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JPH0418764B2 - - Google Patents
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JPH0418764B2 - - Google Patents

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Publication number
JPH0418764B2
JPH0418764B2 JP59273970A JP27397084A JPH0418764B2 JP H0418764 B2 JPH0418764 B2 JP H0418764B2 JP 59273970 A JP59273970 A JP 59273970A JP 27397084 A JP27397084 A JP 27397084A JP H0418764 B2 JPH0418764 B2 JP H0418764B2
Authority
JP
Japan
Prior art keywords
optical flat
reflected
laser
light
gap
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP59273970A
Other languages
Japanese (ja)
Other versions
JPS61153505A (en
Inventor
Toshibumi Ookubo
Junichi Kishigami
Shigehisa Fukui
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
NTT Inc
Original Assignee
Nippon Telegraph and Telephone Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nippon Telegraph and Telephone Corp filed Critical Nippon Telegraph and Telephone Corp
Priority to JP27397084A priority Critical patent/JPS61153505A/en
Publication of JPS61153505A publication Critical patent/JPS61153505A/en
Publication of JPH0418764B2 publication Critical patent/JPH0418764B2/ja
Granted legal-status Critical Current

Links

Classifications

    • GPHYSICS
    • G01MEASURING; TESTING
    • G01BMEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B11/00Measuring arrangements characterised by the use of optical techniques
    • G01B11/14Measuring arrangements characterised by the use of optical techniques for measuring distance or clearance between spaced objects or spaced apertures

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Length Measuring Devices By Optical Means (AREA)

Description

【発明の詳細な説明】 [発明の技術分野] この発明は、測定物の表面と平坦な透明体であ
るオプテイカルフラツトの表面との間に形成され
る微小隙間にレーザ光を照射し該レーザ光のオプ
テイカルフラツト表面および測定物表面からの反
射光の干渉を利用して前記微小隙間の寸法を測定
する微小すきま測定装置に関する。
Detailed Description of the Invention [Technical Field of the Invention] The present invention is a method of irradiating a laser beam into a minute gap formed between the surface of an object to be measured and the surface of an optical flat, which is a flat transparent body. The present invention relates to a micro-gap measuring device that measures the dimensions of the micro-gap using interference of laser light reflected from an optical flat surface and a surface of an object to be measured.

[発明の技術的背景と問題点] レーザ光の干渉を利用して微小隙間の寸法を測
定する微小隙間測定装置は、例えば磁気デイスク
装置において浮動ヘツドスライダの浮上する隙間
を測定したり、鏡面研磨面等においてその面の粗
さを測定するのに有効である。
[Technical Background and Problems of the Invention] A micro-gap measuring device that measures the size of a micro-gap using laser light interference can be used, for example, to measure the gap in which a floating head slider floats in a magnetic disk device, or to perform mirror polishing. It is effective for measuring the roughness of a surface.

