JPH0419655B2 - - Google Patents
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- Publication number
- JPH0419655B2 JPH0419655B2 JP16438384A JP16438384A JPH0419655B2 JP H0419655 B2 JPH0419655 B2 JP H0419655B2 JP 16438384 A JP16438384 A JP 16438384A JP 16438384 A JP16438384 A JP 16438384A JP H0419655 B2 JPH0419655 B2 JP H0419655B2
- Authority
- JP
- Japan
- Prior art keywords
- heating
- fluororesin
- manufacturing
- vinyl monomer
- electrodeposition
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
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Description
〔発明の技術分野〕
本発明は高周波機器に使用される銅張り積層板
等の低誘電率銅張り絶縁皮膜の製造方法に関する
ものである。
〔従来技術〕
一般に高周波用プリント基板としては、誘電率
に低いガラス基材入りのフツ素樹脂基板が広く使
用されているが、これはガラス基材にエマルジヨ
ン化されたフツ素樹脂を含浸した後予備乾燥し、
その後フツ素樹脂含浸ガラス基材を所定の厚みに
積層し、さらに銅箔を重ねて50Kg/cm2程度の圧力
400℃付近の温度に数時間保持して銅張り積層板
を製造するか、あるいはフレキシブル用の基板と
するにはフツ素樹脂を所定の膜厚をもつシートに
成形する工程、例えばフツ素樹脂原料を焼成して
インゴツトを作り、これを切削してフイルム状に
したものを圧延して、さらに加熱処理する工程を
経て得られたシートの表面を活性化処理して接着
性を向上させてから、銅箔を連続的に貼ることに
より銅張り基板とするか、もしくはフイルムの加
熱処理工程で銅箔を溶融接着して銅張り基板を製
造する。
しかるに、上記いずれの方法においても多くの
工程が必要であり、今後高周波用の基板としてフ
ツ素樹脂基板が広く採用されるためには、工程の
簡略化による製造コストの低減が不可欠である。
〔発明の概要〕
本発明は上記欠点を改善する目的でなされたも
ので、フツ素樹脂の水性デイスパージヨン中で、
高温で熱分解性の良好なビニル系モノマを乳化重
合した液を電着塗料として用い、繊維状基材を重
ね合わせた銅箔上に電着塗装法に利用して電着析
出層を形成させ、次いて必要により上記析出層を
有機溶剤で処理した後、高温で短時間加熱して析
出層中のビニル系樹脂を分解揮発させることによ
り、経済的、高信頼性でかつ連続生産が可能な低
誘電率銅張り絶縁皮膜の製造方法を提案するもの
である。
〔発明の構成〕
本発明では銅箔上に繊維状基材を重ね合わせた
ものを被塗装体とする。ここで使用される繊維状
基材としてはガラス繊維が主として使用され、低
誘電率の点から石英繊維が好適であり、例えばガ
ラスクロス(有沢製作所製、EPC050、EPC102、
EPC160、LPC070、LPC110など)が使用可能で
ある。
本発明で使用されるフツ素樹脂としては、ポリ
テトラフルオロエチレン、ポリトリフルオロクロ
ロエチレン、ポリフツ化ビニル、ポリフツ化ビニ
リデン、ジクロルジフルオロエチレンなどがあげ
られ、好適なものとしては、ポリテトラフルオロ
エチレン、テトラフルオロエチレン−ヘキサフル
オロプロピレン共重合物などがあげられ、その水
性デイスパージヨンが任意に用いられ、例えば三
井フロロケミカル社製のテフロン120やテフロン
30−Jなどがあげられる。
本発明において、フツ素樹脂の水性デイスパー
ジヨン中で乳化重合するに用いられるビニルモノ
マとしては高温で熱分解性の良好なものが使用さ
れ、例えばアクリル酸エチル、アクリル酸ブチ
ル、メタクリル酸メチル、メタクリル酸ブチルな
どのアクリル酸エステル類やメタクリル酸エステ
ル類の1種または複数種のものが好適なものとし
てあげられる。これらのビニルモノマはフツ素樹
脂の水性デイスパージヨンの電着にあたり、バイ
ンダ的な役割を果たして、締まりの良い電着析出
層の形成を助け、かつ加熱時に皮膜形成を容易に
する。ビニルモノマはフツ素樹脂の水性デイスパ
ージヨン100重量部(固形分)に対し3〜20重量
部、好ましくは5〜10重量部用いられる。3重量
部未満であればバインダ的な効果が少なくて均一
な皮膜が得られ難く、また20重量部を超えると、
加熱分解時に揮発量が多くなり、ピンホールを発
生しやすくなる。
フツ素樹脂の水性デイスパージヨン中でビニル
モノマを乳化重合するあたり、用いる乳化剤とし
ては非イオン、アニオン、カチオンなどの界面活
性剤が用いられるが、電着性の点からアニオン活
性剤が好適に使用され、例えばラウリル硫酸エス
テルナトリウム、ドデシル硫酸ナトリウム、オレ
イル硫酸ナトリウムなどの飽和または不飽和高級
アルコールの硫酸エステル塩、ドデシルスルホン
酸ナトリウム、ドデシルベンゼンスルホン酸ナト
リウムなどのスルホン酸塩があげられる。乳化剤
の使用量は特に制限はないが、電着性、乳化安定
性の点からビニルモノマ100重量部に対して0.5〜
5重量部が好適である。
ビニルモノマを乳化重合するために用いる重合
開始剤としては、通常のものが何ら制限なしに使
用されるが、過硫酸カリウム−亜硫酸水素ナトリ
ウム、過硫酸アンモニウム−亜硫酸水素ナトリウ
ムのレドツクス系開始剤が特に好適なものとして
あげられる。これらの重合開始剤の量は、ビニル
モノマ100重量部に対して0.01〜10重量部の範囲
で適宜用いられる。
フツ素樹脂の水性デイスパージヨン中でビニル
モノマを乳化重合すると、フツ素樹脂を被覆する
ように付着したビニル系樹脂が得られ、そのまま
電着塗料として用いられる。フツ素樹脂の水性デ
イスパージヨン中でビニルモノマを乳化重合して
得られた水分散液中に被塗装体を浸して陽極と
し、直流電流を対電極との間に流すと、電着塗装
が行われ、電気泳動により被塗装体に上記樹脂が
付着し、電着析出層が形成される。電着条件は必
要な膜厚に応じて、印加の電圧が5〜100V程度
で、適宜実施することができる。
上記により得られた電着析出層を加熱して連続
皮膜を形成させるにあたり、皮膜形成を容易にす
るために、加熱前に、電着析出層中のビニル系樹
脂を溶解または膨潤させる親水性有機溶剤で処理
することが有用である。好適な親水性有機溶剤と
