JPH0416466B2 - - Google Patents
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- Publication number
- JPH0416466B2 JPH0416466B2 JP8497483A JP8497483A JPH0416466B2 JP H0416466 B2 JPH0416466 B2 JP H0416466B2 JP 8497483 A JP8497483 A JP 8497483A JP 8497483 A JP8497483 A JP 8497483A JP H0416466 B2 JPH0416466 B2 JP H0416466B2
- Authority
- JP
- Japan
- Prior art keywords
- mol
- formula
- reaction
- benzene
- solvent
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 238000006243 chemical reaction Methods 0.000 claims description 23
- 150000001875 compounds Chemical class 0.000 claims description 10
- 238000004519 manufacturing process Methods 0.000 claims description 9
- 125000000217 alkyl group Chemical group 0.000 claims description 7
- 125000005843 halogen group Chemical group 0.000 claims description 5
- 239000003960 organic solvent Substances 0.000 claims description 4
- CFCNTIFLYGKEIO-UHFFFAOYSA-N 2-isocyanoacetic acid Chemical class OC(=O)C[N+]#[C-] CFCNTIFLYGKEIO-UHFFFAOYSA-N 0.000 claims description 3
- 125000003118 aryl group Chemical group 0.000 claims description 3
- 239000003054 catalyst Substances 0.000 claims description 3
- 125000000472 sulfonyl group Chemical group *S(*)(=O)=O 0.000 claims description 2
- 125000004093 cyano group Chemical group *C#N 0.000 claims 1
- UHOVQNZJYSORNB-UHFFFAOYSA-N Benzene Chemical compound C1=CC=CC=C1 UHOVQNZJYSORNB-UHFFFAOYSA-N 0.000 description 45
- XEKOWRVHYACXOJ-UHFFFAOYSA-N Ethyl acetate Chemical compound CCOC(C)=O XEKOWRVHYACXOJ-UHFFFAOYSA-N 0.000 description 23
- CSNNHWWHGAXBCP-UHFFFAOYSA-L Magnesium sulfate Chemical compound [Mg+2].[O-][S+2]([O-])([O-])[O-] CSNNHWWHGAXBCP-UHFFFAOYSA-L 0.000 description 18
- 239000002904 solvent Substances 0.000 description 17
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 16
- 239000013078 crystal Substances 0.000 description 12
- VLKZOEOYAKHREP-UHFFFAOYSA-N n-Hexane Chemical compound CCCCCC VLKZOEOYAKHREP-UHFFFAOYSA-N 0.000 description 11
- XTHFKEDIFFGKHM-UHFFFAOYSA-N Dimethoxyethane Chemical compound COCCOC XTHFKEDIFFGKHM-UHFFFAOYSA-N 0.000 description 10
- CDBYLPFSWZWCQE-UHFFFAOYSA-L Sodium Carbonate Chemical compound [Na+].[Na+].[O-]C([O-])=O CDBYLPFSWZWCQE-UHFFFAOYSA-L 0.000 description 10
- 239000000203 mixture Substances 0.000 description 10
- 239000007788 liquid Substances 0.000 description 9
- 229910052943 magnesium sulfate Inorganic materials 0.000 description 9
- 235000019341 magnesium sulphate Nutrition 0.000 description 9
- 239000000243 solution Substances 0.000 description 9
- FPULFENIJDPZBX-UHFFFAOYSA-N ethyl 2-isocyanoacetate Chemical compound CCOC(=O)C[N+]#[C-] FPULFENIJDPZBX-UHFFFAOYSA-N 0.000 description 8
- -1 sodium alkoxide Chemical class 0.000 description 8
- 229910000104 sodium hydride Inorganic materials 0.000 description 8
- HPALAKNZSZLMCH-UHFFFAOYSA-M sodium;chloride;hydrate Chemical class O.[Na+].[Cl-] HPALAKNZSZLMCH-UHFFFAOYSA-M 0.000 description 8
- IAZDPXIOMUYVGZ-UHFFFAOYSA-N Dimethylsulphoxide Chemical compound CS(C)=O IAZDPXIOMUYVGZ-UHFFFAOYSA-N 0.000 description 7
- ZMXDDKWLCZADIW-UHFFFAOYSA-N N,N-Dimethylformamide Chemical compound CN(C)C=O ZMXDDKWLCZADIW-UHFFFAOYSA-N 0.000 description 6
- WYURNTSHIVDZCO-UHFFFAOYSA-N Tetrahydrofuran Chemical compound C1CCOC1 WYURNTSHIVDZCO-UHFFFAOYSA-N 0.000 description 6
- XUSJWQZDJNSHKW-UHFFFAOYSA-N ethyl 3-(2-chlorophenyl)-4-cyano-1h-pyrrole-2-carboxylate Chemical compound N1C=C(C#N)C(C=2C(=CC=CC=2)Cl)=C1C(=O)OCC XUSJWQZDJNSHKW-UHFFFAOYSA-N 0.000 description 6
- 238000010898 silica gel chromatography Methods 0.000 description 6
- 239000000725 suspension Substances 0.000 description 6
- 238000005406 washing Methods 0.000 description 6
- 239000012046 mixed solvent Substances 0.000 description 5
- 239000011734 sodium Substances 0.000 description 5
- 229910052708 sodium Inorganic materials 0.000 description 5
- 229910000029 sodium carbonate Inorganic materials 0.000 description 5
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 4
