JPH0426912B2 - - Google Patents
Info
- Publication number
- JPH0426912B2 JPH0426912B2 JP61301358A JP30135886A JPH0426912B2 JP H0426912 B2 JPH0426912 B2 JP H0426912B2 JP 61301358 A JP61301358 A JP 61301358A JP 30135886 A JP30135886 A JP 30135886A JP H0426912 B2 JPH0426912 B2 JP H0426912B2
- Authority
- JP
- Japan
- Prior art keywords
- coating
- coating liquid
- speed
- original plate
- coated
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/16—Coating processes; Apparatus therefor
- G03F7/162—Coating on a rotating support, e.g. using a whirler or a spinner
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Application Of Or Painting With Fluid Materials (AREA)
- Coating Apparatus (AREA)
Description
【発明の詳細な説明】
〔発明の技術分野〕
本発明は膜厚を均一に塗布する回転塗布方法に
関する。DETAILED DESCRIPTION OF THE INVENTION [Technical Field of the Invention] The present invention relates to a spin coating method for coating a film with a uniform thickness.
従来円板状のガラス原板にレジストなどを塗布
する微細加工の分野においてはガラス原板を回転
させて塗布することが行なわれている。これに使
用される装置を略述すると、第１図において、軸
受体１に回転自在に支持された支持軸２の上端部
に形成された円板状の回転テーブル３上に被塗布
部材４としての円板状のガラス原板４ａを載置
し、これをモータ５で回転させるようになつてい
る。ガラス原板４ａの塗布面（表面）６に塗布さ
れる塗布液７はタンク８に取付けられた先端の細
い管体９により、例えば人手によつて操作されて
供給される。そして塗布に際しては、原板４ａを
低速で回転させながらタンク８を手に持つて、管
体９から塗布液７を滴下しながらガラス原板４ａ
の半径方向に移動させて述付液７を塗布面６に供
給する。その後膜厚を均一にするため、膜厚に対
応した一定回転速度で、一定時間ガラス原板４ａ
を回転させる。これによりガラス原板４ａ上に塗
布膜の生成を行なう。その際余分な液７は飛散す
るが、カバー１０により外部へ飛散するのが防止
される。
2. Description of the Related Art Conventionally, in the field of microfabrication in which a resist or the like is applied to a disc-shaped glass original plate, the glass original plate is rotated and coated. To briefly describe the device used for this, in FIG. A disk-shaped original glass plate 4a is placed thereon, and this is rotated by a motor 5. The coating liquid 7 to be applied to the coating surface (surface) 6 of the glass original plate 4a is supplied through a tube 9 with a thin tip attached to a tank 8, which is operated manually, for example. When coating, hold the tank 8 in your hand while rotating the original plate 4a at a low speed, and drop the coating liquid 7 from the tube body 9 onto the glass original plate 4a.
The coating liquid 7 is supplied to the application surface 6 by moving in the radial direction. After that, in order to make the film thickness uniform, the glass original plate 4a is rotated for a certain period of time at a constant rotation speed corresponding to the film thickness.
Rotate. As a result, a coating film is formed on the glass original plate 4a. At this time, the excess liquid 7 scatters, but the cover 10 prevents it from scattering to the outside.
従来技術においては、塗布液７の供給を手に持
つたタンク８の移動により行つているため、移動
速度が不安定となり、その結果、塗布液７の供給
が不均一となり、形成される膜圧にばらつきを生
じ、歩留りが悪い不都合があつた。また高密度化
に対応するためには膜厚の均一性向上が強く要望
されている。 In the conventional technology, since the coating liquid 7 is supplied by moving the tank 8 held in the hand, the moving speed becomes unstable, and as a result, the coating liquid 7 is not supplied uniformly, and the formed film pressure increases. There was an inconvenience that the yield was poor due to variations in the results. Furthermore, in order to cope with higher density, there is a strong demand for improved uniformity of film thickness.
本発明は回転塗布において均一な膜厚を安定し
て生成することができる回転塗布方法を提供する
ことを目的とする。
An object of the present invention is to provide a spin coating method that can stably produce a uniform film thickness in spin coating.
