JPH0366266B2 - - Google Patents
Info
- Publication number
- JPH0366266B2 JPH0366266B2 JP13837285A JP13837285A JPH0366266B2 JP H0366266 B2 JPH0366266 B2 JP H0366266B2 JP 13837285 A JP13837285 A JP 13837285A JP 13837285 A JP13837285 A JP 13837285A JP H0366266 B2 JPH0366266 B2 JP H0366266B2
- Authority
- JP
- Japan
- Prior art keywords
- glass composition
- weight ratio
- glass
- added
- melting point
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 239000011521 glass Substances 0.000 claims description 55
- 239000000203 mixture Substances 0.000 claims description 54
- 238000002844 melting Methods 0.000 claims description 26
- 230000008018 melting Effects 0.000 claims description 23
- 229910010413 TiO 2 Inorganic materials 0.000 claims description 14
- 229910018068 Li 2 O Inorganic materials 0.000 claims description 13
- KRHYYFGTRYWZRS-UHFFFAOYSA-M Fluoride anion Chemical compound [F-] KRHYYFGTRYWZRS-UHFFFAOYSA-M 0.000 claims description 9
- 229910004298 SiO 2 Inorganic materials 0.000 claims description 6
- 229910052708 sodium Inorganic materials 0.000 claims description 5
- 229910018072 Al 2 O 3 Inorganic materials 0.000 claims description 4
- 229910044991 metal oxide Inorganic materials 0.000 claims description 4
- 150000004706 metal oxides Chemical class 0.000 claims description 4
- 150000002222 fluorine compounds Chemical group 0.000 claims description 3
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 26
- 239000002253 acid Substances 0.000 description 17
- 238000010304 firing Methods 0.000 description 14
- 229910052742 iron Inorganic materials 0.000 description 13
- 239000011734 sodium Substances 0.000 description 13
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 11
- 239000002994 raw material Substances 0.000 description 10
- 210000003298 dental enamel Anatomy 0.000 description 9
- XLOMVQKBTHCTTD-UHFFFAOYSA-N Zinc monoxide Chemical compound [Zn]=O XLOMVQKBTHCTTD-UHFFFAOYSA-N 0.000 description 8
- 239000000758 substrate Substances 0.000 description 6
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 5
- 239000000463 material Substances 0.000 description 5
- 229910000831 Steel Inorganic materials 0.000 description 4
- MCMNRKCIXSYSNV-UHFFFAOYSA-N Zirconium dioxide Chemical compound O=[Zr]=O MCMNRKCIXSYSNV-UHFFFAOYSA-N 0.000 description 4
- 230000007423 decrease Effects 0.000 description 4
- 239000010959 steel Substances 0.000 description 4
- 239000011787 zinc oxide Substances 0.000 description 4
- KKCBUQHMOMHUOY-UHFFFAOYSA-N Na2O Inorganic materials [O-2].[Na+].[Na+] KKCBUQHMOMHUOY-UHFFFAOYSA-N 0.000 description 3
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 description 3
- 239000010960 cold rolled steel Substances 0.000 description 3
- 238000002425 crystallisation Methods 0.000 description 3
- 230000008025 crystallization Effects 0.000 description 3
- 230000000694 effects Effects 0.000 description 3
- 238000004519 manufacturing process Methods 0.000 description 3
- 239000000126 substance Substances 0.000 description 3
- VTYYLEPIZMXCLO-UHFFFAOYSA-L Calcium carbonate Chemical compound [Ca+2].[O-]C([O-])=O VTYYLEPIZMXCLO-UHFFFAOYSA-L 0.000 description 2
- FUJCRWPEOMXPAD-UHFFFAOYSA-N Li2O Inorganic materials [Li+].[Li+].[O-2] FUJCRWPEOMXPAD-UHFFFAOYSA-N 0.000 description 2
- CDBYLPFSWZWCQE-UHFFFAOYSA-L Sodium Carbonate Chemical compound [Na+].[Na+].[O-]C([O-])=O CDBYLPFSWZWCQE-UHFFFAOYSA-L 0.000 description 2
- 239000004115 Sodium Silicate Substances 0.000 description 2
- FAPWRFPIFSIZLT-UHFFFAOYSA-M Sodium chloride Chemical compound [Na+].[Cl-] FAPWRFPIFSIZLT-UHFFFAOYSA-M 0.000 description 2
- 239000000654 additive Substances 0.000 description 2
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 2
