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JPH0414674B2 - - Google Patents
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JPH0414674B2 - - Google Patents

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Publication number
JPH0414674B2
JPH0414674B2 JP5467684A JP5467684A JPH0414674B2 JP H0414674 B2 JPH0414674 B2 JP H0414674B2 JP 5467684 A JP5467684 A JP 5467684A JP 5467684 A JP5467684 A JP 5467684A JP H0414674 B2 JPH0414674 B2 JP H0414674B2
Authority
JP
Japan
Prior art keywords
compound
dioxolane
methyl
acetonyl
benzene
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP5467684A
Other languages
Japanese (ja)
Other versions
JPS60197670A (en
Inventor
Akira Nagata
Atsushi Iyoda
Reikichi Iwamoto
Masaru Mya
Koji Oota
Kingo Uchida
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
National Institute of Advanced Industrial Science and Technology AIST
Original Assignee
Agency of Industrial Science and Technology
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Agency of Industrial Science and Technology filed Critical Agency of Industrial Science and Technology
Priority to JP5467684A priority Critical patent/JPS60197670A/en
Publication of JPS60197670A publication Critical patent/JPS60197670A/en
Publication of JPH0414674B2 publication Critical patent/JPH0414674B2/ja
Granted legal-status Critical Current

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Description

【発明の詳細な説明】[Detailed description of the invention]