第4図はこのような微小隙間測定装置の測定原
理を説明するための図である。同図において、1
はオプテイカルフラツト、3は測定物であり、オ
プテイカルフラツト1の表面1aと測定物3の表
面3aとの間に微小隙間5が形成されている。図
示しないレーザ光光源から発生され集光されたレ
ーザ光111は図示のようにオプテイカルフラツ
ト1の上方から入射してオプテイカルフラツト1
を通過し更に微小隙間5を通つて測定物3の表面
3aを照射する。そして、この入射レーザ光11
1の一部はオプテイカルフラツト1の表面1aに
より反射光113として反射され、また一部は測
定物3の表面3aにより反射光115として反射
される。このように反射された反射光113およ
び115は、微小隙間5の寸法に応じて相対的な
位相が変化するため、それらの干渉光強度は第4
図の上方に描かれているグラフで示すようにレー
ザ光の波長をλとすると微小隙間5の寸法がλ/
2変化する毎に明レベルAと暗レベルBとの間を
周期的に変化する。オプテイカルフラツト表面1
aと測定物表面3aとの間で形成される微小隙間
5におけるくさび状隙間角度は実際には非常に小
さく、測定物表面3aで反射される反射光115
の一部はオプテイカルフラツト表面1aと測定物
表面3aとの間で反射を繰返し、その都度オプテ
イカルフラツト表面1aで反射される反射光11
3と多重干渉する。この場合において、レーザ光
の多重干渉光強度Iと微小隙間5の寸法hとの関
係は次式により規定される。
FIG. 4 is a diagram for explaining the measurement principle of such a micro gap measuring device. In the same figure, 1
3 is an optical flat, and 3 is an object to be measured. A minute gap 5 is formed between the surface 1a of the optical flat 1 and the surface 3a of the object 3 to be measured. A focused laser beam 111 generated from a laser light source (not shown) enters the optical flat 1 from above as shown in the figure.
, and further passes through a minute gap 5 to irradiate the surface 3a of the object to be measured 3. Then, this incident laser beam 11
1 is reflected by the surface 1a of the optical flat 1 as reflected light 113, and a part is reflected by the surface 3a of the measurement object 3 as reflected light 115. Since the relative phases of the reflected lights 113 and 115 that are reflected in this way change depending on the size of the minute gap 5, their interference light intensity is
As shown in the graph drawn at the top of the figure, if the wavelength of the laser beam is λ, the dimension of the minute gap 5 is λ/
It changes periodically between the bright level A and the dark level B every time it changes by 2. Optical flat surface 1
The wedge-shaped gap angle in the minute gap 5 formed between a and the surface 3a of the measurement object is actually very small, and the reflected light 115 reflected at the surface 3a of the measurement object
A part of the reflected light 11 is repeatedly reflected between the optical flat surface 1a and the measurement object surface 3a, and is reflected each time by the optical flat surface 1a.
Multiple interference with 3. In this case, the relationship between the multiple interference light intensity I of the laser beam and the dimension h of the minute gap 5 is defined by the following equation.

ここにおいて、Rはオプテイカルフラツト1の
反射率、Sは測定物3の反射率、λはレーザ光の
波長である。従つて、上式(1)において逆に干渉光
強度Iを測定することにより微小隙間5の寸法を
算出することができるのである。
Here, R is the reflectance of the optical flat 1, S is the reflectance of the object to be measured 3, and λ is the wavelength of the laser beam. Therefore, the size of the minute gap 5 can be calculated by measuring the interference light intensity I in the above equation (1).

第5図は上述した測定原理を利用した従来の微
小隙間測定装置の一例である。同図において、オ
プテイカルフラツト1および測定物3で形成され
る微小隙間5には直線偏光レーザ発振器21から
発生するレーザ光が偏光プリズム23および偏光
板25を通過し集光レンズ27で集光されて微小
スポツトのレーザ光121として入射する。そし
て、この入射レーザ光のオプテイカルフラツト表
面1aによる反射光と測定物表面3aによる反射
光との干渉光123は集光レンズ27、偏向板2
5を介してその偏光面が90゜回転させられて偏光
プリズム23により側方に反射され、レーザ光強
度検出素子29に入射してその光強度が測定され
る。このようにして測定された光強度に基づき上
式(1)から微小隙間5の寸法を算出することができ
るのである。
FIG. 5 is an example of a conventional micro gap measuring device that utilizes the above-mentioned measurement principle. In the figure, a laser beam generated from a linearly polarized laser oscillator 21 passes through a polarizing prism 23 and a polarizing plate 25 and is focused by a condensing lens 27 in a minute gap 5 formed between an optical flat 1 and an object to be measured 3. The laser beam 121 enters the laser beam as a minute spot laser beam 121. The interference light 123 between the reflected light from the optical flat surface 1a of the incident laser beam and the reflected light from the measurement object surface 3a is generated by the condensing lens 27 and the deflecting plate 2.
5, the plane of polarization is rotated by 90 degrees, reflected laterally by the polarizing prism 23, and incident on the laser light intensity detection element 29, where the light intensity is measured. Based on the light intensity thus measured, the dimensions of the minute gap 5 can be calculated from the above equation (1).

