JPH0415102B2 - - Google Patents
Info
- Publication number
- JPH0415102B2 JPH0415102B2 JP11066882A JP11066882A JPH0415102B2 JP H0415102 B2 JPH0415102 B2 JP H0415102B2 JP 11066882 A JP11066882 A JP 11066882A JP 11066882 A JP11066882 A JP 11066882A JP H0415102 B2 JPH0415102 B2 JP H0415102B2
- Authority
- JP
- Japan
- Prior art keywords
- ink
- metal
- substrate
- inkjet recording
- recording head
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 239000000758 substrate Substances 0.000 claims description 27
- 229910052751 metal Inorganic materials 0.000 claims description 24
- 239000002184 metal Substances 0.000 claims description 24
- 238000004519 manufacturing process Methods 0.000 claims description 17
- 229920005989 resin Polymers 0.000 claims description 16
- 239000011347 resin Substances 0.000 claims description 16
- 150000002902 organometallic compounds Chemical class 0.000 claims description 11
- 239000011241 protective layer Substances 0.000 claims description 9
- 238000010438 heat treatment Methods 0.000 claims description 7
- 230000007797 corrosion Effects 0.000 claims description 6
- 238000005260 corrosion Methods 0.000 claims description 6
- 239000010410 layer Substances 0.000 claims description 6
- 239000013522 chelant Substances 0.000 claims description 4
- 150000001875 compounds Chemical class 0.000 claims description 4
- 229910045601 alloy Inorganic materials 0.000 claims description 3
- 239000000956 alloy Substances 0.000 claims description 3
- 229910000510 noble metal Inorganic materials 0.000 claims description 2
- 238000000034 method Methods 0.000 description 28
- 239000010408 film Substances 0.000 description 18
- 229920002120 photoresistant polymer Polymers 0.000 description 16
- 239000000203 mixture Substances 0.000 description 14
- IEKHISJGRIEHRE-UHFFFAOYSA-N 16-methylheptadecanoic acid;propan-2-ol;titanium Chemical compound [Ti].CC(C)O.CC(C)CCCCCCCCCCCCCCC(O)=O.CC(C)CCCCCCCCCCCCCCC(O)=O.CC(C)CCCCCCCCCCCCCCC(O)=O IEKHISJGRIEHRE-UHFFFAOYSA-N 0.000 description 4
- -1 Al 2 O 3 Chemical class 0.000 description 4
- 239000011248 coating agent Substances 0.000 description 4
- 238000000576 coating method Methods 0.000 description 4
- 238000005520 cutting process Methods 0.000 description 4
- 239000011521 glass Substances 0.000 description 4
- 239000002904 solvent Substances 0.000 description 4
- LYCAIKOWRPUZTN-UHFFFAOYSA-N Ethylene glycol Chemical compound OCCO LYCAIKOWRPUZTN-UHFFFAOYSA-N 0.000 description 3
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 3
- 239000000853 adhesive Substances 0.000 description 3
- 230000001070 adhesive effect Effects 0.000 description 3
- 238000010586 diagram Methods 0.000 description 3
- 238000005530 etching Methods 0.000 description 3
- 150000002739 metals Chemical class 0.000 description 3
- 229920002554 vinyl polymer Polymers 0.000 description 3
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 2
- QCWXUUIWCKQGHC-UHFFFAOYSA-N Zirconium Chemical compound [Zr] QCWXUUIWCKQGHC-UHFFFAOYSA-N 0.000 description 2
- YRKCREAYFQTBPV-UHFFFAOYSA-N acetylacetone Chemical compound CC(=O)CC(C)=O YRKCREAYFQTBPV-UHFFFAOYSA-N 0.000 description 2
- 239000012790 adhesive layer Substances 0.000 description 2
- 239000000919 ceramic Substances 0.000 description 2
- 229910052804 chromium Inorganic materials 0.000 description 2
- 239000011651 chromium Substances 0.000 description 2
- 229940114081 cinnamate Drugs 0.000 description 2
- 238000007796 conventional method Methods 0.000 description 2
- 239000013256 coordination polymer Substances 0.000 description 2
- 238000013007 heat curing Methods 0.000 description 2
- 239000007788 liquid Substances 0.000 description 2
- 239000000178 monomer Substances 0.000 description 2
- 229920003023 plastic Polymers 0.000 description 2
- 239000004033 plastic Substances 0.000 description 2
- 239000007787 solid Substances 0.000 description 2
- 229910052719 titanium Inorganic materials 0.000 description 2
- 239000010936 titanium Substances 0.000 description 2
- WBYWAXJHAXSJNI-VOTSOKGWSA-M trans-cinnamate Chemical compound [O-]C(=O)\C=C\C1=CC=CC=C1 WBYWAXJHAXSJNI-VOTSOKGWSA-M 0.000 description 2
- 229910052726 zirconium Inorganic materials 0.000 description 2
- UOCLXMDMGBRAIB-UHFFFAOYSA-N 1,1,1-trichloroethane Chemical compound CC(Cl)(Cl)Cl UOCLXMDMGBRAIB-UHFFFAOYSA-N 0.000 description 1
- MUNGMRPYTCHBFX-UHFFFAOYSA-N 1,5-diphenylpentane-1,3,5-trione Chemical compound C=1C=CC=CC=1C(=O)CC(=O)CC(=O)C1=CC=CC=C1 MUNGMRPYTCHBFX-UHFFFAOYSA-N 0.000 description 1
- RZCMFVQMQKCVEN-UHFFFAOYSA-N 1-methoxypentane-2,4-dione Chemical compound COCC(=O)CC(C)=O RZCMFVQMQKCVEN-UHFFFAOYSA-N 0.000 description 1
