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JPH0362003B2 - - Google Patents
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JPH0362003B2 - - Google Patents

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Publication number
JPH0362003B2
JPH0362003B2 JP58064353A JP6435383A JPH0362003B2 JP H0362003 B2 JPH0362003 B2 JP H0362003B2 JP 58064353 A JP58064353 A JP 58064353A JP 6435383 A JP6435383 A JP 6435383A JP H0362003 B2 JPH0362003 B2 JP H0362003B2
Authority
JP
Japan
Prior art keywords
voltage
semiconductor
mol
nonlinear
semiconductor porcelain
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP58064353A
Other languages
Japanese (ja)
Other versions
JPS59188902A (en
Inventor
Harufumi Bandai
Kyoshi Iwai
Yasuyuki Naito
Kazuyoshi Nakamura
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Murata Manufacturing Co Ltd
Original Assignee
Murata Manufacturing Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Murata Manufacturing Co Ltd filed Critical Murata Manufacturing Co Ltd
Priority to JP58064353A priority Critical patent/JPS59188902A/en
Publication of JPS59188902A publication Critical patent/JPS59188902A/en
Publication of JPH0362003B2 publication Critical patent/JPH0362003B2/ja
Granted legal-status Critical Current

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  • Thermistors And Varistors (AREA)
  • Compositions Of Oxide Ceramics (AREA)

Description

【発明の詳細な説明】[Detailed description of the invention]