ところで、上述したようにオプテイカルフラツ
ト表面1aおよび測定物表面3aで反射されて偏
光プリズム23に入射する干渉光123は偏光プ
リズム23においてその全光量が完全に側方に反
射されるのでなく、該光の一部は偏光プリズム2
3を直進し、矢印125で示すようにレーザ発振
器21に入射する。この結果、レーザ発振器21
と微小隙間5との間をレーザ光が往復することに
なり、レーザ発振器21とオプテイカルフラツト
1または測定物3との間の相対位置変動に起因し
てビート、すなわちうなりが発生し、レーザ光強
度検出素子29の出力が変動するという問題があ
る。従つて、このため従来の装置においては微小
隙間5の測定精度、特に動的に変動する隙間の測
定精度が低下するという問題がある。
By the way, as described above, the interference light 123 that is reflected by the optical flat surface 1a and the measurement object surface 3a and enters the polarizing prism 23 is not completely reflected laterally at the polarizing prism 23; A part of the light is polarized by the polarizing prism 2.
3 and enters the laser oscillator 21 as shown by an arrow 125. As a result, the laser oscillator 21
The laser beam travels back and forth between the laser beam and the minute gap 5, and a beat, or beat, is generated due to relative positional fluctuations between the laser oscillator 21 and the optical flat 1 or the measurement object 3, and the laser beam There is a problem that the output of the light intensity detection element 29 fluctuates. Therefore, for this reason, the conventional apparatus has a problem in that the measurement accuracy of the minute gap 5, especially the measurement accuracy of dynamically changing gaps, is reduced.

[発明の目的] この発明は、上記に鑑みてなされたもので、そ
の目的とするところは、微小隙間を高精度に測定
することができる微小すきま測定装置を提供する
ことにある。
[Object of the Invention] The present invention has been made in view of the above, and its purpose is to provide a minute gap measuring device that can measure minute gaps with high precision.

[発明の概要] 上記目的を達成するため、レーザ光光源と、偏
光プリズムと、偏光面回転手段と、集光レンズと
が一直線上に光軸を合わせて順次配置され、前記
偏光プリズムにより反射された光を検出する検出
手段とを有し、前記レーザ光光源より出射したレ
ーザ光を前記偏光プリズム及び前記偏光面回転手
段の順に透過させ、前記集光レンズにより集光し
てオプテイカルフラツトの表面と測定物の表面と
の間に形成される微小すきまに照射し、前記オプ
テイカルフラツト表面からの前記レーザ光の反射
光と前記測定物表面からの前記レーザ光の反射光
とを相互に干渉させて該干渉光の強度を前記検出
手段により検出することにより前記微小すきまの
寸法を測定する微小すきま測定装置において、前
記レーザ光光源と前記偏光プリズムとの間に前記
レーザ光のビーム径とほぼ等しい開口を有する絞
りを備え、前記レーザ光光源、偏光プリズム、偏
光面回転手段及び集光レンズが配置される直線が
前記オプテイカルフラツト表面の法線に対して所
定角度傾斜されていることを要旨とする。
[Summary of the Invention] In order to achieve the above object, a laser light source, a polarizing prism, a polarization plane rotating means, and a condensing lens are sequentially arranged with their optical axes aligned in a straight line, and the laser light is reflected by the polarizing prism. the laser beam emitted from the laser light source is passed through the polarizing prism and the polarization plane rotation means in this order, and is focused by the condensing lens to form an optical flat. The laser beam is irradiated into a minute gap formed between the surface of the optical flat and the surface of the object to be measured, and the reflected light of the laser beam from the optical flat surface and the reflected light of the laser beam from the surface of the object to be measured are mutually combined. In the micro-gap measuring device that measures the dimensions of the micro-gap by causing interference and detecting the intensity of the interference light by the detection means, a beam diameter and a beam diameter of the laser light are provided between the laser light source and the polarizing prism. A diaphragm having approximately equal apertures is provided, and a straight line on which the laser light source, polarizing prism, polarization plane rotating means, and condensing lens are arranged is inclined at a predetermined angle with respect to the normal to the surface of the optical flat. The gist is:

