JPH0378779B2 - - Google Patents
Info
- Publication number
- JPH0378779B2 JPH0378779B2 JP60033763A JP3376385A JPH0378779B2 JP H0378779 B2 JPH0378779 B2 JP H0378779B2 JP 60033763 A JP60033763 A JP 60033763A JP 3376385 A JP3376385 A JP 3376385A JP H0378779 B2 JPH0378779 B2 JP H0378779B2
- Authority
- JP
- Japan
- Prior art keywords
- resin
- support plate
- pair
- main surface
- protrusion
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
Classifications
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
- H10W74/00—Encapsulations, e.g. protective coatings
- H10W74/01—Manufacture or treatment
- H10W74/016—Manufacture or treatment using moulds
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
- H10W74/00—Encapsulations, e.g. protective coatings
- H10W74/10—Encapsulations, e.g. protective coatings characterised by their shape or disposition
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
- H10W90/00—Package configurations
- H10W90/701—Package configurations characterised by the relative positions of pads or connectors relative to package parts
- H10W90/751—Package configurations characterised by the relative positions of pads or connectors relative to package parts of bond wires
- H10W90/756—Package configurations characterised by the relative positions of pads or connectors relative to package parts of bond wires between a chip and a stacked lead frame, conducting package substrate or heat sink
Landscapes
- Encapsulation Of And Coatings For Semiconductor Or Solid State Devices (AREA)
Description
【発明の詳細な説明】
〔産業上の利用分野〕
本発明は、放熱支持板の半導体チツプを固着す
る方の面のみならず、これを反対側の面にも成形
樹脂体層を設ける電力用樹脂封止型半導体装置の
製造方法に関する。[Detailed Description of the Invention] [Field of Industrial Application] The present invention provides a heat dissipation support plate for power use in which a molded resin layer is provided not only on the side to which a semiconductor chip is fixed, but also on the opposite side. The present invention relates to a method of manufacturing a resin-sealed semiconductor device.
半導体チツプを固着した放熱支持板の裏面にも
薄い樹脂層(厚さ数百μm)を形成し、外部放熱
体等への取付けに際してマイカ薄板のような絶縁
板を使用する必要をなくした樹脂封止型半導体装
置が例えば特開昭57−147260号公報に開示されて
いる。
A thin resin layer (several hundred μm thick) is also formed on the back side of the heat dissipation support plate to which the semiconductor chip is fixed, making it possible to create a resin seal that eliminates the need to use insulating plates such as mica thin plates when attaching to external heat dissipators, etc. A stop-type semiconductor device is disclosed in, for example, Japanese Patent Laid-Open No. 147260/1983.
また、この種の樹脂封止型半導体装置における
放熱支持板の裏面側に薄い樹脂層を良好に形成す
るために、第10図に示す様な金型を使用するこ
とは、本件出願人に係わる特願昭59−114018号で
提案されている。第10図において、1は放熱支
持板、2はリード、3はパワートランジスタチツ
プ、4は内部リード、5は保護樹脂、6は成形樹
脂、7は上部金型、8は下部金型、7aは樹脂の
流れを抑制する仕切り状の突出部、9は樹脂注入
孔、10は金型が型締めされることによつて形成
される。成形用空所である。この装置において、
樹脂注入孔9から粘液状態の樹脂を加熱されてい
る金型7,8の中に注入すると、放熱支持板1の
上と下に脂が流れ込む。この時、上側の樹脂の流
れが突出部7aで抑制され、放熱支持板1の下側
の樹脂の流れが相対的に強められる。この結果、
放熱支持板1の裏面に薄い樹脂層を良好に形成す
ることが出来る。 In addition, it is the applicant's responsibility to use a mold as shown in FIG. 10 in order to form a thin resin layer on the back side of the heat dissipation support plate in this type of resin-sealed semiconductor device. This was proposed in Japanese Patent Application No. 114018/1983. In Fig. 10, 1 is a heat dissipation support plate, 2 is a lead, 3 is a power transistor chip, 4 is an internal lead, 5 is a protective resin, 6 is a molding resin, 7 is an upper mold, 8 is a lower mold, and 7a is a A partition-like protrusion that suppresses the flow of resin, 9 is a resin injection hole, and 10 is formed by clamping a mold. This is a blank space for molding. In this device,
When resin in a sticky state is injected into the heated molds 7 and 8 through the resin injection hole 9, the fat flows above and below the heat dissipation support plate 1. At this time, the flow of the resin on the upper side is suppressed by the protrusion 7a, and the flow of the resin on the lower side of the heat dissipation support plate 1 is relatively strengthened. As a result,
A thin resin layer can be favorably formed on the back surface of the heat dissipation support plate 1.
