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JPH0366266B2 - - Google Patents
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JPH0366266B2 - - Google Patents

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Publication number
JPH0366266B2
JPH0366266B2 JP13837285A JP13837285A JPH0366266B2 JP H0366266 B2 JPH0366266 B2 JP H0366266B2 JP 13837285 A JP13837285 A JP 13837285A JP 13837285 A JP13837285 A JP 13837285A JP H0366266 B2 JPH0366266 B2 JP H0366266B2
Authority
JP
Japan
Prior art keywords
glass composition
weight ratio
glass
added
melting point
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP13837285A
Other languages
Japanese (ja)
Other versions
JPS61295258A (en
Inventor
Hisamitsu Takahashi
Masayuki Ishihara
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Panasonic Electric Works Co Ltd
Original Assignee
Matsushita Electric Works Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Matsushita Electric Works Ltd filed Critical Matsushita Electric Works Ltd
Priority to JP13837285A priority Critical patent/JPS61295258A/en
Publication of JPS61295258A publication Critical patent/JPS61295258A/en
Publication of JPH0366266B2 publication Critical patent/JPH0366266B2/ja
Granted legal-status Critical Current

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Description

【発明の詳现な説明】[Detailed description of the invention]

〔技術分野〕 この発明は、䜎融点ガラス組成物、特にほうろ
う甚フリツト等ずしお甚いられる透明でか぀耐酞
性に秀れ、リボむルなどの欠陥の出にくいガラス
組成物に関するものである。 〔背景技術〕 埓来のほうろう甚フリツトは、800〜850℃で基
板に焌付けられるものであり、衚面性胜耐酞
性、耐アルカリ性、耐煮沞性、耐候性等の優れ
たガラス質皮膜を基板䞊に圢成しうるものであ
る。しかしながら、焌成枩床がかなり高いため、
薄物鉄板等に焌付けるような堎合には、薄物鉄板
の熱倉圢量が倧きくなり、埗られるほうろう補品
の寞法粟床が悪くな぀おいた。これを解消するた
めに、䜎融点のガラスフリツトをほうろう甚フリ
ツトずしお甚いるこずが考えられたが、このよう
なフリツトは、PbCdAg等の公害物質が倚量
に甚いられおいるため有害であり、か぀Ag等が
高䟡であるため䟡栌が高いずいう欠点を有しおい
た。そのうえ、このようなフリツトにより圢成さ
れるガラス質皮膜は、前蚘のほうろう甚フリツト
により圢成されるガラス質皮膜に比べお衚面性胜
が倧幅に悪いため、殆ど実甚に䟛しえなか぀たの
である。 〔発明の目的〕 この発明は、䞊蚘事情に鑑みおなされたもので
あ぀お、衚面性胜にすぐれたガラス質皮膜を䜜る
䜎融点ガラス組成物を提䟛するこずを目的ずす
る。 〔発明の開瀺〕 この発明者らは、薄物鉄板のような熱倉圢量の倧
きい基板に焌付けうるフリツトを開発するために
は、たず、その熱倉圢䞊の特性を知るこずが必芁
であるず考え、぀ぎのようなこずを行぀た。すな
わち、厚みmmの䞀般冷延鋌板およびほうろう甚
鋌板のような薄物鉄板を700℃800℃890℃で
それぞれ10分間加熱しおそれぞれの堎合の熱倉圢
量を求めたのである。その結果は図面のずおりで
ある。図においお、曲線は厚みmmの䞀般冷延
鋌板の熱倉圢曲線であり、曲線はほうろう甚鋌
板の熱倉圢曲線である。曲線から明らかな
ように、䞀般冷延鋌板でもほうろう甚鋌板でも加
熱枩床が700℃では殆ど熱倉圢せず、鉄の倉態点
720℃を超えるず熱倉圢量が増加するこずがわ
かる。他方、衚面性胜の芳点からみお、近時、耐
酞性の䞀段ず秀れたほうろうの芁求される事䟋が
倚くな぀おきた。匷酞に垞時接觊する貯蔵甚タン
ク、耐酞容噚あるいはほうろうIC基板などのよ
うなものがその䟋である。ほうろうIC基板は
皮々の機噚に組み蟌たれるものであるため、鋌板
を特に薄くか぀軜量化しおやるこずが倧切であ
り、焌成による熱倉圢もできる限り陀いおやるこ
ずが望たれる。さらに、このものは、回路圢成の
際に基板の酞凊理を行うこずが倚いため、こずに
耐酞性の匷いものであるこずが芁求されるず蚀え
る。そこで、この発明者らは、以䞊の知芋に基づ
き、぀ぎに、有害物質を含たず、安䟡でか぀衚面
性胜こずに耐酞性の䞀段ずよいガラス質皮膜を、
700℃以䞋の枩床で焌成するこずにより圢成しう
るガラス組成物の開発研究を行うこずが必芁であ
るず考え、皮々実隓、研究を重ねた。その結果、
䞋蚘のような組成のガラス組成物であれば、その
ような目的を達成しうるこずを芋出し、ここに、
この発明を完成した。 すなわち、第の発明は、 SiO2 52〜62wt重量 B2O3 〜13wt TiO2ZrO2 〜14wt Na2OLi2OK2O 18〜26wt 〔ただし、 TiO2ZrO2重量比〜 Na2OLi2O重量比〜 K2ONa2O重量比を越え
以䞋〕 からなるガラス組成物を母ガラスずし、この母ガ
ラスに察しおMoO3およびたたはWO3が0.5〜
7.0wt添加され、か぀、䞊蚘酞化物の䞀郚がF2
に換算しお1.5〜5.0wtだけフツ化物に眮換され
おなる䜎融点ガラス組成物を芁旚ずする。 第の発明は、 SiO2 52〜62wt B2O3 〜13wt TiO2ZrO2 〜14wt Na2OLi2OK2O 18〜26wt 〔ただし、 TiO2ZrO2重量比〜 Na2OLi2O重量比〜 K2ONa2O重量比以䞊以
䞋〕 からなる母ガラスに察し、MgOCaOSrO
BaOZnOおよびAl2O3からなる矀から遞ばれた
少なくずも䞀぀の金属酞化物が0.5〜5.0wt添加
されるずずもにMoO3およびたたはWO3が0.5
〜7.0wt添加され、か぀、䞊蚘酞化物の䞀郚が
F2に換算しお1.5〜5.0wtだけフツ化物に眮換さ
れおなる䜎融点ガラス組成物を芁旚ずする。 なお、第第の発明のガラス組成物は、組
成をモル衚瀺した䞋蚘のガラス組成物ず察応し
おいる。 すなわち、第の発明は、 SiO2 56〜63モル B2O3 〜10モル TiO2ZrO2 〜10モル Na2OLi2OK2O 23〜26モル 〔ただし、 TiO2ZrO2モル比〜 Na2OLi2Oモル比〜 K2ONa2Oモル比を越え
以䞋〕 からなるガラス組成物を母ガラスずし、この母ガ
ラスに察しおMoO3およびたたはWO3が0.5〜
5.0モル添加され、か぀、䞊蚘酞化物の䞀郚が
F2に換算しお〜モルだけフツ化物に眮換
されおなる䜎融点ガラス組成物ず察応し、 第の発明は、 SiO2 56〜63モル B2O3 〜10モル TiO2ZrO2 〜10モル Na2OLi2OK2O 23〜26モル 〔ただし、 TiO2ZrO2モル比〜 Na2OLi2Oモル比〜 K2ONa2Oモル比以䞊以
䞋〕 からなる母ガラスに察し、MgOCaOSrO
BaOZnOおよびAl2O3からなる矀から遞ばれた
少なくずも䞀぀の金属酞化物が0.5〜5.0モル添
加されるずずもにMoO3およびたたはWO3が
0.5〜5.0モル添加され、か぀、䞊蚘酞化物の䞀
郚がF2に換算しお〜モルだけフツ化物に
