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JPH0439781B2 - - Google Patents
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JPH0439781B2 - - Google Patents

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Publication number
JPH0439781B2
JPH0439781B2 JP59092867A JP9286784A JPH0439781B2 JP H0439781 B2 JPH0439781 B2 JP H0439781B2 JP 59092867 A JP59092867 A JP 59092867A JP 9286784 A JP9286784 A JP 9286784A JP H0439781 B2 JPH0439781 B2 JP H0439781B2
Authority
JP
Japan
Prior art keywords
heat
heat generating
cooling module
heat conduction
module device
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP59092867A
Other languages
Japanese (ja)
Other versions
JPS60239048A (en
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP59092867A priority Critical patent/JPS60239048A/en
Publication of JPS60239048A publication Critical patent/JPS60239048A/en
Publication of JPH0439781B2 publication Critical patent/JPH0439781B2/ja
Granted legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10WGENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W40/00Arrangements for thermal protection or thermal control
    • H10W40/70Fillings or auxiliary members in containers or in encapsulations for thermal protection or control
    • H10W40/77Auxiliary members characterised by their shape
    • H10W40/774Pistons, e.g. spring-loaded members
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10WGENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W90/00Package configurations
    • H10W90/701Package configurations characterised by the relative positions of pads or connectors relative to package parts
    • H10W90/721Package configurations characterised by the relative positions of pads or connectors relative to package parts of bump connectors
    • H10W90/724Package configurations characterised by the relative positions of pads or connectors relative to package parts of bump connectors between a chip and a stacked insulating package substrate, interposer or RDL

Landscapes

  • Cooling Or The Like Of Semiconductors Or Solid State Devices (AREA)

Description

【発明の詳細な説明】 〔産業上の利用分野〕 本発明は半導体装置基体において発生される熱
を冷却装置に伝達するための構成及び技法に関す
る。更に具体的には、消費電力の小さい半導体基
体に関連する熱伝導路の熱抵抗を高め、上記半導
体基体がより高い温度に維持されるように特別に
形成された熱伝導中継部材を有する熱伝導冷却モ
ジユール装置に関する。
DETAILED DESCRIPTION OF THE INVENTION Field of the Invention The present invention relates to structures and techniques for transferring heat generated in a semiconductor device substrate to a cooling device. More specifically, a thermal conductor having a thermally conductive relay member specially formed to increase the thermal resistance of a thermally conductive path associated with a semiconductor body with low power consumption and to maintain said semiconductor body at a higher temperature. The present invention relates to a cooling module device.

〔発明の背景〕[Background of the invention]

大型電子計算機では計算速度の速いことが要求
されるため、限定された半導体基体中に半導体素
子を多数個集積し、もつて各素子間の電気的配線
長を可及的に短縮した半導体装置、即ちラージ・
スケール・インテグレイテツド・サーキツ(以下
LSIと言う)チツプが開発されている。又、その
LSIチツプを搭載し、同チツプと外部回路とを電
気的に中継接続する回路基板も、多層かつ高密度
化され、もつて中継接続配線長を実質的に短縮さ
れている。更に、LSIチツプは回路基板上に多数
個実装される傾向になつている。LSIチツプの動
作パラメータを所望の範囲内に保持するととも
に、過熱によるLSIチツプの破壊を防止するため
には、動作によつて発生した熱を効率的に外部へ
放散させる補助的手段を施す必要がある。
Since large-scale electronic computers require high calculation speed, semiconductor devices are developed in which a large number of semiconductor elements are integrated in a limited semiconductor substrate, and the electrical wiring length between each element is shortened as much as possible. That is, large
Scale Integrated Circuits (hereinafter referred to as
(LSI) chips have been developed. Also, that
The circuit board on which the LSI chip is mounted and which electrically interconnects the chip with external circuits is also multi-layered and highly dense, thereby substantially shortening the length of the interconnect wiring. Furthermore, there is a trend for large numbers of LSI chips to be mounted on a circuit board. In order to maintain the operating parameters of the LSI chip within the desired range and to prevent the LSI chip from being destroyed due to overheating, it is necessary to provide auxiliary means to efficiently dissipate the heat generated during operation to the outside. be.

補助的冷却手段を施した一例として次のような
ものが提案されている。即ち、アルミナ基板と金
属製のキヤツプ部材とで密閉容器が形成され、ア
ルミナ基板上に多数個の半導体チツプが搭載さ
れ、キヤツプ部材の容器外側に冷媒を使用した強
制冷却手段が取付けられ、半導体チツプとキヤツ
プ部材との間にはキヤツプ部材に取付けられたシ
リンダと半導体チツプに押圧されるピストンとか
らなる熱伝達手段が設けられ、かつ容器内には半
導体チツプの放熱を助けるために不活性ガスが充
填された構成の半導体冷却モジユール装置が提案
されている。
The following has been proposed as an example of an auxiliary cooling means. That is, an airtight container is formed by an alumina substrate and a metal cap member, a large number of semiconductor chips are mounted on the alumina substrate, a forced cooling means using a refrigerant is attached to the outside of the cap member, and the semiconductor chips are A heat transfer means consisting of a cylinder attached to the cap member and a piston pressed against the semiconductor chip is provided between the cap member and the cap member, and an inert gas is provided in the container to help dissipate heat from the semiconductor chip. A semiconductor cooling module device in a filled configuration has been proposed.

