JPH0432685B2 - - Google Patents
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- Publication number
- JPH0432685B2 JPH0432685B2 JP59161000A JP16100084A JPH0432685B2 JP H0432685 B2 JPH0432685 B2 JP H0432685B2 JP 59161000 A JP59161000 A JP 59161000A JP 16100084 A JP16100084 A JP 16100084A JP H0432685 B2 JPH0432685 B2 JP H0432685B2
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- JP
- Japan
- Prior art keywords
- gas
- adsorption
- container
- cylinder
- adsorbent
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
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- Separation Of Gases By Adsorption (AREA)
Description
【発明の詳細な説明】
〔産業上の利用分野〕
本発明は水素ガスまたはヘリウムガス中に含ま
れる窒素ガス、一酸化炭素ガス、メタンガスなど
の不純ガスを深冷吸着法によつて除去するガス精
製装置に関し、さらに詳しくは吸着筒に内蔵され
たシーズヒーターによる直接加熱によつて、吸着
剤の再生が行われるガス精製装置に関する。[Detailed Description of the Invention] [Industrial Application Field] The present invention relates to a gas that removes impurity gases such as nitrogen gas, carbon monoxide gas, and methane gas contained in hydrogen gas or helium gas by cryogenic adsorption. The present invention relates to a purification device, and more particularly to a gas purification device in which adsorbent is regenerated by direct heating by a sheathed heater built into an adsorption cylinder.
近年、半導体産業、原子力産業などにおける水
素ガス、ヘリウムガスなどの需要が増大して来た
が、これらの分野で使用されるガスは極めて高純
度であることが要求される。 In recent years, the demand for hydrogen gas, helium gas, etc. in the semiconductor industry, nuclear industry, etc. has increased, and the gases used in these fields are required to have extremely high purity.
このため窒素ガス、一酸化炭素ガス、メタンガ
スなどの不純ガスを含む水素ガスまたはヘリウム
ガスを精製して高純度ガスを得るための手段の一
つとして深冷吸着法を利用した種々のガス精製装
置が用いられており、たとえば特開昭54−42370、
特開昭55−7565などがある。これらの装置は主に
吸着筒、液体窒素容器、断熱容器および熱交換器
などによつて構成され、深冷によるガスの吸着精
製と、加熱による吸着剤の再生とが交互に繰返し
て行われる。すなわち、ガスの精製時には液体窒
素で冷却されている吸着筒内に不純ガスを含む水
素ガスまたはヘリウムガスを流すことにより、不
純ガスが吸着剤に吸着され高純度の精製ガスが取
り出される。また、吸着剤の再生時には液体窒素
を抜き出した後、加熱された空気、窒素などで吸
着筒を外側から加熱しながら再生用ガス(精製ガ
ス)を吸着筒内に流すことにより、一旦吸着され
た不純ガスが脱着除去される。
For this reason, various gas purification devices using cryogenic adsorption are used as a means of purifying hydrogen gas or helium gas containing impurity gases such as nitrogen gas, carbon monoxide gas, and methane gas to obtain high-purity gas. are used, for example, JP-A-54-42370,
Examples include JP-A-55-7565. These devices mainly consist of an adsorption cylinder, a liquid nitrogen container, a heat insulating container, a heat exchanger, and the like, and adsorption purification of gas by deep cooling and regeneration of adsorbent by heating are repeatedly performed alternately. That is, during gas purification, by flowing hydrogen gas or helium gas containing impure gas into an adsorption column cooled with liquid nitrogen, the impure gas is adsorbed by the adsorbent and highly purified purified gas is extracted. In addition, when regenerating the adsorbent, after extracting the liquid nitrogen, the regeneration gas (purified gas) is flowed into the adsorption column while heating the adsorption column from the outside with heated air, nitrogen, etc. Impure gases are desorbed and removed.
しかしながら、再製時にこのような加熱ガスを
用いる従来の装置ではガスを加熱する場合の加熱
効率が極めて低いこと、加熱ガスによつて吸着筒
を外側から加熱するため伝熱効率が低いこと、お
よび加熱ガスを循環するためのブロワー配管およ
びこれらの保温などが必要であることなど種々の
欠点があつた。また、露出されたニクロム線など
を使用した電気ヒーターで吸着剤を直接加熱する
ことは、吸着剤が局部加熱される惧れがあるこ
と、吸着筒が真空断熱容器内に収容された場合に
は真空層を貫通し、かつ極低温にさらされること
からリード線の外部への取り出しおよびその材質
選定が困難なこと、ヒーターの絶縁性が悪く、し
かも寿命が短いことなど種々の問題があり、実用
化できなかつた。
However, in conventional equipment that uses such heated gas during remanufacturing, the heating efficiency when heating the gas is extremely low, the heat transfer efficiency is low because the adsorption column is heated from the outside by the heated gas, and the heating gas There were various drawbacks, such as the need for blower piping to circulate the water and heat insulation. In addition, directly heating the adsorbent with an electric heater using exposed nichrome wire may cause local heating of the adsorbent, and if the adsorbent cylinder is housed in a vacuum insulated container, There are various problems such as difficulty in taking out the lead wire outside and selecting the material for it because it penetrates the vacuum layer and is exposed to extremely low temperatures, and the insulation of the heater is poor and its lifespan is short. I couldn't convert it.
