JPH0372326B2 - - Google Patents
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- Publication number
- JPH0372326B2 JPH0372326B2 JP61248179A JP24817986A JPH0372326B2 JP H0372326 B2 JPH0372326 B2 JP H0372326B2 JP 61248179 A JP61248179 A JP 61248179A JP 24817986 A JP24817986 A JP 24817986A JP H0372326 B2 JPH0372326 B2 JP H0372326B2
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- gas
- adsorption tower
- adsorption
- desorption
- pipe
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Description
【発明の詳細な説明】
[産業上の利用分野]
本発明は高純度ガスの分離製造に利用される圧
力スイング吸着方法に関し、特に脱着回収される
べき製品ガス中の不純成分を極力排除し、高純度
製品ガスとして回収するための圧力スイング吸着
方法に関するものである。以下にはその代表例と
してO2及びN2の混合ガスからN2を高純度に回収
する方法について説明するが本発明方法の適用対
象はこれによつて限定解釈されてはならない。[Detailed Description of the Invention] [Industrial Application Field] The present invention relates to a pressure swing adsorption method used for the separation and production of high-purity gases, and in particular a method for eliminating impurity components in product gases to be desorbed and recovered as much as possible. The present invention relates to a pressure swing adsorption method for recovering high-purity product gas. As a typical example, a method for recovering N 2 with high purity from a mixed gas of O 2 and N 2 will be described below, but the scope of application of the method of the present invention should not be construed as limited by this.
[従来の技術]
加圧空気を圧力スイング吸着装置(以下単に
PSA装置という)に導入してN2ガスを濃縮回収
する方法を大別すると、O2ガスを吸着剤に吸着
させて除去する方法と、N2ガスを吸着剤に吸着
させた後脱着回収する方法の2つに分類される。
このうち後者はゼオライト系の吸着剤を使用し、
N2ガスの吸着後の吸着塔を真空ポンプ等によつ
て減圧することにより高純度N2ガスを脱着回収
する方法であり、以下この方法について説明す
る。[Conventional technology] Pressurized air is transferred to a pressure swing adsorption device (hereinafter simply referred to as
The methods for concentrating and recovering N2 gas by introducing it into a PSA device can be roughly divided into two methods: one is to adsorb O2 gas to an adsorbent and remove it, and the other is to adsorb N2 gas to an adsorbent and then desorb and recover it. It is classified into two methods.
The latter uses a zeolite-based adsorbent,
This is a method of desorbing and recovering high-purity N 2 gas by reducing the pressure of the adsorption tower after adsorbing N 2 gas using a vacuum pump or the like, and this method will be explained below.
第2は3塔式のPSA装置を示す概略説明図で
あつて、図示しない前処理装置の出口側に接続さ
れる原料ガス(加圧空気)供給管1には自動開閉
弁(以下単に弁という)V1〜V3を介して吸着塔
3a,3b,3cが接続され、各塔の底部には弁
V4〜V6を介して排ガス廃棄管4が連結される。
また排ガス廃棄管4の途中(弁V4〜V6介設点よ
り上流側)からは脱着用管5a,5b,5cが分
岐され、それらは弁V7〜V9を介してそれより下
流側で合流される。そして合流された脱着用管5
には真空ポンプ6が設けられて製品ガスホルダ9
に連結される。製品ガスホルダ9には製品ガス回
収管2が設けられると共に、製品ガスの一部を洗
浄用として抜き出す洗浄用管8が配設され、該洗
浄用管8は分岐された後弁V13〜V15を介して吸
着塔3a,3b,3cの各頂部に連結される。尚
各吸着塔3a,3b,3cを直列結合する連結配
管10a,10b,10cが弁V10〜V12を介し
て夫々設けられる。 The second is a schematic explanatory diagram showing a three-column type PSA device, in which an automatic opening/closing valve (hereinafter simply referred to as a valve) is installed in a raw material gas (pressurized air) supply pipe 1 connected to the outlet side of a pretreatment device (not shown). ) Adsorption towers 3a, 3b, 3c are connected via V 1 to V 3 , and a valve is installed at the bottom of each tower.