この冷却モジユール装置は、放熱効果が極めて
優れていて半導体チツプの如き熱発生装置を低温
で動作させるのに好適である。
This cooling module device has an extremely excellent heat dissipation effect and is suitable for operating heat generating devices such as semiconductor chips at low temperatures.

しかしながら、消費電力の少ない即ち発熱量の
少ない熱発生装置と消費電力の大きい即ち発熱量
の多い熱発生装置が同一容器内に収納される場合
又は消費電力の少ない熱発生装置のみからなるモ
ジユールと消費電力の大きい熱発生装置のみから
なるモジユールが並設される場合には、消費電力
の少ない熱発生装置に対する冷却効率が高過ぎる
ため、消費電力の少ない熱発生装置は実質的に冷
却され過ぎてしまう。これらの熱発生装置が予定
された動作をするためには、それらを最低動作温
度以上に保持する必要がある。又、冷却され過ぎ
ると熱発生装置が最低動作温度に達するまでに長
時間を要す。このような動作温度の問題は、消費
電力の大きい熱発生装置よりも、消費電力の少な
い熱発生装置において顕著である。また、並設し
た半導体チツプの動作温度が異なると、各チツプ
の特性が不均一となり、所望の特性のモジユール
装置が得られなくなるおそれがある。
However, if a heat generating device with low power consumption, i.e., a low calorific value, and a heat generating device with a high power consumption, i.e., a large calorific value, are housed in the same container, or if a module consisting only of a heat generating device with low power consumption When modules consisting only of heat generating devices with high power consumption are installed in parallel, the cooling efficiency for the heat generating devices with low power consumption is too high, so the heat generating devices with low power consumption are effectively cooled too much. . In order for these heat generating devices to operate as intended, they must be maintained above a minimum operating temperature. Also, if it is too cool, it will take a long time for the heat generating device to reach its minimum operating temperature. Such an operating temperature problem is more noticeable in a heat generating device that consumes less power than in a heat generating device that consumes a large amount of power. Furthermore, if the operating temperatures of semiconductor chips arranged in parallel are different, the characteristics of each chip will become non-uniform, and there is a possibility that a module device with desired characteristics cannot be obtained.

〔発明の目的〕[Purpose of the invention]

本発明の目的は、上述の問題点を解決した改良
された熱伝導冷却モジユール装置を提供すること
にある。
SUMMARY OF THE INVENTION It is an object of the present invention to provide an improved thermal conduction cooling module device that overcomes the above-mentioned problems.

本発明の目的を具体的に言えば、発熱量の異な
る熱発生装置が同一の冷却手段によつて冷却され
る場合に、熱発生装置の動作温度を略等しくした
熱伝導冷却モジユール装置を提供することにあ
る。
Specifically, the purpose of the present invention is to provide a heat conduction cooling module device that makes the operating temperatures of the heat generating devices substantially equal when the heat generating devices having different calorific values are cooled by the same cooling means. There is a particular thing.

〔発明の概要〕[Summary of the invention]

かかる目的を奏する本発明熱発生装置の特徴と
するところは、発熱量の少ない熱発生装置と冷却
手段との間に介在する熱伝達手段の熱抵抗を、発
熱量の多い熱発生装置と冷却手段との間に介在す
る熱伝達手段の熱抵抗より大きくした点にある。
熱抵抗を変える手段としては、熱伝達手段を構成
する各部材の材料を変えること、各部材の形状を
一部変えること、各部材の一部に熱抵抗の大きい
部材を付加すること等がある。ここで言う熱発生
装置には、半導体チツプ、半導体以外の回路素子
が含まれる。また、発熱量の少ない熱発生装置と
発熱量の多い熱発生装置とは、同一の密閉容器に
収納されていても、また異なる密閉容器に収納さ
れていてもよい。
A feature of the heat generating device of the present invention that achieves the above object is that the thermal resistance of the heat transfer means interposed between the heat generating device with a small amount of heat generation and the cooling means is reduced by the thermal resistance of the heat transfer means interposed between the heat generating device with a large amount of heat generation and the cooling means. The thermal resistance is greater than the thermal resistance of the heat transfer means interposed between the
Means for changing the thermal resistance include changing the material of each member that makes up the heat transfer means, partially changing the shape of each member, and adding a member with high thermal resistance to a part of each member. . The heat generating device referred to herein includes semiconductor chips and non-semiconductor circuit elements. Furthermore, the heat generating device that generates a small amount of heat and the heat generating device that generates a large amount of heat may be housed in the same sealed container or may be housed in different sealed containers.

本発明の他の特徴は、以下に述べる実施例の説
明から明らかとなろう。
Other features of the invention will become apparent from the following description of the embodiments.

〔発明の実施例〕[Embodiments of the invention]

第1図及び第2図は熱発生装置としてLSIチツ
プを用いた本発明熱伝導冷却モジユール装置の一
実施例を示す断面図である。
1 and 2 are cross-sectional views showing an embodiment of the heat conduction cooling module device of the present invention using an LSI chip as a heat generating device.