ところで、成形樹脂6の流れは第1図で斜線で
説明的に示す如く支持板1の上側の流れUと下側
の流れLに大別される。空所10に対する成形樹
脂6の充填は、支持板1の上下において注入孔9
側から開始され、リード2側端部で終了すること
が好ましい。突出部7aは、この様な充填を達成
するため設けられている。
By the way, the flow of the molding resin 6 is roughly divided into a flow U above the support plate 1 and a flow L below the support plate 1, as illustrated by diagonal lines in FIG. Filling of the molding resin 6 into the void 10 is carried out through injection holes 9 at the top and bottom of the support plate 1.
Preferably, it starts from the side and ends at the lead 2 side end. The protrusion 7a is provided to achieve such filling.
しかし、支持板1のチツプ3の上部の相対的に
厚い樹脂層6aの充填状態に問題のあることが判
明した。即ち、第12図に模式的に示すように、
樹脂の下側の流れLは、樹脂の基本的な流動方向
である支持板1のリード側端部に向かつて進む下
側のみの流れL1と、支持板1の側面を通つて支
持板1の上側に回り込む流れL2、L3に分かれる。
樹脂の下側の流れLが強められている結果、支持
板1の上側の点Aにおいては、まず樹脂の流れ
L2、L3がぶつかり、その後で樹脂の流れUが到
達するという過程を経る。このような樹脂充填状
態では、点B近傍の空気が樹脂の流れU、L2、
L3に囲まれることによつて逃げ道を失い、最終
的にはチツプ3の上部近傍において樹脂層6aに
未充填部分を残すことになる。 However, it was found that there was a problem in the filling state of the relatively thick resin layer 6a above the chips 3 of the support plate 1. That is, as schematically shown in FIG.
The lower flow L of the resin is divided into a lower flow L 1 that advances toward the lead side end of the support plate 1, which is the basic flow direction of the resin, and a flow L1 only on the lower side that advances toward the lead side end of the support plate 1 through the side surface of the support plate 1. It splits into flows L 2 and L 3 that wrap around above.
As a result of the resin flow L on the lower side being strengthened, at point A on the upper side of the support plate 1, the resin flow first increases.
A process occurs in which L 2 and L 3 collide, and then the resin flow U arrives. In such a resin-filled state, the air near point B causes resin flows U, L 2 ,
By being surrounded by L 3 , there is no way to escape, and eventually an unfilled portion is left in the resin layer 6 a near the top of the chip 3 .
そこで、本発明の目的は、支持板の表面側に厚
い樹脂層を有し、裏面側に薄い樹脂層を有する半
導体装置を製造する際に表面側と裏面側との両方
に良好に樹脂を充填することができる方法を提供
することにある。 Therefore, an object of the present invention is to satisfactorily fill resin on both the front side and the back side when manufacturing a semiconductor device having a thick resin layer on the front side of a support plate and a thin resin layer on the back side. Our goal is to provide a way to do so.