- GUARKOVVHJSMRW-UHFFFAOYSA-N 3-ethylpentane-2,4-dione Chemical compound CCC(C(C)=O)C(C)=O GUARKOVVHJSMRW-UHFFFAOYSA-N 0.000 description 1
- YIWTXSVNRCWBAC-UHFFFAOYSA-N 3-phenylpentane-2,4-dione Chemical compound CC(=O)C(C(C)=O)C1=CC=CC=C1 YIWTXSVNRCWBAC-UHFFFAOYSA-N 0.000 description 1
- WTQZSMDDRMKJRI-UHFFFAOYSA-N 4-diazoniophenolate Chemical compound [O-]C1=CC=C([N+]#N)C=C1 WTQZSMDDRMKJRI-UHFFFAOYSA-N 0.000 description 1
- QTBSBXVTEAMEQO-UHFFFAOYSA-N Acetic acid Chemical compound CC(O)=O QTBSBXVTEAMEQO-UHFFFAOYSA-N 0.000 description 1
- 229920000178 Acrylic resin Polymers 0.000 description 1
- 239000004925 Acrylic resin Substances 0.000 description 1
- 229910018072 Al 2 O 3 Inorganic materials 0.000 description 1
- FERIUCNNQQJTOY-UHFFFAOYSA-M Butyrate Chemical compound CCCC([O-])=O FERIUCNNQQJTOY-UHFFFAOYSA-M 0.000 description 1
- FERIUCNNQQJTOY-UHFFFAOYSA-N Butyric acid Natural products CCCC(O)=O FERIUCNNQQJTOY-UHFFFAOYSA-N 0.000 description 1
- DQFBYFPFKXHELB-UHFFFAOYSA-N Chalcone Natural products C=1C=CC=CC=1C(=O)C=CC1=CC=CC=C1 DQFBYFPFKXHELB-UHFFFAOYSA-N 0.000 description 1
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 description 1
- 229910000792 Monel Inorganic materials 0.000 description 1
- 239000004698 Polyethylene Substances 0.000 description 1
- 239000004721 Polyphenylene oxide Substances 0.000 description 1
- 239000004372 Polyvinyl alcohol Substances 0.000 description 1
- 229910004298 SiO 2 Inorganic materials 0.000 description 1
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 1
- NIXOWILDQLNWCW-UHFFFAOYSA-N acrylic acid group Chemical group C(C=C)(=O)O NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 description 1
- 229920000122 acrylonitrile butadiene styrene Polymers 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- SMZOGRDCAXLAAR-UHFFFAOYSA-N aluminium isopropoxide Chemical compound [Al+3].CC(C)[O-].CC(C)[O-].CC(C)[O-] SMZOGRDCAXLAAR-UHFFFAOYSA-N 0.000 description 1
- 238000004380 ashing Methods 0.000 description 1
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 1
- RWCCWEUUXYIKHB-UHFFFAOYSA-N benzophenone Chemical compound C=1C=CC=CC=1C(=O)C1=CC=CC=C1 RWCCWEUUXYIKHB-UHFFFAOYSA-N 0.000 description 1
- 239000012965 benzophenone Substances 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 235000005513 chalcones Nutrition 0.000 description 1
- 239000002738 chelating agent Substances 0.000 description 1
- BGTFCAQCKWKTRL-YDEUACAXSA-N chembl1095986 Chemical compound C1[C@@H](N)[C@@H](O)[C@H](C)O[C@H]1O[C@@H]([C@H]1C(N[C@H](C2=CC(O)=CC(O[C@@H]3[C@H]([C@@H](O)[C@H](O)[C@@H](CO)O3)O)=C2C=2C(O)=CC=C(C=2)[C@@H](NC(=O)[C@@H]2NC(=O)[C@@H]3C=4C=C(C(=C(O)C=4)C)OC=4C(O)=CC=C(C=4)[C@@H](N)C(=O)N[C@@H](C(=O)N3)[C@H](O)C=3C=CC(O4)=CC=3)C(=O)N1)C(O)=O)=O)C(C=C1)=CC=C1OC1=C(O[C@@H]3[C@H]([C@H](O)[C@@H](O)[C@H](CO[C@@H]5[C@H]([C@@H](O)[C@H](O)[C@@H](C)O5)O)O3)O[C@@H]3[C@H]([C@@H](O)[C@H](O)[C@@H](CO)O3)O[C@@H]3[C@H]([C@H](O)[C@@H](CO)O3)O)C4=CC2=C1 BGTFCAQCKWKTRL-YDEUACAXSA-N 0.000 description 1
- 239000010941 cobalt Substances 0.000 description 1
- 229910017052 cobalt Inorganic materials 0.000 description 1
- GUTLYIVDDKVIGB-UHFFFAOYSA-N cobalt atom Chemical compound [Co] GUTLYIVDDKVIGB-UHFFFAOYSA-N 0.000 description 1
- 229920001577 copolymer Polymers 0.000 description 1
- 238000001723 curing Methods 0.000 description 1
- 230000007423 decrease Effects 0.000 description 1
- 125000000664 diazo group Chemical group [N-]=[N+]=[*] 0.000 description 1
- SOCTUWSJJQCPFX-UHFFFAOYSA-N dichromate(2-) Chemical compound [O-][Cr](=O)(=O)O[Cr]([O-])(=O)=O SOCTUWSJJQCPFX-UHFFFAOYSA-N 0.000 description 1
- QDWLLVUFTWGZRZ-UHFFFAOYSA-N diphenylmethanone;prop-2-enamide Chemical compound NC(=O)C=C.C=1C=CC=CC=1C(=O)C1=CC=CC=C1 QDWLLVUFTWGZRZ-UHFFFAOYSA-N 0.000 description 1
- 238000001035 drying Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 229920006332 epoxy adhesive Polymers 0.000 description 1
- 238000001704 evaporation Methods 0.000 description 1
- 230000008020 evaporation Effects 0.000 description 1
- 125000000524 functional group Chemical group 0.000 description 1
- 229910052737 gold Inorganic materials 0.000 description 1
- 238000007654 immersion Methods 0.000 description 1
- 230000001771 impaired effect Effects 0.000 description 1
- 239000003999 initiator Substances 0.000 description 1
- 229910052809 inorganic oxide Inorganic materials 0.000 description 1
- 238000009434 installation Methods 0.000 description 1
- 238000005304 joining Methods 0.000 description 1
- 230000007774 longterm Effects 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 229910052750 molybdenum Inorganic materials 0.000 description 1
- QRWZCJXEAOZAAW-UHFFFAOYSA-N n,n,2-trimethylprop-2-enamide Chemical compound CN(C)C(=O)C(C)=C QRWZCJXEAOZAAW-UHFFFAOYSA-N 0.000 description 1
