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JPH0367354B2 - - Google Patents
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JPH0367354B2 - - Google Patents

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Publication number
JPH0367354B2
JPH0367354B2 JP59076933A JP7693384A JPH0367354B2 JP H0367354 B2 JPH0367354 B2 JP H0367354B2 JP 59076933 A JP59076933 A JP 59076933A JP 7693384 A JP7693384 A JP 7693384A JP H0367354 B2 JPH0367354 B2 JP H0367354B2
Authority
JP
Japan
Prior art keywords
substrate
thick film
nozzle
discharge hole
distance
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP59076933A
Other languages
Japanese (ja)
Other versions
JPS60219792A (en
Inventor
Shinichi Kudo
Yukio Maeda
Hachiro Nakamichi
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Panasonic Holdings Corp
Original Assignee
Matsushita Electric Industrial Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Matsushita Electric Industrial Co Ltd filed Critical Matsushita Electric Industrial Co Ltd
Priority to JP59076933A priority Critical patent/JPS60219792A/en
Publication of JPS60219792A publication Critical patent/JPS60219792A/en
Publication of JPH0367354B2 publication Critical patent/JPH0367354B2/ja
Granted legal-status Critical Current

Links

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  • Manufacturing Of Printed Wiring (AREA)

Description

【発明の詳細な説明】[Detailed description of the invention]

産業上の利用分野 本発明はラジオ受信機、テレビ受像機、通信機
計測機などに用いることのできる厚膜回路の製造
装置に関するものである。 従来例の構成とその問題点 従来、厚膜回路は一般にスルリーン印刷法によ
り導体ペースト、抵抗ペーストなどを基板上に所
望の形状となるように形成し、その後、乾燥、焼
成して製造していた。しかしスクリーン印刷法は
マスクパターンを利用するため、マスクパターン
の交換と、マスクパターン、スキージの洗浄に時
間がかかり、小ロツトの生産および品種の切替が
多い場合には不向きであつた。 これに対して、マスクパターンを使用しないで
ノズルより直接ペーストを押し出し、移動する基
板上にペーストを描画する方法が考え出され提案
されている。この描画法において、描画した線の
膜厚を均一にするためには基板に「そり」や「ね
じれ」があつても吐出孔と基板との間隔を一定に
する必要がある。そのため基板表面の凹凸状態を
レーザー測長、超音波測長、エアーマイクロ測
長、静電容量測長などの測定法により測定し、そ
の結果を描画ノズルを保持する描画ヘツドにフイ
ードバツクしてこの描画ヘツドを吐出孔と基板と
の間隔を一定にするように上下動させる計測法が
ある。他には第1図に示すようにノズル先端に触
片3を取付け、この触片3を基板5に当接させて
吐出孔2と基板5との間隔を触片3の高さhで一
定にさせる方法も考案されている。しかしなが
ら、いずれの方法でも吐出孔と基板との間隔を一
定にしても吐出孔2の幅l(第2図に示す)が変
化すると第1表に示す通り、膜厚tも変化すると
いう問題があつた。これは吐出孔2の幅lが大き
くなると吐出孔2の中央部と端部のペースト流速
の差が大きくなり、端部に比べて中央部の膜厚が
厚くなつてしまうことに起因していることが発明
者の研究で明らかになつた。
INDUSTRIAL APPLICATION FIELD The present invention relates to a thick film circuit manufacturing apparatus that can be used in radio receivers, television receivers, communication equipment measuring instruments, and the like. Conventional structure and its problems Traditionally, thick film circuits were generally produced by forming conductor paste, resistor paste, etc. into the desired shape on a substrate using the Surleen printing method, and then drying and baking. . However, since the screen printing method uses a mask pattern, it takes time to replace the mask pattern and to clean the mask pattern and the squeegee, making it unsuitable for small-lot production or when there are many product changes. In response, a method has been devised and proposed in which the paste is directly extruded from a nozzle without using a mask pattern, and the paste is drawn on a moving substrate. In this drawing method, in order to make the film thickness of drawn lines uniform, it is necessary to keep the distance between the discharge hole and the substrate constant even if the substrate is "warped" or "twisted". Therefore, the unevenness of the substrate surface is measured using measurement methods such as laser length measurement, ultrasonic length measurement, air micro length measurement, and capacitance length measurement, and the results are fed back to the drawing head that holds the drawing nozzle to perform this drawing. There is a measurement method in which the head is moved up and down so as to keep the distance between the discharge hole and the substrate constant. In addition, as shown in Fig. 1, a contact piece 3 is attached to the tip of the nozzle, and this contact piece 3 is brought into contact with the substrate 5, so that the distance between the discharge hole 2 and the substrate 5 is kept constant at the height h of the contact piece 3. Methods have also been devised to make this happen. However, in either method, even if the distance between the discharge hole and the substrate is kept constant, if the width l of the discharge hole 2 (shown in Figure 2) changes, the film thickness t also changes, as shown in Table 1. It was hot. This is because as the width l of the discharge hole 2 increases, the difference in paste flow velocity between the center and the ends of the discharge hole 2 increases, resulting in a thicker film at the center than at the ends. This was revealed by the inventor's research.

