Deprecated: The each() function is deprecated. This message will be suppressed on further calls in /home/zhenxiangba/zhenxiangba.com/public_html/phproxy-improved-master/index.php on line 456
JPH0414158B2 - - Google Patents
[go: Go Back, main page]

JPH0414158B2 - - Google Patents

Info

Publication number
JPH0414158B2
JPH0414158B2 JP58094589A JP9458983A JPH0414158B2 JP H0414158 B2 JPH0414158 B2 JP H0414158B2 JP 58094589 A JP58094589 A JP 58094589A JP 9458983 A JP9458983 A JP 9458983A JP H0414158 B2 JPH0414158 B2 JP H0414158B2
Authority
JP
Japan
Prior art keywords
gas
odorant
tank
pipe
bypass pipe
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP58094589A
Other languages
Japanese (ja)
Other versions
JPS59219392A (en
Inventor
Masao Seki
Yoshihiro Yamamoto
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
TOKYO GASU ENJINIARINGU KK
Original Assignee
TOKYO GASU ENJINIARINGU KK
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by TOKYO GASU ENJINIARINGU KK filed Critical TOKYO GASU ENJINIARINGU KK
Priority to JP9458983A priority Critical patent/JPS59219392A/en
Publication of JPS59219392A publication Critical patent/JPS59219392A/en
Publication of JPH0414158B2 publication Critical patent/JPH0414158B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Sampling And Sample Adjustment (AREA)
  • Treating Waste Gases (AREA)

Description

【発明の詳細な説明】 〔本発明の属する技術分野〕 本発明は、ガスに対する付臭方法及びその装置
に関するもので、詳しくは、都市ガスなどに於い
て、生ガスの漏洩を早期に発見して処理するため
に、安全対策上供給ガスに対してバイパス方式に
より付臭する方法及びその装置に関するものであ
る。
[Detailed Description of the Invention] [Technical field to which the present invention pertains] The present invention relates to a method and apparatus for adding odor to gas, and more specifically, to a method for odorizing gas and an apparatus for the same. This invention relates to a method and an apparatus for adding odor to supplied gas by a bypass method for safety reasons.

〔従来の技術〕[Conventional technology]

第1図は従来におけるバイパス方式に基づく付
臭装置を示し、ガス導管01に絞り機構02をバ
イパスするバイパス管03を取り付けると共にこ
のバイパス管03内に付臭剤槽04を取り付け、
バイパス管03を通過するガスに付臭剤を蒸発さ
せて飽和させるものである。
FIG. 1 shows a conventional odorization device based on a bypass system, in which a bypass pipe 03 that bypasses a throttle mechanism 02 is attached to a gas conduit 01, and an odorant tank 04 is attached inside this bypass pipe 03.
The odorizing agent is evaporated and saturated in the gas passing through the bypass pipe 03.

〔従来技術の問題点〕[Problems with conventional technology]

従来のバイパス式付臭方法(装置)は以上の如
き構成のため、バイパス管内を通過するガスの温
度及び圧力変動があると、付臭濃度が変化する欠
点を有している。そこで、従来はバイパス管03
内に手動バルブ05を取り付けておき、この手動
バルブ05を経験と勘に頼つて操作しながらバイ
パス管03内を通過するガス量を変化させて濃度
が規定の範囲内に収まるように調整している。
Since the conventional bypass type odorization method (device) has the above-described configuration, it has a drawback that the odor concentration changes when there are fluctuations in the temperature and pressure of the gas passing through the bypass pipe. Therefore, in the past, bypass pipe 03
A manual valve 05 is installed inside the bypass pipe 03, and while operating the manual valve 05 relying on experience and intuition, the amount of gas passing through the bypass pipe 03 is adjusted so that the concentration falls within a specified range. There is.

しかし、上記の方法では、経験者でないと調整
出来ないことと、温度変化や圧力変化が大きい設
備ではバルブの操作が頻繁となり、現実的な対応
が不可能である。そこで、他の付臭装置に比し多
くの利点を有する前記従来方式ではあるが、採用
は見送られている。
However, with the above method, only an experienced person can make adjustments, and in equipment where temperature and pressure changes are large, the valves must be operated frequently, making it impossible to handle them realistically. Therefore, although the conventional method has many advantages over other odorizers, its adoption has been postponed.

