JPH043495B2 - - Google Patents
Info
- Publication number
- JPH043495B2 JPH043495B2 JP1562383A JP1562383A JPH043495B2 JP H043495 B2 JPH043495 B2 JP H043495B2 JP 1562383 A JP1562383 A JP 1562383A JP 1562383 A JP1562383 A JP 1562383A JP H043495 B2 JPH043495 B2 JP H043495B2
- Authority
- JP
- Japan
- Prior art keywords
- light
- reflecting mirror
- pinhole
- elliptical
- receiving element
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 230000003287 optical effect Effects 0.000 claims description 12
- 238000007689 inspection Methods 0.000 claims description 7
- 238000003384 imaging method Methods 0.000 description 8
- 238000010586 diagram Methods 0.000 description 3
- 230000000694 effects Effects 0.000 description 2
- 230000000903 blocking effect Effects 0.000 description 1
- 238000005286 illumination Methods 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- 238000003908 quality control method Methods 0.000 description 1
Classifications
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/17—Systems in which incident light is modified in accordance with the properties of the material investigated
- G01N21/55—Specular reflectivity
- G01N21/57—Measuring gloss
Landscapes
- Physics & Mathematics (AREA)
- Health & Medical Sciences (AREA)
- Life Sciences & Earth Sciences (AREA)
- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- Biochemistry (AREA)
- General Health & Medical Sciences (AREA)
- General Physics & Mathematics (AREA)
- Immunology (AREA)
- Pathology (AREA)
- Investigating Or Analysing Materials By Optical Means (AREA)
- Testing Of Optical Devices Or Fibers (AREA)
Description
【発明の詳細な説明】
産業上の利用分野
本発明は、電子写真複写装置などの露光用とし
て用いられる楕円断面を有する樋形反射鏡の、反
射面の光沢度を測定検査する装置に関する。DETAILED DESCRIPTION OF THE INVENTION Field of the Invention The present invention relates to an apparatus for measuring and inspecting the glossiness of a reflecting surface of a gutter-shaped reflecting mirror having an elliptical cross section used for exposure in electrophotographic copying machines and the like.
従来例の構成とその問題点
従来、金属反射材料などの光沢を有する材料の
光沢度を測定するには、ゴニオ計などが用いられ
ている。Configuration of Conventional Example and its Problems Conventionally, a goniometer or the like has been used to measure the glossiness of a glossy material such as a metallic reflective material.
以下に、ゴニオ計による光沢度測定の原理を説
明する。 The principle of gloss measurement using a goniometer will be explained below.
第1図はゴニオ計の原理を示す図であり、1は
光源、2は拡散板である。前記光源1の光はピン
ホール3とコリメータ・レンズ4により平行光と
され、これを被検材料5に照射角θで照射する。
この被検材料5からの反射光のうち受光角ψの光
だけを受光素子8で受光させるため、集光レンズ
6とピンホール7とを設けている。 FIG. 1 is a diagram showing the principle of a goniometer, where 1 is a light source and 2 is a diffuser plate. The light from the light source 1 is made into parallel light by a pinhole 3 and a collimator lens 4, and is irradiated onto a test material 5 at an illumination angle θ.
A condensing lens 6 and a pinhole 7 are provided in order to cause the light receiving element 8 to receive only the light having the acceptance angle ψ out of the reflected light from the test material 5.
以上のように構成されたゴニオ計では、照射角
θ、受光角を任意に決めて、反射材料5の反射
特性を測定できる。ここで、照射角θと受光角ψ
とを等しく設定すれば正反射光が測定でき、また
両者の角度をずらすことにより拡散反射光が測定
できる。 In the goniometer configured as described above, the reflection characteristics of the reflective material 5 can be measured by arbitrarily determining the irradiation angle θ and the acceptance angle. Here, the illuminating angle θ and the receiving angle ψ
If they are set equal, specularly reflected light can be measured, and by shifting the angles between the two, diffusely reflected light can be measured.