本発明者らは従来装置の欠点を改善し、ガスの
精製と吸着剤の再生サイクルにおける冷却および
加熱に要するエネルギーの損失を著しく減少させ
ることができ、しかも小型化されたガス精製装置
を得るべく吸着剤の電気加熱による再生に着目
し、鋭意研究を続けた結果本発明に到達した。
The present inventors have aimed to improve the shortcomings of conventional devices and to obtain a gas purification device that can significantly reduce the energy losses required for cooling and heating in the gas purification and adsorbent regeneration cycles, and that is also miniaturized. Focusing on the regeneration of adsorbent by electrical heating, the present invention was achieved as a result of intensive research.
すなわち、本発明は深冷吸着法によるガス精製
装置において、外筒容器および内筒容器によつて
2重構造とされ、該内筒容器には1または複数の
吸着筒が収容され、該吸着筒の少くとも1つには
シーズヒーターが内蔵されたことを特徴とするガ
ス精製装置である。 That is, the present invention provides a gas purification apparatus using a cryogenic adsorption method, which has a double structure including an outer cylindrical container and an inner cylindrical container, one or more adsorption cylinders are housed in the inner cylindrical container, and the adsorption cylinder The gas purification device is characterized in that at least one of the gas purifiers has a built-in sheathed heater.
本発明において使用される吸着筒の形状には特
に制限はないが円筒形であることが好ましい。こ
れらの吸着筒は単独で用いられてもよく、また複
数の吸着筒が配管で直列に連結されて用いられて
もよい。 The shape of the adsorption cylinder used in the present invention is not particularly limited, but it is preferably cylindrical. These adsorption cylinders may be used alone, or a plurality of adsorption cylinders may be connected in series through piping.
本発明において吸着筒に充填される吸着剤とし
ては活性炭、モレキユラーシーブおよびゼオライ
トなどがあるが、不純ガスに対する吸着性能の良
さから、就中活性炭が好ましい。 In the present invention, the adsorbent to be filled in the adsorption cylinder includes activated carbon, molecular sieve, and zeolite, but activated carbon is particularly preferred because of its good adsorption performance for impure gases.
本発明において吸着筒に内蔵されるヒーター
は、いわゆるシーズヒーターであればよく、たと
えばニツケル・クロム線などの電熱線が金属シー
ス内に収納され、シース内空間部には高純度の酸
化マグネシウムなどの無機絶縁粉末が強固に充填
され、端子部はシリコン系シール剤あるいはエポ
キシ樹脂などで完全にシールされたヒーター(い
わゆるマイクロヒーターも包含される。以下同
様)である。このようなシーズヒーター以外の電
熱ヒーターでは吸着剤の局部加熱、真空放電、絶
縁不良、電熱線の断線などが生じ易く、実用に耐
える装置を得ることはできない。 In the present invention, the heater built into the adsorption cylinder may be a so-called sheathed heater, for example, a heating wire such as a nickel chrome wire is housed in a metal sheath, and a space inside the sheath is filled with a high-purity magnesium oxide or the like. The heater is tightly filled with inorganic insulating powder and the terminal portion is completely sealed with a silicone sealant or epoxy resin (this also includes a so-called micro-heater, hereinafter the same). With electric heaters other than such sheathed heaters, local heating of the adsorbent, vacuum discharge, poor insulation, disconnection of heating wires, etc. are likely to occur, and it is impossible to obtain a device that can withstand practical use.
またシーズヒーターの端子部から装置外部へ導
かれるリード線も金属細管内でシーズヒーターに
おけると同様な無機絶縁粉末によつて固定され、
かつ、金属細管とともに折曲げ可能な柔軟性を具
備したものが用いられる。 In addition, the lead wires leading from the terminals of the sheathed heater to the outside of the device are fixed in the metal tube with inorganic insulating powder similar to that used in the sheathed heater.
In addition, a material having flexibility that can be bent together with the metal thin tube is used.
吸着筒に内蔵されるシーズヒーターの数は吸着
筒の大きさ、要求される加熱量などによつて異な
り、一概に特定はできないが、円筒状の吸着筒に
ついてその内径がたとえば100mm以下では1〜3
本である。なお、複数の吸着筒が配管によつて直
列に連結されている場合には通常は再生用ガスの
少くとも最上流側に位置する吸着筒にシーズヒー
ターが内蔵される。勿論他の吸着筒にもシーズヒ
ーターを内蔵させることもできる。また吸着剤の
局部加熱をさらに防止し、吸着剤全体に対する伝
熱効率を高めるために吸着筒内部に放熱板を設け
ることが好ましい。放熱板はシーズヒーターの熱
を吸着剤に効率よく伝えるものであればその形状
および数には特に制限はないが、たとえば複数枚
の長方形の金属板を用い、それぞれの一方の長辺
はシーズヒーターまたはヒーター鞘に接し、各放
熱板は放射状に設けられてもよい。また中央にシ
ーズヒーターまたはヒーターの鞘を通すための孔
の他、ガスを自由に通過させるための孔が適宜数
穿設された複数枚の金属円板をそれぞれ水平に
し、吸着筒内で上下方向に間隔をあけて設けられ
てもよい。 The number of sheathed heaters built into an adsorption cylinder varies depending on the size of the adsorption cylinder, the amount of heating required, etc., and cannot be determined unconditionally, but if the inner diameter of a cylindrical adsorption cylinder is 100 mm or less, the number is 1 to 1. 3
It's a book. In addition, when a plurality of adsorption cylinders are connected in series by piping, a sheathed heater is usually built in the adsorption cylinder located at least on the most upstream side of the regeneration gas. Of course, it is also possible to incorporate a sheathed heater in other adsorption cylinders. Further, in order to further prevent local heating of the adsorbent and increase heat transfer efficiency to the entire adsorbent, it is preferable to provide a heat sink inside the adsorption cylinder. There are no particular restrictions on the shape or number of heat sinks as long as they can efficiently transmit the heat from the sheathed heater to the adsorbent, but for example, if multiple rectangular metal plates are used, one long side of each is connected to the sheath heater. Alternatively, the heat sinks may be provided radially in contact with the heater sheath. In addition, in addition to holes for passing the sheathed heater or heater sheath through the center, multiple metal disks with an appropriate number of holes for freely passing gas are placed horizontally and placed vertically inside the adsorption cylinder. They may be provided at intervals.
