JPH0370856B2 - - Google Patents
Info
- Publication number
- JPH0370856B2 JPH0370856B2 JP57133450A JP13345082A JPH0370856B2 JP H0370856 B2 JPH0370856 B2 JP H0370856B2 JP 57133450 A JP57133450 A JP 57133450A JP 13345082 A JP13345082 A JP 13345082A JP H0370856 B2 JPH0370856 B2 JP H0370856B2
- Authority
- JP
- Japan
- Prior art keywords
- rotating support
- vapor deposition
- pressure
- magnetic layer
- nip roller
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
Classifications
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
- G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
- G11B5/84—Processes or apparatus specially adapted for manufacturing record carriers
- G11B5/85—Coating a support with a magnetic layer by vapour deposition
Landscapes
- Manufacturing Of Magnetic Record Carriers (AREA)
- Thin Magnetic Films (AREA)
Description
【発明の詳細な説明】
本発明は、高分子生計物基板上に強磁性金属薄
膜を有する磁気記録媒体の製造方法に関する。DETAILED DESCRIPTION OF THE INVENTION The present invention relates to a method for manufacturing a magnetic recording medium having a ferromagnetic metal thin film on a polymeric substrate.
磁気記録分野における記録密度の向上は目覚し
く、従来より理論的にも損失の少ない媒体として
知られている、いわゆる金属薄膜型の磁気記録媒
体が一部オーデイオ用に実用化され、ビデオ用途
でも実用が近いといわれている。 The improvement in recording density in the field of magnetic recording has been remarkable, and some so-called metal thin film magnetic recording media, which are known as media with theoretically less loss than before, have been put into practical use for audio, and are also being put into practical use for video. It is said to be close.
短波長記録に適した媒体を得る上で重要なの
は、高い保磁力で、角形比の良好な磁性層をいか
に高速で得るかということである。 What is important in obtaining a medium suitable for short wavelength recording is how to obtain a magnetic layer with a high coercive force and a good squareness ratio at high speed.
これまで知られている範囲では、回転支持体に
沿つて移動する高分子成形物基板上に、酸素雰囲
気中で斜方蒸着する方法が、実用的である。 As far as is known so far, a practical method is to perform oblique vapor deposition in an oxygen atmosphere on a polymer molded substrate that moves along a rotating support.
本発明は、そのような方法を基礎として、更に
生産性を向上する研究を進めた結果、蒸着後、同
一回転支持体上で、ローラにより磁性層をほぼ等
方的に押圧すると、より性能の良好な磁性層を得
られることを見出したことにもとづきなされたも
のである。 As a result of research to further improve productivity based on such a method, the present invention has found that, after vapor deposition, if the magnetic layer is pressed almost isotropically with a roller on the same rotating support, performance can be improved. This was based on the discovery that a good magnetic layer could be obtained.
同一回転支持体上で押圧することが必ずしも必
要条件ではないが、蒸着後の押圧を別ローラーに
より行う様構成した時にはクラツクが発生する恐
れがあることや、回転支持体と移動する基板の運
動速度が同一でないときに時として起る回転支持
体に接する側の基板面におけるキズの発生などの
不都合を防ぐことからも、同一回転支持体上での
押圧が好ましいといえる。 Although it is not always necessary to press on the same rotating support, there is a risk that cracks may occur if the pressure after vapor deposition is performed using separate rollers, and the speed of movement of the rotating support and the moving substrate may be affected. It can be said that pressing on the same rotating support is preferable in order to prevent problems such as scratches on the substrate surface on the side that contacts the rotating support, which sometimes occurs when the substrates are not the same.
第1図は本発明を実施するために用いた巻取り
蒸着装置の要部構成図である。 FIG. 1 is a block diagram of the main parts of a winding vapor deposition apparatus used to carry out the present invention.
回転支持体1に沿つて、高分子成形物基板2は
送り出し軸3より巻取り軸4へ移動するよう構成
される。蒸着源5としては電子ビーム蒸発源を用
い模式的に示している。 Along the rotary support 1 , the polymer molded substrate 2 is configured to move from a delivery shaft 3 to a winding shaft 4 . As the evaporation source 5, an electron beam evaporation source is used and schematically shown.
入射角規制マスク6により規制された蒸気流7
により、強磁性層が形成される。 Steam flow 7 regulated by incident angle regulation mask 6
A ferromagnetic layer is thus formed.
8は本発明のポイントニツプローラーである。
材質はシリコンゴムかフツ素ゴムが好ましく、表
面粗さは0.2S程度であれば良い。θは、ニツプロ
ーラー8の位置と回転支持体1の軸とを結ぶ線
が、鉛直下方となす角度である。 8 is a point nip roller of the present invention.
The material is preferably silicone rubber or fluorocarbon rubber, and the surface roughness should be about 0.2S. θ is the angle that a line connecting the position of the nip roller 8 and the axis of the rotating support 1 makes with the vertically downward direction.
押圧力は、ゴム硬度と、バネ圧等で調整される
が、第2図に示したように、圧力により強磁性層
の特性向上の効果は異る。 The pressing force is adjusted by the rubber hardness, spring pressure, etc., but as shown in FIG. 2, the effect of improving the characteristics of the ferromagnetic layer differs depending on the pressure.
以下に、より具体的な実施例を説明する。 More specific examples will be described below.