本発明は電圧非直線抵抗体用半導体磁器の製造
方法に関するものである。 近年、電圧電流特性が非直線的な抵抗体、いわ
ゆるバリスタとして、チタン酸ストロンチウム系
半導体磁器を素体とするものが開発されている。
この種の電圧非直線抵抗体としては、(イ)チタン酸
ストロンチウムを半導体化してなる半導体磁器の
表面に、Mn、Zn、Coなどの金属酸化物を含有す
るペーストを塗布し、空気中または窒素雰囲気中
で1200〜1300℃の温度で熱処理して前記半導体磁
器の結晶粒界に絶縁層を形成させたものを素体と
し、これに電極を取付けたもの、あるいは(ロ)チタ
ン酸ストロンチウムの主成分に、半導体化促進用
金属酸化物、例えば、Nb2O5、Ta2O5、La2O3
CeO2、Nd2O3、WO3などと、電圧電流非直線特
性改善用金属酸化物であるV2O5、Cr2O3、CuO、
CuO2、MoO3、MnO2などを含有させたものを素
体とし、これに電極を取り付けたものが知られて
いる。この電圧非直線抵抗体は、その素体がペロ
ブスカイト結晶構造を有し、強誘電性を示すため
単にバリスタとしての機能のみでなくコンデンサ
としての機能をも有し、従つて、それ自体で異常
高電圧(サージ)の吸収や電圧の安定化などを行
なえるという利点を有している。しかしながら、
従来のチタン酸ストロンチウム系半導体磁器を用
いたものでは、例えば、前記(イ)のものでは、結晶
粒界を絶縁化するためにMn、Zn、Coなどの金属
酸化物を小さな半導体磁器の表面に塗布しなけれ
ばならず、さらに酸化物を半導体磁器の結晶粒界
に均一に拡散させる熱処理が必要であるなど製造
工程が煩雑で、制御が困難な工程を含む他、製造
条件によつて特性が左右され易いことに起因して
電圧非直線抵抗体の非直線指数(α)やしきい値
電圧(Vth)などの特性のバラツキが大きいとい
う欠点があつた。また、後者の(ロ)のものでは、中
性または還元性雰囲気中で焼成する際、電圧電流
非直線特性改善用金属酸化物が金属化して蒸発
し、焼成炉の炉材などを損傷したり、所望の組成
のものが得難く、しかも非直線指数(α)やしき
い値電圧(Vth)などの特性にバラツキを生じる
という欠点があつた。 本発明は、このような欠点に鑑みてなされたも
ので、製造条件によつて特性や組成が大きく変動
するのを防止し、もつてしきい値電圧や非直線指
数など特性のバラツキの小さい電圧非直線抵抗体
用半導体磁器を製造できるようにすることを目的
とするものである。 本発明の要旨は、一般式: (Sr1-x-yCaxBay)(Ti1-zZrz)O3 (式中、x、y、zは各成分のモル分率で、0.03
≦x≦0.30、0.03≦y≦0.30、x+y≦0.50、0
≦z≦0.20)で表わされる主成分99.0〜99.9モル
%と、希土類元素、Nb、WおよびTaの酸化物か
らなる群から選ばれた少なくとも一種の半導体化
剤0.1〜1.0モル%とからなる組成となるように半
導体磁器の主成分原料と半導体化剤とを調合し、
得られた混合物を所定形状に成形した後、中性又
は還元性雰囲気中で焼成して半導体磁器を得、該
半導体磁器を自然雰囲気中又は酸化性雰囲気中で
熱処理することにより半導体磁器の結晶粒界を絶
縁化することを特徴とする電圧非直線抵抗体用半
導体磁器の製造方法にある。 本発明の一実施態様においては、前記組成物に
5モル%以下のSiO2および/またはAl2O3を鉱化
剤として含有させることが行なわれる。 また、他の実施態様においては1モル%以下の
MnO2等を含有させることが行なわれる。 これらの成分の含有量を前記の如く限定したの
は前記含有量を超えると特性に悪影響を与えるか
らである。 本発明に係る半導体磁器の組成を前記のように
限定したのは次の理由による。すなわち、主成分
におけるCaのモル分率xが0.03未満では非直線指
数(α)が小さくなりすぎて実用的でなく、また
0.30を超えると、しきい値電圧が高くなるので、
xは前記範囲とした。また、Baのモル分率yが
0.03未満では非直線指数が小さくなり、0.30を超
えるとしきい値電圧が高くなるのでyは前記範囲
とした。なお、x+y≦0.5としたのは、x+y
が0.5を超えると、しきい値電圧が高くなりすぎ
て実用的でなるからである。主成分におけるZr
のモル分率Zを0〜0.20としたのは、Zが0.20を
超えると、しきい値電圧が高くなりすぎるからで
ある。半導体化剤を0.1〜1.0モル%としたのは、
半導体化剤が0.1モル%未満ではしきい値電圧が
高くなつたり、半導体化せず、1.0モル%を超え
るとバリスタ特性が得難くなるからである。 本発明に係る電圧非直線抵抗体用半導体磁器
は、主成分と半導体化剤とを調合し、ボールミル
にて混合粉砕し、乾燥後、有機バインダを適量混
合して造粒し、次いで成形し、これを中性または
還元性雰囲気中1350〜1400℃で焼成し、さらに自
然雰囲気または酸化性雰囲気中1000〜1200℃で熱
処理することにより製造することができ、得られ
た半導体磁器の表面に電極を形成することにより
電圧非直線抵抗体とすることができる。 以下、本発明の実施例について説明する。 実施例 原料としてSrCO3、CaCO3、BaCO3、TiO2
よびZrO2を用い、これらを第1表に示す組成比
で調合し、ボールミルにて10時間湿式混合し、乾
燥後、空気中1100〜1250℃で2時間仮焼して主成
分(Sr1-x-yCaxBay)(Ti1-zZrz)O3を用意し、こ
れを第1表に示す割合で半導体化剤と混合し、同
表に示す組成比率のものが得られるように調合し
た。この調合原料に有機バインダを6重量%加
え、ボールミルにて充分に湿式混合し、脱水、乾
燥させた後、2000Kg/cm2の圧力を加えて円板状に
成形した。この成形物を自然雰囲気中1150℃で1
時間予備焼成し、次いで還元性雰囲気(95%N2
+5%H2)中1350〜1400℃で2時間焼成し、直
径8mm、肉厚1mmの半導体磁器円板を得た。次
に、この円板を自然雰囲気中1000〜1200℃で熱処
理して、その結晶粒界を絶縁層化し、電圧非直線
抵抗体用半導体磁器円板を得た。この円板の相対
する表面に銀ペーストを印刷塗布し、自然雰囲気
中800℃で焼付けて電極を形成し電圧非直線抵抗
体を得た。 このようにして得た電圧非直線抵抗体のしきい
値電圧(Vth)および非直線指数(α)を求め
た。それらの結果を第1表に合わせて示す。第1
表中、×−印を付した番号の試料は本発明の範囲外
のものを示し、Vthは電圧非直線抵抗体に10mA
流したときの電圧(V10)であり、αは前記V10
と1mA流したときの電圧(V1)とから次式によ
り求めた値である。α=1/log(V10/V1
The present invention relates to a method for manufacturing semiconductor ceramics for voltage nonlinear resistors. In recent years, resistors with nonlinear voltage-current characteristics, so-called varistors, have been developed that use strontium titanate-based semiconductor ceramics as an element body.
This type of voltage nonlinear resistor is manufactured by (a) applying a paste containing metal oxides such as Mn, Zn, and Co to the surface of semiconductor porcelain made by converting strontium titanate into a semiconductor, and The element body is an insulating layer formed on the crystal grain boundaries of the semiconductor porcelain by heat treatment at a temperature of 1200 to 1300°C in an atmosphere, and an electrode is attached to this, or (b) a main body made of strontium titanate. Ingredients include metal oxides for promoting semiconductor formation, such as Nb 2 O 5 , Ta 2 O 5 , La 2 O 3 ,
CeO 2 , Nd 2 O 3 , WO 3 , etc., and V 2 O 5 , Cr 2 O 3 , CuO, which are metal oxides for improving voltage-current nonlinear characteristics.
It is known to have an element body containing CuO 2 , MoO 3 , MnO 2 , etc., and to which electrodes are attached. This voltage nonlinear resistor has a perovskite crystal structure and exhibits ferroelectricity, so it functions not only as a varistor but also as a capacitor. It has the advantage of being able to absorb voltage (surge) and stabilize voltage. however,
In the case of conventional strontium titanate-based semiconductor ceramics, for example, in (a) above, metal oxides such as Mn, Zn, Co, etc. are applied to the surface of the small semiconductor ceramics in order to insulate the grain boundaries. The manufacturing process is complicated and involves processes that are difficult to control, such as the need for coating, and the need for heat treatment to uniformly diffuse the oxide into the grain boundaries of the semiconductor porcelain, and the characteristics may vary depending on the manufacturing conditions. There was a drawback that characteristics such as the nonlinear index (α) and the threshold voltage (Vth) of the voltage nonlinear resistor varied widely due to the fact that the voltage was easily influenced. In addition, in the latter (b), when firing in a neutral or reducing atmosphere, the metal oxide for improving voltage-current nonlinear characteristics becomes metallized and evaporates, causing damage to the furnace materials of the firing furnace. However, it is difficult to obtain a desired composition, and there are also disadvantages in that characteristics such as nonlinear index (α) and threshold voltage (Vth) vary. The present invention has been made in view of these drawbacks, and is intended to prevent the characteristics and composition from greatly varying depending on manufacturing conditions, and to create a voltage with small variations in characteristics such as threshold voltage and nonlinear index. The purpose is to enable manufacturing of semiconductor ceramics for non-linear resistors. The gist of the present invention is the general formula: (Sr 1-xy Ca x Bay ) (Ti 1-z Zr z )O 3 (where x, y, z are the mole fractions of each component, 0.03
