JPH0375056B2 - - Google Patents
Info
- Publication number
- JPH0375056B2 JPH0375056B2 JP15003385A JP15003385A JPH0375056B2 JP H0375056 B2 JPH0375056 B2 JP H0375056B2 JP 15003385 A JP15003385 A JP 15003385A JP 15003385 A JP15003385 A JP 15003385A JP H0375056 B2 JPH0375056 B2 JP H0375056B2
- Authority
- JP
- Japan
- Prior art keywords
- laser beam
- vacuum
- inspected
- window
- foreign matter
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 238000007689 inspection Methods 0.000 claims description 15
- 239000011521 glass Substances 0.000 claims description 6
- 239000000758 substrate Substances 0.000 description 18
- 238000000034 method Methods 0.000 description 12
- 239000002245 particle Substances 0.000 description 6
- 238000004519 manufacturing process Methods 0.000 description 4
- 239000000428 dust Substances 0.000 description 3
- 239000000126 substance Substances 0.000 description 3
- 239000011248 coating agent Substances 0.000 description 2
- 238000000576 coating method Methods 0.000 description 2
- 238000005259 measurement Methods 0.000 description 2
- 239000004065 semiconductor Substances 0.000 description 2
- 238000000149 argon plasma sintering Methods 0.000 description 1
- 238000009795 derivation Methods 0.000 description 1
- 238000001514 detection method Methods 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 238000000605 extraction Methods 0.000 description 1
- 230000010287 polarization Effects 0.000 description 1
- 230000035945 sensitivity Effects 0.000 description 1
Classifications
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/84—Systems specially adapted for particular applications
- G01N21/88—Investigating the presence of flaws or contamination
- G01N21/94—Investigating contamination, e.g. dust
Landscapes
- Physics & Mathematics (AREA)
- Health & Medical Sciences (AREA)
- Life Sciences & Earth Sciences (AREA)
- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- Biochemistry (AREA)
- General Health & Medical Sciences (AREA)
- General Physics & Mathematics (AREA)
- Immunology (AREA)
- Pathology (AREA)
- Investigating Materials By The Use Of Optical Means Adapted For Particular Applications (AREA)
- Investigating Or Analysing Materials By Optical Means (AREA)
- Testing Or Measuring Of Semiconductors Or The Like (AREA)
Description
【発明の詳細な説明】
産業上の利用分野
本発明は、例えば半導体製造用真空装置のよう
な真空プロセス装置に使用され得る真空中で使用
可能な表面異物検査装置に関するものである。DETAILED DESCRIPTION OF THE INVENTION Field of the Invention The present invention relates to a surface foreign matter inspection device that can be used in vacuum and can be used in vacuum process equipment such as vacuum equipment for semiconductor manufacturing.
従来の技術
例えば、半導体製造技術等において、ウエハ等
の基板表面上に付着しているダスト粒子等の異物
を観察、検査することは、歩留り向上の観点から
も重要なことである。BACKGROUND ART For example, in semiconductor manufacturing technology, it is important to observe and inspect foreign substances such as dust particles attached to the surface of a substrate such as a wafer from the viewpoint of improving yield.
従来用いられてきた基板表面上の異物を検査す
る方法としては、
(1) レーザ光線等の光を利用してその散乱光によ
り異物の粒径等を検出する方法;
(2) 顕微鏡を利用して検査する方法;
(3) 走査型電子顕微鏡を用いて異物の形を観察す
る方法
等がある。 Conventionally used methods for inspecting foreign matter on the surface of a substrate include (1) a method that uses light such as a laser beam to detect the particle size of the foreign matter from the scattered light; (2) a method that uses a microscope. (3) There are methods such as observing the shape of foreign objects using a scanning electron microscope.