本発明において吸着筒は真空断熱によつて外界
と遮断されているが、外筒容器および内筒容器に
よつて2重構造とされ、外筒容器の内周面と内筒
容器の外周面との間は全周にわたつて空間有し、
この空間は真空状態を保つことができるよう気密
構造とされている。外筒容器および内筒容器は筒
状であればその形状には特に制限はないが、円筒
状であることが好ましい。外筒容器の内周面と内
筒容器の外周面で挟まれた空間は装置の運転時に
は常に真空状態とされる。内筒容器内には1また
は複数の吸着筒が収容されており、吸着筒はガス
の精製時には内筒容器内に供給された液体窒素
(以下LN2と記す)によつて外側から冷却される。
また、吸着剤の再生時には内筒容器からLN2が抜
き出され、吸着筒内に再生用ガスを流しながら、
吸着筒に内蔵されたシーズヒーターにより吸着剤
を加熱することによつて、吸着されていた不純ガ
スが脱着除去されるが、この再生時には内筒容器
内をも真空状態に保つことが好ましい。 In the present invention, the adsorption cylinder is isolated from the outside world by vacuum insulation, but it has a double structure with an outer cylinder container and an inner cylinder container, and the inner peripheral surface of the outer cylinder container and the outer peripheral surface of the inner cylinder container There is a space around the entire circumference between
This space has an airtight structure to maintain a vacuum state. There is no particular restriction on the shape of the outer cylindrical container and the inner cylindrical container as long as they are cylindrical, but cylindrical shapes are preferred. The space sandwiched between the inner circumferential surface of the outer cylindrical container and the outer circumferential surface of the inner cylindrical container is always kept in a vacuum state during operation of the apparatus. One or more adsorption cylinders are housed in the inner cylinder container, and during gas purification, the adsorption cylinders are cooled from the outside by liquid nitrogen (hereinafter referred to as LN 2 ) supplied into the inner cylinder container. .
In addition, when regenerating the adsorbent, LN 2 is extracted from the inner cylinder container, and while the regeneration gas is flowing into the adsorption cylinder,
By heating the adsorbent with a sheathed heater built into the adsorption cylinder, the adsorbed impurity gas is desorbed and removed, but during this regeneration, it is preferable to also maintain the inside of the inner cylinder container in a vacuum state.
本発明において精製時および再生時の熱効率を
さらに高めるために吸着筒に供給されるガスと吸
着筒から出るガスとの熱交換器を設けることが好
ましい。熱交換器を設ける場所には特に制限はな
く、たとえば、(1)内筒容器のLN2液面の上方空間
部、(2)外筒容器の内周面と内筒容器の外周面との
間の空間部、および(3)外筒容器の外部、が挙げら
れる。これらの中でも(2)が好ましい。さらに内筒
容器内において原料ガスの冷却効率を高めるた
め、吸着筒への原料ガス供給管の一部を蛇管また
は冷却フイン付配管などの予冷管とすることもで
きる。 In the present invention, it is preferable to provide a heat exchanger between the gas supplied to the adsorption column and the gas exiting from the adsorption column in order to further improve thermal efficiency during purification and regeneration. There is no particular restriction on the location where the heat exchanger is installed; for example, (1) the space above the LN2 liquid level in the inner cylindrical container, (2) the space between the inner peripheral surface of the outer cylindrical container and the outer peripheral surface of the inner cylindrical container. and (3) the outside of the outer cylindrical container. Among these, (2) is preferred. Furthermore, in order to improve the cooling efficiency of the raw material gas in the inner cylinder container, a part of the raw material gas supply pipe to the adsorption cylinder can be made into a pre-cooling pipe such as a serpentine pipe or a pipe with cooling fins.
次に図面によつて本発明をさらに具体的に説明
する。 Next, the present invention will be explained in more detail with reference to the drawings.
第1図イおよびロはそれぞれシーズヒーターが
内蔵された吸着筒の縦断面図および横断端面図で
あり、第2図イおよびロはそれぞれ第1図とは異
る態様の吸着筒の縦断面図および横断端面図であ
る。 Figures 1A and 2B are a vertical cross-sectional view and a cross-sectional end view of an adsorption cylinder with a built-in sheathed heater, respectively, and Figures 2A and 2B are longitudinal sectional views of an adsorption cylinder in a different manner from that in Figure 1. and a cross-sectional end view.