しては、N−メチルピロリドン、ジメチルホルム
アミド、ジメチルアセトアミド、ジメチルスルホ
モシド、エチルセロソルブなどの極性溶剤があげ
られる。有機溶剤処理の方法としては、溶剤の液
に浸漬するか蒸気に接触させる方法がある。
こうして処理された電着析出層を加熱するとビ
ニルポリマが分解揮発するとともに水分も除去さ
れ、連続皮膜が形成される。加熱温度は用いたビ
ニル系樹脂の熱分解温度およびフツ素樹脂の溶射
温度により異なるが、400〜600℃の範囲で適宜選
択される。加熱方法としては種々の方法が採用さ
れるが、電着析出層中のビニル系樹脂を速やかに
分解揮発させるために通電加熱、誘導加熱、オー
ブン加熱などが好適な方法としてあげられる。
〔発明の実施例〕
以下、本発明の実施例に図について説明する。
図は本発明の一実施例による製造方法を示す系統
図である。製造方法は、銅箔1および繊維状基材
(ガラスクロス)2が送り出され、ローラ3,4
により重合された状態で、ローラ5を介して表面
が絶縁されたローラ6により対向電極7を設けた
電着槽8に送り込まれ、ローラ6に接した点から
直流電源13により電圧が印加され電着析出層が
形成される。次いで、有機溶剤蒸気槽9で電着析
出層が処理された後、加熱炉10で水分、有機溶
剤およびバインダが分解揮発されて銅張り絶縁皮
膜が形成され、冷却後ローラ11を介して巻取機
12に巻取られる。
参考例:
電着塗料の構造
本発明に使用する電着塗料の製造法の一例を次
に述べる。まず、四つ口フラスコにポリテトラフ
ルオロエチレンデイスパージヨン(テフロン30−
J、樹脂分60%、三井フロロケミカル社製)20
、イオン交換水10、ラウリル硫酸エステルソ
ーダ6gを加え、窒素ガスを通じて30分間かくは
んし、70℃に昇温し、過硫酸アンモニウム6g、
亜硫酸水素ナトリウム2gをイオン交換水20gに
溶解させた液を加え、直にメチルメタクリレート
600gを30分かかつて滴下し、滴下終了後70℃で
2時間反応させる。次にイオン交換水を加え、全
不揮発分20%の水分散液を得る。
実施例 1〜7
表1に示す電着塗料を用いて、図の製造方法に
より、幅500mm、厚さ35μmの連続した銅箔に表
1の繊維状基材を重合して、銅箔側を陽極とし直
流電圧50Vを印加し、電着析出層を形成する。次
いでこの析出層を有機溶剤蒸気で処理した後、通
電加熱により表1に示す最高温度下で熱処理し、
冷却後、巻取ることにより銅張り絶縁皮膜を得
る。特性を表1に併記する。なお銅箔の速度は1
〜10m/minが好適に使用されるが、これに限定
されるものではない。
[Technical Field of the Invention] The present invention relates to a method for producing a low dielectric constant copper-clad insulating film such as a copper-clad laminate used in high-frequency equipment. [Prior art] In general, fluororesin substrates containing a glass base material with a low dielectric constant are widely used as high-frequency printed circuit boards. Pre-dry,
After that, the fluororesin-impregnated glass base material is laminated to a specified thickness, and then copper foil is layered and applied to a pressure of about 50 kg/ cm2.
A copper-clad laminate is produced by maintaining the temperature around 400℃ for several hours, or a process of forming a fluororesin into a sheet with a predetermined thickness to make a flexible substrate, such as a fluororesin raw material. After firing the ingot to make an ingot, cutting it into a film, rolling it, and heat-treating it, the surface of the resulting sheet is activated to improve its adhesion. A copper-clad board is manufactured by continuously pasting copper foil, or by melting and adhering copper foil during a film heat treatment process. However, many steps are required in any of the above methods, and in order for fluororesin substrates to be widely adopted as high-frequency substrates in the future, it is essential to reduce manufacturing costs by simplifying the steps. [Summary of the Invention] The present invention was made for the purpose of improving the above-mentioned drawbacks.