- DGAQECJNVWCQMB-PUAWFVPOSA-M Ilexoside XXIX Chemical compound C[C@@H]1CC[C@@]2(CC[C@@]3(C(=CC[C@H]4[C@]3(CC[C@@H]5[C@@]4(CC[C@@H](C5(C)C)OS(=O)(=O)[O-])C)C)[C@@H]2[C@]1(C)O)C)C(=O)O[C@H]6[C@@H]([C@H]([C@@H]([C@H](O6)CO)O)O)O.[Na+] DGAQECJNVWCQMB-PUAWFVPOSA-M 0.000 description 4
- KEAYESYHFKHZAL-UHFFFAOYSA-N Sodium Chemical compound [Na] KEAYESYHFKHZAL-UHFFFAOYSA-N 0.000 description 4
- 239000005457 ice water Substances 0.000 description 4
- 239000012044 organic layer Substances 0.000 description 4
- 238000010992 reflux Methods 0.000 description 4
- 239000012312 sodium hydride Substances 0.000 description 4
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 4
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 3
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 3
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 3
- 150000003233 pyrroles Chemical class 0.000 description 3
- 238000003756 stirring Methods 0.000 description 3
- YLQBMQCUIZJEEH-UHFFFAOYSA-N tetrahydrofuran Natural products C=1C=COC=1 YLQBMQCUIZJEEH-UHFFFAOYSA-N 0.000 description 3
- ZWKNLRXFUTWSOY-UHFFFAOYSA-N 3-phenylprop-2-enenitrile Chemical compound N#CC=CC1=CC=CC=C1 ZWKNLRXFUTWSOY-UHFFFAOYSA-N 0.000 description 2
- QPLDLSVMHZLSFG-UHFFFAOYSA-N Copper oxide Chemical compound [Cu]=O QPLDLSVMHZLSFG-UHFFFAOYSA-N 0.000 description 2
- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 2
- SMWDFEZZVXVKRB-UHFFFAOYSA-N Quinoline Chemical compound N1=CC=CC2=CC=CC=C21 SMWDFEZZVXVKRB-UHFFFAOYSA-N 0.000 description 2
- 239000012043 crude product Substances 0.000 description 2
- 239000000417 fungicide Substances 0.000 description 2
- 238000000034 method Methods 0.000 description 2
- BWHMMNNQKKPAPP-UHFFFAOYSA-L potassium carbonate Chemical compound [K+].[K+].[O-]C([O-])=O BWHMMNNQKKPAPP-UHFFFAOYSA-L 0.000 description 2
- 239000002994 raw material Substances 0.000 description 2
- BQMPGKPTOHKYHS-UHFFFAOYSA-N 1h-pyrrole-2-carbonitrile Chemical compound N#CC1=CC=CN1 BQMPGKPTOHKYHS-UHFFFAOYSA-N 0.000 description 1
- PCYWMDGJYQAMCR-UHFFFAOYSA-N 1h-pyrrole-3-carbonitrile Chemical compound N#CC=1C=CNC=1 PCYWMDGJYQAMCR-UHFFFAOYSA-N 0.000 description 1
- AIBTZXKBPAAMRL-UHFFFAOYSA-N 2-(4-methylphenyl)sulfonyl-3-phenylprop-2-enenitrile Chemical compound C1=CC(C)=CC=C1S(=O)(=O)C(C#N)=CC1=CC=CC=C1 AIBTZXKBPAAMRL-UHFFFAOYSA-N 0.000 description 1
- JLQRIXWUYHCQNC-UHFFFAOYSA-N 2-chloro-3-phenylprop-2-enenitrile Chemical compound N#CC(Cl)=CC1=CC=CC=C1 JLQRIXWUYHCQNC-UHFFFAOYSA-N 0.000 description 1
- GEWCXMLSRUQIDQ-UHFFFAOYSA-N 4-(2-chlorophenyl)-1h-pyrrole-3-carbonitrile Chemical compound ClC1=CC=CC=C1C1=CNC=C1C#N GEWCXMLSRUQIDQ-UHFFFAOYSA-N 0.000 description 1
- QHCBCVFLFCKZJA-UHFFFAOYSA-N 5-phenyl-1h-pyrrole-3-carbonitrile Chemical compound N#CC1=CNC(C=2C=CC=CC=2)=C1 QHCBCVFLFCKZJA-UHFFFAOYSA-N 0.000 description 1
- DFGKGUXTPFWHIX-UHFFFAOYSA-N 6-[2-[4-[2-(2,3-dihydro-1H-inden-2-ylamino)pyrimidin-5-yl]piperazin-1-yl]acetyl]-3H-1,3-benzoxazol-2-one Chemical compound C1C(CC2=CC=CC=C12)NC1=NC=C(C=N1)N1CCN(CC1)CC(=O)C1=CC2=C(NC(O2)=O)C=C1 DFGKGUXTPFWHIX-UHFFFAOYSA-N 0.000 description 1
- LSNNMFCWUKXFEE-UHFFFAOYSA-M Bisulfite Chemical compound OS([O-])=O LSNNMFCWUKXFEE-UHFFFAOYSA-M 0.000 description 1
- WKBOTKDWSSQWDR-UHFFFAOYSA-N Bromine atom Chemical group [Br] WKBOTKDWSSQWDR-UHFFFAOYSA-N 0.000 description 1
- 239000005749 Copper compound Substances 0.000 description 1
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 1
- JAWMENYCRQKKJY-UHFFFAOYSA-N [3-(2,4,6,7-tetrahydrotriazolo[4,5-c]pyridin-5-ylmethyl)-1-oxa-2,8-diazaspiro[4.5]dec-2-en-8-yl]-[2-[[3-(trifluoromethoxy)phenyl]methylamino]pyrimidin-5-yl]methanone Chemical compound N1N=NC=2CN(CCC=21)CC1=NOC2(C1)CCN(CC2)C(=O)C=1C=NC(=NC=1)NCC1=CC(=CC=C1)OC(F)(F)F JAWMENYCRQKKJY-UHFFFAOYSA-N 0.000 description 1
- 230000002378 acidificating effect Effects 0.000 description 1
- 239000003905 agrochemical Substances 0.000 description 1
- 239000002585 base Substances 0.000 description 1
- SLUNEGLMXGHOLY-UHFFFAOYSA-N benzene;hexane Chemical compound CCCCCC.C1=CC=CC=C1 SLUNEGLMXGHOLY-UHFFFAOYSA-N 0.000 description 1