【表】 このため厚膜ペーストの線幅を変える目的で吐
出孔の幅を変えると膜厚も変化して電気的特性が
ばらつく原因になつていた。また単一ノズルを用
いて反復描画することにより膜厚を一定にして線
幅を変えることも提案されているが、描画速度が
遅く量産性に欠けるといる欠点があつた。 発明の目的 本発明は前記従来の欠点を解消し、電気的特性
の安定したかつ量産性の優れた厚膜回路の描画方
法を提供することにある。 発明の構成 本発明は先端に厚膜ペーストを吐出する吐出孔
を有する描画ノズルを、前記吐出孔と基板との間
隔を保持しつつ基板に対して相対的に移動させて
厚膜回路を描画する方法において、前記吐出孔の
幅に応じて前記吐出孔と基板との間隔を変えた複
数の描画ノズルを用いることにより、線幅の異な
るパターンを均一な膜厚でかつ反復することなく
一回の描画で形成できるようにした厚膜回路の描
画方法である。 実施例の説明 第2図、第3図、第4図にもとづき本発明の一
実施例を説明する。吐出孔2の幅lが異なる3種
類の描画ノズル1a,1b,1cがノズル切換部
12に設置され、これがノズル昇降部11に固定
され、さらにX−Y駆動装置のY軸駆動部7を介
してX軸駆動部13に固定されている。描画ノズ
ル1a,1b,1cは厚膜ペースト4を吐出する
ため、空気圧による加圧が行われ、電磁弁6によ
り加圧・除圧を制御している。基板5は上下動可
能な基板固定台8に真空吸着されソレノイドコイ
ル9により描画ノズルへの加圧力を発生してい
る。10はマイクロプロセツサーを内臓した制御
装置で描画ノズル1a,1b,1cの切換え、電
磁弁6の開閉および基板固定台8の上下動を制御
している。描画ノズル1a,1b,1cの先端に
は厚膜ペースト4を吐出するスリツト状の吐出孔
(W=0.1mm、l=1.0mmまたは2.0mmまたは30mm)
2が設けられ、その描画方向に対して前方に長方
形のダイヤモンドチツプ3が接着されている。 さて基板5に厚膜回路を描画するには、描画ノ
ズル1a,1b,1cのいずれかを選択し、基板
5に対してダイヤモンドチツプ3が当るように降
下させ、ついでX軸駆動部13またはY軸駆動部
7のうち少なくとも一方を作用させ描画ノズルを
移動させる。このとき同時に厚膜ペースト4が吐
出され描画回路14が形成されるように、予め設
定されたタイミングで電磁弁6を開き、描画ノズ
ル内を空気圧にて加圧する。次いで電磁弁6を閉
じて厚膜ペースト4の吐出を中止するのと略同時
に描画ノズル1aあるいは1bまたは1cを上昇
させ、所望の長さになるようにする。なお基板固
定台8のダイヤモンドチツプ3への押付け力はソ
レノイドコイル9に加える電力によつて調節して
おり、実施例では約50gになるように制定してい
る。以下の方法で描画を行つた結果、第2表に示
すように吐出孔2の幅lが変化してもダイヤモン
ドチツプ3の高さhを変えることで一定の膜厚を
得ることができた。これは、吐出孔中央部と端部
のペーストの流速の差をhを変えることにより均
一化できたためと考えられる。
[Table] For this reason, if the width of the discharge hole was changed in order to change the line width of the thick film paste, the film thickness would also change, causing variations in electrical characteristics. It has also been proposed to keep the film thickness constant and change the line width by repeating drawing using a single nozzle, but this method has the drawback of slow drawing speed and lack of mass productivity. OBJECTS OF THE INVENTION It is an object of the present invention to provide a method for drawing a thick film circuit which has stable electrical characteristics and is excellent in mass production by eliminating the above-mentioned conventional drawbacks. Structure of the Invention The present invention draws a thick film circuit by moving a drawing nozzle having a discharge hole at its tip for discharging thick film paste relative to a substrate while maintaining a distance between the discharge hole and the substrate. In this method, by using a plurality of drawing nozzles in which the distance between the discharge hole and the substrate is changed according to the width of the discharge hole, patterns with different line widths can be printed in a single film with a uniform thickness and without repetition. This is a drawing method for thick film circuits that can be formed by drawing. DESCRIPTION OF EMBODIMENTS An embodiment of the present invention will be described based on FIGS. 2, 3, and 4. Three types of drawing nozzles 1a, 1b, 1c with different widths l of the discharge holes 2 are installed in the nozzle switching section 12, fixed to the nozzle elevating section 11, and further connected via the Y-axis drive section 7 of the X-Y drive device. and is fixed to the X-axis drive section 13. In order to discharge the thick film paste 4, the drawing nozzles 1a, 1b, and 1c are pressurized by air pressure, and pressurization and depressurization are controlled by a solenoid valve 6. The substrate 5 is vacuum-adsorbed by a substrate fixing table 8 which can be moved up and down, and a solenoid coil 9 generates a pressing force to the drawing nozzle. Reference numeral 10 denotes a control device incorporating a microprocessor, which controls the switching of the drawing nozzles 1a, 1b, and 1c, the opening and closing of the electromagnetic valve 6, and the vertical movement of the substrate fixing table 8. The tips of the drawing nozzles 1a, 1b, and 1c have slit-shaped discharge holes (W=0.1 mm, l=1.0 mm or 2.0 mm or 30 mm) for discharging the thick film paste 4.
2 is provided, and a rectangular diamond chip 3 is bonded in front of the diamond chip 3 in the drawing direction. Now, in order to draw a thick film circuit on the substrate 5, select one of the drawing nozzles 1a, 1b, and 1c, lower it so that the diamond chip 3 touches the substrate 5, and then At least one of the shaft drive units 7 is operated to move the drawing nozzle. At this time, the electromagnetic valve 6 is opened at a preset timing and the inside of the drawing nozzle is pressurized with air pressure so that the thick film paste 4 is simultaneously discharged and the drawing circuit 14 is formed. Next, the electromagnetic valve 6 is closed to stop discharging the thick film paste 4, and at the same time, the drawing nozzle 1a, 1b, or 1c is raised to obtain a desired length. The pressing force of the substrate fixing table 8 against the diamond chip 3 is adjusted by the electric power applied to the solenoid coil 9, and is set to about 50 g in the embodiment. As a result of drawing using the following method, as shown in Table 2, even if the width l of the discharge hole 2 was changed, a constant film thickness could be obtained by changing the height h of the diamond chip 3. This is thought to be because the difference in the flow velocity of the paste between the center and the end of the discharge hole could be made uniform by changing h.