上記目的を達成するための本発明は、放熱機能
及び電気伝導機能を有し且つ互いに平行な一対の
側面及びこの一対の側面の相互間の一対の端面を
有する支持板と、前記支持板の一方の主表面上に
固着された半導体チツプと、前記支持板の前記一
対の端面の一方の側に連結された支持板接続用外
部リードと、前記半導体チツプに電気的に接続さ
れた少なくとも1本のチツプ接続用外部リード
と、前記支持板接続用及び前記チツプ接続用外部
リードの支持板側の一部、前記半導体チツプ、及
び前記支持板を被覆する成形樹脂体とを具備し、
且つ前記支持板の一方の主表面側の樹脂層が他方
の主表面側の樹脂層よりも厚くなるように前記成
形樹脂体が形成されている半導体装置の製造方法
において、前記支持板の前記一対の端面の他方の
側から樹脂を注入するための樹脂注入孔を有し、
且つ前記樹脂注入孔から注入された樹脂の流れを
抑制するための突出部を有し、前記突出部が前記
支持板の一対の側面に沿うように配設されている
一対の側方突出部と前記支持板の前記一方の主表
面上において前記一対の端面の他方から一方に向
う樹脂の流れを抑制するために前記一対の側方突
出部の相互間の少なくとも一部に設けられた仕切
り状突出部とを備えている樹脂封止用型を用意
し、この樹脂封止用型の成形用空所に前記半導体
チツプを固着した前記支持板を配置し、前記樹脂
注入孔から樹脂を注入することによつて前記成形
樹脂体を形成することを特徴とする樹脂封止型半
導体装置の製造方法に係わるものである。
To achieve the above object, the present invention provides a support plate having a heat dissipation function and an electric conduction function and having a pair of mutually parallel side surfaces and a pair of end surfaces between the pair of side surfaces, and one of the support plates. a semiconductor chip fixed on the main surface of the support plate, an external lead for connecting the support plate connected to one side of the pair of end faces of the support plate, and at least one lead electrically connected to the semiconductor chip. comprising: an external lead for chip connection; a molded resin body that covers the support plate connection and a part of the chip connection external lead on the support plate side; the semiconductor chip; and a molded resin body that covers the support plate;
In the method for manufacturing a semiconductor device, the molded resin body is formed such that a resin layer on one main surface side of the support plate is thicker than a resin layer on the other main surface side, wherein the pair of support plates has a resin injection hole for injecting resin from the other side of the end face of
and a pair of lateral protrusions having protrusions for suppressing the flow of the resin injected from the resin injection hole, the protrusions being disposed along the pair of side surfaces of the support plate; a partition-like protrusion provided on at least a portion between the pair of lateral protrusions on the one main surface of the support plate to suppress the flow of resin from the other of the pair of end faces toward one side; preparing a resin sealing mold having a part, placing the support plate to which the semiconductor chip is fixed in a molding cavity of the resin sealing mold, and injecting resin from the resin injection hole. The present invention relates to a method of manufacturing a resin-sealed semiconductor device, characterized in that the molded resin body is formed by a method of manufacturing a resin-sealed semiconductor device.
本発明における仕切り状突出部は、支持板の一
方の主表面上の樹脂の流れを抑制し、支持板の他
方の主表面下の樹脂の流れを強める。他方の主表
面側の樹脂の流れが強められると、支持板側面を
通つて一方の主表面上に回り込む樹脂の流れが生
じる。しかし、この流れは側方突出部によつて阻
止されるか又は抑制される。この結果、支持板の
一方の主表面上と他方の主表面下に流れる樹脂の
バランスが良くなり、且つ支持板の一方の主表面
上における樹脂の流れと支持板の他方の主表面側
から一方主表面側に回り込む樹脂の流れとのぶつ
かり合いが阻止されるか又は弱められ、不完全な
樹脂充填部分の発生が防止される。
The partition-like protrusion in the present invention suppresses the flow of resin on one main surface of the support plate and strengthens the flow of resin under the other main surface of the support plate. When the flow of the resin on the other main surface side is strengthened, a flow of the resin wraps around onto the one main surface through the side surface of the support plate. However, this flow is blocked or suppressed by the lateral projections. As a result, the balance of the resin flowing on one main surface of the support plate and below the other main surface is improved, and the resin flow on one main surface of the support plate and the resin flowing from the other main surface side of the support plate to one side are improved. Collision with the resin flow that wraps around the main surface side is prevented or weakened, thereby preventing the occurrence of incomplete resin filling portions.
