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JPH0418373B2 - - Google Patents
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JPH0418373B2 - - Google Patents

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Publication number
JPH0418373B2
JPH0418373B2 JP58183688A JP18368883A JPH0418373B2 JP H0418373 B2 JPH0418373 B2 JP H0418373B2 JP 58183688 A JP58183688 A JP 58183688A JP 18368883 A JP18368883 A JP 18368883A JP H0418373 B2 JPH0418373 B2 JP H0418373B2
Authority
JP
Japan
Prior art keywords
evaporation
base material
opening
substrate
vertical
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP58183688A
Other languages
Japanese (ja)
Other versions
JPS6076024A (en
Inventor
Kyuzo Nakamura
Yoshifumi Oota
Hiroki Yamada
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Ulvac Inc
Original Assignee
Ulvac Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Ulvac Inc filed Critical Ulvac Inc
Priority to JP18368883A priority Critical patent/JPS6076024A/en
Publication of JPS6076024A publication Critical patent/JPS6076024A/en
Publication of JPH0418373B2 publication Critical patent/JPH0418373B2/ja
Granted legal-status Critical Current

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  • Magnetic Record Carriers (AREA)
  • Manufacturing Of Magnetic Record Carriers (AREA)

Description

【発明の詳細な説明】 本発明は、金属と金属酸化物との2相が混ざつ
た垂直磁化膜を有する垂直磁気記録体の製造装置
に関する。
DETAILED DESCRIPTION OF THE INVENTION The present invention relates to an apparatus for manufacturing a perpendicular magnetic recording medium having a perpendicular magnetization film in which two phases of metal and metal oxide are mixed.

従来のこの種製造装置は、第1図示のように、
基材aを矢印方向に走行させ、その下方にこれに
対面して設けた蒸発源bへ電子ビーム発生装置よ
り電子ビームcをスイープさせて当て、該蒸発源
bを加熱溶解蒸発させ、その蒸発物を該基材aと
該蒸発源bとの間に介在させた斜め入射蒸着を防
ぐ防着板dの垂直蒸着用開口部eを介して、走行
する基板aに殆ど垂直に入射蒸着せしめるように
したものが公知であるが、一般に、その蒸発源b
の基材の走行方向の長さl0は、該開口部eの基材
の走行方向の長さlより小さい。従つて、特に走
行基材aがその開口部eに現れ始める該開口部e
の上流端の箇所では、図に矢印で示した如く、斜
めに蒸発物が基材aに入射する傾向となる。
A conventional manufacturing device of this type, as shown in the first diagram,
The base material a is moved in the direction of the arrow, and an electron beam c is swept and applied from an electron beam generator to an evaporation source b provided below and facing the base material a, and the evaporation source b is heated, melted, and evaporated. The material is deposited almost perpendicularly onto the traveling substrate a through the vertical deposition opening e of the deposition prevention plate d which prevents oblique incidence deposition between the substrate a and the evaporation source b. Generally, the evaporation source b
The length l 0 of the base material in the running direction is smaller than the length l of the base material of the opening e in the running direction. Therefore, in particular the opening e in which the running substrate a begins to appear
At the upstream end of , the evaporated material tends to enter the base material a obliquely, as shown by the arrow in the figure.

然るに、一般にその蒸発原子の析出成長は、基
材面に最初に蒸着する蒸発原子が核となり、その
核の方向に成長するから、かかる上記の装置で
は、その基材面に最初に蒸着する蒸発原子は基材
面に対し斜めに付着し、これが核となるので、そ
の核の方向に従つてそれ以後斜めに成長する傾向
があり、従つて良好な垂直磁化膜が得られない不
都合を有する。
However, in general, in the precipitation growth of the evaporated atoms, the evaporated atoms that are first deposited on the surface of the substrate serve as a nucleus, and they grow in the direction of the nucleus. Since the atoms attach obliquely to the surface of the substrate and serve as nuclei, they tend to grow obliquely in accordance with the direction of the nucleus, which has the disadvantage that a good perpendicular magnetization film cannot be obtained.

