JPH0416098B2 - - Google Patents
Info
- Publication number
- JPH0416098B2 JPH0416098B2 JP20527983A JP20527983A JPH0416098B2 JP H0416098 B2 JPH0416098 B2 JP H0416098B2 JP 20527983 A JP20527983 A JP 20527983A JP 20527983 A JP20527983 A JP 20527983A JP H0416098 B2 JPH0416098 B2 JP H0416098B2
- Authority
- JP
- Japan
- Prior art keywords
- group
- substituted
- developer
- alkyl group
- present
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 150000001875 compounds Chemical class 0.000 claims description 34
- -1 silver halide Chemical class 0.000 claims description 31
- 238000000034 method Methods 0.000 claims description 29
- 239000000839 emulsion Substances 0.000 claims description 24
- 229910052709 silver Inorganic materials 0.000 claims description 22
- 239000004332 silver Substances 0.000 claims description 22
- 125000000217 alkyl group Chemical group 0.000 claims description 21
- 239000003795 chemical substances by application Substances 0.000 claims description 18
- 125000000542 sulfonic acid group Chemical group 0.000 claims description 15
- QIGBRXMKCJKVMJ-UHFFFAOYSA-N Hydroquinone Chemical compound OC1=CC=C(O)C=C1 QIGBRXMKCJKVMJ-UHFFFAOYSA-N 0.000 claims description 14
- 125000003178 carboxy group Chemical group [H]OC(*)=O 0.000 claims description 14
- 238000012545 processing Methods 0.000 claims description 14
- 125000004432 carbon atom Chemical group C* 0.000 claims description 11
- 239000000463 material Substances 0.000 claims description 10
- 125000003118 aryl group Chemical group 0.000 claims description 8
- 239000000084 colloidal system Substances 0.000 claims description 6
- LSNNMFCWUKXFEE-UHFFFAOYSA-L sulfite Chemical compound [O-]S([O-])=O LSNNMFCWUKXFEE-UHFFFAOYSA-L 0.000 claims description 6
- WSGURAYTCUVDQL-UHFFFAOYSA-N 5-nitro-1h-indazole Chemical compound [O-][N+](=O)C1=CC=C2NN=CC2=C1 WSGURAYTCUVDQL-UHFFFAOYSA-N 0.000 claims description 5
- 125000005843 halogen group Chemical group 0.000 claims description 5
- 125000004435 hydrogen atom Chemical group [H]* 0.000 claims description 5
- 125000001931 aliphatic group Chemical group 0.000 claims description 4
- ORZRMRUXSPNQQL-UHFFFAOYSA-N 6-nitro-1h-indazole Chemical compound [O-][N+](=O)C1=CC=C2C=NNC2=C1 ORZRMRUXSPNQQL-UHFFFAOYSA-N 0.000 claims description 3
- 239000003513 alkali Substances 0.000 claims description 3
- 229920000233 poly(alkylene oxides) Polymers 0.000 description 19
- 108010010803 Gelatin Proteins 0.000 description 13
- 229920000159 gelatin Polymers 0.000 description 13
- 239000008273 gelatin Substances 0.000 description 13
- 235000019322 gelatine Nutrition 0.000 description 13
- 235000011852 gelatine desserts Nutrition 0.000 description 13
- 239000000975 dye Substances 0.000 description 11
- 150000003839 salts Chemical class 0.000 description 11
- 238000011161 development Methods 0.000 description 10
- 230000018109 developmental process Effects 0.000 description 10
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 10
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 description 9
- 206010070834 Sensitisation Diseases 0.000 description 8
- 239000010410 layer Substances 0.000 description 8
- 239000000203 mixture Substances 0.000 description 8
- 230000008313 sensitization Effects 0.000 description 8
- 239000000243 solution Substances 0.000 description 8
- 239000000126 substance Substances 0.000 description 8
- 230000015572 biosynthetic process Effects 0.000 description 7
- 229920001515 polyalkylene glycol Polymers 0.000 description 7
- 238000003786 synthesis reaction Methods 0.000 description 7
- KWYUFKZDYYNOTN-UHFFFAOYSA-M Potassium hydroxide Chemical compound [OH-].[K+] KWYUFKZDYYNOTN-UHFFFAOYSA-M 0.000 description 6
- 239000002253 acid Substances 0.000 description 6
- CMCWWLVWPDLCRM-UHFFFAOYSA-N phenidone Chemical class N1C(=O)CCN1C1=CC=CC=C1 CMCWWLVWPDLCRM-UHFFFAOYSA-N 0.000 description 6
- 230000001235 sensitizing effect Effects 0.000 description 6
- VZGDMQKNWNREIO-UHFFFAOYSA-N tetrachloromethane Chemical compound ClC(Cl)(Cl)Cl VZGDMQKNWNREIO-UHFFFAOYSA-N 0.000 description 6
- WZCQRUWWHSTZEM-UHFFFAOYSA-N 1,3-phenylenediamine Chemical compound NC1=CC=CC(N)=C1 WZCQRUWWHSTZEM-UHFFFAOYSA-N 0.000 description 5
- PLIKAWJENQZMHA-UHFFFAOYSA-N 4-aminophenol Chemical class NC1=CC=C(O)C=C1 PLIKAWJENQZMHA-UHFFFAOYSA-N 0.000 description 5
- 125000002947 alkylene group Chemical group 0.000 description 5
- 239000013078 crystal Substances 0.000 description 5
- 125000003545 alkoxy group Chemical group 0.000 description 4
- 239000007864 aqueous solution Substances 0.000 description 4
- 229940125904 compound 1 Drugs 0.000 description 4
- 150000002540 isothiocyanates Chemical class 0.000 description 4
- 238000002156 mixing Methods 0.000 description 4
- IOLCXVTUBQKXJR-UHFFFAOYSA-M potassium bromide Chemical compound [K+].[Br-] IOLCXVTUBQKXJR-UHFFFAOYSA-M 0.000 description 4
- BWHMMNNQKKPAPP-UHFFFAOYSA-L potassium carbonate Chemical compound [K+].[K+].[O-]C([O-])=O BWHMMNNQKKPAPP-UHFFFAOYSA-L 0.000 description 4
- 230000035945 sensitivity Effects 0.000 description 4
- QGJOPFRUJISHPQ-UHFFFAOYSA-N Carbon disulfide Chemical compound S=C=S QGJOPFRUJISHPQ-UHFFFAOYSA-N 0.000 description 3
- IAYPIBMASNFSPL-UHFFFAOYSA-N Ethylene oxide Chemical compound C1CO1 IAYPIBMASNFSPL-UHFFFAOYSA-N 0.000 description 3
- KFZMGEQAYNKOFK-UHFFFAOYSA-N Isopropanol Chemical compound CC(C)O KFZMGEQAYNKOFK-UHFFFAOYSA-N 0.000 description 3
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 description 3
- 229910021607 Silver chloride Inorganic materials 0.000 description 3
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 3
- ZMANZCXQSJIPKH-UHFFFAOYSA-N Triethylamine Chemical compound CCN(CC)CC ZMANZCXQSJIPKH-UHFFFAOYSA-N 0.000 description 3
- SJOOOZPMQAWAOP-UHFFFAOYSA-N [Ag].BrCl Chemical compound [Ag].BrCl SJOOOZPMQAWAOP-UHFFFAOYSA-N 0.000 description 3
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 3
- 229910052737 gold Inorganic materials 0.000 description 3
- 239000010931 gold Substances 0.000 description 3
- VLKZOEOYAKHREP-UHFFFAOYSA-N n-Hexane Chemical compound CCCCCC VLKZOEOYAKHREP-UHFFFAOYSA-N 0.000 description 3
- 229910000510 noble metal Inorganic materials 0.000 description 3
- HKZLPVFGJNLROG-UHFFFAOYSA-M silver monochloride Chemical compound [Cl-].[Ag+] HKZLPVFGJNLROG-UHFFFAOYSA-M 0.000 description 3
- OXFSTTJBVAAALW-UHFFFAOYSA-N 1,3-dihydroimidazole-2-thione Chemical class SC1=NC=CN1 OXFSTTJBVAAALW-UHFFFAOYSA-N 0.000 description 2
- LSNNMFCWUKXFEE-UHFFFAOYSA-M Bisulfite Chemical compound OS([O-])=O LSNNMFCWUKXFEE-UHFFFAOYSA-M 0.000 description 2
- 229920002284 Cellulose triacetate Polymers 0.000 description 2
- KCXVZYZYPLLWCC-UHFFFAOYSA-N EDTA Chemical compound OC(=O)CN(CC(O)=O)CCN(CC(O)=O)CC(O)=O KCXVZYZYPLLWCC-UHFFFAOYSA-N 0.000 description 2
- KDLHZDBZIXYQEI-UHFFFAOYSA-N Palladium Chemical compound [Pd] KDLHZDBZIXYQEI-UHFFFAOYSA-N 0.000 description 2
- CDBYLPFSWZWCQE-UHFFFAOYSA-L Sodium Carbonate Chemical compound [Na+].[Na+].[O-]C([O-])=O CDBYLPFSWZWCQE-UHFFFAOYSA-L 0.000 description 2
- FAPWRFPIFSIZLT-UHFFFAOYSA-M Sodium chloride Chemical compound [Na+].[Cl-] FAPWRFPIFSIZLT-UHFFFAOYSA-M 0.000 description 2
- NINIDFKCEFEMDL-UHFFFAOYSA-N Sulfur Chemical compound [S] NINIDFKCEFEMDL-UHFFFAOYSA-N 0.000 description 2
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 2
- NNLVGZFZQQXQNW-ADJNRHBOSA-N [(2r,3r,4s,5r,6s)-4,5-diacetyloxy-3-[(2s,3r,4s,5r,6r)-3,4,5-triacetyloxy-6-(acetyloxymethyl)oxan-2-yl]oxy-6-[(2r,3r,4s,5r,6s)-4,5,6-triacetyloxy-2-(acetyloxymethyl)oxan-3-yl]oxyoxan-2-yl]methyl acetate Chemical compound O([C@@H]1O[C@@H]([C@H]([C@H](OC(C)=O)[C@H]1OC(C)=O)O[C@H]1[C@@H]([C@@H](OC(C)=O)[C@H](OC(C)=O)[C@@H](COC(C)=O)O1)OC(C)=O)COC(=O)C)[C@@H]1[C@@H](COC(C)=O)O[C@@H](OC(C)=O)[C@H](OC(C)=O)[C@H]1OC(C)=O NNLVGZFZQQXQNW-ADJNRHBOSA-N 0.000 description 2
- 230000032683 aging Effects 0.000 description 2