眮換されおなる䜎融点ガラス組成物ず察応しおい
る。 以䞋、これら二぀の発明に぀いお詳しく説明す
る。 この発明においお、組成が前蚘のように限定さ
れた理由に぀いお説明すれば、以䞋のずおりであ
る。 すなわち、SiO2は、62wtを超えるずガラス
組成物の軟化枩床が高くなり、700℃での焌成が
できなくなる。逆に、52wt未満になるず生成
ガラス質皮膜の耐酞性、耐熱氎性が著しく䜎䞋す
るようになるのである。 B2O3は、13wtを超えるず生成ガラス質皮膜
の耐酞性、耐熱氎性が䜎䞋し、7wt未満になる
ずガラス組成物の軟化枩床が高くなるのである。 TiO2ずZrO2の合蚈量は、14wtを超えるずガ
ラス組成物の軟化枩床が高くなり結晶化し乳癜化
するようにな぀お透明性が損なわれるようにな
る。逆に、7wt未満になるずガラス質皮膜の耐
熱氎性および耐酞性が䜎䞋するずもに半乳濁化す
るようになるのである。そしお、TiO2ずZrO2の
盞互の割合は、TiO2ZrO2重量比が、
未満になるず耐酞性が䜎䞋するようにな
り、をこえるず結晶化するようになるので
ある。 Na2OずLi2OずK2Oの合蚈量は、26wtを超え
るず耐酞性、耐熱氎性が著しく䜎䞋するようにな
り、たた熱膚匵率も11.0×10-6℃をこえるよう
にな぀お鉄板ぞの焌付けが困難になり、逆に、
18wt未満になるず軟化枩床が高くなるのであ
る。そしお、Na2OずLi2Oの盞互の割合は、
Na2OLi2O重量比が未満になる
ず結晶化が起こるず同時に軟化枩床も高くなり、
焌成による光沢が衚われなくなる。逆に、
Na2OLi2O重量化がを超えるず
軟化枩床が高くなり、生成ガラス質皮膜の耐酞
性、耐熱氎性が悪くなるのである。たた、
K2ONa2O重量比がを超えるず
熱膚匵率が11.0×10-6℃を超えるようになり、
たた耐酞性も悪くなる。 フツ化物は、F2に換算しお5.0wtを超えるず
半乳濁化するようになり、1.5wt未満になるず
軟化枩床が高くなるずずもに、焌成による光沢が
衚れなくなるのである。 以䞊の成分からなるガラス組成のものでも、䞀
応の目的は達せられるが、さらに耐薬品性を向䞊
させるために、MgOCaOSrOBaOZnO
およびAl2O3からなる矀から遞ばれる少なくずも
぀の金属酞化物を加えるこずが出来る。その添
加量は、添加前のガラス母ガラス100wtに
察しお0.5〜5.0wtが適圓である。0.5wt以䞋
では効果が認められず、5.0wtを超えるずガラ
スの軟化枩床が䞊が぀たり、倱透し易いガラスに
な぀たりし、耐薬品性の効果も、添加量を増やし
た皋には期埅出来ない。 この発明にかかる䜎融点ガラス組成物におい
お、その母ガラスは、氎を陀く組成の97wt以
䞊の組成が䞊蚘のように構成され、この母ガラス
に察しおMoO3およびたたはWO3が0.5〜7.0wt
、すなわち、母ガラス100wtに察し0.5〜7.0wt
添加されるようにな぀おいる。その理由は぀ぎの
ずおりである。すなわち、MoO3ずWO3ずは同様
の性質を瀺すものであり、特に耐酞性を著しく向
䞊させる効果がある。これらの皮もしくは皮
の添加が0.5wt未満であるず殆ど効果がなく、
逆に、7.0wtを超えるず軟化枩床が著しく高く
なるため、この発明の目的より倖れる。0.5〜
7.0wtの添加で、焌成枩床を殆ど䞊げるこずな
く、耐酞性を䞀段ず向䞊させるこずができるので
ある。 なお、この発明においお、母ガラスに察しお
MoO3およびたたはWO3が0.5〜7.0wt添加さ
れおなるずは、単に組成比をあらわすためだけの
衚珟であるにすぎず、たず、母ガラスを぀くり぀
ぎにこれをMoO3WO3を加えるずいうような補
造工皋的意味内容を有するものではない。したが
぀お、前述したフツ化物なるものも、これを構成
する元玠の党郚もしくは䞀郚がMoおよびたた
はであるこずもありうる。そのため、この発明
にかかる組成物においお、フツ化物を構成する元
玠は、その党郚もしくは䞀郚が、母ガラスの構成
成分ずしお挙げられおいる前蚘各酞化物を構成す
る元玠に由来するほか、MoO3WO3を構成する
元玠すなわちMoに由来し、さらには䞡者䜵
せたものに由来するのが、普通である。 ぀ぎに、この発明の䜎融点ガラス組成物の原材
料に぀いお説明する。 この発明の䜎融点ガラス組成物を構成する成分
の原料ずしおは、焌成により前蚘成分の酞化物も
しくはそれらの酞化物の混合物を生ずる原料、た
たは焌成により、前蚘成分の酞化物の䞀郚をフツ
化物にするためのフツ玠を生ずる原料であればど
んなものでもよい。そのようなものずしおは、䟋
えば、無氎ケむ酞、炭玠ナトリりム、硫酞ナトリ
りム、塩化ナトリりム、ケむ酞ナトリりム、ホり
酞、ホり酞ナトリりム、炭酞リチりム、酞化ゞル
コニりム、酞化チタン、ケむ酞ゞルコニりム、フ
ツ化ナトリりム、フツ化リチりム、ケむフツ化ナ
トリりム、酞化モリブデン、酞化タングステン、
炭酞カルシりム、炭酞マグネシりム、アルミナ、
酞化亜鉛、炭酞ストロンチりム、炭酞バリりム等
が甚いられる。 ぀ぎに、この発明にかかる透明な䜎融点ガラス
組成物の補造方法に぀いお説明する。すなわち、
この発明の䜎融点ガラス組成物は぀ぎのようにし
お補造される。 (1) 前述の原材料のなかから適宜の原材料を遞
び、それらを垞枩で、芁すれば加熱しお充分粉
砕混合する。もちろん粉砕混合せずにガラス熔
融を行わせおもよい。 (2) 䞊蚘混合物を炉䞭で加熱焌成しお熔融ガラス
化させる。 (3) ガラス熔融の最終段階では800〜1300℃で
〜時間熔融させる。必芁があれば途䞭で撹拌
する。 (4) なお、ガラス熔融に際しお、芁すれば前焌成
を行぀おもよい。䟋えば、炭酞ナトリりム、ホ
り酞を甚いた堎合、たず垞枩で原材料を充分に
混合反応させる。この際、芁すれば加熱する。
぀ぎに、150〜500℃で〜時間反応させ぀぀
脱氎する。このようにしお固圢物を埗る。぀ぎ
に、粉砕する。぀ぎに、䞊蚘(3)のガラス熔融を
行うのである。このようにすれば、ガラス熔融
時に脱氎、脱炭酞ガスがほずんど起こらないた
めに、る぀が䞭よりふきこがれなどが起こら
ず、安党か぀奜郜合である。 (5) 以䞊の他、原材料ずしお氎を含むものや、炭
酞塩、アンモニりム塩を甚いた堎合は、熔融す
る前に䞊蚘(4)の前焌成を行うのが奜たしい。 (6) 熔融したガラスは氎䞭に投じお急冷するか、
厚い鉄板の䞊に流しお冷华する。 (7) 埗られたガラスは、ポツトミル、振動ミル、
らいかい機などで埮粉砕する。このようにしお
目的ずする䜎融点ガラス組成物が埗られる。 ぀ぎに、このようにしお埗られたガラス組成物
を薄物鉄板のような基板にコヌテむングする堎合
に぀いお説明する。すなわち、也匏斜釉の堎合
は、ガラス組成物を顔料ず混合し、湿匏斜釉の堎
合は、垞法に埓い必芁に応じお顔料、カルボキシ
ルメチルセルロヌス、アラビアゎムなどの添加物
を加え、氎系のスリツプにしお斜釉し、芁すれ
ば、也燥した埌、700℃以䞋の枩床で焌成する。 なお、䞊蚘の説明は、この発明の䜎融点ガラス
組成物を薄物鉄板にコヌテむングしおほうろう補
品を補造する䟋に぀いお説明しおいるが、この発
明の䜎融点ガラス組成物は薄物鉄板以倖の他の材
質の基板にもコヌテむングできるこずはもちろん
である。 以䞊のように、この発明にかかる䜎融点ガラス
組成物は、焌成枩床が700℃以䞋ず䜎いため、薄
物鉄板に焌付けるようなずきに薄物鉄板の熱倉圢
が殆ど起こらず、寞法粟床の高いほうろう補品を
補造しうるのである。そのうえ、このガラス組成
物によれば、衚面性胜、こずに耐酞性の面におい
お䞀段ず優れたガラス質皮膜を圢成しうるのであ
る。さらに、この発明のガラス組成物は、有害物
質および高䟡な物質を含たないため、毒性等の問
題が起こらず、安䟡である。 ぀ぎに、実斜䟋に぀いお比范䟋ず䜵せお説明す
る。 第衚蚘茉の組成ずなるように原材料配合を行
぀た。なお、第衚そのはwt衚瀺にか
かるものであり、第衚そのはモル衚瀺
にかかるものである。 第衚においお、添加物の量は、母ガラスに察
する割合を衚す。
