JPH0379319B2 - - Google Patents
Info
- Publication number
- JPH0379319B2 JPH0379319B2 JP14332382A JP14332382A JPH0379319B2 JP H0379319 B2 JPH0379319 B2 JP H0379319B2 JP 14332382 A JP14332382 A JP 14332382A JP 14332382 A JP14332382 A JP 14332382A JP H0379319 B2 JPH0379319 B2 JP H0379319B2
- Authority
- JP
- Japan
- Prior art keywords
- diameter
- crystal
- single crystal
- weight
- control
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 239000013078 crystal Substances 0.000 claims description 63
- 238000000034 method Methods 0.000 claims description 32
- 230000004044 response Effects 0.000 claims description 26
- 238000004033 diameter control Methods 0.000 claims description 15
- 238000010438 heat treatment Methods 0.000 claims description 12
- 230000008859 change Effects 0.000 claims description 11
- 150000001875 compounds Chemical class 0.000 claims description 9
- 239000004065 semiconductor Substances 0.000 claims description 9
- 239000000155 melt Substances 0.000 description 10
- WPYVAWXEWQSOGY-UHFFFAOYSA-N indium antimonide Chemical compound [Sb]#[In] WPYVAWXEWQSOGY-UHFFFAOYSA-N 0.000 description 6
- 230000008569 process Effects 0.000 description 5
- 238000010586 diagram Methods 0.000 description 4
- 230000000694 effects Effects 0.000 description 4
- 238000004519 manufacturing process Methods 0.000 description 3
- 238000012546 transfer Methods 0.000 description 3
- 229910001218 Gallium arsenide Inorganic materials 0.000 description 2
- 230000007423 decrease Effects 0.000 description 2
- 239000012535 impurity Substances 0.000 description 2
- 238000005259 measurement Methods 0.000 description 2
- 238000002844 melting Methods 0.000 description 2
- 230000008018 melting Effects 0.000 description 2
- 230000003287 optical effect Effects 0.000 description 2
- 230000001052 transient effect Effects 0.000 description 2
- 229910005540 GaP Inorganic materials 0.000 description 1
- 229910005542 GaSb Inorganic materials 0.000 description 1
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 1
- 238000001444 catalytic combustion detection Methods 0.000 description 1
- 230000015271 coagulation Effects 0.000 description 1
- 238000005345 coagulation Methods 0.000 description 1
- 238000012937 correction Methods 0.000 description 1
- 238000001514 detection method Methods 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- 230000005499 meniscus Effects 0.000 description 1
- 230000001151 other effect Effects 0.000 description 1
- 230000000737 periodic effect Effects 0.000 description 1
- 239000002994 raw material Substances 0.000 description 1
- 238000011160 research Methods 0.000 description 1
- 238000005070 sampling Methods 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- 230000009466 transformation Effects 0.000 description 1
- 230000007704 transition Effects 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B15/00—Single-crystal growth by pulling from a melt, e.g. Czochralski method
- C30B15/20—Controlling or regulating
- C30B15/22—Stabilisation or shape controlling of the molten zone near the pulled crystal; Controlling the section of the crystal
- C30B15/28—Stabilisation or shape controlling of the molten zone near the pulled crystal; Controlling the section of the crystal using weight changes of the crystal or the melt, e.g. flotation methods
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Crystallography & Structural Chemistry (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Crystals, And After-Treatments Of Crystals (AREA)
- Liquid Deposition Of Substances Of Which Semiconductor Devices Are Composed (AREA)
Description
【発明の詳細な説明】
[発明の属する技術分野]
本発明はチヨコラルスキー法による−族化
合物半導体単結晶の直径制御方法に関するもので
ある。DETAILED DESCRIPTION OF THE INVENTION [Technical field to which the invention pertains] The present invention relates to a method for controlling the diameter of a - group compound semiconductor single crystal using the Czyochoralski method.
