JPH038662B2 - - Google Patents
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- Publication number
- JPH038662B2 JPH038662B2 JP61158900A JP15890086A JPH038662B2 JP H038662 B2 JPH038662 B2 JP H038662B2 JP 61158900 A JP61158900 A JP 61158900A JP 15890086 A JP15890086 A JP 15890086A JP H038662 B2 JPH038662 B2 JP H038662B2
- Authority
- JP
- Japan
- Prior art keywords
- group
- bonded
- groups
- bonded hydrogen
- sic
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 claims description 34
- 229920001296 polysiloxane Polymers 0.000 claims description 24
- 239000001257 hydrogen Substances 0.000 claims description 20
- 229910052739 hydrogen Inorganic materials 0.000 claims description 20
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 claims description 18
- 229910052757 nitrogen Inorganic materials 0.000 claims description 18
- 150000001875 compounds Chemical class 0.000 claims description 15
- 238000000034 method Methods 0.000 claims description 15
- -1 polysiloxane Polymers 0.000 claims description 15
- 125000002887 hydroxy group Chemical group [H]O* 0.000 claims description 10
- 239000000463 material Substances 0.000 claims description 9
- 238000004519 manufacturing process Methods 0.000 claims description 8
- 238000006243 chemical reaction Methods 0.000 claims description 7
- 230000001413 cellular effect Effects 0.000 claims description 6
- PHQOGHDTIVQXHL-UHFFFAOYSA-N n'-(3-trimethoxysilylpropyl)ethane-1,2-diamine Chemical compound CO[Si](OC)(OC)CCCNCCN PHQOGHDTIVQXHL-UHFFFAOYSA-N 0.000 claims description 5
- 239000006261 foam material Substances 0.000 claims description 3
- 238000011067 equilibration Methods 0.000 claims description 2
- QTBSBXVTEAMEQO-UHFFFAOYSA-N Acetic acid Chemical compound CC(O)=O QTBSBXVTEAMEQO-UHFFFAOYSA-N 0.000 description 8
- 150000002430 hydrocarbons Chemical group 0.000 description 8
- 239000000203 mixture Substances 0.000 description 7
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 description 5
- 125000001570 methylene group Chemical group [H]C([H])([*:1])[*:2] 0.000 description 5
- PEDCQBHIVMGVHV-UHFFFAOYSA-N Glycerine Chemical compound OCC(O)CO PEDCQBHIVMGVHV-UHFFFAOYSA-N 0.000 description 4
- 229960000583 acetic acid Drugs 0.000 description 4
- 239000006260 foam Substances 0.000 description 4
- 239000007789 gas Substances 0.000 description 4
- 239000012362 glacial acetic acid Substances 0.000 description 4
- 125000004435 hydrogen atom Chemical group [H]* 0.000 description 4
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 4
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 4
- AZUYLZMQTIKGSC-UHFFFAOYSA-N 1-[6-[4-(5-chloro-6-methyl-1H-indazol-4-yl)-5-methyl-3-(1-methylindazol-5-yl)pyrazol-1-yl]-2-azaspiro[3.3]heptan-2-yl]prop-2-en-1-one Chemical compound ClC=1C(=C2C=NNC2=CC=1C)C=1C(=NN(C=1C)C1CC2(CN(C2)C(C=C)=O)C1)C=1C=C2C=NN(C2=CC=1)C AZUYLZMQTIKGSC-UHFFFAOYSA-N 0.000 description 3
- 239000004215 Carbon black (E152) Substances 0.000 description 3
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 3
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 3
- KWYUFKZDYYNOTN-UHFFFAOYSA-M Potassium hydroxide Chemical compound [OH-].[K+] KWYUFKZDYYNOTN-UHFFFAOYSA-M 0.000 description 3
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical group [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 3
- 230000015572 biosynthetic process Effects 0.000 description 3
- 125000004432 carbon atom Chemical group C* 0.000 description 3
- 239000003795 chemical substances by application Substances 0.000 description 3
- 238000004132 cross linking Methods 0.000 description 3
- RTZKZFJDLAIYFH-UHFFFAOYSA-N ether Substances CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 3
- 229930195733 hydrocarbon Natural products 0.000 description 3
- 239000012774 insulation material Substances 0.000 description 3
- 125000005647 linker group Chemical group 0.000 description 3
- 125000000962 organic group Chemical group 0.000 description 3
- 238000002360 preparation method Methods 0.000 description 3
- 229910052710 silicon Inorganic materials 0.000 description 3
- 229910052861 titanite Inorganic materials 0.000 description 3
- LYCAIKOWRPUZTN-UHFFFAOYSA-N Ethylene glycol Chemical compound OCCO LYCAIKOWRPUZTN-UHFFFAOYSA-N 0.000 description 2
- UQSXHKLRYXJYBZ-UHFFFAOYSA-N Iron oxide Chemical compound [Fe]=O UQSXHKLRYXJYBZ-UHFFFAOYSA-N 0.000 description 2
- WCUXLLCKKVVCTQ-UHFFFAOYSA-M Potassium chloride Chemical compound [Cl-].[K+] WCUXLLCKKVVCTQ-UHFFFAOYSA-M 0.000 description 2