≦x≦0.30, 0.03≦y≦0.30, x+y≦0.50, 0
≦z≦0.20) 99.0 to 99.9 mol% of the main component, and 0.1 to 1.0 mol% of at least one kind of semiconducting agent selected from the group consisting of oxides of rare earth elements, Nb, W, and Ta. The main component raw material of semiconductor porcelain and the semiconducting agent are mixed so that
After forming the obtained mixture into a predetermined shape, it is fired in a neutral or reducing atmosphere to obtain semiconductor porcelain, and the semiconductor porcelain is heat-treated in a natural atmosphere or an oxidizing atmosphere to form crystal grains of the semiconductor porcelain. The present invention provides a method for manufacturing semiconductor ceramics for a voltage nonlinear resistor, which is characterized by insulating the field. In one embodiment of the invention, the composition contains up to 5 mol% of SiO 2 and/or Al 2 O 3 as a mineralizing agent. In other embodiments, 1 mol% or less
Inclusion of MnO 2 etc. is carried out. The content of these components is limited as described above because if the content exceeds the above, the properties will be adversely affected. The reason why the composition of the semiconductor ceramic according to the present invention is limited as described above is as follows. In other words, if the mole fraction x of Ca in the main component is less than 0.03, the nonlinear index (α) will be too small to be practical;
If it exceeds 0.30, the threshold voltage becomes high, so
x was within the above range. Also, the molar fraction y of Ba is
If it is less than 0.03, the nonlinear index becomes small, and if it exceeds 0.30, the threshold voltage becomes high, so y was set in the above range. In addition, x+y≦0.5 is set as x+y
This is because if exceeds 0.5, the threshold voltage becomes too high to be practical. Zr in principal component
The mole fraction Z is set to 0 to 0.20 because if Z exceeds 0.20, the threshold voltage becomes too high. The reason why the semiconducting agent was set at 0.1 to 1.0 mol% was because
This is because if the amount of the semiconducting agent is less than 0.1 mol%, the threshold voltage will be high or the material will not be made into a semiconductor, and if it exceeds 1.0 mol%, it will be difficult to obtain varistor characteristics. The semiconductor ceramic for a voltage nonlinear resistor according to the present invention is prepared by mixing the main component and a semiconducting agent, mixing and pulverizing in a ball mill, drying, mixing an appropriate amount of an organic binder, granulating, and then molding. It can be produced by firing it at 1350-1400℃ in a neutral or reducing atmosphere and then heat-treating it at 1000-1200℃ in a natural atmosphere or oxidizing atmosphere. Electrodes are placed on the surface of the resulting semiconductor porcelain. By forming this, a voltage non-linear resistor can be obtained. Examples of the present invention will be described below. Example Using SrCO 3 , CaCO 3 , BaCO 3 , TiO 2 and ZrO 2 as raw materials, these were mixed in the composition ratio shown in Table 1, wet mixed in a ball mill for 10 hours, dried, and heated in air at The main components (Sr 1-xy Ca x Ba y ) (Ti 1-z Zr z ) O 3 were prepared by calcining at 1250°C for 2 hours, and mixed with the semiconducting agent in the proportions shown in Table 1. The compositions were prepared in such a way that the composition ratios shown in the same table were obtained. 6% by weight of an organic binder was added to this mixed raw material, thoroughly wet-mixed in a ball mill, dehydrated and dried, and then molded into a disk shape by applying a pressure of 2000 Kg/cm 2 . This molded product was heated to 1150℃ in a natural atmosphere.
Pre-calcined for an hour and then in a reducing atmosphere (95% N2 )
+5% H 2 ) at 1350 to 1400° C. for 2 hours to obtain a semiconductor porcelain disk with a diameter of 8 mm and a wall thickness of 1 mm. Next, this disk was heat-treated at 1000 to 1200° C. in a natural atmosphere to form an insulating layer at the grain boundaries, thereby obtaining a semiconductor ceramic disk for a voltage nonlinear resistor. Silver paste was printed and coated on the opposite surfaces of this disk and baked at 800°C in a natural atmosphere to form electrodes and obtain a voltage nonlinear resistor. The threshold voltage (Vth) and nonlinear index (α) of the voltage nonlinear resistor thus obtained were determined. The results are also shown in Table 1. 1st
In the table, samples with numbers marked with an x-mark are outside the scope of the present invention, and Vth is 10mA to the voltage nonlinear resistor.
It is the voltage (V 10 ) when flowing, and α is the voltage (V 10 )
This is the value obtained from the following formula from and the voltage (V 1 ) when 1mA is applied. α=1/log( V10 / V1 )