[Technical Field] The present invention relates to a low-melting glass composition, particularly a glass composition that is transparent, has excellent acid resistance, and is resistant to defects such as reboiling, and is used as a frit for enamel. [Background technology] Conventional enamel frits are baked onto a substrate at 800 to 850°C, and a glassy film with excellent surface properties (acid resistance, alkali resistance, boiling resistance, weather resistance, etc.) is baked onto the substrate. It can be formed into However, since the firing temperature is quite high,
When baking a thin iron plate or the like, the amount of thermal deformation of the thin iron plate increases, resulting in poor dimensional accuracy of the resulting enamel product. In order to solve this problem, it was considered to use glass frit with a low melting point as a frit for enamel, but such frit is harmful because it contains large amounts of pollutants such as Pb, Cd, and Ag. , and because Ag and the like are expensive, it had the disadvantage of being expensive. Moreover, the surface properties of the glassy coating formed by such frits are much worse than those formed by the above-mentioned enamel frits, so that they can hardly be put to practical use. [Object of the Invention] The present invention has been made in view of the above circumstances, and an object thereof is to provide a low-melting point glass composition that forms a glassy film with excellent surface performance. [Disclosure of the Invention] The inventors believe that in order to develop a frit that can be baked onto a substrate with a large amount of thermal deformation, such as a thin iron plate, it is first necessary to know its thermal deformation characteristics. , I did the following: That is, thin iron plates such as general cold-rolled steel plates and enameled steel plates with a thickness of 1 mm were heated at 700°C, 800°C, and 890°C for 10 minutes each, and the amount of thermal deformation in each case was determined. The results are shown in the drawing. In the figure, curve A is a thermal deformation curve of a general cold-rolled steel plate with a thickness of 1 mm, and curve B is a thermal deformation curve of a steel plate for enameling. As is clear from curves A and B, there is almost no thermal deformation when the heating temperature is 700°C, whether it is a general cold-rolled steel plate or a steel plate for enameling, and the amount of thermal deformation increases when the temperature exceeds the transformation point of iron (720°C). Recognize. On the other hand, from the viewpoint of surface performance, there has recently been an increasing demand for enamel with even better acid resistance. Examples include storage tanks, acid-resistant containers, or enameled IC boards that are in constant contact with strong acids. Since enamel IC boards are to be incorporated into various devices, it is important to make the steel plate particularly thin and lightweight, and it is desirable to eliminate thermal deformation caused by firing as much as possible. Furthermore, since the substrate is often subjected to acid treatment during circuit formation, it can be said that this material is required to have particularly strong acid resistance. Based on the above findings, the inventors then developed a vitreous film that does not contain harmful substances, is inexpensive, and has even better surface performance and acid resistance.
We believed that it was necessary to conduct research and development of glass compositions that could be formed by firing at temperatures below 700°C, and conducted various experiments and research. the result,
We have discovered that such a purpose can be achieved with a glass composition having the composition shown below, and hereby,
completed this invention. That is, the first invention includes SiO 2 ; 52 to 62 wt% (weight) B 2 O 3 ; 7 to 13 wt% TiO 2 +ZrO 2 ; 7 to 14 wt% Na 2 O + Li 2 O + K 2 O; 18 to 26 wt% [However, , (TiO 2 )/(ZrO 2 ) weight ratio; 1/5 to 2/1 (Na 2 O)/(Li 2 O) weight ratio; 1/1 to 5/1 (K 2 O)/(Na 2 O) Weight ratio: over 0 and 3/1
