JPH039932B2 - - Google Patents
Info
- Publication number
- JPH039932B2 JPH039932B2 JP15597383A JP15597383A JPH039932B2 JP H039932 B2 JPH039932 B2 JP H039932B2 JP 15597383 A JP15597383 A JP 15597383A JP 15597383 A JP15597383 A JP 15597383A JP H039932 B2 JPH039932 B2 JP H039932B2
- Authority
- JP
- Japan
- Prior art keywords
- polymer
- polymerization
- vinyl
- group
- hydrocarbon group
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 229920000642 polymer Polymers 0.000 claims description 71
- 238000006116 polymerization reaction Methods 0.000 claims description 50
- 238000000034 method Methods 0.000 claims description 23
- 238000006460 hydrolysis reaction Methods 0.000 claims description 21
- 239000003795 chemical substances by application Substances 0.000 claims description 20
- 230000007062 hydrolysis Effects 0.000 claims description 20
- 238000006243 chemical reaction Methods 0.000 claims description 19
- 230000018044 dehydration Effects 0.000 claims description 19
- 238000006297 dehydration reaction Methods 0.000 claims description 19
- 229920002554 vinyl polymer Polymers 0.000 claims description 18
- 238000009833 condensation Methods 0.000 claims description 16
- 230000005494 condensation Effects 0.000 claims description 16
- -1 polysiloxane Polymers 0.000 claims description 13
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 claims description 12
- 125000004432 carbon atom Chemical group C* 0.000 claims description 11
- 229920001296 polysiloxane Polymers 0.000 claims description 10
- 125000002887 hydroxy group Chemical group [H]O* 0.000 claims description 9
- UKRDPEFKFJNXQM-UHFFFAOYSA-N vinylsilane Chemical compound [SiH3]C=C UKRDPEFKFJNXQM-UHFFFAOYSA-N 0.000 claims description 7
- 150000001875 compounds Chemical class 0.000 claims description 6
- 239000001257 hydrogen Substances 0.000 claims description 6
- 229910052739 hydrogen Inorganic materials 0.000 claims description 6
- 238000010526 radical polymerization reaction Methods 0.000 claims description 6
- 238000004519 manufacturing process Methods 0.000 claims description 5
- 239000002685 polymerization catalyst Substances 0.000 claims description 5
- 238000006884 silylation reaction Methods 0.000 claims description 5
- 229910052731 fluorine Inorganic materials 0.000 claims description 4
- 239000011737 fluorine Substances 0.000 claims description 4
- 125000001153 fluoro group Chemical group F* 0.000 claims description 4
- 125000005372 silanol group Chemical group 0.000 claims description 4
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 claims description 3
- 238000010539 anionic addition polymerization reaction Methods 0.000 claims description 3
- 238000012643 polycondensation polymerization Methods 0.000 claims description 3
- 125000002252 acyl group Chemical group 0.000 claims description 2
- 125000002029 aromatic hydrocarbon group Chemical group 0.000 claims description 2
- 229910052794 bromium Inorganic materials 0.000 claims description 2
- 229910052801 chlorine Inorganic materials 0.000 claims description 2
- 150000002431 hydrogen Chemical class 0.000 claims description 2
- 229910052740 iodine Inorganic materials 0.000 claims description 2
- 125000001183 hydrocarbyl group Chemical group 0.000 claims 6
- 125000004429 atom Chemical group 0.000 claims 2
- 125000001931 aliphatic group Chemical group 0.000 claims 1
- 239000007859 condensation product Substances 0.000 claims 1
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 26
- UHOVQNZJYSORNB-UHFFFAOYSA-N monobenzene Natural products C1=CC=CC=C1 UHOVQNZJYSORNB-UHFFFAOYSA-N 0.000 description 19
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 15
- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 14
- 239000011248 coating agent Substances 0.000 description 13
- 238000000576 coating method Methods 0.000 description 13
- FFUAGWLWBBFQJT-UHFFFAOYSA-N hexamethyldisilazane Chemical compound C[Si](C)(C)N[Si](C)(C)C FFUAGWLWBBFQJT-UHFFFAOYSA-N 0.000 description 12
- BWHMMNNQKKPAPP-UHFFFAOYSA-L potassium carbonate Chemical compound [K+].[K+].[O-]C([O-])=O BWHMMNNQKKPAPP-UHFFFAOYSA-L 0.000 description 12
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 11
- 230000015572 biosynthetic process Effects 0.000 description 10
- QTBSBXVTEAMEQO-UHFFFAOYSA-N Acetic acid Chemical compound CC(O)=O QTBSBXVTEAMEQO-UHFFFAOYSA-N 0.000 description 9
- 238000005755 formation reaction Methods 0.000 description 9
- 239000000203 mixture Substances 0.000 description 8
- VLKZOEOYAKHREP-UHFFFAOYSA-N n-Hexane Chemical compound CCCCCC VLKZOEOYAKHREP-UHFFFAOYSA-N 0.000 description 8
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 6
- MZRVEZGGRBJDDB-UHFFFAOYSA-N N-Butyllithium Chemical compound [Li]CCCC MZRVEZGGRBJDDB-UHFFFAOYSA-N 0.000 description 6
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 6
- 239000002253 acid Substances 0.000 description 6
- 238000004458 analytical method Methods 0.000 description 6
- 229910052710 silicon Inorganic materials 0.000 description 6
- 239000002904 solvent Substances 0.000 description 6
- 238000003756 stirring Methods 0.000 description 6
- 238000000862 absorption spectrum Methods 0.000 description 5
- 239000002585 base Substances 0.000 description 5
- 239000003054 catalyst Substances 0.000 description 5
- 238000010438 heat treatment Methods 0.000 description 5
- 150000002430 hydrocarbons Chemical group 0.000 description 5
- 239000011810 insulating material Substances 0.000 description 5
- 229910052757 nitrogen Inorganic materials 0.000 description 5
- 229910000027 potassium carbonate Inorganic materials 0.000 description 5
- 239000010703 silicon Substances 0.000 description 5
- OZAIFHULBGXAKX-UHFFFAOYSA-N 2-(2-cyanopropan-2-yldiazenyl)-2-methylpropanenitrile Chemical compound N#CC(C)(C)N=NC(C)(C)C#N OZAIFHULBGXAKX-UHFFFAOYSA-N 0.000 description 4
- 229960000583 acetic acid Drugs 0.000 description 4
- 125000000217 alkyl group Chemical group 0.000 description 4
- 239000012044 organic layer Substances 0.000 description 4
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 3
- 229910020175 SiOH Inorganic materials 0.000 description 3
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 3
- RQVFGTYFBUVGOP-UHFFFAOYSA-N [acetyloxy(dimethyl)silyl] acetate Chemical compound CC(=O)O[Si](C)(C)OC(C)=O RQVFGTYFBUVGOP-UHFFFAOYSA-N 0.000 description 3
- 125000003118 aryl group Chemical group 0.000 description 3
- 238000005229 chemical vapour deposition Methods 0.000 description 3
- 238000001879 gelation Methods 0.000 description 3
- 239000012362 glacial acetic acid Substances 0.000 description 3