- 150000001412 amines Chemical class 0.000 description 2
- ALYNCZNDIQEVRV-UHFFFAOYSA-N aniline-p-carboxylic acid Natural products NC1=CC=C(C(O)=O)C=C1 ALYNCZNDIQEVRV-UHFFFAOYSA-N 0.000 description 2
- JEHKKBHWRAXMCH-UHFFFAOYSA-N benzenesulfinic acid Chemical compound O[S@@](=O)C1=CC=CC=C1 JEHKKBHWRAXMCH-UHFFFAOYSA-N 0.000 description 2
- 229920001400 block copolymer Polymers 0.000 description 2
- 230000000052 comparative effect Effects 0.000 description 2
- 230000007423 decrease Effects 0.000 description 2
- 150000005205 dihydroxybenzenes Chemical class 0.000 description 2
- 238000009826 distribution Methods 0.000 description 2
- 150000002148 esters Chemical class 0.000 description 2
- 230000001747 exhibiting effect Effects 0.000 description 2
- 125000002887 hydroxy group Chemical group [H]O* 0.000 description 2
- 208000015181 infectious disease Diseases 0.000 description 2
- 230000002458 infectious effect Effects 0.000 description 2
- 239000007788 liquid Substances 0.000 description 2
- 125000001434 methanylylidene group Chemical group [H]C#[*] 0.000 description 2
- 239000002245 particle Substances 0.000 description 2
- 239000012071 phase Substances 0.000 description 2
- 238000000206 photolithography Methods 0.000 description 2
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical compound [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 description 2
- 229910000027 potassium carbonate Inorganic materials 0.000 description 2
- BHZRJJOHZFYXTO-UHFFFAOYSA-L potassium sulfite Chemical compound [K+].[K+].[O-]S([O-])=O BHZRJJOHZFYXTO-UHFFFAOYSA-L 0.000 description 2
- 235000019252 potassium sulphite Nutrition 0.000 description 2
- 125000002924 primary amino group Chemical group [H]N([H])* 0.000 description 2
- 239000011541 reaction mixture Substances 0.000 description 2
- 230000005070 ripening Effects 0.000 description 2
- 125000000467 secondary amino group Chemical group [H]N([*:1])[*:2] 0.000 description 2
- SQGYOTSLMSWVJD-UHFFFAOYSA-N silver(1+) nitrate Chemical compound [Ag+].[O-]N(=O)=O SQGYOTSLMSWVJD-UHFFFAOYSA-N 0.000 description 2
- GEHJYWRUCIMESM-UHFFFAOYSA-L sodium sulfite Chemical compound [Na+].[Na+].[O-]S([O-])=O GEHJYWRUCIMESM-UHFFFAOYSA-L 0.000 description 2
- 125000001424 substituent group Chemical group 0.000 description 2
- 229910052717 sulfur Inorganic materials 0.000 description 2
- 239000011593 sulfur Substances 0.000 description 2
- 150000003464 sulfur compounds Chemical class 0.000 description 2
- 238000001308 synthesis method Methods 0.000 description 2
- 125000001302 tertiary amino group Chemical group 0.000 description 2
- 150000004764 thiosulfuric acid derivatives Chemical class 0.000 description 2
- UMGDCJDMYOKAJW-UHFFFAOYSA-N thiourea Chemical compound NC(N)=S UMGDCJDMYOKAJW-UHFFFAOYSA-N 0.000 description 2
- CNHDIAIOKMXOLK-UHFFFAOYSA-N toluquinol Chemical compound CC1=CC(O)=CC=C1O CNHDIAIOKMXOLK-UHFFFAOYSA-N 0.000 description 2
- 238000005406 washing Methods 0.000 description 2
- YXIWHUQXZSMYRE-UHFFFAOYSA-N 1,3-benzothiazole-2-thiol Chemical class C1=CC=C2SC(S)=NC2=C1 YXIWHUQXZSMYRE-UHFFFAOYSA-N 0.000 description 1
- YHMYGUUIMTVXNW-UHFFFAOYSA-N 1,3-dihydrobenzimidazole-2-thione Chemical class C1=CC=C2NC(S)=NC2=C1 YHMYGUUIMTVXNW-UHFFFAOYSA-N 0.000 description 1
- GGZHVNZHFYCSEV-UHFFFAOYSA-N 1-Phenyl-5-mercaptotetrazole Chemical compound SC1=NN=NN1C1=CC=CC=C1 GGZHVNZHFYCSEV-UHFFFAOYSA-N 0.000 description 1
- JAAIPIWKKXCNOC-UHFFFAOYSA-N 1h-tetrazol-1-ium-5-thiolate Chemical class SC1=NN=NN1 JAAIPIWKKXCNOC-UHFFFAOYSA-N 0.000 description 1
- HAZJTCQWIDBCCE-UHFFFAOYSA-N 1h-triazine-6-thione Chemical class SC1=CC=NN=N1 HAZJTCQWIDBCCE-UHFFFAOYSA-N 0.000 description 1
- HJKLEAOXCZIMPI-UHFFFAOYSA-N 2,2-diethoxyethanamine Chemical compound CCOC(CN)OCC HJKLEAOXCZIMPI-UHFFFAOYSA-N 0.000 description 1
- YIQBWWVNTNHWEI-UHFFFAOYSA-N 2,2-diethoxyethylthiourea Chemical compound C(C)OC(CNC(=S)N)OCC YIQBWWVNTNHWEI-UHFFFAOYSA-N 0.000 description 1
- DBCKMJVEAUXWJJ-UHFFFAOYSA-N 2,3-dichlorobenzene-1,4-diol Chemical compound OC1=CC=C(O)C(Cl)=C1Cl DBCKMJVEAUXWJJ-UHFFFAOYSA-N 0.000 description 1
- GPASWZHHWPVSRG-UHFFFAOYSA-N 2,5-dimethylbenzene-1,4-diol Chemical compound CC1=CC(O)=C(C)C=C1O GPASWZHHWPVSRG-UHFFFAOYSA-N 0.000 description 1
- HIGSPBFIOSHWQG-UHFFFAOYSA-N 2-Isopropyl-1,4-benzenediol Chemical compound CC(C)C1=CC(O)=CC=C1O HIGSPBFIOSHWQG-UHFFFAOYSA-N 0.000 description 1
- JKFYKCYQEWQPTM-UHFFFAOYSA-N 2-azaniumyl-2-(4-fluorophenyl)acetate Chemical compound OC(=O)C(N)C1=CC=C(F)C=C1 JKFYKCYQEWQPTM-UHFFFAOYSA-N 0.000 description 1
- PHPYXVIHDRDPDI-UHFFFAOYSA-N 2-bromo-1h-benzimidazole Chemical class C1=CC=C2NC(Br)=NC2=C1 PHPYXVIHDRDPDI-UHFFFAOYSA-N 0.000 description 1
- REFDOIWRJDGBHY-UHFFFAOYSA-N 2-bromobenzene-1,4-diol Chemical compound OC1=CC=C(O)C(Br)=C1 REFDOIWRJDGBHY-UHFFFAOYSA-N 0.000 description 1
- AYPSHJCKSDNETA-UHFFFAOYSA-N 2-chloro-1h-benzimidazole Chemical class C1=CC=C2NC(Cl)=NC2=C1 AYPSHJCKSDNETA-UHFFFAOYSA-N 0.000 description 1
- KRTDQDCPEZRVGC-UHFFFAOYSA-N 2-nitro-1h-benzimidazole Chemical class C1=CC=C2NC([N+](=O)[O-])=NC2=C1 KRTDQDCPEZRVGC-UHFFFAOYSA-N 0.000 description 1
- JSIAIROWMJGMQZ-UHFFFAOYSA-N 2h-triazol-4-amine Chemical class NC1=CNN=N1 JSIAIROWMJGMQZ-UHFFFAOYSA-N 0.000 description 1
- CBHTTYDJRXOHHL-UHFFFAOYSA-N 2h-triazolo[4,5-c]pyridazine Chemical class N1=NC=CC2=C1N=NN2 CBHTTYDJRXOHHL-UHFFFAOYSA-N 0.000 description 1
- OWIRCRREDNEXTA-UHFFFAOYSA-N 3-nitro-1h-indazole Chemical class C1=CC=C2C([N+](=O)[O-])=NNC2=C1 OWIRCRREDNEXTA-UHFFFAOYSA-N 0.000 description 1
- OCVLSHAVSIYKLI-UHFFFAOYSA-N 3h-1,3-thiazole-2-thione Chemical class SC1=NC=CS1 OCVLSHAVSIYKLI-UHFFFAOYSA-N 0.000 description 1
- AJKLCDRWGVLVSH-UHFFFAOYSA-N 4,4-bis(hydroxymethyl)-1-phenylpyrazolidin-3-one Chemical compound N1C(=O)C(CO)(CO)CN1C1=CC=CC=C1 AJKLCDRWGVLVSH-UHFFFAOYSA-N 0.000 description 1
- NYYSPVRERVXMLJ-UHFFFAOYSA-N 4,4-difluorocyclohexan-1-one Chemical compound FC1(F)CCC(=O)CC1 NYYSPVRERVXMLJ-UHFFFAOYSA-N 0.000 description 1
- SJSJAWHHGDPBOC-UHFFFAOYSA-N 4,4-dimethyl-1-phenylpyrazolidin-3-one Chemical compound N1C(=O)C(C)(C)CN1C1=CC=CC=C1 SJSJAWHHGDPBOC-UHFFFAOYSA-N 0.000 description 1
- ZNFFXFYIHZSXFP-UHFFFAOYSA-N 4-(2-sulfanylidene-1h-imidazol-3-yl)benzoic acid Chemical compound C1=CC(C(=O)O)=CC=C1N1C(=S)NC=C1 ZNFFXFYIHZSXFP-UHFFFAOYSA-N 0.000 description 1
- ZFIQGRISGKSVAG-UHFFFAOYSA-N 4-methylaminophenol Chemical compound CNC1=CC=C(O)C=C1 ZFIQGRISGKSVAG-UHFFFAOYSA-N 0.000 description 1
- UTMDJGPRCLQPBT-UHFFFAOYSA-N 4-nitro-1h-1,2,3-benzotriazole Chemical class [O-][N+](=O)C1=CC=CC2=NNN=C12 UTMDJGPRCLQPBT-UHFFFAOYSA-N 0.000 description 1
- LRUDIIUSNGCQKF-UHFFFAOYSA-N 5-methyl-1H-benzotriazole Chemical compound C1=C(C)C=CC2=NNN=C21 LRUDIIUSNGCQKF-UHFFFAOYSA-N 0.000 description 1
- GIQKIFWTIQDQMM-UHFFFAOYSA-N 5h-1,3-oxazole-2-thione Chemical compound S=C1OCC=N1 GIQKIFWTIQDQMM-UHFFFAOYSA-N 0.000 description 1
- KHBQMWCZKVMBLN-UHFFFAOYSA-N Benzenesulfonamide Chemical class NS(=O)(=O)C1=CC=CC=C1 KHBQMWCZKVMBLN-UHFFFAOYSA-N 0.000 description 1
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 1
- OKTJSMMVPCPJKN-OUBTZVSYSA-N Carbon-13 Chemical compound [13C] OKTJSMMVPCPJKN-OUBTZVSYSA-N 0.000 description 1
- WHXSMMKQMYFTQS-UHFFFAOYSA-N Lithium Chemical compound [Li] WHXSMMKQMYFTQS-UHFFFAOYSA-N 0.000 description 1
- 101150006989 NDEL1 gene Proteins 0.000 description 1
- 229920003171 Poly (ethylene oxide) Polymers 0.000 description 1
- 239000002202 Polyethylene glycol Substances 0.000 description 1
- ZLMJMSJWJFRBEC-UHFFFAOYSA-N Potassium Chemical compound [K] ZLMJMSJWJFRBEC-UHFFFAOYSA-N 0.000 description 1
- GOOHAUXETOMSMM-UHFFFAOYSA-N Propylene oxide Chemical compound CC1CO1 GOOHAUXETOMSMM-UHFFFAOYSA-N 0.000 description 1
- 229910021612 Silver iodide Inorganic materials 0.000 description 1
