシオ、なら
びにカルボン酸および/またはキレート化剤の種
類および反応モル比を変え、またチアンアルコキ
シド・ポリマー合成時の水量を変えて、有機チタ
ン化合物Aと、有機チタン化合物ポリマーBとを
種々の比率で含有する酸化チタン薄膜形成用組成
物を調整した。調整した酸化チタン薄膜形成用組
成物を実施例1と同様のソーダライムガラス基板
に塗布し、以下実施例1と同様に処理し、酸化チ
タン薄膜を形成せしめ屈折率を測定した。さらに
実施例1と同様に処理し、酸化ケイ素薄膜と酸化
チタン薄膜とを積層し光干渉膜を製造した。使用
したチタンアルコキシド、カルボン酸、キレート
化剤の種類およびそれらの反応モル比、有機チタ
ン化合物Bの重合度、有機チタン化合物Aと有機
チタン化合物ポリマーBの量比(重量部)、有機
溶剤の種類、TiO2に換算した有機チタン化合物
Aと有機チタン化合物ポリマーBの混合物濃度を
第1表中に示す。
この酸化チタン薄膜成形用組成物を用いて製造
した酸化チタン薄膜および光干渉膜の薄膜物性を
第1表中に示す。
また、比較として、有機チタン化合物Aのみを
含有する塗布液を使用した場合および、有機チタ
ン化合物ポリマーBのみを含有する塗布液を使用
した場合の薄膜物性を実施例と共に第1表中に示
す。
第1表中において
iPr; イソプロピル基
nBu; ノルマルブチル基
AA; アセチルアセトン
MAA; アセト酢酸メチル
EAA;アセト酢酸エチル
LA; 乳酸
iSt; ステアリン酸
OG; オクチレングリコール
TEA;トリエタノールアミン
の略号を用いる。
第1表中の、成膜性の表示は下記を意味する。
◎ 均一な多層膜が得られた。
○ 多層膜が得られたが、わずかにむらが認め
られる。
× 3層目で剥離を生じ、多層膜が得られなか
つた。
The present invention relates to a composition for forming a titanium oxide thin film, and more specifically, a titanium oxide thin film used for manufacturing an optical interference film in which a titanium oxide thin film and a transparent metal oxide thin film other than titanium oxide are formed in multiple layers. The present invention relates to a forming composition and a method for producing an optical interference film using the composition. Titanium oxide thin films formed on heat-resistant substrates such as glass, metals, and ceramics have high transparency and refractive index, as well as excellent corrosion resistance, abrasion resistance, and decorative properties, so they are widely used. used in the field. In particular, multilayer films made by alternately laminating titanium oxide thin films and low refractive index thin films such as silicon oxide exhibit optical interference, and depending on the lamination mode, they can be used as mirrors or solar heat collectors as light reflective or antireflective films. Used in thermal mirrors, optical filters, cold mirrors, solar cells, etc. These optical interference films are required to have high transparency, uniform thickness, and good interlayer adhesion. For example, a light reflecting film can be obtained by forming a transparent thin film having a film thickness expressed by the following formula (1) on a substrate. Q=On/4n...(1) (Here, Q=film thickness, n: refractive index of the thin film. On: represents the wavelength of light that is the center of reflection.) Method for forming a titanium oxide thin film on a substrate As,
Vacuum deposition methods, sputtering methods, CVD methods, etc. using titanium metal or titanium compounds such as titanium oxide, titanium tetrachloride, etc., and solutions containing solvent-soluble organic titanium compounds can be applied by spray methods, spinner methods, immersion pulling methods, etc. There is a coating method in which the material is applied onto a substrate by a brush coating method, a printing method, etc., and then heated and burned, and the coating method is adopted as a method for processing a large amount at low cost. The coating liquid used in the coating method is usually
Titanium alkoxides represented by the general formula Ti(OR) 4 (herein, R represents a monovalent hydrocarbon group),
For example, organic solvent solutions such as tetraisopropoxytitanium and tetrabutoxytitanium are used.
Titanium alkoxides are highly hydrolyzable, so they absorb moisture in the air and are easily hydrolyzed, making the coating solution cloudy and highly viscous, resulting in extremely poor stability and difficulty in handling. To improve these shortcomings, Japanese Patent Application Laid-Open No. 1983
Publication No. 200471 proposes a coating liquid in which titanium alkoxides are stabilized using chelating agents such as acetylacetone and methyl acetoacetate, alcohols, acetic esters, and the like as solvents.