A liquid obtained by emulsion polymerization of a vinyl monomer that has good thermal decomposition properties at high temperatures is used as an electrodeposition coating, and an electrodeposition layer is formed using the electrodeposition coating method on copper foil overlaid with a fibrous base material. Then, if necessary, the precipitated layer is treated with an organic solvent, and then heated at high temperature for a short time to decompose and volatilize the vinyl resin in the precipitated layer, which enables economical, highly reliable, and continuous production. This paper proposes a method for manufacturing a low dielectric constant copper-clad insulation film. [Structure of the Invention] In the present invention, the object to be coated is a fibrous base material superimposed on a copper foil. Glass fiber is mainly used as the fibrous base material used here, and quartz fiber is suitable from the viewpoint of low dielectric constant. For example, glass cloth (manufactured by Arisawa Seisakusho, EPC050, EPC102,
EPC160, LPC070, LPC110, etc.) can be used. Examples of the fluororesin used in the present invention include polytetrafluoroethylene, polytrifluorochloroethylene, polyvinyl fluoride, polyvinylidene fluoride, dichlorodifluoroethylene, etc., and preferred examples include polytetrafluoroethylene. , tetrafluoroethylene-hexafluoropropylene copolymer, etc., and its aqueous dispersion can be optionally used. For example, Teflon 120 manufactured by Mitsui Fluorochemical Co., Ltd. and Teflon
Examples include 30-J. In the present invention, the vinyl monomer used for emulsion polymerization in the aqueous dispersion of fluororesin is one that has good thermal decomposition properties at high temperatures, such as ethyl acrylate, butyl acrylate, methyl methacrylate, and methacrylate. Preferred examples include one or more of acrylic esters such as butyl esters and methacrylic esters. These vinyl monomers play the role of a binder during the electrodeposition of the aqueous dispersion of fluororesin, assisting in the formation of a tight electrodeposited layer, and facilitating the formation of a film upon heating. The vinyl monomer is used in an amount of 3 to 20 parts by weight, preferably 5 to 10 parts by weight, per 100 parts by weight (solid content) of the aqueous fluororesin dispersion. If it is less than 3 parts by weight, the binder effect will be small and it will be difficult to obtain a uniform film, and if it exceeds 20 parts by weight,
During thermal decomposition, the amount of volatilization increases, making pinholes more likely to occur. In emulsion polymerization of vinyl monomers in an aqueous dispersion of fluororesin, nonionic, anionic, and cationic surfactants are used as emulsifiers, but anionic surfactants are preferably used from the viewpoint of electrodepositivity. Examples include sulfuric acid ester salts of saturated or unsaturated higher alcohols such as sodium lauryl sulfate, sodium dodecyl sulfate, and sodium oleyl sulfate, and sulfonic acid salts such as sodium dodecyl sulfonate and sodium dodecylbenzene sulfonate. There is no particular limit to the amount of emulsifier used, but from the viewpoint of electrodeposition and emulsion stability, it is 0.5 to 0.5 parts by weight per 100 parts by weight of vinyl monomer.