図において、チツプ10は、一般にセラミツク
の多層配線基板12の一方の面に微少はんだボー
ル11により装着されており、このうち10aは
消費電力が少なく発熱量の小さい熱発生装置とし
ての小電力チツプである。基板12はその他方面
から突出する接続ピン14を有している。これら
のピン14を補助回路等を担持した配線ボード1
3のホールに差込み、熱伝導冷却モジユール装置
が配線ボード13に支持される。基板12のチツ
プ10,10aを搭載した側の周辺部には金属又
はセラミツクからなるスペーサ15が、そしてス
ペーサ15の他方の側にはキヤツプ即ちハウジン
グ16が載置され、はんだ等の封着部材17,1
8により固着されている。これら部材12,1
5,16によつて密閉容器19が形成され、この
内部にヘリウムガスの如き熱伝導性気体31が充
填されている。ハウジング16の容器内方には、
チツプ10,10aの各々に対向してピストン状
の突出部16aが形成されている。チツプ10,
10a上に、突出部16aを案内するに開孔20
aを有するシリンダ状の熱伝導中継部材20が突
出部16aが開孔20aに係合した状態で配置さ
れている。熱伝導中継部材20の開孔20aの底
部にばね21が配置され、このばね21の押圧に
よりチツプ10と熱伝導中継部材20との接触を
維持している。熱伝導中継部材20の材質は、(1)
電気絶縁性を有し、(2)耐摩耗性が高く、(3)軽量で
ある点で、ベリリウム、酸化ベリリウム、窒化硼
素の少なくとも1種を添加した焼結炭化硅素が好
適である。熱伝導中継部材20の各々から伝達さ
れた熱は、ハウジング16に蓄えられるととも
に、ハウジング16に連らなつて設けられている
冷却板32の如きヒートシンクに伝達され、更に
冷却板32に蓄積された熱は冷却板32内を循環
する冷却液体42に伝達される。第1図で理解さ
れるように、ハウジング16の容器外表面と冷却
板32の表面は、両者間で良好な熱伝達がなされ
るように平坦に形成されている。冷却板32の空
間部32aには、冷却板32に伝達された熱を徐
去する冷却液体42が循環されていて、効率的な
冷却がなされる。効率的な冷却をなし得る冷却液
体として、水の如き液体が望ましい。したがつ
て、冷却されるべきチツプ10が、作動状態にお
いてあらかじめ設計された温度以上に過熱されな
い状態に維持される場合には、冷却板32による
冷却に代えて空冷によるヒートシンクを用いるこ
とも可能である。この際には、当然ながら騒音問
題を軽微にとどめるような配慮がなされなければ
ならない。
In the figure, a chip 10 is generally attached to one side of a ceramic multilayer wiring board 12 by minute solder balls 11, and 10a is a low-power chip serving as a heat generating device with low power consumption and low heat generation. be. The substrate 12 has connection pins 14 protruding from the other side. These pins 14 are connected to a wiring board 1 that carries auxiliary circuits, etc.
3, and the heat conduction cooling module device is supported by the wiring board 13. A spacer 15 made of metal or ceramic is placed around the side of the substrate 12 on which the chips 10, 10a are mounted, and a cap or housing 16 is placed on the other side of the spacer 15, and a sealing member 17 such as solder is placed. ,1
It is fixed by 8. These members 12,1
5 and 16 form a closed container 19, the inside of which is filled with a thermally conductive gas 31 such as helium gas. Inside the container of the housing 16,
A piston-shaped protrusion 16a is formed opposite each of the chips 10, 10a. Chip 10,
10a, there is an opening 20 for guiding the protrusion 16a.
A cylindrical heat conductive relay member 20 having a diameter of 1.a is disposed with the protrusion 16a engaged with the opening 20a. A spring 21 is disposed at the bottom of the opening 20a of the heat conduction relay member 20, and the pressure of the spring 21 maintains the contact between the chip 10 and the heat conduction relay member 20. The material of the heat conductive relay member 20 is (1)
Sintered silicon carbide to which at least one of beryllium, beryllium oxide, and boron nitride is added is suitable because it has electrical insulation properties, (2) high wear resistance, and (3) light weight. The heat transferred from each of the heat-conducting relay members 20 is stored in the housing 16, transferred to a heat sink such as a cooling plate 32 provided in series with the housing 16, and further accumulated in the cooling plate 32. Heat is transferred to cooling liquid 42 circulating within cold plate 32 . As can be seen in FIG. 1, the outer surface of the housing 16 and the surface of the cooling plate 32 are formed flat to allow good heat transfer between them. A cooling liquid 42 that gradually removes the heat transferred to the cooling plate 32 is circulated in the space 32a of the cooling plate 32, thereby achieving efficient cooling. A liquid such as water is desirable as a cooling liquid capable of efficient cooling. Therefore, if the chip 10 to be cooled is maintained in a state in which it is not overheated above a pre-designed temperature in the operating state, it is also possible to use an air-cooled heat sink instead of cooling with the cooling plate 32. be. In this case, consideration must naturally be given to keeping the noise problem to a minimum.