[従来技術とその問題点]
チヨコラルスキー法による単結晶育成において
結晶直径の制御は重要な問題である。直径の検出
方法としては光学法および重量法があり、これら
の方法により検出した直径偏差をルツボの加熱電
力や引上げ速度にフイードバツクして直径制御が
行われている。一般に、光学法はシリコン単結晶
に、重量法は酸化物単結晶に広く適用されてい
る。−族化合物半導体単結晶では、炉体に高
圧容器が必要であつたり、揮発性成分によるのぞ
き窓のくもりが生じることなどのために、重量法
による直径制御が多く試みられている。ところ
が、−族化合物半導体単結晶では、固定の密
度が液体の密度より小さいため、重量法を適用す
る場合、結晶直径の増減と重量検出器の出力との
間に過渡的に逆応答が見られる場合がある。これ
を具体的に説明すると単結晶引上げ中の重量検出
器の感じる重量は、固まつた結晶重量とこの結晶
に表面張力で引上げられる融液のメニスカス重量
から成る。この状態で温度が僅かに引くなると表
面張力で広がつた融液の部分が固まり単結晶の裾
は広がつて結果的に直径は大きくなる。ところが
重量検出器は密度の大きな融液から密度の小さな
結晶に代わつた体積分の重量だけ逆に軽く感じる
ことになる。この様に過渡的には、結晶直径の増
加と伴に重量検出器の出力は大きくならずに逆に
小さくなり、逆応答が見られるのである。その例
がW.Bardsley et al.、J.Cryst.Growth 40(1977)
の第13頁〜第20頁に記載されている。[Prior art and its problems] Control of crystal diameter is an important issue in single crystal growth by the Czyochoralski method. Diameter detection methods include optical methods and gravimetric methods, and diameter control is performed by feeding back the diameter deviation detected by these methods to the heating power and pulling speed of the crucible. Generally, optical methods are widely applied to silicon single crystals, and gravimetric methods are widely applied to oxide single crystals. For - group compound semiconductor single crystals, many attempts have been made to control the diameter using the gravimetric method because a high-pressure vessel is required in the furnace body and the viewing window is clouded due to volatile components. However, in the case of - group compound semiconductor single crystals, the fixed density is lower than the density of the liquid, so when applying the gravimetric method, there is a transient inverse response between the increase/decrease in the crystal diameter and the output of the gravimetric detector. There are cases. To explain this specifically, the weight felt by the weight detector during pulling of a single crystal consists of the solidified crystal weight and the meniscus weight of the melt pulled by the crystal due to surface tension. When the temperature drops slightly in this state, the part of the melt that has spread due to surface tension solidifies, and the tail of the single crystal widens, resulting in a larger diameter. However, the weight detector will feel lighter by the amount of weight that is replaced by the less dense crystal from the denser melt. In this way, in a transient manner, as the crystal diameter increases, the output of the weight detector does not increase, but rather decreases, and an inverse response is observed. An example is W. Bardsley et al., J. Cryst. Growth 40 (1977).
It is described on pages 13 to 20 of .
この時、直径制御精度を上げようとして、ルー
プゲインを大きくすると制御が不安定になり、ハ
ンチングが生じ、結晶の形状は周期的な凹凸とな
る。このような現象が生じると、直径の均一な結
晶が得られないだけでなく、融液温度も激しく変
動するので、双晶や多結晶が発生したり、結晶中
の不純物が不均一になつたり、また成長縞が発生
してしまうという問題がある。さらに、はなはだ
しい場合には、結晶が融液から切れてしまつた
り、あるいは融液が固化してしまうという問題が
ある。そのため、従来の重量法による直径自動制
御技術では、直径の均一で高品質な−族単結
晶を再現性良く安定して育成できない欠点があ
る。この問題に対して、重量検出器の出力を一度
もしくは二度微分して得た補正信号を制御ループ
に加えて制御する方法が提案されている。例えば
特開昭50−131683号公報に記載されている。しか
し、この方法により育成された単結晶は小口径
(10mm〜30mmφ)で小容量(〜300g以下)のもの
が報告されているだけであり、大口径(50mmφ以
上)で大容量(500g以上)の結晶については適
用された報告例は見当らない。しかも、この方法
に基づく直径自動制御装置は現在市販されておら
ず、実用化されるまでには至つていない。したが
つて大口径・大容量の−族化合物半導体単結
晶を育成するには十分とは言えない。そのため、
近年、赤外線CCD、超高速IC、FET用として注
目されている大口径、大容量InSb、GaAsなどの
−族単結晶育成には適用できない欠点があ