〔本発明の目的〕[Object of the present invention]

本発明は叙上の如き点から、バイパス管内を通
過する圧力及び温度変化があつても付臭濃度が変
化しない付臭方法及びこの方法に使用される付臭
装置を提案するのが目的である。
In view of the above points, the present invention aims to propose an odor adding method in which the odor concentration does not change even if there are changes in pressure and temperature passing through the bypass pipe, and an odor adding device used in this method. .

〔本発明の構成〕[Configuration of the present invention]

本発明は上記目的を達成するために、バイパス
管(ライン)内を通過するガスの圧力と温度とを
検出し、この検出値に基づいて次の式により演算
を行い、補正値を求め、この補正値に基づいてバ
イパス管内に取り付けた流量制御弁を自動制御し
て流量制御を行ないながら付臭濃度を一定に維持
するものである。
In order to achieve the above object, the present invention detects the pressure and temperature of the gas passing through the bypass pipe (line), calculates the following equation based on the detected values, calculates the correction value, and calculates the correction value. The odor concentration is maintained constant while controlling the flow rate by automatically controlling the flow rate control valve installed in the bypass pipe based on the correction value.

先ず、第2図に於いて、ガス導管1内を通過す
るガスの流量をV1(Nm3/h)となし、バイパス
管2内を通過するガスの流量をV2(Nm3/h)と
するとき、バイパス流路の流量調節弁以外の流体
抵抗はほとんど無視できるものとして、 ● 分流比 V1/V2=CV2/CV1 …… (∵圧損ΔPが共通) CV1…メインガス導管ノズルの容量係数 CV2…バイパス管の流量制御弁の容量係数 ● 付臭剤バランス 蒸発量FT(g/h)、滴下率α(g/Nm3)、A
点の揮発量γ(g/Nm3) FT=α・(V1+V2)=V2・γ V2/V1+V2≒V2/V1=α/γ …… (∵V1≫V2) ● ガス圧力とA点の揮発量の関係 ガス圧力P1(Kg/cm2abs)、付臭剤飽和蒸気圧PD
(mmH2O)、付臭剤の種類により定まる定数K γ=PD/P1−PD×10-4×K ≒K・Pn/P1・PD …… (∵P1≫PD) ● 付臭剤の飽和蒸気圧特性 ガス温度t(℃) PD=(t1) …… 〜式より V2/V1=CV2/CV1=α/γ=α・P1/K・(t1)・Pn
…… 式より CV2α・CV1/K・P1/Pn・1/(t1)…… となる。
First, in Fig. 2, the flow rate of gas passing through the gas conduit 1 is assumed to be V 1 (Nm 3 /h), and the flow rate of gas passing through the bypass pipe 2 is assumed to be V 2 (Nm 3 /h). Assuming that the fluid resistance other than the flow control valve in the bypass flow path can be almost ignored, ● Dividing ratio V 1 /V 2 = CV 2 /CV 1 ... (∵Pressure drop ΔP is common) CV 1 ...Main gas Capacity coefficient of conduit nozzle CV 2 ... Capacity coefficient of bypass pipe flow control valve● Odorant balance Evaporation amount F T (g/h), dripping rate α (g/Nm 3 ), A
Volatilization amount γ at a point (g/Nm 3 ) F T =α・(V 1 +V 2 )=V 2・γ V 2 /V 1 +V 2 ≒V 2 /V 1 = α/γ ... (∵V 1 ≫V 2 ) ● Relationship between gas pressure and volatilization amount at point A Gas pressure P 1 (Kg/cm 2 abs), Odorant saturated vapor pressure P D
(mmH 2 O), constant K determined by the type of odorant γ=P D /P 1 −P D ×10 -4 ×K ≒K・Pn/P 1・P D …… (∵P 1 ≫P D ) ● Saturated vapor pressure characteristics of odorant Gas temperature t (°C) P D = (t 1 ) ... From the formula, V 2 /V 1 = CV 2 /CV 1 = α / γ = α・P 1 /K・(t 1 )・Pn
... From the formula, CV 2 α・CV 1 /K・P 1 /Pn・1/(t 1 )...