An exhaust gas waste pipe 4 is connected via V 4 to V 6 .
In addition, desorption pipes 5a, 5b, and 5c are branched from the middle of the exhaust gas waste pipe 4 (upstream from the valves V4 to V6 intervening points), and these are connected to the downstream side via the valves V7 to V9 . will be joined at. And the merged detachment tube 5
A vacuum pump 6 is installed in the product gas holder 9.
connected to. The product gas holder 9 is provided with a product gas recovery pipe 2 as well as a cleaning pipe 8 for extracting a part of the product gas for cleaning, and the cleaning pipe 8 is branched and then connected to valves V 13 to V 15 . It is connected to the tops of adsorption towers 3a, 3b, and 3c via. Incidentally, connection pipes 10a, 10b, 10c connecting the adsorption towers 3a, 3b, 3c in series are provided respectively via valves V10 to V12 .
第3図は、吸着塔3a,3b,3cの作動工程
を示すタイムスケジユールであり、吸着工程開始
時から次回の吸着工程開始時までに行なわれる全
作動を1サイクルとしたとき、1サイクルは吸着
工程、回収工程、洗浄工程及び脱着工程より構成
される。まず吸着工程では脱着された吸着塔内を
加圧すると共に、原料ガスを供給管1から加圧供
給し、回収目的成分のN2ガスを吸着剤に吸着さ
せ不純成分ガス(主にO2ガス)を排ガス廃棄管
4から放出する。又脱着工程では吸着塔と製品ガ
スホルダ9を真空ポンプ6及び脱着用管5を介し
て連通し、吸着塔内を減圧して吸着剤に吸着され
ていたN2を脱着して製品ガスホルダ9に貯留す
る。 FIG. 3 is a time schedule showing the operation process of the adsorption towers 3a, 3b, and 3c. When the entire operation from the start of the adsorption process to the start of the next adsorption process is defined as one cycle, one cycle is the adsorption process. It consists of a process, a recovery process, a cleaning process, and a desorption process. First, in the adsorption process, the interior of the adsorption tower after desorption is pressurized, and the raw material gas is supplied under pressure from the supply pipe 1, and the N 2 gas, which is the target component to be recovered, is adsorbed on the adsorbent, and the impure component gas (mainly O 2 gas) is is released from the exhaust gas waste pipe 4. In addition, in the desorption process, the adsorption tower and the product gas holder 9 are communicated via the vacuum pump 6 and the desorption pipe 5, and the pressure inside the adsorption tower is reduced to desorb the N 2 adsorbed by the adsorbent and store it in the product gas holder 9. do.
また回収工程及び洗浄工程は、吸着塔3aの場
合を例に挙げて説明すると第4図a及びbによつ
て示される。即ち第4図aの状態においては、製
品ガスホルダ9から供給される高純度N2ガスは
洗浄用管8を通つて吸着塔3cの内の残留O2を
追放し、吸着工程の終了した吸着塔3aへ連結配
管10cを介して送り込まれる。その結果吸着塔
3aでは回収工程が行なわれ、吸着塔3cは洗浄
工程が行なわれる。さらに第4図bの状態では、
吸着塔3aは洗浄工程を行ない、吸着塔3bは回
収工程を行なう。 Further, the recovery step and the washing step will be explained using the adsorption tower 3a as an example, as shown in FIGS. 4a and 4b. That is, in the state shown in FIG. 4a, high-purity N 2 gas supplied from the product gas holder 9 passes through the cleaning pipe 8 to expel the residual O 2 in the adsorption tower 3c, and the adsorption tower after the adsorption process is removed. 3a via the connecting pipe 10c. As a result, a recovery process is performed in the adsorption tower 3a, and a cleaning process is performed in the adsorption tower 3c. Furthermore, in the state shown in Figure 4b,
The adsorption tower 3a performs a cleaning process, and the adsorption tower 3b performs a recovery process.