[発明の実施例] 以下、図面を用いてこの発明の実施例を説明す
る。
[Embodiments of the Invention] Examples of the invention will be described below with reference to the drawings.

第1図はこの発明の一実施例に係る微小隙間測
定装置の構成図である。同図に示す微小隙間測定
装置は、第5図に示す従来の装置と同様にオプテ
イカルフラツト1と測定物3との間の微小隙間5
を測定するものであるが、直線偏向レーザ発振器
7から微小隙間5に照射される集光レーザ光11
7が微小隙間5、すなわちオプテイカルフラツト
表面1aおよび測定物表面3aに対して直角でな
く若干傾斜している。詳しくは、オプテイカルフ
ラツト表面1aに対して直角な法線をとする
と、レーザ発振器7からのレーザ入射光117は
法線に対して微小角度θだけ傾斜するように
レーザ発振器7は設定されている。従つて、この
レーザ入射光117のオプテイカルフラツト表面
1aによる反射光119は法線に対して角度
θ傾斜している。なお、このようなレーザ光の傾
斜はオプテイカルフラツト表面1aと測定物表面
3aとの間の角度が非常に小さいので、オプテ
イカルフラツト表面1aの法線は実質的に測
定物表面3aの法線でもあり、上述したようにオ
プテイカルフラツト表面1aの法線に対して
傾斜するように設定されたレーザ光は測定物表面
3aの法線に対してもほぼ角度θ傾斜しているも
のである。
FIG. 1 is a configuration diagram of a micro gap measuring device according to an embodiment of the present invention. The microgap measuring device shown in the figure measures the microgap 5 between the optical flat 1 and the object to be measured 3, similar to the conventional device shown in FIG.
In order to measure
7 is not perpendicular to the minute gap 5, that is, the optical flat surface 1a and the measurement object surface 3a, but is slightly inclined. Specifically, the laser oscillator 7 is set so that when the normal line is perpendicular to the optical flat surface 1a, the laser incident light 117 from the laser oscillator 7 is inclined by a small angle θ with respect to the normal line. There is. Therefore, the reflected light 119 of the laser incident light 117 by the optical flat surface 1a is inclined at an angle θ with respect to the normal. Note that since the angle between the optical flat surface 1a and the measurement object surface 3a is very small, the normal line of the optical flat surface 1a is substantially the same as the measurement object surface 3a. It is also a normal line, and as mentioned above, the laser beam set to be inclined with respect to the normal line of the optical flat surface 1a is also inclined at an angle of approximately θ with respect to the normal line of the measurement object surface 3a. It is.