- 229920006158 high molecular weight polymer Polymers 0.000 description 3
- 239000007788 liquid Substances 0.000 description 3
- 239000000178 monomer Substances 0.000 description 3
- 238000004445 quantitative analysis Methods 0.000 description 3
- 238000010992 reflux Methods 0.000 description 3
- 238000005406 washing Methods 0.000 description 3
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 2
- NBIIXXVUZAFLBC-UHFFFAOYSA-N Phosphoric acid Chemical compound OP(O)(O)=O NBIIXXVUZAFLBC-UHFFFAOYSA-N 0.000 description 2
- 239000004642 Polyimide Substances 0.000 description 2
- 229910008051 Si-OH Inorganic materials 0.000 description 2
- 229910006358 Si—OH Inorganic materials 0.000 description 2
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 2
- 238000010521 absorption reaction Methods 0.000 description 2
- 150000007513 acids Chemical class 0.000 description 2
- 230000000052 comparative effect Effects 0.000 description 2
- 238000006482 condensation reaction Methods 0.000 description 2
- 238000005336 cracking Methods 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 239000012776 electronic material Substances 0.000 description 2
- 230000008014 freezing Effects 0.000 description 2
- 238000007710 freezing Methods 0.000 description 2
- 230000003301 hydrolyzing effect Effects 0.000 description 2
- 239000000463 material Substances 0.000 description 2
- 238000005259 measurement Methods 0.000 description 2
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 description 2
- 229920001721 polyimide Polymers 0.000 description 2
- 239000004065 semiconductor Substances 0.000 description 2
- SCPYDCQAZCOKTP-UHFFFAOYSA-N silanol Chemical compound [SiH3]O SCPYDCQAZCOKTP-UHFFFAOYSA-N 0.000 description 2
- 238000003786 synthesis reaction Methods 0.000 description 2
- IDXCKOANSQIPGX-UHFFFAOYSA-N (acetyloxy-ethenyl-methylsilyl) acetate Chemical group CC(=O)O[Si](C)(C=C)OC(C)=O IDXCKOANSQIPGX-UHFFFAOYSA-N 0.000 description 1
- 239000004342 Benzoyl peroxide Substances 0.000 description 1
- OMPJBNCRMGITSC-UHFFFAOYSA-N Benzoylperoxide Chemical compound C=1C=CC=CC=1C(=O)OOC(=O)C1=CC=CC=C1 OMPJBNCRMGITSC-UHFFFAOYSA-N 0.000 description 1
- 238000004566 IR spectroscopy Methods 0.000 description 1
- AQQCLWZIELXFDV-UHFFFAOYSA-N N-[dimethylamino(prop-1-enyl)silyl]-N-methylmethanamine Chemical compound CN(C)[SiH](C=CC)N(C)C AQQCLWZIELXFDV-UHFFFAOYSA-N 0.000 description 1
- CTQNGGLPUBDAKN-UHFFFAOYSA-N O-Xylene Chemical compound CC1=CC=CC=C1C CTQNGGLPUBDAKN-UHFFFAOYSA-N 0.000 description 1
- 229910004298 SiO 2 Inorganic materials 0.000 description 1
- 230000032683 aging Effects 0.000 description 1
- 229910052783 alkali metal Inorganic materials 0.000 description 1
- 150000001340 alkali metals Chemical class 0.000 description 1
- 229910052784 alkaline earth metal Inorganic materials 0.000 description 1
- 150000001342 alkaline earth metals Chemical class 0.000 description 1
- 125000005234 alkyl aluminium group Chemical group 0.000 description 1
- 229910000147 aluminium phosphate Inorganic materials 0.000 description 1
- 150000004945 aromatic hydrocarbons Chemical class 0.000 description 1
- 235000019400 benzoyl peroxide Nutrition 0.000 description 1
- 229910052799 carbon Inorganic materials 0.000 description 1
- 150000004649 carbonic acid derivatives Chemical class 0.000 description 1
- 239000003729 cation exchange resin Substances 0.000 description 1
- 229940023913 cation exchange resins Drugs 0.000 description 1
- 239000012141 concentrate Substances 0.000 description 1
- 238000004132 cross linking Methods 0.000 description 1
- 239000002274 desiccant Substances 0.000 description 1
- YLJJAVFOBDSYAN-UHFFFAOYSA-N dichloro-ethenyl-methylsilane Chemical compound C[Si](Cl)(Cl)C=C YLJJAVFOBDSYAN-UHFFFAOYSA-N 0.000 description 1
- 125000000118 dimethyl group Chemical group [H]C([H])([H])* 0.000 description 1
- ZIDTUTFKRRXWTK-UHFFFAOYSA-N dimethyl(dipropoxy)silane Chemical compound CCCO[Si](C)(C)OCCC ZIDTUTFKRRXWTK-UHFFFAOYSA-N 0.000 description 1
- 229910001873 dinitrogen Inorganic materials 0.000 description 1
- KPUWHANPEXNPJT-UHFFFAOYSA-N disiloxane Chemical class [SiH3]O[SiH3] KPUWHANPEXNPJT-UHFFFAOYSA-N 0.000 description 1
- 238000009826 distribution Methods 0.000 description 1
- 238000001035 drying Methods 0.000 description 1
- QKDMJUDWTWAFPQ-UHFFFAOYSA-N ethenyl-methyl-dipropoxysilane Chemical group CCCO[Si](C)(C=C)OCCC QKDMJUDWTWAFPQ-UHFFFAOYSA-N 0.000 description 1
- 238000000605 extraction Methods 0.000 description 1
- 238000001914 filtration Methods 0.000 description 1
- 229940093915 gynecological organic acid Drugs 0.000 description 1
- 229910052736 halogen Inorganic materials 0.000 description 1
- 150000002367 halogens Chemical class 0.000 description 1
- 125000004435 hydrogen atom Chemical group [H]* 0.000 description 1
- 150000004679 hydroxides Chemical class 0.000 description 1
- 238000009413 insulation Methods 0.000 description 1
- 239000011229 interlayer Substances 0.000 description 1
- 229910052744 lithium Inorganic materials 0.000 description 1
- 230000008018 melting Effects 0.000 description 1
- 238000002844 melting Methods 0.000 description 1
- 239000012528 membrane Substances 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 150000007522 mineralic acids Chemical class 0.000 description 1
- DYEJUGFQWAGGDF-UHFFFAOYSA-N n-(diethylamino-ethenyl-methylsilyl)-n-ethylethanamine Chemical compound CCN(CC)[Si](C)(C=C)N(CC)CC DYEJUGFQWAGGDF-UHFFFAOYSA-N 0.000 description 1
- FIRXZHKWFHIBOF-UHFFFAOYSA-N n-(dimethylamino-ethenyl-methylsilyl)-n-methylmethanamine Chemical compound CN(C)[Si](C)(C=C)N(C)C FIRXZHKWFHIBOF-UHFFFAOYSA-N 0.000 description 1
- 239000003921 oil Substances 0.000 description 1
- 150000007524 organic acids Chemical class 0.000 description 1
- 235000005985 organic acids Nutrition 0.000 description 1
- 239000012074 organic phase Substances 0.000 description 1
- 239000003973 paint Substances 0.000 description 1
- 238000002161 passivation Methods 0.000 description 1
- 230000000704 physical effect Effects 0.000 description 1
- 239000003505 polymerization initiator Substances 0.000 description 1
- 230000035484 reaction time Effects 0.000 description 1
- 238000000926 separation method Methods 0.000 description 1
- 150000003377 silicon compounds Chemical group 0.000 description 1
- 239000000377 silicon dioxide Substances 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
- 230000006641 stabilisation Effects 0.000 description 1
- 238000011105 stabilization Methods 0.000 description 1
- 238000003860 storage Methods 0.000 description 1