【表】 比較例 SrTiO399.3モル%、Y2O30.2モル%CuO0.5モル
%を秤量し、その混合物に有機バインダを6重量
%加え、ボールミルにて充分に湿式混合し、脱
水、乾燥させた後、2000Kg/cm2の圧力を加えて円
板状に成形した。次いで、この成形物を自然雰囲
気中1150℃で1時間予備焼成し、還元性雰囲気
(95%N2+5%H2)中1380℃で2時間焼成した
後、自然雰囲気中1100℃で熱処理して、結晶粒界
を絶縁層化した直径8mm、肉厚1mmの半導体磁器
円板を得、これに実施例と同様にして電極を形成
して電圧非直線抵抗体を得た。 実施例で得た試料番号3および6の電圧非直線
抵抗体と、比較例で得た電圧非直線抵抗体につい
て、300Vのパルス電圧を印加する前後のしきい
値電圧(Vth)および非直線指数(α)を求め
た。それらの結果を第2表に示す。なお、第2表
には100個の試料についての平均値()と偏差
値(σ)を合わせて示した。
[Table] Comparative example SrTiO 3 99.3 mol%, Y 2 O 3 0.2 mol%, CuO 0.5 mol% were weighed, 6% by weight of an organic binder was added to the mixture, thoroughly wet mixed in a ball mill, dehydrated, and dried. After that, a pressure of 2000 Kg/cm 2 was applied to form it into a disk shape. Next, this molded product was pre-fired at 1150°C in a natural atmosphere for 1 hour, then fired at 1380°C in a reducing atmosphere (95% N 2 + 5% H 2 ) for 2 hours, and then heat treated at 1100°C in a natural atmosphere. A semiconductor ceramic disk having a diameter of 8 mm and a wall thickness of 1 mm was obtained with an insulating layer formed at the grain boundaries, and electrodes were formed thereon in the same manner as in the examples to obtain a voltage nonlinear resistor. Threshold voltage (Vth) and nonlinear index before and after applying a pulse voltage of 300 V for the voltage nonlinear resistors of sample numbers 3 and 6 obtained in the example and the voltage nonlinear resistor obtained in the comparative example (α) was calculated. The results are shown in Table 2. Note that Table 2 also shows the average value ( ) and deviation value (σ) for 100 samples.