- 125000001931 aliphatic group Chemical group 0.000 description 2
- 125000000217 alkyl group Chemical group 0.000 description 2
- 150000001412 amines Chemical class 0.000 description 2
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 2
- 235000011187 glycerol Nutrition 0.000 description 2
- 150000002431 hydrogen Chemical class 0.000 description 2
- AMWRITDGCCNYAT-UHFFFAOYSA-L hydroxy(oxo)manganese;manganese Chemical compound [Mn].O[Mn]=O.O[Mn]=O AMWRITDGCCNYAT-UHFFFAOYSA-L 0.000 description 2
- 238000009413 insulation Methods 0.000 description 2
- YEXPOXQUZXUXJW-UHFFFAOYSA-N oxolead Chemical compound [Pb]=O YEXPOXQUZXUXJW-UHFFFAOYSA-N 0.000 description 2
- 239000010703 silicon Substances 0.000 description 2
- 150000003377 silicon compounds Chemical class 0.000 description 2
- 125000001424 substituent group Chemical group 0.000 description 2
- 239000004408 titanium dioxide Substances 0.000 description 2
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 description 2
- 229910052721 tungsten Inorganic materials 0.000 description 2
- 239000010937 tungsten Substances 0.000 description 2
- 125000004172 4-methoxyphenyl group Chemical group [H]C1=C([H])C(OC([H])([H])[H])=C([H])C([H])=C1* 0.000 description 1
- ZOXJGFHDIHLPTG-UHFFFAOYSA-N Boron Chemical compound [B] ZOXJGFHDIHLPTG-UHFFFAOYSA-N 0.000 description 1
- OTMSDBZUPAUEDD-UHFFFAOYSA-N Ethane Chemical compound CC OTMSDBZUPAUEDD-UHFFFAOYSA-N 0.000 description 1
- YZCKVEUIGOORGS-IGMARMGPSA-N Protium Chemical compound [1H] YZCKVEUIGOORGS-IGMARMGPSA-N 0.000 description 1
- GSEJCLTVZPLZKY-UHFFFAOYSA-N Triethanolamine Chemical compound OCCN(CCO)CCO GSEJCLTVZPLZKY-UHFFFAOYSA-N 0.000 description 1
- WGLPBDUCMAPZCE-UHFFFAOYSA-N Trioxochromium Chemical compound O=[Cr](=O)=O WGLPBDUCMAPZCE-UHFFFAOYSA-N 0.000 description 1
- QCWXUUIWCKQGHC-UHFFFAOYSA-N Zirconium Chemical compound [Zr] QCWXUUIWCKQGHC-UHFFFAOYSA-N 0.000 description 1
- 239000002253 acid Substances 0.000 description 1
- 150000001298 alcohols Chemical class 0.000 description 1
- 125000002877 alkyl aryl group Chemical group 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- 125000003277 amino group Chemical group 0.000 description 1
- 125000002029 aromatic hydrocarbon group Chemical group 0.000 description 1
- 125000003710 aryl alkyl group Chemical group 0.000 description 1
- 125000004429 atom Chemical group 0.000 description 1
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 1
- 125000001797 benzyl group Chemical group [H]C1=C([H])C([H])=C(C([H])=C1[H])C([H])([H])* 0.000 description 1
- 229910052796 boron Inorganic materials 0.000 description 1
- 239000004566 building material Substances 0.000 description 1
- 125000005569 butenylene group Chemical group 0.000 description 1
- 229910000423 chromium oxide Inorganic materials 0.000 description 1
- 230000000052 comparative effect Effects 0.000 description 1
- 238000009833 condensation Methods 0.000 description 1
- 230000005494 condensation Effects 0.000 description 1
- 229920001577 copolymer Polymers 0.000 description 1
- 125000004122 cyclic group Chemical group 0.000 description 1
- 125000000113 cyclohexyl group Chemical group [H]C1([H])C([H])([H])C([H])([H])C([H])(*)C([H])([H])C1([H])[H] 0.000 description 1
- 125000004956 cyclohexylene group Chemical group 0.000 description 1
- KPUWHANPEXNPJT-UHFFFAOYSA-N disiloxane Chemical class [SiH3]O[SiH3] KPUWHANPEXNPJT-UHFFFAOYSA-N 0.000 description 1
- 230000008030 elimination Effects 0.000 description 1
- 238000003379 elimination reaction Methods 0.000 description 1
- 125000000816 ethylene group Chemical group [H]C([H])([*:1])C([H])([H])[*:2] 0.000 description 1
- 230000007717 exclusion Effects 0.000 description 1
- 238000002474 experimental method Methods 0.000 description 1
- 125000001153 fluoro group Chemical group F* 0.000 description 1
- 238000005187 foaming Methods 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 230000002209 hydrophobic effect Effects 0.000 description 1
- WGCNASOHLSPBMP-UHFFFAOYSA-N hydroxyacetaldehyde Natural products OCC=O WGCNASOHLSPBMP-UHFFFAOYSA-N 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- 150000001247 metal acetylides Chemical class 0.000 description 1
- 125000000325 methylidene group Chemical group [H]C([H])=* 0.000 description 1
- MQWFLKHKWJMCEN-UHFFFAOYSA-N n'-[3-[dimethoxy(methyl)silyl]propyl]ethane-1,2-diamine Chemical compound CO[Si](C)(OC)CCCNCCN MQWFLKHKWJMCEN-UHFFFAOYSA-N 0.000 description 1