熱発生装置であるチツプ10,10aから発生
された熱は、チツプ10,10aと熱伝導中継部
材20との界面、熱伝導中継部材20、熱伝導中
継部材20の開孔部20a内壁面とハウジング1
6の突出部16aの表面との間隙、ハウジング1
6、ハウジング16と冷却板32間界面、冷却板
32を順次経由して、最終的にヒートシンクであ
る冷却液体42へと伝達される。第3図は小電力
チツプ10aに関連する熱伝導路に用いられた熱
伝導中継部材20の部分を拡大して示した概略断
面図である。小電力チツプ10a及びハウジング
16の突出部16aとの間で熱伝導手段を構成す
る突出部16a及び熱伝導中継部材20の少なく
とも一方の対向する表面部分に二酸化シリコン膜
20dが被覆され、これらの界面で熱抵抗が増す
ようにされている。二酸化シリコン膜20dは熱
伝導性焼結炭化硅素に比べ、2桁程度低い熱伝導
率を有している。したがつてこの二酸化シリコン
膜20dの熱抵抗によつて、小電力チツプ10a
から熱伝導中継部材20への熱伝達又は熱伝導中
継部材20からハウジング16への熱伝達がそれ
ぞれ抑制される。この結果として小電力チツプ1
0aにおける蓄熱がなされ、同チツプは予定され
た動作温度範囲に維持される。二酸化シリコン膜
20dは熱酸化法によつて形成されるのが最も適
切である。この場合二酸化シリコン膜は、炭化硅
素焼結体を調整された酸素源を有する雰囲気、例
えば水蒸気と酸素ガスを含む雰囲気中で、1000〜
1500℃に加熱することによつて形成される。しか
しながら、熱酸化法以外の方法、例えば
Chemical Vapor Deposition法で代表される如
き化学反応を利用した方法や、スパツタリング法
等によつても二酸化シリコン膜を形成でき、これ
らの方法によつて設けられた二酸化シリコン膜で
あつても、本発明の目的を達成するための熱抵抗
増加担体になり得る。又、二酸化シリコン膜20
dは、本発明の目的を達成する上でこれに限定さ
れるものではない。即ち、ゲルマニウム、アルミ
ニウム、チタニウム、マグネシウム、リチウム、
ジルコニウム、鉛、亜鉛の如き少なくとも1種の
金属の酸化物であつても熱抵抗増加担体になり得
る。この場合、スパツタリング法以外に、厚膜焼
成法、溶射法の如き他の方法で形成される。
The heat generated from the chips 10, 10a, which are heat generating devices, is transmitted to the interface between the chips 10, 10a and the heat conductive relay member 20, the heat conductive relay member 20, the inner wall surface of the opening 20a of the heat conductive relay member 20, and the housing. 1
6, the gap between the surface of the protrusion 16a of the housing 1
6. The heat is transmitted sequentially through the interface between the housing 16 and the cooling plate 32 and the cooling plate 32, and finally to the cooling liquid 42, which is a heat sink. FIG. 3 is a schematic cross-sectional view showing an enlarged portion of the heat conduction relay member 20 used as a heat conduction path related to the low power chip 10a. A silicon dioxide film 20d is coated on the opposing surface portions of at least one of the protrusion 16a and the heat conduction relay member 20, which constitute a heat conduction means between the low power chip 10a and the protrusion 16a of the housing 16, and the interface between these is coated with a silicon dioxide film 20d. The thermal resistance is increased. The silicon dioxide film 20d has a thermal conductivity that is about two orders of magnitude lower than that of thermally conductive sintered silicon carbide. Therefore, due to the thermal resistance of this silicon dioxide film 20d, the low power chip 10a
Heat transfer from the heat conductive relay member 20 to the heat conductive relay member 20 or from the heat conductive relay member 20 to the housing 16 is suppressed. As a result, the low power chip 1
Heat storage at 0a is provided to maintain the chip within its intended operating temperature range. The silicon dioxide film 20d is most suitably formed by a thermal oxidation method. In this case, the silicon dioxide film is formed by heating the silicon carbide sintered body in an atmosphere with a controlled oxygen source, for example, an atmosphere containing water vapor and oxygen gas.
Formed by heating to 1500°C. However, methods other than thermal oxidation, e.g.
A silicon dioxide film can also be formed by a method using a chemical reaction such as the chemical vapor deposition method, a sputtering method, etc., and even if the silicon dioxide film is provided by these methods, the present invention can be applied. It can be a carrier to increase thermal resistance to achieve the purpose of. In addition, silicon dioxide film 20
d is not limited to this in achieving the purpose of the present invention. Namely, germanium, aluminum, titanium, magnesium, lithium,
Oxides of at least one metal such as zirconium, lead, and zinc can also serve as thermal resistance increasing carriers. In this case, in addition to the sputtering method, other methods such as a thick film firing method and a thermal spraying method are used.

