JPH0362261B2 - - Google Patents
Info
- Publication number
- JPH0362261B2 JPH0362261B2 JP18299383A JP18299383A JPH0362261B2 JP H0362261 B2 JPH0362261 B2 JP H0362261B2 JP 18299383 A JP18299383 A JP 18299383A JP 18299383 A JP18299383 A JP 18299383A JP H0362261 B2 JPH0362261 B2 JP H0362261B2
- Authority
- JP
- Japan
- Prior art keywords
- adhesive
- pellicle
- mask substrate
- mask
- pellicle frame
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 239000000853 adhesive Substances 0.000 claims description 65
- 230000001070 adhesive effect Effects 0.000 claims description 65
- 239000000758 substrate Substances 0.000 claims description 27
- 239000012790 adhesive layer Substances 0.000 claims description 10
- 239000000126 substance Substances 0.000 claims description 10
- 239000007864 aqueous solution Substances 0.000 claims description 8
- 239000011521 glass Substances 0.000 description 10
- 239000010410 layer Substances 0.000 description 8
- 239000000463 material Substances 0.000 description 8
- 238000004519 manufacturing process Methods 0.000 description 5
- 239000004065 semiconductor Substances 0.000 description 5
- 239000000243 solution Substances 0.000 description 4
- NIXOWILDQLNWCW-UHFFFAOYSA-N acrylic acid group Chemical group C(C=C)(=O)O NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 description 3
- 238000011109 contamination Methods 0.000 description 3
- 239000002253 acid Substances 0.000 description 2
- 150000007513 acids Chemical class 0.000 description 2
- 239000003795 chemical substances by application Substances 0.000 description 2
- 230000007547 defect Effects 0.000 description 2
- 238000000034 method Methods 0.000 description 2
- 229920003023 plastic Polymers 0.000 description 2
- 239000002985 plastic film Substances 0.000 description 2
- 239000004593 Epoxy Substances 0.000 description 1
- 239000000020 Nitrocellulose Substances 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- 229920005549 butyl rubber Polymers 0.000 description 1
- 239000000356 contaminant Substances 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 229920001971 elastomer Polymers 0.000 description 1
- 239000012776 electronic material Substances 0.000 description 1
- 239000003292 glue Substances 0.000 description 1
- 239000012528 membrane Substances 0.000 description 1
- 229920001220 nitrocellulos Polymers 0.000 description 1
- 239000004033 plastic Substances 0.000 description 1
- 229920006255 plastic film Polymers 0.000 description 1
- 229920002635 polyurethane Polymers 0.000 description 1
- 239000004814 polyurethane Substances 0.000 description 1
- 150000003839 salts Chemical class 0.000 description 1
- 239000013464 silicone adhesive Substances 0.000 description 1
- 239000002356 single layer Substances 0.000 description 1
- 238000010998 test method Methods 0.000 description 1
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 description 1
- 229920002554 vinyl polymer Polymers 0.000 description 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
- G03F1/62—Pellicles, e.g. pellicle assemblies, e.g. having membrane on support frame; Preparation thereof
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
- G03F1/62—Pellicles, e.g. pellicle assemblies, e.g. having membrane on support frame; Preparation thereof
- G03F1/64—Pellicles, e.g. pellicle assemblies, e.g. having membrane on support frame; Preparation thereof characterised by the frames, e.g. structure or material, including bonding means therefor
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Preparing Plates And Mask In Photomechanical Process (AREA)
Description
【発明の詳細な説明】
［技術分野］
本発明はペリクル、特に、半導体装置の製造用
のガラスマスクの汚染や異物付着を防止できるペ
リクルに適用して効果のある技術に関するもので
ある。DETAILED DESCRIPTION OF THE INVENTION [Technical Field] The present invention relates to a pellicle, and particularly to a technique that is effective when applied to a pellicle that can prevent contamination and adhesion of foreign matter to a glass mask for manufacturing semiconductor devices.
［背景技術］
半導体装置の製造においてウエハ上に微細な回
路パターンを形成する場合、回路パターンを転写
するために用いられるガラスマスクの品質が半導
体装置の性能や歩留りを大きく左右する。特に、
ガラスマスクに付着する汚染や異物の数を低減す
ることは半導体装置の製造歩留りを向上させかつ
製造コストを低下させるための最大の課題であ
る。[Background Art] When forming a fine circuit pattern on a wafer in the manufacture of semiconductor devices, the quality of the glass mask used to transfer the circuit pattern greatly influences the performance and yield of the semiconductor device. especially,
Reducing the number of contaminants and foreign substances adhering to glass masks is the biggest challenge for improving the manufacturing yield of semiconductor devices and lowering manufacturing costs.