- GDTBXPJZTBHREO-UHFFFAOYSA-N bromine Chemical group BrBr GDTBXPJZTBHREO-UHFFFAOYSA-N 0.000 description 1
- 229910052794 bromium Inorganic materials 0.000 description 1
- 239000000460 chlorine Substances 0.000 description 1
- 229910052801 chlorine Inorganic materials 0.000 description 1
- 125000001309 chloro group Chemical group Cl* 0.000 description 1
- 238000004440 column chromatography Methods 0.000 description 1
- 238000001816 cooling Methods 0.000 description 1
- 150000001880 copper compounds Chemical class 0.000 description 1
- BERDEBHAJNAUOM-UHFFFAOYSA-N copper(I) oxide Inorganic materials [Cu]O[Cu] BERDEBHAJNAUOM-UHFFFAOYSA-N 0.000 description 1
- 229960004643 cupric oxide Drugs 0.000 description 1
- KRFJLUBVMFXRPN-UHFFFAOYSA-N cuprous oxide Chemical compound [O-2].[Cu+].[Cu+] KRFJLUBVMFXRPN-UHFFFAOYSA-N 0.000 description 1
- 229940112669 cuprous oxide Drugs 0.000 description 1
- 230000000911 decarboxylating effect Effects 0.000 description 1
- 238000000354 decomposition reaction Methods 0.000 description 1
- 239000003814 drug Substances 0.000 description 1
- 239000003480 eluent Substances 0.000 description 1
- 150000002148 esters Chemical class 0.000 description 1
- 238000000605 extraction Methods 0.000 description 1
- 238000001914 filtration Methods 0.000 description 1
- 125000000524 functional group Chemical group 0.000 description 1
- 230000000855 fungicidal effect Effects 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 238000004128 high performance liquid chromatography Methods 0.000 description 1
- 239000001257 hydrogen Substances 0.000 description 1
- 229910052739 hydrogen Inorganic materials 0.000 description 1
- 150000007529 inorganic bases Chemical class 0.000 description 1
- 239000010410 layer Substances 0.000 description 1
- 238000002844 melting Methods 0.000 description 1
- 230000008018 melting Effects 0.000 description 1
- 125000004184 methoxymethyl group Chemical group [H]C([H])([H])OC([H])([H])* 0.000 description 1
- 125000004170 methylsulfonyl group Chemical group [H]C([H])([H])S(*)(=O)=O 0.000 description 1
- 239000002480 mineral oil Substances 0.000 description 1
- 235000010446 mineral oil Nutrition 0.000 description 1
- 125000002560 nitrile group Chemical group 0.000 description 1
- 150000002825 nitriles Chemical group 0.000 description 1
- 239000012299 nitrogen atmosphere Substances 0.000 description 1
- 150000007530 organic bases Chemical class 0.000 description 1
- 239000011591 potassium Substances 0.000 description 1
- 229910052700 potassium Inorganic materials 0.000 description 1
- 229910000027 potassium carbonate Inorganic materials 0.000 description 1
- 239000000047 product Substances 0.000 description 1
- 238000000746 purification Methods 0.000 description 1
- KFZUDNZQQCWGKF-UHFFFAOYSA-M sodium;4-methylbenzenesulfinate Chemical compound [Na+].CC1=CC=C(S([O-])=O)C=C1 KFZUDNZQQCWGKF-UHFFFAOYSA-M 0.000 description 1
- LYPGDCWPTHTUDO-UHFFFAOYSA-M sodium;methanesulfinate Chemical compound [Na+].CS([O-])=O LYPGDCWPTHTUDO-UHFFFAOYSA-M 0.000 description 1
- 238000010183 spectrum analysis Methods 0.000 description 1
- 125000002088 tosyl group Chemical group [H]C1=C([H])C(=C([H])C([H])=C1C([H])([H])[H])S(*)(=O)=O 0.000 description 1
Landscapes
- Pyrrole Compounds (AREA)
- Low-Molecular Organic Synthesis Reactions Using Catalysts (AREA)
Description
【発明の詳細な説明】
本発明は医薬、農薬等の中間体として有用な一
般式
(式中Rは低級アルキル基を、Xはハロゲン原子
を、nは0、1又は2を示す。)で表わされる化
合物及びその製造方法に関するものである。Detailed Description of the Invention The present invention provides a general formula useful as an intermediate for pharmaceuticals, agricultural chemicals, etc. (In the formula, R represents a lower alkyl group, X represents a halogen atom, and n represents 0, 1 or 2) and a method for producing the same.
本発明化合物は、例えば2位を脱炭酸したのち
1位にアシル化することにより特開昭56−
7967255−51066、55−57508等に記載の農園芸用
殺菌剤を収率よく製造できる。 The compound of the present invention can be prepared by, for example, decarboxylating the 2nd position and then acylating the 1st position.