る。 At this time, if the loop gain is increased in an attempt to improve diameter control accuracy, control becomes unstable, hunting occurs, and the shape of the crystal becomes periodic uneven. If this phenomenon occurs, not only will it not be possible to obtain crystals with a uniform diameter, but the melt temperature will also fluctuate drastically, resulting in twins and polycrystals, and impurities in the crystals becoming non-uniform. There is also the problem that growth stripes occur. Furthermore, in extreme cases, there is a problem that the crystals may break off from the melt or the melt may solidify. Therefore, the conventional automatic diameter control technology using the gravimetric method has the drawback that it is not possible to stably grow high-quality - group single crystals with a uniform diameter with good reproducibility. To solve this problem, a method has been proposed in which a correction signal obtained by differentiating the output of the weight detector once or twice is added to the control loop for control. For example, it is described in Japanese Patent Application Laid-open No. 131683/1983. However, single crystals grown using this method have only been reported to have a small diameter (10 mm to 30 mm φ) and a small capacity (~300 g or less), and only those with a large diameter (50 mm φ or more) and large capacity (500 g or more). No reports have been found in which this method has been applied to crystals. Moreover, an automatic diameter control device based on this method is not currently commercially available and has not yet been put into practical use. Therefore, it cannot be said that this method is sufficient for growing large-diameter, large-capacity - group compound semiconductor single crystals. Therefore,
It has the disadvantage that it cannot be applied to - group single crystal growth such as large-diameter, large-capacity InSb and GaAs, which have recently attracted attention for use in infrared CCDs, ultrahigh-speed ICs, and FETs.
[発明の目的]
この発明は上記した点に鑑みなされたもので、
−族化合物半導体単結晶を製造する際に、上
記欠点を取り除き、直径制御された高品質単結晶
を再現性良く安定して製造できる方法を提供する
ものである。[Object of the invention] This invention was made in view of the above points,
The object of the present invention is to provide a method that eliminates the above-mentioned drawbacks when producing - group compound semiconductor single crystals and can stably produce high-quality single crystals with controlled diameters with good reproducibility.
[発明の概要]
本発明者は、前記逆応答は計測上の制限より生
じる見かけのものであり、そのため、過渡期にお
ける見かけの逆応答情報に基づいて制御動作の補
償を行う必要があると考えた。第1図はInSb単
結晶について、融液温度変化と結晶重量の関係を
示す逆応答プロセスを結晶重量の時間微分値とし
て測定したものである。図中、曲線bは引上げ速
度が10mm/h、曲線cは引上げを一時停止して測
定した場合の応答を示している。さらに研究を進
めた結果、曲線bと曲線cとの差を求めるとaの
丸印が得られるが、これは実際の結晶直径を測定
した結果および結晶直径の変化を時間に対して2
次遅れの伝達関数で近似し、時定数を5分とした
場合の応答(曲線a)とも良く一致することを見
い出した。さらに、結晶直径や引上げ速度をそれ
ぞれ20〜50mm、5〜25mm/hまで変化させて行つ
てみたところ、同様の結果が得られた。このこと
から、前記第1図に示す曲線cを見かけの測定値
に付加する補償値として、フイードバツクループ
に加えるようにしたところ、制御系がハンチング
する現象は見られず、安定した直径制御ができ十
分効果があることが分つた。そこで本発明の直径
制御方法では、ルツボ加熱電力の変化と結晶重量
変化の関係から逆応答成分をシユミレートする。
補償回路を有し、補償回路の出力を制御ループに
加えることにより、逆応答成分を打消して直径制
御することを特徴とするものである。さらに、単
結晶引上げ中に、一時引上げを停止した時のルツ
ボ加熱電力の変化に対する結晶重量変化の関係か
ら、逆応答成分をシユミレートするように設定し
たことを特徴とするものである。[Summary of the Invention] The present inventor believes that the above-mentioned reverse response is an apparent one caused by measurement limitations, and therefore, it is necessary to compensate for the control operation based on the apparent reverse response information during the transition period. Ta. Figure 1 shows the inverse response process showing the relationship between melt temperature change and crystal weight for an InSb single crystal, measured as the time differential value of the crystal weight. In the figure, curve b shows the response when the pulling speed was 10 mm/h, and curve c shows the response when the pulling was temporarily stopped. As a result of further research, we found that when we calculated the difference between curves b and c, we obtained the circle mark a, which was the result of measuring the actual crystal diameter and the change in crystal diameter over time.