- QVQLCTNNEUAWMS-UHFFFAOYSA-N barium oxide Inorganic materials [Ba]=O QVQLCTNNEUAWMS-UHFFFAOYSA-N 0.000 description 2
- 238000009835 boiling Methods 0.000 description 2
- KGBXLFKZBHKPEV-UHFFFAOYSA-N boric acid Chemical compound OB(O)O KGBXLFKZBHKPEV-UHFFFAOYSA-N 0.000 description 2
- 239000004327 boric acid Substances 0.000 description 2
- 235000010338 boric acid Nutrition 0.000 description 2
- 239000011248 coating agent Substances 0.000 description 2
- 238000000576 coating method Methods 0.000 description 2
- XUCJHNOBJLKZNU-UHFFFAOYSA-M dilithium;hydroxide Chemical compound [Li+].[Li+].[OH-] XUCJHNOBJLKZNU-UHFFFAOYSA-M 0.000 description 2
- 238000004534 enameling Methods 0.000 description 2
- 238000010438 heat treatment Methods 0.000 description 2
- PQXKHYXIUOZZFA-UHFFFAOYSA-M lithium fluoride Chemical compound [Li+].[F-] PQXKHYXIUOZZFA-UHFFFAOYSA-M 0.000 description 2
- 239000002932 luster Substances 0.000 description 2
- 239000000049 pigment Substances 0.000 description 2
- 239000000377 silicon dioxide Substances 0.000 description 2
- PUZPDOWCWNUUKD-UHFFFAOYSA-M sodium fluoride Chemical compound [F-].[Na+] PUZPDOWCWNUUKD-UHFFFAOYSA-M 0.000 description 2
- LPXPTNMVRIOKMN-UHFFFAOYSA-M sodium nitrite Chemical compound [Na+].[O-]N=O LPXPTNMVRIOKMN-UHFFFAOYSA-M 0.000 description 2
- NTHWMYGWWRZVTN-UHFFFAOYSA-N sodium silicate Chemical compound [Na+].[Na+].[O-][Si]([O-])=O NTHWMYGWWRZVTN-UHFFFAOYSA-N 0.000 description 2
- 229910052911 sodium silicate Inorganic materials 0.000 description 2
- 229920002134 Carboxymethyl cellulose Polymers 0.000 description 1
- PXGOKWXKJXAPGV-UHFFFAOYSA-N Fluorine Chemical compound FF PXGOKWXKJXAPGV-UHFFFAOYSA-N 0.000 description 1
- 229920000084 Gum arabic Polymers 0.000 description 1
- 241000978776 Senegalia senegal Species 0.000 description 1
- PMZURENOXWZQFD-UHFFFAOYSA-L Sodium Sulfate Chemical compound [Na+].[Na+].[O-]S([O-])(=O)=O PMZURENOXWZQFD-UHFFFAOYSA-L 0.000 description 1
- GWBWGPRZOYDADH-UHFFFAOYSA-N [C].[Na] Chemical compound [C].[Na] GWBWGPRZOYDADH-UHFFFAOYSA-N 0.000 description 1
- 239000000205 acacia gum Substances 0.000 description 1
- 235000010489 acacia gum Nutrition 0.000 description 1
- 238000010306 acid treatment Methods 0.000 description 1
- 150000007513 acids Chemical class 0.000 description 1
- 239000003513 alkali Substances 0.000 description 1
- 150000003863 ammonium salts Chemical class 0.000 description 1
- AYJRCSIUFZENHW-DEQYMQKBSA-L barium(2+);oxomethanediolate Chemical compound [Ba+2].[O-][14C]([O-])=O AYJRCSIUFZENHW-DEQYMQKBSA-L 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 229910021538 borax Inorganic materials 0.000 description 1
- 229910052793 cadmium Inorganic materials 0.000 description 1
- 238000001354 calcination Methods 0.000 description 1
- 229910000019 calcium carbonate Inorganic materials 0.000 description 1
- 150000004649 carbonic acid derivatives Chemical class 0.000 description 1
- 239000001768 carboxy methyl cellulose Substances 0.000 description 1
- 235000010948 carboxy methyl cellulose Nutrition 0.000 description 1
- 239000008112 carboxymethyl-cellulose Substances 0.000 description 1
- 239000004927 clay Substances 0.000 description 1
- 229910052681 coesite Inorganic materials 0.000 description 1
- 230000000052 comparative effect Effects 0.000 description 1
- 239000000470 constituent Substances 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 229910052906 cristobalite Inorganic materials 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- 230000018044 dehydration Effects 0.000 description 1
- 238000006297 dehydration reaction Methods 0.000 description 1
- 238000004031 devitrification Methods 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 239000002270 dispersing agent Substances 0.000 description 1