第1図においてガスの入口1および出口2を有
する円筒状の容器本体3の内部に、金属細管で保
護されたリード線4が接続された棒状のシーズヒ
ーター5がその発熱部が吸着剤6の充填層に埋ま
るように容器本体3と同心的に設けられ、シーズ
ヒーター5は容器本体3の上端7において容器本
体3と溶接により気密に固定されている。シーズ
ヒーター5の側面周囲には複数枚の長方形の放熱
板8,…,8がそれぞれ1方の長辺をシーズヒー
ター5に接し、他方の長辺が容器本体の内周面に
向けて放射状に配置せしめられ、残る空間部には
吸着剤6が充填されて吸着筒とされている。 In FIG. 1, inside a cylindrical container body 3 having a gas inlet 1 and an outlet 2, there is a rod-shaped sheathed heater 5 connected to a lead wire 4 protected by a metal capillary tube. The sheathed heater 5 is provided concentrically with the container body 3 so as to be buried in the filling layer, and is airtightly fixed to the container body 3 at the upper end 7 of the container body 3 by welding. Around the side surface of the sheathed heater 5, a plurality of rectangular heat dissipation plates 8,..., 8 each have one long side in contact with the sheathed heater 5, and the other long side radially toward the inner peripheral surface of the container body. The remaining space is filled with adsorbent 6 to form an adsorption column.
第2図においてガス入口1および出口2を有す
る円筒状の容器本体3の内部に直接シーズヒータ
ー5を設ける代りに、シーズヒーター5が着脱自
在に収納され、かつ一端が閉じられた円筒状のヒ
ーター鞘10が容器本体3と同心的に設けられ、
ヒーター鞘10は容器本体3の上端7において容
器本体3と溶接により気密に固定され、ヒーター
鞘10の側面周囲に放熱板8,…,8が放射状に
配置せしめられている他は第1図で示されたと同
様な吸着筒である。 In Fig. 2, instead of providing the sheathed heater 5 directly inside the cylindrical container body 3 having the gas inlet 1 and outlet 2, the sheathed heater 5 is removably housed and a cylindrical heater with one end closed is used. A sheath 10 is provided concentrically with the container body 3,
The heater sheath 10 is airtightly fixed to the container body 3 at the upper end 7 of the container body 3 by welding, and heat dissipation plates 8, . . . , 8 are arranged radially around the side surfaces of the heater sheath 10. This is an adsorption cylinder similar to the one shown.
第3図は単一の吸着筒が用いられた本発明のガ
ス精製装置の原理を示すための縦断面図であり、
第4図は複数の吸着筒が用いられた本発明のガス
精製装置の原理を示すための縦断面図であり、第
5図は第4図において内筒容器および外筒容器が
円筒状とされたガス精製装置の横断端面図であ
る。 FIG. 3 is a longitudinal cross-sectional view showing the principle of the gas purification apparatus of the present invention using a single adsorption cylinder,
FIG. 4 is a longitudinal cross-sectional view showing the principle of the gas purification apparatus of the present invention in which a plurality of adsorption cylinders are used, and FIG. FIG.
第3図において内筒容器11の内部には第1図
または第2図で示されたと同様な吸着筒9が収容
され、内筒容器11は外筒容器12内に収納さ
れ、かつ内筒容器11の外周面と外筒容器12の
内周面で挟まれた空間には円筒状の熱交換器13
が設けられている。原料ガス供給管14および精
製ガス抜出管15はそれぞれ装置外部から外筒容
器12の壁を貫通し、熱交換器13を介し、さら
に内筒容器11の壁を貫通して吸着筒9の入口1
および出口2と接続せしめられている。またLN2
供給管16およびLN2抜出管17はそれぞれ外筒
容器12の壁を貫通して内筒容器11に接続せし
められている。これらの配管はいずれも貫通部に
おいて溶接および管継手によつて気密に固定され
ている。なお、原料ガス供給管14は内筒容器1
1内においてその一部が蛇管18とされている。
金属細管で保護されたリード線4は内筒容器11
および外筒容器12それぞれの壁を順次貫通して
外部へ導かれ、それぞれの貫通部において継手1
9および20によつて気密に固定されている。ガ
スの精製時にはLN2供給管16から内筒容器11
の内部にLN2が供給され、吸着筒9はこのLN2に
浸されて外側から冷却される。原料ガスは原料ガ
ス供給管14により熱交換器13および蛇管18
を順次経由して冷却され、吸着筒9の内部に供給
され、不純ガスが吸着除去され、精製ガスとして
熱交換器13を経由して精製ガス抜出管15より
外部に出る。吸着剤の再生時には内筒容器11か
らLN2抜出管17によつてLN2が抜出され、さら
に真空ポンプ(図示されていない)により、内筒
容器11内部が真空とされ、シーズヒーター5に
通電して吸着剤を加熱しながら再生用ガス(精製
ガス)が精製時とは逆の経路で流されることによ
り吸着されていた不純ガスは脱着除去される。 In FIG. 3, an adsorption tube 9 similar to that shown in FIG. 1 or 2 is housed inside the inner tube container 11, the inner tube container 11 is housed in the outer tube container 12, and the inner tube container 11 is housed inside the inner tube container 11. A cylindrical heat exchanger 13 is located in the space sandwiched between the outer peripheral surface of the container 11 and the inner peripheral surface of the outer cylindrical container 12.
is provided. The raw material gas supply pipe 14 and the purified gas extraction pipe 15 each penetrate the wall of the outer cylinder container 12 from the outside of the apparatus, pass through the heat exchanger 13, and further penetrate the wall of the inner cylinder container 11 to reach the entrance of the adsorption cylinder 9. 1
and outlet 2. Also LN 2
The supply pipe 16 and the LN 2 extraction pipe 17 each penetrate the wall of the outer cylindrical container 12 and are connected to the inner cylindrical container 11. All of these pipes are airtightly fixed at the penetrating portions by welding and pipe joints. Note that the raw material gas supply pipe 14 is connected to the inner cylinder container 1.