この中でラインで速やかに検査できる光散乱法
が広く用いられており、その中でも、検出感度が
高く、小さな粒子まで検出できるという理由で、
レーザを光源としたものが利用されている。これ
らのものは完成された装置として市販されている
が、そのために製造工程中に検査工程を別個に加
える必要があり、その分だけ、時間内にもマイナ
スとなる。 Among these, the light scattering method is widely used because it can be quickly inspected on the line, and among them, it has high detection sensitivity and can detect even the smallest particles.
A light source using a laser is used. Although these devices are commercially available as complete devices, it is necessary to add a separate inspection step during the manufacturing process, which results in a time penalty.
最近の真空プロセスの発展に伴ない、異物検査
装置を製造装置に組み込むという要求があり、特
に、真空プロセス装置に組み込み、インラインで
測定したいという要望が益々強まつている。 With the recent development of vacuum processes, there is a demand for incorporating a foreign substance inspection device into manufacturing equipment, and in particular, there is an increasing demand for incorporating it into vacuum process equipment and performing in-line measurements.
ところで、大気中で使用される従来のレーザダ
ストモニタと異なり、レーザ光線を真空装置内へ
導入する場合、あるいはウエハ上で鏡面反射した
光を真空装置外へ出す場合には、必ず真空窓が必
要となり、真空窓部分での反射光がバツクグラウ
ンドを上げる等の問題となる。 By the way, unlike conventional laser dust monitors that are used in the atmosphere, a vacuum window is always required when introducing a laser beam into a vacuum equipment, or when emitting light specularly reflected on a wafer out of a vacuum equipment. This causes problems such as light reflected at the vacuum window part raising the background.
一方、レーザ光線の反射光を極力低く抑えるた
めに、ブリユースタ窓を用いることは公知であ
る。 On the other hand, it is known to use a Brieuster window in order to suppress the reflected light of the laser beam as low as possible.
しかしながら、ウエハ等の表面をスキヤンする
必要がある場合には、ブリユースタ窓は適さな
い。というのは、ブリユースタ窓は、所定の入射
角度でのみ効果があり、少しでも角度がずれる
と、反射率が高くなるため、レーザをスキヤンす
る場合には使用できない。またブリユースタ窓の
場合には、偏光したレーザ光線を用い、そのレー
ザ光線の偏光面をブリユースタ窓に固有な角度に
合わせる必要があるため、レーザを装置に取り付
ける際に、偏向角の調整が必要である。 However, if it is necessary to scan a surface such as a wafer, the Brieusta window is not suitable. This is because the Brieuster window is only effective at a certain angle of incidence, and if the angle deviates even slightly, the reflectance increases, so it cannot be used for laser scanning. In addition, in the case of a Brieusta window, a polarized laser beam is used, and the polarization plane of the laser beam must be adjusted to an angle unique to the Brieusta window, so the deflection angle must be adjusted when the laser is installed in the device. be.
発明が解決しようとする問題点
このように、レーザ光線を真空装置内に導入す
る場合には、一般的には反射率を抑えるためにブ
リユースタ窓を真空窓に用いているが、レーザを
装置に取り付ける際に、偏向角の調整が必要であ
るという問題があるだけでなく、レーザをスキヤ
ンすることができない。そのため、レーザをスキ
ヤンせずにウエハをステージごと動かすことが考
えられるが、ステージを動かすことは、インライ
ン装置に組み込むことを考えると、非現実的であ
り、またステージが動くことによりダストが発生
する恐れがあり、好ましくない。さらに、通常の
真空窓では反射率が大きいためにバツクグラウン
ドが大きくなり、小さな粒子を検出することがで
きないという問題がある。Problems to be Solved by the Invention As described above, when a laser beam is introduced into a vacuum device, a Brieusta window is generally used as the vacuum window to suppress the reflectance. When installing, there is a problem that not only the deflection angle needs to be adjusted, but also the laser cannot be scanned. Therefore, it is possible to move the wafer along with the stage without scanning the laser, but moving the stage is impractical when considering incorporating it into an in-line device, and moving the stage also generates dust. It's scary and undesirable. Furthermore, a normal vacuum window has a large reflectance, resulting in a large background, making it impossible to detect small particles.