- 238000001035 drying Methods 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 239000003344 environmental pollutant Substances 0.000 description 1
- 238000002474 experimental method Methods 0.000 description 1
- 239000011737 fluorine Substances 0.000 description 1
- 229910052731 fluorine Inorganic materials 0.000 description 1
- BDAGIHXWWSANSR-NJFSPNSNSA-N hydroxyformaldehyde Chemical compound O[14CH]=O BDAGIHXWWSANSR-NJFSPNSNSA-N 0.000 description 1
- 229910052745 lead Inorganic materials 0.000 description 1
- XGZVUEUWXADBQD-UHFFFAOYSA-L lithium carbonate Chemical compound [Li+].[Li+].[O-]C([O-])=O XGZVUEUWXADBQD-UHFFFAOYSA-L 0.000 description 1
- 229910052808 lithium carbonate Inorganic materials 0.000 description 1
- ZLNQQNXFFQJAID-UHFFFAOYSA-L magnesium carbonate Chemical compound [Mg+2].[O-]C([O-])=O ZLNQQNXFFQJAID-UHFFFAOYSA-L 0.000 description 1
- 239000001095 magnesium carbonate Substances 0.000 description 1
- 229910000021 magnesium carbonate Inorganic materials 0.000 description 1
- 238000002156 mixing Methods 0.000 description 1
- 239000006060 molten glass Substances 0.000 description 1
- 229910052750 molybdenum Inorganic materials 0.000 description 1
- 229910000476 molybdenum oxide Inorganic materials 0.000 description 1
- QGLKJKCYBOYXKC-UHFFFAOYSA-N nonaoxidotritungsten Chemical compound O=[W]1(=O)O[W](=O)(=O)O[W](=O)(=O)O1 QGLKJKCYBOYXKC-UHFFFAOYSA-N 0.000 description 1
- 230000003647 oxidation Effects 0.000 description 1
- 238000007254 oxidation reaction Methods 0.000 description 1
- PQQKPALAQIIWST-UHFFFAOYSA-N oxomolybdenum Chemical compound [Mo]=O PQQKPALAQIIWST-UHFFFAOYSA-N 0.000 description 1
- RVTZCBVAJQQJTK-UHFFFAOYSA-N oxygen(2-);zirconium(4+) Chemical compound [O-2].[O-2].[Zr+4] RVTZCBVAJQQJTK-UHFFFAOYSA-N 0.000 description 1
- 230000000704 physical effect Effects 0.000 description 1
- 231100000719 pollutant Toxicity 0.000 description 1
- 238000010298 pulverizing process Methods 0.000 description 1
- 238000011160 research Methods 0.000 description 1
- 238000012827 research and development Methods 0.000 description 1
- 235000012239 silicon dioxide Nutrition 0.000 description 1
- 229910052709 silver Inorganic materials 0.000 description 1
- 229910000029 sodium carbonate Inorganic materials 0.000 description 1
- 239000011780 sodium chloride Substances 0.000 description 1
- 235000002639 sodium chloride Nutrition 0.000 description 1
- 239000011775 sodium fluoride Substances 0.000 description 1
- 235000013024 sodium fluoride Nutrition 0.000 description 1
- 235000010288 sodium nitrite Nutrition 0.000 description 1
- 235000019794 sodium silicate Nutrition 0.000 description 1
- 229910052938 sodium sulfate Inorganic materials 0.000 description 1
- 235000011152 sodium sulphate Nutrition 0.000 description 1
- 235000010339 sodium tetraborate Nutrition 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
- 238000003756 stirring Methods 0.000 description 1
- 229910052682 stishovite Inorganic materials 0.000 description 1
- 229910000018 strontium carbonate Inorganic materials 0.000 description 1
- OGIDPMRJRNCKJF-UHFFFAOYSA-N titanium oxide Inorganic materials [Ti]=O OGIDPMRJRNCKJF-UHFFFAOYSA-N 0.000 description 1
- 230000001988 toxicity Effects 0.000 description 1
- 231100000419 toxicity Toxicity 0.000 description 1
- 230000009466 transformation Effects 0.000 description 1
- 229910052905 tridymite Inorganic materials 0.000 description 1
- BSVBQGMMJUBVOD-UHFFFAOYSA-N trisodium borate Chemical compound [Na+].[Na+].[Na+].[O-]B([O-])[O-] BSVBQGMMJUBVOD-UHFFFAOYSA-N 0.000 description 1
- 229910052721 tungsten Inorganic materials 0.000 description 1
- 229910001930 tungsten oxide Inorganic materials 0.000 description 1
- 229910001928 zirconium oxide Inorganic materials 0.000 description 1
