JPH0378783B2 - - Google Patents
Info
- Publication number
- JPH0378783B2 JPH0378783B2 JP7703388A JP7703388A JPH0378783B2 JP H0378783 B2 JPH0378783 B2 JP H0378783B2 JP 7703388 A JP7703388 A JP 7703388A JP 7703388 A JP7703388 A JP 7703388A JP H0378783 B2 JPH0378783 B2 JP H0378783B2
- Authority
- JP
- Japan
- Prior art keywords
- cap
- electrode
- contact
- curved surface
- electrodes
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 238000003466 welding Methods 0.000 claims description 26
- 238000007789 sealing Methods 0.000 claims description 18
- 238000000034 method Methods 0.000 claims description 16
- 239000004065 semiconductor Substances 0.000 claims description 16
- 239000002184 metal Substances 0.000 claims description 12
- 230000002093 peripheral effect Effects 0.000 claims description 11
- 239000000919 ceramic Substances 0.000 description 3
- 230000008094 contradictory effect Effects 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000004070 electrodeposition Methods 0.000 description 1
- 230000020169 heat generation Effects 0.000 description 1
- 238000007747 plating Methods 0.000 description 1
- 238000004381 surface treatment Methods 0.000 description 1
Landscapes
- Butt Welding And Welding Of Specific Article (AREA)
- Die Bonding (AREA)
Description
【発明の詳細な説明】
(産業上の利用分野)
本発明はシーム溶接法にて半導体装置のパツケ
ージとキヤツプを気密封止する方法およびこの気
密封止方法に用いられる半導体気密封止用電極に
関する。Detailed Description of the Invention (Field of Industrial Application) The present invention relates to a method of hermetically sealing a package and a cap of a semiconductor device by seam welding, and an electrode for hermetically sealing a semiconductor used in this hermetic sealing method. .
(従来技術)
従来、金属表面処理(メツキ)をした半導体装
置用の積層セラミツクパツケージに金属キヤツプ
をかぶせてその接合部をシーム溶接法にて気密封
止する方法として、一対の円錐ローラ電極を金属
キヤツプの上側稜線に接触させ、前記ローラ電極
を回転させつつ該電極とセラミツクパツケージを
相対移動させてパツケージ周囲を溶接する方法が
とられている。第6図a〜dは角形のシールフレ
ームがロー付けされたパツケージを、パツケージ
直線移動方式のパラレルシーム溶接法で溶接封止
する手順を示したものである。まず第6図a,c
の如くセラミツクパツケージ1をテーブル2に固
定し、長方形の角形キヤツプ3を角形シールフレ
ーム4にのせ、軸がキヤツプ面に平行な円錐台形
の一対のローラ電極5をエアーシリンダ等によつ
て下降させるかテーブル2を上昇させるかして長
方形の角形キヤツプ3を電極5で押え付け、次い
でテーブル2を矢印A方向に直線移動させてキヤ
ツプの長辺側を封止する。その後、第6図b,d
の如くテーブル2を90゜方向転換して矢印B方向
に移動させ、キヤツプ3の短辺側の封止を完了
後、再びテーブル2を90゜回転させて元の位置に
戻す。電極5はキヤツプ3の移動につれて軸線の
まわりに回転する。この方法が角形シームパツケ
ージを封止する従来の方法で、直線方向にテーブ
ルが移動することから、直線移動式パラレルシー
ム溶接法と呼ばれている。(Prior art) Conventionally, a pair of conical roller electrodes were attached to metal as a method of covering a laminated ceramic package for semiconductor devices with metal surface treatment (plating) with a metal cap and hermetically sealing the joint by seam welding. A method is used in which the roller electrode is brought into contact with the upper ridgeline of the cap, and the electrode and the ceramic package are moved relative to each other while the roller electrode is rotated to weld the periphery of the package. 6a to 6d show a procedure for welding and sealing a package to which a rectangular seal frame is brazed by a parallel seam welding method using a package linear movement method. First, Figure 6 a, c
A ceramic package 1 is fixed on a table 2 as shown in FIG. The rectangular square cap 3 is held down by the electrode 5 by raising the table 2, and then the table 2 is moved linearly in the direction of arrow A to seal the long side of the cap. After that, Fig. 6 b, d
The table 2 is turned 90 degrees and moved in the direction of arrow B as shown in FIG. The electrode 5 rotates about its axis as the cap 3 moves. This method is the conventional method for sealing rectangular seam packages, and is called linear parallel seam welding because the table moves in a straight line.