- JOXIMZWYDAKGHI-UHFFFAOYSA-N toluene-4-sulfonic acid Chemical compound CC1=CC=C(S(O)(=O)=O)C=C1 JOXIMZWYDAKGHI-UHFFFAOYSA-N 0.000 description 1
- 150000003613 toluenes Chemical class 0.000 description 1
- 238000005292 vacuum distillation Methods 0.000 description 1
- 238000001291 vacuum drying Methods 0.000 description 1
- 239000008096 xylene Substances 0.000 description 1
Landscapes
- Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
Description
本発明は新規なポリビニルポリシロキサンポリ
マーの製造方法に関する。
現在電子材料生産の分野で高性能の耐熱絶縁材
料の出現に対する強い要望がある。その耐熱絶縁
材料に要求される性能としては次のようなものが
ある。
250℃以上の耐熱性を持つこと。
適当な溶媒に可溶であること。
溶媒に溶解した後の安定性があること。
塗膜を厚くできること。
加熱など外部からの作用により塗膜に亀裂を
生じないこと。
塗膜にピンホールができないこと。
段差平滑性を有し、半導体用ステツプカバレ
ージ剤として使えること。
これらの性能を満たすポリマーが得られると半
導体用として、パツシベーシヨン膜、多層配線用
層間絶縁膜、リフトオフ膜などの用途が開けると
共に種々の高性能絶縁材料としての用途が開け
る。
従来電子材料分野で耐熱絶縁材料としてシリ
カ、ポリイミドなどが使用されているが、加工性
や上記性能などの面で必ずしも満足のいく材料と
は言えない。
そこで、本発明者らは、ポリシロキサンを主体
とする耐熱絶縁油、シリカ(SiO2)に見られる
ようにシロキサン結合は耐熱絶縁性を持つことに
着目した。これらは現在使用法、成形加工性など
に関して、前者は油状ないし低融点の材料で固体
絶縁材料として使用し難い。後者は絶縁膜などの
形成にはCVD(Chemical Vapour Deposition)
法などによらねばならず膜厚、平滑性などにも問
題が多い。そこで、更に、シロキサン結合含有の
ラダーポリマーが着目された。ラダーポリマー
は、ポリマーの溶解性、耐熱性などを改良する一
つの方法であることが知られている。
しかし、シロキサン結合含有のラダーポリマー
として、一般式
のような全シロキサンラダーポリマーも発表され
ている(特開昭56−49540号)が、合成法が難し
く、また塗膜に亀裂が生じ易いなどの問題があり
未だ実用化されていない。
また一般式
のような含シロキサンラダーポリマーも合成され
ている(米国特許第3485857号明細書)が、分子
量が低く塗膜に亀裂が入り易いという問題があ
る。これは、ポリビニルシランの重合度は一般に
余り高くなく、従来の報告が示すように重合法に
よる差はあるも20以下であることが一つの原因に
なつていると考えられる。
本発明の目的は、これら含けい素ラダーポリマ
ーの欠点を改善し、上記性能を有する新規なポリ
ビニルポリシロキサンポリマーを提供することで
ある。
本発明は、一般式CH2=CH−SiR1X2(ここに
R1は炭化水素基又はF置換炭化水素基、Xは加
水分解性の基で、同一分子内において同種であつ
ても異種であつてもよい。)で表わされるビニル
シラン又はそのビニル基における水素を弗素で置
換した化合物(以下、これらを「ビニルシラン」
と総称する。)をビニル重合し、得られたビニル
重合体を酸又は塩基の存在下に加水分解脱水縮合
することを包含する高重合度のポリビニルポリシ
ロキサンポリマーの製造方法において、前記ビニ
ル重合体であつて重合度が7以上であるもの(以
下これを「プレポリマー」という。)ないしその
加水分解脱水縮合体(以下これを「プレポリマー
等」という。)を、一般式R1 2SiX2(ここでR1及び
Xは上記のものと同じ意味を表わし、これらはそ
れぞれ同一分子内において同種であつても異種で
あつてもよい。)、重合度6以下で前記プレポリマ
ーの重合度よりも小さい重合度の前記ビニルシラ
ンのビニル重合体並びにそれらの加水分解体及び
それらの加水分解脱水縮合体から選ばれる少なく
とも一種からなるジヨイント剤の存在下に、脱水
縮合重合し、必要に応じて残留シラノール基を、
一般式R1 3SiX(ここにR1及びXは前記と同じ意味
を表わし、R1は同一分子内において同種であつ
ても異種であつてもよい。)、又は一般式R1 3Si−
Y−SiR1 3(ここにYは二価の加水分解性の基であ
り、R1は上記と同じ意味を表わし、同一分子内
で同種であつても異種であつてもよい。)で表わ
される末端停止剤によりシリル化することを特徴
とする前記高重合度ポリビニルポリシロキサンポ
リマーの製造方法である。
前記プレポリマーは先にも述べたように重合度
が低く、これを加水分解し分子内脱水縮合してラ
ダー化しこれから塗膜を作つても亀裂が入り易
い。本発明はこのようなラダーポリマー(と推定
されるもの)を、前記R1 2SiX2もしくは前記比較
的低重合度のポリビニルシラン又はそれらの加水
分解体もしくは加水分解脱水縮合体をジヨイント
剤として、(加水分解)脱水縮合により連結した
形の高分子量重合体を得るものである。この場合
プレポリマーは重合度が高い程最終的に得られる
高分子量重合体の耐熱性はよい。このためその重
合度は7以上が適当である。一方ジヨイント剤
は、ジヨイント反応(高分子化反応)の速度を大
きくするため、分子量は小さい方がよい。従つて
また、前記ジヨイント剤としての比較的低分子量
のポリビニルシラン、その加水分解体又はその加
水分解脱水縮合体(以下「低分子量ポリビニルシ
ラン等」という。)の重合度も低い方がよく、6
以下、2以上が適当である。
前記プレポリマー等とジヨイント剤の反応にお
ける量的割合については、プレポリマー1モルに
対してジヨイント剤0.8モル以上好ましくは0.9モ
ル以上更に好ましくは1モル以上が適当である。
ジヨイント剤の上限に関しては、プレポリマー1
モルに対して、20モル以下、好ましくは10モル以
下、更に好ましくは5モル以下が適当である。但
しR1 2SiX2、その加水分解体又はその加水分解脱
水縮合体(以下「R1 2SiX2等」という。)は、単独
使用する場合にも、低分子量ポリビニルシラン等
と併用する場合にも、プレポリマー1モルに対し
て3モル以下好ましくは2モル以下が適当であ
る。
このようにして得られた高重合度重合体は適当
な溶媒に可溶であるから塗膜への成形加工が容易
であり、溶液が安定であり、塗膜を厚くすること
ができ、得られた塗膜は亀裂が生じにくく、ピン
ホールができにくく、段差平滑性を有し、耐熱性
に富んでいる。
本発明によつて製造されるポリマーは重合度が
50以上好ましくは100以上が適当である。
本発明に使用するビニルシランにおけるR1は
炭化水素基又はその水素の一部又は全部を弗素で
置換したものであるが、好ましくは炭素原子数10
以下のアルキル基又はアリール基等更に好ましく
は炭素原子数1〜4のアルキル基等又は炭素原子
数6〜9のアリール基等である。
Xは加水分解性の基であるが、例として、ハロ
ゲン好ましくはCl、Br又はI;−OR2、−
OCOR2、−SR2、−NR2 2、−NHR2、−OSO3R2を
挙げることができる。ただし、ここにR2は炭化
水素基であり、好ましくは炭素原子数10以下のも
の更に好ましくは炭素原子数1〜4のアルキル基
又は炭素原子数6〜9のアリール基である。
このビニルシランのビニル重合は、例えば炭化
水素系、好ましくは脂肪族系の溶媒中でアルキル
リチウム、アルキルアルミニウム(R3Al、
R2AlCl:ここにRはアルキル基を表わす。)など
のアニオン重合触媒又は過酸化ベンゾイル、アゾ
ビスイソブチロニトリルなどのラジカル重合触媒
を用いて行うことができる。例えば、モノマーと
してメチルビニルビス(ジメチルアミノ)シラン
を使用するときは前記有機金属を用いてアニオン
重合することができ、モノマーとしてメチルビニ
ルジアルコキシシラン、メチルビニルジチオアル
コキシシラン、メチルビニルジアセトキシシラン
又はメチルビニルジクロルシランを使用するとき
は前記ラジカル重合触媒を用いてラジカル重合を
することができる。反応温度としては、前記アニ
オン重合の場合は−10〜90℃好ましくは−5〜50
℃を、ラジカル重合の場合は50〜200℃好ましく
は70〜150℃を、それぞれ採用することができる。
このビニル重合方法自体に関しては既に多くの文
献が存在し、その公知の方法を適用でき、本発明
で特に限定することはない。
このビニル重合による重合度の上限はせいぜい
20であり、これ以上の重合度を得るのは困難であ
る。
次にこのビニル重合体(以下これをプレポリマ
ーということがある。)を加水分解し脱水縮合す
る。この加水分解は酸又は塩基を触媒とし、加水
分解のための水又はアルコールの存在下に−5〜
60℃好ましくは20〜50℃で行うことができる。前
記水又はアルコールの量は前記Si−Xに対し等モ
ル〜3モル倍程度を好適に使用しうる。脱水縮合
は触媒としての酸又は塩基の存在下−5〜100℃
好ましくは20〜70℃で行なうことができる。前記
加水分解と脱水縮合は一段反応で行なうこともで
きる。この場合は前記脱水縮合反応と同じ温度条
件で行うのがよい。これら加水分解及び脱水縮合
に使用する酸としては、塩酸、硫酸、りん酸等の
無機酸、酢酸、パラトルエンスルホン酸等の有機
酸、陽イオン交換樹脂(特に強酸性のもの)を例
示することができる。塩基としては、アルカリ金
属又はアルカリ土類金属の水酸化物、炭酸塩など
を例示することができる。この加水分解脱水縮合
によりラダーポリマーが形成されると推定され
る。この加水分解脱水縮合体はなお少なくとも2
つの−OH基を持つている。この段階のポリマー
の典型的な構造は次のようなものと推定される。
(n=5〜20、Aは重合触媒残基を表わす。)
但し反応条件によつては、両末端以外のシラノ
ール残基の存在することもある。
前記ジヨイント剤はけい素原子に結合された加
水分解性の基を2つ持つたけい素化合物又はその
加水分解体で、具体的には一般式R1 2SiX2で表わ
される化合物もしくはの加水分解体又は前記ビニ
ルシランの比較的低重合度のビニル重合体、その
加水分解体もしくはその加水分解脱水縮合体であ
る。このジヨイント剤は結局Si−OH基を2つ持
つた形となつて、上記プレポリマーの加水分解脱
水縮合体の残留したSi−OH基との間に脱水縮合
を生起せしめられ、高分子を形成して行くのであ
る。
前記R1 2SiX2もしくは比較的低重合度ポリビニ
ルシランの加水分解、又は比較的低重合度のポリ
ビニルシランの加水分解体の脱水縮合は、上記プ
レポリマーの加水分解又はその加水分解体の脱水
縮合と同じ条件で行なうことができ、また別々に
もしくは混合して同時に行なうことができる。混
合して同時に行なうときは上に述べたような、ポ
リビニルシラン自体の加水分解脱水縮合と共にそ
のようなポリマーとジヨイント剤との脱水縮合が
生じる。
前記プレポリマーないしその加水分解脱水縮合
体と前記ジヨイント剤の反応は、適当な溶媒中で
酸又は塩基の存在下に−5〜100℃好ましくは20
〜70℃で行なう。これにより高分子量ポリマーが
形成される。この際前記溶媒は、前記プレポリマ
ーの加水分解体ないその部分的脱水縮合体の分子
内脱水縮合を完結させて架橋反応を防止するた
め、最終的に得られるポリマーを基準としてその
濃度が40%以下好ましくは20%以下となる量を使
用するのが好ましい。該溶媒としてはベンゼン、
トルエン、キシレン等の芳香族炭化水素を使用す
ることができる。
次に、前記高分子化反応で未だ反応しなかつた
低分子量Si化合物の縮合重合、及び高分子内残留
シラノール基間の脱水縮合、を更に進めるため
に、これらの混合物を熟成させるのがよい。この
熟成はなるべく無水の溶液状態で50〜150℃好ま
しくは70〜130℃で行うのがよく、この場合の反
応時間は0.5〜10時間好ましくは1〜5時間とす
ることができる。
この高分子化の際、前記プレポリマー等として
平均重合度の異なる2種以上を混合使用してもよ
い。これにより最終的に得られる高分子重合体の
分子量分布を拡げることができ、これによつて塗
膜の亀裂が更に生じにくいものとなしうる。ジヨ
イント剤に前記低分子量のプレポリマー等を使用
する場合にも同様な効果が得られる。
ポリシロキサン系のポリマーの溶液は該ポリマ
ーのシロキサン連鎖の両末端及び析々中間の一部
に存在する残留水酸基の量及び性質によつて溶液
の保存中にポリマーがゲル化する問題のあること
はよく知られている。上記のようにして得られた
ポリビニルポリシロキサン高分子重合体にもこの
問題はある。そこで、残留水酸基の末端停止剤と
して、一般式R1 3SiX又はR1 3Si−Y−SiR1 3で表わ
される化合物又はその加水分解体を適当量、上記
ポリビニルポリシロキサン高分子重合体形成後こ
れを添加してポリマー中の残留水酸基のシリル化
を行なわせ、その残留量を調節するのが好まし
い。
前記Yとしては一般式R3N<(ここにR3は水素
又は炭素数1〜4の炭化水素基又はアシル基を表
わす。)、−O−がある。
前記シリル化は20〜100℃で好適に行なうこと
ができ、触媒は特に必要としない。
前記残留水酸基の量はポリマー中のSiに対して
モル比で0〜0.1、好ましくは0.001〜0.02とする
のがよい。
本発明に係るポリマーはベンゼン、トルエンな
どの芳香族炭化水素基に易溶である。
次に本発明と従来法であるCVD法によるSiO2
塗膜(形成法)、縮合系ポリイミド(PIQ)の塗
膜(形成法)とを比較して表1に示す。