- PMZURENOXWZQFD-UHFFFAOYSA-L Sodium Sulfate Chemical compound [Na+].[Na+].[O-]S([O-])(=O)=O PMZURENOXWZQFD-UHFFFAOYSA-L 0.000 description 1
- VMHLLURERBWHNL-UHFFFAOYSA-M Sodium acetate Chemical compound [Na+].CC([O-])=O VMHLLURERBWHNL-UHFFFAOYSA-M 0.000 description 1
- DWAQJAXMDSEUJJ-UHFFFAOYSA-M Sodium bisulfite Chemical compound [Na+].OS([O-])=O DWAQJAXMDSEUJJ-UHFFFAOYSA-M 0.000 description 1
- LSNNMFCWUKXFEE-UHFFFAOYSA-N Sulfurous acid Chemical compound OS(O)=O LSNNMFCWUKXFEE-UHFFFAOYSA-N 0.000 description 1
- GSEJCLTVZPLZKY-UHFFFAOYSA-N Triethanolamine Chemical compound OCCN(CCO)CCO GSEJCLTVZPLZKY-UHFFFAOYSA-N 0.000 description 1
- XSQUKJJJFZCRTK-UHFFFAOYSA-N Urea Natural products NC(N)=O XSQUKJJJFZCRTK-UHFFFAOYSA-N 0.000 description 1
- DHKHKXVYLBGOIT-UHFFFAOYSA-N acetaldehyde Diethyl Acetal Natural products CCOC(C)OCC DHKHKXVYLBGOIT-UHFFFAOYSA-N 0.000 description 1
- RUSUZAGBORAKPY-UHFFFAOYSA-N acetic acid;n'-[2-(2-aminoethylamino)ethyl]ethane-1,2-diamine Chemical compound CC(O)=O.CC(O)=O.CC(O)=O.CC(O)=O.CC(O)=O.CC(O)=O.NCCNCCNCCN RUSUZAGBORAKPY-UHFFFAOYSA-N 0.000 description 1
- 150000001299 aldehydes Chemical class 0.000 description 1
- 150000008431 aliphatic amides Chemical class 0.000 description 1
- 125000004453 alkoxycarbonyl group Chemical group 0.000 description 1
- 125000002877 alkyl aryl group Chemical group 0.000 description 1
- 125000004448 alkyl carbonyl group Chemical group 0.000 description 1
- 150000005215 alkyl ethers Chemical class 0.000 description 1
- 125000004390 alkyl sulfonyl group Chemical group 0.000 description 1
- 125000005332 alkyl sulfoxy group Chemical group 0.000 description 1
- 125000004414 alkyl thio group Chemical group 0.000 description 1
- AZDRQVAHHNSJOQ-UHFFFAOYSA-N alumane Chemical class [AlH3] AZDRQVAHHNSJOQ-UHFFFAOYSA-N 0.000 description 1
- 125000004397 aminosulfonyl group Chemical group NS(=O)(=O)* 0.000 description 1
- 239000002280 amphoteric surfactant Substances 0.000 description 1
- 125000000129 anionic group Chemical group 0.000 description 1
- 229920006318 anionic polymer Polymers 0.000 description 1
- 239000003945 anionic surfactant Substances 0.000 description 1
- 125000005129 aryl carbonyl group Chemical group 0.000 description 1
- 150000008378 aryl ethers Chemical class 0.000 description 1
- 125000005161 aryl oxy carbonyl group Chemical group 0.000 description 1
- 125000004391 aryl sulfonyl group Chemical group 0.000 description 1
- 125000005110 aryl thio group Chemical group 0.000 description 1
- 125000004104 aryloxy group Chemical group 0.000 description 1
- 150000003851 azoles Chemical class 0.000 description 1
- IOJUPLGTWVMSFF-UHFFFAOYSA-N benzothiazole Chemical class C1=CC=C2SC=NC2=C1 IOJUPLGTWVMSFF-UHFFFAOYSA-N 0.000 description 1
- 150000001565 benzotriazoles Chemical class 0.000 description 1
- 239000011230 binding agent Substances 0.000 description 1
- 238000009835 boiling Methods 0.000 description 1
- 244000309464 bull Species 0.000 description 1
- 150000001661 cadmium Chemical class 0.000 description 1
- QPHMMPRFMVERHL-UHFFFAOYSA-N carbamodithioic acid;n,n-diethylethanamine Chemical compound NC([S-])=S.CC[NH+](CC)CC QPHMMPRFMVERHL-UHFFFAOYSA-N 0.000 description 1
- 125000003917 carbamoyl group Chemical group [H]N([H])C(*)=O 0.000 description 1
- 229910052799 carbon Inorganic materials 0.000 description 1
- 125000005521 carbonamide group Chemical group 0.000 description 1
- 125000006297 carbonyl amino group Chemical group [H]N([*:2])C([*:1])=O 0.000 description 1
- 125000002843 carboxylic acid group Chemical group 0.000 description 1
- 125000002091 cationic group Chemical group 0.000 description 1
- ZUIVNYGZFPOXFW-UHFFFAOYSA-N chembl1717603 Chemical compound N1=C(C)C=C(O)N2N=CN=C21 ZUIVNYGZFPOXFW-UHFFFAOYSA-N 0.000 description 1
- AJPXTSMULZANCB-UHFFFAOYSA-N chlorohydroquinone Chemical compound OC1=CC=C(O)C(Cl)=C1 AJPXTSMULZANCB-UHFFFAOYSA-N 0.000 description 1
- 150000001844 chromium Chemical class 0.000 description 1
- 239000011248 coating agent Substances 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- 239000002131 composite material Substances 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 238000001816 cooling Methods 0.000 description 1
- 235000014113 dietary fatty acids Nutrition 0.000 description 1
- ZBCBWPMODOFKDW-UHFFFAOYSA-N diethanolamine Chemical compound OCCNCCO ZBCBWPMODOFKDW-UHFFFAOYSA-N 0.000 description 1
- 150000002012 dioxanes Chemical class 0.000 description 1
- 239000006185 dispersion Substances 0.000 description 1
- 238000001035 drying Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 150000002170 ethers Chemical class 0.000 description 1
- MLOJHUCMCKBDLV-UHFFFAOYSA-N ethyl 4-isothiocyanatobenzoate Chemical compound CCOC(=O)C1=CC=C(N=C=S)C=C1 MLOJHUCMCKBDLV-UHFFFAOYSA-N 0.000 description 1
- RIFGWPKJUGCATF-UHFFFAOYSA-N ethyl chloroformate Chemical compound CCOC(Cl)=O RIFGWPKJUGCATF-UHFFFAOYSA-N 0.000 description 1
- 125000004494 ethyl ester group Chemical group 0.000 description 1
- 229940071106 ethylenediaminetetraacetate Drugs 0.000 description 1
- 238000011156 evaluation Methods 0.000 description 1
- 238000002474 experimental method Methods 0.000 description 1
- 239000000194 fatty acid Substances 0.000 description 1
- 229930195729 fatty acid Natural products 0.000 description 1
- 150000004665 fatty acids Chemical class 0.000 description 1
- 230000002349 favourable effect Effects 0.000 description 1
- 238000001914 filtration Methods 0.000 description 1
- 238000005189 flocculation Methods 0.000 description 1
- 230000016615 flocculation Effects 0.000 description 1
- 125000000524 functional group Chemical group 0.000 description 1
- 150000002334 glycols Chemical class 0.000 description 1
- 150000002344 gold compounds Chemical class 0.000 description 1
- 229920000578 graft copolymer Polymers 0.000 description 1
- 229910052736 halogen Inorganic materials 0.000 description 1
- 150000002366 halogen compounds Chemical class 0.000 description 1
- FBPFZTCFMRRESA-UHFFFAOYSA-N hexane-1,2,3,4,5,6-hexol Chemical class OCC(O)C(O)C(O)C(O)CO FBPFZTCFMRRESA-UHFFFAOYSA-N 0.000 description 1
- 230000003301 hydrolyzing effect Effects 0.000 description 1
- NWVVVBRKAWDGAB-UHFFFAOYSA-N hydroquinone methyl ether Natural products COC1=CC=C(O)C=C1 NWVVVBRKAWDGAB-UHFFFAOYSA-N 0.000 description 1
- 239000003112 inhibitor Substances 0.000 description 1
- 150000002503 iridium Chemical class 0.000 description 1
- 229910052741 iridium Inorganic materials 0.000 description 1
- GKOZUEZYRPOHIO-UHFFFAOYSA-N iridium atom Chemical compound [Ir] GKOZUEZYRPOHIO-UHFFFAOYSA-N 0.000 description 1
- XEEYBQQBJWHFJM-UHFFFAOYSA-N iron Substances [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 1
- 229910052742 iron Inorganic materials 0.000 description 1
- 159000000014 iron salts Chemical class 0.000 description 1
- 230000001788 irregular Effects 0.000 description 1
- 239000007791 liquid phase Substances 0.000 description 1
- 229910052744 lithium Inorganic materials 0.000 description 1
- 238000001459 lithography Methods 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- DZVCFNFOPIZQKX-LTHRDKTGSA-M merocyanine Chemical compound [Na+].O=C1N(CCCC)C(=O)N(CCCC)C(=O)C1=C\C=C\C=C/1N(CCCS([O-])(=O)=O)C2=CC=CC=C2O\1 DZVCFNFOPIZQKX-LTHRDKTGSA-M 0.000 description 1
- XMJHPCRAQCTCFT-UHFFFAOYSA-N methyl chloroformate Chemical compound COC(Cl)=O XMJHPCRAQCTCFT-UHFFFAOYSA-N 0.000 description 1
- MGFYIUFZLHCRTH-UHFFFAOYSA-N nitrilotriacetic acid Chemical compound OC(=O)CN(CC(O)=O)CC(O)=O MGFYIUFZLHCRTH-UHFFFAOYSA-N 0.000 description 1
- 150000002898 organic sulfur compounds Chemical class 0.000 description 1
- AICOOMRHRUFYCM-ZRRPKQBOSA-N oxazine, 1 Chemical compound C([C@@H]1[C@H](C(C[C@]2(C)[C@@H]([C@H](C)N(C)C)[C@H](O)C[C@]21C)=O)CC1=CC2)C[C@H]1[C@@]1(C)[C@H]2N=C(C(C)C)OC1 AICOOMRHRUFYCM-ZRRPKQBOSA-N 0.000 description 1
- 239000007800 oxidant agent Substances 0.000 description 1