以上の演算から、バイパス管2に取り付けたリ
ニアル特性を有する制御弁3の制御値(CV)を
圧力・温度の関数としての上式のように特性化す
ると、定量性の高い、付臭が可能となる。
From the above calculations, if the control value (CV) of the control valve 3 with linear characteristics attached to the bypass pipe 2 is characterized as a function of pressure and temperature as shown in the above equation, highly quantitative odor addition is possible. becomes.

なお、第2図に於いて、4は演算器、5はこの
演算器4と制御弁3を結ぶ信号線、6は付臭装
置、7は圧力検出点、8は温度検出器、9,10
は信号線、11は温度変換器である。
In Fig. 2, 4 is a computing unit, 5 is a signal line connecting this computing unit 4 and the control valve 3, 6 is an odorizer, 7 is a pressure detection point, 8 is a temperature detector, 9, 10
is a signal line, and 11 is a temperature converter.

第3図は上記符号6で示した付臭装置を示し、
付臭剤槽6内にパイプ12を垂直に装入し、この
パイプ12の一部にガス導管1からガス13を導
入してパイプ12内に送入し、バブルポンプ方式
により付臭剤槽6内の付臭剤を槽内上部に導いて
バイパス管2から槽内に入つたガスに蒸発させて
飽和させる構成である。
FIG. 3 shows the odorizing device indicated by the reference numeral 6,
A pipe 12 is inserted vertically into the odorant tank 6, and gas 13 is introduced from the gas conduit 1 into a part of the pipe 12 and fed into the pipe 12, and the odorant tank 6 is filled using a bubble pump method. The odorant inside the tank is guided to the upper part of the tank and evaporated into the gas that enters the tank from the bypass pipe 2 to saturate it.

第4図は付臭装置の他の実施例を示し、付臭剤
槽6内に仕切板14をたて方向にずらして装入す
ることにより蛇行流路15を形成し、この蛇行流
路15内においてバイパス管2から槽内に入つた
ガスに付臭剤を蒸発させて飽和させる構成であ
る。なお、仕切板14の両面に付臭液と新和性の
高い繊維等の多孔質材料を添付すればガスと付臭
液との接触面積が拡大し、高流量域まで飽和状態
が維持でき、本装置の適用範囲の拡大が図れる。
FIG. 4 shows another embodiment of the odorizer, in which a meandering channel 15 is formed by inserting the partition plate 14 into the odorant tank 6 while shifting it in the vertical direction. The structure is such that the odorant is evaporated and saturated in the gas that enters the tank from the bypass pipe 2. In addition, if porous materials such as fibers that are highly compatible with the odorizing liquid are attached to both sides of the partition plate 14, the contact area between the gas and the odorizing liquid can be expanded, and the saturated state can be maintained up to a high flow rate range. The scope of application of this device can be expanded.

第5図は付臭装置の他の実施例を示し、付臭剤
槽6の天蓋中心に対して上方からガス送入パイプ
16を挿入し、槽内のフロート17により液面よ
りやや離れた位置に浮上させた傘状噴出体18の
ガス入口19を前記ガス送入パイプ16内に上下
動自在に挿入し、液面の変動に常に追従させなが
ら安定した付臭剤の蒸発と飽和を図る構成であ
る。20は傘状噴出体18の周囲に形成した多脚
状のスカートにして、ガスと付臭液との接触の促
進を図るものである。
FIG. 5 shows another embodiment of the odorizer, in which a gas feed pipe 16 is inserted from above into the center of the canopy of the odorizer tank 6, and a float 17 in the tank is used to position it slightly away from the liquid level. The gas inlet 19 of the umbrella-shaped ejection body 18 floated in the air is inserted into the gas supply pipe 16 so as to be able to move up and down, and the odorant is stably evaporated and saturated while constantly following fluctuations in the liquid level. It is. Numeral 20 is a multi-legged skirt formed around the umbrella-shaped ejector 18 to promote contact between the gas and the odorized liquid.