第6図a〜dに示す従来例では、ローラ電極の
軸線が金属キヤツプ面と平行な方向にのびている
が、これを前記キヤツプ面に対して垂直な方向と
なるように軸支し、かつ前記キヤツプの稜線と接
する先端部を充分基底直径の大きい円錐形とし、
電極円錐面の接触可能領域を広くすることによ
り、角形シールフレーム側を直線移動させること
なく回転のみで溶接封止できるようにしたものも
ある(例えば特公昭57−42223号公報)。 In the conventional example shown in FIGS. 6a to 6d, the axis of the roller electrode extends in a direction parallel to the metal cap surface, but it is pivoted in a direction perpendicular to the metal cap surface, and The tip that touches the ridgeline of the cap is shaped like a cone with a sufficiently large base diameter,
There is also a device in which the contactable area of the conical electrode surface is widened so that welding and sealing can be performed only by rotation without linearly moving the rectangular seal frame side (for example, Japanese Patent Publication No. 57-42223).
(発明が解決しようとする問題点)
この種のシーム溶接においては、ローラ電極の
接触面積と溶接部位の発熱は相反する関係にあ
り、また溶接電流の電流値の大小はパツケージ全
体の温度上昇に影響するので、パツケージの大き
さ、種類等によつて電極の接触面積と電流量との
関係を適切に選定する必要がある。例えば電流量
が同じであるとすれば、金属キヤツプとの接触点
でのローラ電極のテーパ角度が大きい程パツケー
ジ全体の温度上昇は抑制される。しかし上述した
従来のシーム溶接法で用いるローラ電極は、いず
れも裁頭円錐形(円錐台形)あるいは直円錐形の
形状を有し、したがつて金属キヤツプとの接触点
における電極面のテーパ角度はローラ電極の位置
(軸方向位置)に関係なく一定である。このため
従来はパツケージの種類に応じてその都度適切な
テーパ角度をもつたローラ電極と取り換えてシー
ム溶接をしなければならないという不便があつ
た。さらに従来の円錐形ローラ電極では、パツケ
ージのフレームあるいはテーブルとの接触を避け
るために、採用できるテーパ角度にも制限があ
り、場合によつてはテーブルも交換しなければな
らないという不具合があつた。(Problems to be Solved by the Invention) In this type of seam welding, the contact area of the roller electrode and the heat generation at the welding area are in a contradictory relationship, and the magnitude of the current value of the welding current affects the temperature rise of the entire package. Therefore, it is necessary to appropriately select the relationship between the electrode contact area and the amount of current depending on the size, type, etc. of the package. For example, assuming that the amount of current is the same, the larger the taper angle of the roller electrode at the point of contact with the metal cap, the more the temperature rise of the entire package will be suppressed. However, the roller electrodes used in the conventional seam welding method described above all have a truncated cone shape or a right cone shape, so the taper angle of the electrode surface at the point of contact with the metal cap is It is constant regardless of the position (axial position) of the roller electrode. For this reason, conventionally, there was an inconvenience that seam welding had to be performed by replacing the roller electrode with a roller electrode having an appropriate taper angle each time depending on the type of package. Furthermore, conventional conical roller electrodes have limitations in the taper angle that can be adopted in order to avoid contact with the package frame or table, and in some cases the table must be replaced.
(問題点を解決するための手段)
本発明は半導体装置に金属キヤツプをかぶせ該
キヤツプの異なる2点の周縁部に一対の電極を接
触させてシーム溶接法にて気密封止する方法にお
いて、前記一対の電極は回転放物面状の曲面を有
し、半導体装置の種類に応じて前記曲面とキヤツ
プ周縁部との接触抵抗が最適となる電極上の曲面
位置を選択して前記キヤツプ周縁部に接触させ、
前記電極と前記キヤツプ周縁部を相対移動させて
シーム溶接するようにしたものである。(Means for Solving the Problems) The present invention provides a method for hermetically sealing a semiconductor device by a seam welding method by covering a semiconductor device with a metal cap and contacting a pair of electrodes with two different peripheral edges of the cap. The pair of electrodes has a curved surface in the shape of a paraboloid of revolution, and the position of the curved surface on the electrode where the contact resistance between the curved surface and the peripheral edge of the cap is optimal is selected depending on the type of semiconductor device, and the curved surface is attached to the peripheral edge of the cap. contact,
Seam welding is performed by moving the electrode and the peripheral edge of the cap relative to each other.