本発明は新規1,3−ジオキソラン誘導体化合
物に関する。 従来、ポリメタクリル酸メチル(以下、
PMMAと略記する)は、優れた透明性のために、
プラスチツク光学レンズやプラスチツク光フアイ
バーなどの光路媒体材料として有望視され、現に
利用されているが、物性の改善、特に耐熱性の改
善が大きな要請となつていた。 そして耐熱性の改善には、(イ)素材PMMAの分
子量を大きくする方法、(ロ)耐熱性モノマーなどと
の共重合によつて素材PMMAの耐熱性を向上す
る方法、および(ハ)成形後に三次元架橋構造を形成
させる方法などが検討されていた。 ところで、PMMAは線状高分子で熱可塑性で
あることを利用して、通常、量産性の点で優位な
射出成形法などの溶融成形法により成形されてい
る。 これらの成形法では、PMMAの加熱時の流動
特性が生産性に大きく影響し、前記(イ)および(ロ)の
方法では、この流動特性を低下させることになる
ので、耐熱性向上には限界があつた。 特に光路媒体材料では、流動特性の低下は成形
材料の光学的性質に大きく影響し、光学的性質を
低下させる欠点があつた。 また上記(ハ)の方法、すなわちPMMAに架橋構
造を付与して三次元構造とする方法としては、ハ
ードコンタクトレンズのように、切削、研摩等、
機械加工上の要請からグリコールジメタクリレー
トを用いて注型重合する方法が知られているが、
注型重合法による成型は、熱による重合および架
橋であり、熱硬化性樹脂成形品程度の生産性しか
期待できず、量産性では射出成形法等の溶融成形
にはるかに及ばない欠点があつた。 一方、下記一般式で示される1,3−ジオキソ
ラン誘導体(式中、R1=HまたはCH3,R2
CH3,C2H3 n−C3H7のアルキル基またはフエニル基であ
る)は、単独で紫外線照射により重合、架橋して
不溶化すること、またR2=CH3のものはメタク
リル酸エステル等と共重合でき、共重合体は紫外
線照射により架橋して不溶化することが知られて
いる。 しかしながら、これらに用いる光照射の波長は
300nmより短いことが要求されるので、共重合
体のメタクリル酸エステル成分の劣化を伴い、ま
た通常、有色の増感剤を必要とするので、着色を
きらう場合には使用できない問題があつた。 そこで本発明は、かかる従来の欠点を解消すべ
くなされたものであり、1,3−ジオキソランの
新規誘導体化合物を見出し、かかる化合物はメチ
ルメタクリレート等と共重合することができ、共
重合体は溶融成形が可能であるばかりか、300n
m付近の紫外線照射によつて可視域に吸収を持た
ない架橋体を与え、かかる架橋体は光学レンズな
どの無色透明材料として好適である等の特長を有
するものである。 すなわち本発明の新規1,3−ジオキソラン誘
導体化合物は、下記一般式で示されるものであ
る。 ただし式中、n=1のときRは水素原子または
メチル基であり、n=2のときRはメチル基であ
る。 本発明の新規1,3−ジオキソラン誘導体化合
物としては、たとえば下記化合物番号の化合物を
あげることができる。 (2−メチル−2−アセトニル−1,3−ジオ
キソラン−4−イル)メチルアクリレート (2−メチル−2−アセトニル−1,3−ジオ
キソラン−4−イル)メチルメタクリレート 〔2−メチル−2−(β−アセチルエチル)−
1,3−ジオキソラン−4−イル〕メチルメタク
リレート かかる本発明の新規1,3−ジオキソラン誘導
体化合物は下記製造方法1または2により製造す
ることができる。 製造方法1 ただし、R=HまたはCH3、n=1または2で
ある。 反応は、ジケトン化合物(B)を溶媒を兼ねてエポ
キシ化合物(A)に対してモル比で数倍〜10倍以上の
大過剰に用い、リン酸触媒の存在下でアセタール
化することにより行なわれる。反応は通常、60
℃、1時間程で良く、NaOH水でリン酸を中和
した後に有機層を精留すると、1,3−ジオキソ
ラン誘導体化合物(C)が得られる。化合物(C)の収率
は20〜40%である。 NaOH量は、使用したリン酸に対する当量を
わずかに上まわる程度が好適であり、過剰に使用
するとジケトンのエノールナトリウム塩が生成し
て析出するので操作上不利である。精留により回
収した化合物(B)は再使用することができる。な
お、化合物(B)として、CH3COの代りにC2H5CO,
C6H5CO等を有する化合物を用いれば、これら置
換基を有する化合物(C)を得ることができる。 製造方法2 ただし、R=HまたはCH3、M=KまたはNa
等のアルカリ金属、X=ClまたはBr、n=1ま
たは2である。 反応は、アクリル酸またはメタクリル酸のアル
カリ金属塩(D)と1,3−ジオキソランハロゲン化
物(E)を、ジメチルスルホキシド中で加熱、撹拌す
ることにより行なわれる。目的とする1,3−ジ
オキソラン誘導体化合物(C)の収率は40〜65%であ
る。なお、製造方法1と同様に、化合物(E)の
CH3COの代りに、C2H5CO,C6H5CO等の置換基
を有する化合物を用いることができる。 ここで化合物(E)は、下記(a)または(b)の方法によ
り製造することができる。 ただし、(a),(b)法においてXおよびnは前記同
様であり、またCH3COの代りにC2H5CO,
C6H5CO等の置換基を有する化合物を用いること
もできる。 (a)法は製造方法1と同様にジケトン化合物(B)を
ハロゲン化物(F)に対して大過剰に用い、リン酸触
媒存在下にアセタール化し、NaOH水で処理す
ることにより行なわれる。 1,3−ジオキソランハロゲン化物(E)の収率は
20〜40%である。 (b)法においては、α,β−ジオール化合物(G)と
ジケトン化合物(B)をp−トルエンスルホン酸等の
酸触媒の存在下に脱水反応させると、1,3−ジ
オキソランハロゲン化物(E)が得られる。 反応はジケトン化合物(B)を大過剰に作用させる
ことにより行なわれ、脱水反応であるため、ベン
ゼン等の水と共沸する溶媒を加えて還流させ、水
を系外に除去する。新たに水を生成しなくなつた
ところで、反応液をNa2CO3または酢酸ナトリウ
ム等で酸触媒を中和し、次いでベンゼン、過剰の
ジケトン化合物を留去、回収し、残液をNaOH
水で処理して副生成物を除去した後に精留する
と、1,3−ジオキソランハロゲン化物(E)が得ら
れる。収率は20〜30%である。 以上の製造方法により得られた本発明の1,3
−ジオキソラン誘導体化合物はいづれも新規化合
物であり、元素分析およびNMRにより同定し
た。 これら化合物の特性を下記第1表に示す。
The present invention relates to novel 1,3-dioxolane derivative compounds. Conventionally, polymethyl methacrylate (hereinafter referred to as
(abbreviated as PMMA) due to its excellent transparency.
Although it is seen as a promising optical path medium material for plastic optical lenses and plastic optical fibers, and is currently in use, there has been a great need for improvements in its physical properties, particularly in its heat resistance. The heat resistance can be improved by (a) increasing the molecular weight of the material PMMA, (b) improving the heat resistance of the material PMMA by copolymerizing it with heat-resistant monomers, and (c) after molding. Methods for forming three-dimensional crosslinked structures were being considered. By the way, since PMMA is a linear polymer and thermoplastic, it is usually molded by melt molding methods such as injection molding methods, which are advantageous in terms of mass production. In these molding methods, the flow characteristics of PMMA during heating greatly affect productivity, and methods (a) and (b) above reduce these flow characteristics, so there is a limit to improving heat resistance. It was hot. Particularly in the case of optical path medium materials, a decrease in flow characteristics greatly affects the optical properties of the molding material, which has the disadvantage of deteriorating the optical properties. In addition, the method (c) above, that is, the method of imparting a crosslinked structure to PMMA to form a three-dimensional structure, involves cutting, polishing, etc., as in the case of hard contact lenses.
Due to machining requirements, cast polymerization using glycol dimethacrylate is known, but
Molding by cast polymerization involves thermal polymerization and crosslinking, and can only be expected to have productivity comparable to that of thermosetting resin molded products, and has the disadvantage that mass production is far inferior to melt molding such as injection molding. . On the other hand, 1,3-dioxolane derivatives represented by the following general formula (wherein R 1 = H or CH 3 , R 2 =