- 125000004123 n-propyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])* 0.000 description 1
- 125000001624 naphthyl group Chemical group 0.000 description 1
- 125000004433 nitrogen atom Chemical group N* 0.000 description 1
- QJGQUHMNIGDVPM-UHFFFAOYSA-N nitrogen group Chemical group [N] QJGQUHMNIGDVPM-UHFFFAOYSA-N 0.000 description 1
- 239000003605 opacifier Substances 0.000 description 1
- 150000001283 organosilanols Chemical class 0.000 description 1
- 239000001301 oxygen Substances 0.000 description 1
- 229910052760 oxygen Inorganic materials 0.000 description 1
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 description 1
- 229920001843 polymethylhydrosiloxane Chemical group 0.000 description 1
- 239000001103 potassium chloride Substances 0.000 description 1
- 235000011164 potassium chloride Nutrition 0.000 description 1
- 238000010992 reflux Methods 0.000 description 1
- 150000004756 silanes Chemical class 0.000 description 1
- 125000004079 stearyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 238000003756 stirring Methods 0.000 description 1
- 229910052715 tantalum Inorganic materials 0.000 description 1
- GUVRBAGPIYLISA-UHFFFAOYSA-N tantalum atom Chemical compound [Ta] GUVRBAGPIYLISA-UHFFFAOYSA-N 0.000 description 1
- 125000003944 tolyl group Chemical group 0.000 description 1
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 description 1
- 229920002554 vinyl polymer Polymers 0.000 description 1
- 229910052726 zirconium Inorganic materials 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
- C08J9/00—Working-up of macromolecular substances to porous or cellular articles or materials; After-treatment thereof
- C08J9/02—Working-up of macromolecular substances to porous or cellular articles or materials; After-treatment thereof using blowing gases generated by the reacting monomers or modifying agents during the preparation or modification of macromolecules
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
- C08J2383/00—Characterised by the use of macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing silicon with or without sulfur, nitrogen, oxygen, or carbon only; Derivatives of such polymers
- C08J2383/04—Polysiloxanes
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Health & Medical Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Medicinal Chemistry (AREA)
- Polymers & Plastics (AREA)
- Organic Chemistry (AREA)
- Silicon Polymers (AREA)
- Manufacture Of Porous Articles, And Recovery And Treatment Of Waste Products (AREA)
- Ceramic Products (AREA)
Description
【発明の詳細な説明】 産業上の利用分野 本発明は、気泡物質の製造法に関する。[Detailed description of the invention] Industrial applications The present invention relates to a method for producing cellular materials.
従来の技術
気泡物質を製造する際に、Si結合水素を、ヒド
ロキシル基含有化合物との反応により脱離させる
ことにより該気泡物質中に空所を生じさせること
は既に公知である。これに関しては、たとえば英
国特許第867619号明細書[公開日1961年5月10
日、ミツドランド・シリコーンズ(Midland
Silicones)社]を引用する。BACKGROUND OF THE INVENTION It is already known that when producing a cellular material, Si-bonded hydrogen is eliminated by reaction with a hydroxyl group-containing compound, thereby creating voids in the cellular material. In this regard, for example, British Patent No. 867619 [Published on May 10, 1961]
Midland Silicones
Silicones).
発明が解決しようとする問題点
ところで、気泡物質を、Si結合水素含有化合物
をヒドロキシル基含有化合物と反応させることに
より製造し、その際特に短時間に特に寸法安定性
のフオームを得るという課題が生じた。かかる課
題は本発明により解決される。Problems to be Solved by the Invention By the way, when a cellular material is produced by reacting a Si-bonded hydrogen-containing compound with a hydroxyl group-containing compound, the problem arises of obtaining a particularly dimensionally stable form in a particularly short time. Ta. This problem is solved by the present invention.
問題点を解決するための手段
本発明の対象は、気泡物質を、Si結合水素含有
化合物を、ヒドロキシル基含有化合物と反応させ
ることにより製造する方法において、この反応の
際にSi結合水素含有化合物として、少なくとも部
分的に、同一分子中にSi結合水素も、塩基性窒素
を有する少なくとも1つのSiC結合基も有するよ
うなものを、使用することを特徴とする気泡物質
の製造法である。Means for Solving the Problems The object of the present invention is a method for producing a foam material by reacting a Si-bonded hydrogen-containing compound with a hydroxyl group-containing compound, in which the Si-bonded hydrogen-containing compound is , a process for producing a cellular material, characterized in that a material is used which, at least in part, has both Si-bonded hydrogen and at least one SiC-bonded group with basic nitrogen in the same molecule.
本発明による方法において使用されるオルガノ
ポリシロキサンは、線状、分枝状または環状であ
つてもよい。 The organopolysiloxanes used in the process according to the invention may be linear, branched or cyclic.