【表】 ここで本実施例の範囲内では吐出口の幅lと高
さhは大略逆比較的な相関性があるが、適正な膜
厚tを得るためにはhは10〜80μmの範囲が好ま
しく、10μm未満では膜厚が薄くなり過ぎ、また
80μmより大きいと膜厚が厚くなり過ぎ、いずれ
の場合も抵抗値などの所望する電気的特性が得ら
れない。なお実施例では吐出孔がスリツト状の描
画ノズルを用いたが他に円形、だ円形などの吐出
孔であつてもよい。また基板と吐出孔との間隔を
ダイヤモンドチツプの接触法により安定化する方
法をもちいたが、前述の計測法を用いてもよい。 発明の効果 以上説明したように、本発明によれば、それぞ
れ適正な基板と吐出孔との間隔を有する吐出孔の
幅の異なる複数の描画ノズルを用いることによ
り、線幅の異なる描画回路を均一な膜厚で、かつ
反復描画することなく一回の描画で高速で形成で
きるという優れた効果があり電気的特性の安定
化、量産性の向上という点で工業的利用価値は大
きい。
[Table] Here, within the scope of this example, the width l and height h of the ejection port have a roughly inverse correlation, but in order to obtain an appropriate film thickness t, h should be in the range of 10 to 80 μm. is preferable; if it is less than 10 μm, the film thickness will be too thin, or
If it is larger than 80 μm, the film thickness becomes too thick, and in either case, desired electrical characteristics such as resistance value cannot be obtained. In the embodiment, a drawing nozzle with a slit-shaped discharge hole is used, but the discharge hole may be circular, oval, or the like. Further, although a method of stabilizing the distance between the substrate and the discharge hole by a diamond chip contact method was used, the above-mentioned measurement method may also be used. Effects of the Invention As described above, according to the present invention, by using a plurality of drawing nozzles each having an appropriate distance between the substrate and the ejection hole and having different widths of ejection holes, drawing circuits having different line widths can be uniformly drawn. It has the excellent effect of being able to form a film with a certain thickness and at high speed with a single drawing without repeating the drawing, and has great industrial value in terms of stabilizing electrical characteristics and improving mass productivity.