The agricultural and horticultural fungicides described in 7967255-51066, 55-57508, etc. can be produced with good yield.
上記ピロール誘導体の殺菌剤の製造方法として
は下記反応式に示す方法が知られている。 As a method for producing the above-mentioned pyrrole derivative fungicide, a method shown in the following reaction formula is known.
(式中X及びnは前記と同一の意味を示し、
R′はH、低級アルキル又はメトキシメチルを示
す。)しかしながら該製造方法は化合物()と
化合物()を反応させることにより本発明化合
物を経ることなく式()で表わされるピロール
誘導体が得られるが、その収率はXnの種類、反
応条件により30〜70%と低収率であるばかりでな
く、重要な原料化合物である化合物()は下記
反応式に示す方法により製造されることが知られ
ているが、収率が低く高いコストがかかる等の欠
点を有していた。 (In the formula, X and n have the same meanings as above,
R' represents H, lower alkyl or methoxymethyl. ) However, in this production method, the pyrrole derivative represented by the formula () can be obtained by reacting the compound () with the compound () without passing through the compound of the present invention, but the yield varies depending on the type of Xn and the reaction conditions. Not only is the yield low at ~70%, but compound (), which is an important raw material compound, is known to be produced by the method shown in the reaction formula below, but the yield is low and the cost is high. It had the following drawbacks.
本発明者らはより入手しやすい安価な原料を用
いて収率よく前記ピロール誘導体を製造する方法
について検討を重ね本発明を完成した。 The present inventors have completed the present invention through repeated studies on a method for producing the pyrrole derivatives in good yield using readily available and inexpensive raw materials.
本発明の化合物は一般式
(式中X及びnは前記と同一の意味を示し、Zは
ハロゲン原子、ニトリル基又は式SO2r(rはアル
キル基又はアリール基を示す。)で表わされるス
ルホニル基を示す。}で表わされるシンナムニト
リル類と一般式()CNCH2COOR(式中Rは前
記と同一の意味を示す。)で表わされるイソシア
ノ酢酸エステル類とを有機溶媒中、塩基又は触媒
の存在下反応させることにより製造することがで
きる。 The compounds of the present invention have the general formula (In the formula, X and n have the same meanings as above, and Z represents a halogen atom, a nitrile group, or a sulfonyl group represented by the formula SO 2 r (r represents an alkyl group or an aryl group). By reacting cinnamnitrile and isocyanoacetic esters represented by the general formula () CNCH 2 COOR (in the formula, R has the same meaning as above) in an organic solvent in the presence of a base or a catalyst. can be manufactured.
塩基としては水素化ナトリウム、ナトリウムア
ルコキシド、カリウムアルコキシド、金属ナトリ
ウム、炭酸カリあるいは炭酸ナトリウム等の有機
又は無機塩基が用いられる。塩基として水素化ナ
トリウム、アルコラート、金属ナトリウム等を用
いる場合は有機溶媒はベンゼン、トルエン、エー
テル、テトラヒドロフラン、ジメトキシエタン等
の非水素溶媒を用いることができるが、ジメトキ
シエタン、ジメチルスルホキシド、ジメチルホル
ムアミド等のアニオン安定化溶媒を用いるか又は
イソシアノ酢酸エステルと当量のジメチルスルホ
キシドもしくはジメチルホルムアミドを添加した
混合溶媒を用いるのが好ましい。塩基として炭酸
ナトリムウを用いる場合は前記の溶媒の他にメタ
ノール、エタノール等を用いることもでき、特に
含水エタノールを用いるのが好ましい。触媒とし
てはイソシアノ酢酸エステル類と錯体を形成する
銅化合物、例えば酸化第1銅が用いられる。 As the base, an organic or inorganic base such as sodium hydride, sodium alkoxide, potassium alkoxide, metallic sodium, potassium carbonate or sodium carbonate is used. When using sodium hydride, alcoholate, metallic sodium, etc. as the base, non-hydrogen solvents such as benzene, toluene, ether, tetrahydrofuran, dimethoxyethane, etc. can be used as the organic solvent, but dimethoxyethane, dimethylsulfoxide, dimethylformamide, etc. It is preferable to use an anion-stabilizing solvent or a mixed solvent to which isocyanoacetate and an equivalent amount of dimethyl sulfoxide or dimethyl formamide are added. When sodium carbonate is used as the base, methanol, ethanol, etc. can also be used in addition to the above-mentioned solvents, and it is particularly preferable to use aqueous ethanol. As a catalyst, a copper compound that forms a complex with isocyanoacetic acid esters, such as cuprous oxide, is used.
反応温度は用いる塩基、溶媒等により異なるが
通常室温あるいは冷却下0℃〜45℃の緩和な条件
下で行われる。但し、炭酸ナトリウム−含水エタ
ノールの系で反応を行なう場合は加熱還流下でも
可能である。 The reaction temperature varies depending on the base, solvent, etc. used, but is usually carried out at room temperature or under mild conditions of 0°C to 45°C under cooling. However, when the reaction is carried out in a sodium carbonate-hydrated ethanol system, heating under reflux is also possible.
前記一般式()で表わされるシンナムニトリ
ル類のZとしては塩素、臭素、ニトリル、メタン
スルホニル、エタンスルホニル、トシル等脱離基
として利用できる官能基を用いることができる
が、スルホン酸含有基を用いるのが好ましい。 As Z in the cinnamnitrile represented by the above general formula (), functional groups that can be used as leaving groups such as chlorine, bromine, nitrile, methanesulfonyl, ethanesulfonyl, and tosyl can be used, but sulfonic acid-containing groups can be used. It is preferable to use
尚、本発明化合物の構造はMASS,NMR,IR
等のスペクトル分析結果から決定した。 The structure of the compound of the present invention has been determined by MASS, NMR, and IR.