It was found that the response (curve a) when approximated by a next-lag transfer function and when the time constant was 5 minutes matched well. Furthermore, similar results were obtained by varying the crystal diameter and pulling speed from 20 to 50 mm and from 5 to 25 mm/h, respectively. Based on this, when we added the curve c shown in Figure 1 to the feedback loop as a compensation value added to the apparent measured value, no hunting phenomenon was observed in the control system, and stable diameter control was achieved. It was found to be sufficiently effective. Therefore, in the diameter control method of the present invention, the reverse response component is simulated from the relationship between the change in crucible heating power and the change in crystal weight.
It is characterized in that it has a compensation circuit, and by adding the output of the compensation circuit to the control loop, the reverse response component is canceled and the diameter is controlled. Furthermore, the present invention is characterized in that during single crystal pulling, an inverse response component is simulated based on the relationship between the change in crystal weight and the change in crucible heating power when pulling is temporarily stopped.
[発明の効果]
以上説明したように本発明の直径制御方法によ
れば、
(1) −族化合物半導体単結晶育成において、
きわめて高精度な直径制御を再現性良く安定に
行うことができる。[Effects of the Invention] As explained above, according to the diameter control method of the present invention, (1) In - group compound semiconductor single crystal growth,
Extremely precise diameter control can be performed stably with good reproducibility.
(2) 従来の制御方法に比べて融液の温度変動が約
1/10に減少できたことに、より多結晶や双晶の
発生はほとんどみられず、結晶作成歩留りが約
20%向上する。(2) Compared to the conventional control method, the temperature fluctuation of the melt was reduced to about 1/10, and the occurrence of polycrystals and twins was hardly observed, and the crystal production yield was reduced to about 1/10.
Improve by 20%.
(3) 従来の直径制御方法により育成した結晶に比
べて、不純物分布の不均一性、ストリエイシヨ
ンのむらが少なく高品質結晶がえられる。(3) Compared to crystals grown using conventional diameter control methods, high-quality crystals with less uneven impurity distribution and less uneven striation can be obtained.
(4) 本発明は工業的に適用することにより生産性
が向上する。(4) Productivity is improved by industrially applying the present invention.
等の効果がある。There are other effects.
[発明の実施例]
以上本発明の一実施例を図面に基づきより詳細
に説明する。第2図は本発明による機能を具備し
た単結晶製造装置の一例である。図において、1
は容器、2は加熱ヒータ、3はルツボ、4は融
液、5は結晶、6は引上げ軸、7は重量検出器、
8は長さ検出器、9は微分装置、10は調節計、
11は音調器、12は加熱装置、13は逆応答補
償フイルタ、14は切換えスイツチである。ルツ
ボ3内の融液4から引上げつつある結晶5の重量
を重量検出器7により測定し、長さ検出器8から
の基準信号を比較したのち、微分装置9により微
分して直径偏差信号を得る。この偏差信号を次の
直径制御の調節計10に入力してルツボ加熱電力
制御信号を得る。この制御信号を音調器11に入
力して加熱装置12を駆使し、加熱電力を制御し
て直径制御を行う。この時、調節計10の比例、
積分、微分定数を最適値に設定する必要がある。
これは通常、結晶成長の遅れ時間を求めて、ジー
グラー・ニコルスの方法などから定数を定める方
法が行われている。しかし、前述したように、こ
のようにして求めた定数により直径制御を行うと
逆応答成分も同時に検出・入力されるため、制御
が不安定となりハンチングを生じる。そのため、
ハンチングを生じない程度に定数を最適値より小
さく設定しなければならない。そこで、スイツチ
14を閉じて、逆応答補償フイルタ13を動作さ
せ逆応答成分を打消すことにより、最適制御定数
を用いて安定に直径制御することがきる。この逆
応答補償フイルタ13は逆応答のプロセスをシユ
ミレートして、加熱電力の変化の情報から逆応答
成分をあらかじめ予測するもので、第1図に示し
た実測結果から逆応答プロセスG(S)を次式の
伝達関数で近似できる。[Embodiment of the Invention] An embodiment of the present invention will be described in more detail based on the drawings. FIG. 2 is an example of a single crystal manufacturing apparatus equipped with the functions according to the present invention. In the figure, 1