- 229910052759 nickel Inorganic materials 0.000 description 1
- PXHVJJICTQNCMI-UHFFFAOYSA-N nickel Substances [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 1
- 229910052758 niobium Inorganic materials 0.000 description 1
- 150000004767 nitrides Chemical class 0.000 description 1
- 239000010680 novolac-type phenolic resin Substances 0.000 description 1
- 239000003960 organic solvent Substances 0.000 description 1
- 229910052760 oxygen Inorganic materials 0.000 description 1
- 239000001301 oxygen Substances 0.000 description 1
- 239000003973 paint Substances 0.000 description 1
- 229910052763 palladium Inorganic materials 0.000 description 1
- 238000000206 photolithography Methods 0.000 description 1
- 229910052697 platinum Inorganic materials 0.000 description 1
- 229920000570 polyether Polymers 0.000 description 1
- 229920000573 polyethylene Polymers 0.000 description 1
- 229920000642 polymer Polymers 0.000 description 1
- 239000003505 polymerization initiator Substances 0.000 description 1
- 238000006116 polymerization reaction Methods 0.000 description 1
- 229920002451 polyvinyl alcohol Polymers 0.000 description 1
- 239000010970 precious metal Substances 0.000 description 1
- 238000003825 pressing Methods 0.000 description 1
- 238000007789 sealing Methods 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 229910000679 solder Inorganic materials 0.000 description 1
- 239000011343 solid material Substances 0.000 description 1
- 239000008247 solid mixture Substances 0.000 description 1
- 229910052715 tantalum Inorganic materials 0.000 description 1
- 229920005992 thermoplastic resin Polymers 0.000 description 1
- 239000010409 thin film Substances 0.000 description 1
- VXUYXOFXAQZZMF-UHFFFAOYSA-N titanium(IV) isopropoxide Chemical compound CC(C)O[Ti](OC(C)C)(OC(C)C)OC(C)C VXUYXOFXAQZZMF-UHFFFAOYSA-N 0.000 description 1
- 230000001988 toxicity Effects 0.000 description 1
- 231100000419 toxicity Toxicity 0.000 description 1
- 229910052721 tungsten Inorganic materials 0.000 description 1
- 229920006305 unsaturated polyester Polymers 0.000 description 1
- 150000003673 urethanes Chemical class 0.000 description 1
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 description 1
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
- B41J2/00—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
- B41J2/005—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
- B41J2/01—Ink jet
- B41J2/135—Nozzles
- B41J2/16—Production of nozzles
- B41J2/1621—Manufacturing processes
- B41J2/164—Manufacturing processes thin film formation
- B41J2/1645—Manufacturing processes thin film formation thin film formation by spincoating
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
- B41J2/00—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
- B41J2/005—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
- B41J2/01—Ink jet
- B41J2/135—Nozzles
- B41J2/16—Production of nozzles
- B41J2/1601—Production of bubble jet print heads
- B41J2/1604—Production of bubble jet print heads of the edge shooter type
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
- B41J2/00—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
- B41J2/005—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
- B41J2/01—Ink jet
- B41J2/135—Nozzles
- B41J2/16—Production of nozzles
- B41J2/1621—Manufacturing processes
- B41J2/1623—Manufacturing processes bonding and adhesion
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
- B41J2/00—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
- B41J2/005—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
- B41J2/01—Ink jet
- B41J2/135—Nozzles
- B41J2/16—Production of nozzles
- B41J2/1621—Manufacturing processes
- B41J2/1631—Manufacturing processes photolithography
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
- B41J2202/00—Embodiments of or processes related to ink-jet or thermal heads
- B41J2202/01—Embodiments of or processes related to ink-jet heads
- B41J2202/03—Specific materials used
Landscapes
- Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- Particle Formation And Scattering Control In Inkjet Printers (AREA)
Description
本発明は、インクジエツト記録ヘツド、詳しく
は、所謂、インクジエツト記録方式に用いる記録
用インク小滴を発生するためのインクジエツト記
録ヘツドの製造法に関する。
インクジエツト記録方式に適用されるインクジ
エツト記録ヘツドは、一般に、微細なインク吐出
口(オリフイス)、インク通路及びこのインク通
路の一部に設けられるインク吐出圧発生部を備え
ている。
従来、この様なインクジエツト記録ヘツドを作
成する方法としては、例えば、ガラスや金属の板
に切削やエツチング等により、微細な溝を形成し
た後、この溝を形成した板を他の適当な板と接合
してインク通路の形成を行う方法が知られてい
る。
しかし、斯かる従来法によつて作成されるヘツ
ドでは、切削加工されるインク通路内壁面の荒れ
が大き過ぎたり、エツチング率の差からインク通
路に歪が生じたりして、精度の良いインク通路が
得難く、製作後のインクジエツト記録ヘツドのイ
ンクの吐出特性にバラツキが出易い。また、切削
加工の際に、板の欠けや割れが生じ易く、製造歩
留りが悪いという問題点もある。そして、エツチ
ング加工を行う場合は、製造工程が多く、製造コ