CH 3 , C 2 H 3 , n-C 3 H 7 alkyl group or phenyl group) can be polymerized and cross-linked to insolubilize by UV irradiation alone, and R 2 = CH 3 can be copolymerized with methacrylic acid ester, etc. It is known that polymers are crosslinked and rendered insolubilized by ultraviolet irradiation. However, the wavelength of the light irradiation used for these
Since it is required to be shorter than 300 nm, it is accompanied by deterioration of the methacrylic acid ester component of the copolymer, and it usually requires a colored sensitizer, so there is a problem that it cannot be used in cases where coloring is to be avoided. Therefore, the present invention has been made to solve these conventional drawbacks, and has discovered a new derivative compound of 1,3-dioxolane, which can be copolymerized with methyl methacrylate, etc., and the copolymer can be melted. Not only is it possible to mold, but also 300n
By irradiating ultraviolet rays in the vicinity of m, a crosslinked product having no absorption in the visible region can be obtained, and such a crosslinked product has features such as being suitable as a colorless and transparent material for optical lenses and the like. That is, the novel 1,3-dioxolane derivative compound of the present invention is represented by the following general formula. However, in the formula, when n=1, R is a hydrogen atom or a methyl group, and when n=2, R is a methyl group. Examples of the novel 1,3-dioxolane derivative compounds of the present invention include compounds with the following compound numbers. (2-Methyl-2-acetonyl-1,3-dioxolan-4-yl)methyl acrylate (2-Methyl-2-acetonyl-1,3-dioxolan-4-yl)methyl methacrylate [2-Methyl-2-(β-acetylethyl)-
1,3-Dioxolane-4-yl]methyl methacrylate The novel 1,3-dioxolane derivative compound of the present invention can be produced by Production Method 1 or 2 below. Manufacturing method 1 However, R=H or CH 3 and n=1 or 2. The reaction is carried out by acetalization in the presence of a phosphoric acid catalyst using the diketone compound (B), which also serves as a solvent, in a large molar excess of several to ten times or more relative to the epoxy compound (A). . The reaction is usually 60
℃ for about 1 hour. When the organic layer is rectified after neutralizing the phosphoric acid with NaOH water, the 1,3-dioxolane derivative compound (C) is obtained. The yield of compound (C) is 20-40%. The amount of NaOH is preferably slightly more than the equivalent amount to the phosphoric acid used; if it is used in excess, enol sodium salt of the diketone will be formed and precipitated, which is disadvantageous in terms of operation. Compound (B) recovered by rectification can be reused. In addition, as compound (B), C 2 H 5 CO, instead of CH 3 CO,
If a compound having C 6 H 5 CO or the like is used, a compound (C) having these substituents can be obtained. Manufacturing method 2 However, R=H or CH 3 , M=K or Na
an alkali metal such as, X=Cl or Br, n=1 or 2. The reaction is carried out by heating and stirring the alkali metal salt of acrylic acid or methacrylic acid (D) and the 1,3-dioxolane halide (E) in dimethyl sulfoxide. The yield of the target 1,3-dioxolane derivative compound (C) is 40 to 65%. In addition, similarly to production method 1, compound (E)
Instead of CH 3 CO, a compound having a substituent such as C 2 H 5 CO, C 6 H 5 CO, etc. can be used. Compound (E) can be produced by the method (a) or (b) below. However, in methods (a) and (b), X and n are the same as above, and instead of CH 3 CO, C 2 H 5 CO,
Compounds having substituents such as C 6 H 5 CO can also be used. Method (a) is carried out in the same manner as Production Method 1, by using a diketone compound (B) in large excess with respect to the halide (F), acetalizing it in the presence of a phosphoric acid catalyst, and treating it with NaOH water. The yield of 1,3-dioxolane halide (E) is
It is 20-40%. In method (b), when α,β-diol compound (G) and diketone compound (B) are subjected to a dehydration reaction in the presence of an acid catalyst such as p-toluenesulfonic acid, 1,3-dioxolane halide (E ) is obtained. The reaction is carried out by applying a large excess of the diketone compound (B), and since it is a dehydration reaction, a solvent such as benzene that is azeotropic with water is added and refluxed to remove water from the system. When no more water is produced, the acid catalyst in the reaction solution is neutralized with Na 2 CO 3 or sodium acetate, etc., and then the benzene and excess diketone compound are distilled off and collected, and the remaining liquid is diluted with NaOH.
After treatment with water to remove by-products and rectification, 1,3-dioxolane halide (E) is obtained. Yield is 20-30%. 1 and 3 of the present invention obtained by the above manufacturing method
-The dioxolane derivative compounds are all new compounds and were identified by elemental analysis and NMR. The properties of these compounds are shown in Table 1 below.