is a container, 2 is a heater, 3 is a crucible, 4 is a melt, 5 is a crystal, 6 is a pulling shaft, 7 is a weight detector,
8 is a length detector, 9 is a differentiator, 10 is a controller,
11 is a tone adjuster, 12 is a heating device, 13 is a reverse response compensation filter, and 14 is a changeover switch. The weight of the crystal 5 being pulled from the melt 4 in the crucible 3 is measured by the weight detector 7, and after comparing it with the reference signal from the length detector 8, it is differentiated by the differentiator 9 to obtain a diameter deviation signal. . This deviation signal is input to the next diameter control controller 10 to obtain a crucible heating power control signal. This control signal is input to the tone adjuster 11 and the heating device 12 is used to control the heating power and perform diameter control. At this time, the proportion of controller 10,
It is necessary to set the integral and differential constants to optimal values.
This is usually done by determining the delay time of crystal growth and determining a constant using the Ziegler-Nichols method or the like. However, as described above, when diameter control is performed using the constant determined in this way, the reverse response component is also detected and input at the same time, making the control unstable and causing hunting. Therefore,
The constant must be set smaller than the optimal value to the extent that hunting does not occur. Therefore, by closing the switch 14 and operating the reverse response compensation filter 13 to cancel the reverse response component, it is possible to stably control the diameter using the optimum control constant. This reverse response compensation filter 13 simulates the reverse response process and predicts the reverse response component in advance from information on changes in heating power, and calculates the reverse response process G(S) from the actual measurement results shown in FIG. It can be approximated by the following transfer function.
G(S)=K1/(1+T1S)2+K2/1+T2Se-LS……(
1)
ここで、Sはラプラス演算子、T1、T2、Lは
融液の熱時定数および結晶成長の遅れ時間などか
ら決まる定数、K1、K2は結晶直径および引上げ
速度などから決まる定数である。このフイルタ1
3はたとえば、デイジタル的手段により次のよう
に構成できる。フイルタ13の伝達関数をD
(S)、零次ロールド回路をGC(S)とすると、
D(S)=GcG(S)=1−e-STS/SG(S)……(2)
となる。ただしTsはサンプリング周期である。
次にDをZ変換し、補償出力Yを求めると次式と
なる。 G(S)=K 1 /(1+T 1 S) 2 +K 2 /1+T 2 Se -LS ……(
1) Here, S is the Laplace operator, T 1 , T 2 , and L are constants determined from the thermal time constant of the melt and the delay time of crystal growth, and K 1 and K 2 are determined from the crystal diameter and pulling speed. It is a constant. This filter 1
3 can be configured by digital means as follows, for example. The transfer function of the filter 13 is D
(S), and the zero-order rolled circuit is GC(S), then D(S)=G c G(S)=1-e -STS /SG(S)...(2). However, T s is the sampling period.
Next, when D is Z-transformed and the compensation output Y is obtained, the following equation is obtained.
Yo=K
〓i=1
aiUo-i−K
〓i=1
biYo-i ……(3)
ここで、YnとUnはそれぞれ時刻nにおける補
償出力と加熱電力、ai、biは(2)式のZ変換により
定まる係数である。第3図は、このようにして構
成したフイルタ13のステツプ入力に対するサン
プル出力値の一例を示したものである。 Y o = K 〓 i=1 a i U oi − K 〓 i=1 b i Y oi ...(3) Here, Yn and Un are the compensation output and heating power at time n, respectively, and ai and bi are (2 ) is a coefficient determined by the Z transformation of the equation. FIG. 3 shows an example of sample output values for the step input of the filter 13 constructed in this manner.