本発明は、この欠点を解消し、基材面に垂直磁
気特性の優れた垂直磁化膜を形成できる垂直磁気
記録体の製造装置を提供することを目的とするも
ので、一方へ走行する基材と、該基材の下方にこ
れに対面して設けた蒸発源と、蒸発源の蒸発面を
基材の走行方向へスイープする電子ビームと、該
基材の該蒸発源との間にその基材の近傍に斜め入
射蒸着を防ぐ防着板の垂直蒸着用開口部と、該垂
直蒸着用開口部に向けて酸素ガスを噴出する酸素
導入管を備えた垂直磁気記録体の製造装置におい
て、該蒸発源に、走行する基材の上流側の該垂直
蒸着用開口部の開口端縁をまたいで拡がる上流側
蒸発面と走行する基材の下流側の該垂直蒸着用開
口部の開口端縁をまたいで拡がる下流側蒸発面と
を設けたことを特徴とする。
The object of the present invention is to eliminate this drawback and provide a manufacturing apparatus for a perpendicular magnetic recording medium that can form a perpendicularly magnetized film with excellent perpendicular magnetic properties on the surface of a substrate. an evaporation source provided below and facing the base material; an electron beam that sweeps the evaporation surface of the evaporation source in the running direction of the base material; In a manufacturing apparatus for a perpendicular magnetic recording body, the device is equipped with an opening for vertical deposition of a deposition prevention plate that prevents obliquely incident deposition near the material, and an oxygen introduction pipe that blows out oxygen gas toward the opening for vertical deposition. The evaporation source includes an upstream evaporation surface extending across the opening edge of the vertical deposition opening on the upstream side of the traveling substrate and an opening edge of the vertical deposition opening on the downstream side of the traveling substrate. It is characterized by being provided with a downstream side evaporation surface that extends across the air.

本発明の実施例を第2図及び第3図示の原理図
に基づき説明する。同図に於いて、符号1は矢印
方向へ走行する基材、2はその下方に設けた蒸発
源、3は該基材1と該蒸発源2との間に介在され
且つ該基材1の近傍に設けられた斜め入射蒸着を
防ぐ防着板、4は該防着板3に設けた垂直蒸着用
開口部を示す。
Embodiments of the present invention will be described based on the principle diagrams shown in FIGS. 2 and 3. In the figure, reference numeral 1 indicates a base material running in the direction of the arrow, 2 indicates an evaporation source provided below the base material, and 3 indicates a base member interposed between the base material 1 and the evaporation source 2 and located below the base material 1. A deposition prevention plate 4 is provided nearby to prevent obliquely incident deposition, and reference numeral 4 indicates an opening for vertical deposition provided in the deposition prevention plate 3 .

こうした構成は従来の装置も備えるところであ
り、該開口部4に向けて酸素ガスを噴出するため
の酸素導入管9も従来の装置が備えるところであ
るが、本発明に於いては、該蒸発源2に、垂直蒸
着用開口部4に基材1が現れ始める該開口部4の
上流側の開口端縁4aを跨いで上流側へと拡がる
上流側蒸発面2aを設けると共に下流側の開口端
縁4bを跨いで下流側へと拡がる下流側蒸発面2
bを設けるようにした。図面でL0は蒸発源2の
基材の走行方向の長さで、その長さは、開口部4
の基材の走行方向の長さLよりも大きくなつてい
る。そして、該蒸発源2に電子ビーム発生装置か
らの電子ビームBをその上流側蒸発面2aにスイ
ープして当てると、矢印のように、該上流側の開
口端縁4aの近傍では垂直に蒸発すると共にその
両側からは斜めに蒸発した蒸発物が垂直の蒸発物
と合流し、その結果、何れか一方へ斜めに傾いた
蒸着はなくなる傾向となり、殆ど垂直に蒸着し、
その後の基材1の走行で開口部4から入射する蒸
発物はこの核に付着して垂直に成長する。そして
蒸発源2には下流側の開口端縁4bを跨いで更に
下流側へ拡がる下流側蒸発面2bを設けたことに
より斜めの成長がより一層抑制され、垂直方向へ
成長した垂直磁化膜が得られる。
Such a configuration is also provided in the conventional device, and the conventional device is also provided with the oxygen introduction pipe 9 for spouting oxygen gas toward the opening 4. However, in the present invention, the evaporation source 2 In addition, an upstream evaporation surface 2a is provided that extends upstream across the upstream opening edge 4a of the opening 4 where the base material 1 begins to appear in the vertical deposition opening 4, and a downstream opening edge 4b is provided. Downstream evaporation surface 2 that extends downstream across the
b. In the drawing, L 0 is the length of the base material of the evaporation source 2 in the running direction, and that length is the length of the base material of the evaporation source 2.
It is larger than the length L of the base material in the running direction. When the electron beam B from the electron beam generator is swept and applied to the upstream evaporation surface 2a of the evaporation source 2, it evaporates vertically near the upstream opening edge 4a, as shown by the arrow. At the same time, the evaporated matter that evaporated obliquely from both sides merges with the evaporated matter that is vertical, and as a result, the evaporation that is obliquely inclined to one side tends to disappear, and the evaporation is almost vertical,
The evaporated matter that enters from the opening 4 during the subsequent movement of the base material 1 adheres to this nucleus and grows vertically. By providing the evaporation source 2 with a downstream evaporation surface 2b that extends further downstream across the downstream opening edge 4b, oblique growth is further suppressed, and a perpendicularly magnetized film grown in the vertical direction is obtained. It will be done.