- GFQYVLUOOAAOGM-UHFFFAOYSA-N zirconium(iv) silicate Chemical compound [Zr+4].[O-][Si]([O-])([O-])[O-] GFQYVLUOOAAOGM-UHFFFAOYSA-N 0.000 description 1
Landscapes
- Glass Compositions (AREA)
Description
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[Technical Field] The present invention relates to a low-melting glass composition, particularly a glass composition that is transparent, has excellent acid resistance, and is resistant to defects such as reboiling, and is used as a frit for enamel. [Background technology] Conventional enamel frits are baked onto a substrate at 800 to 850°C, and a glassy film with excellent surface properties (acid resistance, alkali resistance, boiling resistance, weather resistance, etc.) is baked onto the substrate. It can be formed into However, since the firing temperature is quite high,
When baking a thin iron plate or the like, the amount of thermal deformation of the thin iron plate increases, resulting in poor dimensional accuracy of the resulting enamel product. In order to solve this problem, it was considered to use glass frit with a low melting point as a frit for enamel, but such frit is harmful because it contains large amounts of pollutants such as Pb, Cd, and Ag. , and because Ag and the like are expensive, it had the disadvantage of being expensive. Moreover, the surface properties of the glassy coating formed by such frits are much worse than those formed by the above-mentioned enamel frits, so that they can hardly be put to practical use. [Object of the Invention] The present invention has been made in view of the above circumstances, and an object thereof is to provide a low-melting point glass composition that forms a glassy film with excellent surface performance. [Disclosure of the Invention] The inventors believe that in order to develop a frit that can be baked onto a substrate with a large amount of thermal deformation, such as a thin iron plate, it is first necessary to know its thermal deformation characteristics. , I did the following: That is, thin iron plates such as general cold-rolled steel plates and enameled steel plates with a thickness of 1 mm were heated at 700°C, 800°C, and 890°C for 10 minutes each, and the amount of thermal deformation in each case was determined. The results are shown in the drawing. In the figure, curve A is a thermal deformation curve of a general cold-rolled steel plate with a thickness of 1 mm, and curve B is a thermal deformation curve of a steel plate for enameling. As is clear from curves A and B, there is almost no thermal deformation when the heating temperature is 700°C, whether it is a general cold-rolled steel plate or a steel plate for enameling, and the amount of thermal deformation increases when the temperature exceeds the transformation point of iron (720°C). Recognize. On the other hand, from the viewpoint of surface performance, there has recently been an increasing demand for enamel with even better acid resistance. Examples include storage tanks, acid-resistant containers, or enameled IC boards that are in constant contact with strong acids. Since enamel IC boards are to be incorporated into various devices, it is important to make the steel plate particularly thin and lightweight, and it is desirable to eliminate thermal deformation caused by firing as much as possible. Furthermore, since the substrate is often subjected to acid treatment during circuit formation, it can be said that this material is required to have particularly strong acid resistance. Based on the above findings, the inventors then developed a vitreous film that does not contain harmful substances, is inexpensive, and has even better surface performance and acid resistance.