This was determined from the results of spectral analysis.
以下、実施例を挙げて本発明化合物の製造方法
について更に詳しく説明する。 Hereinafter, the method for producing the compound of the present invention will be explained in more detail with reference to Examples.
実施例 1
30ml4頚フラスコにα−シアノ−O−クロロシ
ンナモニトリル4.7g、60%水素化ナトリウム1.1
g、乾燥テトラヒドロフラン15mlを仕込み5〜10
℃に冷却し、窒素雰囲気下5mlの乾燥テトラヒド
ロフラン5mlに溶解したイソシアノ酢酸エチルエ
ステル3.1gを反応温度10℃以下で滴下した。滴
下後室温で3時間撹拌し反応を完結させ析出した
結晶を別した。液を減圧乾固せしめベンゼン
で溶解し水洗乾燥後再度減圧乾固した。得られた
粗結晶をエタノールで再結晶し、3gの3−シア
ノ−4−(2−クロルフエニル)−5−カルボエト
キシピロールを得た。収率44%
実施例 2
α−クロル−O−クロルシンナモニトリル2g
(0.01モル)とエチルイソシアノアセテート1.3g
(0.0115モル)を乾燥したベンゼン30mlに溶かし
た溶液をN2気流中、50%水素化ナトリウム0.6g
(0.0125モル)の乾燥したベンゼン20mlと
DMSO10mlの懸濁液に0°〜5℃の間で滴下し反応
させた。その後室温で1時間撹拌した。反応液を
氷水50mlの中に注入し、酢酸エチル30mlで2回抽
出し、有機層を飽和食塩水30mlで2回洗浄後硫酸
マグネシウムで乾燥して濃縮した。残留物をベン
ゼンを展開溶媒としてシリカゲルカラムクロマト
グラフイーにかけ精製すると2−エトキシカルボ
ニル−3−(2−クロルフエニル)−4−シアノピ
ロール1gを得た。収率38% mp136−138℃
実施例 3
α−クロルシンナモニトリル2.5g(0.015モ
ル)とエチルイソシアノアセテート2.1g
(0.0185モル)を乾燥したジメトキシエタン25ml
に溶かした溶液をN2気流中、50%NaH1.1g
(0.0229モル)の乾燥したジメトキシエタン15ml
の懸濁液に反応温度が45℃を越えないように徐々
に滴下した。その後室温で1時間撹拌した。反応
液を氷水30mlの中に注入し酢酸エチル50mlで抽出
し、有機層を飽和食塩水で洗浄後硫酸マグネシウ
ムで乾燥して濃縮した。残留物をベンゼンを展開
溶媒としてシリカゲルカラムクロマトグラフイー
にかけ精製すると2−エトキシカルボニル−3−
フエニル−4−シアノピロール1.3gを得た。収
率36.1% mp156−158℃
実施例 4
α−トシル−O−クロルシンナモニトリル2g
(0.0063モル)とエチルイソシアノアセテート0.9
g(0.0079モル)を乾燥したジメトキシエタン30
mlに溶かした溶液をN2気流中、50%NaH0.4g
(0.0083モル)の乾燥したジメトキシエタン10ml
の懸濁液に反応温度が45℃を越えないように徐々
に滴下した。その後室温で30分撹拌した。反応後
析出したp−トルエンフルフイン酸ソーダを別
し、液を濃縮して残留物を酢酸エチル50mlに溶
解させ飽和食塩水で洗浄、次いで硫酸マグネシウ
ムで乾燥し、溶媒を減圧下留去した。得られた粗
結晶をn−ヘキサン/ベンゼン2対1の混合溶媒
10mlで洗浄し、2−エトキシカルボニル−3−
(2−クロルフエニル)−4−シアノピロール0.9
gを得た。洗液を濃縮して残留物をベンゼンを展
開溶媒としてシリカゲルカラムクロマトグラフイ
ーにかけ精製し、二次晶として0.53g得られた。Example 1 4.7 g of α-cyano-O-chlorocinnamonitrile and 1.1 g of 60% sodium hydride in a 30 ml four-necked flask.
g, prepare 15 ml of dry tetrahydrofuran and prepare 5 to 10 g.
3.1 g of isocyanoacetic acid ethyl ester dissolved in 5 ml of dry tetrahydrofuran was added dropwise under a nitrogen atmosphere at a reaction temperature of 10° C. or lower. After the dropwise addition, the mixture was stirred at room temperature for 3 hours to complete the reaction and the precipitated crystals were separated. The solution was dried under reduced pressure, dissolved in benzene, washed with water, dried, and dried again under reduced pressure. The obtained crude crystals were recrystallized from ethanol to obtain 3 g of 3-cyano-4-(2-chlorophenyl)-5-carboethoxypyrrole. Yield 44% Example 2 α-Chlor-O-chlorcinnamonitrile 2g
(0.01 mol) and ethyl isocyanoacetate 1.3 g
(0.0115 mol) in 30 ml of dry benzene was dissolved in 0.6 g of 50% sodium hydride in a stream of N2 .
