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JPH0370176B2 - - Google Patents
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JPH0370176B2 - - Google Patents

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Publication number
JPH0370176B2
JPH0370176B2 JP19303387A JP19303387A JPH0370176B2 JP H0370176 B2 JPH0370176 B2 JP H0370176B2 JP 19303387 A JP19303387 A JP 19303387A JP 19303387 A JP19303387 A JP 19303387A JP H0370176 B2 JPH0370176 B2 JP H0370176B2
Authority
JP
Japan
Prior art keywords
light
sample
irradiation
irradiated
wavelength
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP19303387A
Other languages
Japanese (ja)
Other versions
JPS6438631A (en
Inventor
Choichi Suga
Yoji Watanabe
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Suga Test Instruments Co Ltd
Original Assignee
Suga Test Instruments Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Suga Test Instruments Co Ltd filed Critical Suga Test Instruments Co Ltd
Priority to JP19303387A priority Critical patent/JPS6438631A/en
Publication of JPS6438631A publication Critical patent/JPS6438631A/en
Publication of JPH0370176B2 publication Critical patent/JPH0370176B2/ja
Granted legal-status Critical Current

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Description

【発明の詳細な説明】 〔産業上の利用分野〕 本発明は各種工業材料や製品が太陽光線にあた
つて劣化する現象を人工的に促進して調べる耐光
試験に関するものである。
DETAILED DESCRIPTION OF THE INVENTION [Field of Industrial Application] The present invention relates to a light resistance test in which the phenomenon of deterioration of various industrial materials and products when exposed to sunlight is investigated by artificially accelerating the phenomenon.

〔従来の技術〕[Conventional technology]

従来の耐光試験は紫外線カーボンアーク灯、サ
ンシヤインカーボンアーク灯、キセノンランプ等
の光を直接試料に照射して試験片に劣化を生じさ
せ、光の照射量と劣化の度合いからその試験片の
耐光性の良否を判定する方法が行われていた。し
かし更に一歩進めて耐光性をより良く改善する研
究のためには劣化を生ずるのは光源のどの波長域
の光が最も強く影響しているのかを知る必要があ
る。この目的のために分光装置を用いて試料に波
長別の光を照射する実験が試みられていたが、本
来耐光試験を目的としたものでないため、照射エ
ネルギーが弱く、耐光性の良否を判定するには照
射時間も長時間を要して、この目的を解決するた
めの装置として不十分なものであつた。
In conventional light resistance tests, the specimen is directly irradiated with light from an ultraviolet carbon arc lamp, sunshine carbon arc lamp, xenon lamp, etc. to cause deterioration of the specimen, and the test piece is evaluated based on the amount of light irradiation and the degree of deterioration. A method was used to determine the quality of light resistance. However, in order to go one step further and conduct research to better improve light resistance, it is necessary to know which wavelength range of light from the light source has the strongest effect on causing deterioration. For this purpose, experiments have been attempted in which a spectroscopic device is used to irradiate a sample with light of different wavelengths, but since it was not originally intended for light resistance testing, the irradiation energy was weak and it was difficult to judge the quality of light resistance. However, the irradiation time required for this purpose was long, and the device was insufficient to solve this purpose.

〔発明が解決しようとする課題〕[Problem to be solved by the invention]

光を波長別に分けて照射するためには分光学上
どうしても光束をスリツトに集めなければなら
ず、スリツトを出た光束を分散素子を通して波長
別の光を分けるとエネルギーは弱くなつてしま
う。しかし耐光試験の目的からすると、なるべく
短時間で劣化が調べられることが望ましいので照
射エネルギーの強いものが望まれていた。又照射
エネルギーを強力にすると熱線が多くなり、装置
内部の機器が熱による影響で正確な測定の限界を
越える状況に置かれ、測定誤差を生じたり測定不
能になつたりするため、この熱による影響を受け
ないように照射エネルギーを強くすることが必要
とされていた。
In order to separate and irradiate light by wavelength, it is necessary for spectroscopy to collect the light beam into a slit, and if the light beam exiting the slit is separated into wavelengths by passing through a dispersion element, the energy becomes weaker. However, for the purpose of light fastness testing, it is desirable to be able to examine deterioration in as short a time as possible, so something with strong irradiation energy was desired. In addition, when the irradiation energy is increased, the number of heat rays increases, and the equipment inside the device is placed in a situation where the influence of heat exceeds the limit of accurate measurement, causing measurement errors or making measurements impossible. It was necessary to increase the irradiation energy so as not to cause damage.