そこで、ガラスマスクを汚染や異物付着から保
護し、マスク欠陥を排除するために透明な膜を有
するペリクルが使用されている（たとえば、工業
調査会発行の「電子材料」、1982年３月号、P52
〜55参照）。 Therefore, a pellicle with a transparent film is used to protect the glass mask from contamination and foreign matter adhesion and to eliminate mask defects (for example, "Electronic Materials" published by Kogyo Research Association, March 1982 issue, P52
~55).
このようなペリクルはガラスマスクのパターン
形成面側に接着剤で装着することが考えられる。 It is conceivable that such a pellicle may be attached to the pattern forming surface side of the glass mask using an adhesive.
その場合、接着剤の接着力は取扱い時にペリク
ルがガラスマスクから外れない程度以上でなけれ
ばならない。 In that case, the adhesive strength of the adhesive must be at least strong enough to prevent the pellicle from coming off the glass mask during handling.
しかし、接着剤の接着力をあまり強くしようと
すると、ペリクルをガラスマスクから剥がす際に
無理な力が加わつてガラスマスクを損傷したり、
あるいは剥離後に接着剤またはその糊が異物とし
てガラスマスク上に残留してしまう結果、半導体
装置の欠陥をひき起こしたり、製造歩留りを低下
させる原因となるということを本発明者は見い出
した。 However, if you try to make the adhesive strength too strong, excessive force will be applied when removing the pellicle from the glass mask, which may damage the glass mask.
Alternatively, the inventors have discovered that the adhesive or its paste remains on the glass mask as a foreign substance after peeling, resulting in defects in semiconductor devices and a decrease in manufacturing yield.
［発明の目的］
本発明の目的は、ペリクルの接着剤がマスク基
板に残留して異物化することを防止できる技術を
提供することにある。[Object of the Invention] An object of the present invention is to provide a technique that can prevent the adhesive of the pellicle from remaining on the mask substrate and turning into foreign matter.
本発明の前記ならびにその他の目的と新規な特
徴は、本明細書の記述および添付図面から明らか
になるであろう。 The above and other objects and novel features of the present invention will become apparent from the description of this specification and the accompanying drawings.
［発明の概要］
本願において開示される発明のうち代表的なも
のの概要を簡単に説明すれば、次の通りである。[Summary of the Invention] A brief overview of typical inventions disclosed in this application is as follows.
すなわち、ペリクル枠をマスク基板に装着する
接着剤の接着力をマスク基板側がペリクル枠側よ
りも弱くなるようにすることにより、また接着剤
として溶液凝固性の物質で構成することにより、
接着剤がマスク基板に残留して異物化することを
防止できる。 That is, by making the adhesive strength of the adhesive that attaches the pellicle frame to the mask substrate weaker on the mask substrate side than on the pellicle frame side, and by using a solution coagulable substance as the adhesive,
It is possible to prevent the adhesive from remaining on the mask substrate and turning into foreign matter.
［実施例 １］
第１図は本発明の実施例１であるペリクルのマ
スク基板への接着状態を示断面図、第２図はその
接着剤の一実施例を示す接着部の拡大部分断面図
である。[Example 1] Fig. 1 is a sectional view showing the state of adhesion of a pellicle to a mask substrate according to Embodiment 1 of the present invention, and Fig. 2 is an enlarged partial sectional view of the adhesive part showing an example of the adhesive. It is.
この実施例においては、ペリクルはリング状の
枠体よりなるペリクル枠１と、ペリクル枠１の一
端側に貼着された透明なペリクル膜２とからな
る。ペリクル枠１はたとえばプラスチツクまたは
アルミニウム等よりなる。一方、ペリクル膜２は
たとえば強い光線の照射に耐えることができ、ま
たマスクの解像度を劣化させないニトロセルロー
スのような透明プラスチツクフイルム等よりな
る。 In this embodiment, the pellicle consists of a pellicle frame 1 made of a ring-shaped frame body, and a transparent pellicle film 2 attached to one end side of the pellicle frame 1. The pellicle frame 1 is made of, for example, plastic or aluminum. On the other hand, the pellicle film 2 is made of, for example, a transparent plastic film such as nitrocellulose that can withstand strong light irradiation and does not deteriorate the resolution of the mask.