また、本発明の気密封止方法に用いる電極は、
回転放物面状の曲面部分を有し、該曲面部分を前
記キヤツプ周縁部との接触領域としたものであ
る。 Further, the electrode used in the hermetic sealing method of the present invention is
It has a curved surface portion in the shape of a paraboloid of revolution, and the curved surface portion is used as a contact area with the peripheral edge of the cap.
(実施例)
次に、本発明を実施例について図面を参照して
説明する。(Example) Next, an example of the present invention will be described with reference to the drawings.
第1図は、本発明の実施例に係るローラ電極1
0の側面図であり、第2図は本発明に係る気密封
止方法を用いて角形パツケージの気密封止を行う
場合の一例を示した平面図である。第1図に示す
ように本実施例のローラ電極10は、軸部11の
先端に回転放物面の曲面部分をもつキヤツプ接触
部12を有している。この回転放物面の中心線は
軸部11の軸線13と一致している。したがつて
キヤツプ接触部12の任意の点Pにおける接線T
と軸線との成す角(テーパ角)θは軸線方向にと
つたキヤツプ接触部上の各点についてそれぞれ異
なつており、第3図に示すように先端部側ではこ
の角度が大で被溶接材の金属キヤツプ3との接触
面積が小さく、軸部11側即ち回転放物面の基底
部12aに近ずく程テーパ角θは小となつてキヤ
ツプ3との接触面積は増大する。 FIG. 1 shows a roller electrode 1 according to an embodiment of the present invention.
0, and FIG. 2 is a plan view showing an example of the case where a rectangular package is hermetically sealed using the hermetic sealing method according to the present invention. As shown in FIG. 1, the roller electrode 10 of this embodiment has a cap contact portion 12 having a curved surface portion of a paraboloid of revolution at the tip of a shaft portion 11. The center line of this paraboloid of revolution coincides with the axis 13 of the shaft portion 11. Therefore, the tangent T at any point P of the cap contact portion 12
The angle (taper angle) θ formed by The contact area with the metal cap 3 is small, and the closer it gets to the shaft portion 11 side, that is, the base 12a of the paraboloid of revolution, the smaller the taper angle θ becomes, and the contact area with the cap 3 increases.
このようなローラ電極でパツケージの気密封止
を行うには、第2図に示すように、一対の電極1
0,10′を水平に対向して軸支し、パツケージ
1の角形シールフレーム上にかぶせた角形金属キ
ヤツプ3の対向した二つの陵部に回転放物面のキ
ヤツプ接触部12,12′を接触させて押圧し、
パツケージ1を電極軸線に対して直角方向(図示
矢印方向)に移動させて各電極をその軸線のまわ
りに回転させ、例えばキヤツプ3の長辺側2辺を
封止し、その後、パツケージ1を水平面内で90゜
回転させて同様に短辺側2辺の封止を行う。な
お、第6図でも説明したように、この実施例でも
パツケージ1は直線往復移動可能なテーブル上に
固定される。 In order to hermetically seal a package using such roller electrodes, as shown in Figure 2, a pair of electrodes 1
0 and 10' are horizontally opposed and pivoted, and the cap contact portions 12 and 12' of the paraboloid of revolution are brought into contact with the two opposing ridges of the square metal cap 3 which is placed over the square seal frame of the package 1. Let and press,
The package 1 is moved in a direction perpendicular to the electrode axis (in the direction of the arrow shown in the figure) and each electrode is rotated around the axis to seal the two long sides of the cap 3, for example, and then the package 1 is moved on a horizontal surface. Rotate it 90 degrees within the box and seal the two short sides in the same way. As explained in FIG. 6, in this embodiment as well, the package 1 is fixed on a table that can be moved back and forth in a straight line.
ここで本発明においては、パツケージ1の種
類、大きさ、外形形状等によつて、一対のローラ
電極10,10′の間隔を変え、キヤツプ接触部
12とキヤツプ稜部との接触面積、いいかえれば
接触抵抗が良好な溶接結果をもたらす電極位置を
選定して接触させる。これによつてその都度所要
のテーパ角をもつローラ電極と交換することな
く、同じ電極で種々の半導体装置のシーム溶接封
止を行うことができる。 Here, in the present invention, the distance between the pair of roller electrodes 10, 10' is changed depending on the type, size, external shape, etc. of the package 1, and the contact area between the cap contact portion 12 and the cap ridge, in other words, Select and make contact with the electrode position that provides a good welding result with contact resistance. As a result, various semiconductor devices can be seam welded and sealed using the same electrode without having to replace the roller electrode with a roller electrode having the required taper angle each time.