次に、第1図〜第8図に基づいて本発明の実施
例に係わる樹脂封止型パワートランジスタの製造
方法について説明する。
Next, a method for manufacturing a resin-sealed power transistor according to an embodiment of the present invention will be described based on FIGS. 1 to 8.
まず、第1図に示すリードフレーム11を用意
する。図ではトランジスタ1個分を示している
が、実際には多数個分(例えば10個分)が並列配
置されている。12はNi被覆Cu板から成る放熱
機能と電気伝導機能を合わせ持つた支持板であ
る。14は支持板12の一端に連結された支持板
接続用外部リードであり、コレクタリードとして
機能する。 First, a lead frame 11 shown in FIG. 1 is prepared. Although the figure shows one transistor, in reality, many transistors (for example, 10 transistors) are arranged in parallel. Reference numeral 12 denotes a support plate made of a Ni-coated Cu plate and having both a heat dissipation function and an electrical conduction function. Reference numeral 14 denotes an external lead for connecting the support plate connected to one end of the support plate 12, and functions as a collector lead.
13,15はチツプ接続用外部リードであり、
それぞれベースリード、エミツタリードとして機
能する。各外部リード13,14,15は、支持
板12と同一の材料で形成されている。16は外
部リード同志を橋絡するタイバー、17は外部リ
ード端を共通して連結する細条である。支持板1
2の外部リードとは反対側には、U字状切欠部1
8及び支持板12の肉薄部12bが形成されてい
る。12aは支持板12の肉厚部である。19は
シリコンパワートランジスタチツプで、その下面
はコレクタ電極(図示せず)となつており、支持
板12の一方の主表面上に半田(図示せず)によ
り固着されている。チツプ19の上面には、ベー
ス電極及びエミツタ電極(図示せず)が形成され
ており、これらの電極と外部リード13,15の
間がAl線から成る内部リード20,21で接続
されている。22はシリコン樹脂から成るチツプ
保護用樹脂である。 13 and 15 are external leads for chip connection;
Each functions as a base lead and an emitter lead. Each external lead 13, 14, 15 is made of the same material as the support plate 12. 16 is a tie bar that bridges the external leads, and 17 is a strip that commonly connects the ends of the external leads. Support plate 1
On the side opposite to the external lead 2, there is a U-shaped notch 1.
8 and a thin wall portion 12b of the support plate 12 are formed. 12a is a thick portion of the support plate 12. Reference numeral 19 denotes a silicon power transistor chip, the lower surface of which serves as a collector electrode (not shown), and is fixed to one main surface of the support plate 12 with solder (not shown). A base electrode and an emitter electrode (not shown) are formed on the upper surface of the chip 19, and these electrodes and the outer leads 13 and 15 are connected by inner leads 20 and 21 made of Al wire. 22 is a chip protection resin made of silicone resin.