そこで、本発明の目的は、真空窓にブリユース
タ窓を用いずに反射光によるバツクグラウンドの
増大の問題を解決すると共に真空プロセスライン
中に容易に組み込むことのできる表面異物検査装
置を提供することにある。 SUMMARY OF THE INVENTION Therefore, an object of the present invention is to provide a surface foreign matter inspection device that solves the problem of background increase due to reflected light without using a Brewster window as a vacuum window, and that can be easily incorporated into a vacuum process line. be.
問題点を解決するための手段
上記の目的を達成するために、本発明による真
空中で使用可能な表面異物検査装置は、異物検査
すべき被検査物を収容する真空容器にレーザ光線
導入用真空窓と上記真空容器内の被検査物上で鏡
面反射したレーザ光線を外部へ導出するレーザ光
線導出用真空窓とを設け、上記真空容器内の被検
査物表面上に導入されるレーザ光線を上記被検査
物表面上で少なくとも一つの方向に走査させるレ
ーザスキヤナおよび被検査物上の異物によつて乱
反射したレーザ光線を検出できる位置に配置され
た検出器を有し、上記レーザ光線導入用真空窓お
よびレーザ光線導出用真空窓を反射防止膜を備え
たガラスで構成したことを特徴としている。Means for Solving the Problems In order to achieve the above object, the surface foreign matter inspection device according to the present invention, which can be used in a vacuum, uses a vacuum for introducing a laser beam into a vacuum container containing an object to be inspected for foreign matter. A window and a vacuum window for guiding the laser beam specularly reflected on the object to be inspected in the vacuum container to the outside are provided, and the laser beam introduced onto the surface of the object to be inspected in the vacuum container is directed to the surface of the object to be inspected in the vacuum container. It has a laser scanner that scans the surface of the object to be inspected in at least one direction, and a detector arranged at a position where it can detect the laser beam diffusely reflected by foreign matter on the object to be inspected, and the vacuum window for introducing the laser beam; The device is characterized in that the vacuum window for guiding the laser beam is made of glass with an anti-reflection coating.
作 用
このように構成した本発明による真空中で使用
可能な表面異物検査装置においては、レーザスキ
ヤナは、真空装置内の基板表面上をX,Y方向あ
るいはX方向のみにスキヤンすることができ、
X,Y両方向にスキヤンするときは被検査物は測
定中動かさない。一方、X方向のみにスキヤンす
るときには、被検査物をインラインの搬送系によ
つて適当な速度でY方向に送りながら検査を行な
うことができる。真空容器に設けたレーザ光線導
入用真空窓を通つて真空容器内の被検査物表面上
にレーザ光線が導入され、このレーザ光線により
被検査物表面上をX,Y方向に走査する。もしこ
の被検査物表面上に何らかの異物が存在している
と、導入されたレーザ光線は被検査物上で鏡面反
射してレーザ光線導出用真空窓を通つて外部へ導
出される他、その異物に衝突したレーザ光線部分
は乱反射して検出器に入射する。これにより、検
出器は被検査物表面上の異物を検出する。この場
合、一連の異物検査操作は被検査物が真空プロセ
スラインにある間に行なうことができる。In the surface foreign matter inspection device of the present invention configured as described above, which can be used in a vacuum, the laser scanner can scan the surface of the substrate in the vacuum device in the X, Y directions or only in the X direction,
When scanning in both the X and Y directions, the object to be inspected does not move during the measurement. On the other hand, when scanning only in the X direction, the inspection can be carried out while sending the object to be inspected in the Y direction at an appropriate speed using an in-line conveyance system. A laser beam is introduced onto the surface of the object to be inspected inside the vacuum chamber through a vacuum window for introducing the laser beam provided in the vacuum container, and the laser beam scans the surface of the object to be inspected in the X and Y directions. If any foreign matter is present on the surface of the object to be inspected, the introduced laser beam will be specularly reflected on the object to be inspected and will be led out through the vacuum window for guiding the laser beam, as well as the foreign object. The portion of the laser beam that collides with the detector is diffusely reflected and enters the detector. Thereby, the detector detects foreign matter on the surface of the object to be inspected. In this case, a series of foreign object inspection operations can be performed while the object to be inspected is in the vacuum process line.