しかしながら、上記のような構成では、被検材
料5への照射光が平行光となるため、平板状の材
料の光沢度しか測定することができず、曲面を有
する材料では光が散乱され、曲面を有する材料の
光沢度は測定することができない。一方、電子写
真複写装置などでは、露光用として用いられる樋
形反射鏡の反射面の光沢度の違いによつて露光す
る照射面の照度が変化する。したがつて、電子写
真複写装置などでは、露光する照射面の照度を一
定の範囲に管理するために、樋形反射鏡の反射面
の光沢を測定・管理する必要がある。しかしなが
ら、先にのべたように曲面を有する反射材料、す
なわち、樋形反射鏡の反射面の光沢度を測定でき
ないので、このことが樋形反射鏡の品質管理を行
なう上で、大きな障害となつていた。 However, in the above configuration, since the light irradiated to the test material 5 becomes parallel light, it is only possible to measure the glossiness of a flat material, and the light is scattered when using a material with a curved surface. It is not possible to measure the gloss of materials with On the other hand, in an electrophotographic copying apparatus or the like, the illuminance of the exposed irradiation surface changes depending on the glossiness of the reflecting surface of the gutter-shaped reflecting mirror used for exposure. Therefore, in electrophotographic copying machines and the like, it is necessary to measure and control the gloss of the reflective surface of the trough-shaped reflector in order to control the illuminance of the exposed irradiation surface within a certain range. However, as mentioned earlier, it is not possible to measure the glossiness of the reflecting surface of a reflective material with a curved surface, that is, a trough-shaped reflector, and this poses a major obstacle in quality control of trough-shaped reflectors. was.
発明の目的
本発明は上記従来の問題点に留意し、電子写真
複写装置などの、露光用として用いられる楕円断
面を有する樋形反射鏡の反射面の光沢度を容易
に、かつ、正確に測定検査できる装置を提供する
ことを目的とする。Purpose of the Invention The present invention takes into account the above-mentioned conventional problems, and makes it possible to easily and accurately measure the glossiness of the reflecting surface of a gutter-shaped reflecting mirror with an elliptical cross section used for exposure, such as in electrophotographic copying machines. The purpose is to provide a device that can be inspected.
発明の構成
前記目的を達成するため、本発明は楕円断面を
有する樋形反射鏡の反射面の、一方に設置した線
上光源と、前記楕円焦点と相対する他方の楕円焦
点との間に設置した1つのピンホールと、1枚ま
たは複数枚の平面鏡を用いて2つの結像光学系を
構成し、これによつて投影される反射鏡の像を受
光する受光素子を備えた光沢検査装置の構成とし
たものであり、2つの光学系を切り換えて受光素
子への入射光を選択することにより、反射鏡の光
沢度を測定検査することのできるものである。Structure of the Invention In order to achieve the above object, the present invention provides a linear light source installed on one side of the reflecting surface of a gutter-shaped reflecting mirror having an elliptical cross section, and a linear light source installed between the elliptical focal point and the other elliptical focal point opposite to the elliptical focal point. Configuration of a gloss inspection device comprising two imaging optical systems using one pinhole and one or more plane mirrors, and a light receiving element that receives the image of the reflecting mirror projected by the two imaging optical systems. By switching between the two optical systems and selecting the light incident on the light receiving element, the glossiness of the reflecting mirror can be measured and inspected.