また、第1図のチツプ19が固着されたリード
フレーム11を樹脂封止するために、第2図〜第
4図に示す上下の金型23,24を用意する。こ
の上下の金型23,24は、これを組み合せるこ
とによつて第3図及び第4図に示す如き成形空所
25を得るものであり、支持板の肉薄部12bを
挾持するための一対の円錐台状ピン23aと、取
付孔を得るための円筒状突起23bと、取付孔を
得るための円筒状突起23bと、支持板12のチ
ツプ19が固着されている上面(一方の主表面
側)における樹脂の流れを妨げるための仕切り状
突出部23cと、支持板12の下面(他方の主表
面側)から側方を通つて上面側に樹脂が流れ込む
ことを妨げるための側方突出部23dとを有す
る。なお、仕切り状突出部24cの中央には脂の
流れ方向に従つて末広状に幅が大になつている溝
23eが設けられている。この溝23eは、円筒
状突起23bによつて妨げられた中央部の樹脂の
流れの強さを補償する機能を有する。下部金型2
4は支持板12を挾持するための一対の円錐台状
ピン24aと、リード配置用溝24bと、樹脂注
入孔26とを有する。 Further, in order to resin-seal the lead frame 11 to which the chip 19 shown in FIG. 1 is fixed, upper and lower molds 23 and 24 shown in FIGS. 2 to 4 are prepared. The upper and lower molds 23 and 24 are combined to form a molding cavity 25 as shown in FIGS. 3 and 4, and are a pair for holding the thin part 12b of the support plate. The truncated conical pin 23a, the cylindrical protrusion 23b for obtaining the mounting hole, the upper surface (one main surface side) to which the chip 19 of the support plate 12 is fixed. ) and a lateral protrusion 23d to prevent the resin from flowing from the lower surface (the other main surface side) of the support plate 12 to the upper surface side through the sides. and has. A groove 23e is provided in the center of the partition-like protrusion 24c, and the groove 23e becomes wider in the direction of the fat flow. This groove 23e has a function of compensating for the strength of the flow of resin in the central portion that is obstructed by the cylindrical projection 23b. Lower mold 2
4 has a pair of truncated conical pins 24a for holding the support plate 12, a lead arrangement groove 24b, and a resin injection hole 26.
次に、第1図に示すチツプ19が固着されたリ
ードフレーム11を第2図の金型23,24の成
形空所25に第3図及び第4図に示す如く配置
し、一対の金型23,24の型締めをなす。これ
より、リード13〜15が上下の金型23,24
で挾持されると共に、上下のピン23a,24a
によつて支持板12の肉薄部12bが挾持され
る。円筒状突起23bは支持板12の切欠部18
を通つて下部金型24に接する。仕切り状突出部
23cは樹脂注入孔26とチツプ19との間に位
置する。側方突出部23dは、仕切り状突出部2
3cからチツプ19のほぼ中央部までに対応する
側方に位置し、この先端と支持板12との間に僅
かな隙間が生じる。支持板12はその厚み方向に
おける位置が正確になるように金型23,24内
に収容されているので、側方突出部23dの先端
と支持板12との間隔の精度は高い。支持板12
の上方の生じる上部空所25aに比較し、下部空
所25bは極めて狭く、支持板の肉厚部12aと
下部金型24との間隔は約0.5mmである。 Next, the lead frame 11 to which the chip 19 shown in FIG. 1 is fixed is placed in the molding cavity 25 of the molds 23 and 24 shown in FIG. 23 and 24 are clamped. From this, the leads 13 to 15 are attached to the upper and lower molds 23, 24.
The upper and lower pins 23a, 24a
The thin portion 12b of the support plate 12 is held between the two. The cylindrical projection 23b is located in the notch 18 of the support plate 12.
It contacts the lower mold 24 through. The partition-like protrusion 23c is located between the resin injection hole 26 and the chip 19. The lateral protrusion 23d is the partition-like protrusion 2
3c to approximately the center of the tip 19, and a slight gap is created between this tip and the support plate 12. Since the support plate 12 is housed in the molds 23 and 24 so that its position in the thickness direction is accurate, the spacing between the tip of the lateral protrusion 23d and the support plate 12 is highly accurate. Support plate 12
Compared to the upper cavity 25a formed above, the lower cavity 25b is extremely narrow, and the distance between the thick part 12a of the support plate and the lower mold 24 is about 0.5 mm.