〔本発明の効果〕[Effects of the present invention]

本発明は以上のように、ガス圧に変動があつた
場合及びガスに温度変化が生じ、この結果飽和蒸
気圧に変動があつた場合に、これを検出し、この
検出値から補正値を演算することによりバイパス
管2内を通過するガス量を制御して、付臭濃度の
安定化を図るので、付臭濃度の変化に基づくトラ
ブルの発生は防止できる。
As described above, the present invention detects when there is a change in gas pressure or when a temperature change occurs in the gas, resulting in a change in saturated vapor pressure, and calculates a correction value from this detected value. By doing so, the amount of gas passing through the bypass pipe 2 is controlled and the odor concentration is stabilized, so troubles due to changes in the odor concentration can be prevented from occurring.

次に、付臭装置として、第3図に示すようなバ
ブルポンプ方式、第4図に示すような流路蛇行方
式、第5図に示すようなフロート方式を採用する
ことにより、高流量域まで付臭液の飽和状態が保
障される。
Next, by adopting the bubble pump method as shown in Fig. 3, the meandering flow path method as shown in Fig. 4, and the float method as shown in Fig. 5 as the odorization device, it is possible to reach a high flow rate range. The saturated state of the odorizing liquid is guaranteed.

【図面の簡単な説明】[Brief explanation of drawings]

第1図は従来のバイパス式付臭装置の説明図、
第2図は本発明に係る付臭方法及びその装置を示
す一実施例図、第3図イ,ロはバブルポンプ方式
を採用した付臭装置の断面図、第4図イ,ロは蛇
行流路方式を採用した付臭装置の断面図、第5図
イ,ロ,ハはフロート方式を採用した付臭装置の
断面図である。 1……ガス導管、2……バイパス管、3……流
量制御弁、4……演算器、6……付臭装置。
Figure 1 is an explanatory diagram of a conventional bypass type odorizer.
Fig. 2 is an embodiment of the odorization method and device according to the present invention, Fig. 3 A and B are cross-sectional views of an odorization device employing a bubble pump system, and Fig. 4 A and B are serpentine flow diagrams. FIGS. 5A, 5B, and 5C are cross-sectional views of an odorizer that uses a float method. DESCRIPTION OF SYMBOLS 1... Gas conduit, 2... Bypass pipe, 3... Flow rate control valve, 4... Arithmetic unit, 6... Odorization device.

Claims (1)

【特許請求の範囲】 1 ガス導管に対してバイパス管を取り付けると
共にこのバイパス管の一部に付臭剤槽を取り付
け、バイパス管内を通過するガスに付臭剤を蒸発
させて飽和させるガスに対する付臭方法におい
て、付臭剤槽内の圧力と槽内出側又は出口近傍の
温度とを検出し、これら二つの変動値から補正値
を演算してバイパス管内を通過するガスの流量を
調整するガスに対する付臭方法。 2 付臭剤槽内にパイプを垂直に装入し、このパ
イプ内にガス導管内のガスの一部を送入し、付臭
剤を槽内上部に導いて拡散し、蒸発させるように
構成した付臭装置。 3 付臭剤槽内たて方向に仕切板をずらして装入
することにより蛇行流路を形成し、バイパス管内
のガスをこの蛇行流路を介して通過させることに
より付臭剤を蒸発させるように構成した付臭装
置。 4 付臭剤槽の天蓋中心に対して上方からガス送
入パイプを取り付け、下位にフロートを取り付け
た傘状噴出体のガス入口を前記ガス送入パイプ内
に上下動自在に挿入し、ガスの噴出口を液面に近
づけて付臭剤の蒸発を行うように構成した付臭剤
装置。
[Claims] 1. A bypass pipe is attached to the gas conduit, and an odorant tank is attached to a part of the bypass pipe, and an odorant is evaporated into the gas passing through the bypass pipe to saturate the gas. In the odor method, the pressure in the odorant tank and the temperature on the outlet side or near the outlet of the tank are detected, and a correction value is calculated from these two fluctuation values to adjust the flow rate of gas passing through the bypass pipe. How to add odor to. 2 A pipe is inserted vertically into the odorant tank, and a part of the gas in the gas pipe is fed into this pipe, and the odorant is guided to the upper part of the tank, where it is diffused and evaporated. odor-adding device. 3 A meandering flow path is formed by shifting the partition plate in the vertical direction of the odorant tank and evaporating the odorant by passing the gas in the bypass pipe through this meandering flow path. An odor-adding device configured as follows. 4. Attach a gas supply pipe from above to the center of the canopy of the odorant tank, insert the gas inlet of the umbrella-shaped ejector with a float attached to the lower part into the gas supply pipe so that it can move up and down, and then An odorant device configured to evaporate the odorant by bringing the spout close to the liquid surface.
JP9458983A 1983-05-27 1983-05-27 Odorization of gas and device for it Granted JPS59219392A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP9458983A JPS59219392A (en) 1983-05-27 1983-05-27 Odorization of gas and device for it