実施例の説明
第2図は本発明の光沢検査装置の一実施例であ
り、その断面を示す図で、正反射光の強度を測定
している状態を示すものである。第2図において
10は被検材料、すなわち楕円断面を有する樋系
反射鏡(以下、楕円反射鏡という)である。11
はこの楕円反射鏡10の一方の焦点に設置した線
状光源、12は前記楕円反射鏡10のもう一方の
焦点、13は結像光学系を構成するためのピンホ
ール、14,15は反射鏡10から焦点12へ集
まる光をピンホール13へ導く平面鏡、16は楕
円反射鏡10からの拡散光がピンホール13へ入
射することを防ぐための遮光板、17はピンホー
ル13を通過した楕円反射鏡10の投影像からの
光を受光する受光素子、18は線状光源11から
の直射光がピンホール13へ入射することを防ぐ
ための遮光板である。DESCRIPTION OF EMBODIMENTS FIG. 2 shows an embodiment of the gloss inspection device of the present invention, and is a cross-sectional view showing a state in which the intensity of specularly reflected light is being measured. In FIG. 2, reference numeral 10 indicates the material to be tested, that is, a gutter-type reflector having an elliptical cross section (hereinafter referred to as an elliptical reflector). 11
12 is the other focal point of the elliptical reflecting mirror 10; 13 is a pinhole for forming an imaging optical system; 14 and 15 are reflecting mirrors. 16 is a light shielding plate that prevents the diffused light from the elliptical reflector 10 from entering the pinhole 13; 17 is an elliptical reflection that has passed through the pinhole 13; A light receiving element 18 that receives light from the projected image of the mirror 10 is a light shielding plate that prevents direct light from the linear light source 11 from entering the pinhole 13.
以上のように構成された本実施例の光沢検査装
置について、以下にその動作を説明する。 The operation of the gloss inspection apparatus of this embodiment configured as described above will be explained below.
線状光源11からの放射光は、楕円反射鏡10
に照射され、これに対する楕円反射鏡10の正反
射光が焦点12へ集まる。ここでこの正反射光
は、平面鏡15および平面鏡14によつてピンホ
ール13へ導かれる。このとき、楕円反射鏡10
からピンホール13までの光学的距離は、楕円反
射鏡10から焦点12までの距離と等しくすれ
ば、楕円反射鏡10からの正反射光がピンホール
13に集光する。すなわち、ピンホール13で結
像光学系を構成して受光素子17に楕円反射鏡1
0を投影すると、正反射鏡のみで投影できる。こ
の時、楕円反射鏡10からの拡散反射光は遮光板
16により遮光されている。したがつて、このと
きの受光素子17の出力は、正反射光の強度を示
すものである。 The emitted light from the linear light source 11 is transmitted through the elliptical reflector 10
The specularly reflected light from the elliptical reflector 10 converges on the focal point 12. Here, this specularly reflected light is guided to the pinhole 13 by a plane mirror 15 and a plane mirror 14. At this time, the elliptical reflector 10
If the optical distance from the elliptical reflector 10 to the pinhole 13 is equal to the distance from the elliptical reflector 10 to the focal point 12, specularly reflected light from the elliptical reflector 10 will be focused on the pinhole 13. That is, the pinhole 13 constitutes an imaging optical system, and the light receiving element 17 is provided with an elliptical reflecting mirror 1.
When 0 is projected, it can be projected only with a regular reflecting mirror. At this time, the diffusely reflected light from the elliptical reflecting mirror 10 is blocked by the light blocking plate 16. Therefore, the output of the light receiving element 17 at this time indicates the intensity of the specularly reflected light.
これに対して、第3図に示すごとく、平面鏡1
4を19の方向へ、また遮光板16を20の方向
へそれぞれ移動すると、平面鏡15からの正反射
光がピンホール13へ入射しなくなるとともに、
楕円反射鏡10からの拡散反射光が入射し、この
ピンホール13で構成した結像光学系によつて、
反射鏡10が受光素子17に投影される。したが
つて、このときの受光素子17の出力は拡散反射
光の強度を示すものである。 On the other hand, as shown in FIG.
4 in the direction of 19 and the light shielding plate 16 in the direction of 20, the specularly reflected light from the plane mirror 15 no longer enters the pinhole 13, and
Diffuse reflected light from the elliptical reflector 10 enters, and the imaging optical system configured with this pinhole 13 allows
The reflecting mirror 10 is projected onto the light receiving element 17 . Therefore, the output of the light receiving element 17 at this time indicates the intensity of the diffusely reflected light.