また、レーザ発振器7の出力端の側近には絞り
9が配設されている。なお、この絞り9と微小隙
間5との間の距離はlである。絞り9の中央に形
成された開口9aの直径はレーザ発振器7から発
生するレーザビームの径にほぼ相当する大きさで
ある。レーザ発振器7から発生したレーザ光はこ
の開口9aを通過した後、更に偏光プリズム1
1、偏光板13を通過し集光レンズ15で集光さ
れて微小スポツトのレーザ光117として法線
PQに対して入射角θ傾斜してオプテイカルフラ
ツト1に入射しオプテイカルフラツト1を通過し
て微小隙間5に入射する。そして、オプテイカル
フラツト1に入射したレーザ光117の一部はオ
プテイカルフラツト表面1aで反射され、また微
小隙間5に入射したレーザ光117は測定物表面
3aで反射される。この入射レーザ光117のオ
プテイカルフラツト表面1aによる反射光と測定
物表面3aによる反射光とは互いに干渉し干渉光
119として法線に対して反射角θ傾斜して
集光レンズ15、偏光板13を通過して偏光プリ
ズム11により大部分の光は側方に反射され、レ
ーザ光強度検出素子17に入射してその光強度が
測定される。その結果、上述したようにこの測定
された光強度に基づき上式(1)から微小隙間5の寸
法を算出することができる。
Further, a diaphragm 9 is disposed near the output end of the laser oscillator 7. Note that the distance between this diaphragm 9 and the minute gap 5 is l. The diameter of the aperture 9a formed at the center of the aperture 9 is approximately equivalent to the diameter of the laser beam generated from the laser oscillator 7. The laser beam generated from the laser oscillator 7 passes through the aperture 9a and then passes through the polarizing prism 1.
1. The light passes through the polarizing plate 13 and is focused by the condensing lens 15 to form a tiny spot of laser light 117 on the normal line.
The light enters the optical flat 1 at an incident angle θ inclined with respect to PQ, passes through the optical flat 1, and enters the minute gap 5. A portion of the laser beam 117 incident on the optical flat 1 is reflected by the optical flat surface 1a, and a portion of the laser beam 117 incident on the minute gap 5 is reflected by the measurement object surface 3a. The reflected light from the optical flat surface 1a and the reflected light from the measurement object surface 3a of the incident laser beam 117 interfere with each other and form interference light 119, which is reflected at an angle θ with respect to the normal line, and then passes through the condenser lens 15 and the polarizing plate. 13, most of the light is reflected laterally by the polarizing prism 11, enters the laser light intensity detection element 17, and its light intensity is measured. As a result, as described above, the dimensions of the minute gap 5 can be calculated from the above equation (1) based on the measured light intensity.

ところで、前記干渉光119のうち偏光プリズ
ム11で側方に反射されずに偏光プリズム11を
透過した微弱な干渉光119′は、上述したレー
ザ光の傾斜のために絞り9の開口9aよりもわず
かにずれた位置に達し、ここで完全に遮断され
る。従つて、この透過光119′は従来のように
レーザ発振器7に入射してレーザ発振器7と微小
隙間5との間で往復するということがなくなる。
このため従来のようなビート、すなわちうなりが
なくなり、安定した干渉光強度検出を行なうこと
ができるのである。
By the way, among the interference lights 119, the weak interference lights 119' that are transmitted through the polarization prism 11 without being reflected laterally by the polarization prism 11 are slightly smaller than the aperture 9a of the aperture 9 due to the above-mentioned inclination of the laser light. It reaches a position shifted to , where it is completely cut off. Therefore, this transmitted light 119' does not enter the laser oscillator 7 and go back and forth between the laser oscillator 7 and the minute gap 5 as in the conventional case.
Therefore, there is no beat, that is, beat, as in the conventional method, and stable interference light intensity detection can be performed.

第2図は、第1図に示した微小隙間測定装置に
おいてレーザ光を角度θ傾斜したことにより微小
隙間5の測定精度に与える影響を説明するための
図であつて、オプテイカルフラツト1、測定物3
および微小隙間5の部分を拡大してレーザ入射光
117およびオプテイカルフラツト表面1aによ
る反射光119aおよび測定物表面3aによる反
射光119bの関係を詳細に示しているものであ
る。
FIG. 2 is a diagram for explaining the influence of tilting the laser beam at an angle θ in the micro gap measuring device shown in FIG. 1 on the measurement accuracy of the micro gap 5. Measurement object 3
The micro gap 5 is enlarged to show in detail the relationship between the laser incident light 117, the reflected light 119a from the optical flat surface 1a, and the reflected light 119b from the measurement object surface 3a.