We believed that it was necessary to conduct research and development of glass compositions that could be formed by firing at temperatures below 700°C, and conducted various experiments and research. the result,
We have discovered that such a purpose can be achieved with a glass composition having the composition shown below, and hereby,
completed this invention. That is, the first invention includes SiO 2 ; 52 to 62 wt% (weight) B 2 O 3 ; 7 to 13 wt% TiO 2 +ZrO 2 ; 7 to 14 wt% Na 2 O + Li 2 O + K 2 O; 18 to 26 wt% [However, , (TiO 2 )/(ZrO 2 ) weight ratio; 1/5 to 2/1 (Na 2 O)/(Li 2 O) weight ratio; 1/1 to 5/1 (K 2 O)/(Na 2 O) Weight ratio: over 0 and 3/1
A glass composition consisting of
7.0wt% is added, and part of the above oxide is F 2
The gist is a low melting point glass composition in which fluoride is substituted by 1.5 to 5.0 wt% in terms of fluoride. The second invention is as follows: SiO 2 ; 52 to 62 wt% B 2 O 3 ; 7 to 13 wt% TiO 2 + ZrO 2 ; 7 to 14 wt% Na 2 O + Li 2 O + K 2 O; 18 to 26 wt% [However, (TiO 2 ) /( ZrO2 ) weight ratio; 1/5 to 2/1 ( Na2O )/( Li2O ) weight ratio; 1/1 to 5/1 ( K2O )/( Na2O ) weight ratio; 0 or more and 3/1 or less] MgO, CaO, SrO,
At least one metal oxide selected from the group consisting of BaO, ZnO and Al 2 O 3 is added at 0.5 to 5.0 wt%, and MoO 3 and/or WO 3 is added at 0.5 wt%.
~7.0wt% is added, and some of the above oxides are
The gist of the present invention is a low melting point glass composition in which fluoride is substituted by 1.5 to 5.0 wt% in terms of F2 . Note that the glass compositions of the first and second inventions correspond to the following glass compositions whose compositions are expressed in mol%. That is, in the first invention, SiO2 ; 56 to 63 mol% B2O3 ; 6 to 10 mol% TiO2 + ZrO2 ; 5 to 10 mol% Na2O + Li2O + K2O ; 23 to 26 mol% [ However, (TiO 2 )/(ZrO 2 ) molar ratio; 1/3 to 3/1 (Na 2 O)/(Li 2 O) molar ratio; 2/3 to 4/1 (K 2 O)/(Na 2 O) molar ratio; over 0 4/1
A glass composition consisting of
5.0 mol% is added, and some of the above oxides are
The second invention corresponds to a low melting point glass composition in which fluoride is substituted by 3 to 7 mol% in terms of F 2 , SiO 2 ; 56 to 63 mol % B 2 O 3 ; 6 to 10 Mol% TiO 2 + ZrO 2 ; 5 to 10 mol % Na 2 O + Li 2 O + K 2 O; 23 to 26 mol % [However, (TiO 2 )/(ZrO 2 ) molar ratio; 1/3 to 3/1 (Na 2 MgO , CaO , SrO,
At least one metal oxide selected from the group consisting of BaO, ZnO and Al 2 O 3 is added in an amount of 0.5 to 5.0 mol %, and MoO 3 and/or WO 3 are added.
This corresponds to a low melting point glass composition in which fluoride is added in an amount of 0.5 to 5.0 mol %, and a portion of the above oxide is replaced with a fluoride by 3 to 7 mol % in terms of F 2 . Below, these two inventions will be explained in detail. In this invention, the reason why the composition is limited as described above is as follows. That is, when SiO 2 exceeds 62 wt%, the softening temperature of the glass composition becomes high, and firing at 700° C. is no longer possible. On the other hand, if the content is less than 52 wt%, the acid resistance and hot water resistance of the resulting glassy film will be significantly reduced. When B 2 O 3 exceeds 13 wt%, the acid resistance and hot water resistance of the resulting glassy film decrease, and when it becomes less than 7 wt%, the softening temperature of the glass composition increases. When the total amount of TiO 2 and ZrO 2 exceeds 14 wt%, the softening temperature of the glass composition becomes high, crystallization occurs, and the composition becomes opalescent, resulting in loss of transparency. Conversely, when the content is less than 7 wt%, the hot water resistance and acid resistance of the vitreous film decrease and it becomes semi-emulsified. The mutual proportion of TiO 2 and ZrO 2 is (TiO 2 )/(ZrO 2 ) weight ratio,
When the ratio is less than 1/5, acid resistance decreases, and when it exceeds 2/1, crystallization occurs. When the total amount of Na 2 O, Li 2 O, and K 2 O exceeds 26 wt%, acid resistance and hot water resistance will decrease significantly, and the thermal expansion coefficient will also exceed 11.0 Ã 10 -6 /â. As it gets older, it becomes difficult to bake onto the iron plate, and conversely,
When the content is less than 18wt%, the softening temperature becomes high. And the mutual ratio of Na 2 O and Li 2 O is
When the (Na 2 O)/(Li 2 O) weight ratio is less than 1/1, crystallization occurs and the softening temperature also increases.