又光源を波長別に分光して用いると、照射面で
のエネルギーは光源の分光特性と分光するための
光学系の特性との合わさつたものとして得られ
る。このため照射面がどれだけ波長別エネルギー
を受けたかがわからないと、劣化した試料の判定
は正確にできない。
Furthermore, when a light source is used by dividing the light into wavelengths, the energy at the irradiation surface is obtained as a combination of the spectral characteristics of the light source and the characteristics of the optical system for performing the spectroscopy. For this reason, unless it is known how much energy the irradiated surface has received for each wavelength, it is not possible to accurately determine whether the sample has deteriorated.

又特性の注目する波長がわかつている場合には
その特定の波長だけを取り出して試料に照射する
ことも耐光試験の研究には重要なことである。
In addition, when the wavelength of interest for a characteristic is known, it is important for light resistance test research to extract only that specific wavelength and irradiate the sample.

このように試料が受光する波長別エネルギーが
確認出来てかつ強い照射エネルギーを有し、照射
光による熱の影響を受けず、短時間で劣化判定が
求められるような分光照射装置の出現が望まれて
いた。
In this way, it is hoped that a spectroscopic irradiation device will emerge that can confirm the energy of each wavelength received by the sample, has strong irradiation energy, is not affected by heat from irradiation light, and can determine deterioration in a short time. was.

〔課題を解決するための手段〕[Means to solve the problem]

本願発明は上記のような課題を解決するため
に、分光した光による試料の劣化の波長依存性を
求める装置において、試料に強い光を照射するた
めに照射光を集光する反射鏡を有した光源を設
け、この照射光の焦点位置手前に複数枚の透明板
の間に液体を循環させる熱線吸収フイルターを設
けて照射光の熱を吸収し、この照射光の焦点位置
にスリツトを設け、このスリツトを経た照射光を
回折格子を介して分散して分散光を試料に照射
し、さらにこの分散光の試料照射光路中にハーフ
ミラーを設けて、この分散光の一部の波長別エネ
ルギーを測定するために、微小面受光素子を波長
の分散方向に多数配列して一体とした受光器群に
照射するようにし、又試料に特定の波長の光を照
射するために、試料面直前に設けた試料面と平行
に移動可能な出射スリツトを介して特定波長の光
を取出して試料に照射するように構成することを
手段とした。
In order to solve the above-mentioned problems, the present invention provides an apparatus for determining the wavelength dependence of deterioration of a sample due to separated light, which includes a reflecting mirror that condenses irradiated light in order to irradiate the sample with strong light. A light source is provided, a heat ray absorption filter that circulates a liquid between multiple transparent plates is provided in front of the focal point of this irradiated light to absorb the heat of the irradiated light, a slit is provided at the focal point of this irradiated light, and this slit is The irradiated light is dispersed through a diffraction grating to irradiate the sample with the dispersed light, and a half mirror is installed in the sample irradiation optical path of this dispersed light to measure the energy of each wavelength of a part of this dispersed light. In order to irradiate the sample with light of a specific wavelength, a large number of microsurface photodetectors are arranged in the wavelength dispersion direction to irradiate the integrated photoreceiver group, and a sample surface provided just in front of the sample surface is used to irradiate the sample with light of a specific wavelength. The method is to extract light of a specific wavelength and irradiate it onto the sample through an output slit that can be moved in parallel with the sample.

〔作用〕[Effect]

上記手段を採用したことにより、反射鏡によつ
て光源の光を効率よくスリツトに集光できるた
め、より強力な光を試料に照射することができ
る。又光源は発熱し照射光の熱線は多くなるが、
熱線吸収フイルターでこの熱を吸収してからスリ
ツトに集光されるため、回折格子などの照射光を
分散するための機器の使用温度範囲を越えること
がないため、熱による影響を受けることがなく、
照射光を安定して分散することができる。又分散
光の試料照射光路中にハーフミラーを設けてこの
分散光の一部を受光器群に照射するようにしたた
め、試料に照射されている波長別のエネルギーを
同時に測定することができる。
By employing the above means, the light from the light source can be efficiently focused on the slit by the reflecting mirror, so that more powerful light can be irradiated onto the sample. Also, the light source generates heat and the number of heat rays from the irradiated light increases,
Since this heat is absorbed by a heat ray absorption filter and then focused on a slit, the temperature does not exceed the operating temperature range of the equipment used to disperse the irradiated light, such as a diffraction grating, so it is not affected by heat. ,
Irradiation light can be stably dispersed. Furthermore, since a half mirror is provided in the sample irradiation optical path of the dispersed light to irradiate a portion of the dispersed light to the photoreceiver group, it is possible to simultaneously measure the energy of each wavelength irradiated to the sample.