本発明により用いられるSi結合水素を有するオ
ルガノポリシロキサンは好ましくは、式:
RxR1 yHz(OR2)pSiO4-x-y-z-p/2
[ただし、Rは同じかまたは異なる、一価の、
塩基性窒素不含の、SiC結合有機基を表し、R1は
塩基性窒素を有する一価のSiC結合基を表し、同
様に同じかまたは異なつていてよく、R2は基1
つあたり1〜4個の炭素原子を有する同じかまた
は異なるアルキル基を表し、xは0,1,2また
は3、平均0〜2、好ましくは平均0〜1.8であ
り、yは0または1、平均0.1〜0.6、好ましくは
平均0.15〜0.3であり、zは0または1、平均0.2
〜1、好ましくは平均0.5〜1であり、pは0,
1,2または3、平均0〜0.8、好ましくは平均
0.01〜0.6であり、またx,y,zおよびpのそ
れぞれの平均値の総和は最高3.4である]で示さ
れる単位からなるようなものである。 The organopolysiloxanes with Si- bonded hydrogen used according to the invention preferably have the formula : ,
represents a SiC-binding organic group free of basic nitrogen, R 1 represents a monovalent SiC-binding group containing basic nitrogen, which may likewise be the same or different, and R 2 represents a group 1
each represents the same or different alkyl groups having 1 to 4 carbon atoms, x is 0, 1, 2 or 3, on average 0 to 2, preferably on average 0 to 1.8, y is 0 or 1, Average is 0.1 to 0.6, preferably average is 0.15 to 0.3, and z is 0 or 1, average is 0.2
~1, preferably on average 0.5~1, p is 0,
1, 2 or 3, average 0-0.8, preferably average
0.01 to 0.6, and the sum of the respective average values of x, y, z and p is at most 3.4].
塩基性窒素を含まないSi結合有機基Rの例は、
殊に基1つあたり1〜20個の炭素原子を有する炭
化水素基、例えばメチル基、エチル基、n−プロ
ピル基およびイソプロピル基ならびにオクタデシ
ル基のようなアルキル基;ビニル基およびアリル
基ならびにブタジエニル基のような少なくとも1
つの二重結合を有する脂肪族炭化水素基;シクロ
ヘキシル基およびメチルシクロヘキシル基のよう
な脂環式炭化水素基;フエニル基およびナフチル
基のような芳香族炭化水素基;トリル基のような
アルカリール基およびベンジル基のようなアラル
キル基である。該炭化水素基は、Si結合水素、塩
基性窒素およびヒドロキシル基に対して50℃より
低い温度では不活性である置換基を有することが
できる。この種の置換炭化水素基の例は、3,
3,3−トリフルオロプロピル基のようなフツ素
化炭化水素基;1,1,2,2,3,3−ヘキサ
フルオロプロピルオキシプロピル基および1,
1,2,2−テトラフルオロエトキシプロピル基
のような、炭素原子、水素原子、エーテル酸素原
子およびフツ素原子から構成されら一価の脂肪族
基、およびp−メトキシフエニル基のような、エ
ーテル酸素を唯1つの置換基として含有する一価
の炭化水素基である。 Examples of Si-bonded organic groups R that do not contain basic nitrogen are:
In particular hydrocarbon radicals having 1 to 20 carbon atoms per radical, such as methyl, ethyl, n-propyl and isopropyl radicals, and alkyl radicals such as octadecyl; vinyl and allyl radicals and butadienyl radicals; at least 1 like
Aliphatic hydrocarbon groups with two double bonds; cycloaliphatic hydrocarbon groups such as cyclohexyl and methylcyclohexyl; aromatic hydrocarbon groups such as phenyl and naphthyl; alkaryl groups such as tolyl and aralkyl groups such as benzyl groups. The hydrocarbon radicals can have substituents that are inert towards Si-bonded hydrogens, basic nitrogens and hydroxyl groups at temperatures below 50°C. Examples of substituted hydrocarbon groups of this type are 3,
Fluorinated hydrocarbon groups such as 3,3-trifluoropropyl; 1,1,2,2,3,3-hexafluoropropyloxypropyl and 1,
Monovalent aliphatic groups composed of carbon atoms, hydrogen atoms, ether oxygen atoms and fluorine atoms, such as 1,2,2-tetrafluoroethoxypropyl group, and p-methoxyphenyl group, It is a monovalent hydrocarbon group containing ether oxygen as the only substituent.
殊に容易な入手性のため、本発明により使用さ
れるオルガノポリシロキサン中の、塩基性窒素を
含まないSiC結合有機基はメチル基が有利であ
る。さらに、水素原子が直接結合しているそれぞ
れのケイ素原子に、炭化水素基、殊にメチル基も
結合しているのが有利である。 Particularly because of their easy availability, the basic nitrogen-free SiC-bonded organic groups in the organopolysiloxanes used according to the invention are preferably methyl groups. Furthermore, it is advantageous if a hydrocarbon group, in particular a methyl group, is also bonded to each silicon atom to which a hydrogen atom is directly bonded.
塩基性窒素を有するSiC結合基、ひいては基R1
としては、式:
R3 2NR4−
[式中、R3は水素を表すか、または同じかま
たは異なるアルキル基またはアミノ基ないしはイ
ミノアルキル基を表し、R4は分枝状炭化水素基
を表す]で示されるようなものが有利である。 SiC bonding group with basic nitrogen and thus the group R 1
for the formula: R 3 2 NR 4 − [wherein R 3 represents hydrogen or the same or different alkyl group or amino group or iminoalkyl group, and R 4 represents a branched hydrocarbon group; [expressed] is advantageous.