(0.0125 mol) of dry benzene and 20 ml of
It was added dropwise to a suspension of 10 ml of DMSO at a temperature of 0° to 5°C to cause a reaction. Thereafter, the mixture was stirred at room temperature for 1 hour. The reaction solution was poured into 50 ml of ice water, extracted twice with 30 ml of ethyl acetate, and the organic layer was washed twice with 30 ml of saturated brine, dried over magnesium sulfate, and concentrated. The residue was purified by silica gel column chromatography using benzene as a developing solvent to obtain 1 g of 2-ethoxycarbonyl-3-(2-chlorophenyl)-4-cyanopyrrole. Yield 38% mp136-138℃ Example 3 2.5 g (0.015 mol) of α-chlorcinnamonitrile and 2.1 g of ethyl isocyanoacetate
(0.0185 mol) of dried dimethoxyethane 25 ml
1.1 g of 50% NaH in a N2 stream
(0.0229 mol) of dry dimethoxyethane 15 ml
was gradually added dropwise to the suspension so that the reaction temperature did not exceed 45°C. Thereafter, the mixture was stirred at room temperature for 1 hour. The reaction solution was poured into 30 ml of ice water, extracted with 50 ml of ethyl acetate, and the organic layer was washed with saturated brine, dried over magnesium sulfate, and concentrated. The residue was purified by silica gel column chromatography using benzene as a developing solvent, resulting in 2-ethoxycarbonyl-3-
1.3 g of phenyl-4-cyanopyrrole was obtained. Yield 36.1% mp156-158℃ Example 4 α-Tosyl-O-chlorcinnamonitrile 2g
(0.0063 mol) and ethyl isocyanoacetate 0.9
g (0.0079 mol) of dried dimethoxyethane 30
0.4 g of 50% NaH in a stream of N2
(0.0083 mol) of dry dimethoxyethane 10 ml
was gradually added dropwise to the suspension so that the reaction temperature did not exceed 45°C. Thereafter, the mixture was stirred at room temperature for 30 minutes. After the reaction, the precipitated sodium p-toluenefluinate was separated, the liquid was concentrated, the residue was dissolved in 50 ml of ethyl acetate, washed with saturated brine, and then dried over magnesium sulfate, and the solvent was distilled off under reduced pressure. The obtained crude crystals were dissolved in a mixed solvent of n-hexane/benzene (2:1).
Wash with 10 ml of 2-ethoxycarbonyl-3-
(2-chlorophenyl)-4-cyanopyrrole 0.9
I got g. The washing liquid was concentrated, and the residue was purified by silica gel column chromatography using benzene as a developing solvent to obtain 0.53 g of secondary crystals.
収率 82.7% mp136−138℃
実施例 5
α−トシル−シンナモニトリル3g(0.0106モ
ル)とエチルイソシアノアセテート1.4g
(0.0123モル)を乾燥したジメトキシエタン20ml
に溶かした溶液をN2気流下50%NaH0.6g
(0.0125モル)の乾燥したジメトキシエタン10ml
の懸濁液に反応温度が43℃を越えないように徐々
に滴下した。その後室温で1時間撹拌した。反応
後析出したp−トルエンスルフイン酸ソーダを
別し、液を濃縮して残留物を酢酸エチル30mlに
溶解させ、飽和食塩水で水洗後硫酸マグネシウム
で乾燥して、溶媒を減圧下留去した。得られた粗
結晶をn−ヘキサン、ベンゼン1対1の混合溶媒
10mlで洗浄し、1.8gの2−エトキシカルボニル
−3−フエニル−4−シアノピロール1.8gを得
た。洗液を濃縮して残留物をベンゼンを展開溶媒
としてシリカゲルカラムクロマトグラフイーにか
け精製すると二次晶として0.128gを得た。収率
75.8% mp156−158℃
実施例 6
α−メチルスルホニル−0−クロルシンナモニ
トリル2g(0.00828モル)とエチルイソシアノ
アセテート1g(0.0088モル)を乾燥したジメト
キシエタン25mlに溶かした溶液をN2気流中50%
NaH0.4g(0.0083モル)の乾燥したジメトキシ
エタン10mlの懸濁液に反応温度が40℃を越えない
ように徐々に滴下した。その後室温で30分撹拌し
た。反応後析出したメタンスルフイン酸ナトリウ
ムを別し、液を濃縮して得られた残留物をn
−ヘキサン40mlで2回洗浄して鉱油成分を除去
し、次いで残渣を酢酸エチル35mlに溶解させ飽和
食塩水で洗浄、次いで硫酸マグネシウムで乾燥し
溶媒を減圧下留去した。得られた粗結晶をn−ヘ
キサンヘンゼン1対1の混合溶媒10mlで洗浄し、
2−エトキシカルボニル−3−(2−クロルフエ
ニル)−4−シアノピロール1.5gを得た。洗液を
濃縮して残留物をベンゼンを展開溶媒としてシリ
カゲルカラムクロマトグラフイーにかけ精製し、
二次晶として0.36g得た。収率82.7% mp140−
141℃
実施例 7
α−メチルスルホニル−0−クロルシンナモニ
トリル2g(0.00828モル)とエチルイソシアノ
アセテート0.95g(0.0084モル)をエタノール40
mlに溶かした溶液に炭酸ナトリウム0.53g
(0.005モル)を加え50分間加熱還流した。反応終