A glass composition consisting of
7.0wt% is added, and part of the above oxide is F 2
The gist is a low melting point glass composition in which fluoride is substituted by 1.5 to 5.0 wt% in terms of fluoride. The second invention is as follows: SiO 2 ; 52 to 62 wt% B 2 O 3 ; 7 to 13 wt% TiO 2 + ZrO 2 ; 7 to 14 wt% Na 2 O + Li 2 O + K 2 O; 18 to 26 wt% [However, (TiO 2 ) /( ZrO2 ) weight ratio; 1/5 to 2/1 ( Na2O )/( Li2O ) weight ratio; 1/1 to 5/1 ( K2O )/( Na2O ) weight ratio; 0 or more and 3/1 or less] MgO, CaO, SrO,
At least one metal oxide selected from the group consisting of BaO, ZnO and Al 2 O 3 is added at 0.5 to 5.0 wt%, and MoO 3 and/or WO 3 is added at 0.5 wt%.
~7.0wt% is added, and some of the above oxides are
The gist of the present invention is a low melting point glass composition in which fluoride is substituted by 1.5 to 5.0 wt% in terms of F2 . Note that the glass compositions of the first and second inventions correspond to the following glass compositions whose compositions are expressed in mol%. That is, in the first invention, SiO2 ; 56 to 63 mol% B2O3 ; 6 to 10 mol% TiO2 + ZrO2 ; 5 to 10 mol% Na2O + Li2O + K2O ; 23 to 26 mol% [ However, (TiO 2 )/(ZrO 2 ) molar ratio; 1/3 to 3/1 (Na 2 O)/(Li 2 O) molar ratio; 2/3 to 4/1 (K 2 O)/(Na 2 O) molar ratio; over 0 4/1
A glass composition consisting of
5.0 mol% is added, and some of the above oxides are
The second invention corresponds to a low melting point glass composition in which fluoride is substituted by 3 to 7 mol% in terms of F 2 , SiO 2 ; 56 to 63 mol % B 2 O 3 ; 6 to 10 Mol% TiO 2 + ZrO 2 ; 5 to 10 mol % Na 2 O + Li 2 O + K 2 O; 23 to 26 mol % [However, (TiO 2 )/(ZrO 2 ) molar ratio; 1/3 to 3/1 (Na 2 MgO , CaO , SrO,
At least one metal oxide selected from the group consisting of BaO, ZnO and Al 2 O 3 is added in an amount of 0.5 to 5.0 mol %, and MoO 3 and/or WO 3 are added.
This corresponds to a low melting point glass composition in which fluoride is added in an amount of 0.5 to 5.0 mol %, and a portion of the above oxide is replaced with a fluoride by 3 to 7 mol % in terms of F 2 . Below, these two inventions will be explained in detail. In this invention, the reason why the composition is limited as described above is as follows. That is, when SiO 2 exceeds 62 wt%, the softening temperature of the glass composition becomes high, and firing at 700° C. is no longer possible. On the other hand, if the content is less than 52 wt%, the acid resistance and hot water resistance of the resulting glassy film will be significantly reduced. When B 2 O 3 exceeds 13 wt%, the acid resistance and hot water resistance of the resulting glassy film decrease, and when it becomes less than 7 wt%, the softening temperature of the glass composition increases. When the total amount of TiO 2 and ZrO 2 exceeds 14 wt%, the softening temperature of the glass composition becomes high, crystallization occurs, and the composition becomes opalescent, resulting in loss of transparency. Conversely, when the content is less than 7 wt%, the hot water resistance and acid resistance of the vitreous film decrease and it becomes semi-emulsified. The mutual proportion of TiO 2 and ZrO 2 is (TiO 2 )/(ZrO 2 ) weight ratio,
When the ratio is less than 1/5, acid resistance decreases, and when it exceeds 2/1, crystallization occurs. When the total amount of Na 2 O, Li 2 O, and K 2 O exceeds 26 wt%, acid resistance and hot water resistance will decrease significantly, and the thermal expansion coefficient will also exceed 11.0 × 10 -6 /℃. As it gets older, it becomes difficult to bake onto the iron plate, and conversely,