【表】 以上述べたように、本発明における1,3−ジ
オキソラン誘導体化合物(化合物番号1〜3)
は、いづれも2の位置に含カルボニル置換基を有
する新規化合物であり、かかる新規化合物は、熱
可塑性の他の樹脂モーノマー、例えばメタクリル
酸メチル、スチレン等と共重合させることによ
り、含カルボニル置換基を有する1,3−ジオキ
ソラン修飾共重合樹脂組成物を与え、このものは
熱可塑性を失なわずに容易に成形することができ
る。 この共重合樹脂組成物は1,3−ジオキソラン
の2の位置に含カルボニル置換基を持つことによ
つて、従来よりも長波長光に感光して架橋する特
長があり、有色増感剤による着色や短波長紫外線
による分解を避けることができる。 したがつて、本発明1,3−ジオキソラン誘導
体化合物を用いることにより、PMMAの光学的
特性や溶融成形による高い生産性を維持しつつ、
成形後に光照射することによつて耐熱性等の物性
を容易に改善することができる。 得られた架橋体は三次元構造であるので、切削
等の機械加工も容易であり、プラスチツク光学レ
ンズなどの無色透明性を要する材料として好適で
ある。 また本発明の1,3−ジオキソラン誘導体化合
物は、単独でも紫外線照射によつて重合、ゲル化
する。従つて、本発明の化合物およびこれを用い
た樹脂組成物は、光照射による架橋性を利用した
接着剤、コーテイング材料、フオトレジスト等光
加工材料としての用途も期待される。 以下、本発明の実施例を述べる。 実施例 1 製造方法1による〔2−メチル−2−(β−ア
セチルエチル)−1,3−ジオキソラン−4−
イル〕メチルメタクリレート(化合物番号3)
の製造。 300mlフラスコに、グリシジルメタクリレート
(前記化合物Aにおいて、R=CH3)20g(0.141
モル)、アセトニルアセトン(化合物Bにおいて
n=2)170g(1.49モル)、85%リン酸16g
(0.14モル)、および重合禁止剤としてのハイドロ
キノン20mgを仕込み、撹拌、均一後に60℃で1時
間反応させた。 次いで冷却後、ベンゼン100mlを加えて希釈し、
この希釈した反応液を、10%水酸化ナトリウム水
溶液80mlで3回振とう、洗浄した後に有機層を分
離した。一方、全水層をベンゼン50mlで抽出し、
ベンゼン層を有機層と合併した。 この合併した有機層に重合禁止剤のN−フエニ
ル−β−ナフチルアミン10mgを添加して、減圧下
にベンゼンおよび過剰の未反応アセトニルアセト
ンを回収した後に、残液を15cmビグリユー精留管
を用いて精留した。 沸点120℃/0.6mmHg〜135℃/1.5mmHgの留分
16.1gを得た。収率45%であつた。 またガスクロマトフ分析の結果、純度98%であ
り、再蒸留した沸点130〜132℃/1.2mmHgのもの
は、元素分析および1H−NMR、13C−NMRから、
下記構造式の 〔2−メチル−2−(β−アセチルエチル)−
1,3−ジオキソラン−4−イル〕メチルメタク
リレート(化合物番号3)であることを確認し
た。 実施例 2 (2−メチル−2−アセトニル−1,3−ジオ
キソラン−4−イル)メチルメタクリレート
(化合物番号2)の製造。 実施例1と同様にして、グリシジルメタクリレ
ート35g(0.246モル)、アセチルアセトン(化合
物Bにおいて、n=1)274g(2.74モル)、85%
リン酸28gから、沸点120〜125℃/1.5mmHgの留
分22g(収率37%)の、下記構造式を有する(2
−メチル−2−アセトニル−1,3−ジオキソラ
ン−4−イル)メチルメタクリレート(化合物番
号2)を得た。 実施例 3 製造方法2による(2−メチル−2−アセトニ
ル−1,3−ジオキソラン−4−イル)メチル
アクリレート(化合物番号1)の製造。 2−メチル−2−アセトニル−4−クロロメチ
ル−1,3−ジオキソラン(化合物Eにおいて、
n=1、X=Cl)3.8g(0.02モル)、ジメチルス
ルホキシド10ml、クロロベンゼン4ml、アクリル
酸カリウム(化合物D、R=H、M=K)2.2g、
N−フエニル−β−ナフチルアミン10mg(重合禁
止剤)を蒸留フラスコに入れ、加熱して液温が
160℃になるまで留分を留出させた。なお、クロ
ロベンゼンは反応系の水分を共沸混合物として除
去するために、使用した。 液温160℃に1時間保持した後に、冷却し、沈
澱物を別し、母液をビグリユー管付蒸留フラス
コに移し、減圧蒸留して沸点114〜116℃/1.5mm
Hgの留分、2.5g(収率55%)を得た。 このものは、元素分析および1H−NMR、13C−
NMRの結果から、下記構造式を有する(2−メ
チル−2−アセトニル−1,3−ジオキソラン−
4−イル)メチルアクリレート(化合物番号1)
であることを確認した。 参考例 1 実施例3に用いた2−メチル−2−アセトニル
−4−クロロメチル−1,3−ジオキソラン(化
合物E、n=1、X=Cl)は下記のようにして製
造した。 エピクロルヒドリン(化合物G、X=Cl)28g
(0.3モル)アセチルアセトン(化合物B、n=
1)150g(1.5モル)、85%リン酸34gを300mlフ
ラスコに仕込み、60℃で1時間反応させた後、反
応液にベンゼン100mlを加え、10%水酸ナトリウ
ム水溶液100mlで振とうし、有機層と分離した。
有機層を更に2回、同様に水酸化ナトリウム水溶
液で処理した。 3回分の水層を合併して、新たなベンゼン150
mlで振とう、抽出し、ベンゼン層を母液の有機層
に合併した。 この合併した有機層を減圧下にベンゼンおよび
未反応アセチルアセトンを留去した後、ビグリユ
ー精留管を用いて精留した。 沸点80〜80.5℃/1.2mmHgの留分11.1g(収率
19%)を得た。このものは、元素分析および1H
−NMR、13C−NMRから下記構造式の2−メチ
ル−2−アセトニル−4−クロロメチル−1,3
−ジオキソラン(化合物E、X=Cl、n=1)で
あることを確認した。 実施例 4 時計皿に化合物番号1の本発明の化合物52mgを
秤量して入れ、250W超高圧水銀灯を装填したウ
シオ電機製紫外線照射装置UIS−251Hに、波長
270nm以下の低波長柴外光を除くためのパイレ
ツクスガラスフイルターを付した装置で30分間照
射した。 時計皿にクロロホルムを注ぎ入れ、可溶性部分
を溶解除去する操作を数回繰り返した後、真空乾
燥して溶媒を除き秤量した結果、不溶の残留ゲル
は49mgであつた。
[Table] As mentioned above, 1,3-dioxolane derivative compounds (compound numbers 1 to 3) in the present invention