アルキル基Rの例は、全範囲内で、アルキル基
R3にもあてはまる。しかしながら、式:
R3 2NR4−
で示される基中のそれぞれの窒素原子に、少なく
とも1個の水素原子が結合しているのが好まし
い。 Examples of alkyl radicals R include, within the entire scope, alkyl radicals
This also applies to R3 . However, it is preferred that at least one hydrogen atom is bonded to each nitrogen atom in the group of the formula: R 3 2 NR 4 -.
好ましくは、分枝状炭化水素基R4は基1つあ
たり最高20個の炭化水素原子を有する。この種の
炭化水素基の例は、メチレン基およびエチレン
基、ならびにプロピレン基、ブチレン基、シクロ
ヘキシレン基、オクタデシレン基、フエニレン基
およびブテニレン基である。殊に容易な入手性の
ためn−プロピレン基が有利である。塩基性窒素
を有するSiC結合基、ひいては基R1としては、
式:
H2N(CH2)2NH(CH2)3−
で示される基が特に有利である。 Preferably, the branched hydrocarbon radicals R 4 have at most 20 hydrocarbon atoms per radical. Examples of hydrocarbon groups of this type are methylene and ethylene groups, as well as propylene, butylene, cyclohexylene, octadecylene, phenylene and butenylene groups. Particularly preferred is the n-propylene group because of its easy availability. As the SiC bonding group with basic nitrogen, and therefore the group R 1 ,
Particular preference is given to radicals of the formula H2N ( CH2 ) 2NH ( CH2 ) 3- .
塩基性窒素を有するSiC結合基ひいては基R1の
別の例は式:
H2N(CH2)3−
H2N(CH2)2−
H3CNH(CH2)3−
H2N(CH2)5−
H(NHCH2CH2)3− および
n−C4H9NH(CH2)2NH(CH2)3−
で示されるようなものである。 Another example of a SiC bonding group with a basic nitrogen and thus a group R 1 is of the formula: H 2 N(CH 2 ) 3 − H 2 N(CH 2 ) 2 − H 3 CNH(CH 2 ) 3 − H 2 N( CH2 ) 5 -H( NHCH2CH2 ) 3- and n- C4H9NH ( CH2 ) 2NH ( CH2 ) 3- .
基R2の例は、殊にメチル基、エチル基および
イソプロピル基である。 Examples of radicals R 2 are, in particular, the methyl, ethyl and isopropyl radicals.
本発明により使用される、Si結合水素および塩
基性窒素を有する少なくとも1つのSiC結合基を
有する化合物は、たとえばγ−アミノエチルアミ
ノプロピルトリメトキシシランまたはγ−アミノ
エチルアミノプロピルメチルジメトキシシランま
たはこの種のシランからなる混合物を、塩基性窒
素不含であるがSi結合水素を含有するオルガノポ
リシロキサンとたとえば平衡化ないしは縮合させ
ることにより製造することができる。その際用い
られるオルガノポリシロキサンは好ましくは、ト
リメチルシロキシ基により末端封鎖されたメチル
水素ポリシロキサンまたはトリメチルシロキシ
基、ジメチルシロキサン単位およびメチル水素シ
ロキサン単位からなる共重合体である。 The compounds used according to the invention having at least one SiC-bonded group with a Si-bonded hydrogen and a basic nitrogen are, for example, γ-aminoethylaminopropyltrimethoxysilane or γ-aminoethylaminopropylmethyldimethoxysilane or such species. A mixture of silanes can be prepared, for example, by equilibration or condensation with an organopolysiloxane which is free of basic nitrogen but contains Si-bonded hydrogen. The organopolysiloxane used in this case is preferably a methylhydrogenpolysiloxane end-capped with trimethylsiloxy groups or a copolymer of trimethylsiloxy groups, dimethylsiloxane units and methylhydrogensiloxane units.
Si結合水素との反応によりフオーム形成および
塩基性窒素を有するSiC結合基を有するオルガノ
ポリシロキサンの架橋を惹起する、ヒドロキシル
基を含有する化合物としては、本発明による方法
を実施する場合、水、エテレングリコール、グリ
セリンまたはトリエタノールアミンのような1分
子あたり少なくとも2つのヒドロキシル基を含有
するアルコール、ならびにオルガノシラノールお
よびジメチルポリシロキサノールのようなオルガ
ノポリシロキサノールが有利である。 When carrying out the process according to the invention, compounds containing hydroxyl groups which, by reaction with Si-bonded hydrogen, cause formation of forms and crosslinking of organopolysiloxanes having SiC-bonded groups with basic nitrogen, can include water, ethane, etc. Preference is given to alcohols containing at least two hydroxyl groups per molecule, such as lene glycol, glycerin or triethanolamine, and organopolysiloxanols, such as organosilanols and dimethylpolysiloxanol.