そして第4図bに示した洗浄工程の終了した
後、吸着塔3aは次に脱着工程が行なわれること
になる。 After the cleaning step shown in FIG. 4b is completed, the adsorption tower 3a is then subjected to a desorption step.
[発明が解決しようとする課題]
しかしながらN2ガスの脱着回収に当たつて吸
着塔3a,3b,3cのいずれかを真空ポンプ6
によつて減圧する場合の状況を更に詳しく観察し
てみると、脱着工程が行なわれる吸着塔内のガス
はもとより、当該吸着塔に連接される管内(ただ
し弁によつて遮断される位置まで)に残存するガ
スも一緒に真空ポンプ6側に引込んでしまう(例
えば吸着塔3aの場合を考えたときには第2図に
おいて破線で囲む配管中の残存ガスが問題とな
る)。従つて上記管内に低純度のN2ガスが残存す
る場合には、製品ガスホルダ9へ取り出させる製
品N2ガスの純度が低下してしまうという不具合
を生じる。特に回収工程及び洗浄工程において使
用される連結配管に残存する低純度N2ガスは、
量も多いため、製品N2ガスの純度を低下させる
大きな要因となつている。即ち第2図の例におい
て吸着塔3aを脱着する場合、連結配管10cの
弁V12の下流側部分及び連結配管10aの弁V10
の上流側部分で低純度N2ガスが多く残存してお
り、これらが製品ガス中に混入することになる。[Problem to be solved by the invention] However, when desorbing and recovering N2 gas, one of the adsorption towers 3a, 3b, and 3c is operated by the vacuum pump 6.
If we look in more detail at the situation when the pressure is reduced by The remaining gas is also drawn into the vacuum pump 6 side (for example, when considering the adsorption tower 3a, the remaining gas in the piping surrounded by the broken line in FIG. 2 becomes a problem). Therefore, if low-purity N 2 gas remains in the pipe, a problem arises in that the purity of the product N 2 gas taken out to the product gas holder 9 decreases. In particular, low-purity N2 gas remaining in the connecting pipes used in the recovery process and cleaning process is
Since the amount is large, it is a major factor in reducing the purity of the product N 2 gas. That is, in the example of FIG. 2, when the adsorption tower 3a is desorbed, the downstream portion of the valve V 12 of the connecting pipe 10c and the valve V 10 of the connecting pipe 10a are
A large amount of low-purity N2 gas remains in the upstream portion of the gas, and this will be mixed into the product gas.
そこで本発明者は、脱着工程を実施する前に連
結配管から予め不純成分ガスを排除しておき、脱
着工程に際して高純度製品ガスのみが脱着される
脱着準備システムを開発することを目的に種々研
究を重ねた結果、本発明方法を開発することに成
功した。 Therefore, the present inventor conducted various research with the aim of developing a desorption preparation system in which impurity gases are removed from the connecting pipes before the desorption process, and only high-purity product gas is desorbed during the desorption process. As a result of repeated efforts, we succeeded in developing the method of the present invention.
[課題を解決するための手段]
上記目的を達成し得た本発明方法は、3塔以上
の圧力スイング吸着塔を使用すると共に、各吸着
塔は連結配管によつて直列に接続され、各吸着塔
は少なくとも吸着、回収、洗浄、脱着の各工程を
順に行なう易吸着性成分の分離方法において、脱
着工程を行なう直前の吸着塔における回収工程に
使用された連結配管と、既に脱着工程の終了した
後の他の吸着塔を、バイパス管を介して連通せし
め、前記連結配管中に残存するガスを圧力差によ
り、前記脱着工程の終了した後の他の吸着塔へ導
入する浄化工程を含む点を要旨とするものであ
る。[Means for Solving the Problems] The method of the present invention that has achieved the above object uses three or more pressure swing adsorption towers, each adsorption tower is connected in series by a connecting pipe, and each adsorption tower is In a method for separating easily adsorbable components in which at least the steps of adsorption, recovery, washing, and desorption are carried out in sequence, the column is used to connect the connecting piping used in the recovery step in the adsorption tower immediately before the desorption step and the connection piping used in the recovery step in the adsorption tower immediately before the desorption step, and the connection piping used in the recovery step in the adsorption tower immediately before the desorption step, and Another adsorption tower after the completion of the desorption step is connected through a bypass pipe, and gas remaining in the connecting pipe is introduced into the other adsorption tower after the completion of the desorption step through a purification step. This is a summary.