次に、第5図及び第6図に示すように、公知の
トランスフアモールド法に基づいて、加熱されて
いつたん粘液状となつたエポキシ樹脂を注入孔2
6から空所25に加圧注入する。金型23,24
は約180℃に加熱されているので、空所25に充
填されたエポキシ樹脂は数分以内に熱硬化し、成
形樹脂体27となる。この成形樹脂体27を得る
ための樹脂注入時に、金型の仕切り状突出部23
cは第11図の突出部7aと同じく上部空所25
aへの樹脂の流れを抑制して相対的に下部空所2
5bへの樹脂の流れを強める。このため、下部空
所25bに樹脂の未充填部分が生じることが防止
され、薄い樹脂層27bが良好に形成される。ま
た、金型の側方突出部23dは下部空所25bを
流れた樹脂が上部空所25aに回り込もうとする
のを抑制する。即ち、第11図で言えば、樹脂の
流れL2,L3を弱めるように作用する。このため、
上部空所25aのチツプ19の上部近傍に樹脂の
未充填部分が発生することが防止され、厚い樹脂
層27aも良好に形成される。この樹脂注入時に
おける支持板12の上面中央部の樹脂の流れは、
仕切り状突出部23cの中央に溝23eが設けら
れているので、比較的強い。即ち、円筒状突起2
3bが前方にあるにも拘らず、中央部の流れの強
さがこの中央部の両側よりも落ちることが防止さ
れる。更に溝23eは末広がり形成されているの
で、支持板12の上面を流れる樹脂と下面から側
方を通つて回り込んでくる樹脂とのバランスが良
くなる。 Next, as shown in FIGS. 5 and 6, based on the known transfer molding method, the epoxy resin, which has been heated and has become sticky, is poured into the injection hole 2.
6 into the cavity 25 under pressure. Molds 23, 24
Since the resin is heated to about 180° C., the epoxy resin filled in the cavity 25 is thermally hardened within a few minutes to form the molded resin body 27. At the time of resin injection to obtain this molded resin body 27, the partition-like protrusion 23 of the mold
c is the upper space 25 similar to the protrusion 7a in FIG.
By suppressing the flow of resin to a, the lower space 2 is relatively
Strengthen the flow of resin to 5b. Therefore, it is possible to prevent an unfilled portion of the resin from forming in the lower space 25b, and to form a thin resin layer 27b in a good manner. Further, the lateral protrusion 23d of the mold prevents the resin that has flowed through the lower cavity 25b from going around to the upper cavity 25a. That is, in FIG. 11, it acts to weaken the resin flows L 2 and L 3 . For this reason,
This prevents the occurrence of an unfilled portion of the resin near the top of the chip 19 in the upper space 25a, and allows a thick resin layer 27a to be formed satisfactorily. The flow of the resin at the center of the upper surface of the support plate 12 during resin injection is as follows:
Since the groove 23e is provided in the center of the partition-like protrusion 23c, it is relatively strong. That is, the cylindrical projection 2
3b is in front, the strength of the flow in the central part is prevented from being lower than on both sides of this central part. Further, since the groove 23e is formed to widen toward the end, the balance between the resin flowing on the upper surface of the support plate 12 and the resin coming around from the lower surface through the sides is improved.
次に、金型23,24の型締めを解いてリード
フレーム11を取り出し、成形樹脂体27を完全
に熱硬化させるために更に長時間の熱処理を行
う。続いてタイバー16および細条17をプレス
加工により切断で除去し、第7図及び第8図に示
すパワートランジスタとする。凹部28,29
は、それぞれ金型の円錐台状ピン23a,24a
に対応して形成されるものである。30は外部放
熱体に取付けるときにネジ等を通すための取付孔
であり、金型の円筒状ピン23bに対応して形成
されたものである。凹所31,32は、それぞれ
金型の突出部23c,23dに対応して形成され
たものである。凹部31,32の底と支持板12
との間には薄い樹脂層が介在している。 Next, the molds 23 and 24 are unclamped, the lead frame 11 is taken out, and the molded resin body 27 is subjected to an even longer heat treatment in order to completely heat cure. Subsequently, the tie bars 16 and the strips 17 are cut and removed by press working to obtain the power transistor shown in FIGS. 7 and 8. Recesses 28, 29
are the truncated conical pins 23a and 24a of the mold, respectively.