好ましくは、Si結合水素との反応によりフオー
ム形成および、塩基性窒素を有するSiC結合基を
有するオルガノポリシロキサンの架橋を惹起す
る、ヒドロキシル基含有化合物は、Si結合水素1
グラム原子あたりヒドロキシル基1〜20グラム当
量の量で使用する。 Preferably, the hydroxyl group-containing compound which, upon reaction with Si-bonded hydrogen, causes form formation and cross-linking of the organopolysiloxane having SiC-bonded groups with basic nitrogen, is a compound containing Si-bonded hydrogen 1
Amounts of 1 to 20 gram equivalents of hydroxyl groups per gram atom are used.
本発明による方法は、好ましくは−20〜+50℃
および環境大気の圧力で、すなわち1020hPa(絶
対)または約1020hPa(絶対)で実施する。 The method according to the invention preferably comprises -20 to +50°C.
and at the pressure of the ambient atmosphere, i.e. at or about 1020 hPa (absolute).
本発明による方法を実施する場合、Si結合水素
の脱離は、氷酢酸のような無水酸を、Si結合水素
との反応によるフオームの形成および塩基性窒素
を有する少なくとも1つのSiC結合基を有するオ
ルガノポリシロキサンの架橋を惹起するヒドロキ
シル基含有化合物の添加前、またはそれと同時
に、添加することによつて遅延させることができ
る。 When carrying out the process according to the invention, the elimination of Si-bonded hydrogen is carried out using an anhydrous acid, such as glacial acetic acid, by reaction with Si-bonded hydrogen and the formation of a form containing at least one SiC-bonded group with a basic nitrogen. The delay can be effected by addition before or simultaneously with the addition of the hydroxyl group-containing compound which causes crosslinking of the organopolysiloxane.
本発明により製造されるフオームは、たとえば
疎水性建築材料として、および建築物、陸上車、
船舶および航空機における断熱材として適当であ
る。 The foams produced according to the invention can be used, for example, as hydrophobic building materials and in buildings, land vehicles,
Suitable as insulation in ships and aircraft.
殊に断熱材を製造する場合、本発明による方法
では、断熱材の製造の際に通常一緒に使用される
ような混濁剤を一緒に使用することができる。こ
の種の混濁剤の例は、チタン鉄鉱、二酸化チタン
(ルチルを含む)、酸化クロム、酸化マンガン、ジ
ルコニウム、酸化鉄、一酸化鉛、ならびにケイ
素、ホウ素、タンタルまたはタングステンの炭化
物、金属のアルミニウム、タングステンまたはケ
イ素、またはかかる混濁剤の少なくとも2つから
なる混合物である。混濁剤はそれぞれの気泡物質
の合計60重量%までの量で存在することができ
る。 Particularly in the production of insulation materials, the process according to the invention can also be used with clouding agents such as those commonly used in the production of insulation materials. Examples of opacifiers of this type are titanite, titanium dioxide (including rutile), chromium oxide, manganese oxide, zirconium, iron oxide, lead monoxide, as well as carbides of silicon, boron, tantalum or tungsten, metallic aluminum, Tungsten or silicon, or a mixture of at least two such opacifying agents. Clouding agents may be present in amounts up to a total of 60% by weight of the respective foam material.
同一分子中にSi結合水素も、塩基性窒素を有す
る少なくとも1つのSiC結合基も含有するケイ素
化合物に対して付加的に、本発明による方法では
他のケイ素化合物を一緒に使用することもでき
る。 In addition to silicon compounds which contain both Si-bonded hydrogen and at least one SiC-bonded group with a basic nitrogen in the same molecule, other silicon compounds can also be used together in the process according to the invention.
実施例
例 1
a トリメチルシロキシ基により末端封鎖され
た、25℃で粘度約20mm2・s-1を有するメチル水
素ポリシロキサン400gおよびγ−アミノエチ
ルアミノプロピルトリメトキシシラン165gか
らなる混合物を、窒素下に6時間140℃に加熱
する。得られた、空気遮断下で安定なオルガノ
ポリシロキサンは、25℃で粘度約7.5mm2・s-1を
有する無色透明の液体である。該オルガノポリ
シロキサンはアミン価(物質1gを中和するの
に必要な1N−HClのml数)2.63、アミン窒素
含有率3.7重量%を有しかつSi結合水素1.1重量
%を含有する。EXAMPLE 1 a A mixture consisting of 400 g of methylhydrogen polysiloxane end-capped with trimethylsiloxy groups and having a viscosity of about 20 mm 2 s -1 at 25° C. and 165 g of γ-aminoethylaminopropyltrimethoxysilane is heated under nitrogen. Heat to 140°C for 6 hours. The resulting organopolysiloxane, which is stable under exclusion of air, is a clear, colorless liquid with a viscosity of about 7.5 mm 2 ·s -1 at 25°C. The organopolysiloxane has an amine value (the number of milliliters of 1N HCl required to neutralize 1 g of material) of 2.63, an amine nitrogen content of 3.7% by weight, and contains 1.1% by weight of Si-bonded hydrogen.
b オルガノポリシロキサン(その製造法は上記
aに記載した)28.25gに水10gを加える。1
〜2秒後に激しいガスの発生が起き、フオーム
が得られ、このフオームはその形を保持する。
反応は15秒後に終了し、発泡したオルガノポリ
シロキサンは架橋していた。b Add 10 g of water to 28.25 g of organopolysiloxane (its manufacturing method is described in a. above). 1
After ~2 seconds, a vigorous evolution of gas occurs and a foam is obtained, which retains its shape.