すなわち、第2図、第3図に示すように順次測
定することにより、正反射光の強度および拡散反
射光の強度がわかり、これより容易に光沢度を求
めることができる。 That is, by sequentially measuring as shown in FIGS. 2 and 3, the intensity of specularly reflected light and the intensity of diffusely reflected light can be determined, and the degree of gloss can be easily determined from this.
以上のように本実施例によれば、楕円断面を有
する樋形反射鏡の一方の焦点に線状光源を設け、
平面鏡を使つて、正反射光と拡散反射光を1組の
ピンホールと受光素子で受光することにより、楕
円断面を有する反射鏡の光沢度を測定することが
できる。 As described above, according to this embodiment, a linear light source is provided at one focal point of the gutter-shaped reflecting mirror having an elliptical cross section,
By using a plane mirror and receiving specularly reflected light and diffusely reflected light with a pair of pinholes and a light receiving element, the glossiness of the reflecting mirror having an elliptical cross section can be measured.
なお、実施例において、受光素子として一般の
受光素子としたが、一次元撮像素子を用いること
により、反射鏡各部が一次元撮影素子のそれぞれ
に対応する位置に投影されるので、光沢度の分布
を求めることができる。 In the examples, a general light-receiving element was used as the light-receiving element, but by using a one-dimensional imaging element, each part of the reflecting mirror is projected at a position corresponding to each one of the one-dimensional imaging elements, so the distribution of glossiness is can be found.
発明の効果
以上の実施例より明らかなように本発明の光沢
検査装置は、平面鏡を用いることにより、ピンホ
ールで構成する結像光学系を切り換えて、1組の
ピンホールと受光素子で、楕円断面を有する反射
鏡の光沢度を測定することができ、その実用的効
果は大きい。Effects of the Invention As is clear from the above embodiments, the gloss inspection device of the present invention uses a plane mirror to switch the imaging optical system composed of pinholes, and uses a pair of pinholes and a light receiving element to form an elliptical shape. The glossiness of a reflective mirror having a cross section can be measured, and its practical effects are great.
第1図は従来のゴニオ計の原理図、第2図は本
発明の一実施例における光沢検査装置の断側面
図、第3図は同装置において拡散反射光を測定す
る状態を示した断側面図である。
10……被検材料(楕円反射鏡)、11……線
状光源、12……楕円焦点、13……ピンホー
ル、14,15……平面鏡、17……受光素子。
Fig. 1 is a principle diagram of a conventional goniometer, Fig. 2 is a cross-sectional side view of a gloss inspection device according to an embodiment of the present invention, and Fig. 3 is a cross-sectional side view showing the state in which the same device measures diffusely reflected light. It is a diagram. 10... Test material (elliptical reflecting mirror), 11... Linear light source, 12... Elliptical focal point, 13... Pinhole, 14, 15... Plane mirror, 17... Light receiving element.