- 229910052763 palladium Inorganic materials 0.000 description 1
- 229910052697 platinum Inorganic materials 0.000 description 1
- 229920000172 poly(styrenesulfonic acid) Polymers 0.000 description 1
- 229920001281 polyalkylene Polymers 0.000 description 1
- 229920000120 polyethyl acrylate Polymers 0.000 description 1
- 229920001223 polyethylene glycol Polymers 0.000 description 1
- 239000004848 polyfunctional curative Substances 0.000 description 1
- 229940005642 polystyrene sulfonic acid Drugs 0.000 description 1
- 229910052700 potassium Inorganic materials 0.000 description 1
- 239000011591 potassium Substances 0.000 description 1
- RWPGFSMJFRPDDP-UHFFFAOYSA-L potassium metabisulfite Chemical compound [K+].[K+].[O-]S(=O)S([O-])(=O)=O RWPGFSMJFRPDDP-UHFFFAOYSA-L 0.000 description 1
- 229940043349 potassium metabisulfite Drugs 0.000 description 1
- 235000010263 potassium metabisulphite Nutrition 0.000 description 1
- 238000001556 precipitation Methods 0.000 description 1
- 238000002360 preparation method Methods 0.000 description 1
- 239000003755 preservative agent Substances 0.000 description 1
- 230000002335 preservative effect Effects 0.000 description 1
- 230000001681 protective effect Effects 0.000 description 1
- 239000011241 protective layer Substances 0.000 description 1
- HBCQSNAFLVXVAY-UHFFFAOYSA-N pyrimidine-2-thiol Chemical class SC1=NC=CC=N1 HBCQSNAFLVXVAY-UHFFFAOYSA-N 0.000 description 1
- 238000011160 research Methods 0.000 description 1
- 150000003283 rhodium Chemical class 0.000 description 1
- 238000004062 sedimentation Methods 0.000 description 1
- 150000004756 silanes Chemical class 0.000 description 1
- ZUNKMNLKJXRCDM-UHFFFAOYSA-N silver bromoiodide Chemical compound [Ag].IBr ZUNKMNLKJXRCDM-UHFFFAOYSA-N 0.000 description 1
- 229940045105 silver iodide Drugs 0.000 description 1
- 229910001961 silver nitrate Inorganic materials 0.000 description 1
- 239000001632 sodium acetate Substances 0.000 description 1
- 235000017281 sodium acetate Nutrition 0.000 description 1
- 229910000029 sodium carbonate Inorganic materials 0.000 description 1
- 239000011780 sodium chloride Substances 0.000 description 1
- 235000010267 sodium hydrogen sulphite Nutrition 0.000 description 1
- 229910052938 sodium sulfate Inorganic materials 0.000 description 1
- 235000011152 sodium sulphate Nutrition 0.000 description 1
- 235000010265 sodium sulphite Nutrition 0.000 description 1
- AKHNMLFCWUSKQB-UHFFFAOYSA-L sodium thiosulfate Chemical compound [Na+].[Na+].[O-]S([O-])(=O)=S AKHNMLFCWUSKQB-UHFFFAOYSA-L 0.000 description 1
- 235000019345 sodium thiosulphate Nutrition 0.000 description 1
- GGCZERPQGJTIQP-UHFFFAOYSA-N sodium;9,10-dioxoanthracene-2-sulfonic acid Chemical compound [Na+].C1=CC=C2C(=O)C3=CC(S(=O)(=O)O)=CC=C3C(=O)C2=C1 GGCZERPQGJTIQP-UHFFFAOYSA-N 0.000 description 1
- UOULCEYHQNCFFH-UHFFFAOYSA-M sodium;hydroxymethanesulfonate Chemical compound [Na+].OCS([O-])(=O)=O UOULCEYHQNCFFH-UHFFFAOYSA-M 0.000 description 1
- 239000002195 soluble material Substances 0.000 description 1
- 230000003595 spectral effect Effects 0.000 description 1
- 239000003381 stabilizer Substances 0.000 description 1
- 230000000087 stabilizing effect Effects 0.000 description 1
- 238000003860 storage Methods 0.000 description 1
- 125000000565 sulfonamide group Chemical group 0.000 description 1
- 239000004094 surface-active agent Substances 0.000 description 1
- 230000002194 synthesizing effect Effects 0.000 description 1
- 150000003475 thallium Chemical class 0.000 description 1
- JJJPTTANZGDADF-UHFFFAOYSA-N thiadiazole-4-thiol Chemical class SC1=CSN=N1 JJJPTTANZGDADF-UHFFFAOYSA-N 0.000 description 1
- 150000003557 thiazoles Chemical class 0.000 description 1
- 150000003567 thiocyanates Chemical class 0.000 description 1
- 125000005323 thioketone group Chemical group 0.000 description 1
- 150000003585 thioureas Chemical class 0.000 description 1
- 229940062627 tribasic potassium phosphate Drugs 0.000 description 1
- ZIBGPFATKBEMQZ-UHFFFAOYSA-N triethylene glycol Chemical compound OCCOCCOCCO ZIBGPFATKBEMQZ-UHFFFAOYSA-N 0.000 description 1
- LWIHDJKSTIGBAC-UHFFFAOYSA-K tripotassium phosphate Chemical compound [K+].[K+].[K+].[O-]P([O-])([O-])=O LWIHDJKSTIGBAC-UHFFFAOYSA-K 0.000 description 1
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 description 1
- 150000003751 zinc Chemical class 0.000 description 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03C—PHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES; PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR, STEREO-PHOTOGRAPHIC PROCESSES; AUXILIARY PROCESSES IN PHOTOGRAPHY
- G03C1/00—Photosensitive materials
- G03C1/005—Silver halide emulsions; Preparation thereof; Physical treatment thereof; Incorporation of additives therein
- G03C1/06—Silver halide emulsions; Preparation thereof; Physical treatment thereof; Incorporation of additives therein with non-macromolecular additives
Landscapes
- Physics & Mathematics (AREA)
- Chemical & Material Sciences (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- General Physics & Mathematics (AREA)
- Silver Salt Photography Or Processing Solution Therefor (AREA)
Description
(産業上の利用分野)
本発明は画像形成方法に関するものであり、時
に安定な処理液を用いて、迅速に、写真製版の分
野で用いるに適した品質を有する銀画像を形成す
る方法に関するものである。
(従来技術)
写真製版工程においては網点画像(dotimage)
による連続階調の再生あるいは線画の再生を良好
ならしめるため、超硬調の写真特性を示す画像形
成システムが必要である。
従来、この目的のためには亜硫酸イオンの有効
濃度を極めて低く(通常0.1モル/以下)した
ハイドロキノン現像液(伝染現像液)を用いる方
法が一般的であつた。しかしこの方法では現像液
中の亜硫酸濃度が低いために、現像液は極めて不
安定で、3日を越える保存に耐えない。
一方、近年の写真製版分野においては作業の合
理化、効率化のニーズが高まつており、このニー
ズに答えるものとして、安定な処理液を用いて簡
易迅速な処理を行なえるラピツドアクセスシステ
ムが普及している。このシステムではハイドロキ
ノンと0.1g/以上の1−フエニル−3−ピラ
ゾリドン類が組合されて用いられている。しかし
ながら、このシステムでは良好な網点品質を得る
ために必要な超硬調な写真特性が得られないの
で、その用途は限られたものでしかなかつた。
ところで網点品質を改良する目的で、この分野
ではポリアルキレンオキサイド類が使用されてい
るが、この化合物を網点品質を十分に改良するに
足る程の量用いると、現像処理されたフイルム面
上に現像ムラが生じ易いという問題があつた。
(発明の目的)
従つて本発明の目的は網点品質の良好な超硬調
の画像を現像ムラなく、安定な処理液を用いて迅
速に得ることができる画像形成方法を提供するこ
とにある。
(発明の構成)
上記の本発明の目的は
支持体上に少なくとも1つのハロゲン化銀乳剤
層を有し、該乳剤層もしくは他の親水性コロイド
層中に下記一般式()で表わされる化合物を含
有してなる写真感光材料を画像露光したのち、ジ
ヒドロキシベンゼン系現像主薬を0.05乃至0.5モ
ル/含有し、補助現像主薬を0乃至0.05g/
含有し、遊離の亜硫酸イオンを0.25モル/以上
含有し、5−又は6−ニトロインダゾールを20
mg/以上含有し、かつPHを10.5以上にするに十
分な量のアルカリを含有する現像液で処理するこ
とを特徴とする画像形成方法。
一般式()
〔式中R1は、炭素数10以下の、置換又は無置換
のアルキル基、あるいは置換又は無置換のアリー
ル基を表わし;
R2、R3はそれぞれ独立に水素原子、ハロゲン
原子、カルボキシル基、スルホン酸基、炭素数10
以下の、脂肪族基又は芳香族基を表わす。
但し、R1、R2又はR3の少なくとも1つはカル
ボキシル基又はスルホン酸基を含有するものとす
る。〕
R1で表わされる基のうち好ましいものは、炭
素数10以下の、アルキル基、アルコキシ置換アル
キル基、カルボキシ基を有するアルキル基、スル
ホン酸基を有するアルキル基、1,2又は3級ア
ミノ基を有するアルキル基、ハロゲン置換アルキ
ル基、ヒドロキシ置要アルキル基、炭素数10以下
の置換又は無置換フエニル(置換基としてはアル
キル基、アルコキシ置換アルキル基、ハロゲン置
換アルキル基、アルコキシ基、アルコキシ置換ア
ルコキシ基、カルボキシル基を有するアルキル
基、スルホン酸基を有するアルキル基、カルボキ
シル基、スルホン酸基、ハロゲン原子、ヒドロキ
シ基、ヒドロキシ置換アルキル基などである)。
R1として特に好ましいものは、炭素数8以下
のアルキル基、アルコキシ置換アルキル基、フエ
ニル基、カルボキシル基を有するフエニル基、ス
ルホン酸基を有するフエニル基である。
R2、R3の脂肪族基又は芳香族基としては置換
又は無置換のアルキル基、置換又は無置換のアリ
ール基、置換又は無置換のアルコキシ基、置換又
は無置換のアリールオキシ基、置換又は無置換の
アルキルチオ基、置換又は無置換のアリールチオ
基、置換又は無置換のカルバモイル基、置換又は
無置換のカルボンアミド基、置換又は無置換のス
ルフアモイル基、置換又は無置換のスルホンアミ
ド基、置換又は無置換のアルキルカルボニル基、
置換又は無置換のアリールカルボニル基、置換又
は無置換のアルコキシカルボニル基、置換又は無
置換のアリールオキシカルボニル基、置換又は無
置換のアルキルスルホニル基、置換又は無置換の
アリールスルホニル基、置換又は無置換のアルキ
ルスルホキシ基、置換又は無置換のアリールスル
ホキシ基、置換又は無置換のアルキル基などであ
つて、各々炭素数が10以下のものが好ましい。
R2又はR3で表わされる基のうち好ましいもの
は、水素原子、炭素数10以下の、アルキル基、ア
ルコキシ基、アルコキシ置換アルキル基、カルボ
キシル基を有するアルキル基、スルホン酸基を有
するアルキル基、1,2又は3級のアミノ基を有
するアルキル基、ハロゲン置換アルキル基、ヒド
ロキシ置換アルキル基、フエニル基、炭素数10以
下の置換フエニル基(置換基としてはアルキル
基、アルコキシ置換アルキル基、ハロゲン置換ア
ルキル基、アルコキシ基、カルボキシル基を有す
るアルキル基、スルホン酸基を有するアルキル
基、カルボキシル基、スルホン酸基、ハロゲン原
子、ヒドロキシ基、ヒドロキシ置換アルキル基な
どがある)、ハロゲン原子、カルボキシル基、又
はスルホン酸基である。
R2、R3として特に好ましいものは水素原子、
炭素数8以下の、アルキル基、アルコキシ置換ア
ルキル基、フエニル基、カルボキシル基を有する
フエニル基、スルホン酸基を有するフエニル基、
カルボキシル基、又はスルホン酸基である。
以下に一般式()で表わされる化合物の具体
例を挙げる。
一般式()で表わされる化合物は、メルカプ
トイミダゾール類すなわち、2,3−ジヒドロイ
ミダゾール−2−チオン類の合成の常法に従つて
合成でき、その方法は例えば米国特許2585388号、
同2541924号、Chemical Abstract 58、7921g
(1963);
I.I.Kovtunovskaya−Levshina著Tr.Ukr.Inst.
Eksperim.Endo krinol.18、345頁(1961);M.