When the content is less than 18wt%, the softening temperature becomes high. And the mutual ratio of Na 2 O and Li 2 O is
When the (Na 2 O)/(Li 2 O) weight ratio is less than 1/1, crystallization occurs and the softening temperature also increases.
The luster caused by firing no longer appears. vice versa,
When the (Na 2 O)/(Li 2 O) weight ratio exceeds 5/1, the softening temperature becomes high and the acid resistance and hot water resistance of the resulting glassy film deteriorate. Also,
When the (K 2 O)/(Na 2 O) weight ratio exceeds 3/1, the coefficient of thermal expansion exceeds 11.0×10 -6 /℃,
In addition, acid resistance also deteriorates. When the fluoride exceeds 5.0 wt% in terms of F2 , it becomes semi-emulsified, and when it becomes less than 1.5 wt%, the softening temperature increases and the luster caused by firing no longer appears. Glass compositions consisting of the above components can also achieve the intended purpose, but in order to further improve chemical resistance, MgO, CaO, SrO, BaO, ZnO
At least one metal oxide selected from the group consisting of and Al 2 O 3 can be added. The appropriate amount of addition is 0.5 to 5.0 wt% relative to 100 wt% of the glass (mother glass) before addition. If the amount is less than 0.5wt%, no effect is observed, and if it exceeds 5.0wt%, the softening temperature of the glass increases and the glass becomes prone to devitrification. I can't expect much. In the low melting point glass composition according to the present invention, the mother glass has the above-mentioned composition of 97 wt% or more of the composition excluding water, and MoO 3 and/or WO 3 is 0.5 to 0. 7.0wt
%, i.e. 0.5 to 7.0wt for 100wt of mother glass
It is starting to be added. The reason is as follows. That is, MoO 3 and WO 3 exhibit similar properties and are particularly effective in significantly improving acid resistance. If the addition of one or two of these types is less than 0.5wt%, there will be little effect;
On the other hand, if it exceeds 7.0 wt%, the softening temperature becomes significantly high, which is beyond the purpose of this invention. 0.5~
By adding 7.0 wt%, acid resistance can be further improved without raising the firing temperature. In addition, in this invention, for the mother glass
The addition of 0.5 to 7.0 wt% of MoO 3 and/or WO 3 is merely an expression to express the composition ratio; first, a mother glass is made, and then MoO 3 and WO 3 are added. It does not have any meaning or content in terms of the manufacturing process. Therefore, all or part of the elements constituting the above-mentioned fluoride may be Mo and/or W. Therefore, in the composition according to the present invention, the elements constituting the fluoride are derived in whole or in part from the elements constituting each of the above-mentioned oxides listed as constituent components of the mother glass, as well as MoO 3 , WO 3 is derived from the elements constituting Mo and W, and is usually derived from a combination of both. Next, the raw materials for the low melting point glass composition of the present invention will be explained. The raw materials for the components constituting the low melting point glass composition of this invention include raw materials that produce oxides of the aforementioned components or mixtures of these oxides by firing, or materials that produce fluorides of some of the oxides of the aforementioned components by firing. Any raw material may be used as long as it generates fluorine for the purpose of oxidation. Such materials include, for example, silicic anhydride, sodium carbon, sodium sulfate, sodium chloride, sodium silicate, boric acid, sodium borate, lithium carbonate, zirconium oxide, titanium oxide, zirconium silicate, sodium fluoride, Lithium fluoride, sodium silicate, molybdenum oxide, tungsten oxide,