第2図において、レーザ入射光117が入射角
θで入射し反射角θでオプテイカルフラツト表面
1aで反射される点をA、レーザ入射光117が
オプテイカルフラツト1を通過して微小隙間5に
入射し、微小隙間5の空気の屈折率n′により屈折
角θで屈折して測定物表面3aで反射される点を
B、点Bで反射されたレーザ光119bがオプテ
イカルフラツト1に入射する点をC、点Cから反
射光119aに降した垂線の足、すなわち垂線と
反射光119aとの交点をN、オプテイカルフラ
ツト1の屈折率をn、オプテイカルフラツト表面
1aと測定物表面3aとの間の寸法をhとする
と、オプテイカルフラツト表面1aからの反射光
119aおよび測定物表面3aからの反射光11
9bの同一波面位置NまたはCにおける光路差
ΔPは次式で表される。
In FIG. 2, point A is where the laser incident light 117 enters at an incident angle θ and is reflected by the optical flat surface 1a at a reflection angle θ, and the point A is the point where the laser incident light 117 passes through the optical flat 1 and passes through the small gap. 5, is refracted at a refraction angle θ by the refractive index n' of the air in the minute gap 5, and is reflected at the measurement object surface 3a at a point B, and the laser beam 119b reflected at point B is the optical flat 1. The point of incidence on the optical flat 1 is C, the foot of the perpendicular from point C to the reflected light 119a, that is, the intersection of the perpendicular and the reflected light 119a is N, the refractive index of the optical flat 1 is n, and the optical flat surface 1a is If the dimension between the measured object surface 3a and the measured object surface 3a is h, then reflected light 119a from the optical flat surface 1a and reflected light 11 from the measured object surface 3a.
The optical path difference ΔP at the same wavefront position N or C of 9b is expressed by the following equation.

ΔP=n′(+)−n・ …(2) ここで、,,はそれぞれ微小隙間5
の寸法h、入射角θ、屈折角θ′を用いて次式のよ
うに表される。
ΔP=n′(+)−n・…(2) Here,,, are the minute gaps 5, respectively.
It is expressed as follows using the dimension h, the incident angle θ, and the refraction angle θ'.

==h/cosθ′ …(3) =・sinθ=2h tanθ′・sinθ …(4) 従つて、式(3)および(4)を式(2)に代入すると、光
路差ΔPは次式のように表される。
==h/cosθ'...(3) =・sinθ=2h tanθ'・sinθ...(4) Therefore, by substituting equations (3) and (4) into equation (2), the optical path difference ΔP is calculated by the following equation. It is expressed as follows.

ΔP=2n′・hcosθ′ …(5) この結果から垂直入射の場合に対する傾斜入射
の場合の光路差の差を計算するに、今絞り9と微
小隙間5との間の距離を100mm、レーザビーム
径を1mm、反射光119が絞り9に戻つてきた場
合のその絞り9における位置を絞り9の開口9a
から3mm離れた位置とすると、レーザ光の入射角
θは約1゜程度であり、屈折角θ′もほぼ同程度とし
て前記光路差の差は0.2%以下である。従つて、
微小隙間5の変化に対する干渉光強度特性は垂直
入射として扱つても問題がないことがわかる。
ΔP=2n′・hcosθ′ …(5) From this result, to calculate the difference in optical path difference in the case of oblique incidence and the case of normal incidence, we now set the distance between the aperture 9 and the minute gap 5 to 100 mm, and the laser beam The diameter is 1 mm, and the position in the aperture 9 when the reflected light 119 returns to the aperture 9 is the aperture 9a of the aperture 9.
When the position is 3 mm away from the laser beam, the incident angle θ of the laser beam is approximately 1°, and the refraction angle θ' is approximately the same, and the difference in optical path difference is 0.2% or less. Therefore,
It can be seen that there is no problem even if the interference light intensity characteristics with respect to changes in the minute gap 5 are treated as normal incidence.