前記ペリクル枠１の反対端面は接着剤３によ
り、たとえばガラスで作られたマスク基板４のパ
ターン５を形成した面に対して装着されている。
したがつて、マスク基板４のパターン５はペリク
ル膜２とペリクル枠１により異物の付着や汚染か
ら保護される。 The opposite end surface of the pellicle frame 1 is attached with an adhesive 3 to a surface of a mask substrate 4 made of glass, for example, on which a pattern 5 is formed.
Therefore, the pattern 5 on the mask substrate 4 is protected by the pellicle film 2 and the pellicle frame 1 from adhesion of foreign matter and contamination.
前記接着剤３は粘着力の異なる２層の接着剤層
すなわちペリクル枠１側の強接着力層３ａとマス
ク基板４側の弱接着力層３ｂとからなる両面テー
プ材３ｃで構成されている。この実施例の接着剤
３の層３ａと３ｂはたとえばアクリル系、ゴム
系、ビニル系、エポキシ系あるいはシリコン系等
の接着剤で構成され、両面テープ材３ｃのテープ
基材としては紙、プラスチツクフイルム、ブチル
ゴムシート、発泡ポリウレタンシート等よりな
る。 The adhesive 3 is composed of a double-sided tape material 3c consisting of two adhesive layers having different adhesive strengths, namely a strong adhesive layer 3a on the pellicle frame 1 side and a weak adhesive layer 3b on the mask substrate 4 side. The layers 3a and 3b of the adhesive 3 in this embodiment are made of an acrylic, rubber, vinyl, epoxy, or silicone adhesive, and the tape base material of the double-sided tape material 3c is paper or plastic film. , butyl rubber sheet, foamed polyurethane sheet, etc.
また、前記層３ａ，３ｂの各接着力は、強接着
力層３ａがたとえば150〜1000ｇ／cm、弱接着力
層３ｂがたとえば約40〜500ｇ／cmとなるように
設定するのが好ましい。このような接着力の値は
JIS Ｚ−0237粘着力試験方法によるものである。 Further, the adhesion strength of each of the layers 3a and 3b is preferably set such that the strong adhesive force layer 3a has, for example, 150 to 1000 g/cm, and the weak adhesive force layer 3b has, for example, about 40 to 500 g/cm. The value of such adhesive force is
This is based on the JIS Z-0237 adhesion test method.
このように、接着剤３の両面テープ材３ｃのペ
リクル枠１側を強接着力層３ａとし、かつマスク
基板４側を弱接着力層３ｂとしたことにより、弱
接着力層３ｂは取り扱い時にペリクルがマスク基
板４から外れない程度に弱い反面、ペリクルをマ
スク基板４から容易に剥がすことができ、しかも
剥離後の接着面には接着剤３およびその糊の跡が
残留せず、接着剤３がマスク基板４の異物となる
ことは防止される。 In this way, the strong adhesive layer 3a is formed on the pellicle frame 1 side of the double-sided tape material 3c of the adhesive 3, and the weak adhesive layer 3b is formed on the mask substrate 4 side. Although the pellicle is weak to the extent that it does not come off from the mask substrate 4, the pellicle can be easily peeled off from the mask substrate 4, and there are no traces of the adhesive 3 or its glue left on the adhesive surface after peeling. Foreign matter on the mask substrate 4 is prevented.
［実施例 ２］
第３図は本発明の実施例２による接着部の拡大
部分断面図である。[Example 2] FIG. 3 is an enlarged partial sectional view of a bonded portion according to Example 2 of the present invention.
本実施例の接着剤３は、１層で接着剤の両面の
物質との間の接着力に差のあるものである。すな
わち、ペリクル枠１側の強接着力部３ｄと、マス
ク基板４側に弱接着力部３ｅとの１層構造よりな
る。 The adhesive 3 of this embodiment has a single layer with a difference in adhesive strength between the materials on both sides of the adhesive. That is, it has a one-layer structure including a strong adhesive force section 3d on the pellicle frame 1 side and a weak adhesive force section 3e on the mask substrate 4 side.