Calcium carbonate, magnesium carbonate, alumina,
Zinc oxide, strontium carbonate, barium carbonate, etc. are used. Next, a method for producing a transparent low-melting glass composition according to the present invention will be explained. That is,
The low melting point glass composition of this invention is produced as follows. (1) Select appropriate raw materials from the above raw materials, and thoroughly grind and mix them at room temperature, heating if necessary. Of course, the glass may be melted without pulverization and mixing. (2) The above mixture is heated and fired in a furnace to melt and vitrify it. (3) At the final stage of glass melting, 1
Allow to melt for ~4 hours. Stir in between if necessary. (4) In addition, when melting the glass, pre-firing may be performed if necessary. For example, when sodium carbonate and boric acid are used, the raw materials are first thoroughly mixed and reacted at room temperature. At this time, heat if necessary.
Next, the mixture is dehydrated while reacting at 150 to 500°C for 1 to 3 hours. In this way a solid is obtained. Next, crush it. Next, the glass melting described in (3) above is performed. In this way, dehydration and decarbonation hardly occur during glass melting, and therefore no boiling over from the inside of the crucible occurs, which is safe and convenient. (5) In addition to the above, when raw materials containing water, carbonates, or ammonium salts are used, it is preferable to perform pre-calcination as described in (4) above before melting. (6) Either throw the molten glass into water and cool it quickly.
Pour onto a thick iron plate to cool. (7) The obtained glass can be processed by pot mill, vibration mill,
Finely grind it using a grinder. In this way, the desired low melting point glass composition is obtained. Next, the case where a substrate such as a thin iron plate is coated with the glass composition obtained in this manner will be described. That is, in the case of dry glazing, the glass composition is mixed with a pigment, and in the case of wet glazing, pigments, additives such as carboxymethylcellulose, gum arabic, etc. are added as necessary according to conventional methods, and the composition is made into a water-based slip and glazed. However, if necessary, after drying, it is fired at a temperature of 700°C or less. The above explanation describes an example in which an enameled product is manufactured by coating a thin iron plate with the low melting point glass composition of the present invention, but the low melting point glass composition of the present invention can be applied to other materials other than thin iron plates. Of course, it is also possible to coat substrates made of other materials. As described above, since the low melting point glass composition according to the present invention has a low firing temperature of 700°C or less, there is almost no thermal deformation of the thin iron plate when baking it, and the enamel has high dimensional accuracy. They can manufacture products. Moreover, this glass composition makes it possible to form a glassy film that is even more excellent in terms of surface performance, especially acid resistance. Furthermore, since the glass composition of the present invention does not contain harmful or expensive substances, it does not cause problems such as toxicity and is inexpensive. Next, examples will be described together with comparative examples. The raw materials were mixed to have the composition shown in Table 1. Note that Table 1 (Part 1) is based on wt% display, and Table 1 (Part 2) is based on mol% display. In Table 1, the amounts of additives represent the proportion to the mother glass.