However, in this method, although the moisture resistance stability of the coating solution is improved, the film forming properties of the titanium oxide thin film are poor, and the refractive index of the obtained titanium oxide thin film is also low. JP-A-49-122520 proposes that the coating liquid be an organic solvent solution containing a titanium alkoxide polymer obtained by adding water to titanium alkoxides and polymerizing them. Although the coating liquid of the invention is excellent in forming a titanium oxide thin film, clouding due to the influence of humidity has not been improved. Unexamined Japanese Patent Publication 1973
Publication No. 43241 proposes a coating solution in which water is added to thian alkoxides to polymerize them, and further stabilized using a chelating agent such as acetylacetone. The coating liquid has excellent moisture stability, and also has excellent film formability when a single layer of a titanium oxide thin film is formed using the coating liquid. However, when obtaining a multilayer film with different types of metal oxide thin films, such as silicon oxide thin films, in order to obtain an optical interference film,
It has a drawback of poor interlayer adhesion between the titanium oxide thin film and the dissimilar metal oxide thin film. The present invention is suitable for producing an optical interference film by a coating method, that is, it is stable and has excellent film formability, particularly has good interlayer adhesion with a thin film of a dissimilar metal oxide, and has a high refractive index. It is an object of the present invention to provide a composition for forming a titanium oxide thin film from which a titanium oxide thin film can be obtained, and another object is to provide a method for producing an optical interference film using the composition. As a result of intensive research to achieve the above object, the present inventors have developed a composition containing a mixture of itan alkoxide monomers and a polymer obtained by polymerizing them with a compound stabilized with a chelating agent. By using an organic solvent solution as a coating liquid, a titanium oxide thin film with a uniform thickness and high refractive index can be obtained, and it also has excellent interlayer adhesion when formed into a multilayer film with a silicon oxide thin film. They discovered this and completed the present invention. The present invention relates to a part of the alkoxy group of titanium alkoxides represented by the general formula: Ti(OR) 4 ... [] (wherein R represents a monovalent hydrocarbon group having 1 to 18 carbon atoms) or all of the carboxylic acid residues of carboxylic acids represented by the general formula: HOCOR'...[] -
OCOR' (here, R' represents a monovalent hydrocarbon group having 1 to 18 carbon atoms) and the residue of organic compounds that can form a chelate ring with titanium represented by the general formula: HX...[] Group: Organic titanium compound substituted with one or more selected from the group of -X A: 5
to 50 parts by weight, and a substituent of a titanium alkoxide polymer obtained by hydropolymerizing the same or different titanium alkoxides represented by the general formula []: Part or all of -OR is represented by the general formula [] Residues of carboxylic acids: -OCOR' and residues of organic compounds capable of forming a chelate ring with titanium represented by the general formula []: organic compounds substituted with one or more selected from the group of -X. This is a composition for forming a titanium oxide thin film, comprising an organic solvent solution containing a mixture of 95 to 50 parts by weight of titanium compound B. In the present invention, the organic titanium compound A is a titanium alkoxide represented by the general formula []Ti(OR) 4 , such as tetramethoxytitanium, tetraethoxytitanium, tetraisopropoxytitanium,
Part or all of the alkoxy group such as tetrabutoxytitanium, diethoxydiisopropoxytitanium, dimethoxydibutoxytitanium, etc., can be replaced by the general formula []
Carboxylic acids represented by HOCOR′ such as acetic acid, propionic acid, butyric acid residues:
-OCOR' and/or organic compounds capable of forming a chelate ring with titanium represented by the general formula []HX, such as β-diketones such as acetylacetone and benzoylacetone, α- such as acetoacetic acid and propionylbutyric acid, Or, β-keto acids, lower alkyl esters of keto acids such as methyl, ethyl, propyl, butyl, oxyacids such as glycolic acid and lactic acid, lower alkyl esters of oxyacids such as methyl, ethyl, propyl, butyl, Residues of chelating agents such as diols and amino alcohols: Compounds substituted with -X For example, diisopropoxy titanium diisostearate, diisobutoxy bis(lactate) titanium, diisopropoxy bis(acetyl acetonato) titanium, dibutoxy bis(acetylacetonato) titanium, etc. Some or all of the alkoxy groups of titanium alkoxides are replaced with carboxylic acid residues and/or
Alternatively, the organotitanium compound A substituted with a chelating agent residue can be easily produced by reacting a titanium alkoxide with a carboxylic acid and/or a chelating agent in the presence or absence of an organic solvent. can. On the other hand, organic titanium compound polymer B is a titanium compound having a degree of polymerization n of 2 to 50 obtained by reacting the same or different titanium alkoxides represented by the general formula [] with a desired stoichiometric amount of water. In the alkoxide polymer, a carboxylic acid represented by the general formula [] and/or a general formula []