了後室温に冷却し、過して析出した炭酸ナトリ
ウムの結晶を除いた。液に酢酸エチルエステル
30mlを加えて過し、液を飽和食塩水で洗浄
後、硫酸マグネシウムで乾燥し溶媒を減圧下留去
した。得られた粗結晶をn−ヘキサン−ベンゼン
7対3の混合溶媒で洗浄し、2−エトキシカルボ
ニル−3−(2−クロルフエニル)−4−シアノピ
ロール1.55gを得た。洗液を濃縮してベンゼンを
展開溶媒としてカラムクロマトグラフイーにかけ
て精製し二次晶として0.1gを得た。収率 72.7
%
実施例 8
α−トシル−0−クロルシンナモニトリル6.35
(0.02モル)、エチルイソシアノアセテート2.26g
(0.02モル)、炭酸ナトリウム1.06g(0.01モル)、
エタノール30ml、水10mlからなる懸濁液を撹拌
下、30分間加熱還流した。反応液はロータリーエ
バポレーターを用いてエタノールを留去の後残渣
をベンゼン抽出した。ベンゼン層は水洗後、硫酸
マグネシウムにて乾燥、溶媒を留去した。得られ
た結晶は、n−ヘキサン洗浄して5.5gの2−エ
トキシカルボニル−3−(2−クロルフエニル)−
4−シアノピロールを得た。高速液体クロマトグ
ラフイー純度92.3% 収率 92.3%
参考例 1
エタノール8ml、水16.3ml、水酸化ナトリウム
1.6g(0.04モル)からなる溶液中に2−エトキ
シカルボニル−3−(2−クロルフエニル)−4−
シアノピロール5.49g(0.02モル)を加え、撹拌
下、5時間加熱還流した。反応液は冷却後、氷水
中に注加し、次いで塩酸を加えて酸性とした。こ
のものは酢酸エチルで抽出し、有機層は飽和食塩
水で洗浄後、硫酸マグネシウムで乾燥した。溶媒
を減圧下に留去、真空ポンプで乾燥して4.52gの
2−カルボキシ−3−(2−クロルフエニル)−4
−シアノピロールを得た。収率91.3% 分解点
215.1℃
(このものは特に精製する事なく次工程へ用いる
事が出来る純度を有する。)
参考例 2
2−カルボキシ−3−(2−クロルフエニル)−
4−シアノピロール9.86g(0.04モル)、キノリ
ン20ml、酸化第二銅0.64g(0.008モル)からな
る混合物を撹拌下、150〜60℃にて2.5時間加熱し
た。反応液は室温まで冷却後、濃塩酸20gを含む
氷水中に注加した。酢酸エチル200mlを用いて抽
出後、有機層は飽和食塩水で洗浄、次いで硫酸マ
グネシウムで乾燥した。溶媒を減圧下に留去して
粗製品8.0gを得た。Yield 82.7% mp136-138℃ Example 5 3 g (0.0106 mol) α-tosyl-cinnamonitrile and 1.4 g ethyl isocyanoacetate
(0.0123 mol) of dried dimethoxyethane 20 ml
0.6 g of 50% NaH under a stream of N2
(0.0125 mol) of dry dimethoxyethane 10 ml
was gradually added dropwise to the suspension so that the reaction temperature did not exceed 43°C. Thereafter, the mixture was stirred at room temperature for 1 hour. After the reaction, the precipitated sodium p-toluenesulfinate was separated, the liquid was concentrated, and the residue was dissolved in 30 ml of ethyl acetate, washed with saturated brine, dried over magnesium sulfate, and the solvent was distilled off under reduced pressure. . The obtained crude crystals were mixed with n-hexane and benzene in a mixed solvent of 1:1.
Washing with 10 ml gave 1.8 g of 2-ethoxycarbonyl-3-phenyl-4-cyanopyrrole. The washing liquid was concentrated, and the residue was purified by silica gel column chromatography using benzene as a developing solvent to obtain 0.128 g of secondary crystals. yield
75.8% mp156−158℃ Example 6 A solution of 2 g (0.00828 mol) of α-methylsulfonyl-0-chlorocinnamonitrile and 1 g (0.0088 mol) of ethyl isocyanoacetate in 25 ml of dry dimethoxyethane was prepared at 50% concentration in a stream of N2 .
The mixture was gradually added dropwise to a suspension of 0.4 g (0.0083 mol) of NaH in 10 ml of dry dimethoxyethane so that the reaction temperature did not exceed 40°C. Thereafter, the mixture was stirred at room temperature for 30 minutes. After the reaction, the precipitated sodium methanesulfinate was separated and the liquid was concentrated.
- The mineral oil component was removed by washing twice with 40 ml of hexane, then the residue was dissolved in 35 ml of ethyl acetate, washed with saturated brine, then dried over magnesium sulfate, and the solvent was distilled off under reduced pressure. The obtained crude crystals were washed with 10 ml of a mixed solvent of 1:1 n-hexane and Hensen,
1.5 g of 2-ethoxycarbonyl-3-(2-chlorophenyl)-4-cyanopyrrole was obtained. The washing liquid was concentrated and the residue was purified by silica gel column chromatography using benzene as a developing solvent.
0.36g of secondary crystals was obtained. Yield 82.7% mp140−
141℃ Example 7 2 g (0.00828 mol) of α-methylsulfonyl-0-chlorocinnamonitrile and 0.95 g (0.0084 mol) of ethyl isocyanoacetate were added to 40 ml of ethanol.