are new compounds having a carbonyl-containing substituent at the 2-position, and these new compounds can be made by copolymerizing with other thermoplastic resin monomers, such as methyl methacrylate, styrene, etc. The present invention provides a 1,3-dioxolane modified copolymer resin composition having the following properties, which can be easily molded without losing thermoplasticity. By having a carbonyl-containing substituent at the 2-position of 1,3-dioxolane, this copolymer resin composition has the feature of being crosslinked by being sensitive to longer wavelength light than conventional ones, and it can be colored with a colored sensitizer. Decomposition by UV light and short wavelength ultraviolet rays can be avoided. Therefore, by using the 1,3-dioxolane derivative compound of the present invention, while maintaining the optical properties of PMMA and high productivity by melt molding,
By irradiating with light after molding, physical properties such as heat resistance can be easily improved. Since the obtained crosslinked product has a three-dimensional structure, it can be easily machined such as cutting, and is suitable as a material that requires colorless transparency such as plastic optical lenses. Furthermore, the 1,3-dioxolane derivative compound of the present invention polymerizes and gels when irradiated with ultraviolet rays even when used alone. Therefore, the compound of the present invention and the resin composition using the same are expected to be used as optically processed materials such as adhesives, coating materials, and photoresists that utilize the crosslinkability caused by light irradiation. Examples of the present invention will be described below. Example 1 [2-Methyl-2-(β-acetylethyl)-1,3-dioxolane-4-] by Production Method 1
yl] methyl methacrylate (compound number 3)
Manufacturing of. In a 300 ml flask, add 20 g (0.141
mol), acetonyl acetone (n=2 in compound B) 170 g (1.49 mol), 85% phosphoric acid 16 g
(0.14 mol) and 20 mg of hydroquinone as a polymerization inhibitor were charged, stirred and homogenized, and then reacted at 60°C for 1 hour. After cooling, add 100ml of benzene to dilute.
This diluted reaction solution was shaken and washed three times with 80 ml of a 10% aqueous sodium hydroxide solution, and then the organic layer was separated. Meanwhile, the entire aqueous layer was extracted with 50 ml of benzene.
The benzene layer was merged with the organic layer. After adding 10 mg of N-phenyl-β-naphthylamine, a polymerization inhibitor, to the combined organic layer and recovering benzene and excess unreacted acetonylacetone under reduced pressure, the remaining liquid was collected using a 15 cm Vigreux rectification tube. It was rectified. Fraction with boiling point 120℃/0.6mmHg to 135℃/1.5mmHg
16.1g was obtained. The yield was 45%. Furthermore, as a result of gas chromatographic analysis, the purity was 98%, and the redistilled product with a boiling point of 130-132℃/1.2mmHg was found to be as follows from elemental analysis, 1 H-NMR, 13 C-NMR.
The structural formula below [2-Methyl-2-(β-acetylethyl)-
It was confirmed that it was 1,3-dioxolan-4-yl]methyl methacrylate (compound number 3). Example 2 Preparation of (2-methyl-2-acetonyl-1,3-dioxolan-4-yl)methyl methacrylate (Compound No. 2). In the same manner as in Example 1, 35 g (0.246 mol) of glycidyl methacrylate, 274 g (2.74 mol) of acetylacetone (n = 1 in compound B), 85%