又、上記実施例の熱伝導冷却モジユール装置に
おいて、ハウジングと小電力チツプ10a間の熱
伝導手段の熱抵抗は、二酸化シリコン膜20dの
厚さによつても調節される。チツプ10aに向け
てばね21により押圧が与えられる熱伝導中継部
材20の末端部分20bの直径Dは約6.5mm、同
部材20の全長は6.0mmに調整されている。熱伝
導中継部材20の開孔部20aの側壁20cとハ
ウジング16の突出部16aにおける側壁16b
の間隙は、約0.025mmである。突出部16aの直
径はD/2に等しく、その長さは8.0mmである。
したがつて、側壁20cと側壁16b間の対向面
積と相関を有する対向長Lは2.5mmである。これ
らの一定パラメータを用いて、チツプ10aから
ハウジング16に至る全熱抵抗(℃/W)を二酸
化シリコン膜20dの厚さ(μm)に対してプロ
ツトすることにより、第4図に示す熱特性曲線が
得られる。同曲線に示される如く、厚さが増すに
つれ熱抵抗を増しており、二酸化シリコン膜20
dの厚さを調節によつて小電力チツプ10aの熱
伝導路に関する放熱能力を制御できることが理解
される。又、熱伝導路の放熱能力は二酸化シリコ
ン膜20dを熱伝導中継部材20の一部に設ける
ことによつても調節される。第5図は熱伝導中継
部材20のチツプ10aと熱伝導界面を形成する
部分に選択的に二酸化シリコン膜20dを設けた
熱伝導中継部材20の拡大断面図である。このよ
うな構造にすることにより、チツプ10aからハ
ウジング16に至る全熱抵抗を、熱伝導中継部材
20の全面に二酸化シリコン膜20dを設けた場
合に対して、約1/3に調節できる。更に、熱伝
導路の放熱能力は、二酸化シリコン膜20dの膜
質、例えば密度、空孔率の調節によつても変え得
る。
In the heat conduction cooling module device of the above embodiment, the thermal resistance of the heat conduction means between the housing and the low power chip 10a is also adjusted by the thickness of the silicon dioxide film 20d. The diameter D of the end portion 20b of the heat conductive relay member 20, which is pressed by the spring 21 toward the chip 10a, is adjusted to approximately 6.5 mm, and the overall length of the member 20 is adjusted to 6.0 mm. The side wall 20c of the opening 20a of the heat conduction relay member 20 and the side wall 16b of the protrusion 16a of the housing 16
The gap is approximately 0.025mm. The diameter of the protrusion 16a is equal to D/2, and the length is 8.0 mm.
Therefore, the opposing length L, which correlates with the opposing area between the side wall 20c and the side wall 16b, is 2.5 mm. Using these constant parameters, the thermal characteristic curve shown in FIG. 4 is obtained by plotting the total thermal resistance (°C/W) from the chip 10a to the housing 16 against the thickness (μm) of the silicon dioxide film 20d. is obtained. As shown in the curve, the thermal resistance increases as the thickness increases, and the silicon dioxide film 20
It is understood that by adjusting the thickness of d, the heat dissipation capability of the heat conduction path of the low power chip 10a can be controlled. Further, the heat dissipation capacity of the heat conduction path can also be adjusted by providing a silicon dioxide film 20d on a part of the heat conduction relay member 20. FIG. 5 is an enlarged sectional view of the heat conductive relay member 20 in which a silicon dioxide film 20d is selectively provided at a portion forming a heat conductive interface with the chip 10a of the heat conductive relay member 20. With this structure, the total thermal resistance from the chip 10a to the housing 16 can be adjusted to about 1/3 of that in the case where the silicon dioxide film 20d is provided on the entire surface of the heat conductive relay member 20. Furthermore, the heat dissipation ability of the heat conduction path can also be changed by adjusting the film quality of the silicon dioxide film 20d, such as density and porosity.

又、本実施例の熱伝導冷却モジユール装置に
は、熱発生装置としてのチツプ10,10aが可
及的高密度に実装されている。それぞれの熱発生
装置10,10aは、限定された半導体基体中に
多数個集積した半導体素子を有している。各々の
半導体素子が電気回路を形成するためには、必要
に応じて個々の素子を電気絶縁しなければならな
い。したがつて、一般に半導体素子は、pn接合
を逆バイアスすることによつて電気的に分離され
た、通常島と呼ばれる半導体領域に形成される。
この場合、pn接合を逆バイアスするための電圧
が半導体基体、即ち熱伝導性部材と接触界面を形
成する熱発生装置10,10aに与えられる。基
板12上に実装される熱発生装置10,10aの
全てが同一機能を有する半導体基体からなる場合
は稀で、一般には機能の異なる2種ないしそれ以
上の熱発生装置10,10aが同一冷却モジユー
ル装置内に実装されると考えねばならない。この
ような場合は逆バイアス電圧を2ないしそれ以上
の水準に維持する必要がある。ところで、異なる
逆バイアス電圧の与えられた熱発生装置10,1
0aどうしは、導電性の熱伝導中継部材、弾性部
材としてのばね1、キヤツプとしてのハウジング
16を用いた場合はこれらを介して電気的に連絡
することとなり、予定された逆バイアス条件を維
持できず、冷却モジユール装置全体の回路機能が
損なわれる。又、冷却モジユール装置内に実装さ
れた全ての熱発生装置の逆バイアス条件が全く同
一である場合は上述の問題は解消される。しかし
ながら、キヤツプに連なつて接触界面を形成する
ヒートシンクないし冷媒中の不純物や汚染物質を
通じて冷却モジユール装置相互が電気的に連絡さ
れたり、更に筐体中に高密度実装されたプリント
基板との、冷却モジユール装置どうしの振動接触
による電気連絡網を形成する危険を伴なう。した
がつて、基板上に実装された熱発生装置どうし
は、あらかじめ予定された導電路以外で電気的連
絡されることは好しくなく、この意味で具体的に
はキヤツプないし熱伝導中継部材に電気絶縁機能
を付与しておくことが望ましい。本実施例におい
て、熱伝導中継部材20としての焼結炭化硅素に
は添加剤によつて電気絶縁性が付与されている
が、各種金属の酸化物は焼結炭化硅素に更に確実
な電気絶縁性を付与し、又焼結炭化硅素が添加剤
による絶縁性を付与されていない場合でも各種金
属の酸化物は炭化硅素焼結体に新たなる絶縁性を
付与せしめるのに効果がある。
Further, in the heat conduction cooling module device of this embodiment, the chips 10 and 10a as heat generating devices are mounted as densely as possible. Each heat generating device 10, 10a has a large number of semiconductor elements integrated in a limited semiconductor substrate. In order for each semiconductor element to form an electric circuit, the individual elements must be electrically insulated as necessary. Therefore, semiconductor devices are generally formed in semiconductor regions, commonly called islands, that are electrically isolated by reverse biasing pn junctions.
In this case, a voltage for reverse biasing the pn junction is applied to the heat generating device 10, 10a which forms a contact interface with the semiconductor substrate, ie the thermally conductive member. It is rare that all of the heat generating devices 10, 10a mounted on the substrate 12 are made of semiconductor substrates having the same function, and generally two or more types of heat generating devices 10, 10a with different functions are integrated into the same cooling module. It must be considered that it is implemented within the device. In such cases, it is necessary to maintain the reverse bias voltage at a level of 2 or more. By the way, heat generating devices 10, 1 given different reverse bias voltages
When a conductive heat conduction relay member, a spring 1 as an elastic member, and a housing 16 as a cap are used, the terminals 0a are electrically connected to each other through these, and the planned reverse bias condition cannot be maintained. First, the circuit function of the entire cooling module device is impaired. Further, if the reverse bias conditions of all the heat generating devices mounted in the cooling module device are exactly the same, the above-mentioned problem is solved. However, the cooling module devices are electrically connected to each other through impurities and contaminants in the heat sink or refrigerant that form a contact interface connected to the cap, and furthermore, the cooling There is a risk of forming an electrical network due to vibrating contact between modular devices. Therefore, it is undesirable for heat generating devices mounted on a board to be electrically connected to each other other than through a pre-planned conductive path. It is desirable to provide an insulation function. In this embodiment, the sintered silicon carbide used as the heat-conducting relay member 20 is given electrical insulation properties by additives, but oxides of various metals provide even more reliable electrical insulation properties to the sintered silicon carbide. Furthermore, even when the sintered silicon carbide is not provided with insulation properties by additives, oxides of various metals are effective in imparting new insulation properties to the silicon carbide sintered body.