Chamben etal.,Bull.Soc.79,4922頁(1957);
A.Wohl,W.Marckwald著 ドイツ化学会誌
(Ber.),22,568頁(1889)などに記載されてい
る。更に具体的には、化合物−7〜−10は米
国特許2585388号、同2541924号記載のエステルを
加水分解することにより得られ、化合物−1の
合成はChemical Abstract,58 7921g(1963)
に記載されている。この他の合成法としては次の
方法が利用できる。例えば化合物−1は、パラ
アミノ安息香酸エステル(たとえばエチルエステ
ル)から次の手順で合成できる。すなわち、パラ
アミノ安息香酸エステルを二硫化炭素とトリエチ
ルアミンで処理して対応するジチオカルバミン酸
トリエチルアンモニウム塩とし、次いでクロルギ
酸エチルまたはクロルギ酸メチルを作用させた後
加熱して対応するイソチオシアネートとする。こ
のイソチオシアネートに、アミノアセトアルデヒ
ドジエチルアセタールを付加させ、次いで酸と水
の存在下に加熱すると閉環と同時にエステルが加
水分解されて化合物−1が得られる。化合物
−1の置換体もこれと同様にして合成することが
できる。
なおここで用いたイソチオシアネート(たとえ
ばパラカルボエトキシフエニルイソチオシアネー
ト)は、たとえばS.R.SandlerおよびW.Karo著
Organic Functional Group Preparations,
Academic Press社1968年発行、312−315ページ
記載の方法に従つて合成することができる。
次に合成の具体例を挙げて本発明の化合物の合
成法を説明するが、合成例を挙げていない化合物
も、下記の合成例に準じて合成することができ
る。
(合成例)
化合物−1の合成
(1) N−(4−カルボエトキシフエニル)−N′−
(2,2−ジエトキシエチル)チオ尿素の合
成:4−カルボエトキフエニルイソチオシアネ
ート20gを四塩化炭素50mlに溶解し、これにア
ミノアセトアルデヒドエチルアセタール13gを
5分間にわたり滴下した。次いで室温で1時間
撹拌した。反応混合物に四塩化炭素50mlを加
え、析出した結晶を取し、四塩化炭素50mlで
洗つた後乾燥した。収量27.5g、収率80.9%
(2) 化合物−1(1−(4−カルボキシフエニ
ル)−2,3−ジヒドロイミダゾール−2−チ
オン)の合成
(1)で得たN−(4−カルボエトキシフエニル)
−N′−(2,2−ジエトキシエチル)チオ尿素
80gに30%硫酸400mlを加え油浴上1時間還流
した。反応混合物を室温まで冷却した後水600
mlを加え氷冷した。析出した結晶を取し水
200ml、イソプロピルアルコール100ml、ヘキサ
ン100mlの順で洗浄し乾燥した。
収量48g 収率92.8%
本発明の一般式()の化合物を乳剤層又は他
の親水性コロイド層に添加した感光材料は、後述
する本発明の現像液で処理された場合に、迅速に
良好な網点品質を実現しうる超硬調な画像を現像
ムラを発生させずに形成することができる。
本発明の一般式()の化合物の好ましい使用
量は、ハロゲン化銀1モル当り、10-6〜10-1モ
ル、特に10-5〜10-3モルの範囲にある。
本発明において用いられるハロゲン化銀感光材
料中のハロゲン化銀は塩化銀、塩臭化銀、沃臭化
銀、沃臭塩化銀等、どの組成でもかまわないが、
40モル%が塩化銀から成ることが好ましく、さら
に70モル%以上が塩化銀からなることが好まし
い。
沃化銀の含量は5モル%以下で、さらに1モル
%以下であることが好ましい。
本発明における可溶性銀塩と可溶性ハロゲン塩
を反応させる形式としては片側混合法、同時混合
法、それらの組合せなどのいずれを用いてもよ
い。
粒子を銀イオン過剰の下において形成させる方
法(いわゆる逆混合法)を用いることもできる。
同時混合法の一つの形式としてハロゲン化銀の生
成される液相中のpAgを一定に保つ方法、すなわ
ちいわゆるコントロールド・ダブルジエツト法を
用いることができ、この方法によると、結晶形が
規則的で粒子サイズが均一に近いハロゲン化銀乳
剤がえられる。
本発明に用いられる写真乳剤中のハロゲン化銀
粒子は、比較的広い粒子サイズ分布をもつことも
できるが、せまい粒子サイズ分布をもつことが好
ましく、特にハロゲン化銀粒子の重量又は数に関
して全体の90%を占める粒子のサイズが平均粒子
サイズの±40%以内にあることが好ましい(一般
にこのような乳剤は単分散乳剤とよばれる)。
本発明で用いるハロゲン化銀粒子は、微粒子
(例えば0.7μ以下)の方が好ましく、特に0.4μ以
下が好ましい。
写真乳剤中のハロゲン化銀粒子は、立方体、八
面体のような規則的(regular)な結晶体を有す
るものでもよく、また球体、板状などのような変
則的(irregurar)な結晶をもつもの、あるいは
これらの結晶形の複合形をもつものでもよい。
種々の結晶形の粒子の混合から成つてもよい。
ハロゲン化銀粒子は内部と表層とが均一な相か
ら成つていても、単なる相をもつていてもよい。
別々に形成した2種以上のハロゲン化銀乳剤を
混合して用いてもよい。
本発明に用いるハロゲン化銀乳剤にはハロゲン
化銀粒子の形成または物理熟成の過程においてカ
ドミウム塩、亜鉛塩、鉛塩、タリウム塩、イリジ
ウム塩もしくはその錯塩、ロジウム塩又はその錯
塩、または鉄塩もしくはその錯塩などを共存させ
てもよい。
乳剤は沈澱形成後あるいは物理熟成後に通常可
溶性塩類を除去されるが、そのための手段として
は古くから知られたゼラチンをゲル化させて行な
うヌーデル水洗法を用いてもよく、また多価アニ
オンより成る無機塩類、たとえば硫酸ナトリウ
ム、アニオン性界面活性剤、アニオン性ポリマー
(たとえばポリスチレンスルホン酸)、あるいはゼ
ラチン誘導体(たとえば脂肪族アシル化ゼラチ
ン、芳香族アシル化ゼラチン、芳香族カルバモイ
ル化ゼラチンなど)を利用した沈降法(フロキユ
レーシヨン)を用いてもよい。可溶性塩類除去の
過程は省略してもよい。
本発明の方法で用いるハロゲン化銀乳剤は化学
増感されていなくてもよいが、化学増感されてい
るのが好ましい。ハロゲン化銀乳剤の化学増感の
方法として、硫黄増感、還元増感及び貴金属増感
法が知られており、これらのいずれをも単独で用
いても、又併用して化学増感してもよい。これら
については前記GlafkidesまたはZelikmanらの著
書あるいはH.Frieser編Die Grundlagen der
Photographischen Prozesse mit
Silberhalogeniden(Akademische
Verlagsgesellschafr,1968)に記載されている。
貴金属増感法のうち金増感法はその代表的なも
ので金化合物、主として金錯塩を用いる。金以外
の貴金属、たとえば白金、パラジウム、イリジウ
ム等の錯塩を含有しても差支えない。その具体例
は米国特許2448060号、英国特許618061号などに
記載されている。
硫黄増感剤としては、ゼラチン中に含まれる硫
黄化合物のほか、種々の硫黄化合物、たとえばチ
オ硫酸塩、チオ尿素塩、チアゾール類、ローダニ
ン類等を用いることができる。具体例は米国特許
1574944号、同2278947号、同2410689号、同
2728668号、同3150313号、同3656955号に記載さ
れたものである。
還元増感剤としては第一すず塩、アミン類、ホ
ルムアミジンスルフイン酸、シラン化合物などを
用いることができ、それらの具体例は米国特許
2487850号、2518698号、2983609号、2983610号、
2694637号に記載されている。
本発明に用いられる写真乳剤は、メチン色素そ
の他によつて分光増感されてよい。これらの増感
色素は単独に用いてもよいが、それらの組合せを
用いてもよく、増感色素の組合せは特に強色増感
の目的でしばしば用いられる。増感色素ととも
に、それ自身分光増感作用をもたない色素あるい
は可視光を実質的に吸収しない物質であつて、強
色増感を示す物質を乳剤中に含んでもよい。
有用な増感色素、強色増感を示す色素の組合せ
及び強色増感を示す物質はリサーチ・デスクロー
ジヤ(Research Disclosure)176巻17643(1978
年12月発行)第23頁のJ項に記載されている。
写真乳剤の結合剤または保護コロイドとして
は、ゼラチンを用いるのが有利であるが、それ以
外の親水性コロイドも用いることができる。たと
えばゼラチンとしては石灰処理ゼラチンのほか、
酸処理ゼラチンを用いてもよく、ゼラチン加水分
解物、ゼラチン酸素分解物も用いることができ
る。
本発明においては、網点品質を更に高める等の
目的で分子量600以上のポリアルキレンオキサイ
ド化合物を用いることができる。
本発明に用いるポリアルキレンオキサイド化合
物は、炭素数2〜4のアルキレンオキサイド、た
とえばエチレンオキサイド、プロピレン−1,2
−オキサイド、ブチレン−1,2−オキサイドな
ど、好ましくはエチレンオキサイドの少くとも10
単位から成るポリアルキレンオキサイドと、水、
脂肪族アルコール、芳香族アルコール、脂肪酸、
有機アミン、ヘキシトール誘導体などの活性水素
原子を少くとも1個有する化合物との縮合物ある
いは二種以上のポリアルキレンオキサイドのブロ
ツクコポリマーなどを包含する。すなわち、ポリ
アルキレンオキサイド化合物として、具体的には
ポリアルキレングリコール類
ポリアルキレングリコールアルキルエーテル類
ポリアルキレングリコールアリールエーテル類
〃 〃 (アルキルアリール)
エーテル類
ポリアルキレングリコールエステル類
ポリアルキレングリコール脂肪族アミド類
ポリアルキレングリコールアミン類
ポリアルキレングリコール・ブロツク共重合体
ポリアルキレングリコールグラフト重合物
などを用いることができる。分子量は600以上で
あることが必要である。
ポリアルキレンオキサイド鎖は分子中に一つと
は限らず、二つ以上含まれてもよい。その場合個
個のポリアルキレンオキサイド鎖が10より少いア
ルキレンオキサイド単位から成つてもよいが、分
子中のアルキレンオキサイド単位の合計は少くと
も10でなければならない。分子中に二つ以上のポ
リアルキレンオキサイド鎖を有する場合、それら
の各々は異なるアルキレンオキサイド単位、たと
えばエチレンオキサイドとプロピレンオキサイド
から成つていてもよい。本発明で用いるポリアル
キレンオキサイド化合物は、好ましくは14以上
100までのアルキレンオキサイド単位を含むもの
である。
本発明で用いるポリアルキレンオキサイド化合
物の具体例をあげると次の如くである。
ポリアルキレンオキサイド化合物例
−1 HO(CH2CH2O)90H
−2 C4H9O(CH2CH2O)15H
−3 C12H25O(CH2CH2O)15H
−4 C18H37O(CH2CH2O)15H
−5 C18H37O(CH2CH2O)40H
−6 C8H17CH=CHC8H16O(CH2CH2O)15H
−10 C11H23COO(CH2CH2O)80H
−11 C11H23COO(CH2CH2O)24OCC11H23
−13 C11H23CONH(CH2CH2O)15H
−15 C14H29N(CH2)(CH2CH2O)24H
−20
HO(CH2CH2O)a(CH2CH2CH2CH2O)b(CH2C
H2O)cH
a+c=30、b=14
−24 HO(−CH2CH2O−)34H
など特開昭50−156423号、特開昭52−108130号お
よび特開昭53−3217号に記載されたポリアルキレ
ンオキサイド化合物を用いることができる。これ
らのポリアルキレンオキサイド化合物は一種類の
みを用いても、二種類以上組合せて用いてもよ
い。
これらのポリアルキレンオキサイド化合物をハ
ロゲン化銀乳剤に添加する場合には、適当な濃度
の水溶液としてあるいは水と混和しうる低沸点の
有機溶楳に溶解して、塗布前の適当な時期、好ま
しくは、化学熟成の後に乳剤を添加することがで
きる。乳剤に加えずに非感光性の親水性コロイド
層、たとえば中間層、保護層、フイルター層など
に添加してもよい。
本発明ではポリアルキレンオキサイドを用いる
場合、その使用量を通常よりも少なくできるた
め、現像ムラを発生させることなく網点品質を更
に改良することができるのである。例えばハロゲ
ン化銀1モル当り20〜150mgの量で本発明の一般
式()の化合物を併用される。
本発明の感光材料には、感光材料の製造工程、
保存中あるいは写真処理中のカブリを防止しある
いは写真性能を安定化させる目的で、種々の化合
物を含有させることができる。すなわちアゾール
類たとえばベンゾチアゾリウム塩、ニトロインダ
ゾール類、ニトロベンズイミダゾール類、クロロ
ベンズイミダゾール類、ブロモベンズイミダゾー
ル類、メルカプトチアゾール類、メルカプトベン
ゾチアゾール類、メルカプトベンズイミダゾール
類、メルカプトチアジアゾール類、アミノトリア
ゾール類、ベンゾトリアゾール類、ニトロベンゾ
トリアゾール類、メルカプトテトラゾール類(特
に1−フエニル−5−メルカプトテトラゾール)
など;メルカプトピリミジン類;メルカプトトリ
アジン類;たとえばオキサゾリンチオンのような
チオケト化合物;アザインデン類、たとえばトリ
アザインデン類、テトラアザインデン類(特に4
−ヒドロキシ置換(1,3,3a,7)テトラザ
インデン類)、ペンタアザインデン類など;ベン
ゼンテオスルフオン酸、ベンゼンスルフイン酸、
ベンゼンスルフオン酸アミド等のようなカブリ防
止剤または安定剤として知られた多くの化合物を
加えることができる。
本発明で用いられる感光材料には、例えば、
水溶性材料(フイルター又はイラジエーシヨン
防止が目的。例えば、オキソノール染料、ヘミオ
キソノール染料、メロシアニン染料など)、
硬膜剤(例えば、クロム塩、アルデヒド剤、N
−メチロール化合物、ジオキサン誘導体、活性ビ
ニル化合物、活性ハロゲン化合物など)、
界面活性剤(例えば、公知の種々の非イオン
性、アニオン性、カオチン性、両性界面活性剤)
等を含有させることができる。
本発明で用いられる現像液は、補助現像主薬
(例えば1−フエニル−3−ピラゾリドン類又は
p−アミノフエノール類)を全く含まないか又は
0.05g/以下に抑え、主現像主薬としてジヒド
ロキシベンゼン類を0.05〜0.5モル/(特に0.1
〜0.4モル/)含有する現像液であつて、遊離
の亜硫酸イオン濃度が0.25モル/以上あり、5
−又は6−ニトロインダゾールを20mg/以上含
有し、かつPHを10.5以上(特に11.5以上)にする
に十分な量のアルカリを含有する現像液である。
この中でも補助現像主薬を含まれないジヒドロキ
シベンゼン類(特にハイドロキノン)単独の使用
が好ましい。
この現像液は本発明の感光材料を使つて極めて
硬調な写真特性を迅速に得ることを可能にし、か
つ亜硫酸イオンを多量に現像しうるので極めて安
定である。
上記において、ジヒドロキシベンゼン系現像主
薬としては、例えばハイドロキノン、クロロハイ
ドロキノン、ブロモハイドロキノン、イソプロピ
ルハイドロキノン、トルヒドロハイドロキノン、
メチルハイドロキノン、2,3−ジクロロハイド
ロキノン、2,5−ジメチルハイドロキノンなど
があり、1−フエニル−3−ピラゾリドン系現像
主薬としては1−フエニル−3−ピラゾリドン、
4,4−ジメチル−1−フエニル−3−ピラゾリ
ドン、4−ヒドロキシメチル−4−メチル−1−
フエニル−3−ピラゾリドン、4,4−ジヒドロ
キシメチル−1−フエニル−3−ピラゾリドンな
どがあり、p−アミノフエノール系現像主薬とし
てはp−アミノフエノール、N−メチル−p−ア
ミノフエノールなどが用いられる。
現像液には保恒剤として遊離の亜硫酸イオンを
与える化合物、例えば亜硫酸ナトリウム、亜硫酸
カリウム、メタ重亜硫酸カリウム、重亜硫酸ナト
リウム等が添加される。伝染現像液の場合は現像
液中でほとんど遊離の亜硫酸イオンを与えないホ
ルムアルデヒド重亜硫酸ナトリウムを用いても良
い。
本発明に用いる現像液のアルカリ剤としては水
酸化カリウム、水酸化ナトリウム、炭酸カリウ
ム、炭酸ナトリウム、酢酸ナトリウム、第三リン
酸カリウム、ジエタノールアミン、トリエタノー
ルアミンなどが用いられる。
本発明に使用し得る現像液には前述したと同種
のポリアルキレンオキサイドを現像抑制剤として
含有させるのが好ましい。例えば分子量1000〜
10000のポリエチレンオキサイドなどを0.1〜10
g/の範囲で含有させることができる。
本発明に使用し得る現像液には硬水軟化剤とし
てニトリロトリ酢酸、エチレンジアミンテトラア
セテイツクアシド、トリエチレンテトラアミンヘ
キサアセテイツクアシド、ジエチレンテトラアミ
ンペンタアセテツクアシド等を添加することが好
ましい。
定着液としては一般に用いられる組成のものを
用いることができる。
定着剤としてはチオ硫酸塩、チオシアン酸塩の
ほか、定着剤としての効果が知られている有機硫
黄化合物を用いることができる。
定着液には硬膜剤として水溶性アルミニウム塩
を含んでもよい。
定着液には酸化剤としてエチレンジアミン四酢
酸と三価の鉄イオンとの錯体を含むこともでき
る。
処理温度や処理時間は適宜設定されるが普通18
℃〜50℃の処理温度が適当であり、一方いわゆる
自動現像機を用いた15〜120秒の迅速処理を行う
のが好ましい。
以下に実施例を掲げ、本発明を更に詳細に説明
する。
本発明の感光材料は一般式()で示される化
合物を有する感光材料を前述した特定の組成を有
する現像液で、処理することにより網点画像や線
画の再現に有効な著しく硬調な特性を得ることを
可能にしその上現像液が安定であるため長期にわ
たつての使用が可能になるという優れた利点を持
つ。
以下、実施例により本発明を更に詳しく説明す
る。
実施例 1
50℃に保つたPH=4.0のゼラチン水溶液中に硝
酸銀水溶液と塩化ナトリウムおよび臭化カリウム
の混合水溶液を同時に一定の速度で30分間添加し
て0.3μの塩臭化銀剤(Br30モル%)を調製した。
この乳剤を常法に従つて水洗して、可溶性塩類
を除去したあとチオ硫酸ナトリウムとカリウムク
ロロオーレートを加えて化学増感を施した。
これらの塩臭化銀乳剤を分割し、第1表に示す
ように比較化合物と本発明の化合物を加え、各々
に増感色素として5−〔3−(4−スルホブチル)
−5−クロロ−2−オキサゾリジリデン〕−1−
ヒドロキシエトキシエチル−3−(2−ピリジル)
−2−チオヒダントインを加え、更に各々に4−
ヒドロキシ−6−メチル−1,3,3a,7−テ
トラザインデン、ポリエチルアクリレートの分散
物、2−ヒドロキシ−4,6−ジクロロ−1,
3,5−トリアジンナトリウム塩を加えた後、セ
ルローストリアセテートフイルム上に銀4g/m2
になる如く塗布をした。
これらのフイルムに150線マゼンタコンタクト
スクリーンを用いてセンシトメトリー用露光ウエ
ツジを通して露光した後、下記組成の現像液で38
℃、30秒間現像し、停止、定着、水洗、乾燥し
た。
(現像液組成)
臭化カリウム 2.0g
水酸化カリウム 25g
炭酸カリウム 35g
亜硫酸カリウム 80g
ハイドロキノン 20g