この場合、接着剤３を強弱の差のある接着力部
３ｄ，３ｅとするためには、たとえば接着剤３の
テープの片面を剥離剤の溶液に含浸してその面の
みに剥離剤をしみ込ませれば、その側が弱接着力
部３ｅとなる。それとは逆に、片面に接着力強化
処理を施してその側を強接着力部３ｄとしてもよ
い。 In this case, in order to make the adhesive 3 have adhesive parts 3d and 3e with different strengths, for example, one side of the tape of the adhesive 3 is impregnated with a release agent solution, and only that side is soaked with the release agent. In this case, that side becomes the weak adhesive strength portion 3e. On the other hand, one side may be treated to strengthen the adhesive strength and that side may be used as the strong adhesive strength portion 3d.
［実施例 ３］
第４図は本発明の他の実施例による接着部の拡
大部分断面図である。[Embodiment 3] FIG. 4 is an enlarged partial sectional view of a bonded portion according to another embodiment of the present invention.
この実施例における接着剤は、たとえば水溶液
に対して凝固性のある接着剤６、たとえばアクリ
ル系の物質よりなる。 The adhesive in this embodiment is, for example, an adhesive 6 that coagulates in an aqueous solution, such as an acrylic material.
この接着剤６は取り扱い時にペリクルをマスク
基板４に対して接着保持するのに十分な接着力を
有する反面、ペリクルをマスク基板４から剥離す
る際には水溶液中に浸漬することにより第４図に
二点鎖線で示す如く凝固する。 This adhesive 6 has sufficient adhesion to hold the pellicle to the mask substrate 4 during handling, but when the pellicle is peeled off from the mask substrate 4, it is necessary to immerse it in an aqueous solution as shown in FIG. It solidifies as shown by the two-dot chain line.
したがつて、本実施例では、接着剤６として水
溶液に対して凝固性を示す物質を用いることによ
り、容易に剥離ができるようになるうえ、剥離後
に接着剤６およびその糊がマスク面に残留して異
物化することを防止できる。 Therefore, in this example, by using a substance that shows coagulability in an aqueous solution as the adhesive 6, peeling becomes easy and the adhesive 6 and its paste remain on the mask surface after peeling. can be prevented from turning into foreign matter.
なお、本実施例では水溶液凝固性のアクリル系
物質を接着剤として用いたがこれに限らず、酸や
アルカリ、各種塩類の水溶液あるいは各種有機溶
液に対して凝固性を示す物質を接着剤として用い
てもよい。 In this example, an acrylic substance that coagulates in an aqueous solution was used as the adhesive; however, the adhesive is not limited to this, and substances that coagulate in an aqueous solution of acids, alkalis, various salts, or various organic solutions may be used as the adhesive. It's okay.
［効果］
(1) ペリクルの接着剤が、マスク基板と接着され
る面の接着力がペリクル枠と接着される面の接
着力よりも弱いことによつて、ペリクルをマス
ク基板から剥がした際に接着剤がマスク面に残
留して異物化することを防止でき、マスク面を
清浄に保護できる。[Effects] (1) The adhesive strength of the surface of the pellicle that is bonded to the mask substrate is weaker than that of the surface that is bonded to the pellicle frame, so that when the pellicle is peeled off from the mask substrate, It is possible to prevent the adhesive from remaining on the mask surface and turning it into foreign matter, and it is possible to protect the mask surface cleanly.
(2) 接着剤を溶液凝固性の物質で構成したことに
より、ペリクルをマスク基板から剥がした後に
接着剤がマスク面に残留して異物化することを
防止でき、マスク面を清浄に保護できる。(2) Since the adhesive is made of a solution-coagulable substance, it is possible to prevent the adhesive from remaining on the mask surface and turning into foreign matter after the pellicle is peeled off from the mask substrate, and the mask surface can be cleanly protected.
以上本発明者によつてなされた発明を実施例に
基づき具体的に説明したが、本発明は前記実施例
に限定されるものではなく、その要旨を逸脱しな
い範囲で種々変更可能であることはいうまでもな
い。 Although the invention made by the present inventor has been specifically explained based on Examples above, the present invention is not limited to the Examples described above, and it is understood that various changes can be made without departing from the gist of the invention. Needless to say.
たとえば、接着剤は３層以上の多層とすること
もでき、材質も他の様々なものを使用できる。 For example, the adhesive can be multilayered with three or more layers, and various other materials can be used.