尚、本実施例において、熱伝導中継部材20に
は、同部材20自身の荷重を軽減し、もつて熱伝
導冷却モジユール装置に過大な慣性力が与えられ
た場合にチツプ10,10aあるいは微少はんだ
ボール11に及ぼす悪影響、例えばチツピング、
割れ、つぶれ等を可及的に避けるため、ハウジン
グ16との熱的係合部に開孔部20aを設けて荷
重を軽減した構造を有している。しかしながら、
焼結炭化硅素はそれ自体密度が3.2g/cm3と小さ
く、小荷重の熱伝導中継部材になり得る。したが
つて、上述の悪影響が及ぼされない限りにおい
て、ハウジングに開孔部を設け、その開孔部に略
柱状の熱伝導中継部材を配置した構造の場合で
も、熱伝導界面部に熱抵抗を増す皮膜を設けた柱
状部材は小電力チツプ用の熱伝導中継部材として
使用し得る。
In this embodiment, the heat conduction relay member 20 is provided with chips 10, 10a or a small amount of solder in order to reduce the load on the member 20 itself, and to prevent the heat conduction cooling module from being exposed to chips 10, 10a or a small amount of solder when excessive inertia is applied to the heat conduction cooling module device. Adverse effects on the ball 11, such as chipping,
In order to avoid cracking, crushing, etc. as much as possible, an opening 20a is provided in the thermally engaged portion with the housing 16 to reduce the load. however,
Sintered silicon carbide itself has a low density of 3.2 g/cm 3 and can be used as a heat conductive relay member with a small load. Therefore, as long as the above-mentioned adverse effects are not exerted, even in the case of a structure in which an opening is provided in the housing and a substantially columnar heat-conducting relay member is placed in the opening, thermal resistance is increased at the heat-conducting interface. The coated columnar member can be used as a heat conductive relay member for low power chips.

又、本発明熱伝導冷却モジユール装置では、ハ
ウジング16が、封入モジユール装置の外方で冷
却媒体に直接触れるヒートシンクを兼ねることは
何等障害になるものではない。即ち、ハウジング
16が直接冷却媒体としての水や空気によつて冷
却されることも可能である。
Further, in the heat conduction cooling module device of the present invention, there is no problem in that the housing 16 also serves as a heat sink that directly contacts the cooling medium outside the enclosed module device. That is, it is also possible for the housing 16 to be directly cooled by water or air as a cooling medium.