実施例
以下、添附図面を参照して本発明の実施例につ
いて説明する。Embodiments Hereinafter, embodiments of the present invention will be described with reference to the accompanying drawings.
図面には本発明による表面異物検査装置の構成
を示し、1は真空容器で、この真空容器1にはY
方向に動くことのできる可動テーブル2が設けら
れ、この可動テーブル2上には基板ホルダ3が取
付けられ、その上に被検査物である基板4が装着
されている。真空容器1には、基板4に対して予
定の入射角度でレーザ光線を導入できる位置に設
けられたレーザ光線導入用真空窓5と、このレー
ザ光線導入用真空窓5を通つて基板4に入射した
レーザ光線が鏡面反射して進む位置に設けられた
レーザ光線導出用真空窓6とが設けられている。
7はレーザ光線導入用真空窓5に取付られたレー
ザ光線発生導入装置で、レーザ光源7aとレーザ
光源7aからのレーザ光線を基板4上でX,Y方
向に走査させるスキヤナ7bとを備えている。一
方、レーザ光線発生導入装置7とレーザ光線導入
用真空窓5とレーザ光線導出用真空窓6とを通る
平面に対して所要の角度を成して検出器を成す光
電子増倍管8が真空容器1に取付けられている。
検出器8としては任意の適当な型式のものが用い
られ得、その出力は例えばコンピユータ装置(図
示してない)に接続されている。 The drawing shows the configuration of the surface foreign matter inspection device according to the present invention, 1 is a vacuum container, and this vacuum container 1 has Y
A movable table 2 that can move in a direction is provided, a substrate holder 3 is mounted on the movable table 2, and a substrate 4, which is an object to be inspected, is mounted on the movable table 2. The vacuum container 1 includes a vacuum window 5 for introducing a laser beam, which is provided at a position where the laser beam can be introduced into the substrate 4 at a predetermined angle of incidence, and a vacuum window 5 for introducing the laser beam into the substrate 4 through the vacuum window 5 for introducing the laser beam. A vacuum window 6 for guiding the laser beam is provided at a position where the laser beam is specularly reflected and proceeds.
Reference numeral 7 denotes a laser beam generation and introduction device attached to the laser beam introduction vacuum window 5, and includes a laser light source 7a and a scanner 7b that scans the laser beam from the laser light source 7a on the substrate 4 in the X and Y directions. . On the other hand, a photomultiplier tube 8 forming a detector forms a required angle with respect to a plane passing through the laser beam generation/introduction device 7, the vacuum window 5 for laser beam introduction, and the vacuum window 6 for laser beam derivation, and the photomultiplier tube 8 forms a vacuum vessel. It is attached to 1.
Any suitable type of detector 8 may be used, the output of which is connected, for example, to a computer device (not shown).
レーザ光線導入用真空窓5およびレーザ光線導
出用真空窓6は、それぞれ口部5a,6aに密封
的に装着された反射防止膜を備えたガラス5b,
6bを備えている。 The vacuum window 5 for introducing the laser beam and the vacuum window 6 for guiding the laser beam are glass 5b, which is provided with an anti-reflection film sealed at the openings 5a, 6a, respectively.
6b.