The present invention relates to a novel method for producing polyvinylpolysiloxane polymers. Currently, there is a strong demand for the emergence of high-performance heat-resistant insulating materials in the field of electronic material production. The following properties are required of the heat-resistant insulating material. Must have heat resistance of 250℃ or higher. Must be soluble in a suitable solvent. Must be stable after being dissolved in a solvent. The ability to thicken the coating film. The coating film should not crack due to external effects such as heating. No pinholes should be formed in the paint film. It has step smoothness and can be used as a step coverage agent for semiconductors. If a polymer that satisfies these properties can be obtained, it will be used as a passivation film for semiconductors, an interlayer insulating film for multilayer wiring, a lift-off film, etc., and it will also be used as a variety of high-performance insulating materials. Silica, polyimide, and the like have been used as heat-resistant insulating materials in the field of electronic materials, but these materials are not necessarily satisfactory in terms of processability and the above-mentioned performance. Therefore, the present inventors focused on the fact that siloxane bonds have heat-resistant insulation properties, as seen in silica (SiO 2 ), a heat-resistant insulating oil mainly composed of polysiloxane. Regarding the current usage and moldability of these materials, the former is oily or has a low melting point and is difficult to use as a solid insulating material. The latter uses CVD (Chemical Vapor Deposition) to form insulating films, etc.
There are many problems with film thickness, smoothness, etc. Therefore, attention has been paid to ladder polymers containing siloxane bonds. Ladder polymers are known to be one method for improving the solubility, heat resistance, etc. of polymers. However, as a ladder polymer containing siloxane bonds, the general formula All-siloxane ladder polymers have also been published (Japanese Patent Application Laid-Open No. 56-49540), but they have not yet been put into practical use due to problems such as difficult synthesis and easy cracking of the coating film. Also general formula A siloxane-containing ladder polymer has also been synthesized (US Pat. No. 3,485,857), but it has a problem that the molecular weight is low and the coating film is easily cracked. One reason for this is thought to be that the degree of polymerization of polyvinylsilane is generally not very high, and as shown in previous reports, it is 20 or less, although there are differences depending on the polymerization method. An object of the present invention is to improve the drawbacks of these silicon-containing ladder polymers and to provide a new polyvinylpolysiloxane polymer having the above-mentioned properties. The present invention is based on the general formula CH 2 =CH-SiR 1 X 2 (wherein
R 1 is a hydrocarbon group or an F-substituted hydrocarbon group, and X is a hydrolyzable group, which may be the same type or different types within the same molecule. ) or a compound in which hydrogen in the vinyl group is replaced with fluorine (hereinafter these are referred to as "vinylsilane")
Collectively called. ), and the resulting vinyl polymer is hydrolyzed, dehydrated and condensed in the presence of an acid or a base. Polymers having a degree of 7 or more (hereinafter referred to as "prepolymers") or their hydrolyzed and dehydrated condensates (hereinafter referred to as "prepolymers, etc.") are represented by the general formula R 1 2 SiX 2 (hereinafter referred to as R 1 and X represent the same meanings as above, and they may be the same or different in the same molecule.), a degree of polymerization of 6 or less and lower than the degree of polymerization of the prepolymer. Dehydration condensation polymerization is carried out in the presence of a jointing agent consisting of at least one member selected from a vinyl polymer of the above-mentioned vinyl silane, their hydrolysis, and their hydrolyzed and dehydrated condensates, and if necessary, residual silanol groups are removed.
General formula R 1 3 SiX ( herein, R 1 and
Represented by Y-SiR 1 3 (here, Y is a divalent hydrolyzable group, R 1 has the same meaning as above, and may be the same or different in the same molecule) The method for producing the highly polymerized polyvinylpolysiloxane polymer is characterized in that silylation is carried out using a terminal capping agent. As mentioned above, the prepolymer has a low degree of polymerization, and even if it is hydrolyzed and subjected to intramolecular dehydration condensation to form a ladder, which is then used to form a coating film, cracks are likely to occur. The present invention uses such a ladder polymer (presumed to be one) by using the R 1 2 SiX 2 or the polyvinylsilane with a relatively low degree of polymerization, or a hydrolyzed or hydrolyzed dehydrated condensate thereof as a joint agent, (Hydrolysis) A high molecular weight polymer in a connected form is obtained by dehydration condensation. In this case, the higher the degree of polymerization of the prepolymer, the better the heat resistance of the high molecular weight polymer finally obtained. Therefore, the degree of polymerization is suitably 7 or more. On the other hand, in order to increase the speed of the joint reaction (polymerization reaction), it is better for the joint agent to have a small molecular weight. Therefore, it is also preferable that the degree of polymerization of the relatively low molecular weight polyvinylsilane, its hydrolyzed product, or its hydrolyzed and dehydrated condensate (hereinafter referred to as "low molecular weight polyvinylsilane etc.") used as the jointing agent is low.
Below, 2 or more is appropriate. Regarding the quantitative ratio in the reaction between the prepolymer and the like, the joint agent is suitably 0.8 mol or more, preferably 0.9 mol or more, and more preferably 1 mol or more, per 1 mol of the prepolymer.
Regarding the upper limit of jointing agent, prepolymer 1
Based on the mole, a suitable amount is 20 mol or less, preferably 10 mol or less, more preferably 5 mol or less. However, R 1 2 SiX 2 , its hydrolysis, or its hydrolyzed and dehydrated condensate (hereinafter referred to as "R 1 2 SiX 2 , etc.") may be used alone or in combination with low molecular weight polyvinylsilane, etc. Also, the amount is suitably 3 mol or less, preferably 2 mol or less, per 1 mol of prepolymer. The highly polymerized polymer obtained in this way is soluble in an appropriate solvent, so it is easy to form into a coating film, the solution is stable, the coating film can be thickened, and the obtained The coating film is less prone to cracks, less prone to pinholes, has smoother steps, and is highly heat resistant. The polymer produced according to the present invention has a degree of polymerization.