[作用]
本発明では、回収工程及び洗浄工程に使用され
た連結配管を、既に脱着工程が終了して塔内圧力
が減圧状態にある吸着塔にバイパス管を介して接
続し、前記連結配管中のガスを前記減圧状態にあ
る吸着塔へ圧力差を利用して移動させることとし
た。この結果吸着塔を脱着するに際しては、不純
成分含有ガスの混入が低減され、脱着の実施によ
つて取出される製品ガス中の不純成分濃度を大幅
に低下させることが可能となつた。[Function] In the present invention, the connecting pipe used in the recovery process and the cleaning process is connected via a bypass pipe to an adsorption tower in which the desorption process has already been completed and the internal pressure of the tower is in a reduced pressure state, and the connecting pipe is It was decided to move the gas to the adsorption tower in the reduced pressure state using the pressure difference. As a result, when the adsorption tower is desorbed, the contamination of gas containing impure components is reduced, making it possible to significantly reduce the concentration of impure components in the product gas taken out by desorption.
[実施例]
第1図は本発明方法に利用されるPSA装置の
代表的実施例を示す概略説明図であり、第2図に
示した従来のPSA装置に比較して次の点に特徴
が存在する。[Example] FIG. 1 is a schematic explanatory diagram showing a typical example of a PSA device used in the method of the present invention, which has the following features compared to the conventional PSA device shown in FIG. exist.
即ちこの装置では各連結配管10a,10b,
10cと各吸着塔3a〜3cを接続するバイパス
配管A,B,Cを別に設け、各バイパス管A,
B,Cの途中位置には夫々弁Z1〜Z3を配設してい
る。この実施例の他の構成としては第6図に示す
様に連結配管10a〜10cの最上流端(各吸着
塔3a〜3cの下部側)及び最下流端(各吸着塔
3a〜3cの頂部側)の夫々に開閉弁V10-a,
V12-a及びV10-b,V11-b,V12-bを設けて逆流防止
に備えたものに対して、同様にバイパス管A,
B,C及び弁Z1〜Z3を配設することもできる。 That is, in this device, each connection pipe 10a, 10b,
10c and each adsorption tower 3a to 3c are provided separately, and each bypass pipe A,
Valves Z 1 to Z 3 are disposed midway between B and C, respectively. As shown in FIG. 6, other configurations of this embodiment include the most upstream end (lower side of each adsorption tower 3a to 3c) and the most downstream end (top side of each adsorption tower 3a to 3c) of the connecting pipes 10a to 10c. ) on each of the on-off valves V 10-a ,
Similarly , bypass pipe A ,
B, C and valves Z 1 to Z 3 can also be provided.
例えば第1図に示す様にPSA装置の吸着塔3
aにおける洗浄工程が終了した時点で、弁Z3を開
放して吸着塔3c(脱着工程が終了した後であり
減圧状態になつている)と連結配管10aとを瞬
間的(数秒間)に連通させると、連結配管10a
中のガスは第7図aの矢印に沿つて吸着塔3cへ
移動される。尚弁V10を閉鎖する前に上記弁Z3を
開放すれば、連結配管10aにおける弁V10の上
流側部分及び下流側部分のいずれに残存するガス
を吸着塔3cへ移動されることになる。すなわち
前記上流側部分の浄化は、吸着塔3aの脱着工程
時に高濃度化を助成し、また前記下流側部分の浄
化は洗浄工程を経て脱着工程を行なう吸着塔3b
の高濃度化を促すことになり、総合的に回収目的
成分を高純度で得ることができる。またこのとき
吸着塔3a及び3b内の高純度ガスも若干量吸着
塔3cへ移動する。 For example, as shown in Figure 1, the adsorption tower 3 of a PSA device
When the cleaning step a is completed, the valve Z3 is opened to instantaneously (several seconds) communicate the adsorption tower 3c (which is in a reduced pressure state after the desorption step) and the connecting pipe 10a. When the connecting pipe 10a
The gas therein is moved to the adsorption tower 3c along the arrow in FIG. 7a. If the valve Z 3 is opened before closing the valve V 10 , the gas remaining in either the upstream or downstream portion of the valve V 10 in the connecting pipe 10a will be transferred to the adsorption tower 3c. . In other words, the purification of the upstream portion assists in increasing the concentration during the desorption step of the adsorption tower 3a, and the purification of the downstream portion is performed by the adsorption tower 3b, which performs the desorption step after the cleaning step.