ストの上昇を招くという問題点がある。更に、上
記した従来法に共通する問題点としては、インク
通路溝を形成した溝付板と、インクに作用するエ
ネルギーを発生する圧電素子、発熱素子等の駆動
素子が設けられた基板との貼合わせの際に、夫々
の位置合わせを精度良く行うことが困難であつ
て、量産性に欠ける点が挙げられる。
これ等の問題点が解決できるインクジエツトヘ
ツドの製造法として、感光性樹脂の硬化膜により
インク通路壁を形成する方法が、例えば特開昭57
−43876号により知られている。この方法によれ
ば、インク通路が精度良く、正確に、且つ歩留り
良く微細加工される。また、量産化も容易であ
り、安価なインクジエツト記録ヘツドを提供する
ことができるため優れた方法であるといえる。
しかし、この様に改良された製造法により提供
されたインクジエツト記録ヘツドでは、前記問題
点は解決されたものの、インクの長期浸漬に対し
基板と感光性樹脂硬化膜の密着力が除々に低下
し、微小な剥れが生じ、インク滴の直進性、すな
わち着弾点精度に影響を与えている。このこと
は、近年インクジエツト記録方式が高密度ノズル
によつて高解像度の画質が要求される中で、大き
な障害となつていた。
本発明は、上記問題点に鑑み成されたもので、
精密であり、しかも、信頼性の高いインクジエツ
ト記録ヘツドを製造するための新規な方法を提供
することを目的とする。また、インク通路が精度
良く且つ、設計な忠実に微細加工された構成を有
するインクジエツト記録ヘツドを簡略な方法によ
り歩留り良く製造する方法を提供することも本発
明の目的である。更に使用耐久性に優れたインク
ジエツト記録ヘツドの製造法を提供することも本
発明の他の目的である。
このような諸目的を達成する本発明のインクジ
エツト記録ヘツドの製造方法は、インクを吐出口
から吐出するために利用される熱エネルギーを発
生する発熱素子が設けられた基板と壁と覆いとに
よつて、前記吐出口に連通するインク通路が設け
られているインクジエツト記録ヘツドの製造方法
において、貴金属を除く耐食金属及び耐食合金か
らなる層を、発熱素子の保護層として発熱素子の
設けられた基板上に設ける工程と、保護層の表面
を金属アルコラート、金属アシレート、及び金属
キレート化合物から成る群より選ばれた一種類以
上の金属有機化合物で処理する工程と、金属有機
化合物で処理された保護層上に感光性樹脂を用い
てインク通路の壁を形成する工程と、を有するこ
とを特徴とするものである。
以下、図面に基づいて本発明を詳細に説明す
る。
第1図乃至第6図は、本発明方法に従うインク
ジエツト記録ヘツドの製作工程を例示する模式図
である。
第1図の工程では、ガラス、セラミツク、プラ
スチツク、或は金属等の基板1上にインクを吐出
するために利用されるエネルギーを発性するエネ
ルギー発生素子(インク吐出圧発生素子)2とし
て熱エネルギーを発生する発熱素子又はピエゾ素
子等を所望の個数配置し、更に必要に応じて電気
絶縁性を付与する目的で、SiO2、Ta2O5、
Al2O3、ガラス、Si3N4、BN等の無機酸化物や無
機窒化物の保護層(不図示)を被覆してもよい。
本発明においては、この基板1に対し主に耐イ
ンク性を向上させる目的で金属からなる保護層3
を被覆する。保護層3を形成する金属としては、
Ti、Cr、Ni、Ta、Mo、W、Nb等の耐食金属や
SUS、モネルメタル等の耐食合金が使用できる。
Au、Pd、Pt等の貴金属は耐インク性はよいが、
後述する金属有機化合物とのマツチング性能が不
十分であるため好ましくない。
このようにして得られた保護層の表面が金属か
らなる第1図の基板は、表面を浄化し、80〜150
℃で10分間乾燥させた後、イソプロピルトリイソ
ステアロイルチタネート(商品名TTS.味の素
KK製、分子構造式
The present invention relates to an inkjet recording head, and more particularly to a method for manufacturing an inkjet recording head for generating recording ink droplets for use in so-called inkjet recording systems. An inkjet recording head applied to an inkjet recording system generally includes a fine ink ejection opening (orifice), an ink passage, and an ink ejection pressure generating section provided in a part of the ink passage. Conventionally, the method for creating such an inkjet recording head is to form fine grooves on a glass or metal plate by cutting or etching, and then combine the plate with the grooves with another suitable plate. A method of forming an ink passage by joining is known. However, in heads manufactured by such conventional methods, the roughness of the inner wall surface of the ink passages to be cut is too large, and distortion occurs in the ink passages due to differences in etching rate. It is difficult to obtain a high quality inkjet recording head, and variations tend to occur in the ink ejection characteristics of the inkjet recording head after manufacture. Further, there is also the problem that the plate is likely to chip or crack during cutting, resulting in poor manufacturing yield. When etching is performed, there is a problem in that there are many manufacturing steps, leading to an increase in manufacturing costs. Furthermore, a problem common to the conventional methods described above is that the grooved plate in which the ink passage grooves are formed is attached to the substrate on which driving elements such as piezoelectric elements and heating elements that generate energy that acts on the ink are provided. At the time of alignment, it is difficult to perform each position alignment with high precision, and mass production is lacking. As a manufacturing method of an ink jet head that can solve these problems, a method of forming ink passage walls with a cured film of a photosensitive resin has been proposed, for example, in Japanese Patent Laid-Open No. 57
-Known from No. 43876. According to this method, the ink passages are microfabricated with high precision, accuracy, and high yield. Furthermore, it can be said to be an excellent method because it is easy to mass-produce and can provide an inexpensive inkjet recording head. However, although the inkjet recording head provided by this improved manufacturing method has solved the above problems, the adhesion between the substrate and the photosensitive resin cured film gradually decreases due to long-term immersion in ink. Minute peeling occurs, which affects the straightness of the ink droplet, that is, the accuracy of the landing point. This has become a major obstacle in recent years as inkjet recording systems are required to provide high resolution image quality with high density nozzles. The present invention has been made in view of the above problems, and