次に具体的な例として、本発明の機能を具備し
た単結晶製造装置により、InSb単結晶を製造す
る場合について詳しく説明する。第2図におい
て、直径75mmのルツボ3にInSb多結晶原料を500
g入れ、〜650℃まで加熱した。次に<211>軸の
種結晶を10vpmで回転させながら融液4に接触さ
せたのち、10mm/hの速度で結晶引上げを開始
し、所定径35mmになるように肩部を育成した。こ
こで逆応答プロセスは実測により、T1=2.5分、
T2=6分、L=5分、K1=0.6g/min、K2=−
0.45g/minと求まつたので、フイルタ13の係
数はTs=1分としてa1=−7.39×10-3g/min・
℃、a2=−0.59×10-3、a3=−4.79×10-3、a7=
−13.82×10-3、a8=18.52×10-3、a9=−6.21×
10-3、b1=−4.37×10-3、b2=3.17×10-3、b3=−
0.76×10-3、(他の係数は全て0)にあらかじめ
設定した。次に、所定径になつたところで、調節
計10を動作させ、直径制御を開始した。ここで
比較定数Gを0から徐々に大きくしたところ、
0.1ぐらいから制御系が不安定になりだし、0.15
は周期〜20分でハンチングが生じた。そこでスイ
ツチ14を閉じてフイルタ13を動作さ(第4図
のA)ところ、ハンチングが収束していく様子が
見られた。さらに定数を0.25から0.3まで大きく
したがハンチングは生ぜず、安定して直径制御す
ることができ、InSb単結晶450gを引上げること
ができた。第4図は本発明の直径制御方法の効果
を示したものである。以上のようにして決めた上
記の定数を用いて、InSb単結晶育成を連続10回
行い、すべて直径35±1mmで重量450g以上の単
結晶が得られた。これらの単結晶はすべて多結晶
や双晶の発生がなく、極めて均質な単結晶であつ
た。一方、フイルタ13を動作させない場合(第
4図B)は、ハンチングにより、直径の変化は周
期的で±3mmもあり、多結晶が発生するなど、良
好な結果を得ることはできなかつた。 Next, as a specific example, a case in which an InSb single crystal is manufactured using a single crystal manufacturing apparatus having the functions of the present invention will be described in detail. In Figure 2, 500 InSb polycrystalline raw materials are placed in crucible 3 with a diameter of 75 mm.
g and heated to ~650°C. Next, the <211>-axis seed crystal was brought into contact with the melt 4 while being rotated at 10 vpm, and then crystal pulling was started at a speed of 10 mm/h to grow a shoulder portion to a predetermined diameter of 35 mm. Here, the reverse response process is actually measured, T 1 = 2.5 minutes,
T 2 = 6 minutes, L = 5 minutes, K 1 = 0.6 g/min, K 2 = -
Since it was found to be 0.45 g/min, the coefficient of filter 13 is a 1 = -7.39×10 -3 g/min, assuming T s = 1 minute.
°C, a 2 = −0.59×10 -3 , a 3 = −4.79×10 -3 , a 7 =
−13.82×10 -3 , a 8 = 18.52×10 -3 , a 9 = −6.21×
10 -3 , b 1 = −4.37×10 −3 , b 2 = 3.17×10 −3 , b 3 = −
It was set in advance to 0.76×10 -3 (all other coefficients are 0). Next, when the predetermined diameter was reached, the controller 10 was operated to start diameter control. Here, when the comparison constant G was gradually increased from 0,
The control system started to become unstable at around 0.1, and at around 0.15
Hunting occurred at a cycle of ~20 minutes. Then, when the switch 14 was closed and the filter 13 was operated (A in FIG. 4), it was observed that the hunting was converging. Although the constant was further increased from 0.25 to 0.3, hunting did not occur, the diameter could be controlled stably, and 450 g of InSb single crystal could be pulled. FIG. 4 shows the effect of the diameter control method of the present invention. Using the above constants determined as above, InSb single crystal growth was performed 10 times in a row, and single crystals with a diameter of 35±1 mm and a weight of 450 g or more were obtained in all cases. All of these single crystals were extremely homogeneous single crystals without the occurrence of polycrystals or twins. On the other hand, when the filter 13 was not operated (FIG. 4B), due to hunting, the diameter changed periodically by as much as ±3 mm, and polycrystals were generated, so that good results could not be obtained.