【表】 第1表および第2表の結果から明らかなように
本発明によれば、しきい値電圧が低い領域で非直
線指数の大きい電圧非直線抵抗体を製造すること
ができ、しかも比較例に示す従来のものに比べ、
しきい値電圧および非直線指数の各偏差値が半分
以下と、特性のバラツキの少ない電圧非直線抵抗
体を製造することができる。また、本発明に係る
電圧非直線抵抗体は、パルス電圧を印加してもし
きい値電圧および非直線指数がさほど低下せず、
かえつてバラツキが少なくなつている。 以上の説明から明らかなように、本発明は、従
来のチタン酸ストロンチウム系半導体磁器を素体
とする電圧非直線抵抗体における特性のバラツキ
が大きいという欠点をなくし、しきい値電圧が数
ボルトの低電圧領域から百ボルト程度の高電圧領
域にわたつて大きな非直線指数を有し、しかも特
性のバラツキの小さな電圧非直線抵抗体を製造す
ることを可能にし、かつ、結晶粒界に絶縁層を形
成するために金属酸化物を塗布、熱拡散させる工
程が不要であり、しかも半導体化するため還元処
理する際、成分が金属化して蒸発することがほと
んどなく、従つて、製造が容易で歩留まりもよ
く、焼成炉を損傷したりすることがないなど優れ
た効果を奏する。
[Table] As is clear from the results in Tables 1 and 2, according to the present invention, it is possible to manufacture a voltage nonlinear resistor with a large nonlinear index in the region of low threshold voltage, and in addition, compared to Compared to the conventional one shown in the example,
It is possible to manufacture a voltage nonlinear resistor with less variation in characteristics, in which each deviation value of threshold voltage and nonlinear index is less than half. Further, in the voltage nonlinear resistor according to the present invention, even when a pulse voltage is applied, the threshold voltage and the nonlinear index do not decrease much,
On the contrary, the variation is decreasing. As is clear from the above description, the present invention eliminates the disadvantage of large variations in characteristics in conventional voltage nonlinear resistors made of strontium titanate-based semiconductor ceramic, and has a threshold voltage of several volts. It is possible to manufacture a voltage nonlinear resistor that has a large nonlinearity index from a low voltage region to a high voltage region of about 100 volts and has small variations in characteristics, and it also enables the production of a voltage nonlinear resistor with an insulating layer at the grain boundaries. There is no need for the process of applying metal oxides and thermally diffusing them to form them, and in addition, there is almost no chance that the components will metalize and evaporate during the reduction process to convert them into semiconductors. Therefore, manufacturing is easy and yields are low. It has excellent effects such as not damaging the firing furnace.