Claims (1)
射鏡の一方の楕円焦点上に設置した線状光源と、
前記樋形反射鏡からの反射光の一部を通過させる
ピンホールと、このピンホールを通過した光を受
光する受光素子と、前記樋形反射鏡から他方の焦
点に集まる光をピンホールへ導く1枚または複数
枚の平面鏡とを備え、前記平面鏡のうち少なくと
も1枚が回動して前記のピンホールと受光素子、
または前記ピンホールと受光素子と平面鏡とから
構成した2種類の光学系に切換えられるよう構成
し、この2種類の光学系のうち一方が線状光源の
ない側の楕円焦点に集光する光を前記受光素子に
導き、他方の光学系が前記樋形反射鏡からの拡散
反射光を前記受光素子に導くことを特徴とする光
沢検査装置。 2 樋形反射鏡からピンホールまでの光路長を前
記樋形反射鏡から線状光源のない側の楕円焦点ま
での距離に等しく設定したことを特徴とする特許
請求の範囲第1項記載の光沢検査装置。[Scope of Claims] 1. A gutter-shaped reflecting mirror having an elliptical cross section, a linear light source installed on one of the elliptical focal points of this gutter-shaped reflecting mirror,
A pinhole that allows a portion of the reflected light from the gutter-shaped reflecting mirror to pass through, a light receiving element that receives the light that has passed through the pinhole, and guides the light that gathers at the other focal point from the gutter-shaped reflecting mirror to the pinhole. one or more plane mirrors, at least one of the plane mirrors rotates to connect the pinhole and the light receiving element;
Alternatively, the configuration is such that it can be switched between two types of optical systems each consisting of the pinhole, a light receiving element, and a plane mirror, and one of these two types of optical systems focuses the light on the elliptical focal point on the side where there is no linear light source. The gloss inspection device is characterized in that the other optical system guides the diffusely reflected light from the gutter-shaped reflecting mirror to the light receiving element. 2. The gloss according to claim 1, wherein the optical path length from the trough-shaped reflecting mirror to the pinhole is set equal to the distance from the trough-shaped reflecting mirror to the elliptical focal point on the side without the linear light source. Inspection equipment.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP58015623A JPS59141041A (en) | 1983-02-01 | 1983-02-01 | Gloss inspection device |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP58015623A JPS59141041A (en) | 1983-02-01 | 1983-02-01 | Gloss inspection device |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS59141041A JPS59141041A (en) | 1984-08-13 |
| JPH043495B2 true JPH043495B2 (en) | 1992-01-23 |
Family
ID=11893832
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP58015623A Granted JPS59141041A (en) | 1983-02-01 | 1983-02-01 | Gloss inspection device |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS59141041A (en) |
-
1983
- 1983-02-01 JP JP58015623A patent/JPS59141041A/en active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS59141041A (en) | 1984-08-13 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| JP5388543B2 (en) | Appearance inspection device | |
| JP3140664B2 (en) | Foreign matter inspection method and apparatus | |
| JP3226946B2 (en) | Optical inspection equipment | |
| KR970707432A (en) | DEFECT DETECTION IN PATTERNED SUBSTRATES USING OPTICAL COMPUTING | |
| CN114324365B (en) | A curved surface detection device | |
| JP2002181698A (en) | Spectral reflectance measuring apparatus and spectral reflectance measuring method | |
| KR970075860A (en) | Device for measuring photometric and colorimetric properties of objects | |
| JP3388285B2 (en) | Inspection device | |
| JPH043495B2 (en) | ||
| JP3871415B2 (en) | Spectral transmittance measuring device | |
| US5111037A (en) | Device for measuring light scattered by an information support | |
| EP0051899B1 (en) | Apparatus for automatically detecting and evaluating the characteristics of prints | |
| JPH0577228B2 (en) | ||
| JPS58120106A (en) | Detecting device for focal point | |
| JP3040131B2 (en) | Spherical surface scratch inspection device | |
| JPS6411132B2 (en) | ||
| JPS622113A (en) | Surface roughness meter using reflected light | |
| JP3106521B2 (en) | Optical inspection equipment for transparent substrates | |
| JP2002139309A (en) | Optical property measuring device, film thickness measuring device, polishing end point judging device and polishing device | |
| JPH10185828A (en) | Defect inspection method and device for transparent flat body surface | |
| JPH08278259A (en) | Surface inspection device | |
| JP4232648B2 (en) | Reflected light measuring device | |
| JP2002323404A (en) | Surface inspection equipment | |
| KR930010651A (en) | Exposure light quantity monitoring method of the characteristic evaluation apparatus for electrophotographic photosensitive drums | |
| JPH03130639A (en) | Optical-axis aligning method for mtf measuring apparatus |