It is an object of the present invention to provide a new method for manufacturing an inkjet recording head that is precise and highly reliable. Another object of the present invention is to provide a method for manufacturing an inkjet recording head in which the ink passages are microfabricated precisely and faithfully to the design, by a simple method and with a high yield. Another object of the present invention is to provide a method for manufacturing an inkjet recording head that has excellent durability in use. The inkjet recording head manufacturing method of the present invention, which achieves these objects, comprises a substrate, a wall, and a cover provided with a heating element that generates thermal energy used to eject ink from an ejection port. In the method for manufacturing an inkjet recording head in which an ink passage communicating with the ejection port is provided, a layer made of a corrosion-resistant metal and a corrosion-resistant alloy excluding noble metals is applied as a protective layer to a heat-generating element on a substrate provided with the heat-generating element. a step of treating the surface of the protective layer with one or more metal organic compounds selected from the group consisting of metal alcoholates, metal acylates, and metal chelate compounds; The method is characterized by comprising the steps of: forming a wall of the ink passage using a photosensitive resin. Hereinafter, the present invention will be explained in detail based on the drawings. 1 to 6 are schematic diagrams illustrating the manufacturing process of an inkjet recording head according to the method of the present invention. In the process shown in FIG. 1, an energy generating element (ink ejection pressure generating element) 2 that generates energy used to eject ink onto a substrate 1 made of glass, ceramic, plastic, or metal is used to generate thermal energy. SiO 2 , Ta 2 O 5 ,
A protective layer (not shown) of inorganic oxide or inorganic nitride such as Al 2 O 3 , glass, Si 3 N 4 or BN may be coated. In the present invention, a protective layer 3 made of metal is provided on the substrate 1 mainly for the purpose of improving ink resistance.
Cover. The metal forming the protective layer 3 is as follows:
Corrosion-resistant metals such as Ti, Cr, Ni, Ta, Mo, W, and Nb
Corrosion-resistant alloys such as SUS and Monel metal can be used.
Precious metals such as Au, Pd, and Pt have good ink resistance, but
This is not preferred because the matching performance with the metal organic compound described below is insufficient. The thus obtained substrate of FIG.
After drying for 10 minutes at
Made by KK, molecular structure formula
【式】)のトルエ
ン1%溶液を1000〜6000rpmでスピンナーコート
し、基板上に均一に塗布して薄膜を形成し、80℃
で10分間加熱乾燥して溶剤を飛散させる。
本発明方法においては、金属保護層の上に、上
記イソプロピルトリイソステアロイルチタネート
以外に、金属アルコラート、金属アシレート及び
金属キレート化合物から成る群より選ばれた1種
以上の金属有機化合物が使用できる。これら金属
有機化合物を構成する金属としては、アルミニウ
ム、ジルコニウム、コバルト、チタンなどが好ま
しく、他の金属でも効果が認められるが価格、毒
性の面から問題がある。金属アルコラートにはエ
チラート、プロピラート、ブチラートなどがあ
り、工業的に入手しやすい金属アルコラートはア
ルミニウムイソプロピラート、チタニウムイソプ
ロピラート、ジルコニウムターシヤリーブチラー
トなどがある。またそのキレート化合物として
は、これらの金属アルコラートを一般に知られて
いるアセチルアセトン、3−エチルアセチルアセ
トン、3−フエニルアセチルアセトン、3−メト
キシアセチルアセトン、ジベンゾイルアセトン、
メトキシカルボニウムアセトンなどのキレート化
剤と反応して得られるものである。
金属有機化合物は、使用する感光性樹脂の組成
に応じ、感光性樹脂と反応する官能基を有する金
属有機化合物を選択して使用することが好まし
い。これら金属有機化合物の代表的なものを表1
〜4に金属別にまとめて示す。Spinner coat a 1% toluene solution of [Formula]) at 1000 to 6000 rpm, apply it uniformly on the substrate to form a thin film, and then apply it at 80°C.
Heat and dry for 10 minutes to scatter the solvent. In the method of the present invention, in addition to the isopropyl triisostearoyl titanate, one or more metal organic compounds selected from the group consisting of metal alcoholates, metal acylates, and metal chelate compounds can be used on the metal protective layer. The metals constituting these metal-organic compounds are preferably aluminum, zirconium, cobalt, titanium, etc. Other metals are also effective, but have problems in terms of cost and toxicity. Metal alcoholates include ethylate, propylate, butyrate, etc., and industrially easily available metal alcoholates include aluminum isopropylate, titanium isopropylate, and zirconium tert-butyrate. Chelate compounds of these metal alcoholates include generally known acetylacetone, 3-ethylacetylacetone, 3-phenylacetylacetone, 3-methoxyacetylacetone, dibenzoylacetone,
It is obtained by reacting with a chelating agent such as methoxycarbonium acetone. As the metal organic compound, it is preferable to select and use a metal organic compound having a functional group that reacts with the photosensitive resin, depending on the composition of the photosensitive resin used. Table 1 lists representative examples of these metal-organic compounds.
-4 are summarized by metal.