【衚】【table】

【衚】 ぀ぎに、以䞊の原材料配合物を1300℃に蚭定し
た電気炉においおアルミナる぀がを甚いお溶融し
た。そしお玄時間枅柄し、぀いで氎䞭に投入し
たのち急冷しポツトミルで粉砕しお䜎融点ガラス
組成物を埗た。埗られた䜎融点ガラス組成物の物
性は第衚のずおりであ぀た。そしお、埗られた
ガラス組成物粉末状に察しお分散剀および氎
を添加しおスリツプ化し、䞋釉を塗装・焌成した
薄物鉄板に塗装しお同衚に瀺す焌成条件で焌成し
ガラス質皮膜を圢成した。このようにしおほうろ
う補品が埗られた。埗られたほうろう補品のガラ
ス質皮膜の性胜は第衚のずおりであ぀た。な
お、䞋釉の配合は 䞋釉フリツト2236日本プロヌ瀟補 20 〃 2240 〃  80 ケむ石  粘土  亜硝酞゜ヌダ 0.5 であり、焌成は750℃分で行぀た。
[Table] Next, the above raw material mixture was melted using an alumina crucible in an electric furnace set at 1300°C. The mixture was clarified for about 2 hours, then poured into water, rapidly cooled, and crushed in a pot mill to obtain a low melting point glass composition. The physical properties of the obtained low melting point glass composition were as shown in Table 2. Then, a dispersant and water are added to the obtained glass composition (powdered form) to form a slip, which is coated on a thin iron plate that has been painted and fired with a lower glaze, and then fired under the firing conditions shown in the table to form a glassy product. A film was formed. An enameled product was thus obtained. The performance of the glassy film of the obtained enamel product was as shown in Table 2. The composition of the lower glaze was 20 parts of lower glaze frit #2236 (manufactured by Nippon Fellow Co., Ltd.), 80 parts of #2240, 5 parts of silica, 5 parts of clay, and 0.5 parts of sodium nitrite, and firing was performed at 750°C for 5 minutes.