It is formed in response to the Reference numeral 30 denotes a mounting hole through which a screw or the like is passed when attaching to an external heat sink, and is formed to correspond to the cylindrical pin 23b of the mold. The recesses 31 and 32 are formed corresponding to the protrusions 23c and 23d of the mold, respectively. The bottoms of the recesses 31 and 32 and the support plate 12
A thin resin layer is interposed between the two.
本発明は上述の実施例に限定されるものでな
く、例えば次の変形例が可能なものである。
The present invention is not limited to the embodiments described above, and the following modifications are possible, for example.
(A) 第9図に示す完成したトランジスタに示す凹
部32が得られるように、上部金型23の側方
突出部23dを金型23の側壁から少し離して
もよい。即ち突出部23dを仕切り状に形成し
てもよい。(A) The lateral protrusion 23d of the upper mold 23 may be slightly separated from the side wall of the mold 23 so that the recess 32 shown in the completed transistor shown in FIG. 9 is obtained. That is, the protruding portion 23d may be formed into a partition shape.
(B) 完成したトランジスタにおいて、成形樹脂体
27の側面にのみ開口入口を有するように突出
部23dが金型23の側壁から支持板12平行
に突出するようにしてもよい。(B) In the completed transistor, the protrusion 23d may protrude from the side wall of the mold 23 parallel to the support plate 12 so that the opening inlet is provided only on the side surface of the molded resin body 27.
第1図は本発明の実施例に係わるリードフレー
ムを示す斜視図、第2図は本発明の実施例に係わ
る金型の一部を示す斜視図、第3図は第1図のリ
ード14に沿う部分に対応する金型とリードフレ
ームとの断面図、第4図は第1図のリード13に
沿う部分に対応する金型とリードフレームとの断
面図、第5図及び第6図は成形樹脂体を形成した
ものを示す第3図及び第4図に対応する断面図、
第7図は完成したトランジスタの斜視図、第8図
は第7図のトランジスタの平面図、第9図は変形
例のトランジスタを示す平面図、第10図は従来
の金型とトランジスタを示す断面図、第11図は
第10図のトランジスタのリードフレームを示す
斜視図である。
12……支持板、13,14,15……リー
ド、19……チツプ、23……上部金型、23c
……仕切り状突出部、23d……側方突出部、2
4……下部金型。
FIG. 1 is a perspective view showing a lead frame according to an embodiment of the present invention, FIG. 2 is a perspective view showing a part of a mold according to an embodiment of the present invention, and FIG. FIG. 4 is a sectional view of the mold and lead frame corresponding to the portion along the lead 13 in FIG. 1, and FIGS. 5 and 6 are the molding A sectional view corresponding to FIGS. 3 and 4 showing a resin body formed therein;
Fig. 7 is a perspective view of the completed transistor, Fig. 8 is a plan view of the transistor shown in Fig. 7, Fig. 9 is a plan view showing a modified transistor, and Fig. 10 is a cross section showing the conventional mold and transistor. 11 is a perspective view showing the lead frame of the transistor shown in FIG. 10. 12... Support plate, 13, 14, 15... Lead, 19... Chip, 23... Upper mold, 23c
...Partition-like protrusion, 23d...Side protrusion, 2
4...Lower mold.