第3図a,bは、それぞれ従来の垂直入射方式
の微小隙間測定装置および本実施例で示す傾斜入
射方式の微小隙間測定装置で測定した固定微小隙
間に対する干渉光強度出力のオシロスコープ波形
を示すものである。同図において、横軸は時間、
縦軸は光強度出力、Aは明レベル、Bは暗レベル
を示す。また、測定する微小隙間の大きさは測定
感度の最も高い明レベルAと暗レベルBの中間レ
ベルになるように設定されている。同図からわか
るように、第3図aで示す従来によるものよりも
第3図bで示す本実施例による方がビート成分が
除去されていることがよくわかる。
Figures 3a and 3b show oscilloscope waveforms of the interference light intensity output for a fixed microgap measured by a conventional vertical incidence microgap measurement device and an oblique incidence microgap measurement device shown in this example, respectively. It is. In the figure, the horizontal axis is time;
The vertical axis indicates the light intensity output, A indicates the bright level, and B indicates the dark level. Further, the size of the minute gap to be measured is set to be an intermediate level between the bright level A and the dark level B, which have the highest measurement sensitivity. As can be seen from the figure, it is clear that the beat component is removed better in the present embodiment shown in FIG. 3B than in the conventional method shown in FIG. 3A.

[発明の効果] 以上説明したように、この発明によれば、レー
ザ光をオプテイカルフラツト表面および測定物表
面の法線に対して傾斜されて微小隙間に照射し、
かつ、絞りを設けているので、オプテイカルフラ
ツト表面または測定物表面からの反射光はレーザ
光光源への再入射を完全に遮断されるため、レー
ザ光光源と微小隙間との間でレーザ光が往復して
発生するビート、すなわちうなりがなくなり、安
定した干渉光強度を検出することができ、微小隙
間の測定精度、特に動的に変動する微小隙間の測
定精度を向上することができる。
[Effects of the Invention] As explained above, according to the present invention, a laser beam is irradiated into a minute gap at an angle with respect to the normal to the optical flat surface and the surface of the object to be measured,
In addition, since the aperture is provided, the reflected light from the optical flat surface or the surface of the object to be measured is completely blocked from re-entering the laser light source, so that the laser light is not transmitted between the laser light source and the minute gap. The beats, that is, the beats generated by the back and forth movements of the laser beam, are eliminated, and a stable interference light intensity can be detected, thereby improving the measurement accuracy of minute gaps, especially the measurement accuracy of dynamically fluctuating minute gaps.

【図面の簡単な説明】[Brief explanation of drawings]

第1図はこの発明の一実施例を示す微小すきま
測定装置の構成図、第2図は第1図の装置におけ
るレーザ光の傾斜入射の影響を説明するための第
1図の装置の部分拡大図、第3図a,bはそれぞ
れ従来の垂直入射方式の微小すきま測定装置およ
び第1図に示す傾斜入射方式の微小すきま測定装
置で測定した固定微小隙間に対する干渉光強度出
力のオシロスコープ波形を示す図、第4図は微小
すきま測定装置の測定原理を説明するための図、
第5図は従来の微小すきま測定装置の構成図であ
る。 1…オプテイカルフラツト、1a…オプテイカ
ルフラツト表面、3…測定物、3a…測定物表
面、5…微小隙間、7…レーザ発振器、9…絞
り、11…偏光プリズム、13…偏光板、15…
集光レンズ、17…レーザ光強度検出素子。
Fig. 1 is a block diagram of a micro-gap measuring device showing an embodiment of the present invention, and Fig. 2 is a partial enlargement of the device shown in Fig. 1 to explain the influence of oblique incidence of laser light on the device shown in Fig. 1. Figures 3a and 3b show the oscilloscope waveforms of the interference light intensity output for a fixed microgap measured with a conventional vertical incidence microgap measurement device and an oblique incidence microgap measurement device shown in Fig. 1, respectively. Figure 4 is a diagram for explaining the measurement principle of the micro clearance measuring device,
FIG. 5 is a configuration diagram of a conventional micro-gap measuring device. DESCRIPTION OF SYMBOLS 1... Optical flat, 1a... Optical flat surface, 3... Measured object, 3a... Measured object surface, 5... Minute gap, 7... Laser oscillator, 9... Aperture, 11... Polarizing prism, 13... Polarizing plate, 15...
Condensing lens, 17...Laser light intensity detection element.