また、凝固性の接着剤としても、水溶液の他、
酸やアルカリ、あるいは有機溶液に対して凝固性
を示す物質を利用できる。 In addition to aqueous solutions, it can also be used as a coagulable adhesive.
Substances that coagulate in acids, alkalis, or organic solutions can be used.
さらに、ペリクルはマスク基板の両面に装着し
てもよい。 Furthermore, the pellicle may be attached to both sides of the mask substrate.
第１図は本発明によるペリクルの一実施例の断
面図、第２図はその接着部の実施例１の拡大部分
断面図、第３図は本発明の実施例２による接着部
の拡大部分断面図、第４図は本発明の実施例３に
よる接着部の拡大部分断面図である。
１……ペリクル枠、２……ペリクル膜、３……
接着剤、３ａ……強接着力層、３ｂ……弱接着力
層、３ｃ……両面テープ材、３ｄ……強接着力
部、３ｅ……弱接着力部、４……マスク基板、５
……パターン、６……水溶液凝固性の接着剤。
FIG. 1 is a cross-sectional view of an embodiment of the pellicle according to the present invention, FIG. 2 is an enlarged partial cross-sectional view of the bonded portion of Example 1, and FIG. 3 is an enlarged partial cross-sectional view of the bonded portion according to Example 2 of the present invention. FIG. 4 is an enlarged partial cross-sectional view of a bonded portion according to a third embodiment of the present invention. 1... Pellicle frame, 2... Pellicle membrane, 3...
Adhesive, 3a...Strong adhesive force layer, 3b...Weak adhesive force layer, 3c...Double-sided tape material, 3d...Strong adhesive force part, 3e...Weak adhesive force part, 4...Mask substrate, 5
...Pattern, 6...Aqueous solution coagulable adhesive.
Claims (1)
るペリクル枠とを備えてなるペリクルにおいて、
ペリクル枠が接着剤によりマスク基板に装着さ
れ、前記接着剤は、前記マスク基板と接着される
面の接着力が前記ペリクル枠に接着される面の接
着力よりも弱いことを特徴とするペリクル。 ２ 接着剤が一層の接着剤層で形成され、この接
着剤層のマスク基板接着面またはペリクル枠接着
面の少なくとも一方は前者の接着力が後者の接着
力よりも弱くなるよう処理されていることを特徴
とする特許請求の範囲第１項記載のペリクル。 ３ 接着剤が複数層の接着剤層よりなり、マスク
基板側の接着剤層の接着力がペリクル枠側の接着
剤層より弱いことを特徴とする特許請求の範囲第
１項記載のペリクル。 ４ 透明のペリクル膜と、マスク基板に装着され
るペリクル枠とを備えてなるペリクルにおいて、
ペリクル枠が溶液凝固性の物質よりなる接着剤で
マスク基板に装着されてなることを特徴とするペ
リクル。 ５ 接着剤が水溶液凝固性の物質よりなることを
特徴とする特許請求の範囲第４項記載のペリク
ル。[Claims] 1. A pellicle comprising a transparent pellicle film and a pellicle frame attached to a mask substrate,
A pellicle, wherein a pellicle frame is attached to a mask substrate with an adhesive, and the adhesive has a weaker adhesive force on a surface bonded to the mask substrate than on a surface bonded to the pellicle frame. 2. The adhesive is formed of one adhesive layer, and at least one of the mask substrate adhesive surface or the pellicle frame adhesive surface of this adhesive layer is treated so that the adhesive force of the former is weaker than the adhesive force of the latter. A pellicle according to claim 1, characterized in that: 3. The pellicle according to claim 1, wherein the adhesive comprises a plurality of adhesive layers, and the adhesive layer on the mask substrate side has a weaker adhesive force than the adhesive layer on the pellicle frame side. 4. A pellicle comprising a transparent pellicle film and a pellicle frame attached to a mask substrate,
A pellicle characterized in that a pellicle frame is attached to a mask substrate with an adhesive made of a solution-coagulable substance. 5. The pellicle according to claim 4, wherein the adhesive is made of an aqueous solution solidifying substance.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP58182993A JPS6075835A (en) | 1983-10-03 | 1983-10-03 | Pellicle |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP58182993A JPS6075835A (en) | 1983-10-03 | 1983-10-03 | Pellicle |
Related Child Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP6075692A Division JPH07175206A (en) | 1994-04-14 | 1994-04-14 | Pellicle |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS6075835A JPS6075835A (en) | 1985-04-30 |
| JPH0362261B2 true JPH0362261B2 (en) | 1991-09-25 |
Family
ID=16127873