Claims (1)
平行な一対の側面及びこの一対の側面の相互間の
一対の端面を有する支持板と、前記支持板の一方
の主表面上に固着された半導体チツプと、前記支
持板の前記一対の端面の一方の側に連結された支
持板接続用外部リードと、前記半導体チツプに電
気的に接続された少なくとも1本のチツプ接続用
外部リードと、前記支持板接続用及び前記チツプ
接続用外部リードの支持板側の一部、前記半導体
チツプ、及び前記支持板を被覆する成形樹脂体と
を具備し、且つ前記支持板の一方の主表面側の樹
脂層が他方の主表面側の樹脂層よりも厚くなるよ
うに前記成形樹脂体が形成されている半導体装置
の製造方法において、前記支持板の前記一対の端
面の他方の側から樹脂を注入するための樹脂注入
孔を有し、且つ前記樹脂注入孔から注入された樹
脂の流れを抑制するための突出部を有し、前記突
出部が前記支持板の一対の側面に沿うように配設
されている一対の側方突出部と前記支持板の前記
一方の主表面上において前記一対の端面の他方か
ら一方に向う樹脂の流れを抑制するために前記一
対の側方突出部の相互間の少なくとも一部に設け
られた仕切り状突出部とを備えている樹脂封止用
型を用意し、この樹脂封止用型の成形用空所に前
記半導体チツプを固着した前記支持板を配置し、
前記樹脂注入孔から樹脂を注入することによつて
前記成形樹脂体を形成することを特徴とする樹脂
封止型半導体装置の製造方法。1. A support plate having a heat dissipation function and an electrical conduction function and having a pair of mutually parallel side surfaces and a pair of end surfaces between the pair of side surfaces, and a semiconductor chip fixed on one main surface of the support plate. a support plate connection external lead connected to one side of the pair of end faces of the support plate; at least one chip connection external lead electrically connected to the semiconductor chip; and the support plate. A molded resin body that covers a part of the support plate side of the external lead for connection and the chip connection, the semiconductor chip, and the support plate, and a resin layer on one main surface side of the support plate. In the method of manufacturing a semiconductor device, in which the molded resin body is formed to be thicker than the resin layer on the other main surface side, the resin is injected from the other side of the pair of end surfaces of the support plate. a pair having an injection hole and a protrusion for suppressing the flow of resin injected from the resin injection hole, the protrusion being disposed along the pair of side surfaces of the support plate; At least a portion between the pair of side protrusions and the one main surface of the support plate to suppress the flow of resin from the other end face to the other side of the pair of end faces. preparing a resin sealing mold having a partition-like protrusion, disposing the support plate to which the semiconductor chip is fixed in a molding cavity of the resin sealing mold;
A method for manufacturing a resin-sealed semiconductor device, characterized in that the molded resin body is formed by injecting resin from the resin injection hole.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP60033763A JPS61193460A (en) | 1985-02-22 | 1985-02-22 | Manufacture of resin-sealed type semiconductor device |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP60033763A JPS61193460A (en) | 1985-02-22 | 1985-02-22 | Manufacture of resin-sealed type semiconductor device |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS61193460A JPS61193460A (en) | 1986-08-27 |
| JPH0378779B2 true JPH0378779B2 (en) | 1991-12-16 |
Family
ID=12395470
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP60033763A Granted JPS61193460A (en) | 1985-02-22 | 1985-02-22 | Manufacture of resin-sealed type semiconductor device |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS61193460A (en) |
Families Citing this family (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5018003A (en) * | 1988-10-20 | 1991-05-21 | Mitsubishi Denki Kabushiki Kaisha | Lead frame and semiconductor device |
| US5728600A (en) * | 1994-11-15 | 1998-03-17 | Vlt Corporation | Circuit encapsulation process |
| US5945130A (en) * | 1994-11-15 | 1999-08-31 | Vlt Corporation | Apparatus for circuit encapsulation |
Family Cites Families (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5980951A (en) * | 1983-08-24 | 1984-05-10 | Hitachi Ltd | Resin molded electronic component parts |
-
1985
- 1985-02-22 JP JP60033763A patent/JPS61193460A/en active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS61193460A (en) | 1986-08-27 |
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