1, a part of which is made into a flexible pipe 18.
The lead wire 4 protected by a metal thin tube is connected to the inner cylinder container 11
and the outer cylindrical container 12, and are guided to the outside through the respective walls of the outer cylindrical container 12, and the joint 1
9 and 20 in an airtight manner. When refining gas, the LN2 supply pipe 16 is connected to the inner cylinder container 11.
LN 2 is supplied into the interior of the adsorption cylinder 9, and the adsorption cylinder 9 is immersed in this LN 2 and cooled from the outside. The raw material gas is passed through the raw material gas supply pipe 14 to the heat exchanger 13 and the flexible pipe 18.
The purified gas is sequentially cooled and supplied to the interior of the adsorption column 9, where impurity gas is adsorbed and removed, and exits as purified gas from the purified gas extraction pipe 15 via the heat exchanger 13. When regenerating the adsorbent, LN 2 is extracted from the inner cylinder container 11 by the LN 2 extraction pipe 17, and the inside of the inner cylinder container 11 is evacuated by a vacuum pump (not shown), and the sheathed heater 5 The impurity gas adsorbed is desorbed and removed by passing the regeneration gas (purified gas) in the opposite path to that used during purification while heating the adsorbent by applying electricity to the adsorbent.
第4図においてシーズヒーター5が内蔵されて
いる吸着筒9が4筒およびシーズヒーター5が内
蔵されていない吸着筒9′が3筒それぞれ交互に
連絡配管21,…,21で直列に連結されて用い
られた以外は第3図で示されたと同様な構造のガ
ス精製装置である。 In Fig. 4, four adsorption cylinders 9 with built-in sheathed heaters 5 and three adsorption cylinders 9' without built-in sheathed heaters 5 are alternately connected in series through connecting pipes 21, . . . , 21. A gas purification apparatus having a structure similar to that shown in FIG. 3 was used except that.
ガスの精製時にはLN2供給管16から内筒容器
11の内部にLN2が供給され、吸着筒9,9′,
…,9′,9がそれぞれこのLN2に浸されて外側
から冷却される。原料ガスは原料ガス供給管14
により熱交換器13および蛇管18を順次経由し
て冷却され、吸着筒9,9′,…,9,9それぞ
れの連結の順にその内部を通過せしめられること
により不純ガスが吸着除去され、精製ガスとして
熱交換器13を経由して精製ガス抜出管15から
外部に排出される。吸着剤の再生時には内筒容器
11からLN2抜出管17によつてLN2を抜出し、
さらに真空ポンプ(図示されていない)により、
内筒容器11内部を真空とし、シーズヒーター
5,…,5に通電して再生用ガス(精製ガス)を
精製時とは逆の経路で流すことにより吸着されて
いた不純ガスは脱着除去される。 During gas purification, LN 2 is supplied from the LN 2 supply pipe 16 into the inner cylinder container 11, and the adsorption cylinders 9, 9',
..., 9', 9 are each immersed in this LN 2 and cooled from the outside. The raw material gas is supplied through the raw material gas supply pipe 14
The purified gas is cooled through the heat exchanger 13 and the corrugated pipe 18, and is passed through the adsorption cylinders 9, 9', ..., 9, 9 in the order of connection, so that impurity gas is adsorbed and removed. The purified gas is discharged to the outside from the purified gas extraction pipe 15 via the heat exchanger 13. When regenerating the adsorbent, LN 2 is extracted from the inner cylinder container 11 through the LN 2 extraction pipe 17,
Additionally, a vacuum pump (not shown)
The inside of the inner cylindrical container 11 is evacuated and the sheathed heaters 5,..., 5 are energized to flow the regeneration gas (purified gas) in the opposite path to that used during purification, thereby desorbing and removing the adsorbed impurity gas. .
第5図において円筒状の外筒容器12と円筒状
の内筒容器11とは互に同心的に設けられ、その
内部には吸着筒9,9′,…,9′,9が収容さ
れ、吸着筒9,9′,…,9′,9はそれぞれ連絡
配管21,…,21によつて直列に連結され、内
筒容器11の外周面と外筒容器12の内周面との
間の空間部には円筒状の熱交換器13が配設され
て、外観的にはほゞ円筒形のガス精製装置とされ
ている。 In FIG. 5, a cylindrical outer container 12 and a cylindrical inner container 11 are provided concentrically with each other, and adsorption cylinders 9, 9', . . . , 9', 9 are accommodated therein. The adsorption cylinders 9, 9', ..., 9', 9 are connected in series by connecting pipes 21, ..., 21, respectively, and the gap between the outer peripheral surface of the inner cylinder container 11 and the inner peripheral surface of the outer cylinder container 12 is A cylindrical heat exchanger 13 is disposed in the space, and the gas purification device has a substantially cylindrical appearance.