5 parts by weight is preferred. As the polymerization initiator used for emulsion polymerization of the vinyl monomer, ordinary initiators can be used without any restrictions, but redox initiators such as potassium persulfate-sodium hydrogen sulfite and ammonium persulfate-sodium hydrogen sulfite are particularly preferred. It can be given as a thing. The amount of these polymerization initiators is suitably used in the range of 0.01 to 10 parts by weight based on 100 parts by weight of the vinyl monomer. When a vinyl monomer is emulsion polymerized in an aqueous dispersion of a fluororesin, a vinyl resin that adheres to the fluororesin is obtained and used as is as an electrodeposition paint. The object to be coated is immersed in an aqueous dispersion obtained by emulsion polymerization of a vinyl monomer in an aqueous dispersion of fluororesin, which serves as an anode, and a direct current is passed between it and the counter electrode to perform electrodeposition coating. Then, the resin adheres to the object to be coated by electrophoresis, forming an electrodeposited layer. Electrodeposition conditions can be suitably implemented with an applied voltage of about 5 to 100 V depending on the required film thickness. When heating the electrodeposited layer obtained above to form a continuous film, in order to facilitate film formation, a hydrophilic organic material that dissolves or swells the vinyl resin in the electrodeposited layer is used before heating. Solvent treatment is useful. Suitable hydrophilic organic solvents include polar solvents such as N-methylpyrrolidone, dimethylformamide, dimethylacetamide, dimethylsulhomoside, and ethyl cellosolve. Methods for organic solvent treatment include immersion in a solvent solution or contact with steam. When the electrodeposited layer treated in this manner is heated, the vinyl polymer is decomposed and volatilized, and water is also removed, forming a continuous film. The heating temperature varies depending on the thermal decomposition temperature of the vinyl resin used and the thermal spraying temperature of the fluororesin, but is appropriately selected within the range of 400 to 600°C. Various methods can be employed as the heating method, but suitable methods include electrical heating, induction heating, oven heating, etc. in order to rapidly decompose and volatilize the vinyl resin in the electrodeposited layer. [Embodiments of the Invention] Hereinafter, embodiments of the present invention will be explained with reference to the drawings.
The figure is a system diagram showing a manufacturing method according to an embodiment of the present invention. In the manufacturing method, a copper foil 1 and a fibrous base material (glass cloth) 2 are sent out, and rollers 3 and 4
The polymerized state is sent via a roller 5 to an electrodeposition tank 8 provided with a counter electrode 7 by a roller 6 whose surface is insulated, and a voltage is applied by a DC power source 13 from the point in contact with the roller 6 to generate an electric current. A deposited layer is formed. Next, after the electrodeposited layer is treated in an organic solvent vapor tank 9, water, organic solvent, and binder are decomposed and volatilized in a heating furnace 10 to form a copper-clad insulating film, and after cooling, it is rolled up via a roller 11. It is wound up by the machine 12. Reference Example: Structure of Electrodeposition Paint An example of the method for manufacturing the electrodeposition paint used in the present invention will be described below. First, place polytetrafluoroethylene dispersion (Teflon 30-
J, resin content 60%, manufactured by Mitsui Fluorochemical Co., Ltd.) 20
Add 10 g of ion-exchanged water and 6 g of lauryl sulfate ester soda, stir for 30 minutes through nitrogen gas, raise the temperature to 70°C, and add 6 g of ammonium persulfate,
Add a solution of 2 g of sodium bisulfite dissolved in 20 g of ion-exchanged water, and immediately add methyl methacrylate.