【図面の簡単な説明】[Brief explanation of drawings]

第1図は代表的な描画法を示す断面図、第2図
はその斜視図、第3図は本発明の一実施例を示す
系統図、第4図は本発明の一実施例における描画
ノズル部の断面図である。 1……描画ノズル、2……吐出孔、3……ダイ
ヤモンドチツプ、4……厚膜ペースト、5……基
板、6……電磁弁、7……Y軸駆動部、8……基
板固定台、9……ソレノイドコイル、10……制
御装置、11……ノズル昇降部、12……ノズル
切換部、13……X軸駆動部、14……描画回
路。
Fig. 1 is a sectional view showing a typical drawing method, Fig. 2 is a perspective view thereof, Fig. 3 is a system diagram showing an embodiment of the present invention, and Fig. 4 is a drawing nozzle in an embodiment of the present invention. FIG. 1... Drawing nozzle, 2... Discharge hole, 3... Diamond chip, 4... Thick film paste, 5... Substrate, 6... Solenoid valve, 7... Y-axis drive unit, 8... Substrate fixing stand , 9... Solenoid coil, 10... Control device, 11... Nozzle elevating section, 12... Nozzle switching section, 13... X-axis drive section, 14... Drawing circuit.

Claims (1)

【特許請求の範囲】 1 先端に厚膜ペーストを吐出する吐出孔を有す
る描画ノズルを、前記吐出孔と基板との間隔を保
持しつつ基板に対して相対的に移動させて厚膜回
路を描画する方法であつて、前記吐出孔の幅に応
じて前記吐出孔と基板との間隔を変えた複数の描
画ノズルを用いて、基板の表面に厚膜ペーストを
塗布する厚膜回路の描画方法。 2 吐出孔の幅が広くなるにしたがい、吐出孔と
基板との間隔をせまくして塗布する特許請求の範
囲第1項記載の厚膜回路の描画方法。 3 ノズル切換部に複数の描画ノズルを搭載し、
所定の描画位置で使用する描画ノズルを自動的に
選択して描画する特許請求の範囲第1項記載の厚
膜回路の描画方法。
[Claims] 1. Draw a thick film circuit by moving a drawing nozzle having a discharge hole at its tip for discharging thick film paste relative to a substrate while maintaining a distance between the discharge hole and the substrate. A method for drawing a thick film circuit, the method comprising: applying a thick film paste to a surface of a substrate using a plurality of drawing nozzles in which the distance between the ejection hole and the substrate is changed depending on the width of the ejection hole. 2. The method for drawing a thick film circuit according to claim 1, wherein the distance between the ejection hole and the substrate is narrowed as the width of the ejection hole becomes wider. 3 Equipped with multiple drawing nozzles in the nozzle switching section,
A method for drawing a thick film circuit according to claim 1, wherein a drawing nozzle to be used at a predetermined drawing position is automatically selected for drawing.
JP59076933A 1984-04-17 1984-04-17 Method of drawing thick film circuit Granted JPS60219792A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP59076933A JPS60219792A (en) 1984-04-17 1984-04-17 Method of drawing thick film circuit

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP59076933A JPS60219792A (en) 1984-04-17 1984-04-17 Method of drawing thick film circuit

Publications (2)

Publication Number Publication Date
JPS60219792A JPS60219792A (en) 1985-11-02
JPH0367354B2 true JPH0367354B2 (en) 1991-10-22

Family

ID=13619525

Family Applications (1)

Application Number Title Priority Date Filing Date
JP59076933A Granted JPS60219792A (en) 1984-04-17 1984-04-17 Method of drawing thick film circuit

Country Status (1)

Country Link
JP (1) JPS60219792A (en)

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB1603558A (en) * 1978-05-24 1981-11-25 Metal Box Co Ltd Plotting device
JPS5713796A (en) * 1980-06-30 1982-01-23 Tokyo Shibaura Electric Co Method of producing thick film circuit board
JPS57132393A (en) * 1981-02-09 1982-08-16 Tokyo Shibaura Electric Co Method of producing electric circuit board

Also Published As

Publication number Publication date
JPS60219792A (en) 1985-11-02

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