さらに特定波長の光を取出して試料に照射する
ことも可能であり、又このエネルギーを測定する
こともできる。
Furthermore, it is also possible to extract light of a specific wavelength and irradiate the sample, and also to measure this energy.

〔実施例〕〔Example〕

以下図面に従つて本発明の実施例を説明する。 Embodiments of the present invention will be described below with reference to the drawings.

(第1実施例) 第1図は本発明の第1実施例を示す構成図であ
る。図において、光源室1は、楕円鏡14を備え
た光源15、この光束を折曲げる平面鏡18、熱
線を吸収する熱線吸収フイルター13などより構
成される。又光源室1に接続した分光室2は、光
源15の焦点位置に配したスリツト12、凹面鏡
3a、回折格子4、凹面鏡3bさらに分光室2外
に配した受光器群6に照射光の一部を送るハーフ
ミラー5などより構成されている。
(First Embodiment) FIG. 1 is a block diagram showing a first embodiment of the present invention. In the figure, the light source chamber 1 is comprised of a light source 15 equipped with an elliptical mirror 14, a plane mirror 18 that bends this light beam, a heat ray absorption filter 13 that absorbs heat rays, and the like. A spectroscopic chamber 2 connected to the light source chamber 1 transmits a portion of the irradiated light to a slit 12 arranged at the focal point of the light source 15, a concave mirror 3a, a diffraction grating 4, a concave mirror 3b, and a receiver group 6 arranged outside the spectroscopic chamber 2. It is composed of a half mirror 5, etc. that sends the information.

さて、光源15は紫外域から近赤外域までの波
長範囲に連続した発光スペクトルを有するもの
で、例えばキセノンシヨートアークランプ等が用
いられる。(本実施例では5Kwのキセノンシヨー
トアークランプを光源とした。)光源の光を集光
した強力な照射光を照射するための反射板として
楕円鏡14を用いている。この楕円鏡14の第1
焦点の位置に光源15の中心がくるように配置す
ると、第2焦点に光源の光束が集光されるのでこ
の位置にスリツト12が配置されている。又この
光束を折曲げて装置全体を出来るだけコンパクト
にまとめるために平面鏡18が第2焦点の手前に
配してある。
Now, the light source 15 has a continuous emission spectrum in the wavelength range from the ultraviolet region to the near infrared region, and for example, a xenon short arc lamp or the like is used. (In this example, a 5Kw xenon short arc lamp was used as the light source.) An elliptical mirror 14 is used as a reflector for irradiating powerful irradiation light that is a condensed light from the light source. The first of this elliptical mirror 14
If the center of the light source 15 is placed at the focal point, the light beam from the light source will be condensed at the second focal point, so the slit 12 is placed at this position. A plane mirror 18 is placed in front of the second focal point in order to bend this light beam and make the entire device as compact as possible.

平面鏡18とスリツト12の間には、照射光の
熱線のみを吸収し、短波長の紫外域の照射光はそ
のまま通過する材料、即ち2枚の透明石英板の間
に液体を循環させ、液体の循環経路の途中に放熱
器(図示せず)を入れてこの放熱器を強制空冷す
ることにより液体が吸収した熱量を放熱させる熱
線吸収フイルター13を置き、スリツト12以降
へは不必要な熱線を通過させないようにしてい
る。ここで上記構成の熱線吸収フイルター13を
を採用したのは、一般に用いられている通常の光
学フイルターからなる熱線吸収フイルターでは熱
線の吸収と同時に試料を劣化させる重要な紫外線
も除去してしまうためである。
Between the plane mirror 18 and the slit 12, a liquid is circulated between two transparent quartz plates, which are materials that absorb only the heat rays of the irradiated light and allow the irradiated light in the short wavelength ultraviolet region to pass through as is. A heat ray absorption filter 13 is placed in the middle of the slit 12 to prevent unnecessary heat rays from passing through the slit 12 and beyond. I have to. The reason why the heat ray absorption filter 13 having the above structure was adopted here is because a commonly used heat ray absorption filter consisting of an ordinary optical filter absorbs heat rays and at the same time removes important ultraviolet rays that degrade the sample. be.