第4図は半導体装置のシーム溶接において本発
明によるローラ電極10を用いた場合と従来の円
錐台形ローラ電極5(破線で示す)を用いた場合
とを比較して示した部分的な正面図である。この
半導体装置のパツケージ1に対しては電極10の
回転放物面のC点で接触させるのが接触抵抗の上
で最適であるとした場合に、これを従来の電極5
を用いて溶接しようとすると、図示の位置では電
極5の大径の基底部5aがテーブル2に当接する
こととなり、従来このような場合は同じデーパ角
でテーブル2に当らない形状の小さな円錐台形ロ
ーラ電極5′と取り換えて、同じ中心半径Rの位
置で接触させて溶接しなければならない。これに
対して本発明の放物曲面をもつローラ電極10の
場合は、曲面上の任意の点(例えば図示のC点)
から軸線方向両側の部分が被溶接部側から離れる
方向へ凸状にわん曲するので、直円錐形と比べて
その分だけテーブル等に当接する危険は少ない。 FIG. 4 is a partial front view showing a comparison between the case where the roller electrode 10 according to the present invention is used and the case where a conventional truncated conical roller electrode 5 (indicated by a broken line) is used in seam welding of semiconductor devices. be. If it is assumed that contacting the package 1 of this semiconductor device at point C of the paraboloid of revolution of the electrode 10 is optimal in terms of contact resistance, then this is compared to the conventional electrode 5.
If welding is attempted using the electrode 5, the large-diameter base 5a of the electrode 5 will come into contact with the table 2 at the position shown in the figure. It must be replaced with the roller electrode 5' and welded by contacting it at the same center radius R. On the other hand, in the case of the roller electrode 10 having a parabolic curved surface of the present invention, any point on the curved surface (for example, point C in the figure)
Since the parts on both sides in the axial direction are convexly curved in the direction away from the part to be welded, there is less risk of contact with a table etc. compared to a right conical shape.
上述の実施例では電極の軸線をキヤツプの面と
平行(水平)に保持した場合を示したが、場合に
よつては第5図のように電極軸線13をキヤツプ
面3aに対して垂直方向に軸支し、回転放物面を
もつ先端部の曲面上で所望テーパ角の接触位置を
選んで電極とキヤツプの稜線を接触させて溶接し
てもよい。 In the above embodiment, the axis of the electrode is held parallel (horizontal) to the surface of the cap, but in some cases, the axis of the electrode 13 may be held perpendicular to the surface of the cap 3a as shown in FIG. The cap may be pivoted, and a contact position with a desired taper angle may be selected on the curved surface of the distal end having a paraboloid of rotation, and the electrode may be brought into contact with the ridgeline of the cap for welding.
以上の実施例においては、矩形のキヤツプを用
いた場合について説明したが、キヤツプが円形の
場合には一対の放物面状電極の適切なテーパ角の
部分を選んで該キヤツプに接触させ、テーブルを
180゜強ほど回転させることにより同様にシーム溶
接することができる。 In the above embodiments, a rectangular cap is used, but if the cap is circular, select a portion of a pair of parabolic electrodes with an appropriate taper angle and bring them into contact with the cap. of
Seam welding can be done in the same way by rotating it a little more than 180 degrees.
(発明の効果)
以上説明したように本発明によれば、1つの電
極で複数のテーパ角をもたせることができ、した
がつて種々の半導体装置に対してその都度これに
合つたテーパ角の電極と交換する必要がなく、能
率のよい溶接封止が行える。また円錐形電極のよ
うに電極基部側が半導体装置の支持台、回転台等
に当る危険が少なく、この点でも同じ1つの電極
で各種外形の半導体装置のシーム溶接を有効に行
い得る効果がある。(Effects of the Invention) As explained above, according to the present invention, one electrode can have a plurality of taper angles. There is no need to replace it, and efficient welding and sealing can be performed. In addition, unlike a conical electrode, there is less risk of the electrode base side hitting the support stand, rotary table, etc. of the semiconductor device, and in this respect, the same electrode can effectively perform seam welding of semiconductor devices of various external shapes.