【衚】【table】

〔発明の効果〕〔Effect of the invention〕

この発明にかかる䜎融点ガラス組成物は、以䞊
のように構成されおいるため、衚面性胜にすぐれ
たガラス皮膜を䜜るこずができる。
Since the low melting point glass composition according to the present invention is configured as described above, a glass film with excellent surface performance can be produced.

【図面の簡単な説明】[Brief explanation of drawings]

図面は薄物鉄板の焌成枩床ず熱倉圢量の関係を
説明する説明図である。
The drawing is an explanatory diagram illustrating the relationship between the firing temperature and the amount of thermal deformation of a thin iron plate.

Claims (1)

【特蚱請求の範囲】  SiO2 52〜62wt B2O3 〜13wt TiO2ZrO2 〜14wt Na2OLi2OK2O 18〜26wt 〔ただし、 TiO2ZrO2重量比〜 Na2OLi2O重量比〜 K2ONa2O重量比を越え
以䞋〕 からなるガラス組成物を母ガラスずし、この母ガ
ラスに察しおMoO3およびたたはWO3が0.5〜
7.0wt添加され、か぀、䞊蚘酞化物の䞀郚がF2
に換算しお1.5〜5.0wtだけフツ化物に眮換され
おなる䜎融点ガラス組成物。 (2) SiO2 52〜62wt B2O3 〜13wt TiO2ZrO2 〜14wt Na2OLi2OK2O 18〜26wt 〔ただし、 TiO2ZrO2重量比〜 Na2OLi2O重量比〜 K2ONa2O重量比以䞊以
䞋〕 からなる母ガラスに察し、MgOCaOSrO
BaOZnOおよびAl2O3からなる矀から遞ばれた
少なくずも䞀぀の金属酞化物が0.5〜5.0wt添加
されるずずもにMoO3およびたたはWO3が0.5
〜7.0wt添加され、か぀、䞊蚘酞化物の䞀郚が
F2に換算しお1.5〜5.0wtだけフツ化物に眮換さ
れおなる䜎融点ガラス組成物。
[Claims] 1 SiO 2 ; 52 to 62 wt% B 2 O 3 ; 7 to 13 wt% TiO 2 +ZrO 2 ; 7 to 14 wt% Na 2 O + Li 2 O + K 2 O; 18 to 26 wt% [However, (TiO 2 )/(ZrO 2 ) weight ratio; 1/5 to 2/1 (Na 2 O)/(Li 2 O) weight ratio; 1/1 to 5/1 (K 2 O)/(Na 2 O) weight ratio ;Over 0 3/1
A glass composition consisting of
7.0wt% is added, and part of the above oxide is F 2
A low melting point glass composition in which only 1.5 to 5.0 wt% of fluoride is substituted. (2) SiO 2 ; 52 to 62 wt% B 2 O 3 ; 7 to 13 wt% TiO 2 + ZrO 2 ; 7 to 14 wt% Na 2 O + Li 2 O + K 2 O; 18 to 26 wt% [However, (TiO 2 )/(ZrO 2 ) Weight ratio; 1/5 to 2/1 (Na 2 O)/(Li 2 O) weight ratio; 1/1 to 5/1 (K 2 O)/(Na 2 O) weight ratio; 0 or more 3 /1 or less] MgO, CaO, SrO,
At least one metal oxide selected from the group consisting of BaO, ZnO and Al 2 O 3 is added at 0.5 to 5.0 wt%, and MoO 3 and/or WO 3 is added at 0.5 wt%.
~7.0wt% is added, and some of the above oxides are
A low melting point glass composition in which 1.5 to 5.0 wt% of F2 is substituted with fluoride.
JP13837285A 1985-06-25 1985-06-25 Low melting point glass composition Granted JPS61295258A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP13837285A JPS61295258A (en) 1985-06-25 1985-06-25 Low melting point glass composition

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP13837285A JPS61295258A (en) 1985-06-25 1985-06-25 Low melting point glass composition

Publications (2)

Publication Number Publication Date
JPS61295258A JPS61295258A (en) 1986-12-26
JPH0366266B2 true JPH0366266B2 (en) 1991-10-16

Family

ID=15220391

Family Applications (1)

Application Number Title Priority Date Filing Date
JP13837285A Granted JPS61295258A (en) 1985-06-25 1985-06-25 Low melting point glass composition

Country Status (1)

Country Link
JP (1) JPS61295258A (en)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100632001B1 (en) 2005-07-29 2006-10-09 삌성전Ʞ죌식회사 Glass composition for low temperature sintering, glass frit, dielectric composition and multilayer ceramic capacitor using the same
CN104030569A (en) * 2014-06-30 2014-09-10 莵州省兎仁县荣凯五金搪瓷制品有限公叞 Nickel base porcelain glaze for sintered metal drum and production method thereof

Also Published As

Publication number Publication date
JPS61295258A (en) 1986-12-26

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