Claims (1)

【特許請求の範囲】 1 一般式: (Sr1-x-yCaxBay)(Ti1-zZrz)O3 (式中、x、y、zは各成分のモル分率で、0.03
≦x≦0.30、0.03≦y≦0.30、x+y≦0.50、0
≦z≦0.20)で表わされる主成分99.0〜99.9モル
%と、希土類元素、Nb、WおよびTaの酸化物か
らなる群から選ばれた少なくとも一種の半導体化
剤0.1〜1.0モル%とからなる組成となるように半
導体磁器の主成分原料と半導体化剤とを調合し、
得られた混合物を所定形状に成形した後、中性又
は還元性雰囲気中で焼成して半導体磁器を得、該
半導体磁器を自然雰囲気中又は酸化性雰囲気中で
熱処理することにより半導体磁器の結晶粒界を絶
縁化することを特徴とする電圧非直線抵抗体用半
導体磁器の製造方法。
[Claims] 1 General formula: (Sr 1-xy Ca x Bay ) (Ti 1-z Zr z ) O 3 (where x, y, z are the mole fractions of each component, 0.03
≦x≦0.30, 0.03≦y≦0.30, x+y≦0.50, 0
≦z≦0.20) 99.0 to 99.9 mol% of the main component, and 0.1 to 1.0 mol% of at least one kind of semiconducting agent selected from the group consisting of oxides of rare earth elements, Nb, W, and Ta. The main component raw material of semiconductor porcelain and the semiconducting agent are mixed so that
After forming the obtained mixture into a predetermined shape, it is fired in a neutral or reducing atmosphere to obtain semiconductor porcelain, and the semiconductor porcelain is heat-treated in a natural atmosphere or an oxidizing atmosphere to form crystal grains of the semiconductor porcelain. A method for manufacturing semiconductor ceramic for voltage nonlinear resistor, characterized by insulating the field.
JP58064353A 1983-04-11 1983-04-11 Semiconductor porcelain composition for voltage nonlinear resistor Granted JPS59188902A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP58064353A JPS59188902A (en) 1983-04-11 1983-04-11 Semiconductor porcelain composition for voltage nonlinear resistor

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP58064353A JPS59188902A (en) 1983-04-11 1983-04-11 Semiconductor porcelain composition for voltage nonlinear resistor

Publications (2)

Publication Number Publication Date
JPS59188902A JPS59188902A (en) 1984-10-26
JPH0362003B2 true JPH0362003B2 (en) 1991-09-24

Family

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Family Applications (1)

Application Number Title Priority Date Filing Date
JP58064353A Granted JPS59188902A (en) 1983-04-11 1983-04-11 Semiconductor porcelain composition for voltage nonlinear resistor

Country Status (1)

Country Link
JP (1) JPS59188902A (en)

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6252927A (en) * 1985-08-30 1987-03-07 Sharp Corp Method for forming electrode of thin film semiconductor device

Also Published As

Publication number Publication date
JPS59188902A (en) 1984-10-26

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