このように構成した図示装置において、まずレ
ーザ光線発生導入装置7のレーザ光源7aとスキ
ヤナ7bによつてレーザ光線を発生させると共に
スキヤンし、レーザ光線導入用真空窓5を通つて
可動テーブル2上の基板4上をX方向に走査す
る。レーザ光線で走査した基板4に異物がなけれ
ば、レーザ光線はその基板4で鏡面反射してレー
ザ光線導出用真空窓6を通つて真空容器1外へ出
て行く。もし基板に異物があれば、その異物に衝
突したレーザ光線部分は散乱され、この散乱光は
検出器8り検出され、こうして基板上の異物を検
出すによることができる。 In the illustrated apparatus configured as described above, a laser beam is first generated and scanned by the laser light source 7a and the scanner 7b of the laser beam generation/introduction device 7, and is passed through the vacuum window 5 for laser beam introduction onto the movable table 2. The substrate 4 is scanned in the X direction. If there is no foreign matter on the substrate 4 scanned by the laser beam, the laser beam is specularly reflected by the substrate 4 and exits the vacuum chamber 1 through the vacuum window 6 for guiding the laser beam. If there is a foreign object on the substrate, the portion of the laser beam that collides with the foreign object will be scattered, and this scattered light will be detected by the detector 8, thus making it possible to detect the foreign object on the substrate.
なお、図示実施例において、検出器8の位置は
基板上の異物で乱反射した光を検出できる位置で
あればどの位置でもよい。またスキヤナ7bによ
るスキヤン操作とY方向への基板の移動とは同期
させて行なわれるべきである。さらに、図示実施
例では、スキヤナ7bはレーザ光線をX方向にの
みスキヤンさせ、Y方向には基板を動かしながら
検査するようにしているが、当然、スキヤナ7b
をX,Y両方向にスキヤンするように構成し、検
査中は基板を静止させるようにしてもよい。 In the illustrated embodiment, the detector 8 may be located at any position as long as it can detect light diffusely reflected by foreign matter on the substrate. Further, the scanning operation by the scanner 7b and the movement of the substrate in the Y direction should be performed in synchronization. Further, in the illustrated embodiment, the scanner 7b scans the laser beam only in the X direction and inspects the substrate while moving it in the Y direction.
It may be configured to scan in both the X and Y directions, and the substrate may be kept stationary during inspection.
発明の効果
以上説明してきたように、本発明によれば、異
物検査すべき被検査物を収容する真空容器にレー
ザ光線導入用真空窓と上記真空容器内の被検査物
上で鏡面反射したレーザ光線を外部へ導出するレ
ーザ光線導出用真空窓とを設け、上記真空容器内
の被検査物表面上に導入されるレーザ光線を上記
被検査物表面上で少なくとも一つの方向に走査さ
せるレーザスキヤナおよび被検査物上の異物によ
つて乱反射したレーザ光線を検出できる位置に配
置された検出器を有する真空中で使用可能な表面
異物検査装置において、レーザ光線導入用真空窓
およびレーザ光線導出用真空窓を、反射防止膜を
備えたガラスで構成しているので、通常のガラス
の真空窓の場合、反射光が約4%あるのに対し
て、反射光を0.4%に押えることができ、そのた
め、バツクグラウンドを大幅に低下させることが
できる。その結果、通常のガラス窓を使用した場
合に最小検出粒径が約2μmであつたのに対して、
本発明による装置では0.5μmの粒径まで検出する
ことができる。また、本発明による装置は容易に
インライン真空プロセス装置に組み込むことがで
き、検査工程の簡易化を計ることができる。Effects of the Invention As described above, according to the present invention, a vacuum container for accommodating an object to be inspected for foreign substances is provided with a vacuum window for introducing a laser beam, and a laser beam specularly reflected on the object to be inspected in the vacuum container is provided. A laser scanner and a laser scanner, which are provided with a vacuum window for guiding the laser beam to the outside, and scan the laser beam introduced onto the surface of the object to be inspected in the vacuum container in at least one direction on the surface of the object to be inspected. In a surface foreign matter inspection device that can be used in a vacuum and has a detector placed at a position where it can detect the laser beam diffusely reflected by foreign matter on the inspection object, a vacuum window for introducing the laser beam and a vacuum window for guiding the laser beam are installed. Since it is made of glass with an anti-reflection coating, it is possible to reduce the amount of reflected light to 0.4%, compared to about 4% for regular glass vacuum windows. Ground can be significantly lowered. As a result, the minimum detectable particle size was approximately 2 μm when using a regular glass window, whereas
The device according to the invention can detect particle sizes down to 0.5 μm. Further, the device according to the present invention can be easily incorporated into an in-line vacuum process device, and the inspection process can be simplified.