〔発明の概要〕
本発明は回転している被塗布部材に対して半径
方向に沿つて走査しながら塗布液を供給して塗布
するにあたつて、走査の速度を被塗布部材の回転
中心付近を外周縁より大にしたものである。[Summary of the Invention] The present invention supplies a coating liquid to a rotating member to be coated while scanning it in the radial direction. is larger than the outer periphery.
以下本発明の詳細を本発明を実施するのに好適
な装置を示す第２図および第３図と第４図とを参
照しながら一実施例により説明する。２１は支持
テーブルで、これには貫通孔２２が設けられてい
て、これと同軸に軸受体２３が取付けられてい
る。この軸受体２３には内部に玉軸受が取付けら
れていて、これを介して支持軸２４が回転自在に
取付けられている。この支持軸２４の上端部は円
盤状に形成されて回転テーブル２５となつてい
て、軸受体２３から突出した下端部は径小に形成
されて、軸継手２６を経てモータ２７に連結され
ており、モータ２７により回転テーブル２５は回
転される。なお上記の軸継手２６とモータ２７と
で回転駆動機構２８を構成している。上述の回転
テーブル２５には支持軸２４の一部で形成された
突出ピン２９が設けられていて、回転テーブル２
５上に、被塗布部材４としての円板状のガラス原
板４ａが、突出ピン２９により心出しされて載置
される。またこのガラス原板４ａを囲んでカバー
３１が設けられている。
The present invention will now be described in detail by way of an example, with reference to FIGS. 2, 3, and 4, which illustrate apparatus suitable for carrying out the invention. Reference numeral 21 denotes a support table, which is provided with a through hole 22, and a bearing body 23 is attached coaxially with the through hole 22. A ball bearing is attached to the inside of this bearing body 23, and a support shaft 24 is rotatably attached via this ball bearing. The upper end of this support shaft 24 is formed into a disk shape and serves as a rotary table 25, and the lower end protruding from the bearing body 23 is formed with a small diameter and is connected to a motor 27 via a shaft coupling 26. , the rotary table 25 is rotated by the motor 27. Note that the shaft joint 26 and the motor 27 constitute a rotational drive mechanism 28. The rotary table 25 described above is provided with a protruding pin 29 formed by a part of the support shaft 24, and the rotary table 25 is
A disk-shaped glass original plate 4 a as the member to be coated 4 is placed on the glass substrate 5 with its center being centered by a protruding pin 29 . Further, a cover 31 is provided surrounding this glass original plate 4a.
さらにまた支持テーブル２１上には取付け台３
３が取付けられていて、この上に塗布液供給装置
３５、管体走査機構３６および制御装置３７など
が取付けられている。 Furthermore, on the support table 21 is a mounting base 3.
3 is attached, and a coating liquid supply device 35, a tube body scanning mechanism 36, a control device 37, etc. are attached thereon.
塗布液供給装置３５は、取付け台３３から立設
したスタンド４０の上に、塗布液４１を収容した
タンク４２と、管体４３と、これらの間に介在し
た電磁弁４４とから構成されていて、図示しない
圧縮空気源からの空気により加圧されたタンク４
２内の塗布液４１は管体４３から塗布面６に流出
するが、その流出、停止は外部指令により開閉す
る電磁弁４４によりなされる。 The coating liquid supply device 35 is constructed of a tank 42 containing a coating liquid 41, a pipe body 43, and a solenoid valve 44 interposed between these, on a stand 40 erected from a mounting base 33. , a tank 4 pressurized with air from a compressed air source (not shown)
The coating liquid 41 in 2 flows out from the tube body 43 to the coating surface 6, but the flow is stopped and stopped by a solenoid valve 44 which is opened and closed by an external command.
次に管体操作機構３６は取付け台３３に固定さ
れたパルスモータ４６と、一端部で管体４３を保
持するとともに他端部がパルスモータ４６の出力
軸に固定された走査レバー４７とからなつてい
て、外部指令により制御されるパルスモータ４６
により走査レバー４７は首振り状に回動し、管体
４３の開口４８は中心の突出ピン２９から外周縁
４ｂまで走査する。 Next, the tube operation mechanism 36 consists of a pulse motor 46 fixed to the mounting base 33 and a scanning lever 47 that holds the tube 43 at one end and whose other end is fixed to the output shaft of the pulse motor 46. The pulse motor 46 is controlled by an external command.