本発明のガス精製装置は従来の装置に比べて次
のような優れた特徴を有している。
The gas purification device of the present invention has the following superior features compared to conventional devices.
1 吸着剤の再生時、加熱されたガスによる間接
加熱と異り、加熱効率がきわめて高い。1. When regenerating the adsorbent, heating efficiency is extremely high, unlike indirect heating using heated gas.
2 吸着剤の再生時、内筒容器の内部をも真空に
することができガス伝導による熱エネルギーの
ロスが小さい。2. When regenerating the adsorbent, the inside of the inner cylindrical container can also be evacuated, reducing thermal energy loss due to gas conduction.
3 ガスを外部加熱するための加熱炉、ブロワ
ー、配管ならびにこれらの保温も不要であり、
従つて装置が小型化できると共にシール材、バ
ルブなどの耐熱仕様が緩やかになり、設備費が
低減される。3. There is no need for a heating furnace, blower, piping, or insulation for heating gas externally,
Therefore, the device can be made smaller, and the heat resistance specifications for sealing materials, valves, etc. can be relaxed, and equipment costs can be reduced.
実施例
装置:
第4図および第5図で示されたと同様な装置に
おいて、7筒の吸着筒、それぞれの容器本体の材
質SUS304、寸法89.1mmφ×1000mmH×2mmtと
し、このうちシーズヒーターが内蔵された4筒に
はそれぞれ第2図で示されたと同様な構造のもの
を用いた。すなわち4筒それぞれについてヒータ
ー鞘として材質SUS304、寸法19mmφ×1000mmH
×1.2mmt、シーズヒーターとして200V、500W、
寸法16mmφ×1050mm、発熱部の長さ800mm、放
熱板として材質SUS304、寸法30mm×200mm×1
mmtの板16枚を使用した。また7筒の吸着筒のそ
れぞれにはヤシ殻活性炭を5ずつ充填した。内
筒容器は寸法318.5mmφ×1400mmH×4mmt、外
筒容器は寸法600mmφ×1600mmH×4mmtであり、
金属細管で保護されたリード線は内筒容器および
外筒容器それぞれの壁を貫通させてスライダツク
に接続し、それぞれの貫通部はスエージロツク継
手(米、スエージロツク社製)で固定した。Example device: In a device similar to that shown in Figs. 4 and 5, there were seven adsorption cylinders, the material of each container body was SUS304, the dimensions were 89.1 mmφ x 1000 mmH x 2 mmt, and a sheathed heater was built in. Each of the four cylinders used had a structure similar to that shown in FIG. In other words, the heater sheath for each of the four cylinders is made of SUS304, and the dimensions are 19mmφ x 1000mmH.
×1.2mmt, 200V, 500W as a sheathed heater,
Dimensions: 16mmφ x 1050mm, heat generating part length: 800mm, heat sink made of SUS304, dimensions: 30mm x 200mm x 1
16 mmt plates were used. Further, each of the seven adsorption cylinders was filled with five pieces of coconut shell activated carbon. The inner cylindrical container has dimensions of 318.5mmφ x 1400mmH x 4mmt, and the outer cylindrical container has dimensions of 600mmφ x 1600mmH x 4mmt.
A lead wire protected by a thin metal tube was passed through the walls of the inner and outer containers and connected to the slider, and each penetrating portion was fixed with a Swagelok joint (manufactured by Swagelok, USA).
この装置を用いてガスの精製および吸着剤の再
生を行つた。 This equipment was used to purify gas and regenerate adsorbent.
ガスの精製:
内筒容器の外周面と外筒容器の内周面との間の
空間を真空状態(0.1Torr)に保ち、内筒容器に
LN2を供給して吸着筒を−196℃に冷却しながら
原料ガス供給管より窒素ガス330ppm、一酸化炭
素ガス70ppm、メタンガス70ppmを含む原料水素
ガスを流速20Nm3/hrで供給し、精製を10日間続
けた。この間に得られた精製水素ガスをTCDお
よびFID型ガスクロマトグラスによつて分析した
結果窒素ガス、一酸化炭素ガスおよびメタンガス
はいずれも検出されなかつた。これら不純ガスの
検出下限は窒素ガス1ppm、一酸化炭素0.1ppm、
メタンガス0.05ppmである。Purification of gas: The space between the outer circumferential surface of the inner cylinder container and the inner circumferential surface of the outer cylinder container is kept in a vacuum state (0.1 Torr), and
While LN 2 was supplied and the adsorption cylinder was cooled to -196°C, raw hydrogen gas containing 330 ppm nitrogen gas, 70 ppm carbon monoxide gas, and 70 ppm methane gas was supplied from the raw gas supply pipe at a flow rate of 20 Nm 3 /hr to perform purification. It continued for 10 days. The purified hydrogen gas obtained during this period was analyzed by TCD and FID type gas chromatography, and as a result, no nitrogen gas, carbon monoxide gas, or methane gas was detected. The detection limits for these impurity gases are nitrogen gas 1ppm, carbon monoxide 0.1ppm,
Methane gas is 0.05ppm.