スリツト12を通過した光束は凹面鏡3aによ
り平行光束となり、回折格子4に入射する。ここ
からの反射光は光の波長によつてそれぞれわずか
ずつ異つた方向へ反射され凹面鏡3bによつて試
料7の位置に集光される。ここで試料の照射面に
はスリツト12の開口巾で決まる波長純度の波長
別の光が照射される。
The light beam passing through the slit 12 is turned into a parallel light beam by the concave mirror 3a, and is incident on the diffraction grating 4. The reflected light from here is reflected in slightly different directions depending on the wavelength of the light, and is focused at the position of the sample 7 by the concave mirror 3b. Here, the irradiated surface of the sample is irradiated with light of different wavelengths with wavelength purity determined by the aperture width of the slit 12.

従つて試料7の位置に試験片をセツトして連続
照射すると、試験片の各部分には異つた波長の光
が照射されるので、もし試験片が特定の波長域に
弱い特性があれば、その波長域の光が照射された
部分だけに劣化現象を示すことになり、その試験
片の劣化に及ぼす波長を知ることができるもので
ある。
Therefore, when a test piece is set at the position of sample 7 and irradiated continuously, each part of the test piece is irradiated with light of a different wavelength, so if the test piece has characteristics that are weak in a specific wavelength range, The deterioration phenomenon will be observed only in the area irradiated with light in that wavelength range, and it is possible to know the wavelength that affects the deterioration of the test piece.

試料7の前方にハーフミラー5を配置し、照射
光の一部を折り曲げて照射光系外に取出し照射面
までと等距離の位置に、例えば波長10nm毎の光
を受光できるような微小面受光素子を波長の分散
方向に多数配列して一体として構成した受光器群
6を配してこれに入射させるようになつている。
この受光器群6は、あらかじめ校正された強度比
から照射面での波長別の積算照度値が求められる
ようになつている。又これらの処理は増巾器8、
演算回路9、表示装置10によつて行われ、表示
装置10としてはCRTやプリンターが用いられ
る。
A half mirror 5 is placed in front of the sample 7, and a part of the irradiated light is bent and taken out of the irradiation light system, and a minute surface receiving light is placed at a position equidistant from the irradiation surface and can receive light at wavelengths of, for example, every 10 nm. A photoreceiver group 6, which is integrally constructed by arranging a large number of elements in the direction of wavelength dispersion, is arranged, and the light is made incident thereon.
This photoreceiver group 6 is configured such that the integrated illuminance value for each wavelength on the irradiation surface can be determined from a previously calibrated intensity ratio. In addition, these processes are carried out by the amplifier 8,
This is performed by an arithmetic circuit 9 and a display device 10, and a CRT or a printer is used as the display device 10.

尚、受光器群6は図示の位置だけでなく照射面
の一部に装着出来るようにしておけば、これを取
外して試料7の位置にセツトすれば試験片に照射
されるエネルギーを測定でき、上記のようにあら
かじめ強度比を校正するときの手段となる。
If the receiver group 6 can be attached not only to the position shown in the figure but also to a part of the irradiation surface, the energy irradiated to the test piece can be measured by removing it and setting it at the position of the sample 7. This is a means for calibrating the intensity ratio in advance as described above.

ハーフミラー5は紫外域から近赤外域までの波
長範囲の光を良く透過する材料のものが良く、例
えば透明石英板のようなものが用いられる。又透
過と反射の割合は本発明の目的では照射光そのも
のが強いので、全照射光の数%の反射光を受光器
群6に入射させればよく大部分の光は透過させて
試料7を照射する。
The half mirror 5 is preferably made of a material that easily transmits light in a wavelength range from the ultraviolet region to the near-infrared region, such as a transparent quartz plate. In addition, for the purpose of the present invention, the ratio of transmission and reflection is that the irradiated light itself is strong, so it is sufficient to make a few percent of the reflected light of the total irradiated light enter the receiver group 6, and most of the light is transmitted and the sample 7 is irradiate.

本実施例では波長範囲250nm〜700nm間の光が
照射面上で約9cmの範囲に分散照射され、巾方向
には4cmの巾で同一波長の光が照射されるように
なつている。
In this embodiment, light with a wavelength range of 250 nm to 700 nm is dispersed and irradiated over an area of about 9 cm on the irradiation surface, and light of the same wavelength is irradiated over a width of 4 cm in the width direction.