A value of 50 or more, preferably 100 or more is appropriate. R 1 in the vinyl silane used in the present invention is a hydrocarbon group or one in which part or all of its hydrogen is substituted with fluorine, and preferably has 10 carbon atoms.
The following alkyl groups or aryl groups are more preferable, such as alkyl groups having 1 to 4 carbon atoms or aryl groups having 6 to 9 carbon atoms. X is a hydrolyzable group, for example halogen, preferably Cl, Br or I; -OR2 , -
Mention may be made of OCOR2 , -SR2 , -NR22 , -NHR2 , -OSO3R2 . However, R2 here is a hydrocarbon group, preferably one having 10 or less carbon atoms, and more preferably an alkyl group having 1 to 4 carbon atoms or an aryl group having 6 to 9 carbon atoms. This vinyl polymerization of vinylsilane is carried out, for example, using alkyl lithium, alkyl aluminum (R 3 Al,
R 2 AlCl: R here represents an alkyl group. ) or radical polymerization catalysts such as benzoyl peroxide and azobisisobutyronitrile. For example, when methylvinylbis(dimethylamino)silane is used as a monomer, anionic polymerization can be performed using the above-mentioned organic metal; When methylvinyldichlorosilane is used, radical polymerization can be carried out using the above-mentioned radical polymerization catalyst. In the case of the anionic polymerization, the reaction temperature is -10 to 90°C, preferably -5 to 50°C.
In the case of radical polymerization, a temperature of 50 to 200°C, preferably 70 to 150°C can be employed.
There are already many documents regarding this vinyl polymerization method itself, and the known methods can be applied, and the present invention is not particularly limited thereto. The upper limit of the degree of polymerization due to vinyl polymerization is at most
20, and it is difficult to obtain a higher degree of polymerization. Next, this vinyl polymer (hereinafter sometimes referred to as prepolymer) is hydrolyzed and subjected to dehydration condensation. This hydrolysis is catalyzed by acids or bases in the presence of water or alcohol for hydrolysis.
It can be carried out at 60°C, preferably 20-50°C. The amount of water or alcohol used may preferably range from equimolar to about 3 times the amount of Si-X. Dehydration condensation is carried out at -5 to 100°C in the presence of an acid or base as a catalyst.
Preferably, it can be carried out at 20 to 70°C. The hydrolysis and dehydration condensation can also be carried out in one step. In this case, it is preferable to carry out the reaction under the same temperature conditions as the dehydration condensation reaction. Examples of acids used in these hydrolysis and dehydration condensations include inorganic acids such as hydrochloric acid, sulfuric acid, and phosphoric acid, organic acids such as acetic acid and paratoluenesulfonic acid, and cation exchange resins (especially strong acid ones). Can be done. Examples of the base include hydroxides and carbonates of alkali metals or alkaline earth metals. It is estimated that a ladder polymer is formed by this hydrolytic dehydration condensation. This hydrolyzed and dehydrated condensate is still at least 2
It has two –OH groups. The typical structure of the polymer at this stage is estimated to be as follows. (n=5 to 20, A represents a polymerization catalyst residue.) However, depending on the reaction conditions, silanol residues other than those at both ends may be present. The joint agent is a silicon compound having two hydrolyzable groups bonded to a silicon atom or its hydrolysis, specifically a compound represented by the general formula R 1 2 SiX 2 or its hydrolysis. It is a vinyl polymer having a relatively low degree of polymerization of the vinyl silane, hydrolysis thereof, or a hydrolyzed dehydrated condensate thereof. This jointing agent ends up having two Si-OH groups, and dehydration condensation occurs with the remaining Si-OH groups of the hydrolyzed and dehydrated condensate of the prepolymer, forming a polymer. That's what I'm going to do. The hydrolysis of R 1 2 SiX 2 or relatively low polymerization degree polyvinylsilane, or the dehydration condensation of hydrolysis of relatively low polymerization degree polyvinylsilane, is the hydrolysis of the above prepolymer or the dehydration condensation of hydrolysis thereof. It can be carried out under the same conditions as , and it can be carried out separately or in a mixture at the same time. When mixed and carried out at the same time, as mentioned above, the hydrolysis and dehydration condensation of the polyvinylsilane itself and the dehydration condensation of the polymer and the jointing agent occur. The reaction between the prepolymer or its hydrolyzed and dehydrated condensate and the jointing agent is carried out in a suitable solvent in the presence of an acid or base at -5 to 100°C, preferably at 20°C.
Perform at ~70°C. This forms a high molecular weight polymer. At this time, the concentration of the solvent is 40% based on the final polymer in order to prevent the crosslinking reaction by completing the hydrolysis of the prepolymer and the intramolecular dehydration condensation of its partially dehydrated condensate. It is preferable to use an amount of 20% or less. The solvent is benzene,
Aromatic hydrocarbons such as toluene and xylene can be used. Next, in order to further advance the condensation polymerization of the low molecular weight Si compounds that have not yet reacted in the polymerization reaction and the dehydration condensation between the remaining silanol groups in the polymer, it is preferable to age the mixture. This aging is preferably carried out in an anhydrous solution state at 50 to 150°C, preferably 70 to 130°C, and the reaction time in this case can be 0.5 to 10 hours, preferably 1 to 5 hours. During this polymerization, two or more types of prepolymers having different average degrees of polymerization may be mixed and used. This makes it possible to widen the molecular weight distribution of the finally obtained polymer, thereby making the coating film less prone to cracking. A similar effect can be obtained when the above-mentioned low molecular weight prepolymer or the like is used as a joint agent. Solutions of polysiloxane polymers may have the problem of gelation during storage due to the amount and nature of residual hydroxyl groups present at both ends and in the middle of the siloxane chain of the polymer. well known. The polyvinylpolysiloxane polymer obtained as described above also has this problem. Therefore, as a terminal capping agent for residual hydroxyl groups, an appropriate amount of a compound represented by the general formula R 1 3 SiX or R 1 3 Si-Y-SiR 1 3 or its hydrolysis is added after forming the polyvinyl polysiloxane polymer. It is preferable to add this to silylate residual hydroxyl groups in the polymer and adjust the residual amount thereof. The above Y includes the general formula R 3 N< (where R 3 represents hydrogen, a hydrocarbon group having 1 to 4 carbon atoms, or an acyl group), and -O-. The silylation can be suitably carried out at 20 to 100°C, and no catalyst is particularly required. The amount of the residual hydroxyl group is preferably 0 to 0.1, preferably 0.001 to 0.02 in molar ratio to Si in the polymer. The polymer according to the present invention is easily soluble in aromatic hydrocarbon groups such as benzene and toluene. Next, SiO 2 was prepared using the present invention and the conventional CVD method.
Table 1 shows a comparison between the coating film (formation method) and the coating film (formation method) of condensed polyimide (PIQ).
【表】
実施例 1
(1) ビニル重合:
窒素置換された300ml3つ口フラスコにメチ
ル・ビニル・ビス(ジメチルアミノ)シラン
54gおよびn−ヘキサン90mlを入れ、窒素気流
中室温にて12mmolのn−ブチルリチウム触媒
をn−ヘキサン溶液の状態で添加し撹拌下に重
合を行なつた。室温で3時間重合反応を行なつ
たのちメタノールで処理しポリマーを沈殿させ
た。このポリマーをメタノールによる洗滌・
過を3〜4回繰り返し実施したのち真空乾燥し
た。得られたポリマーは10.3gで氷点降下法に
よる測定から重合度は9.5であつた。
(2) ポリシロキサン形成反応(ラダー化反応)及
び高分子化反応:
窒素置換された500ml3つ口フラスコに200ml
のトルエンおよび(1)で得られたポリマー10gを
入れ窒素気流中撹拌下に氷酢酸15.5mlを滴下し
室温で反応せしめた。1時間反応後ジメチル・
ジ・アセトキシシランの0.5gを添加し、ついで
水を1.1ml滴下し、室温で30分間撹拌下に反応
を行ないシロキサン結合を生成させた。生成ポ
リマー溶液にエーテルを加え、更に水を加えた
後水液ロートに移し水洗分離を3回繰り返し
た。有機層を分離し炭酸カリで一夜乾燥した。
炭酸カリを別した後、湯浴により加熱しエー
テルを留去した。残つた液を75℃〜85℃にて1
時間熱処理した後減圧下にトルエンを留去し、
溶液を濃縮した。
約10%のポリマー溶液になるまで濃縮した液
の一部を採取し、赤外吸収スペクトル分析、
SiOHの定量分析及び分子量測定を行なつた。
得られたポリマーの重量平均分子量はGPCに
より2.5×104であり、(1)で得られたプレポリマ
ーの数10倍の重合度を示した。また赤外吸収ス
ペクトル測定の結果3450cm-1にシラノール(Si
−OH)の吸収が見られた。この水酸基はG.E.