第3図に於いて、符号5は真空排気される密閉
容器、6はテープ状基材1を一方へ移行させる送
出しロール6aと巻取ロール6bから成る移行装
置、7はテープ基材1に移動と冷却を与える冷却
キヤン、8は電子ビーム発生装置、10は蒸発源
2を収容したるつぼを示す。
In FIG. 3, reference numeral 5 denotes a sealed container that is evacuated, 6 a transfer device consisting of a delivery roll 6a and a take-up roll 6b for transferring the tape-like base material 1 to one side, and 7 a transfer device for transferring the tape-like base material 1 to one side. A cooling can for providing movement and cooling, 8 an electron beam generator, and 10 a crucible containing an evaporation source 2.

該蒸発源2にFe,Co,Niやその合金等の金属
を収め、基材1に向けての蒸発源2からの蒸発と
同時に酸素導入管9から酸素ガスを開口部4に向
けて噴出させると、上記したように上流側蒸発面
2aから基材1に垂直に入射する蒸着物の一部が
酸化され、金属と金属酸化物との2相が所定割合
で混ざつたCo−O,Co−Ni−O,Fe−Co−Ni
−Oなどの垂直磁化膜がテープ基材面に形成さ
れ、金属と金属酸化物の2相が垂直に成長した形
の垂直磁気記録体が製造される。この垂直磁化膜
は強磁性柱状粒子と非強磁性酸化物の2相構造の
膜であり、飽和磁化が減少し且つ形状磁気異方性
や結晶磁気異方性による垂直磁気異方性が増大
し、垂直磁気特性の優れた膜が得られる。
Metals such as Fe, Co, Ni, and their alloys are placed in the evaporation source 2, and at the same time as the evaporation from the evaporation source 2 toward the base material 1 occurs, oxygen gas is ejected from the oxygen introduction tube 9 toward the opening 4. Then, as described above, a part of the vapor deposited that is perpendicularly incident on the substrate 1 from the upstream evaporation surface 2a is oxidized, resulting in Co-O, Co containing two phases of metal and metal oxide mixed in a predetermined ratio. −Ni−O, Fe−Co−Ni
A perpendicular magnetization film such as -O is formed on the tape base material surface, and a perpendicular magnetic recording body in which two phases of metal and metal oxide are grown perpendicularly is manufactured. This perpendicularly magnetized film has a two-phase structure of ferromagnetic columnar grains and non-ferromagnetic oxide, which reduces saturation magnetization and increases perpendicular magnetic anisotropy due to shape magnetic anisotropy and magnetocrystalline anisotropy. , a film with excellent perpendicular magnetic properties can be obtained.