The luster caused by firing no longer appears. vice versa,
When the (Na 2 O)/(Li 2 O) weight ratio exceeds 5/1, the softening temperature becomes high and the acid resistance and hot water resistance of the resulting glassy film deteriorate. Also,
When the (K 2 O)/(Na 2 O) weight ratio exceeds 3/1, the coefficient of thermal expansion exceeds 11.0Ã10 -6 /â,
In addition, acid resistance also deteriorates. When the fluoride exceeds 5.0 wt% in terms of F2 , it becomes semi-emulsified, and when it becomes less than 1.5 wt%, the softening temperature increases and the luster caused by firing no longer appears. Glass compositions consisting of the above components can also achieve the intended purpose, but in order to further improve chemical resistance, MgO, CaO, SrO, BaO, ZnO
At least one metal oxide selected from the group consisting of and Al 2 O 3 can be added. The appropriate amount of addition is 0.5 to 5.0 wt% relative to 100 wt% of the glass (mother glass) before addition. If the amount is less than 0.5wt%, no effect is observed, and if it exceeds 5.0wt%, the softening temperature of the glass increases and the glass becomes prone to devitrification. I can't expect much. In the low melting point glass composition according to the present invention, the mother glass has the above-mentioned composition of 97 wt% or more of the composition excluding water, and MoO 3 and/or WO 3 is 0.5 to 0. 7.0wt
%, i.e. 0.5 to 7.0wt for 100wt of mother glass
It is starting to be added. The reason is as follows. That is, MoO 3 and WO 3 exhibit similar properties and are particularly effective in significantly improving acid resistance. If the addition of one or two of these types is less than 0.5wt%, there will be little effect;
On the other hand, if it exceeds 7.0 wt%, the softening temperature becomes significantly high, which is beyond the purpose of this invention. 0.5~
By adding 7.0 wt%, acid resistance can be further improved without raising the firing temperature. In addition, in this invention, for the mother glass
The addition of 0.5 to 7.0 wt% of MoO 3 and/or WO 3 is merely an expression to express the composition ratio; first, a mother glass is made, and then MoO 3 and WO 3 are added. It does not have any meaning or content in terms of the manufacturing process. Therefore, all or part of the elements constituting the above-mentioned fluoride may be Mo and/or W. Therefore, in the composition according to the present invention, the elements constituting the fluoride are derived in whole or in part from the elements constituting each of the above-mentioned oxides listed as constituent components of the mother glass, as well as MoO 3 , WO 3 is derived from the elements constituting Mo and W, and is usually derived from a combination of both. Next, the raw materials for the low melting point glass composition of the present invention will be explained. The raw materials for the components constituting the low melting point glass composition of this invention include raw materials that produce oxides of the aforementioned components or mixtures of these oxides by firing, or materials that produce fluorides of some of the oxides of the aforementioned components by firing. Any raw material may be used as long as it generates fluorine for the purpose of oxidation. Such materials include, for example, silicic anhydride, sodium carbon, sodium sulfate, sodium chloride, sodium silicate, boric acid, sodium borate, lithium carbonate, zirconium oxide, titanium oxide, zirconium silicate, sodium fluoride, Lithium fluoride, sodium silicate, molybdenum oxide, tungsten oxide,
Calcium carbonate, magnesium carbonate, alumina,
Zinc oxide, strontium carbonate, barium carbonate, etc. are used. Next, a method for producing a transparent low-melting glass composition according to the present invention will be explained. That is,
The low melting point glass composition of this invention is produced as follows. (1) Select appropriate raw materials from the above raw materials, and thoroughly grind and mix them at room temperature, heating if necessary. Of course, the glass may be melted without pulverization and mixing. (2) The above mixture is heated and fired in a furnace to melt and vitrify it. (3) At the final stage of glass melting, 1
Allow to melt for ~4 hours. Stir in between if necessary. (4) In addition, when melting the glass, pre-firing may be performed if necessary. For example, when sodium carbonate and boric acid are used, the raw materials are first thoroughly mixed and reacted at room temperature. At this time, heat if necessary.