受光器群6としては例えばシリコンホトセル
(大きさ3×15mm)を並べて用いるとすれば、9
cm間に30個配列出来るので250〜700nmの波長を
割当てると約15nm間隔で各波長の受光量を求め
ることが出来る。
For example, if silicon photocells (size 3 x 15 mm) are used as the receiver group 6, 9
Since 30 pieces can be arranged within cm, by assigning wavelengths from 250 to 700 nm, the amount of light received at each wavelength can be determined at approximately 15 nm intervals.

本実施例では以上説明したものの他に光源15
を点灯させるための起動装置11、電源装置17
があり、図示していないが光源15を冷却するた
めの冷却装置があり冷却ダクト16を通して冷却
が行われる。これらの装置は光源室1に収められ
ている。
In this embodiment, in addition to the light source 15 described above,
A starting device 11 and a power supply device 17 for lighting the
Although not shown, there is a cooling device for cooling the light source 15, and cooling is performed through a cooling duct 16. These devices are housed in a light source chamber 1.

〔第2実施例〕 第2図は本発明の第2実施例を示す構成図であ
る。本実施例は第1実施例の装置で、分光室2に
設けてある試料照射部分を一部変更したものであ
る。図において、分光室2の試料照射部分の外側
にスリツト移動レール20を固定し、これに出射
スリツト19を移動可能に取り付け、スリツト移
動ツマミ21によつて移動レール20上を移動出
来る構造としてある。
[Second Embodiment] FIG. 2 is a block diagram showing a second embodiment of the present invention. This embodiment is the apparatus of the first embodiment, with a part of the sample irradiation part provided in the spectroscopic chamber 2 being modified. In the figure, a slit moving rail 20 is fixed to the outside of the sample irradiation part of the spectroscopic chamber 2, and an exit slit 19 is movably attached to this, so that it can be moved on the moving rail 20 by a slit moving knob 21.

この目的は特定の波長の光だけを取出して試料
7に照射出来るようにしたもので、例えばある特
定波長だけに弱い試料があつた場合、この改良研
究のためにはこの波長域だけの照射が出来れば非
常に有用なものとなるからである。
The purpose of this is to extract only light of a specific wavelength and irradiate it to the sample 7. For example, if there is a sample that is weak only at a specific wavelength, it is necessary to irradiate only this wavelength range for improvement research. This is because it would be extremely useful if possible.

〔実験例〕[Experiment example]

次に本発明の装置を用いて行つた1実験例を説
明する。
Next, an example of an experiment conducted using the apparatus of the present invention will be described.

耐光試験機の光度を試験するための感光紙
(LSP)を用いて照射実験したところ、本発明の
第1実施例の装置では3時間照射で320nmの波長
を中心とする部分に強い退色を示し反射率Y%の
変化で未退色部分がY=20%に対して退色部分で
はY=38%になつていた。
When we conducted an irradiation experiment using light-sensitive paper (LSP) to test the luminosity of a light fastness tester, we found that the device of the first embodiment of the present invention showed strong discoloration in a region centered around a wavelength of 320 nm after 3 hours of irradiation. As a result of the change in reflectance Y%, the unfaded area was Y=20%, while the faded area was Y=38%.

この反射率の変化は約φ1.6mmの測定面積を有す
る測色計で2mmピツチで測定したものでその結果
を第3図の下段に示す。横軸は照射波長を示し縦
軸が反射率Y%である。上段は照射した試料の様
子を概念的に示すものである。
This change in reflectance was measured at a pitch of 2 mm using a colorimeter having a measurement area of about 1.6 mm, and the results are shown in the lower part of FIG. The horizontal axis shows the irradiation wavelength, and the vertical axis shows the reflectance Y%. The upper row conceptually shows the state of the irradiated sample.

上述のLSPは従来の紫外線カーボンアーク灯を
用いた耐光試験機においては、20時間照射でY=
26%程度の変化を示すものである。従つてこれと
比べると本発明の装置は試料の劣化時間を大幅に
短縮することができるものであることがわかる。
The above-mentioned LSP is Y= Y after irradiation for 20 hours in a light resistance tester using a conventional ultraviolet carbon arc lamp.
This shows a change of about 26%. Therefore, compared to this, it can be seen that the apparatus of the present invention can significantly shorten the sample deterioration time.