第4図は、第3図示の冷却キヤン7に代えて、
無端金属ベルト11を張設した1対の冷却ローラ
ー12,12によりテープ状基材1を走行させる
ようにしたものである。この例では、酸素導入管
9を左右対称に設けるようにした。
FIG. 4 shows, in place of the cooling can 7 shown in FIG. 3,
The tape-shaped base material 1 is made to run by a pair of cooling rollers 12, 12 on which an endless metal belt 11 is stretched. In this example, the oxygen introduction pipes 9 are arranged symmetrically.

第3図及び第4図の場合、その蒸発源2の長さ
L0を防着板3の開口部4の長さLよりは著しく
長手とし、その両側の蒸発面2a,2bは開口端
縁4a,4bより夫々等しい長さだけ延長するよ
うにした。第3図示の装置により酸素ガスを開口
部4に向けて噴出しながら垂直磁化膜を形成した
場合、そのL0/Lの比が1を越えればHc⊥Hc
は2以上、Br⊥/Brは1.5以上を有する垂直
磁化膜が得られるに対し、L0/Lの比が0.5では、
Hc⊥/Hcは1.2程度、Br⊥/Brは1程度に
すぎなかつた。
In the case of Figures 3 and 4, the length of the evaporation source 2
L 0 is made significantly longer than the length L of the opening 4 of the deposition-preventing plate 3, and the evaporation surfaces 2a, 2b on both sides thereof extend by equal lengths from the opening edges 4a, 4b, respectively. When a perpendicularly magnetized film is formed by blowing out oxygen gas toward the opening 4 using the device shown in Figure 3, if the ratio of L 0 /L exceeds 1, Hc⊥Hc
While a perpendicularly magnetized film having L 0 /L of 2 or more and Br⊥/Br of 1.5 or more can be obtained, when the ratio of L 0 /L is 0.5,
Hc⊥/Hc was about 1.2, and Br⊥/Br was only about 1.

このように本発明によるときは、一方へ走行す
る基材の近傍に防着板の垂直蒸着用開口部を備え
ると共に、該垂直蒸着用開口部に向けて酸素ガス
を噴出する酸素導入管を備え、蒸発源の蒸発面が
電子ビームで基材の走行方向へスイープされる垂
直磁気記録体の製造装置において、該蒸発源に、
走行する基材の上流側の該垂直蒸着用開口部の開
口端縁を跨いで拡がる上流側蒸発面と走行する基
材の下流側の該垂直蒸着用開口部の開口端縁を跨
いで拡がる下流側蒸発面とを設けたので、走行す
る基材面に垂直方向へ成長するための核となる垂
直方向の蒸着物であつて金属と金属酸化物とが混
じつた蒸着物を蒸着することが出来、斜めの成長
が抑制されるので基材の走行でその後に付着する
蒸発物の成長を垂直方向となし得られ、金属と金
属酸化物の混じつた垂直磁気特性の優れた垂直磁
化膜を有する磁気記録体を製造できる等の効果が
ある。
As described above, according to the present invention, the deposition prevention plate is provided with a vertical deposition opening in the vicinity of the base material traveling in one direction, and is also provided with an oxygen introduction pipe for spouting oxygen gas toward the vertical deposition opening. In an apparatus for manufacturing a perpendicular magnetic recording body in which the evaporation surface of the evaporation source is swept in the running direction of the substrate by an electron beam, the evaporation source includes:
An upstream evaporation surface that extends across the opening edge of the vertical deposition opening on the upstream side of the traveling base material, and a downstream that extends across the opening edge of the vertical deposition opening on the downstream side of the traveling base material. Since a side evaporation surface is provided, it is possible to evaporate a vertical evaporation material that is a mixture of metal and metal oxide and serves as a nucleus for growth in the vertical direction on the surface of the traveling substrate. , since diagonal growth is suppressed, the growth of evaporates that adhere after the substrate travels is made perpendicular, and a magnetic film with a perpendicular magnetization film containing a mixture of metal and metal oxide with excellent perpendicular magnetic properties is obtained. There are effects such as being able to manufacture recording bodies.