The reaction ended after 15 seconds, and the foamed organopolysiloxane was crosslinked.
例 2
オルガノポリシロキサン(その製造法は、例
1aに記載した)20gにさしあたり氷酢酸2.5g、
次に水7gを加える。ガスの発生は例1の場合よ
りも緩慢である。Example 2 Organopolysiloxane (its manufacturing method is shown in Example 2)
2.5 g of glacial acetic acid per 20 g (described in 1a),
Next, add 7g of water. Gas evolution is slower than in Example 1.
例 3
氷酢酸2.5gの代わりに氷酢酸5gを使用して、
例2に記載した作業法を繰り返す。ガスの発生
は、例1の場合よりもなお緩慢である。Example 3 Using 5g of glacial acetic acid instead of 2.5g of glacial acetic acid,
Repeat the procedure described in Example 2. Gas evolution is even slower than in Example 1.
比較実験
トリメチルシロキシ基により末端封鎖された、
25℃で粘度約20mm2・s-1を有するメチル水素ポリ
シロキサン20gに、さしあたりγ−アミノエチル
アミノプロピルトリメトキシシラン8.25g、次に
水7gを加える。発泡は例1の場合よりも緩慢に
進行し、オルガノポリシロキサンが架橋する前
に、フオームはほとんど完全に崩壊する。 Comparative experiment End-capped with trimethylsiloxy group,
To 20 g of methylhydrogen polysiloxane having a viscosity of about 20 mm 2 s -1 at 25 DEG C. are added first 8.25 g of .gamma.-aminoethylaminopropyltrimethoxysilane and then 7 g of water. The foaming proceeds more slowly than in Example 1, and the foam collapses almost completely before the organopolysiloxane crosslinks.
例 4
a 撹拌機、滴加漏斗および還流冷却器を備えた
1の3つ口フラスコ中で、γ−アミノエチル
アミノプロピルトリメトキシシラン150gを、
撹拌下にメタノール4g中の水酸化カリウム
0.2gおよび平均分子重量約450g/モルおよび
25℃で粘度4mm2・s-1を有するポリエチルシリ
ケート500gからなる混合物に加える。こうし
て得られた混合物を6時間100℃に加熱する。
混合物を30℃に冷却した後に、10重量%の含水
塩酸2.5mlを加える。130℃にまで加熱すること
によつて、フラスコ内容物1.06gを留去する。
最後に塩化カリウムを濾別する。Example 4 a In a three-necked flask equipped with a stirrer, addition funnel and reflux condenser, 150 g of γ-aminoethylaminopropyltrimethoxysilane were
Potassium hydroxide in 4 g of methanol under stirring
0.2g and average molecular weight approximately 450g/mol and
A mixture consisting of 500 g of polyethylsilicate having a viscosity of 4 mm 2 s -1 at 25° C. is added. The mixture thus obtained is heated to 100° C. for 6 hours.
After the mixture has been cooled to 30° C., 2.5 ml of 10% by weight hydrochloric acid are added. By heating to 130°C, 1.06 g of the flask contents are distilled off.
Finally, potassium chloride is filtered off.
b Si結合水素不含のオルガノポリシロキサン
(その製法は前記aに記載した)50重量部、オ
ルガノポリシロキサン(その製法は例1aに記
載した)50重量部、例1aに詳述したメチル水
素ポリシロキサン50重量部、γ−アミノエチル
アミノプロピルトリメトキシシラン50重量部お
よび粉末状チタン鉄鉱60重量部からなる混合物
100gに、グリセリン15gを加える。1ないし
2秒後に激しいガスの発生が起き、フオームが
得られ、このフオームはその形を保持する。反
応は15秒後に終結し、オルガノポリシロキサン
は架橋している。この方法で優れた断熱材が得
られる。b 50 parts by weight of an organopolysiloxane containing no Si-bonded hydrogen (the method of preparation of which is described in a. above), 50 parts of an organopolysiloxane (the method of preparation of which is described in Example 1a), 50 parts by weight of an organopolysiloxane (the method of preparation of which is described in Example 1a), methylhydrogen polysiloxane as detailed in Example 1a. A mixture consisting of 50 parts by weight of siloxane, 50 parts by weight of γ-aminoethylaminopropyltrimethoxysilane and 60 parts by weight of powdered titanite.
Add 15g of glycerin to 100g. After 1 to 2 seconds, a strong evolution of gas occurs and a foam is obtained, which retains its shape. The reaction is complete after 15 seconds and the organopolysiloxane is crosslinked. This method provides excellent insulation.
例 5
チタン鉄鉱60重量部の代わりに粉末状二酸化チ
タン60重量部を使用して、例4bに記載した作業
法を繰り返す。同様に優れた断熱材が得られる。Example 5 The procedure described in Example 4b is repeated using 60 parts by weight of powdered titanium dioxide instead of 60 parts by weight of titanite. An excellent thermal insulation material is obtained as well.