KELLUMらの方法Anal.Chem.39 1623(1967)
法による分析の結果OH/Siのモル比で0.17で
あつた。上記分析結果及びトルエンに対する溶
解性から、得られたポリマーはラダー構造を持
つたものと推定される。このポリマー溶液をシ
リコンウエフアーにスピン塗布し室温にて2日
間乾燥したが0.1μmの厚さにおいてもクラツク
は発生しなかつた。この溶液を1か月室温に放
置したところゲルの発生が認められた。
実施例 2
実施例1と全く同様にして、プレポリマーの合
成、ポリシロキサン形成・高分子化反応、炭酸カ
リを用いた乾燥、ポリマー溶液の10%濃度への濃
縮を行なつた。その後このポリマー溶液(トルエ
ン溶液)へヘキサメチルジシラザン
〔(CH3)3SiNHSi(CH3)3;以下HMDSと略記す
る。〕1gを添加し90℃で1時間反応させた。
得られたポリマーの残留水酸基については、
SiOHにもとずく3450cm-1の赤外吸収スペクトル
は殆ど見られず、定量分析(実施例1と同じ方
法)の結果からもOH/Siのモル比で0.001以下で
あつた。
実施例 3
(1) ビニル重合:
n−ブチルリチウム触媒の使用量を11mmol
および25mmolに変更した2種の重合を触媒量
以外の条件は実施例1と全く同様にして行なつ
た。得られたポリマーの重合度はそれぞれ10.5
および4.7であつた。
(2) ポリシロキサン形成・高分子化反応:
(1)で合成した重合度10.5のポリマー2.8gおよ
び重合度4.7のポリマー8.7gを使用し氷酢酸18
mlを実施例1と同様にして滴下し反応させた。
1時間反応後水を1.3ml滴下し室温で30分間加
水分解縮合を行わせた。得られた生成溶液を実
施例1と同様水洗、エーテル抽出により分離
し、乾燥した。得られたポリマーの重量平均分
子量はGPCにより5.1×104であつた。ポリマー
溶液を200mlまで濃縮し、これを2つに分け、
一方はそのまゝ、他方にはHMDS5mlを加え
130〜140℃で5時間還流下に反応させた。上記
2種のポリマー溶液サンプルを80℃にて減圧下
に濃縮し約10%溶液にした。
HMDSを添加する前のポリマーは赤外吸収
スペクトルから明らかにシラノールの吸収
(3450cm-1)が認められ、また、定量分析の結
果もOH/Siのモル比で0.12であつた。この溶
液は室温で保存したところ約1.5か月でゲル化
の生成が見られた。
一方HMDS添加のポリマーには赤外吸収ス
ペクトルから残留水酸基が殆ど消失しているこ
とが判明した。またこの溶液は室温で4か月放
置するもゲル化の発生は認められなかつた。
比較例
(1) ビニル重合:
実施例1と同様にして行なつた。
(2) ポリシロキサン形成(ラダー化)反応:
ジメチルジアセトキシシランを添加せずに実
施例1と同様にして行なつた。得られたポリマ
ーの平均重合度は氷点降下法で測定して10であ
つた。約5%のポリマー溶液が10日間の室温放
置でゲル化が認められ、またシリコンウエフア
にスピン塗布し乾燥したところ多数の亀裂発生
が認められた。
実施例 4
(1) ビニル重合:
メチルビニル・ジ−(n−プロポキシシラン
(bp.60℃/10mmHg)11.0gを窒素置換したフラ
スコに入れ、これに0.04gのアゾビスイソブチ
ロニトリルをラジカル重合開始剤として加え、
再び窒素ガスにて置換した後内容物を140〜150
℃のパス中に入れて重合反応を行なつた。2時
間後には全体が粘稠な液体となり、重合してい
るのが認められた。色の変化はなかつた。6時
間で重合を停止した。このようにして得られた
プレポリマーから未反応のモノマーを真空蒸留
によつて留去させた。9.5g(収率86%)のポリ
マーが得られた。
(2) ポリシロキサン形成・高分子化反応:
(1)で得られたポリマー9.0gに150mlのトルエ
ンおよび0.5gのジメチル・ジ−(n−プロポキ
シ)シランを加え、溶量300mlの三つ口フラス
コに移し、これに希塩酸1mlを含む100mlの水
を加えた後50℃で2時間撹拌下に加水分解反応
および縮合反応を行なわせた。反応液を水洗し
有機相を分離・乾燥した。このトルエン溶液に
0.5mlのヘキサメチルジシラザンを加え加熱還
流下に1時間反応した。得られたポリマー溶液
を100mlになるまでトルエンを留去し濃縮した。
この溶液の赤外吸収スペクトルからSiOH基
の存在は認められなかつた。溶液中のポリマー
は分析の結果、分子量4.8×104、濃度は12.6%
であつた。
実施例 5
メチル・ビニル・ジ−(n−プロポキシ)シラ
ンをメチル・ビニル−ジ−(アセトキシ)シラン
に代えた以外は実施例4と同様にラジカル重合を
行なつた。未反応モノマーを留去した後、分析の
結果ポリマー収量は8.9gであつた。このポリマー
8gとジメチル・ジアセトキシシラン0.2gを150ml
のベンゼンに溶解し300mlのフラスコ中で撹拌下
25℃で水1.0mlを滴下反応させた。エーテルを加
えた後水洗、分離を3回繰り返し、有機層を無水
炭酸カリにより一夜乾燥した。乾燥剤を分離しエ
ーテルを留去した後0.2mlのヘキサメチルジシラ
ザンを加え70℃で2時間反応した。その後ベンゼ
ンの一部を留去し、全量を約80mlまで濃縮した。
得られたポリマー溶液は濃度10%であり、ポリ
マーは分析の結果分子量3.5×104であつた。
実施例 6
(1) ビニル重合:
ビニル・メチル・ビス(ジエチルアミノ)シラ
ン80.4g、n−ヘキサン120mlおよび重合触媒とし
てn−ブチルリチウム溶液(15%)を10mlを使用
した以外は実施例1の(1)と同様に操作し、平均重
合度9.7のポリマー(A)を21.6gを得た。一方ビニ
ル・メチル・ビス(ジエチルアミノ)シラン
76.2g、n−ヘキサン120mlおよびn−ブチルリチ
ウム溶液20mlを使用し、上と同様の操作を行ない
重合度5.2のポリマー(B)を40.1gを得た。
(2) ポリシロキサン形成・高分子化反応:
窒素置換された1三つ口フラスコに400ml
のベンゼンおよび(1)で得られたポリマー(A)およ
び(B)をそれぞれ5.1gおよび18.0g入れ撹拌下25
℃にて氷酢酸36mlを滴下反応せしめた。30分間
反応した後ジ・メチル・ジアセトキシシランの
1gを添加混合する。ついで2.75mlの水を撹拌下
30℃で滴下反応せしめた。50分間反応を続けた
後エーテル300mlを加える。この溶液を分液ロ
ートに移し水洗・分離を3回繰り返した後有機
層を採取し無水炭酸カリで乾燥した。
(3) 安定化反応:
乾燥した有機層を湯浴上でエーテルを留去し
ついでベンゼンの1部を留去し溶液の全量を約
300mlになるまで濃縮した。この溶液に0.3mlの
ヘキサメチル・ジシラザンを加え還流下に1時
間反応せしめた後ベンゼンを留去し溶液全量を
60mlまで濃縮した。
(4) ポリマーの物性:
この溶液を分析した結果、ポリマー濃度は
15.6%、ポリマーの平均分子量は2.8×104であ
つた。TGA(Thermal Gravimetric
Analysis)による熱減量開始温度は286℃であ
り、毎分10℃の昇温速度で10%熱減量点が480
℃で耐熱性のよいことを示した。このポリマー
溶液を1000rpmのスピナーによりシリコンウエ
フアーに塗布し170℃30分間熱処理したところ
1.2μmの厚さで亀裂のない均一な塗膜が得られ
た。この塗膜の電気特性は、誘電率3.5、絶縁
耐圧250V/μmであつた。
実施例 7
実施例1,3及び比較例で得られたポリビニル
ポリシロキサンポリマーの15%溶液をシリコンウ
エフアーにスピン塗布し(回転数1000rpm)150
℃で30分間加熱処理した後膜の状態を調べた。結
果は次の表2のようであつた。[Table] Example 1 (1) Vinyl polymerization: Methyl vinyl bis(dimethylamino)silane was placed in a 300ml three-necked flask purged with nitrogen.