なお、上記(1)〜(3)式および各定数は本実施例に
限定されるものではなく、他の制御式や実験式に
よつても何等差支えない。また、本発明の方法は
他の−族化合物半導体単結晶、例えば
GaAs、GaSb、GaP等においても同様に適用で
きるものであり、その得る効果も大きい。 It should be noted that the above equations (1) to (3) and each constant are not limited to the present embodiment, and other control equations or experimental equations may be used. The method of the present invention can also be applied to other - group compound semiconductor single crystals, e.g.
It can be similarly applied to GaAs, GaSb, GaP, etc., and the effects obtained are also great.
第1図は、融点温度と結量重量の関係を示す逆
応答プロセスを説明するための図、第2図は本発
明の一実施例を説明するための図、第3図は逆応
答補償フイルタのステツプ入力に対する応答特性
を示す図、第4図は本発明の方法の効果を説明す
るための図である。
1……容器、2……加熱ヒータ、3……ルツ
ボ、4……融点、5……結晶、6……引上げ軸、
7……重量検出器、8……長さ検出器、9……微
分装置、10……調節計、11……温調器、12
……加熱装置、13……逆応答補償フイルタ、1
4……切換えスイツチ。
FIG. 1 is a diagram for explaining the reverse response process showing the relationship between melting point temperature and coagulation weight, FIG. 2 is a diagram for explaining an embodiment of the present invention, and FIG. 3 is a diagram for explaining the reverse response compensation filter. FIG. 4 is a diagram for explaining the effect of the method of the present invention. 1... Container, 2... Heater, 3... Crucible, 4... Melting point, 5... Crystal, 6... Pulling shaft,
7... Weight detector, 8... Length detector, 9... Differentiator, 10... Controller, 11... Temperature controller, 12
... Heating device, 13 ... Reverse response compensation filter, 1
4... Changeover switch.
Claims (1)
結晶の重量を検出して結晶直径制御を行うチヨク
ラススキー法による単結晶育成を行うに当たり、
前記単結晶と同形の単結晶の引上げを一時停止し
た際に生じるルツボ加熱電力の変化量に対する単
結晶重量変化量を逆応答成分と予め定めておき、
ルツボ加熱電力の変化量に応じた前記単結晶の重
量変化量から前記逆応答成分を引いた差の信号を
重量変化量として直径制御ループに加えることに
より、直径制御することを特徴とする−族化
合物半導体単結晶の直径制御方法。1. When growing a single crystal using the Czyoklassky method, which controls the crystal diameter by detecting the weight of a substantially pulled - group compound semiconductor single crystal,
The amount of change in the weight of the single crystal with respect to the amount of change in crucible heating power that occurs when pulling of a single crystal having the same shape as the single crystal is temporarily stopped is determined in advance as an inverse response component,
The diameter is controlled by adding a signal of the difference obtained by subtracting the reverse response component from the amount of weight change of the single crystal in response to the amount of change in crucible heating power to a diameter control loop as the amount of weight change. A method for controlling the diameter of compound semiconductor single crystals.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP14332382A JPS5935089A (en) | 1982-08-20 | 1982-08-20 | Method for controlling diameter of iii-v group compound semiconductor single crystal |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP14332382A JPS5935089A (en) | 1982-08-20 | 1982-08-20 | Method for controlling diameter of iii-v group compound semiconductor single crystal |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS5935089A JPS5935089A (en) | 1984-02-25 |
| JPH0379319B2 true JPH0379319B2 (en) | 1991-12-18 |
Family
ID=15336110
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP14332382A Granted JPS5935089A (en) | 1982-08-20 | 1982-08-20 | Method for controlling diameter of iii-v group compound semiconductor single crystal |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS5935089A (en) |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS59184796A (en) * | 1983-04-04 | 1984-10-20 | Agency Of Ind Science & Technol | Preparation of group iii-v compound semiconductor single crystal |
| JPS62159356A (en) * | 1986-01-08 | 1987-07-15 | Victor Co Of Japan Ltd | Optical information signal reproducing device |
-
1982
- 1982-08-20 JP JP14332382A patent/JPS5935089A/en active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS5935089A (en) | 1984-02-25 |
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