第4図は本発明の受光器群を用いて上記試料の
3時間照射中における波長別の積算エネルギーを
求めてグラフに示したものである。横軸は波長、
縦軸が積算エネルギー(MJ/m2)を示す。従つ
て今回の実験に用いたLSPの場合には退色の変化
は3200nm付近に最大ピークがあるけれども、照
射されたエネルギーのピークは480nm付近であ
り、320nmのエネルギーはそれよりも半分程度の
エネルギーであることがわかる。
FIG. 4 is a graph showing the integrated energy for each wavelength during 3-hour irradiation of the sample using the photodetector group of the present invention. The horizontal axis is the wavelength,
The vertical axis shows the integrated energy (MJ/m 2 ). Therefore, in the case of the LSP used in this experiment, although the maximum peak of color fading change is around 3200 nm, the peak of the irradiated energy is around 480 nm, and the energy at 320 nm is about half that. I understand that there is something.

このように照射されたエネルギー値がわかるこ
とにより、仮に等エネルギー光で照射されたらど
のような変化が予測できるかの計算や、太陽光の
分布で照射したときの結果を予測計算することが
可能となる。
By knowing the energy value of irradiation in this way, it is possible to calculate what kind of changes can be predicted if it is irradiated with equal energy light, or to predict the results when irradiated with sunlight distribution. becomes.

〔発明の効果〕〔Effect of the invention〕

従つて本発明により従来から分光照射が望まれ
ていながらあまりにも長時間を要するために思う
ような試験が出来なかつた耐光性の研究分野に対
し、試験時間を大幅に短縮できかつ照射された波
長ごとのエネルギー値がわかる、有力な装置を提
供することが出来、今後の工業材料の耐光性の改
善研究に役立つところ大である。
Therefore, with the present invention, in the field of light resistance research, where spectral irradiation has traditionally been desired but has not been possible due to the long time it takes, it is possible to significantly shorten the test time and improve the irradiation wavelength. We are able to provide a powerful device that can determine the energy value of each component, which will be of great help in future research on improving the light resistance of industrial materials.

【図面の簡単な説明】[Brief explanation of drawings]

第1図は本発明の1実施例を示す構成図、第2
図は一部変更した他の実施例を示す部分平面図、
第3図は照射結果の反射率変化を示すグラフと試
料の概念図、第4図は照射実験した時の波長別エ
ネルギー積算値を示すグラフである。 1……光源室、2……分光室、3……凹面鏡、
4……回折格子、5……ハーフミラー、6……受
光器群、7……試料、8……増巾器、9……演算
回路、10……表示装置、11……起動装置、1
2……スリツト、13……熱線吸収フイルター、
14……楕円鏡、15……光源、16……冷却ダ
クト、17……電源装置、18……平面鏡、19
……出射スリツト、20……スリツト移動レー
ル、21……スリツト移動ツマミ、22……光量
試験紙、23……照射部。
FIG. 1 is a configuration diagram showing one embodiment of the present invention, and FIG.
The figure is a partial plan view showing another embodiment with some changes.
FIG. 3 is a graph showing changes in reflectance as a result of irradiation and a conceptual diagram of the sample, and FIG. 4 is a graph showing integrated energy values for each wavelength during an irradiation experiment. 1...Light source room, 2...Spectroscopy room, 3...Concave mirror,
4... Diffraction grating, 5... Half mirror, 6... Light receiver group, 7... Sample, 8... Amplifier, 9... Arithmetic circuit, 10... Display device, 11... Starting device, 1
2...Slit, 13...Heat ray absorption filter,
14...Elliptical mirror, 15...Light source, 16...Cooling duct, 17...Power supply device, 18...Plane mirror, 19
...Emission slit, 20...Slit moving rail, 21...Slit moving knob, 22...Light intensity test paper, 23...Irradiation section.