Claims (1)
有化合物と反応させることにより気泡物質を製造
する方法において、この反応の際にSi結合水素含
有化合物として、少なくとも部分的に、同一分子
中にSi結合水素も、塩基性窒素を有する少なくと
も1つのSiC結合基も有するようなものを使用す
ることを特徴とする、気泡物質の製造法。 2 Si結合水素を有し、かつ塩基性窒素を有する
少なくとも1つのSiC結合基を有する化合物とし
て、トリメチルシロキシ基により末端封鎖された
メチル水素ポリシロキサンをγ−アミノエチルア
ミノプロピルトリメトキシシランで平衡化するこ
とにより得られるようなものを使用する、特許請
求の範囲第1項記載の方法。[Claims] 1. A method for producing a foam material by reacting a Si-bonded hydrogen-containing compound with a hydroxyl group-containing compound, in which at least a portion of the same molecule is used as the Si-bonded hydrogen-containing compound during this reaction. 1. A method for producing a cellular material, characterized in that a material having Si-bonded hydrogen and at least one SiC-bonded group having basic nitrogen therein is used. 2 Equilibration of methylhydrogen polysiloxane end-capped with trimethylsiloxy groups with γ-aminoethylaminopropyltrimethoxysilane as a compound having Si-bonded hydrogen and at least one SiC-bonded group containing basic nitrogen. 2. A method according to claim 1, wherein the method is as obtained by:
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DE19853524493 DE3524493A1 (en) | 1985-07-09 | 1985-07-09 | METHOD FOR PRODUCING FOAMS |
| DE3524493.3 | 1985-07-09 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS6213439A JPS6213439A (en) | 1987-01-22 |
| JPH038662B2 true JPH038662B2 (en) | 1991-02-06 |
Family
ID=6275322
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP61158900A Granted JPS6213439A (en) | 1985-07-09 | 1986-07-08 | Production of foaming substance |
Country Status (4)
| Country | Link |
|---|---|
| US (1) | US4692474A (en) |
| EP (1) | EP0208286A3 (en) |
| JP (1) | JPS6213439A (en) |
| DE (1) | DE3524493A1 (en) |
Families Citing this family (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| FR2299117A1 (en) | 1975-02-03 | 1976-08-27 | Hure Sa | IMPROVEMENTS TO MACHINE TOOLS WITH A BELIER SLIDING TOOL HOLDERS |
| US4980384A (en) * | 1988-09-05 | 1990-12-25 | Shin-Etsu Chemical Co., Ltd. | Foamable silicone rubber composition and method for curing the same |
| DE4235638A1 (en) * | 1992-10-22 | 1994-04-28 | Sonderhoff Ernst Fa | Process for producing a fine-pored silicone foam |
| US5653875A (en) * | 1994-02-04 | 1997-08-05 | Supelco, Inc. | Nucleophilic bodies bonded to siloxane and use thereof for separations from sample matrices |
| CN106283161B (en) * | 2016-08-25 | 2018-08-03 | 山东清大银光金属海绵新材料有限责任公司 | The preparation method of sponge structure sections/SiC particulate base water-oil separating reinforcement material |
Family Cites Families (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3036019A (en) * | 1958-11-03 | 1962-05-22 | Richardson Co | Modification of silicon-nitrogen containing compounds |
| US3923705A (en) * | 1974-10-30 | 1975-12-02 | Dow Corning | Method of preparing fire retardant siloxane foams and foams prepared therefrom |
| US4026842A (en) * | 1975-07-14 | 1977-05-31 | Dow Corning Corporation | Method of preparing fire retardant open-cell siloxane foams and foams prepared therefrom |
| US4026843A (en) * | 1975-07-14 | 1977-05-31 | Dow Corning Corporation | Foamable silicone gum stock having less skin thickness |
| JPS5945330A (en) * | 1982-09-08 | 1984-03-14 | Toshiba Silicone Co Ltd | Foamable polysiloxane composition |
| GB8309230D0 (en) * | 1983-04-05 | 1983-05-11 | Dow Corning Ltd | Silicone elastomer forming compositions |
| JPS59226036A (en) * | 1983-06-07 | 1984-12-19 | Toray Silicone Co Ltd | Organopolysiloxane foam composition |
| US4476188A (en) * | 1983-12-23 | 1984-10-09 | Dow Corning Corporation | Compositions producing aminofunctional silicone foams and coatings |
| US4460712A (en) * | 1983-12-23 | 1984-07-17 | Dow Corning Corporation | Compositions producing aminofunctional silicone foams and coatings |
-
1985
- 1985-07-09 DE DE19853524493 patent/DE3524493A1/en not_active Withdrawn
-
1986
- 1986-06-16 US US06/874,329 patent/US4692474A/en not_active Expired - Fee Related
- 1986-07-07 EP EP86109227A patent/EP0208286A3/en not_active Ceased
- 1986-07-08 JP JP61158900A patent/JPS6213439A/en active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| EP0208286A3 (en) | 1987-12-23 |
| US4692474A (en) | 1987-09-08 |
| EP0208286A2 (en) | 1987-01-14 |
| DE3524493A1 (en) | 1987-01-15 |
| JPS6213439A (en) | 1987-01-22 |
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