第1図は本発明の実施例に係る溶接封止用電極
の側面図、第2図は本発明による電極を用いて気
密封止する場合の一例を示した平面図、第3図は
本発明の電極におけるテーパ角の変化を例示した
部分的な側面図、第4図は電極とパツケージテー
ブルとの位置関係を本発明による電極と従来の円
錐台形ローラ電極について比較して示した側面
図、第5図は本発明の他の実施例に係る溶接封止
用電極の側面図、第6図a〜dは従来の円錐台形
ローラ電極によるパラレルシーム溶接の溶接手順
を示した図である。
1……パツケージ、2……テーブル、3……角
形キヤツプ、4……角形シールフレーム、5,1
0……ローラ電極、11……軸部、12……キヤ
ツプ接触部、θ……テーパ角、T……接触点接
線。
FIG. 1 is a side view of a welding sealing electrode according to an embodiment of the present invention, FIG. 2 is a plan view showing an example of hermetic sealing using the electrode according to the present invention, and FIG. 3 is a side view of a weld sealing electrode according to an embodiment of the present invention. FIG. 4 is a partial side view illustrating changes in the taper angle of the electrode; FIG. FIG. 5 is a side view of a weld sealing electrode according to another embodiment of the present invention, and FIGS. 6a to 6d are diagrams showing a welding procedure for parallel seam welding using a conventional truncated conical roller electrode. 1...Package, 2...Table, 3...Square cap, 4...Square seal frame, 5,1
0... Roller electrode, 11... Shaft portion, 12... Cap contact portion, θ... Taper angle, T... Contact point tangent.
Claims (1)
プの異なる2点の周縁部に一対の電極を接触させ
てシーム溶接法にて気密封止する方法において、
前記一対の電極は回転放物面状の曲面を有し、半
導体装置の種類に応じて前記曲面とキヤツプ周縁
部との接触抵抗が最適となる電極上の曲面位置を
選択して前記キヤツプ周縁部に接触させ、前記電
極と前記キヤツプ周縁部を相対移動させてシーム
溶接することを特徴とする半導体装置の気密封止
方法。 2 半導体装置に金属キヤツプをかぶせ該キヤツ
プの異なる2点の周縁部に一対の電極を接触させ
てシーム溶接法にて気密封止するのに用いる電極
において、回転放物面状の曲面部分を有し、該曲
面部分を前記キヤツプ周縁部との接触領域とする
ことを特徴とする半導体装置の気密封止用電極。[Claims] 1. A method of covering a semiconductor device with a metal cap, contacting a pair of electrodes with two different peripheral edges of the cap, and hermetically sealing the device by seam welding,
The pair of electrodes has a curved surface in the shape of a paraboloid of revolution, and the position of the curved surface on the electrodes is selected so that the contact resistance between the curved surface and the peripheral edge of the cap is optimal depending on the type of semiconductor device. 1. A method for hermetically sealing a semiconductor device, characterized in that seam welding is performed by bringing the electrode into contact with the peripheral edge of the cap and moving the electrode and the peripheral edge of the cap relative to each other. 2. Electrodes used to hermetically seal a semiconductor device by seam welding by covering a metal cap with a pair of electrodes on two different peripheral edges of the cap and having a curved surface portion in the shape of a paraboloid of revolution. An electrode for hermetically sealing a semiconductor device, wherein the curved surface portion is a contact area with the peripheral edge of the cap.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP7703388A JPH01248646A (en) | 1988-03-30 | 1988-03-30 | Hermetic sealing method for semiconductor devices and electrodes for hermetic sealing |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP7703388A JPH01248646A (en) | 1988-03-30 | 1988-03-30 | Hermetic sealing method for semiconductor devices and electrodes for hermetic sealing |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH01248646A JPH01248646A (en) | 1989-10-04 |
| JPH0378783B2 true JPH0378783B2 (en) | 1991-12-16 |
Family
ID=13622445
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP7703388A Granted JPH01248646A (en) | 1988-03-30 | 1988-03-30 | Hermetic sealing method for semiconductor devices and electrodes for hermetic sealing |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH01248646A (en) |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN103056500B (en) * | 2012-11-30 | 2015-09-02 | 北京时代民芯科技有限公司 | The welding method of semiconductive ceramic case cap |
-
1988
- 1988-03-30 JP JP7703388A patent/JPH01248646A/en active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPH01248646A (en) | 1989-10-04 |
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