吸着剤の再生:
次に原料水素ガスの供給を停止し、吸着剤の再
生を行つた。内筒容器のLN2を抜き出した後、室
温の乾燥窒素ガスを内筒容器に流して昇温した。
内筒容器内の温度が−50℃まで上昇したとき窒素
ガスを止め、内筒容器内を0.1Torrの真空とし
た。スライダツクを操作して各吸着筒のシーズヒ
ーターそれぞれに0.5Aの電流を流し始め、徐々
に電流値を増し2.0Aとすると同時に吸着剤の再
生用ガスとして精製水素ガスを常圧で精製ガス抜
出管から、精製時とは逆の経路で始めの1hrに1N
m3流した。シーズヒーターが内蔵された吸着筒内
の温度はさらに上昇をつゞけ、10℃になつたとき
に、精製水素ガスを流速3Nm3/hrで2hr流した。
その後、吸着筒内の温度はさらに上昇をつゞけ
180℃に達した。こゝでシーズヒーターの電流を
1.8Aに下げたが0.5hr後に吸着筒内の温度は210℃
に達して、ほゞ一定となつた。このときシーズヒ
ーターが内蔵されていない吸着筒内の温度は190
℃であつた。この状態で再生用ガスの流速を1N
m3/hrに下げ、3.5hr再生を続けた。この間シー
ズヒーターが内蔵されていない吸着筒内の温度は
205℃でほゞ一定値を示した。Regeneration of adsorbent: Next, the supply of raw hydrogen gas was stopped and the adsorbent was regenerated. After extracting the LN 2 from the inner cylinder container, dry nitrogen gas at room temperature was flowed into the inner cylinder container to raise the temperature.
When the temperature inside the inner tube rose to -50°C, the nitrogen gas was stopped, and the inside of the inner tube was made into a vacuum of 0.1 Torr. Operate the slider to start applying a current of 0.5A to each sheathed heater in each adsorption tube, and gradually increase the current value to 2.0A. At the same time, purified hydrogen gas is extracted at normal pressure as gas for regenerating the adsorbent. From the tube, add 1N for the first 1 hr in the reverse direction of purification.
m3 flowed. The temperature inside the adsorption cylinder containing the sheath heater was further increased, and when it reached 10°C, purified hydrogen gas was flowed at a flow rate of 3 Nm 3 /hr for 2 hours.
After that, the temperature inside the adsorption cylinder continues to rise.
The temperature reached 180℃. Here, turn on the current of the sheathed heater.
Although the temperature was lowered to 1.8A, the temperature inside the adsorption cylinder was 210℃ after 0.5hr.
reached and became almost constant. At this time, the temperature inside the adsorption cylinder without a built-in sheathed heater is 190.
It was warm at ℃. In this state, the flow rate of the regeneration gas is set to 1N.
m 3 /hr and continued regeneration for 3.5hr. During this time, the temperature inside the adsorption cylinder without a built-in sheath heater will be
It showed a nearly constant value at 205℃.
こゝで再生を終了し、電流を切り、内側容器内
の真空を破つて室温の窒素ガスを流して冷却する
ことにより2hr後に吸着筒内の温度は120℃に下つ
た。この間に要した全電力消費量は7KWHであ
り、精製水素ガスの消費量は12Nm3であつた。引
続き水素ガスの精製を行つた結果前記と同様な結
果が得られた。 At this point, regeneration was terminated, the electric current was cut off, the vacuum inside the inner container was broken, and nitrogen gas at room temperature was flowed for cooling, and the temperature inside the adsorption column dropped to 120°C after 2 hours. The total electricity consumption during this period was 7KWH, and the consumption of purified hydrogen gas was 12Nm3 . As a result of subsequent purification of hydrogen gas, the same results as above were obtained.
比較例
実施例と同様に水素ガスの吸着精製を行つた
後、条件を次の様に変更して吸着剤の再生を行つ
た。Comparative Example After hydrogen gas was adsorbed and purified in the same manner as in the example, the adsorbent was regenerated by changing the conditions as follows.
すなわち吸着筒にシーズヒーターを内蔵させる
代りに外筒容器の外部に電気炉とブロワーを設
け、420℃に加熱された電気炉で窒素ガスを加熱
しながら内筒容器との間を循環させて吸着筒を加
熱した。また再生用ガスとして500℃に加熱され
た別の加熱炉で精製水素ガスを加熱して吸着筒内
に流した。 In other words, instead of having a sheathed heater built into the adsorption cylinder, an electric furnace and a blower are installed outside the outer cylinder, and nitrogen gas is heated in the electric furnace heated to 420°C and circulated between the inner cylinder and the adsorption cylinder. The cylinder was heated. In addition, purified hydrogen gas was heated in a separate heating furnace heated to 500°C as a regeneration gas and flowed into the adsorption cylinder.
まず内筒容器内のLN2を抜き出した後、室温の
乾燥窒素ガスを内筒容器に流して、内筒容器が0
℃に昇温したとき上記の加熱窒素ガス循環系に接
続し、1hrで吸着筒内の温度を100℃に昇温させ
た。窒素ガスの循環を続けながら500℃に調節さ
れた電気炉で加熱された精製水素ガスを実施例に
おけると同じ経路で流速1.5Nm3/hrで吸着筒内
に流してたところ4hrで200℃に達した。窒素ガス
加熱用電気炉の調節温度を400℃に下げて、さら
に3.5hr続けた。
First, after extracting the LN 2 in the inner cylinder container, dry nitrogen gas at room temperature is flowed into the inner cylinder container until the inner cylinder is 0.