トリエチレングリコール 30g
ポリエチレングリコール(分子量4000) 2.0g
5−ニトロインダゾール 0.1g
水を加えて 1
PH12.0
結果を第1表に示す。但し表中、
Γ相対感度は濃度1.5を与える露光量の逆数の相
対値で、試料1の値を100とした。
Γ網点品質は顕微鏡観察により5段階に評価した
もので、「5」が最もよく、「1」が最も悪い品
質を表わす。「5」又は「4」が実用可能で、
「3」は粗悪だがぎりぎり実用でき、「2」又は
「1」は実用可能である。
Γ現像ムラは肉眼によりフイルムを観察して5段
階に評価したもので、各々の数値は網点品質の
評価の数値と同義である。
(Field of Industrial Application) The present invention relates to an image forming method, and relates to a method for quickly forming a silver image having a quality suitable for use in the field of photolithography, sometimes using a stable processing liquid. It is. (Prior art) In the photoengraving process, halftone images (dotimages)
In order to achieve good continuous tone reproduction or line drawing reproduction, an image forming system is required that exhibits ultra-high contrast photographic characteristics. Conventionally, for this purpose, it has been common to use a hydroquinone developer (infectious developer) with an extremely low effective concentration of sulfite ions (usually 0.1 mol/less or less). However, in this method, since the concentration of sulfite in the developer is low, the developer is extremely unstable and cannot be stored for more than 3 days. On the other hand, in recent years in the photolithography field, there has been an increasing need for work rationalization and efficiency, and to meet this need, rapid access systems that can perform simple and quick processing using stable processing liquids have become popular. are doing. This system uses a combination of hydroquinone and 0.1 g/or more of 1-phenyl-3-pyrazolidones. However, since this system does not provide the ultra-high contrast photographic characteristics necessary to obtain good halftone dot quality, its use has been limited. By the way, polyalkylene oxides are used in this field for the purpose of improving the halftone dot quality, but when this compound is used in an amount sufficient to improve the halftone dot quality, the surface of the developed film is There was a problem that uneven development was likely to occur. (Objective of the Invention) Therefore, the object of the present invention is to provide an image forming method that can quickly obtain an ultra-high contrast image with good halftone dot quality without uneven development and using a stable processing solution. (Structure of the Invention) The above object of the present invention is to have at least one silver halide emulsion layer on a support, and to contain a compound represented by the following general formula () in the emulsion layer or other hydrophilic colloid layer. After imagewise exposure of the photographic material containing the dihydroxybenzene-based developing agent, 0.05 to 0.5 mol/contains a dihydroxybenzene-based developing agent, and 0 to 0.05 g/contains an auxiliary developing agent.
Contains 0.25 mol/or more of free sulfite ions, and 20% of 5- or 6-nitroindazole.
1. An image forming method characterized by processing with a developer containing alkali in an amount of at least mg/mg/ml and a sufficient amount to raise the pH to 10.5 or more. General formula () [In the formula, R 1 represents a substituted or unsubstituted alkyl group having 10 or less carbon atoms, or a substituted or unsubstituted aryl group; R 2 and R 3 each independently represent a hydrogen atom, a halogen atom, a carboxyl group, Sulfonic acid group, carbon number 10
It represents the following aliphatic group or aromatic group. However, at least one of R 1 , R 2 or R 3 shall contain a carboxyl group or a sulfonic acid group. ] Preferred groups among the groups represented by R 1 are alkyl groups, alkoxy-substituted alkyl groups, alkyl groups having a carboxy group, alkyl groups having a sulfonic acid group, and primary, secondary, or tertiary amino groups having 10 or less carbon atoms. an alkyl group, a halogen-substituted alkyl group, a hydroxy-substituted alkyl group, a substituted or unsubstituted phenyl group having 10 or less carbon atoms (as a substituent, an alkyl group, an alkoxy-substituted alkyl group, a halogen-substituted alkyl group, an alkoxy group, an alkoxy-substituted alkoxy group, an alkyl group having a carboxyl group, an alkyl group having a sulfonic acid group, a carboxyl group, a sulfonic acid group, a halogen atom, a hydroxy group, a hydroxy-substituted alkyl group, etc.). Particularly preferred as R 1 are an alkyl group having 8 or less carbon atoms, an alkoxy-substituted alkyl group, a phenyl group, a phenyl group having a carboxyl group, and a phenyl group having a sulfonic acid group. The aliphatic group or aromatic group for R 2 and R 3 includes a substituted or unsubstituted alkyl group, a substituted or unsubstituted aryl group, a substituted or unsubstituted alkoxy group, a substituted or unsubstituted aryloxy group, a substituted or Unsubstituted alkylthio group, substituted or unsubstituted arylthio group, substituted or unsubstituted carbamoyl group, substituted or unsubstituted carbonamide group, substituted or unsubstituted sulfamoyl group, substituted or unsubstituted sulfonamide group, substituted or unsubstituted unsubstituted alkylcarbonyl group,
Substituted or unsubstituted arylcarbonyl group, substituted or unsubstituted alkoxycarbonyl group, substituted or unsubstituted aryloxycarbonyl group, substituted or unsubstituted alkylsulfonyl group, substituted or unsubstituted arylsulfonyl group, substituted or unsubstituted an alkylsulfoxy group, a substituted or unsubstituted arylsulfoxy group, a substituted or unsubstituted alkyl group, each having 10 or less carbon atoms. Among the groups represented by R 2 or R 3 , preferred are a hydrogen atom, an alkyl group having 10 or less carbon atoms, an alkoxy group, an alkoxy-substituted alkyl group, an alkyl group having a carboxyl group, an alkyl group having a sulfonic acid group, An alkyl group having a primary, secondary or tertiary amino group, a halogen-substituted alkyl group, a hydroxy-substituted alkyl group, a phenyl group, a substituted phenyl group having 10 or less carbon atoms (as a substituent, an alkyl group, an alkoxy-substituted alkyl group, a halogen-substituted alkyl group) Alkyl group, alkoxy group, alkyl group having a carboxyl group, alkyl group having a sulfonic acid group, carboxyl group, sulfonic acid group, halogen atom, hydroxy group, hydroxy-substituted alkyl group, etc.), halogen atom, carboxyl group, It is a sulfonic acid group. Particularly preferred R 2 and R 3 are hydrogen atoms,
an alkyl group, an alkoxy-substituted alkyl group, a phenyl group, a phenyl group having a carboxyl group, a phenyl group having a sulfonic acid group, having 8 or less carbon atoms;
It is a carboxyl group or a sulfonic acid group. Specific examples of the compound represented by the general formula () are listed below. The compound represented by the general formula () can be synthesized according to the conventional method for synthesizing mercaptoimidazoles, that is, 2,3-dihydroimidazole-2-thiones, and the method is described in, for example, US Pat. No. 2,585,388;
No. 2541924, Chemical Abstract 58 , 7921g
(1963); IIKovtunovskaya-Levshina Tr.Ukr.Inst.
Eksperim. Endo krinol. 18 , p. 345 (1961); M.
Chamben et al., Bull.Soc. 79 , p. 4922 (1957);
It is described in A.Wohl, W.Marckwald, Journal of the German Chemical Society (Ber.), 22 , p. 568 (1889). More specifically, compounds -7 to -10 are obtained by hydrolyzing the esters described in US Pat. No. 2,585,388 and US Pat.
It is described in. As other synthesis methods, the following methods can be used. For example, Compound-1 can be synthesized from para-aminobenzoic acid ester (eg, ethyl ester) by the following procedure. That is, para-aminobenzoic acid ester is treated with carbon disulfide and triethylamine to form the corresponding triethylammonium dithiocarbamate salt, and then treated with ethyl chloroformate or methyl chloroformate and then heated to form the corresponding isothiocyanate. When aminoacetaldehyde diethyl acetal is added to this isothiocyanate and then heated in the presence of acid and water, the ester is hydrolyzed at the same time as the ring is closed, yielding Compound-1. Substituted compounds of Compound-1 can also be synthesized in the same manner. Note that the isothiocyanate used here (for example, paracarboethoxyphenyl isothiocyanate) is described, for example, by SRSandler and W. Karo.