尚、本発明熱伝導冷却モジユール装置では、ス
ペーサ15の材質は熱伝導性の観点よりも、むし
ろ基板12及びハウジング16と熱膨張係数が一
致又は近似している点を優先して選択されるべき
である。例えば基板12の材質がアルミナセラミ
ツク、ムライトセラミツクの場合には、スペーサ
15はアルミナセラミツク、ムライトセラミツ
ク、炭化硅素焼結体、コバール、58Fe−42Ni、
タングステンカーバイド等のような材質を選ぶこ
とができる。熱膨張係数の観点を優先する理由
は、基板12又はハウジング16との間の熱膨張
係数差に起因して、熱的サイクルが与えられたと
き生ずる封着部材の疲労破壊を避ける必要からで
ある。又、ハウジング16の材質は、同様の疲労
破壊を避ける必要から、スペーサ15との熱膨張
係数が近似している観点や、熱伝導性が優れる観
点から選択されるのが最も望ましい。この理由か
ら、ハウジング16として上述の添加剤を含む炭
化硅素焼結体が選ばれるのが好ましい。しかし、
ヒートシンクによる冷却が効率的であつて、スペ
ーサ15との封着部分の温度変化が少ない場合、
即ち、封着部材18の疲労破壊が防止される限り
においては、ハウジング16用材質として熱伝導
性のよい銅、アルミニウムの如き金属を用い得
る。
In the heat conduction cooling module device of the present invention, the material of the spacer 15 should be selected with priority given to the fact that the coefficient of thermal expansion matches or is similar to that of the substrate 12 and the housing 16, rather than from the viewpoint of thermal conductivity. It is. For example, when the material of the substrate 12 is alumina ceramic or mullite ceramic, the spacer 15 is made of alumina ceramic, mullite ceramic, silicon carbide sintered body, Kovar, 58Fe-42Ni,
Materials such as tungsten carbide can be selected. The reason for prioritizing the thermal expansion coefficient is that it is necessary to avoid fatigue failure of the sealing member that occurs when thermal cycles are applied due to the difference in thermal expansion coefficient between the substrate 12 or the housing 16. . Furthermore, in order to avoid similar fatigue failure, the material of the housing 16 is most preferably selected from the viewpoint of having a similar coefficient of thermal expansion to that of the spacer 15 and from the viewpoint of having excellent thermal conductivity. For this reason, a silicon carbide sintered body containing the above-mentioned additives is preferably selected as the housing 16. but,
When the cooling by the heat sink is efficient and there is little temperature change at the part sealed with the spacer 15,
That is, as long as fatigue failure of the sealing member 18 is prevented, metals such as copper and aluminum having good thermal conductivity may be used as the material for the housing 16.

第6図は本発明の他の実施例を開示する熱伝導
冷却モジユール装置の、熱伝導路を拡大して示す
概略断面図である。小電力チツプ10aは他のチ
ツプ10とともに基板12上に搭載され、これら
のチツプ10,10aに対向するハウジング16
の内壁に開孔部16gが設けられ、略柱状の熱伝
導中継部材20が開孔部16gに配置され、ばね
21によつてチツプ10,10aに熱伝導中継部
材20を圧接する力が付与されている。この際、
小電力チツプ10aの熱伝導路内にある熱伝導中
継部材20の表面には二酸化シリコン膜20dが
設けられ、熱伝導路内の熱抵抗が調整されるよう
に設計されている。この結果、小電力チツプ10
aは予定された動作温度範囲に維持される。尚、
本実施例の場合は、熱伝導中継部材20はハウジ
ング16の開孔部16gに案内される構造をとる
ため、第2図構造の如き場合に比べハウジング1
6の重量増加を伴なう。この場合であつても、接
続ピン14に関連する接続部の問題を避け得る範
囲で実施できることは勿論である。
FIG. 6 is a schematic sectional view showing an enlarged heat conduction path of a heat conduction cooling module device disclosing another embodiment of the present invention. The low power chip 10a is mounted on a board 12 together with other chips 10, and a housing 16 facing these chips 10, 10a is mounted.
An aperture 16g is provided in the inner wall of the chip, a substantially columnar heat conduction relay member 20 is placed in the aperture 16g, and a force is applied by a spring 21 to press the heat conduction relay member 20 against the chips 10, 10a. ing. On this occasion,
A silicon dioxide film 20d is provided on the surface of the heat conduction relay member 20 in the heat conduction path of the low power chip 10a, and is designed to adjust the thermal resistance in the heat conduction path. As a result, the low power chip 10
a is maintained within the intended operating temperature range. still,
In the case of this embodiment, since the heat conductive relay member 20 has a structure in which it is guided through the opening 16g of the housing 16, the housing 16 is
6 with an increase in weight. Even in this case, it goes without saying that the present invention can be implemented as long as the problem of the connection part related to the connection pin 14 can be avoided.

以上は本発明の代表的な実施例について説明し
たが、本発明はこれらに限定されることなく種々
の変形が可能である。例えば、第3図及び第6図
において、二酸化シリコン膜の代りに熱伝導中継
部材とハウジングの対向面に所定数の凹部を設け
ること、第3図及び第6図において大消費電力チ
ツプに対向接触する熱伝導中継部材を金属材料と
しその表面を二酸化シリコン膜で被覆したもの等
も本発明を実現する上で有効な方法である。
Although typical embodiments of the present invention have been described above, the present invention is not limited to these and can be modified in various ways. For example, in FIGS. 3 and 6, instead of the silicon dioxide film, a predetermined number of recesses may be provided on the opposing surfaces of the heat conductive relay member and the housing, and in FIGS. It is also an effective method for realizing the present invention that the heat conductive relay member is made of a metal material and its surface is coated with a silicon dioxide film.

〔発明の効果〕〔Effect of the invention〕

本発明によれば、熱発生装置の発熱量に関係な
く動作温度を略均一にすることができる効果があ
る。このため、発熱量の異なる熱発生装置を熱伝
達手段を変えることで多数個同一冷却手段で冷却
することができ、装置の構成が簡略化できる。
According to the present invention, there is an effect that the operating temperature can be made substantially uniform regardless of the amount of heat generated by the heat generating device. Therefore, by changing the heat transfer means, a large number of heat generating devices with different calorific values can be cooled by the same cooling means, and the configuration of the device can be simplified.