図面は本発明の一実施例による装置の構成を示
す概略線図である。
図中、1:真空容器、2:可動テーブル、4:
基板、5:レーザ光線導入用真空窓、6:レーザ
光線導出用真空窓、7:レーザ光線発生導入装
置、7a:レーザ光源、7b:スキヤナ。
The drawing is a schematic diagram showing the configuration of an apparatus according to an embodiment of the present invention. In the figure, 1: vacuum container, 2: movable table, 4:
Substrate, 5: Vacuum window for laser beam introduction, 6: Vacuum window for laser beam extraction, 7: Laser beam generation and introduction device, 7a: Laser light source, 7b: Scanner.
Claims (1)
にレーザ光線導入用真空窓と上記真空容器内の被
検査物上で鏡面反射したレーザ光線を外部へ導出
するレーザ光線導出用真空窓とを設け、上記真空
容器内の被検査物表面上に導入されるレーザ光線
を上記被検査物表面上で少なくとも一つの方向に
走査させるレーザスキヤナおよび被検査物上の異
物によつて乱反射したレーザ光線を検出できる位
置に配置された検出器を有する真空中で使用可能
な表面異物検査装置において、上記レーザ光線導
入用真空窓およびレーザ光線導出用真空窓を、反
射防止膜を備えたガラスで構成したことを特徴と
する真空中で使用可能な表面異物検査装置。1. A vacuum container containing an object to be inspected for foreign matter is provided with a vacuum window for introducing a laser beam and a vacuum window for guiding the laser beam specularly reflected on the object to be inspected in the vacuum container to the outside. , a laser scanner that scans a laser beam introduced onto the surface of the object to be inspected in at least one direction on the surface of the object to be inspected, and a laser beam that is diffusely reflected by foreign matter on the object to be inspected can be detected. A surface foreign matter inspection device that can be used in a vacuum and has a detector placed at a certain position, characterized in that the vacuum window for introducing the laser beam and the vacuum window for leading the laser beam are made of glass with an antireflection film. A surface foreign matter inspection device that can be used in a vacuum.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP15003385A JPS6212844A (en) | 1985-07-10 | 1985-07-10 | Surface foreign substance detector to be used in vacuum |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP15003385A JPS6212844A (en) | 1985-07-10 | 1985-07-10 | Surface foreign substance detector to be used in vacuum |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS6212844A JPS6212844A (en) | 1987-01-21 |
| JPH0375056B2 true JPH0375056B2 (en) | 1991-11-28 |
Family
ID=15488029
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP15003385A Granted JPS6212844A (en) | 1985-07-10 | 1985-07-10 | Surface foreign substance detector to be used in vacuum |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS6212844A (en) |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| AUPR749801A0 (en) * | 2001-09-05 | 2001-09-27 | Generation Technology Research Pty Ltd | Apparatus for presenting a sample of material for analysis |
| AU2002325081B2 (en) * | 2001-09-05 | 2006-11-23 | Xrf Scientific Limited | Apparatus for presenting a sample of material for analysis |
-
1985
- 1985-07-10 JP JP15003385A patent/JPS6212844A/en active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS6212844A (en) | 1987-01-21 |
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