【表】【table】
【表】【table】
【表】【table】
【表】【table】
【表】【table】
【表】
このようにして金属有機化合物で表面を処理し
た基板に対し、次いで80℃〜105℃程度に加温さ
れた感光性樹脂であるドライフイルムフオトレジ
スト5(膜厚、約25μm〜100μm)を0.5〜0.4f/
分の速度、1〜3Kg/cm2の加圧条件下でラミネー
トする。この時、ドライフイルムフオトレジスト
5は自己接着性を示して基板1の表面に融着して
固定され、以後相当の外力が加わつた場合にも基
板1から剥離することはない。
続いて、第3図に示す様に、基板面に設けたド
ライフイルムフオトレジスト5上に所定のパター
ンを有するフオトマスク6を重ね合わせた後、こ
のフオトマスク6の上部から露光を行う。このと
き、インク吐出圧発生素子2の設置位置と上記パ
ターンの位置合わせを公知の手法で行つておく必
要がある。
第4図は、上記露光済みのドライフイルムフオ
トレジスト5の未露光部分をトリクロルエタン等
の所定の有機溶剤から成る現像液にて溶解除去し
た工程を示す説明図で、インク通路9が形成され
る。
次に基板1に残されたドライフイルムフオトレ
ジストの露光された部分5Pの耐インク性向上、
及びドライフイルムフオトレズストとイソプロピ
ルトリイソステアロイルチタネート層を介した基
板との密着力をより高めるため熱硬化処理(例え
ば150〜250℃で30分〜6時間加熱)又は、紫外線
照射(例えば50〜200mW/cm2又はそれ以上の紫
外線強度で)を行う。上記熱硬化と紫外線による
硬化の両方を兼用するのも効果的である。
ところで、使用したイソプロピルトリイソステ
アロイルチタネート層が溝9内に残存すると、イ
ンク中に溶出してインクを変質させたり、あるい
はインク吐出圧発生素子2の機能を損う恐れがあ
るので、溝9内に露出しているイソプロピルトリ
イソステアロイルチタネート層は、酸素プラズマ
によつて灰化させることなどにより除去すること
が好ましい(第5図)。
第6図は、上記の充分な重合を終え硬化したド
ライフイルムフオトレジスト5Pでインク通路と
なる溝9の形成された基板1に覆いとなる平板8
を接着剤層7で接着するか単に圧着して固定した
ところを示す図であるが、接着剤を用いずに圧着
によつて固定してもよい。
第6図に示す工程に於いて、覆いを付設する具
体的方法としては、
(1) ガラス、セラミツク、金属、プラスチツク等
の平板8にエポキシ系接着剤を厚さ3〜4μm
にスピンナーコートした後、予備加熱して接着
剤7を所謂Bステージ化させ、これを硬化した
フオトレジスト膜5P上に貼り合わせて前記接
着剤を本硬化させる。或は、
(2) アクリル系樹脂、ABS樹脂、ポリエチレン
等の熱可塑性樹脂の平板8を硬化したフオトレ
ジスト膜5P上に、直接、熱融着させる方法が
ある。
ここで、第6図示の工程終了後のインクジエツ
ト記録ヘツド外観を第7図に、模式的斜視図で示
す。第7図中、9−1はインク供給室、9−2は
インク細流路、10はインク供給室9−1に不図
示のインク供給管を連結させるための貫通孔を示
している。
以上のとおり、溝を形成した基板と平板との接
合が完了した後、第7図のC−C′線に沿つて切断
する。これは、インク細流路9−2に於いて、イ
ンク吐出圧発生素子2とインク吐出口9−3との
間隔を最適化するために行うものであり、ここで
切断する領域は適宜決定される。この切断に際し
ては、半導体工業で通常採用されているダイシン
グ法が採用される。
第8図は第7図のZ−Z′線切断面図である。そ
して、切断面を研磨して平滑化し、貫通孔10に
インク供給管11を取り付けてインクジエツト記
録ヘツドが完成する(第9図)。
以上、図面に基づいて説明した実施例に於いて
は、溝作成用の感光性組成物(フオトレジスト)
としてはドライフイルムタイプ、つまり固体のも
のを利用したが、本発明ではこれのみに限定され
るものではなく、液状の感光性組成物も勿論利用
することができる。そして、基板上へのこの感光
性組成物塗膜の形成法として、液体の場合にはレ
リーフ画像の製作時に用いられるスキージによる
方法、すなわち所望の感光性組成物膜厚に応じた
高さの壁を基板の周囲におき、スキージによつて
余分の組成物を除去する方法が適用できる。この
場合感光性組成物の粘度は100CP〜300CPの範囲
が好ましく、壁の高さは感光性組成物の溶剤分の
蒸発の減量を見込んで決定する必要がある。
他方、固体の場合は、感光性組成物シートを基
板上に加熱圧着して貼着する。尚、本発明に於い
ては、その取扱い上、及び厚さの制御が容易且つ
正確にできる点で、固体のフイルムタイプのもの
を利用する方が有利ではある。このような固体の
ものとしては、例えば、デユポン社製パーマネン
トフオトポリマーコーテイングRISTON(ソルダ
ーマスク)730S、同740S、同730FR、同740FR、
同SM/等の商品名で市販されている感光性樹脂
がある。この他、本発明において使用できる感光
性組成物としては、感光性樹脂、フオトレジスト
等の通常のフオトリソグラフイーの分野において
使用されている感光性組成物の多くのものが挙げ
られ、例えば、ジアゾレジン、P−ジアゾキノ
ン、更には例えばビニルモノマーと重合開始剤を
使用する光重合型フオトポリマー、ポリビニルシ
ンナメート等と増感剤を使用する二量化型フオト
ポリマー、オルソナフトキノンジアジドとノボラ
ツクタイプのフエノール樹脂との混合物、ポリビ
ニルアルコールとジアゾ樹脂の混合物、4−グリ
シジルエチレンオキシドとベンゾフエノンやグリ
シジルカルコンとを共重合させたポリエーテル型
フオトポリマー、N,N−ジメチルメタクリルア
ミドと例えばアクリルアミドベンゾフエノンとの
共重合体、不飽和ポリエステル系感光性樹脂〔例
えばAPR(旭化成)、テビスタ(帝人)、ゾンネ
(関西ペイント)等〕、不飽和ウレタンオリゴマー
系感光性樹脂、二官能アクリルモノマーに光重合
開始剤とポリマーとを混合した感光性組成物、重
クロム酸系フオトレジスト、非クロム系水溶性フ
オトレジスト、ポリケイ皮酸ビニル系フオトレジ
スト、環化ゴム−アジド系フオトレジスト等が挙
げられる。
以上詳しく説明した本発明の効果としては、次
のようなことがあげられる。
1 基板と感光性樹脂の接着が増したことによ
り、特に衝撃のかかるインク吐出口形成の切断
によつても基板からの感光性樹脂の剥れがなく
なつた。
2 接着部の耐溶剤性が向上し、エチレングリコ
ール等の溶剤を含むインクの使用によつても基
板と感光性樹脂硬化膜の通路壁が剥離すること
がなくなつた。
3 インク吐出口の形状安定性が高いため、経時
的なインク着弾点精度が高い。[Table] Dry film photoresist 5 (film thickness, approximately 25 μm to 100 μm), which is a photosensitive resin, is then heated to approximately 80°C to 105°C on the substrate whose surface has been treated with a metal-organic compound in this manner. 0.5~0.4f/