600g was added dropwise over 30 minutes, and after the addition was completed, the reaction was allowed to proceed at 70°C for 2 hours. Next, add ion-exchanged water to obtain an aqueous dispersion with a total nonvolatile content of 20%. Examples 1 to 7 Using the electrodeposition paint shown in Table 1, the fibrous base material shown in Table 1 was polymerized on a continuous copper foil with a width of 500 mm and a thickness of 35 μm according to the manufacturing method shown in the figure, and the copper foil side was A DC voltage of 50 V is applied as an anode to form an electrodeposited layer. Next, this deposited layer was treated with organic solvent vapor, and then heat-treated by electrical heating at the maximum temperature shown in Table 1,
After cooling, a copper-clad insulating film is obtained by winding it up. The characteristics are also listed in Table 1. Note that the speed of the copper foil is 1
~10 m/min is preferably used, but is not limited thereto.
【表】【table】
本発明によれば、バインダを含むフツ素樹脂溶
液による電着析出層を形成した後、バインダを揮
発させるようにしたので、経済的、高信頼性で連
続的に低誘電率銅張り絶縁皮膜を製造することが
できる。
According to the present invention, after forming an electrodeposited layer using a fluororesin solution containing a binder, the binder is volatilized, so that a low dielectric constant copper-clad insulating film can be continuously formed economically and with high reliability. can be manufactured.
図はこの発明の一実施例を示す系統図であり、
1は銅箔、2は繊維状基材、3〜6,11はロー
ラ、7は対向電極、8は電着槽、9は有機溶剤蒸
気槽、10は加熱炉である。
The figure is a system diagram showing an embodiment of the present invention.
1 is a copper foil, 2 is a fibrous base material, 3 to 6, 11 are rollers, 7 is a counter electrode, 8 is an electrodeposition bath, 9 is an organic solvent vapor bath, and 10 is a heating furnace.
Claims (1)
樹脂の水性デイスパージヨンで熱分解性の良好な
ビニルモノマを乳化重合した液を電着塗料とし
て、電着塗装により電着析出層を形成させ、加熱
によりビニルポリマを分解揮発させ、絶縁皮膜を
形成することを特徴とする低誘電率銅張り絶縁皮
膜の製造方法。 2 繊維状基材がガラスクロスである特許請求の
範囲第1項記載の製造方法。 3 ビニルモノマがメチルメタクリレートである
特許請求の範囲第1項または第2項記載の製造方
法。 4 加熱が通電加熱である特許請求の範囲第1項
ないし第3項のいずれかに記載の製造方法。[Scope of Claims] 1. Electrodeposition coating using a liquid obtained by emulsion polymerization of a vinyl monomer with good heat decomposition properties in an aqueous dispersion of fluororesin as an electrodeposition paint on a copper foil overlaid with fibrous base materials. A method for producing a low dielectric constant copper-clad insulating film, which comprises forming an electrodeposited layer by heating, decomposing and volatilizing the vinyl polymer by heating, and forming an insulating film. 2. The manufacturing method according to claim 1, wherein the fibrous base material is glass cloth. 3. The manufacturing method according to claim 1 or 2, wherein the vinyl monomer is methyl methacrylate. 4. The manufacturing method according to any one of claims 1 to 3, wherein the heating is electrical heating.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP16438384A JPS6142822A (en) | 1984-08-06 | 1984-08-06 | Method of producing low dielectric constant copper-lined insulating film |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP16438384A JPS6142822A (en) | 1984-08-06 | 1984-08-06 | Method of producing low dielectric constant copper-lined insulating film |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS6142822A JPS6142822A (en) | 1986-03-01 |
| JPH0419655B2 true JPH0419655B2 (en) | 1992-03-31 |
Family
ID=15792081
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP16438384A Granted JPS6142822A (en) | 1984-08-06 | 1984-08-06 | Method of producing low dielectric constant copper-lined insulating film |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS6142822A (en) |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE3743850A1 (en) * | 1987-12-23 | 1989-07-06 | Wella Ag | METHOD FOR TREATING HAIR SHAPING OF HAIR COILED ON A BODY, SUCH AS HUMAN HAIR, AND APPARATUS FOR CARRYING OUT THE METHOD |
| EP4600318A4 (en) | 2022-11-02 | 2026-03-11 | Daikin Ind Ltd | Electro-dip coating composition, film, coated article, coated wire and conductor board |
-
1984
- 1984-08-06 JP JP16438384A patent/JPS6142822A/en active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS6142822A (en) | 1986-03-01 |
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