It is obtained by reacting titanium represented by the formula with a chelating agent capable of forming a chelate ring. As the organic titanium compound polymer B, the degree of polymerization n is 2
-50, preferably 2-20 are used. In the present invention, the composition for forming a titanium oxide thin film is obtained by converting a mixture consisting of 5 to 50 parts by weight of the organic compound A and 95 to 50 parts by weight of the organic titanium compound polymer B into titanium oxide (TiO 2 ) . It is an organic solvent solution containing 20% by weight or less, preferably 1 to 10% by weight. In addition, glass forming agents such as inorganic or organic phosphorus compounds, boron compounds, arsenic compounds, antimony compounds, tin compounds, zinc compounds, lead compounds,
Also included are compounds containing one or more of potassium compounds, nickel nitrate, cobalt nitrate, and the like. Any organic solvent can be used as long as it can dissolve both the organic titanium compound A and the organic titanium compound polymer B used, but the volatility of the solvent, the stability of the solution, and the economic efficiency may be used. Lower alcohols with a boiling point of 180℃ or less,
A single solvent or a mixed solvent of two or more of these halides is preferably used. In the present invention, an organic solvent solution containing a mixture of organic titanium compound A and organic titanium compound B is used as a coating liquid, and is applied to a heat-resistant base material such as glass, metal, or ceramics to a uniform thickness. By holding at a temperature of 1 second to 3 hours at a temperature higher than 0.degree. C. and carrying out a thermal decomposition treatment, a transparent and homogeneous titanium oxide thin film with a uniform film thickness can be formed on the surface of the heat-resistant base material. The coating method for applying the coating liquid to the heat-resistant substrate is the dipping method, spray method, spinner method, printing method,
Any known method such as the brush printing method can be employed, but the dipping and pulling method is preferable when forming a titanium oxide thin film with a uniform thickness. Also, 300
A titanium oxide thin film can also be formed by spraying a coating liquid onto a heat-resistant substrate heated to a temperature of .degree. C. or higher and thermally decomposing it. In the present invention, an optical interference film can be obtained by forming a multilayer film by alternately forming a thin film of titanium oxide and a thin film of a metal oxide other than titanium oxide with a low refractive index, such as silicon oxide, to a predetermined thickness. . The silicon oxide thin film is made of organic silicon compounds containing organic alkoxysilanes and their derivatives such as tetramethoxysilane, tetraethoxysilane, tetraisopropoxysilane, tetrabutoxysilane, diethoxydiisopropoxysilane, dichlorodimethoxysilane, etc. Heat-resistant substrates or
It can be formed by coating a heat-resistant base material on which a titanium oxide thin film is formed and heating and baking it. For example, TiO 2 /SiO 2 /
TiO 2 triple layer film, TiO 2 /SiO 2 /TiO 2 /SiO 2 /TiO 2
By forming a five-layer film, a light-reflecting film can be obtained. The composition for forming a titanium oxide thin film of the present invention comprises an organic titanium compound A and an organic titanium compound polymer B.
It has the following characteristics by having a mixture with as the main component. (1) Excellent stability, especially moisture resistance. (2) Excellent film formability, especially interlayer adhesion with dissimilar metal oxide thin films. (3) A titanium oxide thin film with a high refractive index can be obtained. In the present invention, the adhesion of the organic titanium compound A to the substrate and the film formability of the organic titanium compound polymer B act synergistically to produce an optical interference film with a high refractive index and excellent interlayer adhesion. It is assumed that this will be obtained. The present invention is used to produce an optical interference film that is highly stable and has excellent film formability, especially interlayer adhesion with a dissimilar metal oxide thin film, and can obtain a homogeneous titanium oxide thin film with a high refractive index. The present invention provides a titanium oxide thin film-forming composition suitable for the following, and its industrial significance is extremely large. EXAMPLES Below, the present invention will be explained in more detail with reference to Examples. However, the scope of the present invention is not limited in any way by the following examples. Example 1 Synthesis of organic titanium compound A: Tetraisopropoxytitanium Ti (OiPr) 4 :
42.6g was dissolved in 234g of ethanol, 30g of acetylacetone was added and reacted, and Ti(OiPr) 4-
An ethanol solution containing 4.6 g of an organic titanium compound A in which part of the OiPr group was substituted with an acetylacetone residue was prepared. (iPr represents an isopropyl group.) Synthesis of organic titanium compound polymer B: Tetraisopropoxytitanium・Ti (OiPr) 4 :
Dissolve 56.8g in 350g of ethanol and stir with sewage.