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP58182993A Granted JPS6075835A (en) | 1983-10-03 | 1983-10-03 | Pellicle |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS6075835A (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2012108277A (en) * | 2010-11-17 | 2012-06-07 | Shin Etsu Chem Co Ltd | Pellicle for lithography |
Families Citing this family (13)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS6284047U (en) * | 1985-11-13 | 1987-05-28 | ||
| JPS62156957U (en) * | 1986-03-25 | 1987-10-05 | ||
| JP2642637B2 (en) * | 1987-08-18 | 1997-08-20 | 三井石油化学工業 株式会社 | Dustproof film |
| JPH0278945U (en) * | 1988-12-07 | 1990-06-18 | ||
| JP2599460B2 (en) * | 1989-06-16 | 1997-04-09 | 松下電子工業株式会社 | Photo mask |
| JP2714450B2 (en) * | 1989-08-10 | 1998-02-16 | ダイセル化学工業株式会社 | Dustproof film |
| JPH09204038A (en) * | 1996-09-24 | 1997-08-05 | Hitachi Ltd | Manufacturing method of mask |
| US6153060A (en) * | 1999-08-04 | 2000-11-28 | Honeywell International Inc. | Sputtering process |
| CN1198316C (en) * | 2000-12-27 | 2005-04-20 | 三井化学株式会社 | Thin film |
| JP4979088B2 (en) * | 2008-05-14 | 2012-07-18 | 信越化学工業株式会社 | Pellicle for semiconductor lithography |
| WO2010026938A1 (en) * | 2008-09-08 | 2010-03-11 | 電気化学工業株式会社 | Semiconductor product manufacturing method |
| JP6303286B2 (en) * | 2013-04-30 | 2018-04-04 | 凸版印刷株式会社 | Inspection method for photomask with pellicle and pellicle adhesion durability inspection device |
| US10353283B2 (en) * | 2016-07-11 | 2019-07-16 | Shin-Etsu Chemical Co., Ltd. | Adhesive for pellicle, pellicle, and method of selecting adhesive for pellicle |
-
1983
- 1983-10-03 JP JP58182993A patent/JPS6075835A/en active Granted
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2012108277A (en) * | 2010-11-17 | 2012-06-07 | Shin Etsu Chem Co Ltd | Pellicle for lithography |
Also Published As
| Publication number | Publication date |
|---|---|
| JPS6075835A (en) | 1985-04-30 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| JPH0362261B2 (en) | ||
| US4992354A (en) | Dry film photoresist for forming a conformable mask and method of application to a printed circuit board or the like | |
| EP0513859B1 (en) | Method of producing films and jig for producing the same | |
| EP0188051B1 (en) | Transfer sheet | |
| JPH07175206A (en) | Pellicle | |
| JP4916057B2 (en) | Protective film for FPC, resin conductor foil laminate with protective film for FPC, and method for producing flexible printed wiring board using the same | |
| US6309805B1 (en) | Method for securing and processing thin film materials | |
| JPH0812418B2 (en) | Pellicle manufacturing method | |
| JP3004723U (en) | Transfer printing sheet | |
| JP2002134877A (en) | Mounting and processing of thin film materials | |
| JPH0617541Y2 (en) | Silicon rubber film | |
| JPS62183541A (en) | Cap for sealing electronic parts and manufacture of the same | |
| JPS6161168A (en) | Manufacture of photo-curing resin printing plate material | |
| CN104133341A (en) | Dustproof film assembly | |
| JPS5457580A (en) | Solvent adsorbing laminated film | |
| JPH0264540A (en) | Pellicle with which dust generation is prevented | |
| JPS6127182Y2 (en) | ||
| JPS6070866U (en) | Seal | |
| JPH0452751Y2 (en) | ||
| JPH0315545B2 (en) | ||
| KR900017781A (en) | Wrapping paper with gold foil pattern and urethane resin film adhered to substrate paper | |
| JPH0738239A (en) | Flexible printed wiring board | |
| JPH0519452A (en) | Pellicle and its mounting method | |
| JPH0449628Y2 (en) | ||
| JP4055854B2 (en) | Manufacturing method of large pellicle membrane |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| LAPS | Cancellation because of no payment of annual fees |