As a result, the scanning lever 47 rotates in an oscillating manner, and the opening 48 of the tube body 43 scans from the central projecting pin 29 to the outer peripheral edge 4b.
制御装置３７は取付け台３３に取付けられた箱
体５０の中に収容されていて、パルスモータ４６
の回転速度、回転方向を制御するパルスモータ４
６の駆動回路、電磁弁４４の開閉回路およびモー
タ２７の駆動回路などが設けられており、これら
は手動により操作されるスイツチにより作動を開
始し、例えば駆動回路はモータの回転により順次
接点が切換えられてパルスモータ４６の速度を制
御する制御スイツチを設けて構成されている。 The control device 37 is housed in a box body 50 attached to the mounting base 33, and is connected to a pulse motor 46.
A pulse motor 4 that controls the rotation speed and direction of the
6, an opening/closing circuit for the solenoid valve 44, a drive circuit for the motor 27, etc., which are started by a manually operated switch.For example, in the drive circuit, the contacts are sequentially switched by the rotation of the motor. A control switch for controlling the speed of the pulse motor 46 is provided.
次に上記の装置をもとに本発明につき述べる
と、電磁弁４４が閉じられ、タンク４２には塗布
液４１が満たされ、若干加圧された状態にして準
備を終り、直径約300mmのガラス原板４ａを回転
テーブル２５に載置する。次にモータ２７を始動
してガラス原板４ａを低速で回転させ、しかる後
制御装置３７を作動させ、電磁弁４４を開き、続
いてパルスモータ４６を始動して走査を開始させ
る。この際の走査の速度変化は、例えば第３図の
ようになる。すなわち本図は横軸に開口４８から
ガラス原板４ａの中心までの距離をとり、縦軸に
その速度をとつたもので便宜上階段状に順次速度
を変化させて中心付近でV0の速度から外周縁で
はV1の速度になるように制御する。かくして外
周縁４ｂを過ぎると電磁弁４４が閉じられて、塗
布液４１の供給を終える。このように走査速度を
変化させてあるので、ほぼ塗布面４ｃ上には均一
の厚さに塗布液４１が供給される。次に所定の速
度で所定の時間ガラス原板４ａを回転させると、
余分な塗布液４１は外周縁４ｂから飛び去りカバ
ー３１に当たり、流下して行く。これにより所定
厚さに均一にレジストが塗布される。 Next, the present invention will be described based on the above-mentioned device.The solenoid valve 44 is closed, the tank 42 is filled with the coating liquid 41, and the preparation is completed with the coating liquid 41 in a slightly pressurized state. The original plate 4a is placed on the rotary table 25. Next, the motor 27 is started to rotate the glass original plate 4a at a low speed, and then the control device 37 is activated to open the solenoid valve 44, and then the pulse motor 46 is started to start scanning. The scanning speed change at this time is as shown in FIG. 3, for example. In other words, in this figure, the horizontal axis represents the distance from the opening 48 to the center of the glass original plate 4a, and the vertical axis represents the speed. At the periphery, the speed is controlled to be V 1 . After passing the outer peripheral edge 4b, the solenoid valve 44 is closed and the supply of the coating liquid 41 is finished. Since the scanning speed is changed in this way, the coating liquid 41 is supplied to a substantially uniform thickness on the coating surface 4c. Next, when the glass original plate 4a is rotated at a predetermined speed for a predetermined time,
The excess coating liquid 41 flies away from the outer peripheral edge 4b, hits the cover 31, and flows down. As a result, the resist is uniformly applied to a predetermined thickness.
なお本実施例においては、走査速度を階段状に
変化させたが、これに限定されず、第４図Ａ曲線
とかＢ曲線のように変化させてもよいことはもち
ろんであり、走査方向についても外周から内周へ
行つてもよい。また塗布液もレジストに限定され
ず、被塗布部材もガラスに限定されない。 In this embodiment, the scanning speed was changed in a stepwise manner; however, the scanning speed is not limited to this, and it is of course possible to change it as shown in the curves A and B in FIG. 4. You may go from the outer circumference to the inner circumference. Further, the coating liquid is not limited to resist, and the member to be coated is not limited to glass.