Claims (1)

【特許請求の範囲】[Claims] 1 レーザ光光源と、偏光プリズムと、偏光面回
転手段と、集光レンズとが一直線上に光軸を合わ
せて順次配置され、前記偏光プリズムにより反射
された光を検出する検出手段とを有し、前記レー
ザ光光源より出射したレーザ光を前記偏光プリズ
ム及び前記偏光面回転手段の順に透過させ、前記
集光レンズにより集光してオプテイカルフラツト
の表面と測定物の表面との間に形成される微小す
きまに照射し、前記オプテイカルフラツト表面か
らの前記レーザ光の反射光と前記測定物表面から
の前記レーザ光の反射光とを相互に干渉させて該
干渉光の強度を前記検出手段により検出すること
により前記微小すきまの寸法を測定する微小すき
ま測定装置において、前記レーザ光光源と前記偏
光プリズムとの間に前記レーザ光のビーム径とほ
ぼ等しい開口を有する絞りを備え、前記レーザ光
光源、偏光プリズム、偏光面回転手段及び集光レ
ンズが配置される直線が前記オプテイカルフラツ
ト表面の法線に対して所定角度傾斜されているこ
とを特徴とする微小すきま測定装置。
1. A laser light source, a polarizing prism, a polarization plane rotating means, and a condensing lens are sequentially arranged with their optical axes aligned in a straight line, and a detecting means for detecting the light reflected by the polarizing prism. , the laser light emitted from the laser light source is passed through the polarizing prism and the polarization plane rotating means in this order, and is focused by the condensing lens to form a laser beam between the surface of the optical flat and the surface of the object to be measured. The reflected light of the laser light from the optical flat surface and the reflected light of the laser light from the surface of the object to be measured mutually interfere with each other, and the intensity of the interference light is detected as described above. A micro-gap measuring device for measuring the dimensions of the micro-gap by detecting the micro-gap by means of a device, comprising: a diaphragm having an aperture approximately equal to the beam diameter of the laser light between the laser light source and the polarizing prism; A micro-gap measuring device characterized in that a straight line on which a light source, a polarizing prism, a polarizing plane rotating means, and a condensing lens are arranged is inclined at a predetermined angle with respect to the normal to the surface of the optical flat.
JP27397084A 1984-12-27 1984-12-27 Measuring instrument for fine clearance Granted JPS61153505A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP27397084A JPS61153505A (en) 1984-12-27 1984-12-27 Measuring instrument for fine clearance

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP27397084A JPS61153505A (en) 1984-12-27 1984-12-27 Measuring instrument for fine clearance

Publications (2)

Publication Number Publication Date
JPS61153505A JPS61153505A (en) 1986-07-12
JPH0418764B2 true JPH0418764B2 (en) 1992-03-27

Family

ID=17535112

Family Applications (1)

Application Number Title Priority Date Filing Date
JP27397084A Granted JPS61153505A (en) 1984-12-27 1984-12-27 Measuring instrument for fine clearance

Country Status (1)

Country Link
JP (1) JPS61153505A (en)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP7194025B2 (en) * 2019-01-08 2022-12-21 三星電子株式会社 Wafer inspection equipment

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS59216003A (en) * 1983-05-24 1984-12-06 Toyoda Mach Works Ltd Method and device for measuring gap amount
JPS59225308A (en) * 1983-06-06 1984-12-18 Hitachi Ltd Minute gap measuring method and apparatus

Also Published As

Publication number Publication date
JPS61153505A (en) 1986-07-12

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