When the temperature was raised to 100°C, it was connected to the heated nitrogen gas circulation system described above, and the temperature inside the adsorption column was raised to 100°C in 1 hour. Purified hydrogen gas heated in an electric furnace adjusted to 500℃ while continuing to circulate nitrogen gas was flowed into the adsorption column at a flow rate of 1.5Nm 3 /hr through the same route as in the example, and the temperature reached 200℃ in 4 hours. Reached. The temperature control of the electric furnace for nitrogen gas heating was lowered to 400°C and continued for an additional 3.5 hours.
吸着剤の再生に要した電力消費量は循環ブロワ
ーの駆動電力を除いて、38KWHであり、精製水
素ガスの消費量は12Nm3であつた。引続き水素ガ
スの精製を行つたところ実施例における精製と同
様な結果が得られた。 The power consumption required for regenerating the adsorbent was 38 KWH, excluding the driving power of the circulation blower, and the consumption of purified hydrogen gas was 12 Nm 3 . Subsequently, the hydrogen gas was purified, and the same results as in the example were obtained.
第1図イおよびロは、それぞれシーズヒーター
が内蔵された吸着筒の縦断面図および横断端面図
であり、第2図イおよびロはそれぞれ第1図とは
異る態様の吸着筒の縦断面図および横断端面図で
あり、第3図は単一の吸着筒が用いられた本発明
のガス精製装置の原理を示すための縦断面図であ
り、第4図は複数の吸着筒が用いられた本発明の
ガス精製装置の原理を示すための縦断面図であ
り、第5図は第4図における円筒状とされたガス
精製装置の横断端面図である。
図において、1……入口、2……出口、3……
容器本体、4……金属細管で保護されたリード
線、5……シーズヒーター、6……吸着剤、7…
…上端、8……放熱板、9および9′……吸着筒、
10……ヒーター鞘、11……内筒容器、12…
…外筒容器、13……熱交換器、14……原料ガ
ス供給管、15……精製ガス抜出管、16……
LN2供給管、17……LN2抜出管、18……蛇
管、19および20継手ならびに21……連絡配
管である。
Figures 1A and 2B are a vertical cross-sectional view and a cross-sectional end view, respectively, of an adsorption cylinder with a built-in sheathed heater, and Figures 2A and 2B are longitudinal cross-sections of an adsorption cylinder in a different form from that in Figure 1. FIG. 3 is a vertical sectional view showing the principle of the gas purification apparatus of the present invention using a single adsorption cylinder, and FIG. FIG. 5 is a longitudinal sectional view showing the principle of the gas purification apparatus of the present invention, and FIG. 5 is a cross-sectional end view of the cylindrical gas purification apparatus in FIG. 4. In the figure, 1...inlet, 2...exit, 3...
Container body, 4...Lead wire protected by metal thin tube, 5...Sheathed heater, 6...Adsorbent, 7...
...Top end, 8...Radiation plate, 9 and 9'...Adsorption cylinder,
10... Heater sheath, 11... Inner cylinder container, 12...
... Outer cylinder container, 13 ... Heat exchanger, 14 ... Raw material gas supply pipe, 15 ... Purified gas extraction pipe, 16 ...
LN 2 supply pipe, 17... LN 2 extraction pipe, 18... serpentine pipe, 19 and 20 joints, and 21... connection piping.
Claims (1)
筒容器および内筒容器によつて2重構造とされ、
該内筒容器には1または複数の吸着筒が収容さ
れ、該吸着筒の少くとも1つにはシーズヒーター
が内蔵されたことを特徴とするガス精製装置。1. In a gas purification device using the cryogenic adsorption method, it has a double structure with an outer cylindrical container and an inner cylindrical container,
A gas purification device characterized in that one or more adsorption cylinders are housed in the inner cylinder container, and at least one of the adsorption cylinders has a sheathed heater built therein.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP16100084A JPS6138616A (en) | 1984-07-31 | 1984-07-31 | Gas purifying apparatus |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP16100084A JPS6138616A (en) | 1984-07-31 | 1984-07-31 | Gas purifying apparatus |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS6138616A JPS6138616A (en) | 1986-02-24 |
| JPH0432685B2 true JPH0432685B2 (en) | 1992-06-01 |
Family
ID=15726665
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP16100084A Granted JPS6138616A (en) | 1984-07-31 | 1984-07-31 | Gas purifying apparatus |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS6138616A (en) |
Families Citing this family (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4688899A (en) * | 1984-07-27 | 1987-08-25 | Casio Computer Co., Ltd. | Dual-frequency, dielectric anisotropy liquid crystal display |
| US5453112A (en) * | 1994-02-02 | 1995-09-26 | Praxair Technology, Inc. | Pressure swing adsorption heat recovery |
| CN105032117B (en) * | 2015-07-09 | 2017-05-24 | 东南大学 | A device for gas-solid reaction between heavy metal vapor and adsorbent |
| JP6930156B2 (en) * | 2017-03-16 | 2021-09-01 | 株式会社富士通ゼネラル | Suction unit and air purifier |
| JP7330225B2 (en) * | 2021-04-21 | 2023-08-21 | 大陽日酸株式会社 | gas purifier |
-
1984
- 1984-07-31 JP JP16100084A patent/JPS6138616A/en active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS6138616A (en) | 1986-02-24 |
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