円筒状回転キヤンの直径を50cmと100cmの2種
類について実施した。また、第1図におけるニツ
プローラー8の位置を表わすθについて、θ1=
45°、θ2=80°、θ3=180°の3つの場合に差がある
かどうか調べた。この結果、キヤン直径、あるい
はニツプローラーの位置には殆んど関係なく、圧
力がある値以上あれば良いことが確認された。 The experiment was conducted using two types of cylindrical rotating cans with diameters of 50 cm and 100 cm. Furthermore, regarding θ representing the position of the nip roller 8 in FIG. 1, θ 1 =
It was investigated whether there was a difference between the three cases of 45°, θ 2 =80°, and θ 3 =180°. As a result, it was confirmed that the pressure is sufficient as long as it is at least a certain value, regardless of the can diameter or the position of the nip roller.
第2図は、3×10-5Torrと酸素雰囲気中で
Co85%、Ni15%を最小入射角44°で蒸着した厚さ
0.13μm(基板はポリエチレンテレフタレートフ
イルム、厚さ11μm)の磁性層の特性を示す。 Figure 2 is in an oxygen atmosphere of 3×10 -5 Torr.
Thickness with 85% Co and 15% Ni evaporated at a minimum angle of incidence of 44°
The characteristics of a magnetic layer of 0.13 μm (substrate is polyethylene terephthalate film, thickness 11 μm) are shown.
この場合は300g/cm2以上あれば角形比は1に
なり、保磁力も本発明によらない場合よりも18%
余り大きい値を実現できた。 In this case, if it is 300 g/cm 2 or more, the squareness ratio will be 1, and the coercive force will be 18% compared to the case not according to the present invention.
We were able to achieve a much larger value.
この変化率は、磁性材料、最小入射角にもよる
が、おおむね20%程度の保磁力増が確保できるも
ので、そのメカニズムは明らかではないが、薄膜
形成直後であるため、結晶の整列性、欠陥の増加
等が顕著に誘起されるためとみられる。このこと
を間接的に確かめるため、蒸着後、大気中に取出
して、同様の圧力をかけても、磁気特性は全く変
化しなかつた。 This rate of change depends on the magnetic material and the minimum incident angle, but it can ensure an increase in coercive force of approximately 20%. Although the mechanism is not clear, since it is immediately after the thin film is formed, the alignment of the crystals This seems to be because the number of defects is significantly increased. To indirectly confirm this, after vapor deposition, the material was taken out into the atmosphere and the same pressure was applied, but the magnetic properties did not change at all.
また逆に、蒸着後1秒以内となるような条件を
第1図に示した装置で実現することは実験的には
できるが、実用性はない。(ニツプローラーに蒸
着膜が形成され、その膜がやがてはくりするトラ
ブルが発生したりするので)。確認していないが、
その場合に予測される効果は、第2図の曲線が圧
力の小さい側へシフトするだけと考えられる。 On the other hand, although it is experimentally possible to achieve conditions such that the deposition takes place within 1 second using the apparatus shown in FIG. 1, it is not practical. (A vapor deposited film is formed on the nip roller, which may eventually peel off.) I haven't confirmed it, but
The expected effect in that case would be that the curve in FIG. 2 would simply shift to the side of lower pressure.
θは45°〜180°でも第2図に示した効果は同じ
であつた。実用上はθは120°ぐらいにとればいい
といえる。 The effect shown in FIG. 2 was the same even when θ was between 45° and 180°. In practical terms, it is sufficient to set θ to about 120°.
以上説明したように本発明によると、同一速度
での製造では特性向上がはかれるし、同一特性を
得る時には、最小入射角を小さくして蒸着効率を
大きくできる。 As explained above, according to the present invention, characteristics can be improved when manufacturing at the same speed, and when obtaining the same characteristics, the minimum incident angle can be reduced to increase the vapor deposition efficiency.
第1図は本発明を実施するために用いた巻取蒸
着装置の要部構成例を示す図、第2図はニツプロ
ーラー押圧力と得られる磁気特性の関係を示す図
である。
1……回転支持体、2……基板、5……蒸発
源、8……ニツプローラー。
FIG. 1 is a diagram showing an example of the main part configuration of a winding vapor deposition apparatus used to carry out the present invention, and FIG. 2 is a diagram showing the relationship between the nip roller pressing force and the obtained magnetic properties. DESCRIPTION OF SYMBOLS 1... Rotating support body, 2... Substrate, 5... Evaporation source, 8... Nip roller.
Claims (1)
板上に磁性層を蒸着にて形成し、蒸着直後に上記
回転支持体に沿つた状態でローラにより上記磁性
層を300g/cm2以上の圧力で押圧処理することを
特徴とする磁気記録媒体の製造方法。1. A magnetic layer is formed by vapor deposition on a polymer molded substrate that moves along a rotating support, and immediately after vapor deposition, the magnetic layer is applied with a roller along the rotating support at a pressure of 300 g/cm 2 or more. 1. A method for manufacturing a magnetic recording medium, characterized in that a pressure treatment is carried out.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP57133450A JPS5924447A (en) | 1982-07-29 | 1982-07-29 | Method for manufacturing magnetic recording media |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP57133450A JPS5924447A (en) | 1982-07-29 | 1982-07-29 | Method for manufacturing magnetic recording media |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS5924447A JPS5924447A (en) | 1984-02-08 |
| JPH0370856B2 true JPH0370856B2 (en) | 1991-11-11 |
Family
ID=15105055
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP57133450A Granted JPS5924447A (en) | 1982-07-29 | 1982-07-29 | Method for manufacturing magnetic recording media |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS5924447A (en) |
Family Cites Families (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS6031012B2 (en) * | 1976-08-17 | 1985-07-19 | 松下電器産業株式会社 | Method for manufacturing magnetic recording material |
-
1982
- 1982-07-29 JP JP57133450A patent/JPS5924447A/en active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS5924447A (en) | 1984-02-08 |
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