54 g of n-hexane and 90 ml of n-hexane were added, and 12 mmol of n-butyllithium catalyst was added in the form of an n-hexane solution at room temperature in a nitrogen stream, and polymerization was carried out with stirring. After carrying out the polymerization reaction at room temperature for 3 hours, the mixture was treated with methanol to precipitate the polymer. This polymer was washed with methanol and
After repeating the filtration 3 to 4 times, vacuum drying was performed. The obtained polymer weighed 10.3 g, and the degree of polymerization was 9.5 as determined by the freezing point depression method. (2) Polysiloxane formation reaction (ladder reaction) and polymerization reaction: 200ml in a 500ml three-necked flask purged with nitrogen.
Toluene and 10 g of the polymer obtained in (1) were added thereto, and 15.5 ml of glacial acetic acid was added dropwise under stirring in a nitrogen stream to react at room temperature. After 1 hour reaction, dimethyl
0.5 g of diacetoxysilane was added, then 1.1 ml of water was added dropwise, and the reaction was carried out with stirring at room temperature for 30 minutes to form a siloxane bond. After adding ether and further water to the resulting polymer solution, it was transferred to an aqueous funnel and water washing and separation was repeated three times. The organic layer was separated and dried over potassium carbonate overnight.
After separating the potassium carbonate, the mixture was heated in a hot water bath to distill off the ether. The remaining liquid was heated to 75°C to 85°C.
After heat treatment for an hour, toluene was distilled off under reduced pressure.
The solution was concentrated. A portion of the liquid was concentrated until it became an approximately 10% polymer solution, and was analyzed by infrared absorption spectroscopy.
Quantitative analysis and molecular weight measurement of SiOH were performed.
The weight average molecular weight of the obtained polymer was determined by GPC to be 2.5×10 4 , indicating a degree of polymerization several tens of times higher than that of the prepolymer obtained in (1). In addition, as a result of infrared absorption spectrum measurement, silanol (Si
-OH) absorption was observed. This hydroxyl group is GE
Method of KELLUM et al. Anal.Chem.39 1623 (1967)
As a result of analysis using the method, the OH/Si molar ratio was 0.17. From the above analysis results and solubility in toluene, it is presumed that the obtained polymer had a ladder structure. This polymer solution was spin-coated onto a silicon wafer and dried for two days at room temperature, but no cracks occurred even at a thickness of 0.1 μm. When this solution was left at room temperature for one month, gel formation was observed. Example 2 In exactly the same manner as in Example 1, synthesis of a prepolymer, polysiloxane formation/polymerization reaction, drying using potassium carbonate, and concentration of the polymer solution to a concentration of 10% were carried out. Thereafter, hexamethyldisilazane [(CH 3 ) 3 SiNHSi(CH 3 ) 3 ; hereinafter abbreviated as HMDS was added to this polymer solution (toluene solution). ]1 g was added and reacted at 90°C for 1 hour. Regarding the residual hydroxyl groups of the obtained polymer,
Almost no infrared absorption spectrum at 3450 cm -1 based on SiOH was observed, and the results of quantitative analysis (same method as in Example 1) showed that the OH/Si molar ratio was 0.001 or less. Example 3 (1) Vinyl polymerization: The amount of n-butyllithium catalyst used was 11 mmol.
Two types of polymerizations were carried out in exactly the same manner as in Example 1 except for the amount of catalyst. The degree of polymerization of the obtained polymers is 10.5, respectively.
and 4.7. (2) Polysiloxane formation/polymerization reaction: Using 2.8 g of the polymer with a polymerization degree of 10.5 synthesized in (1) and 8.7 g of the polymer with a polymerization degree of 4.7, glacial acetic acid 18
ml was added dropwise in the same manner as in Example 1 to cause a reaction.
After reacting for 1 hour, 1.3 ml of water was added dropwise to carry out hydrolytic condensation at room temperature for 30 minutes. The resulting product solution was separated by washing with water, extraction with ether, and dried in the same manner as in Example 1. The weight average molecular weight of the obtained polymer was found to be 5.1×10 4 by GPC. Concentrate the polymer solution to 200ml, divide it into two parts,
Leave one as is and add 5ml of HMDS to the other.
The reaction was carried out under reflux at 130-140°C for 5 hours. The above two types of polymer solution samples were concentrated under reduced pressure at 80°C to a solution of about 10%. The infrared absorption spectrum of the polymer before adding HMDS clearly showed silanol absorption (3450 cm -1 ), and quantitative analysis also showed that the OH/Si molar ratio was 0.12. When this solution was stored at room temperature, gelation was observed after about 1.5 months. On the other hand, it was found from the infrared absorption spectrum that almost all residual hydroxyl groups in the polymer added with HMDS disappeared. Further, even though this solution was left at room temperature for 4 months, no gelation was observed. Comparative Example (1) Vinyl polymerization: Conducted in the same manner as in Example 1. (2) Polysiloxane formation (laddering) reaction: The reaction was carried out in the same manner as in Example 1 without adding dimethyldiacetoxysilane. The average degree of polymerization of the obtained polymer was 10 as measured by the freezing point depression method. Approximately 5% polymer solution was observed to gel after being left at room temperature for 10 days, and numerous cracks were observed when it was spin-coated onto a silicon wafer and dried. Example 4 (1) Vinyl polymerization: 11.0 g of methylvinyl di-(n-propoxysilane (bp. 60°C/10 mmHg) was placed in a nitrogen-substituted flask, and 0.04 g of azobisisobutyronitrile was added to it as a radical. Added as a polymerization initiator,
After replacing with nitrogen gas again, reduce the contents to 140~150
The polymerization reaction was carried out by placing the tube in a ℃ temperature path. After 2 hours, the entire mixture became a viscous liquid, and it was observed that polymerization had occurred. There was no change in color. Polymerization was stopped after 6 hours. Unreacted monomers were distilled off from the prepolymer thus obtained by vacuum distillation. 9.5 g (86% yield) of polymer was obtained. (2) Polysiloxane formation/polymerization reaction: Add 150 ml of toluene and 0.5 g of dimethyl di-(n-propoxy)silane to 9.0 g of the polymer obtained in (1), and add 300 ml of 3-necked The mixture was transferred to a flask, and 100 ml of water containing 1 ml of dilute hydrochloric acid was added thereto, followed by a hydrolysis reaction and a condensation reaction at 50°C for 2 hours with stirring. The reaction solution was washed with water, and the organic phase was separated and dried. In this toluene solution
0.5 ml of hexamethyldisilazane was added and the mixture was reacted under heating under reflux for 1 hour. The obtained polymer solution was concentrated by distilling off toluene to 100 ml. The presence of SiOH groups was not recognized from the infrared absorption spectrum of this solution. Analysis of the polymer in the solution revealed a molecular weight of 4.8×10 4 and a concentration of 12.6%.
It was hot. Example 5 Radical polymerization was carried out in the same manner as in Example 4 except that methyl vinyl di-(n-propoxy) silane was replaced with methyl vinyl di-(acetoxy) silane. After distilling off unreacted monomers, analysis revealed that the yield of polymer was 8.9 g. This polymer
150ml of 8g and 0.2g of dimethyl diacetoxysilane
in benzene and stirred in a 300 ml flask.
1.0 ml of water was added dropwise to react at 25°C. After adding ether, washing with water and separating were repeated three times, and the organic layer was dried over anhydrous potassium carbonate overnight. After separating the desiccant and distilling off the ether, 0.2 ml of hexamethyldisilazane was added and reacted at 70°C for 2 hours. Thereafter, part of the benzene was distilled off, and the total volume was concentrated to about 80 ml. The concentration of the obtained polymer solution was 10%, and the polymer had a molecular weight of 3.5×10 4 as a result of analysis. Example 6 (1) Vinyl polymerization: The procedure of Example 1 ( The same procedure as in 1) was carried out to obtain 21.6 g of polymer (A) with an average degree of polymerization of 9.7. On the other hand, vinyl methyl bis(diethylamino)silane
Using 76.2 g, 120 ml of n-hexane, and 20 ml of n-butyllithium solution, the same operation as above was carried out to obtain 40.1 g of polymer (B) with a degree of polymerization of 5.2. (2) Polysiloxane formation/polymerization reaction: 400 ml in a three-neck flask purged with nitrogen.
Add benzene and 5.1 g and 18.0 g of polymers (A) and (B) obtained in (1), respectively, and stir for 25 minutes.
36 ml of glacial acetic acid was added dropwise to react at ℃. of dimethyl diacetoxysilane after reacting for 30 minutes.
Add 1g and mix. Then add 2.75ml of water while stirring.