This promotes high concentration of the components, and the components to be recovered can be obtained with high purity overall. At this time, a small amount of high-purity gas in the adsorption towers 3a and 3b also moves to the adsorption tower 3c.
洗浄工程の実施の後、不純ガスが除去されるの
で本工程は以下浄化工程と呼ぶが、不純ガス中の
回収目的成分は吸着塔3cに入つて吸着剤に吸着
される。第7図a〜cは各連結配管10a〜10
cと脱着工程を終えた吸着塔3a〜3cの接続時
の状態を示す説明図である。 After the cleaning step, the impure gas is removed, so this step will be referred to as a purification step hereinafter, and the components to be recovered in the impure gas enter the adsorption tower 3c and are adsorbed by the adsorbent. Figures 7a to 7c show each connecting pipe 10a to 10.
FIG. 3 is an explanatory diagram showing a state when adsorption towers 3a to 3c are connected to adsorption towers 3a to 3c after the desorption process.
第5図は3塔式PSA装置における各吸着塔の
工程順序を示す説明図であり、減圧状態にある他
の吸着塔と連結配管との連通を行なうに当たつて
洗浄工程終了後に上述の浄化工程を設定し、上記
連結配管と他の吸着塔を連通させて前記配管中の
低純度N2ガスの放出を行なう例を示している。
尚脱着工程終了後には他の吸着塔の浄化工程にお
けるレシーバーとして昇圧工程の一部を形成す
る。上記連結配管10a,10b,10cと減圧
下にある脱着終了後の吸着塔との接続ルートにつ
いては、第1図の実施例に限定されず、前記した
様に第6図に示す実施例も採用でき、各連結配管
10a〜10cはバイパス管A,B,Cを介して
各吸着塔3a〜3cに接続される。この例におい
て吸着塔3aの浄化工程では、連結配管10aの
ガスは矢印に沿つて弁Z3及びバイパス管Cを介し
て吸着塔3cへ移動するが、このとき弁V10-bを
閉鎖しておけば回収工程の終了した吸着塔3b中
のガスは該弁1010-bによつて遮断されているた
め、吸着塔3cへは移動しない様にすることもで
きる。 FIG. 5 is an explanatory diagram showing the process order of each adsorption tower in a three-column PSA device, and the above-mentioned purification process is performed after the cleaning process is completed when connecting the connecting piping with other adsorption towers in a reduced pressure state. An example is shown in which a process is set, the connecting pipe is connected to another adsorption tower, and low-purity N 2 gas in the pipe is released.
After the desorption step is completed, it forms part of the pressure increasing step as a receiver in the purification step of another adsorption tower. The connection route between the connecting pipes 10a, 10b, 10c and the adsorption tower under reduced pressure after the completion of desorption is not limited to the embodiment shown in Fig. 1, but as described above, the embodiment shown in Fig. 6 is also adopted. The connecting pipes 10a to 10c are connected to the adsorption towers 3a to 3c via bypass pipes A, B, and C. In this example, in the purification process of the adsorption tower 3a, the gas in the connecting pipe 10a moves along the arrow to the adsorption tower 3c via the valve Z 3 and the bypass pipe C, but at this time, the valve V 10-b is closed. If this is done, the gas in the adsorption tower 3b after the recovery process is blocked by the valve 1010-b , so that it can be prevented from moving to the adsorption tower 3c.