Next, the mixture is dehydrated while reacting at 150 to 500°C for 1 to 3 hours. In this way a solid is obtained. Next, crush it. Next, the glass melting described in (3) above is performed. In this way, dehydration and decarbonation hardly occur during glass melting, and therefore no boiling over from the inside of the crucible occurs, which is safe and convenient. (5) In addition to the above, when raw materials containing water, carbonates, or ammonium salts are used, it is preferable to perform pre-calcination as described in (4) above before melting. (6) Either throw the molten glass into water and cool it quickly.
Pour onto a thick iron plate to cool. (7) The obtained glass can be processed by pot mill, vibration mill,
Finely grind it using a grinder. In this way, the desired low melting point glass composition is obtained. Next, the case where a substrate such as a thin iron plate is coated with the glass composition obtained in this manner will be described. That is, in the case of dry glazing, the glass composition is mixed with a pigment, and in the case of wet glazing, pigments, additives such as carboxymethylcellulose, gum arabic, etc. are added as necessary according to conventional methods, and the composition is made into a water-based slip and glazed. However, if necessary, after drying, it is fired at a temperature of 700°C or less. The above explanation describes an example in which an enameled product is manufactured by coating a thin iron plate with the low melting point glass composition of the present invention, but the low melting point glass composition of the present invention can be applied to other materials other than thin iron plates. Of course, it is also possible to coat substrates made of other materials. As described above, since the low melting point glass composition according to the present invention has a low firing temperature of 700°C or less, there is almost no thermal deformation of the thin iron plate when baking it, and the enamel has high dimensional accuracy. They can manufacture products. Moreover, this glass composition makes it possible to form a glassy film that is even more excellent in terms of surface performance, especially acid resistance. Furthermore, since the glass composition of the present invention does not contain harmful or expensive substances, it does not cause problems such as toxicity and is inexpensive. Next, examples will be described together with comparative examples. The raw materials were mixed to have the composition shown in Table 1. Note that Table 1 (Part 1) is based on wt% display, and Table 1 (Part 2) is based on mol% display. In Table 1, the amounts of additives represent the proportion to the mother glass.
ã衚ããtableã
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äžéããªããïŒ2236ïŒæ¥æ¬ããšããŒç€Ÿè£œïŒ 20
ã ïŒ2240ïŒ ã ïŒ 80
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ã§ãããçŒæã¯750âïŒåã§è¡ã€ãã[Table] Next, the above raw material mixture was melted using an alumina crucible in an electric furnace set at 1300°C. The mixture was clarified for about 2 hours, then poured into water, rapidly cooled, and crushed in a pot mill to obtain a low melting point glass composition. The physical properties of the obtained low melting point glass composition were as shown in Table 2. Then, a dispersant and water are added to the obtained glass composition (powdered form) to form a slip, which is coated on a thin iron plate that has been painted and fired with a lower glaze, and then fired under the firing conditions shown in the table to form a glassy product. A film was formed. An enameled product was thus obtained. The performance of the glassy film of the obtained enamel product was as shown in Table 2. The composition of the lower glaze was 20 parts of lower glaze frit #2236 (manufactured by Nippon Fellow Co., Ltd.), 80 parts of #2240, 5 parts of silica, 5 parts of clay, and 0.5 parts of sodium nitrite, and firing was performed at 750°C for 5 minutes.
ã衚ããtableã
ãã®çºæã«ãããäœèç¹ã¬ã©ã¹çµæç©ã¯ã以äž
ã®ããã«æ§æãããŠãããããè¡šé¢æ§èœã«ããã
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Since the low melting point glass composition according to the present invention is configured as described above, a glass film with excellent surface performance can be produced.
å³é¢ã¯èç©éæ¿ã®çŒææž©åºŠãšç±å€åœ¢éã®é¢ä¿ã
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The drawing is an explanatory diagram illustrating the relationship between the firing temperature and the amount of thermal deformation of a thin iron plate.