From 28 g of phosphoric acid, 22 g (yield 37%) of a fraction with a boiling point of 120 to 125°C/1.5 mmHg, having the following structural formula (2
-Methyl-2-acetonyl-1,3-dioxolan-4-yl)methyl methacrylate (Compound No. 2) was obtained. Example 3 Production of (2-methyl-2-acetonyl-1,3-dioxolan-4-yl)methyl acrylate (Compound No. 1) by Production Method 2. 2-methyl-2-acetonyl-4-chloromethyl-1,3-dioxolane (in compound E,
n=1, X=Cl) 3.8g (0.02 mol), dimethyl sulfoxide 10ml, chlorobenzene 4ml, potassium acrylate (compound D, R=H, M=K) 2.2g
Put 10mg of N-phenyl-β-naphthylamine (polymerization inhibitor) into a distillation flask and heat until the liquid temperature reaches
The fraction was distilled until the temperature reached 160°C. Note that chlorobenzene was used to remove water from the reaction system as an azeotrope. After keeping the liquid temperature at 160℃ for 1 hour, it was cooled, the precipitate was separated, and the mother liquor was transferred to a distillation flask with a Vigreux tube and distilled under reduced pressure to obtain a boiling point of 114-116℃/1.5mm.
2.5 g (yield 55%) of Hg fraction was obtained. This material was subjected to elemental analysis, 1 H-NMR, 13 C-
From the NMR results, it has the following structural formula (2-methyl-2-acetonyl-1,3-dioxolane-
4-yl) methyl acrylate (compound number 1)
It was confirmed that Reference Example 1 2-Methyl-2-acetonyl-4-chloromethyl-1,3-dioxolane (Compound E, n=1, X=Cl) used in Example 3 was produced as follows. Epichlorohydrin (compound G, X=Cl) 28g
(0.3 mol) acetylacetone (compound B, n=
1) Charge 150 g (1.5 mol) of 85% phosphoric acid and 34 g of 85% phosphoric acid into a 300 ml flask and react at 60°C for 1 hour. Add 100 ml of benzene to the reaction solution, shake with 100 ml of 10% sodium hydroxide aqueous solution, and add organic separated from the layers.
The organic layer was treated two more times in the same manner with aqueous sodium hydroxide solution. By merging the three aqueous layers, a new benzene 150
ml, the benzene layer was combined with the organic layer of the mother liquor. Benzene and unreacted acetylacetone were distilled off from the combined organic layers under reduced pressure, and then rectified using a Vigreux rectifying tube. 11.1g of fraction with a boiling point of 80-80.5℃/1.2mmHg (yield
19%). This stuff was tested for elemental analysis and 1H
-NMR, 2-methyl-2-acetonyl-4-chloromethyl-1,3 of the following structural formula from 13 C-NMR
-Dioxolane (compound E, X=Cl, n=1). Example 4 Weighed out 52 mg of the compound of the present invention, Compound No. 1, into a watch glass, and placed it in a Ushio Inc. ultraviolet irradiation device UIS-251H equipped with a 250W ultra-high pressure mercury lamp at a wavelength of
The light was irradiated for 30 minutes using a device equipped with a Pyrex glass filter to remove low-wavelength external light of 270 nm or less. After repeating the operation of pouring chloroform into a watch glass and dissolving and removing the soluble portion several times, the solution was vacuum dried, the solvent was removed, and the amount was weighed. As a result, the remaining insoluble gel was 49 mg.