Organic Functional Group Preparations,
It can be synthesized according to the method described in Academic Press, 1968, pages 312-315. Next, the synthesis method of the compound of the present invention will be explained by giving specific synthesis examples, but compounds for which synthesis examples are not listed can also be synthesized according to the following synthesis examples. (Synthesis example) Synthesis of compound-1 (1) N-(4-carboethoxyphenyl)-N'-
Synthesis of (2,2-diethoxyethyl)thiourea: 20 g of 4-carboethoxyphenyl isothiocyanate was dissolved in 50 ml of carbon tetrachloride, and 13 g of aminoacetaldehyde ethyl acetal was added dropwise thereto over 5 minutes. The mixture was then stirred at room temperature for 1 hour. 50 ml of carbon tetrachloride was added to the reaction mixture, and the precipitated crystals were collected, washed with 50 ml of carbon tetrachloride, and then dried. Yield 27.5g, yield 80.9% (2) Synthesis of compound-1 (1-(4-carboxyphenyl)-2,3-dihydroimidazole-2-thione) ethoxyphenyl)
-N'-(2,2-diethoxyethyl)thiourea
400 ml of 30% sulfuric acid was added to 80 g and refluxed on an oil bath for 1 hour. After cooling the reaction mixture to room temperature, add 600 ml of water.
ml was added and cooled on ice. Take the precipitated crystals and add water
It was washed with 200 ml, 100 ml of isopropyl alcohol, and 100 ml of hexane in this order, and dried. Yield: 48g Yield: 92.8% A light-sensitive material containing the compound of the general formula () of the present invention added to an emulsion layer or other hydrophilic colloid layer quickly develops into a good image when processed with the developer of the present invention described below. Ultra-high contrast images that can achieve halftone dot quality can be formed without developing unevenness. The preferred amount of the compound of general formula () according to the invention is in the range from 10 -6 to 10 -1 mol, especially from 10 -5 to 10 -3 mol, per mol of silver halide. The silver halide in the silver halide photosensitive material used in the present invention may have any composition, such as silver chloride, silver chlorobromide, silver iodobromide, silver iodobromochloride, etc.
It is preferable that 40 mol% consists of silver chloride, and more preferably 70 mol% or more consists of silver chloride. The content of silver iodide is 5 mol% or less, more preferably 1 mol% or less. In the present invention, the soluble silver salt and the soluble halogen salt may be reacted by any method such as a one-sided mixing method, a simultaneous mixing method, or a combination thereof. It is also possible to use a method in which particles are formed in an excess of silver ions (so-called back-mixing method).
One type of simultaneous mixing method is a method in which the pAg in the liquid phase in which silver halide is produced is kept constant, that is, the so-called controlled double-jet method. A silver halide emulsion with nearly uniform grain size can be obtained. Although the silver halide grains in the photographic emulsions used in the present invention can have a relatively wide grain size distribution, it is preferred that they have a narrow grain size distribution, particularly in terms of weight or number of silver halide grains. It is preferable that the size of the grains accounting for 90% is within ±40% of the average grain size (such an emulsion is generally called a monodisperse emulsion). The silver halide grains used in the present invention are preferably fine grains (eg, 0.7 μm or less), particularly preferably 0.4 μm or less. Silver halide grains in photographic emulsions may have regular crystals such as cubes and octahedrons, or irregular crystals such as spheres and plates. , or may have a composite form of these crystal forms.
It may also consist of a mixture of particles of various crystalline forms. The silver halide grains may have a uniform phase inside and on the surface, or may have a simple phase. Two or more types of silver halide emulsions formed separately may be mixed and used. The silver halide emulsion used in the present invention contains cadmium salts, zinc salts, lead salts, thallium salts, iridium salts or complex salts thereof, rhodium salts or complex salts thereof, or iron salts or A complex salt thereof may also be present. The soluble salts are usually removed from the emulsion after precipitation or physical ripening, and the long-known Nudel water washing method, which involves gelatinizing gelatin, may be used. Utilizing inorganic salts such as sodium sulfate, anionic surfactants, anionic polymers (e.g. polystyrene sulfonic acid), or gelatin derivatives (e.g. aliphatic acylated gelatin, aromatic acylated gelatin, aromatic carbamoylated gelatin, etc.) A sedimentation method (flocculation) may also be used. The process of removing soluble salts may be omitted. The silver halide emulsion used in the method of the present invention does not need to be chemically sensitized, but is preferably chemically sensitized. Sulfur sensitization, reduction sensitization, and noble metal sensitization methods are known as methods for chemical sensitization of silver halide emulsions, and any of these methods can be used alone or in combination for chemical sensitization. Good too. Regarding these, see the above-mentioned book by Glafkides or Zelikman et al. or Die Grundlagen der edited by H. Frieser.
Photographischen Prozesse mit
Silberhalogeniden (Akademische
Verlagsgesellschafr, 1968). Among the noble metal sensitization methods, the gold sensitization method is a typical method and uses a gold compound, mainly a gold complex salt. There is no problem in containing complex salts of noble metals other than gold, such as platinum, palladium, and iridium. Specific examples thereof are described in US Pat. No. 2,448,060, British Patent No. 618,061, etc. As the sulfur sensitizer, in addition to the sulfur compounds contained in gelatin, various sulfur compounds such as thiosulfates, thiourea salts, thiazoles, rhodanines, etc. can be used. Specific example is a US patent
No. 1574944, No. 2278947, No. 2410689, No.
It is described in No. 2728668, No. 3150313, and No. 3656955. As the reduction sensitizer, stannous salts, amines, formamidine sulfinic acid, silane compounds, etc. can be used, and specific examples thereof are described in the U.S. patent.
No. 2487850, No. 2518698, No. 2983609, No. 2983610,
Described in No. 2694637. The photographic emulsions used in the present invention may be spectrally sensitized with methine dyes and others. These sensitizing dyes may be used alone or in combination, and combinations of sensitizing dyes are often used particularly for the purpose of supersensitization. Along with the sensitizing dye, the emulsion may contain a dye that itself does not have a spectral sensitizing effect or a substance that does not substantially absorb visible light and exhibits supersensitization. Useful sensitizing dyes, combinations of dyes exhibiting supersensitization, and substances exhibiting supersensitization are described in Research Disclosure, Vol. 176, 17643 (1978).
Published in December 2017), page 23, Section J. Gelatin is advantageously used as a binder or protective colloid in photographic emulsions, but other hydrophilic colloids can also be used. For example, gelatin includes lime-processed gelatin,
Acid-treated gelatin may be used, and gelatin hydrolysates and gelatin oxygen-decomposed products may also be used. In the present invention, a polyalkylene oxide compound having a molecular weight of 600 or more can be used for the purpose of further improving halftone dot quality. The polyalkylene oxide compound used in the present invention is an alkylene oxide having 2 to 4 carbon atoms, such as ethylene oxide, propylene-1,2
- oxide, such as butylene-1,2-oxide, preferably ethylene oxide.
Polyalkylene oxide consisting of units, water,
aliphatic alcohols, aromatic alcohols, fatty acids,
It includes condensates with compounds having at least one active hydrogen atom, such as organic amines and hexitol derivatives, and block copolymers of two or more types of polyalkylene oxides. That is, as polyalkylene oxide compounds, specifically, polyalkylene glycols, polyalkylene glycol alkyl ethers, polyalkylene glycol aryl ethers, 〃 〃 (alkylaryl) ethers, polyalkylene glycol esters, polyalkylene glycol aliphatic amides, polyalkylene Glycolamines, polyalkylene glycol block copolymers, polyalkylene glycol graft polymers, and the like can be used. The molecular weight needs to be 600 or more. The number of polyalkylene oxide chains is not limited to one in the molecule, and two or more may be included. In this case, the individual polyalkylene oxide chains may consist of less than 10 alkylene oxide units, but the total number of alkylene oxide units in the molecule must be at least 10. If there is more than one polyalkylene oxide chain in the molecule, each of them may consist of different alkylene oxide units, such as ethylene oxide and propylene oxide. The polyalkylene oxide compound used in the present invention is preferably 14 or more.
Contains up to 100 alkylene oxide units. Specific examples of the polyalkylene oxide compounds used in the present invention are as follows. Polyalkylene oxide compound example-1 HO (CH 2 CH 2 O) 90 H −2 C 4 H 9 O (CH 2 CH 2 O) 15 H −3 C 12 H 25 O (CH 2 CH 2 O) 15 H − 4 C 18 H 37 O (CH 2 CH 2 O) 15 H −5 C 18 H 37 O (CH 2 CH 2 O) 40 H −6 C 8 H 17 CH=CHC 8 H 16 O (CH 2 CH 2 O ) 15H −10 C 11 H 23 COO (CH 2 CH 2 O) 80 H −11 C 11 H 23 COO (CH 2 CH 2 O) 24 OCC 11 H 23 −13 C 11 H 23 CONH (CH 2 CH 2 O) 15 H −15 C 14 H 29 N(CH 2 )(CH 2 CH 2 O) 24 H −20 HO(CH 2 CH 2 O) a (CH 2 CH 2 CH 2 CH 2 O) b (CH 2 C
H 2 O) c H a+c=30, b=14 -24 HO (-CH 2 CH 2 O-) 34 H and other polyalkylene oxide compounds described in JP-A-50-156423, JP-A-52-108130 and JP-A-53-3217 can be used. can. These polyalkylene oxide compounds may be used alone or in combination of two or more. When these polyalkylene oxide compounds are added to a silver halide emulsion, they are added as an aqueous solution of an appropriate concentration or dissolved in a water-miscible low-boiling organic solution at an appropriate time before coating, preferably. , the emulsion can be added after chemical ripening. It may be added to non-photosensitive hydrophilic colloid layers, such as intermediate layers, protective layers, filter layers, etc., instead of being added to the emulsion. In the present invention, when polyalkylene oxide is used, the amount of polyalkylene oxide used can be made smaller than usual, so that the quality of halftone dots can be further improved without causing uneven development. For example, the compound of general formula () of the present invention is used in combination in an amount of 20 to 150 mg per mole of silver halide. The photosensitive material of the present invention includes a photosensitive material manufacturing process,
Various compounds can be contained for the purpose of preventing fog during storage or photographic processing or stabilizing photographic performance. That is, azoles such as benzothiazolium salts, nitroindazoles, nitrobenzimidazoles, chlorobenzimidazoles, bromobenzimidazoles, mercaptothiazoles, mercaptobenzothiazoles, mercaptobenzimidazoles, mercaptothiadiazoles, aminotriazoles. , benzotriazoles, nitrobenzotriazoles, mercaptotetrazoles (especially 1-phenyl-5-mercaptotetrazole)
mercaptopyrimidines; mercaptotriazines; thioketo compounds such as oxazolinthione; azaindenes, such as triazaindenes, tetraazaindenes (especially 4
-hydroxy-substituted (1,3,3a,7)tetrazaindenes), pentaazaindenes, etc.; benzenetheosulfonic acid, benzenesulfinic acid,
Many compounds known as antifoggants or stabilizers can be added, such as benzenesulfonic acid amides and the like. The light-sensitive materials used in the present invention include, for example, water-soluble materials (for filtering or anti-irradiation purposes, such as oxonol dyes, hemioxonol dyes, merocyanine dyes, etc.), hardeners (such as chromium salts, aldehyde agents, N
-methylol compounds, dioxane derivatives, active vinyl compounds, active halogen compounds, etc.), surfactants (for example, various known nonionic, anionic, cationic, amphoteric surfactants), etc. The developer used in the present invention does not contain any auxiliary developing agent (for example, 1-phenyl-3-pyrazolidones or p-aminophenols) or
The amount of dihydroxybenzenes as the main developing agent is kept at 0.05 to 0.5 mol/(especially 0.1
~0.4 mol/), the free sulfite ion concentration is 0.25 mol/or more, and 5
- or 6-nitroindazole in an amount of 20 mg or more, and a sufficient amount of alkali to adjust the pH to 10.5 or higher (particularly 11.5 or higher).