3.2g was gradually added and polymerized. Then, while stirring this solution, 40 g of acetylacetone was added to prepare an ethanol solution containing 60.8 g of organotitanium compound polymer B with a degree of polymerization: n = 10 in which some of the -OiPr groups were substituted with acetylacetone residues. did. Preparation of titanium oxide thin film forming composition (coating solution): Mix 30 g of the ethanol solution of organic titanium compound A prepared above and 400 g of ethanol solution of organic titanium compound polymer B, and add pentoxide as a vitreous forming material. Add 0.4g of phosphorus/P 2 O 5 ,
A composition for forming a titanium oxide thin film was prepared in which the mixture concentration of organic titanium compound A and organic titanium compound polymer B in terms of TiO 2 was 3.6 g% by weight. Manufacture of optical interference (reflection) film: Use the composition for forming a titanium oxide thin film prepared above as a coating solution, and use a well-washed 60 mm film as a base material in this coating solution.
×120mm ×1mm soda lime glass was immersed and pulled up, then placed in an electric furnace heated to a temperature of 500℃.
A titanium oxide thin film was formed on the substrate by heating and baking for 30 minutes. The formed titanium oxide thin film was a transparent thin film with a uniform thickness of 610 Å, and the refractive index at a wavelength of 540 nm was 2.2. Next, the above titanium oxide was added to an organic solvent solution (Atron R NSi-500, main component silicate polymer, main solvent acetate ester, manufactured by Nippon Soda Co., Ltd.) containing an organosilicon compound with a concentration of 5.0% by weight in terms of SiO 2 . The substrate on which the thin film was formed was immersed, pulled up, and fired for 30 minutes in an electric furnace heated to a temperature of 500° C., thereby forming a silicon oxide thin film on the titanium oxide thin film formed above. The silicon oxide thin film formed has a thickness of
It was a uniform transparent thin film of 900 Å. Furthermore, on top of forming the silicon oxide thin film, a titanium oxide thin film, a silicon oxide thin film, and further a titanium oxide thin film are formed in the same manner as above,
A five-layer film of TiO 2 /SiO 2 /TiO 2 /SiO 2 /TiO 2 was obtained. The total thickness of the five-layer film obtained was 3630 Å,
The emission rate of light with a wavelength of 540 nm was 91%. Examples 2 to 14 In Example 1, the type and reaction molar ratio of titanium alkoxide, carboxylic acid and/or chelating agent were changed, and the amount of water during synthesis of thian alkoxide polymer was changed to produce organic titanium compound A. , organic titanium compound polymer B and organic titanium compound polymer B in various ratios were prepared. The prepared composition for forming a titanium oxide thin film was applied to the same soda lime glass substrate as in Example 1, and then treated in the same manner as in Example 1 to form a titanium oxide thin film and the refractive index was measured. Further, the same treatment as in Example 1 was carried out to laminate a silicon oxide thin film and a titanium oxide thin film to produce an optical interference film. Types of titanium alkoxide, carboxylic acid, and chelating agent used and their reaction molar ratios, degree of polymerization of organic titanium compound B, quantitative ratio (parts by weight) of organic titanium compound A and organic titanium compound polymer B, type of organic solvent Table 1 shows the concentration of the mixture of organic titanium compound A and organic titanium compound polymer B in terms of TiO 2 . Table 1 shows the thin film properties of the titanium oxide thin film and optical interference film produced using this titanium oxide thin film forming composition. In addition, as a comparison, the physical properties of thin films when using a coating liquid containing only organic titanium compound A and when using a coating liquid containing only organic titanium compound polymer B are shown in Table 1 together with Examples. In Table 1, the abbreviations for iPr; isopropyl group nBu; normal butyl group AA; acetylacetone MAA; methyl acetoacetate EAA; ethyl acetoacetate LA; lactic acid iSt; stearic acid OG; octylene glycol TEA; triethanolamine are used. In Table 1, the indications of film formability mean the following. ◎ A uniform multilayer film was obtained. ○ A multilayer film was obtained, but slight unevenness was observed. × Peeling occurred in the third layer, and a multilayer film could not be obtained.