Claims (1)

【特許請求の範囲】 1 分光した光による試料の劣化の波長依存性を
求める装置において、試料に強い光を照射するた
めに照射光を集光する反射鏡を有した光源を設
け、この照射光の焦点位置手前に複数枚の透明板
の間に液体を循環させる熱線吸収フイルターを設
けて照射光の熱線を吸収し、この照射光の焦点位
置にスリツトを設け、このスリツトを経た照射光
を回折格子を介して分散して分散光を試料に照射
し、さらにこの分散光の試料照射光路中にハーフ
ミラーを設けて、この分散光の一部の波長別エネ
ルギーを測定するために、微小面受光素子を波長
の分散方向に多数配列しして一体とした受光器群
に照射するように構成し、試料に連続した波長別
の光を照射すると共にこの波長別の光のエネルギ
ーを同時に測定可能にすることを特徴とする分光
照射装置。 2 分光した光による試料の劣化の波長依存性を
求める装置において、試料に強い光を照射するた
めに照射光を集光する反射鏡を有した光源を設
け、この照射光の焦点位置手前に複数枚の透明板
の間に液体を循環させる熱線吸収フイルターを設
けて照射光の熱線を吸収し、この照射光の焦点位
置にスリツトを設け、このスリツトを経た照射光
を回折格子を介して分散し、試料面直前に設けた
試料面と平行に移動可能な出射スリツトを介して
特定波長の光を取出して試料に照射し、さらにこ
の分散光の試料照射光路中にハーフミラーを設け
て、この分散光の一部の波長別エネルギーを測定
するために、微小面受光素子を波長の分散方向に
多数配列して一体とした受光器群に照射するよう
に構成し、試料に特定に波長の光を照射すること
を特徴とする分光照射装置。
[Scope of Claims] 1. In an apparatus for determining the wavelength dependence of deterioration of a sample due to spectral light, a light source is provided with a reflecting mirror that condenses the irradiated light in order to irradiate the sample with strong light, and this irradiated light is A heat ray absorption filter that circulates a liquid between multiple transparent plates is provided in front of the focal point of the irradiation light to absorb the heat rays of the irradiation light.A slit is provided at the focal point of this irradiation light, and the irradiation light that has passed through the slit is passed through a diffraction grating. A half mirror is installed in the sample irradiation optical path of this dispersed light, and a micro-surface photodetector is used to measure the energy of each wavelength of a part of this dispersed light. A configuration in which a large number of light receivers are arranged in the wavelength dispersion direction and irradiated onto an integrated photoreceiver group, and the sample is irradiated with continuous light of different wavelengths, and the energy of the light of different wavelengths can be simultaneously measured. A spectroscopic irradiation device featuring: 2. In an apparatus for determining the wavelength dependence of the deterioration of a sample due to separated light, a light source with a reflecting mirror that condenses the irradiated light is installed to irradiate the sample with strong light. A heat ray absorption filter that circulates a liquid between two transparent plates is provided to absorb the heat rays of the irradiation light, a slit is provided at the focal point of this irradiation light, and the irradiation light that has passed through the slit is dispersed through a diffraction grating. Light of a specific wavelength is extracted and irradiated onto the sample through an exit slit that can be moved parallel to the sample surface, which is provided just in front of the surface, and a half mirror is installed in the sample irradiation optical path of this dispersed light. In order to measure the energy of some wavelengths, a large number of microsurface photodetectors are arranged in the direction of wavelength dispersion and configured to irradiate an integrated photoreceiver group, and the sample is irradiated with light of a specific wavelength. A spectral irradiation device characterized by:
JP19303387A 1987-08-01 1987-08-01 Spectral irradiation apparatus Granted JPS6438631A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP19303387A JPS6438631A (en) 1987-08-01 1987-08-01 Spectral irradiation apparatus

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP19303387A JPS6438631A (en) 1987-08-01 1987-08-01 Spectral irradiation apparatus

Publications (2)

Publication Number Publication Date
JPS6438631A JPS6438631A (en) 1989-02-08
JPH0370176B2 true JPH0370176B2 (en) 1991-11-06

Family

ID=16301048

Family Applications (1)

Application Number Title Priority Date Filing Date
JP19303387A Granted JPS6438631A (en) 1987-08-01 1987-08-01 Spectral irradiation apparatus

Country Status (1)

Country Link
JP (1) JPS6438631A (en)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7038196B2 (en) * 2004-02-02 2006-05-02 Atlas Material Testing Technology Llc Accelerated weathering test apparatus with full spectrum calibration, monitoring and control
JP6051296B2 (en) * 2013-04-26 2016-12-27 株式会社日立製作所 Method for evaluating weather resistance of polymer materials
JP6864358B2 (en) * 2017-10-16 2021-04-28 スガ試験機株式会社 Weather resistance tester

Also Published As

Publication number Publication date
JPS6438631A (en) 1989-02-08

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