JPH0374178B2 - - Google Patents
Info
- Publication number
- JPH0374178B2 JPH0374178B2 JP59032982A JP3298284A JPH0374178B2 JP H0374178 B2 JPH0374178 B2 JP H0374178B2 JP 59032982 A JP59032982 A JP 59032982A JP 3298284 A JP3298284 A JP 3298284A JP H0374178 B2 JPH0374178 B2 JP H0374178B2
- Authority
- JP
- Japan
- Prior art keywords
- film
- membrane
- mask
- pellicle
- present
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
Landscapes
- Laminated Bodies (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Preparing Plates And Mask In Photomechanical Process (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
Description
【発明の詳細な説明】
〔技術分野〕
本発明はマスクに使用されるメンブラン膜の膜
構造に関する。DETAILED DESCRIPTION OF THE INVENTION [Technical Field] The present invention relates to the membrane structure of a membrane membrane used in a mask.
従来、メンブラン膜は、単層膜として用いられ
るのが通例であり、マスク保護用のペリクルある
いは、Ｘ線マスク支持体層として用いられるのが
通例であつた。
Conventionally, membrane membranes have typically been used as single-layer membranes, and have typically been used as pellicles for mask protection or X-ray mask support layers.
第１図は従来技術によるメンブラン膜のマスク
保護体（ペリクル）として使用例を示すペリクル
の断面図である。すなわち、プラスチツク製枠１
の表面には3.2ミクロン層のニトロ・セルロース
膜２が形成されて成る。 FIG. 1 is a cross-sectional view of a pellicle showing an example of use as a mask protector (pellicle) of a membrane film according to the prior art. That is, plastic frame 1
A 3.2 micron layer of nitrocellulose membrane 2 is formed on the surface.
しかし、上記従来技術によると、ペリクルの表
面にはゴミが付着し、除去できず、マスク保護膜
としての作用が減少する欠点がある。 However, according to the above-mentioned conventional technology, there is a drawback that dust adheres to the surface of the pellicle and cannot be removed, reducing its function as a mask protective film.
本発明は、かかる従来技術の欠点をなくし、マ
スク材あるいはマスク保護材としてゴミ付着のな
いペリクルあるいはマスクを製作できるメンブラ
ン膜構造を提供することを目的とする。
SUMMARY OF THE INVENTION An object of the present invention is to eliminate the drawbacks of the prior art and to provide a membrane structure that can be used as a mask material or mask protection material to produce a pellicle or mask free of dust adhesion.
上記目的を達成するための本発明の基本的な構
成は、メンブラン膜に関し、１〜2μmから10μm
程度の極めて薄い絶縁膜表面には帯電防止膜が被
覆されて成ることを特徴とする。
The basic structure of the present invention for achieving the above object is related to a membrane membrane with a thickness of 1 to 2 μm to 10 μm.
The surface of the extremely thin insulating film is coated with an antistatic film.
以下、実施例により本発明を詳述する。 Hereinafter, the present invention will be explained in detail with reference to Examples.
第２図は本発明の一実施例を示すペリクルの断
面図である。すなわち、プラスチツク製枠１１の
表面にはニトロ・セルロースから成るメンブラン
膜１２が形成され、該メンブラン膜１２の表面に
はベンゼン・スルフオン酸の単分子膜１３が形成
されて成る。 FIG. 2 is a sectional view of a pellicle showing an embodiment of the present invention. That is, a membrane film 12 made of nitrocellulose is formed on the surface of the plastic frame 11, and a monomolecular film 13 of benzene sulfonic acid is formed on the surface of the membrane film 12.
第３図は本発明の他の実施例を示す 線マスク
の断面図である。すなわち、枠２１の表面にはメ
ンブラン膜２２が貼付けられ、該メンブラン膜２
２上には図形状金膜２３が形成され、且つ少くと
もメンブラン膜２２表面には100Å程度の極めて
薄いAu膜２４が形成されて成る。 FIG. 3 is a sectional view of a line mask showing another embodiment of the present invention. That is, a membrane film 22 is attached to the surface of the frame 21, and the membrane film 2
A graphic gold film 23 is formed on the membrane film 22, and an extremely thin Au film 24 of about 100 Å is formed at least on the surface of the membrane film 22.
本発明の如く、メンブラン膜上にベンゼン・ス
ルフオン酸等の帯電防止膜や、InO2，SnO2等の
透明導電膜、Au等の金属膜等から成る帯電防止
膜を形成することにより、メンブラン膜の用途に
より必要な基本的機能をそこなうことなく、メン
ブラン膜へのゴミの付着を防止できる効果があ
る。
As in the present invention, by forming an antistatic film made of benzene sulfonic acid or the like, a transparent conductive film such as InO 2 or SnO 2 , or a metal film such as Au on the membrane film, the membrane film can be It has the effect of preventing dust from adhering to the membrane membrane without impairing the basic functions necessary for its use.
第１図は従来技術によるペリクルの断面図、第
２図及び第３図は本発明の実施例を示すペリクル
及びＸ線マスクの断面図である。
１，１１，２１……フレーム、２，１２，２２
……メンブラン膜、１３，２４……帯電防止膜、
２３……図形状金膜。
FIG. 1 is a sectional view of a pellicle according to the prior art, and FIGS. 2 and 3 are sectional views of a pellicle and an X-ray mask showing embodiments of the present invention. 1, 11, 21...Frame, 2, 12, 22
...Membrane film, 13,24...Antistatic film,
23...Graphic gold film.
Claims (1)
覆されているメンブラン膜を有することを特徴と
するマスク。 ２ 前記帯電防止膜はベンゼン・スルフオン酸か
らなる膜であることを特徴とする特許請求の範囲
第１項記載のマスク。 ３ 前記帯電防止膜は透明導電性膜からなること
を特徴とする特許請求の範囲第１項記載のマス
ク。 ４ 前記帯電防止膜は金属膜からなることを特徴
とする特許請求の範囲第１項記載のマスク。[Scope of Claims] 1. A mask characterized by having a membrane film in which an antistatic film is coated on an insulating film with a thickness of 1 to 10 μm. 2. The mask according to claim 1, wherein the antistatic film is a film made of benzene sulfonic acid. 3. The mask according to claim 1, wherein the antistatic film is made of a transparent conductive film. 4. The mask according to claim 1, wherein the antistatic film is made of a metal film.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP59032982A JPS60176751A (en) | 1984-02-23 | 1984-02-23 | Membrane film |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP59032982A JPS60176751A (en) | 1984-02-23 | 1984-02-23 | Membrane film |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS60176751A JPS60176751A (en) | 1985-09-10 |
| JPH0374178B2 true JPH0374178B2 (en) | 1991-11-26 |
Family
ID=12374081
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP59032982A Granted JPS60176751A (en) | 1984-02-23 | 1984-02-23 | Membrane film |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS60176751A (en) |
Families Citing this family (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH066504Y2 (en) * | 1987-05-20 | 1994-02-16 | 大日本印刷株式会社 | X-ray exposure mask |
| JPH02310A (en) * | 1987-12-29 | 1990-01-05 | Canon Inc | X-ray mask and exposure method using it |
| JPH02309A (en) * | 1987-12-29 | 1990-01-05 | Canon Inc | X-ray mask and exposure method using it |
| JPH0652648A (en) * | 1992-07-29 | 1994-02-25 | Mitsubishi Kasei Corp | Cartridge for optical recording medium |
-
1984
- 1984-02-23 JP JP59032982A patent/JPS60176751A/en active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS60176751A (en) | 1985-09-10 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| EXPY | Cancellation because of completion of term |