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP9458983A JPS59219392A (en) 1983-05-27 1983-05-27 Odorization of gas and device for it

Publications (2)

Publication Number Publication Date
JPS59219392A JPS59219392A (en) 1984-12-10
JPH0414158B2 true JPH0414158B2 (en) 1992-03-11

Family

ID=14114459

Family Applications (1)

Application Number Title Priority Date Filing Date
JP9458983A Granted JPS59219392A (en) 1983-05-27 1983-05-27 Odorization of gas and device for it

Country Status (1)

Country Link
JP (1) JPS59219392A (en)

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
UA58154A (en) * 2002-10-14 2003-07-15 Приватне Підприємство Фірма "Техкон" Gas odorizer
JP5055883B2 (en) 2005-09-07 2012-10-24 トヨタ自動車株式会社 Hydrogen supply device
JP4859729B2 (en) * 2007-03-30 2012-01-25 三井造船株式会社 Odoring device
JP4905235B2 (en) 2007-04-19 2012-03-28 トヨタ自動車株式会社 Odorant addition device, fuel gas supply system
JP5164917B2 (en) * 2009-04-28 2013-03-21 エスペック株式会社 Test method, organic gas supply device and test device
JP5164916B2 (en) * 2009-04-28 2013-03-21 エスペック株式会社 Test method and test apparatus
DE102014019463A1 (en) * 2014-12-23 2016-06-23 Linde Aktiengesellschaft Method and Odorierungsmittelspeicher for odorizing a Nutzgases, especially natural gas

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5281303A (en) * 1975-12-27 1977-07-07 Osaka Gas Co Ltd Apparatus for odorizing gas
JPS5299362A (en) * 1976-02-16 1977-08-20 Omron Tateisi Electronics Co Group control of weaving machine
JPS52132355A (en) * 1976-04-28 1977-11-07 Tokyo Electric Power Co Inc:The Setting system for protective relay

Also Published As

Publication number Publication date
JPS59219392A (en) 1984-12-10

Similar Documents

Publication Publication Date Title
US3974847A (en) Liquid additive dispenser
US5254292A (en) Device for regulating and reducing the fluctuations in a polyphasic flow, and its use
US4321796A (en) Apparatus for evaporating ordinary temperature liquefied gases
CA2524909A1 (en) Dew point humidifier and related gas temperature control
JPH0414158B2 (en)
SU1827006A3 (en) Well production rate measuring unit
US3583685A (en) Method and apparatus for controlling quantity of a vapor in a gas
CA2217103A1 (en) Humidifying system with a level control system for the liquid that is to be evaporated
US5968421A (en) Process to enrich a gas in a liquid
JPH0892780A (en) Water electrolysis gas generator
US4493635A (en) Oxygen-enriched air ratio control device for combustion apparatus
US4337619A (en) Hot water system
US2128176A (en) Apparatus for maintaining selected differential values
JPS63236530A (en) Device for injecting substances with low vapor pressure into low pressure or vacuum systems
US2175526A (en) Apparatus for introducing an odorant fluid into a gas line
JP2001235417A (en) Pore size distribution measuring instrument
JPS57104664A (en) Gasification method for liquid source
JPS55142199A (en) Device for evaporating liquefied gas by air heat
JPH0634421A (en) Level gauge for evaporating and concentrating device
US4398503A (en) Method and apparatus for metering a feed of hydrogen fluoride vapor
SU1125031A1 (en) Gas bubbling odorizer
JPH03232503A (en) Device for separating gas from liquid
JP4734904B2 (en) Humidifier
JPS562500A (en) Supplier of constant flow rate
GB933286A (en) Improvements in and relating to electro-precipitation