0.53 g of sodium carbonate in solution dissolved in ml
(0.005 mol) was added and heated under reflux for 50 minutes. After the reaction was completed, the mixture was cooled to room temperature and the precipitated sodium carbonate crystals were removed. acetic acid ethyl ester in liquid
After adding 30 ml and filtering, the liquid was washed with saturated brine, dried over magnesium sulfate, and the solvent was distilled off under reduced pressure. The obtained crude crystals were washed with a mixed solvent of 7:3 of n-hexane-benzene to obtain 1.55 g of 2-ethoxycarbonyl-3-(2-chlorophenyl)-4-cyanopyrrole. The washing liquid was concentrated and purified by column chromatography using benzene as a developing solvent to obtain 0.1 g of secondary crystals. Yield 72.7
% Example 8 α-Tosyl-0-chlorcinnamonitrile 6.35
(0.02 mol), ethyl isocyanoacetate 2.26 g
(0.02 mol), sodium carbonate 1.06g (0.01 mol),
A suspension consisting of 30 ml of ethanol and 10 ml of water was heated under reflux for 30 minutes while stirring. Ethanol was distilled off from the reaction solution using a rotary evaporator, and the residue was extracted with benzene. The benzene layer was washed with water, dried over magnesium sulfate, and the solvent was distilled off. The obtained crystals were washed with n-hexane to give 5.5 g of 2-ethoxycarbonyl-3-(2-chlorophenyl)-
4-cyanopyrrole was obtained. High performance liquid chromatography Purity 92.3% Yield 92.3% Reference example 1 8 ml of ethanol, 16.3 ml of water, sodium hydroxide
2-ethoxycarbonyl-3-(2-chlorophenyl)-4- in a solution consisting of 1.6 g (0.04 mol)
5.49 g (0.02 mol) of cyanopyrrole was added, and the mixture was heated under reflux for 5 hours while stirring. After the reaction solution was cooled, it was poured into ice water, and then hydrochloric acid was added to make it acidic. This was extracted with ethyl acetate, and the organic layer was washed with saturated brine and dried over magnesium sulfate. The solvent was distilled off under reduced pressure and dried using a vacuum pump to give 4.52 g of 2-carboxy-3-(2-chlorophenyl)-4.
- Cyanopyrrole was obtained. Yield 91.3% Decomposition point
215.1℃ (This product has a purity that can be used in the next step without any particular purification.) Reference example 2 2-carboxy-3-(2-chlorophenyl)-
A mixture consisting of 9.86 g (0.04 mol) of 4-cyanopyrrole, 20 ml of quinoline, and 0.64 g (0.008 mol) of cupric oxide was heated at 150 to 60° C. for 2.5 hours with stirring. After the reaction solution was cooled to room temperature, it was poured into ice water containing 20 g of concentrated hydrochloric acid. After extraction with 200 ml of ethyl acetate, the organic layer was washed with saturated brine and then dried over magnesium sulfate. The solvent was distilled off under reduced pressure to obtain 8.0 g of a crude product.
粗製品はシリカゲルカラムクロマト法(溶出液
ベンゼン)で精製し、7.03gの3−(2−クロル
フエニル)−4−シアノピロールを得た。 The crude product was purified by silica gel column chromatography (eluent: benzene) to obtain 7.03 g of 3-(2-chlorophenyl)-4-cyanopyrrole.
収率 86.8% 融点 139.4℃Yield 86.8% Melting point 139.4℃
Claims (1)
を、nは0、1又は2を示す。)で表わされる化
合物。 2 一般式 {式中Xはハロゲン原子を、nは0、1又は2
を、Zはハロゲン原子、シアノ基又は式SO2r(r
はアルキル基又はアリール基を示す。)で表わさ
れるスルホニル基を示す。}で表わされるシンナ
ムニトリル類と、 一般式 CNCH2COOR () (式中Rは低級アルキル基を示す。)で表わされ
るイソシアノ酢酸エステル類とを反応させること
を特徴とする一般式 (式中X、R及びnは前記と同一の意味を示す。)
で表わされる化合物の製造方法。 3 有機溶媒中塩基の存在下反応させる特許請求
の範囲第2項記載の製造方法。 4 有機溶媒中触媒の存在下反応させる特許請求
の範囲第2項記載の製造方法。 5 ZがSO2r(rはアルキル基又はアリール基を
示す。)である特許請求の範囲第2,3又は4項
記載の製造方法。[Claims] 1 (1) General formula (In the formula, R represents a lower alkyl group, X represents a halogen atom, and n represents 0, 1 or 2). 2 General formula {In the formula, X is a halogen atom, and n is 0, 1 or 2
, Z is a halogen atom, a cyano group, or a formula SO 2 r (r
represents an alkyl group or an aryl group. ) represents a sulfonyl group. } and isocyanoacetic acid esters represented by the general formula CNCH 2 COOR () (in which R represents a lower alkyl group). (In the formula, X, R and n have the same meanings as above.)
A method for producing a compound represented by 3. The manufacturing method according to claim 2, wherein the reaction is carried out in the presence of a base in an organic solvent. 4. The manufacturing method according to claim 2, wherein the reaction is carried out in an organic solvent in the presence of a catalyst. 5. The manufacturing method according to claim 2, 3 or 4, wherein Z is SO 2 r (r represents an alkyl group or an aryl group).
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP8497483A JPS59212468A (en) | 1983-05-17 | 1983-05-17 | 3-phenyl-4-cyanopyrrole derivative and production thereof |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP8497483A JPS59212468A (en) | 1983-05-17 | 1983-05-17 | 3-phenyl-4-cyanopyrrole derivative and production thereof |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS59212468A JPS59212468A (en) | 1984-12-01 |
| JPH0416466B2 true JPH0416466B2 (en) | 1992-03-24 |
Family
ID=13845589
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP8497483A Granted JPS59212468A (en) | 1983-05-17 | 1983-05-17 | 3-phenyl-4-cyanopyrrole derivative and production thereof |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS59212468A (en) |
-
1983
- 1983-05-17 JP JP8497483A patent/JPS59212468A/en active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS59212468A (en) | 1984-12-01 |
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