【図面の簡単な説明】[Brief explanation of drawings]

第1図は従来装置の側面線図、第2図は本発明
の要部の側面図、第3図は本発明の実施例の全体
側面図、第4図は本発明の変形例の側面図であ
る。 1……基材、2……蒸発源、2a……上流側蒸
発面、3……防着板、4……垂直蒸着用開口部、
4a……上流側開口端縁、9……酸素導入管。
Fig. 1 is a side view of a conventional device, Fig. 2 is a side view of essential parts of the present invention, Fig. 3 is an overall side view of an embodiment of the present invention, and Fig. 4 is a side view of a modification of the present invention. It is. DESCRIPTION OF SYMBOLS 1... Base material, 2... Evaporation source, 2a... Upstream evaporation surface, 3... Deposition prevention plate, 4... Vertical evaporation opening,
4a...Upstream opening edge, 9...Oxygen introduction pipe.

Claims (1)

【特許請求の範囲】[Claims] 1 一方へ走行する基材と、該基材の下方にこれ
に対面して設けた蒸発源と、蒸発源の蒸発面を基
材の走行方向へスイープする電子ビームと、該基
材の該蒸発源との間にその基材の近傍に斜め入射
蒸着を防ぐ防着板の垂直蒸着用開口部と、該垂直
蒸着用開口部に向けて酸素ガスを噴出する酸素導
入管を備えた垂直磁気記録体の製造装置におい
て、該蒸発源に、走行する基材の上流側の該垂直
蒸着用開口部の開口端縁をまたいで拡がる上流側
蒸発面と走行する基材の下流側の該垂直蒸着用開
口部の開口端縁をまたいで拡がる下流側蒸発面と
を設けたことを特徴とする垂直磁気記録体の製造
装置。
1. A base material traveling in one direction, an evaporation source provided below and facing the base material, an electron beam that sweeps the evaporation surface of the evaporation source in the traveling direction of the base material, and an evaporation source provided below the base material to face it; Perpendicular magnetic recording comprising an opening for vertical evaporation of a deposition prevention plate to prevent obliquely incident evaporation in the vicinity of the substrate between the source and the substrate, and an oxygen introduction pipe for spouting oxygen gas toward the opening for vertical evaporation. In the evaporation source, an upstream evaporation surface extending across the opening edge of the vertical evaporation opening on the upstream side of the traveling substrate and the vertical evaporation surface on the downstream side of the traveling substrate. 1. An apparatus for manufacturing a perpendicular magnetic recording medium, characterized in that an aperture has a downstream evaporation surface extending across the edge of the aperture.
JP18368883A 1983-10-01 1983-10-01 Manufacturing device of vertical magnetic recording medium Granted JPS6076024A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP18368883A JPS6076024A (en) 1983-10-01 1983-10-01 Manufacturing device of vertical magnetic recording medium

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP18368883A JPS6076024A (en) 1983-10-01 1983-10-01 Manufacturing device of vertical magnetic recording medium

Publications (2)

Publication Number Publication Date
JPS6076024A JPS6076024A (en) 1985-04-30
JPH0418373B2 true JPH0418373B2 (en) 1992-03-27

Family

ID=16140189

Family Applications (1)

Application Number Title Priority Date Filing Date
JP18368883A Granted JPS6076024A (en) 1983-10-01 1983-10-01 Manufacturing device of vertical magnetic recording medium

Country Status (1)

Country Link
JP (1) JPS6076024A (en)

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0239019B2 (en) * 1981-07-16 1990-09-03 Matsushita Electric Ind Co Ltd JIKIKIROKUBAITAINOSEIZOHOHO
JPS5896868A (en) * 1981-12-02 1983-06-09 Matsushita Electric Ind Co Ltd Reactive vapor deposition equipment
JPS58105433A (en) * 1981-12-18 1983-06-23 Nippon Telegr & Teleph Corp <Ntt> Producing device of magnetic recording medium
JPS59175036A (en) * 1983-03-24 1984-10-03 Matsushita Electric Ind Co Ltd Method for manufacturing magnetic recording media

Also Published As

Publication number Publication date
JPS6076024A (en) 1985-04-30

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