Laminate at a speed of 1 minute under pressure conditions of 1-3 Kg/ cm2 . At this time, the dry film photoresist 5 exhibits self-adhesion and is fused and fixed to the surface of the substrate 1, and will not peel off from the substrate 1 even if a considerable external force is applied thereafter. Subsequently, as shown in FIG. 3, a photomask 6 having a predetermined pattern is superimposed on the dry film photoresist 5 provided on the substrate surface, and then the photomask 6 is exposed to light from above. At this time, it is necessary to align the installation position of the ink ejection pressure generating element 2 and the pattern using a known method. FIG. 4 is an explanatory diagram showing a process in which the unexposed portions of the exposed dry film photoresist 5 are dissolved and removed using a developer made of a predetermined organic solvent such as trichloroethane, and an ink passage 9 is formed. . Next, the ink resistance of the exposed portion 5P of the dry film photoresist left on the substrate 1 is improved;
In order to further increase the adhesion between the dry film photoresist and the substrate through the isopropyltriisostearoyl titanate layer, heat curing treatment (for example, heating at 150 to 250°C for 30 minutes to 6 hours) or ultraviolet irradiation (for example, heating at 150 to 250°C for 30 minutes to 6 hours) (with an ultraviolet intensity of 200 mW/cm 2 or higher). It is also effective to use both the above-mentioned heat curing and ultraviolet curing. By the way, if the used isopropyl triisostearoyl titanate layer remains in the groove 9, it may dissolve into the ink and change the quality of the ink, or the function of the ink ejection pressure generating element 2 may be impaired. The exposed isopropyl triisostearoyl titanate layer is preferably removed by ashing with oxygen plasma or the like (FIG. 5). FIG. 6 shows a flat plate 8 serving as a cover on a substrate 1 in which grooves 9 serving as ink passages are formed using dry film photoresist 5P that has been cured after sufficient polymerization.
Although this figure shows a state in which the parts are fixed by adhering with an adhesive layer 7 or simply by pressure bonding, they may be fixed by pressure bonding without using an adhesive. In the process shown in Figure 6, the specific method for attaching the cover is as follows: (1) Apply epoxy adhesive to a thickness of 3 to 4 μm on a flat plate 8 made of glass, ceramic, metal, plastic, etc.
After spinner coating, the adhesive 7 is preheated to a so-called B stage, and this is bonded onto the cured photoresist film 5P to fully cure the adhesive. Alternatively, (2) there is a method of directly heat-sealing a flat plate 8 of thermoplastic resin such as acrylic resin, ABS resin, polyethylene, etc. onto the hardened photoresist film 5P. FIG. 7 is a schematic perspective view of the appearance of the inkjet recording head after the process shown in FIG. 6 is completed. In FIG. 7, reference numeral 9-1 indicates an ink supply chamber, 9-2 indicates an ink narrow flow path, and 10 indicates a through hole for connecting an ink supply pipe (not shown) to the ink supply chamber 9-1. After the substrate in which the grooves are formed and the flat plate are bonded together as described above, the substrate is cut along the line CC' in FIG. This is done to optimize the distance between the ink ejection pressure generating element 2 and the ink ejection port 9-3 in the ink narrow flow path 9-2, and the area to be cut here is determined as appropriate. . For this cutting, a dicing method commonly used in the semiconductor industry is used. FIG. 8 is a sectional view taken along the line Z--Z' in FIG. 7. Then, the cut surface is polished to make it smooth, and the ink supply tube 11 is attached to the through hole 10 to complete the inkjet recording head (FIG. 9). In the embodiments described above based on the drawings, a photosensitive composition (photoresist) for creating grooves was used.