【表】【table】
Claims (1)
の異種同種を表す。) で表わされるチタンアルコキシド類のアルコキシ
基の一部または全部を、 一般式:HOCOR′で表わされるカルボン酸の
残基: −OCOR′ (ここに、Rは炭素数1〜18の1価の炭化水素基
を表す。) および 一般式:HXで表わされるチタンとキレート環
を形成し得る有機化合物の残基:−Xの群から選
ばれた1種または2種以上で置換した 有機チタン化合物A:5ないし50重量部と 一般式:Ti(OR)4 (ここに、Rは炭素数1〜18の1価の炭化水素基
の異種同種を表す。) で表わされる同種または意種のチタンアルコキシ
ド類を加水重合して得られるチタンアルコキシ
ド・ポリマーの置換基:−ORの一部または全部
を 一般式:HOCOR′で表わされるカルボン酸の
残基: −OCOR′ (ここに、R′は炭素数1〜18の1価の炭化水素
基を表す。) および 一般式:HXで表わされるチタンとキレート環
を形成し得る有機化合物の残基:−Xの群から選
ばれた1種または2種以上で置換した有機チタン
化合物ポリマーB:95ないし50重量部とからなる
混合物を含有する、有機溶剤溶液からなることを
特徴とする酸化チタン薄膜形成用組成物。 2 一般式HXで表わされるチタンとキレート環
を形成し得る有機化合物が、β−ジケトン類、α
−またはβ−ケト酸類、ケト酸の低級アルキルエ
ステル類、オキシ酸類、オキシ酸の低級アルキル
エステル類、ジオール類およびアミノアルコール
類の群から選ばれる1種または2種以上である特
許請求の範囲第1項記載の酸化チタン薄膜形成用
組成物。 3 リン化合物、ホウ素化合物、ヒ素化合物およ
びアンチモン化合物の群から選ばれた1種または
2種以上のガラス質形成剤を含有する特許請求の
範囲第1項記載の酸化チタン薄膜形成用組成物。 4 TiO2に換算した有機チタン化合物Aと有機
チタン化合物ポリマーBとの混合物の濃度が1〜
20重量%である特許請求の範囲第1項記載の酸化
チタン薄膜形成用組成物。[Claims] 1 General formula: Ti(OR) 4 (herein, R represents the same kind of monovalent hydrocarbon group having 1 to 18 carbon atoms) of the alkoxy group of titanium alkoxides A residue of a carboxylic acid represented by the general formula: HOCOR': -OCOR' (wherein, R represents a monovalent hydrocarbon group having 1 to 18 carbon atoms) and the general formula: HX 5 to 50 parts by weight of an organic titanium compound A substituted with one or more selected from the group -X: a residue of an organic compound capable of forming a chelate ring with titanium represented by the formula: Ti( OR) 4 (Here, R represents the same type of monovalent hydrocarbon group having 1 to 18 carbon atoms.) Titanium alkoxide polymer obtained by hydropolymerizing titanium alkoxides of the same type or type represented by Substituent: Part or all of -OR General formula: Residue of carboxylic acid represented by HOCOR': -OCOR' (Here, R' represents a monovalent hydrocarbon group having 1 to 18 carbon atoms. ) and Residue of an organic compound capable of forming a chelate ring with titanium represented by general formula: HX: Organic titanium compound polymer B substituted with one or more selected from the group -X: 95 to 50 1. A composition for forming a titanium oxide thin film, comprising an organic solvent solution containing a mixture of parts by weight. 2 Organic compounds capable of forming a chelate ring with titanium represented by the general formula HX include β-diketones, α
- or β-keto acids, lower alkyl esters of keto acids, oxyacids, lower alkyl esters of oxyacids, diols, and amino alcohols. The composition for forming a titanium oxide thin film according to item 1. 3. The composition for forming a titanium oxide thin film according to claim 1, which contains one or more glass forming agents selected from the group of phosphorus compounds, boron compounds, arsenic compounds, and antimony compounds. 4 The concentration of the mixture of organic titanium compound A and organic titanium compound polymer B in terms of TiO 2 is 1 to
20% by weight of the composition for forming a titanium oxide thin film according to claim 1.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP14901483A JPS6040171A (en) | 1983-08-15 | 1983-08-15 | Composition for forming titanium oxide thin film |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP14901483A JPS6040171A (en) | 1983-08-15 | 1983-08-15 | Composition for forming titanium oxide thin film |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS6040171A JPS6040171A (en) | 1985-03-02 |
| JPH0360353B2 true JPH0360353B2 (en) | 1991-09-13 |
Family
ID=15465782
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP14901483A Granted JPS6040171A (en) | 1983-08-15 | 1983-08-15 | Composition for forming titanium oxide thin film |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS6040171A (en) |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP4807020B2 (en) * | 2005-09-21 | 2011-11-02 | 東洋製罐株式会社 | Method for producing binder composition for dispersing semiconductor fine particles |
| JP4745261B2 (en) * | 2007-02-07 | 2011-08-10 | 双葉電子工業株式会社 | Display element |
-
1983
- 1983-08-15 JP JP14901483A patent/JPS6040171A/en active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS6040171A (en) | 1985-03-02 |
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