【図面の簡単な説明】[Brief explanation of drawings]

第1図は本発明熱伝導冷却モジユール装置の一
実施例を示す斜視図、第2図は第1図のA−
A′線に沿う概略断面図、第3図は第2図の一部
拡大図、第4図は二酸化シリコン膜の厚さと熱抵
抗との関係図、第5図は熱伝導中継部材の他の実
施例を示す断面図、第6図は更に他の実施例を示
す断面図である。 10……LSIチツプ(大消費電力用)、10a
……LSIチツプ(小消費電力用)、12……基板、
16……ハウジング、16a……突出部、20…
…熱伝導中継部材、20d……二酸化シリコン
膜。
FIG. 1 is a perspective view showing an embodiment of the heat conduction cooling module device of the present invention, and FIG.
A schematic cross-sectional view along line A', Figure 3 is a partially enlarged view of Figure 2, Figure 4 is a relationship between the thickness of silicon dioxide film and thermal resistance, and Figure 5 is a diagram of other thermally conductive relay members. A sectional view showing an embodiment, and FIG. 6 is a sectional view showing still another embodiment. 10...LSI chip (for high power consumption), 10a
... LSI chip (for low power consumption), 12 ... board,
16...Housing, 16a...Protrusion, 20...
...Heat conductive relay member, 20d...Silicon dioxide film.

Claims (1)

【特許請求の範囲】 1 発熱量の異なる熱発生装置と、熱発生装置を
収納する密閉容器と、密閉容器外に配置され熱発
生装置を冷却する冷却手段と、熱発生装置と冷却
手段との間を熱的に接続する熱伝達手段とを具備
し、発熱量の小さい熱発生装置と冷却手段との間
に配置される熱伝達手段の熱抵抗が、発熱量の大
きい熱発生装置と冷却手段との間に配置される熱
伝達手段のそれより大きいことを特徴とする熱伝
導冷却モジユール装置。 2 特許請求の範囲第1項において、熱伝達手段
が、熱発生装置と容器との間に設けたシリンダ部
とそれに案内されるピストン部とを備えているこ
とを特徴とする熱伝導冷却モジユール装置。 3 特許請求の範囲第2項において、熱抵抗の大
きい側の熱伝達手段は、シリンダ部及びピストン
部の熱伝達通路となる個所に絶縁膜を有すること
を特徴とする熱伝導冷却モジユール装置。 4 特許請求の範囲第2項或いは第3項におい
て、シリンダ部及びピストン部が炭化硅素を主成
分とし、それにベリリウム、酸化ベリリウム、窒
化硼素の少なくとも1種を添加した焼結体で形成
されていることを特徴とする熱伝導冷却モジユー
ル装置。 5 特許請求の範囲第4項或いは第5項におい
て、絶縁膜が、シリコン、ゲルマニウム、アルミ
ニウム、チタニウム、マグネシウム、リチウム、
ジルコニウム、鉛、亜鉛の少なくとも1種の酸化
物であることを特徴とする熱伝導冷却モジユール
装置。 6 特許請求の範囲第1項、第2項、第3項、第
4項或いは第5項において、熱発生装置が半導体
チツプであることを特徴とする熱伝導冷却モジユ
ール装置。
[Scope of Claims] 1 Heat generating devices with different calorific values, an airtight container housing the heat generating devices, a cooling means disposed outside the airtight container to cool the heat generating devices, and a combination of the heat generating devices and the cooling means. and a heat transfer means that thermally connects the heat generating device with a large calorific value and the cooling means, the thermal resistance of the heat transfer means disposed between the heat generating device with a small calorific value and the cooling means is A thermal conductive cooling module device, characterized in that the device is larger than that of the heat transfer means disposed between the device. 2. The heat conduction cooling module device according to claim 1, wherein the heat transfer means includes a cylinder section provided between the heat generating device and the container, and a piston section guided by the cylinder section. . 3. The heat conduction cooling module device according to claim 2, wherein the heat transfer means on the side with larger thermal resistance has an insulating film at the portions of the cylinder portion and the piston portion that serve as heat transfer passages. 4. In claim 2 or 3, the cylinder part and the piston part are formed of a sintered body containing silicon carbide as a main component and adding at least one of beryllium, beryllium oxide, and boron nitride thereto. A heat conduction cooling module device characterized by: 5 In claim 4 or 5, the insulating film is made of silicon, germanium, aluminum, titanium, magnesium, lithium,
1. A heat conduction cooling module device characterized in that it is an oxide of at least one of zirconium, lead, and zinc. 6. A heat conduction cooling module device according to claim 1, 2, 3, 4, or 5, wherein the heat generating device is a semiconductor chip.
JP59092867A 1984-05-11 1984-05-11 Heat conductive cooling module device Granted JPS60239048A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP59092867A JPS60239048A (en) 1984-05-11 1984-05-11 Heat conductive cooling module device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP59092867A JPS60239048A (en) 1984-05-11 1984-05-11 Heat conductive cooling module device

Publications (2)

Publication Number Publication Date
JPS60239048A JPS60239048A (en) 1985-11-27
JPH0439781B2 true JPH0439781B2 (en) 1992-06-30

Family

ID=14066378

Family Applications (1)

Application Number Title Priority Date Filing Date
JP59092867A Granted JPS60239048A (en) 1984-05-11 1984-05-11 Heat conductive cooling module device

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KR20020046755A (en) * 2000-12-15 2002-06-21 밍 루 Apparatus for distributing heat generated from an electronic part accommodated in a protection case

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JPS60239048A (en) 1985-11-27

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