Although a dry film type, that is, a solid composition was used, the present invention is not limited to this, and a liquid photosensitive composition can of course also be used. In the case of a liquid, the method of forming the photosensitive composition coating film on the substrate is a method using a squeegee, which is used when producing a relief image, that is, a method of forming a coating film of the photosensitive composition on the substrate, that is, a method using a squeegee that is used when producing a relief image, that is, a wall of a height corresponding to the desired thickness of the photosensitive composition film. An applicable method is to place the composition around the substrate and remove the excess composition using a squeegee. In this case, the viscosity of the photosensitive composition is preferably in the range of 100 CP to 300 CP, and the height of the wall must be determined by taking into account the reduction in evaporation of the solvent component of the photosensitive composition. On the other hand, in the case of a solid, the photosensitive composition sheet is attached to the substrate by heat-pressing. In the present invention, it is advantageous to use a solid film type material in terms of its handling and the fact that the thickness can be easily and accurately controlled. Examples of such solid materials include Dupont's permanent photopolymer coating RISTON (solder mask) 730S, 740S, 730FR, 740FR,
There are photosensitive resins commercially available under product names such as SM/. In addition, photosensitive compositions that can be used in the present invention include many photosensitive compositions used in the field of ordinary photolithography, such as photosensitive resins and photoresists, such as diazoresin, , P-diazoquinone, as well as photopolymerizable photopolymers using a vinyl monomer and a polymerization initiator, dimerized photopolymers using polyvinyl cinnamate, etc. and a sensitizer, orthonaphthoquinonediazide and novolac type phenolic resins. mixtures of polyvinyl alcohol and diazo resins, polyether type photopolymers obtained by copolymerizing 4-glycidyl ethylene oxide with benzophenone or glycidyl chalcone, copolymers of N,N-dimethyl methacrylamide with e.g. acrylamide benzophenone. A combination of unsaturated polyester photosensitive resins (e.g. APR (Asahi Kasei), Tevista (Teijin), Sonne (Kansai Paint), etc.), unsaturated urethane oligomer photosensitive resins, difunctional acrylic monomers, photopolymerization initiators and polymers. photoresists, dichromate-based photoresists, non-chromium-based water-soluble photoresists, polyvinyl cinnamate-based photoresists, cyclized rubber-azide-based photoresists, and the like. The effects of the present invention described in detail above include the following. 1. Due to the increased adhesion between the substrate and the photosensitive resin, the photosensitive resin no longer peels off from the substrate even when cutting the ink ejection port formation, which is particularly impactful. 2. The solvent resistance of the bonded portion has been improved, and the passage wall between the substrate and the photosensitive resin cured film no longer peels off even when ink containing a solvent such as ethylene glycol is used. 3. Since the shape stability of the ink ejection port is high, the accuracy of the ink landing point over time is high.
第1図乃至第6図は本発明のインクジエツト記
録ヘツドの製造工程を示す模式図である。第7図
は本発明方法により得られたインクジエツト記録
ヘツドの斜視図で、第8図及び第9図は断面図で
ある。
1:基板、2:インク吐出圧発生素子、3:保
護層、4:金属有機化合物層、5:感光性樹脂、
5P:インク通路壁、6:フオトマスク、7:接
着剤層、8:覆い、9:溝、9−1:インク供給
室、9−2:インク細流路、10:貫通孔、1
1:インク供給管。
1 to 6 are schematic diagrams showing the manufacturing process of the inkjet recording head of the present invention. FIG. 7 is a perspective view of an inkjet recording head obtained by the method of the present invention, and FIGS. 8 and 9 are sectional views. 1: Substrate, 2: Ink ejection pressure generating element, 3: Protective layer, 4: Metal organic compound layer, 5: Photosensitive resin,
5P: Ink passage wall, 6: Photomask, 7: Adhesive layer, 8: Cover, 9: Groove, 9-1: Ink supply chamber, 9-2: Ink narrow channel, 10: Through hole, 1
1: Ink supply pipe.
Claims (1)
る熱エネルギーを発生する発熱素子が設けられた
基板と壁と覆いとによつて、前記吐出口に連通す
るインク通路が設けられているインクジエツト記
録ヘツドの製造方法において、 貴金属を除く耐食金属及び耐食合金からなる層
を、前記発熱素子の保護層として前記発熱素子の
設けられた前記基板上に設ける工程と、 前記保護層の表面を金属アルコラート、金属ア
シレート、及び金属キレート化合物から成る群よ
り選ばれた一種類以上の金属有機化合物で処理す
る工程と、 前記金属有機化合物で処理された保護層上に感
光性樹脂を用いて前記インク通路の前記壁を形成
する工程と、 を有することを特徴とするインクジエツト記録ヘ
ツドの製造方法。[Scope of Claims] 1. An ink passage communicating with the ejection port is provided by a substrate, a wall, and a cover provided with a heating element that generates thermal energy used to eject ink from the ejection port. A method of manufacturing an inkjet recording head according to the present invention includes the steps of: providing a layer made of a corrosion-resistant metal and a corrosion-resistant alloy other than noble metals as a protective layer for the heating element on the substrate on which the heating element is provided; a step of treating the surface with one or more metal organic compounds selected from the group consisting of metal alcoholates, metal acylates, and metal chelate compounds; and using a photosensitive resin on the protective layer treated with the metal organic compound. A method of manufacturing an inkjet recording head, comprising: forming the wall of the ink passage.
Priority Applications (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP11066882A JPS591269A (en) | 1982-06-29 | 1982-06-29 | Manufacture of ink jet recording head |
| DE19833322647 DE3322647A1 (en) | 1982-06-25 | 1983-06-23 | Method of producing an ink-jet recording head |
| US06/634,439 US4609427A (en) | 1982-06-25 | 1984-07-26 | Method for producing ink jet recording head |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP11066882A JPS591269A (en) | 1982-06-29 | 1982-06-29 | Manufacture of ink jet recording head |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS591269A JPS591269A (en) | 1984-01-06 |
| JPH0415102B2 true JPH0415102B2 (en) | 1992-03-16 |
Family
ID=14541432
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP11066882A Granted JPS591269A (en) | 1982-06-25 | 1982-06-29 | Manufacture of ink jet recording head |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS591269A (en) |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH064333B2 (en) * | 1984-03-31 | 1994-01-19 | キヤノン株式会社 | Method for manufacturing ink jet recording head |
-
1982
- 1982-06-29 JP JP11066882A patent/JPS591269A/en active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS591269A (en) | 1984-01-06 |
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