実験例
第1図に示したPSA装置を利用し、第5図に
示す工程順沿に沿つて、N2ガス(79%)及びO2
ガス(21%)からなる混合ガスよりN2ガスを選
択回収する実験を行なつた。吸着塔の大きさは内
径450mm、高さ2000mmのものを使用し、吸着剤に
は合成ゼオライト5A型を使用した。Experimental example Using the PSA device shown in Figure 1, N 2 gas (79%) and O 2 gas were added along the process sequence shown in Figure 5.
An experiment was conducted to selectively recover N 2 gas from a mixed gas consisting of (21%) gas. The adsorption tower used had an inner diameter of 450 mm and a height of 2000 mm, and synthetic zeolite type 5A was used as the adsorbent.
吸着圧力は4.0Kg/cm2Gとし、原料ガスは70N
m3/hで吸着塔へ供給し、脱着圧力は0.1Kg/cm2
Gに設定して吸着塔の工程1サイクルを3分とし
た。 The adsorption pressure is 4.0Kg/cm 2 G, and the raw material gas is 70N.
m 3 /h to the adsorption tower, and the desorption pressure is 0.1Kg/cm 2
G, and one cycle of the adsorption tower process was set to 3 minutes.
一方第3図に示し従来の工程順序に沿つて上記
と同様の条件でN2ガスの回収を行なつた場合、
製品N2ガス純度は99.998%であつたが、本発明
方法を利用した場合の製品N2ガス純度は99.999
%を達成できる様になり、深冷分離装置を使つて
N2ガスの分離回収を行なうのとほぼ同等純度の
ものが得られる様になつた。また本発明方法によ
るN2ガスの回収率は40%強であり、従来方法の
回収率に比べてほとんど変らなかつた。 On the other hand, if N2 gas is recovered under the same conditions as above according to the conventional process order shown in Figure 3,
The product N2 gas purity was 99.998%, but when the method of the present invention was used, the product N2 gas purity was 99.999%.
%, using a cryogenic separator
It has become possible to obtain a product with almost the same purity as by separating and recovering N 2 gas. Furthermore, the recovery rate of N 2 gas by the method of the present invention was over 40%, which was almost unchanged compared to the recovery rate of the conventional method.
上記した例ではN2ガスの濃縮回収の例を示し
て説明したが、本発明方法はこの他H2ガスやCO
ガス等の回収にも適用され、3塔以上の吸着塔を
有するPSA装置で採用される。 In the above example, an example of concentration and recovery of N 2 gas was shown and explained, but the method of the present invention can also be applied to H 2 gas, CO
It is also applied to the recovery of gas, etc., and is used in PSA equipment that has three or more adsorption towers.
[発明の効果]
本発明方法は以上の様に構成されているので、
連結配管に残存する低純度ガスが製品ガス中に混
入することがなくなるので、高純度の回収目的成
分ガスを分離精製できる様になつた。このとき上
記回収目的成分の回収率を低下することはない。[Effect of the invention] Since the method of the present invention is configured as described above,
Since the low-purity gas remaining in the connecting pipe is no longer mixed into the product gas, it is now possible to separate and purify the high-purity component gas to be recovered. At this time, the recovery rate of the component to be recovered is not reduced.
第1図は本発明方法に利用する代表的なPSA
装置例を示す概略説明図、第2図は従来の方法に
用いられるPSA装置の例を示す概略説明図、第
3図は従来の圧力スイング吸着の工程を示す説明
図、第4図a,bは吸着塔3aの回収工程及び洗
浄工程を示す説明図、第5図は本発明方法の圧力
スイング吸着の工程を示す説明図、第6図は本発
明方法に利用する他のPSA装置例を示す概略説
明図、第7a〜cは第1図に示す装置における連
結配管と吸着塔の接続を示す説明図である。
1……原料ガス供給管、2……製品ガス取出
管、3a,3b,3c……吸着塔、4……排ガス
廃棄管、5……脱着用管、6……真空ポンプ、8
……洗浄用管、9……製品ガスホルダ、10a,
10b,10c……連結配管、V1〜V16,V10-a、
V11-a,V12-a,V10-b,V11-b,V12-b,Z1〜Z3…
…自動開閉弁。
Figure 1 shows a typical PSA used in the method of the present invention.