以上詳述したように被塗布部材の中心から外周
縁迄の間の塗布液を供給する走査速度を適宜変化
させて塗布したので、被塗布部材の塗布面に均一
の厚さに、または各部を所望の厚さ分布に塗布液
を供給することができ、後工程の高速回転により
均一な膜厚を得る際の均一性向上に役するところ
極めて大である。
As detailed above, since the scanning speed for supplying the coating liquid from the center to the outer periphery of the member to be coated was changed appropriately, coating was carried out to a uniform thickness on the coated surface of the member to be coated, or to each part. The coating liquid can be supplied in a desired thickness distribution, which is extremely useful for improving uniformity when obtaining a uniform film thickness by high-speed rotation in the subsequent process.
第１図は従来例の要部を示す断面図、第２図は
本考案を実施する好適な装置の例の要部を断面し
て示す正面図、第３図は本実施例における走査速
度説明図、第４図は他の走査速度の説明図であ
る。
４：被塗布部材、４ｃ：塗布面、２５：回転テ
ーブル、２８：回転駆動機構、３５：塗布液回転
装置、３６：管体走査機構、３７：制御装置、４
１：塗布液、４３：管体、４８：開口。
FIG. 1 is a sectional view showing the main parts of a conventional example, FIG. 2 is a front view showing the main parts of a preferred example of an apparatus for carrying out the present invention, and FIG. 3 is an explanation of the scanning speed in this embodiment. 4 are explanatory diagrams of other scanning speeds. 4: Member to be coated, 4c: Coating surface, 25: Rotating table, 28: Rotation drive mechanism, 35: Coating liquid rotation device, 36: Tube body scanning mechanism, 37: Control device, 4
1: Coating liquid, 43: Pipe body, 48: Opening.
Claims (1)
回転されている被塗布部材の塗布面に塗布液を上
記塗布部材の半径方向に沿つて上記塗布部材の回
転中心から外周縁に向かうに従つて遅くした走査
速度で上記塗布面上に塗布膜を生成する塗布工程
と、この塗布工程後上記回転されている塗布部材
を余分な塗布液が飛散する回転速度にして回転す
る回転工程とを備えたことを特徴とする回転塗布
方法。1 Applying a coating liquid onto the coating surface of a member to be coated that is placed on a rotary table and being rotated at a predetermined speed along the radial direction of the coating member from the center of rotation of the coating member toward the outer peripheral edge. a coating step of producing a coating film on the coating surface at a slow scanning speed; and a rotation step of rotating the rotating coating member after the coating step at a rotational speed at which excess coating liquid is scattered. A spin coating method characterized by:
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP30135886A JPS62183885A (en) | 1986-12-19 | 1986-12-19 | Rotary coating method |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP30135886A JPS62183885A (en) | 1986-12-19 | 1986-12-19 | Rotary coating method |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS62183885A JPS62183885A (en) | 1987-08-12 |
| JPH0426912B2 true JPH0426912B2 (en) | 1992-05-08 |
Family
ID=17895906
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP30135886A Granted JPS62183885A (en) | 1986-12-19 | 1986-12-19 | Rotary coating method |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS62183885A (en) |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0675367B2 (en) * | 1989-12-05 | 1994-09-21 | 旭硝子株式会社 | Surface treatment method and device for panel face for cathode ray tube |
| JP2008016708A (en) * | 2006-07-07 | 2008-01-24 | Victor Co Of Japan Ltd | Treatment liquid application equipment |
Family Cites Families (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS551145A (en) * | 1978-06-19 | 1980-01-07 | Nec Corp | Semiconductor wafer photo-resist applicator |
| JPS581144A (en) * | 1981-06-25 | 1983-01-06 | Fujitsu Ltd | Method for coating photoresist |
-
1986
- 1986-12-19 JP JP30135886A patent/JPS62183885A/en active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS62183885A (en) | 1987-08-12 |
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