Claims (1)

【特許請求の範囲】 1 下記一般式で示される新規1,3−ジオキソ
ラン誘導体化合物。 ただし式中、n=1のときRは水素原子または
メチル基であり、n=2のときRはメチル基であ
る。
[Scope of Claims] 1. A novel 1,3-dioxolane derivative compound represented by the following general formula. However, in the formula, when n=1, R is a hydrogen atom or a methyl group, and when n=2, R is a methyl group.
JP5467684A 1984-03-21 1984-03-21 Novel 1,3-dioxolane derivative compound and resin composition containing said compound as copolymer component Granted JPS60197670A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP5467684A JPS60197670A (en) 1984-03-21 1984-03-21 Novel 1,3-dioxolane derivative compound and resin composition containing said compound as copolymer component

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP5467684A JPS60197670A (en) 1984-03-21 1984-03-21 Novel 1,3-dioxolane derivative compound and resin composition containing said compound as copolymer component

Related Child Applications (1)

Application Number Title Priority Date Filing Date
JP26874591A Division JPH0539321A (en) 1991-09-19 1991-09-19 Resin composition containing 1,3-dioxolane derivative compound as comonomer

Publications (2)

Publication Number Publication Date
JPS60197670A JPS60197670A (en) 1985-10-07
JPH0414674B2 true JPH0414674B2 (en) 1992-03-13

Family

ID=12977387

Family Applications (1)

Application Number Title Priority Date Filing Date
JP5467684A Granted JPS60197670A (en) 1984-03-21 1984-03-21 Novel 1,3-dioxolane derivative compound and resin composition containing said compound as copolymer component

Country Status (1)

Country Link
JP (1) JPS60197670A (en)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6357618A (en) * 1986-08-28 1988-03-12 Agency Of Ind Science & Technol Photocurable adhesive and bonding therewith
JP3989259B2 (en) * 2002-02-08 2007-10-10 三菱レイヨン株式会社 Active energy ray-curable composition for hardened layer of optical disc having silver or silver alloy recording film, and optical disc

Also Published As

Publication number Publication date
JPS60197670A (en) 1985-10-07

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