Among these, it is preferable to use dihydroxybenzenes (especially hydroquinone) alone without containing an auxiliary developing agent. This developing solution makes it possible to rapidly obtain extremely high contrast photographic properties using the light-sensitive material of the present invention, and is extremely stable since it can develop with a large amount of sulfite ions. In the above, examples of the dihydroxybenzene-based developing agent include hydroquinone, chlorohydroquinone, bromohydroquinone, isopropylhydroquinone, toluhydrohydroquinone,
Examples of 1-phenyl-3-pyrazolidone-based developing agents include methylhydroquinone, 2,3-dichlorohydroquinone, 2,5-dimethylhydroquinone, and 1-phenyl-3-pyrazolidone.
4,4-dimethyl-1-phenyl-3-pyrazolidone, 4-hydroxymethyl-4-methyl-1-
Examples include phenyl-3-pyrazolidone, 4,4-dihydroxymethyl-1-phenyl-3-pyrazolidone, etc., and p-aminophenol, N-methyl-p-aminophenol, etc. are used as p-aminophenol developing agents. . A compound that provides free sulfite ions, such as sodium sulfite, potassium sulfite, potassium metabisulfite, and sodium bisulfite, is added to the developer as a preservative. In the case of an infectious developer, sodium formaldehyde bisulfite may be used, which provides almost no free sulfite ions in the developer. As the alkaline agent for the developer used in the present invention, potassium hydroxide, sodium hydroxide, potassium carbonate, sodium carbonate, sodium acetate, tribasic potassium phosphate, diethanolamine, triethanolamine, etc. are used. It is preferable that the developer that can be used in the present invention contains the same type of polyalkylene oxide as described above as a development inhibitor. For example, molecular weight 1000~
10000 polyethylene oxide etc. 0.1~10
It can be contained within a range of g/g/. It is preferable to add nitrilotriacetic acid, ethylenediaminetetraacetate acid, triethylenetetraamine hexaacetate acid, diethylenetetraamine pentaacetate acid, etc. as a water softener to the developer that can be used in the present invention. As the fixer, one having a commonly used composition can be used. As the fixing agent, in addition to thiosulfates and thiocyanates, organic sulfur compounds known to be effective as fixing agents can be used. The fixing solution may contain a water-soluble aluminum salt as a hardening agent. The fixer may also contain a complex of ethylenediaminetetraacetic acid and trivalent iron ions as an oxidizing agent. Processing temperature and processing time are set appropriately, but usually18
Processing temperatures of .degree. C. to 50.degree. C. are suitable, while rapid processing of 15 to 120 seconds using so-called automatic processors is preferred. The present invention will be explained in more detail with reference to Examples below. The photosensitive material of the present invention obtains characteristics of extremely high contrast that are effective in reproducing halftone images and line drawings by processing the photosensitive material containing the compound represented by the general formula () with a developer having the above-mentioned specific composition. Furthermore, the developing solution is stable, so it has the excellent advantage of being able to be used for a long period of time. Hereinafter, the present invention will be explained in more detail with reference to Examples. Example 1 A silver nitrate aqueous solution and a mixed aqueous solution of sodium chloride and potassium bromide were simultaneously added at a constant rate for 30 minutes to a gelatin aqueous solution with a pH of 4.0 kept at 50°C to obtain a 0.3μ silver chlorobromide agent (30 moles of Br). %) was prepared. This emulsion was washed with water in a conventional manner to remove soluble salts, and then chemical sensitization was performed by adding sodium thiosulfate and potassium chloroaurate. These silver chlorobromide emulsions were divided, comparative compounds and compounds of the present invention were added as shown in Table 1, and 5-[3-(4-sulfobutyl) was added as a sensitizing dye to each.
-5-chloro-2-oxazolidylidene]-1-
Hydroxyethoxyethyl-3-(2-pyridyl)
-2-thiohydantoin was added, and then 4-
Hydroxy-6-methyl-1,3,3a,7-tetrazaindene, dispersion of polyethyl acrylate, 2-hydroxy-4,6-dichloro-1,
After addition of 3,5-triazine sodium salt, 4 g/m 2 of silver was deposited on the cellulose triacetate film.
I applied it as desired. After exposing these films through a sensitometric exposure wedge using a 150-line magenta contact screen, they were exposed to light using a developer solution with the following composition.
℃ for 30 seconds, stopped, fixed, washed with water, and dried. (Developer composition) Potassium bromide 2.0g Potassium hydroxide 25g Potassium carbonate 35g Potassium sulfite 80g Hydroquinone 20g Triethylene glycol 30g Polyethylene glycol (molecular weight 4000) 2.0g 5-nitroindazole 0.1g Add water 1 PH12.0 Results Shown in Table 1. However, in the table, Γ relative sensitivity is the relative value of the reciprocal of the exposure amount that gives a density of 1.5, and the value of sample 1 is taken as 100. The Γ halftone quality is evaluated on a five-level scale by microscopic observation, with "5" representing the best quality and "1" representing the worst quality. "5" or "4" is practical,
"3" is inferior but barely usable, and "2" or "1" is usable. The Γ development unevenness is evaluated by observing the film with the naked eye on a five-level scale, and each numerical value is synonymous with the numerical value for evaluation of halftone dot quality.
【表】
第1表より次のことが明らかである。網点品質
を改善する化合物として著名なポリアルキレンオ
キサイド類を単独で用いたフイルムNo.2は現像ム
ラを引き起し易く、本発明の迅速処理には不適で
ある。またカルボン酸基やスルホン酸基を持つ
が、母核が本発明の化合物とは異なる比較化合物
B、Cを用いたフイルム3〜6は感度の低下を引
き起すのみで超硬調のガンマを達成できない。
これに対し、本発明の一般式()の化合物を
用いたフイルム7〜10は市販のリスフイルムとリ
ス現像に匹敵する硬調さと網点品質を現像ムラを
引き起さず迅速処理で達成できるという優れた効
果を示すことが明らかである。
実施例 2
実施例1と同様の乳剤に第2表に示すように本
発明の化合物−1、−11を加えた後、セルロ
ーストリアセテートフイルム上にAg3.5g/mに
なる如く塗布し、第3表に示す組成の現像液A〜
Gを用いて38℃で現像、定着、水洗、乾燥を行な
つた。さらに現像液の安定性を比較するために4
日経時させたのち同様の方法で現像処理した。網
点品質の比較は現像を5秒おきに行ない同一感度
で行つた。[Table] The following is clear from Table 1. Film No. 2, which uses polyalkylene oxide alone, which is well-known as a compound for improving halftone dot quality, tends to cause uneven development and is unsuitable for the rapid processing of the present invention. Furthermore, films 3 to 6 using Comparative Compounds B and C, which have a carboxylic acid group or a sulfonic acid group but whose mother nucleus is different from that of the compound of the present invention, only cause a decrease in sensitivity and cannot achieve ultra-high contrast gamma. . On the other hand, it is said that films 7 to 10 using the compound of general formula () of the present invention can achieve high contrast and halftone dot quality comparable to commercially available lithium film and lithography through rapid processing without causing uneven development. It is clear that it shows excellent effects. Example 2 Compounds -1 and -11 of the present invention were added to the same emulsion as in Example 1 as shown in Table 2, and then coated on a cellulose triacetate film at an Ag concentration of 3.5 g/m. Developer solution A with the composition shown in the table
Developing, fixing, washing with water, and drying were carried out at 38°C using G. Furthermore, in order to compare the stability of the developer,
After aging for several days, the film was developed in the same manner. Comparison of halftone dot quality was conducted at the same sensitivity with development performed every 5 seconds.
【表】
第2表から明らかなように本発明の時に好まし
い現像液であるCは非常によい網点画質を示すこ
とは明らかである。現像液Dには補助現像主薬と
して1−フエニル−3−ピラゾリドンが0.2g/
含有されているが、現像液Cより網点品質が劣
ることは明らかである。また現像液Eは亜硫酸イ
オン濃度が高いため4日経時させた時の現像液感
度の低下が大きく安定な現像液を与えない。現像
液Fは現像液Cに比べPHが低く網点品質が現像液
Cよりは悪くなるとともに現像時間が長くなる。
さらに現像液Gでは5−ニトロインダゾールの代
りに5−メチルベンゾトリアゾールを用いた場合
であり、網点品質が現像液Cには及ばない。従つ
て短い現像時間で良好な網点画質を与え安定な現
像液として現像液Cの場合に時に好ましい結果が
得られることは第2表から明らかである。[Table] As is clear from Table 2, it is clear that C, which is a preferred developer in the present invention, exhibits very good halftone image quality. Developer solution D contains 0.2g/1-phenyl-3-pyrazolidone as an auxiliary developing agent.
However, it is clear that the halftone dot quality is inferior to that of developer C. Further, since the developer E has a high sulfite ion concentration, the developer sensitivity decreases significantly after aging for 4 days, and a stable developer cannot be obtained. Developer F has a lower pH than Developer C, resulting in poorer halftone dot quality than Developer C and longer development time.
Furthermore, in developer G, 5-methylbenzotriazole was used instead of 5-nitroindazole, and the halftone dot quality was not as good as developer C. Therefore, it is clear from Table 2 that favorable results are sometimes obtained with developer C as a stable developer which provides good halftone image quality in a short development time.
【表】【table】
【表】
実施例 3
本発明の実施例1と同一の条件下で本発明一般
式()の化合物−4、−5、−10、−
13、−16、−17、−21を用いて実験を行つ
た。結果を第4表に示す。
第4表から明らかな様に本発明のサンプルNo.7
〜24は良好な結果を示した。[Table] Example 3 Compounds of the general formula () of the present invention -4, -5, -10, - under the same conditions as in Example 1 of the present invention
Experiments were conducted using 13, -16, -17, and -21. The results are shown in Table 4. As is clear from Table 4, sample No. 7 of the present invention
~24 showed good results.
Claims (1)
剤層を有し、該乳剤層もしくは他の親水性コロイ
ド層中に下記一般式()で表わされる化合物を
含有してなに写真感光材料を画像露光したのち、
ジヒドロキシベンゼン系現像主薬を0.05乃至0.5
モル/含有し、補助現像主薬を0乃至0.05g/
含有し、遊離の亜硫酸イオンを0.25モル/以
上含有し、5−又は6−ニトロインダゾールを20
mg/以上含有し、かつPHを10.5以上にするに十
分な量のアルカリを含有する現像液で処理するこ
とを特徴とする画像形成方法。 一般式() 式中R1は、炭素数10以下の置換又は無置換の
アルキル基、あるいは置換又は無置換のアリール
基を表わし;R2、R3はそれぞれ独立に水素原子、
ハロゲン原子、カルボキシル基、スルホン酸基、
炭素数10以下の、脂肪族基又は芳香族基を表わ
す。 但し、R1、R2又はR3の少なくとも1つはカル
ボキシル基又はスルホン酸基を含有するものとす
る。[Scope of Claims] 1. What has at least one silver halide emulsion layer on a support and contains a compound represented by the following general formula () in the emulsion layer or other hydrophilic colloid layer? After exposing the photographic material to light,
Dihydroxybenzene-based developing agent from 0.05 to 0.5
mol/contains auxiliary developing agent from 0 to 0.05g/
Contains 0.25 mol/or more of free sulfite ions, and 20% of 5- or 6-nitroindazole.
1. An image forming method characterized by processing with a developer containing alkali in an amount of at least mg/mg/ml and a sufficient amount to raise the pH to 10.5 or more. General formula () In the formula, R 1 represents a substituted or unsubstituted alkyl group having 10 or less carbon atoms, or a substituted or unsubstituted aryl group; R 2 and R 3 each independently represent a hydrogen atom,
halogen atom, carboxyl group, sulfonic acid group,
Represents an aliphatic group or an aromatic group having 10 or less carbon atoms. However, at least one of R 1 , R 2 or R 3 shall contain a carboxyl group or a sulfonic acid group.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP20527983A JPS6097348A (en) | 1983-11-01 | 1983-11-01 | Image forming method |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP20527983A JPS6097348A (en) | 1983-11-01 | 1983-11-01 | Image forming method |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS6097348A JPS6097348A (en) | 1985-05-31 |
| JPH0416098B2 true JPH0416098B2 (en) | 1992-03-23 |
Family
ID=16504340
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP20527983A Granted JPS6097348A (en) | 1983-11-01 | 1983-11-01 | Image forming method |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS6097348A (en) |
-
1983
- 1983-11-01 JP JP20527983A patent/JPS6097348A/en active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS6097348A (en) | 1985-05-31 |
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