Claims (1)
以äžã ãããªãã¬ã©ã¹çµæç©ãæ¯ã¬ã©ã¹ãšãããã®æ¯ã¬
ã©ã¹ã«å¯ŸããŠMoO3ããã³ïŒãŸãã¯WO3ã0.5ã
7.0wtïŒ æ·»å ããããã€ãäžèšé žåç©ã®äžéšãF2
ã«æç®ããŠ1.5ã5.0wtïŒ ã ãããåç©ã«çœ®æãã
ãŠãªãäœèç¹ã¬ã©ã¹çµæç©ã (2) SiO2 ïŒ52ã62wtïŒ B2O3 ïŒïŒã13wtïŒ TiO2ïŒZrO2 ïŒïŒã14wtïŒ Na2OïŒLi2OïŒK2O ïŒ18ã26wtïŒ ããã ãã ïŒTiO2ïŒïŒïŒZrO2ïŒé鿝ïŒïŒïŒïŒãïŒïŒïŒ ïŒNa2OïŒïŒïŒLi2OïŒé鿝ïŒïŒïŒïŒãïŒïŒïŒ ïŒK2OïŒïŒïŒNa2OïŒé鿝ïŒïŒä»¥äžïŒïŒïŒä»¥
äžã ãããªãæ¯ã¬ã©ã¹ã«å¯ŸããMgOïŒCaOïŒSrOïŒ
BaOïŒZnOããã³Al2O3ãããªã矀ããéžã°ãã
å°ãªããšãäžã€ã®éå±é žåç©ã0.5ã5.0wtïŒ æ·»å
ããããšãšãã«MoO3ããã³ïŒãŸãã¯WO3ã0.5
ã7.0wtïŒ æ·»å ããããã€ãäžèšé žåç©ã®äžéšã
F2ã«æç®ããŠ1.5ã5.0wtïŒ ã ãããåç©ã«çœ®æã
ããŠãªãäœèç¹ã¬ã©ã¹çµæç©ã[Claims] 1 SiO 2 ; 52 to 62 wt% B 2 O 3 ; 7 to 13 wt% TiO 2 +ZrO 2 ; 7 to 14 wt% Na 2 O + Li 2 O + K 2 O; 18 to 26 wt% [However, (TiO 2 )/(ZrO 2 ) weight ratio; 1/5 to 2/1 (Na 2 O)/(Li 2 O) weight ratio; 1/1 to 5/1 (K 2 O)/(Na 2 O) weight ratio ;Over 0 3/1
A glass composition consisting of
7.0wt% is added, and part of the above oxide is F 2
A low melting point glass composition in which only 1.5 to 5.0 wt% of fluoride is substituted. (2) SiO 2 ; 52 to 62 wt% B 2 O 3 ; 7 to 13 wt% TiO 2 + ZrO 2 ; 7 to 14 wt% Na 2 O + Li 2 O + K 2 O; 18 to 26 wt% [However, (TiO 2 )/(ZrO 2 ) Weight ratio; 1/5 to 2/1 (Na 2 O)/(Li 2 O) weight ratio; 1/1 to 5/1 (K 2 O)/(Na 2 O) weight ratio; 0 or more 3 /1 or less] MgO, CaO, SrO,
At least one metal oxide selected from the group consisting of BaO, ZnO and Al 2 O 3 is added at 0.5 to 5.0 wt%, and MoO 3 and/or WO 3 is added at 0.5 wt%.
~7.0wt% is added, and some of the above oxides are
A low melting point glass composition in which 1.5 to 5.0 wt% of F2 is substituted with fluoride.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP13837285A JPS61295258A (en) | 1985-06-25 | 1985-06-25 | Low melting point glass composition |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP13837285A JPS61295258A (en) | 1985-06-25 | 1985-06-25 | Low melting point glass composition |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS61295258A JPS61295258A (en) | 1986-12-26 |
| JPH0366266B2 true JPH0366266B2 (en) | 1991-10-16 |
Family
ID=15220391
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP13837285A Granted JPS61295258A (en) | 1985-06-25 | 1985-06-25 | Low melting point glass composition |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS61295258A (en) |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR100632001B1 (en) | 2005-07-29 | 2006-10-09 | ìŒì±ì Ʞ죌ìíì¬ | Glass composition for low temperature sintering, glass frit, dielectric composition and multilayer ceramic capacitor using the same |
| CN104030569A (en) * | 2014-06-30 | 2014-09-10 | 莵å·çå Žä»å¿è£å¯äºéæªç·å¶åæéå ¬åž | Nickel base porcelain glaze for sintered metal drum and production method thereof |
-
1985
- 1985-06-25 JP JP13837285A patent/JPS61295258A/en active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS61295258A (en) | 1986-12-26 |
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