A dropwise reaction was carried out at 30°C. After continuing the reaction for 50 minutes, add 300 ml of ether. This solution was transferred to a separatory funnel, washed with water and separated three times, and then the organic layer was collected and dried over anhydrous potassium carbonate. (3) Stabilization reaction: Distill the ether from the dried organic layer on a hot water bath, then distill off part of the benzene and reduce the total volume of the solution to approx.
It was concentrated to 300ml. 0.3 ml of hexamethyl disilazane was added to this solution and reacted for 1 hour under reflux, then the benzene was distilled off and the entire solution was diluted.
It was concentrated to 60ml. (4) Physical properties of polymer: As a result of analyzing this solution, the polymer concentration was
The average molecular weight of the polymer was 2.8×10 4 . TGA (Thermal Gravimetric)
The thermal loss starting temperature according to Analysis) is 286℃, and the 10% thermal loss point is 480℃ at a heating rate of 10℃ per minute.
It showed good heat resistance at ℃. This polymer solution was applied to a silicon wafer using a spinner at 1000 rpm and heat treated at 170°C for 30 minutes.
A uniform coating film with a thickness of 1.2 μm without cracks was obtained. The electrical properties of this coating film were a dielectric constant of 3.5 and a dielectric strength voltage of 250 V/μm. Example 7 A 15% solution of the polyvinylpolysiloxane polymer obtained in Examples 1, 3 and Comparative Example was spin-coated onto a silicon wafer (rotation speed: 1000 rpm) at 150 rpm.
After heat treatment at ℃ for 30 minutes, the state of the membrane was examined. The results were as shown in Table 2 below.
Claims (1)
水素基又は弗素置換炭化水素基、Xは加水分解性
の基で、同一分子内において同種であつても異種
であつてもよい。)で表わされるビニルシラン又
はそのビニル基における水素を弗素で置換した化
合物(以下、これらを「ビニルシラン」と総称す
る。)をビニル重合し、得られたビニル重合体を
酸又は塩基の存在下に加水分解脱水縮合すること
を包含する高重合度のポリビニルポリシロキサン
ポリマーの製造方法において、前記ビニル重合体
であつて重合度が7以上のもの(以下これを「プ
レポリマー」という。)ないしその加水分解脱水
縮合体(以下これを「プレポリマー等」という。)
を、一般式R1 2SiX2(ここにR1及びXは上記のもの
と同じ意味を表わし、これらは同一分子内におい
て同種であつても異種であつてもよい。)、重合度
6以下で前記プレポリマーの重合度よりも小さい
重合度の前記ビニルシランのビニル重合体並びに
それらの加水分解体及びそれらの加水分解脱水縮
合体から選ばれる少なくとも一種からなるジヨイ
ント剤の存在下に、脱水縮合重合し、必要に応じ
て残留シラノール基を、一般式R1 3SiX(ここにR1
及びXは前記と同じ意味を表わし、R1は同一分
子内において同種であつても異種であつてもよ
い。)、又は一般式R1 3Si−Y−SiR1 3(ここにYは二
価の加水分解性の基であり、R1は上記と同じ意
味を表わし、同一分子内で同種であつても異種で
あつてもよい。)で表わされる末端停止剤により
シリル化することを特徴とする前記高重合度ポリ
ビニルポリシロキサンポリマーの製造方法。 2 前記R1が炭素原子数1〜10の炭化水素又は
弗素置換炭化水素基であることを特徴とする第1
項記載の方法。 3 前記R1が炭素原子数1〜4の脂肪族炭化水
素基もしくは炭素原子数6〜9の芳香族炭化水素
基またはこれらの水素を弗素で置換したものであ
ることを特徴とする第1項記載の方法。 4 前記Xが−NR2 2、−OR2、−SR2、−OCOR2も
しくは−OSO3R2(ここにR2は炭素原子数1〜10
好ましくは1〜4の炭化水素基を表わす。)又は
Cl、BrもしくはIであることを特徴とする第1
項から第4項までのいずれかに記載の方法。 5 前記ビニル重合が、アニオン重合触媒又はラ
ジカル重合触媒を用いて行なうものであることを
特徴とする第1項から第4項までのいずれかに記
載の方法。 6 前記プレポリマー等とジヨイント剤の反応に
おいて、プレポリマー等1モルに対してジヨイン
ト剤0.8〜20モルを存在させることを特徴とする
第1項から第5項までのいずれかに記載の方法。 7 前記−Y−が、一般式R3N<(ここにR3は水
素又は炭素数1〜4の炭化水素基又はアシル基を
表わす。)又は−O−であることを特徴とする第
1項から第6項までのいずれかに記載の方法。 8 前記末端停止剤によるシリル化により前記残
留水酸基の量をポリマー中のSi原子に対してモル
比で0〜0.1とすることを特徴とする第1項から
第7項までのいずれかに記載の方法。 9 前記末端停止剤によるシリル化により前記残
留水酸基の量をポリマー中のSi原子に対してモル
比で0.001〜0.02とすることを特徴とする第1項
から第7項までのいずれかに記載の方法。[Claims] 1 General formula CH 2 =CH-SiR 1 X 2 (where R 1 is a hydrocarbon group or a fluorine-substituted hydrocarbon group, ) or a compound in which hydrogen in the vinyl group is replaced with fluorine (hereinafter collectively referred to as "vinyl silane"), and a vinyl polymer obtained by vinyl polymerization. In the method for producing a polyvinyl polysiloxane polymer with a high degree of polymerization, which includes hydrolysis dehydration condensation of (hereinafter referred to as "prepolymers, etc.") or their hydrolyzed and dehydrated condensates (hereinafter referred to as "prepolymers, etc.")
, the general formula R 1 2 SiX 2 (here, R 1 and dehydration condensation polymerization in the presence of a jointing agent consisting of at least one member selected from a vinyl polymer of the vinylsilane having a polymerization degree lower than that of the prepolymer, hydrolysis thereof, and hydrolysis dehydration condensation products thereof. and, if necessary, replace residual silanol groups with the general formula R 1 3 SiX (where R 1
and X represent the same meanings as above, and R 1 may be the same or different in the same molecule. ), or the general formula R 1 3 Si-Y-SiR 1 3 (where Y is a divalent hydrolyzable group, R 1 represents the same meaning as above, and even if they are the same in the same molecule, A method for producing a highly polymerized polyvinylpolysiloxane polymer, characterized in that silylation is carried out using a terminal capping agent represented by the following. 2. The first, wherein R 1 is a hydrocarbon group having 1 to 10 carbon atoms or a fluorine-substituted hydrocarbon group.
The method described in section. 3 Item 1, wherein R 1 is an aliphatic hydrocarbon group having 1 to 4 carbon atoms, an aromatic hydrocarbon group having 6 to 9 carbon atoms, or a group in which hydrogen thereof is replaced with fluorine. Method described. 4 The above - mentioned _ _ _
Preferably it represents 1 to 4 hydrocarbon groups. ) or
The first, characterized in that it is Cl, Br or I.
The method described in any one of paragraphs to paragraphs 4 to 4. 5. The method according to any one of items 1 to 4, wherein the vinyl polymerization is carried out using an anionic polymerization catalyst or a radical polymerization catalyst. 6. The method according to any one of Items 1 to 5, characterized in that in the reaction between the prepolymer and the like and the joint agent, 0.8 to 20 moles of the joint agent are present per 1 mole of the prepolymer. 7. The first compound characterized in that -Y- has the general formula R 3 N< (where R 3 represents hydrogen, a hydrocarbon group having 1 to 4 carbon atoms, or an acyl group) or -O-. The method described in any of paragraphs 6 to 6. 8. The method according to any one of items 1 to 7, wherein the amount of the residual hydroxyl group is set to a molar ratio of 0 to 0.1 with respect to Si atoms in the polymer by silylation with the terminal capping agent. Method. 9. The method according to any one of items 1 to 7, wherein the amount of the residual hydroxyl group is set to a molar ratio of 0.001 to 0.02 with respect to Si atoms in the polymer by silylation with the terminal capping agent. Method.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP15597383A JPS6049002A (en) | 1983-08-26 | 1983-08-26 | Preparation of polyvinylpolysiloxane polymer |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP15597383A JPS6049002A (en) | 1983-08-26 | 1983-08-26 | Preparation of polyvinylpolysiloxane polymer |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS6049002A JPS6049002A (en) | 1985-03-18 |
| JPH039932B2 true JPH039932B2 (en) | 1991-02-12 |
Family
ID=15617575
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP15597383A Granted JPS6049002A (en) | 1983-08-26 | 1983-08-26 | Preparation of polyvinylpolysiloxane polymer |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS6049002A (en) |
-
1983
- 1983-08-26 JP JP15597383A patent/JPS6049002A/en active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS6049002A (en) | 1985-03-18 |
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