Fig. 2 is a schematic explanatory diagram showing an example of a PSA device used in a conventional method; Fig. 3 is an explanatory diagram showing a conventional pressure swing adsorption process; Fig. 4 a, b 5 is an explanatory diagram showing the recovery process and washing process of the adsorption tower 3a, FIG. 5 is an explanatory diagram showing the pressure swing adsorption process of the method of the present invention, and FIG. 6 is an example of another PSA device used in the method of the present invention. Schematic explanatory diagrams 7a to 7c are explanatory diagrams showing the connection between the connecting pipe and the adsorption tower in the apparatus shown in FIG. 1. 1... Raw material gas supply pipe, 2... Product gas extraction pipe, 3a, 3b, 3c... Adsorption tower, 4... Exhaust gas disposal pipe, 5... Desorption pipe, 6... Vacuum pump, 8
...Cleaning pipe, 9...Product gas holder, 10a,
10b, 10c...Connection piping, V1 to V16 , V10-a ,
V 11-a , V 12-a , V 10-b , V 11-b , V 12-b , Z 1 to Z 3 …
...Automatic on-off valve.
Claims (1)
共に、各吸着塔は連結配管によつて直列に接続さ
れ、各吸着塔は少なくとも吸着、回収、洗浄、脱
着の各工程を順に行なう易吸着性成分の分離方法
において、脱着工程を行なう直前の吸着塔におけ
る回収工程に使用された連結配管と、既に脱着工
程の終了した後の他の吸着塔を、バイパス管を介
して連通せしめ、前記連結配管中に残存するガス
を圧力差により、前記脱着工程の終了した後の他
の吸着塔へ導入する浄化工程を含むことを特徴と
する圧力スイング吸着方法。1 Three or more pressure swing adsorption towers are used, and each adsorption tower is connected in series through connecting piping, and each adsorption tower is capable of absorbing easily adsorbable components that perform at least the steps of adsorption, recovery, washing, and desorption in sequence. In the separation method, the connecting pipe used for the recovery process in the adsorption tower immediately before the desorption process is communicated with another adsorption tower after the desorption process has already been completed via a bypass pipe, and A pressure swing adsorption method comprising a purification step of introducing gas remaining in the adsorption column into another adsorption tower after the completion of the desorption step using a pressure difference.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP61248179A JPS63100914A (en) | 1986-10-17 | 1986-10-17 | Adsorption method for pressure swing |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP61248179A JPS63100914A (en) | 1986-10-17 | 1986-10-17 | Adsorption method for pressure swing |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS63100914A JPS63100914A (en) | 1988-05-06 |
| JPH0372326B2 true JPH0372326B2 (en) | 1991-11-18 |
Family
ID=17174374
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP61248179A Granted JPS63100914A (en) | 1986-10-17 | 1986-10-17 | Adsorption method for pressure swing |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS63100914A (en) |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2681894B2 (en) * | 1992-04-28 | 1997-11-26 | 鐘紡株式会社 | Oxygen gas separation method |
Family Cites Families (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| ZA849756B (en) * | 1983-12-15 | 1986-06-25 | Bergwerksverband Gmbh | Process for isolating and recovering gases which are relatively strongly adsorbable on adsorbents from gas mixtures which otherwise essentially contain only less strongly adsorbable gases |
| JPS60221304A (en) * | 1984-04-19 | 1985-11-06 | Showa Denko Kk | Preparation of oxygen-rich gas by pressure changing adsorption method under atmospheric pressure |
-
1986
- 1986-10-17 JP JP61248179A patent/JPS63100914A/en active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS63100914A (en) | 1988-05-06 |
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