JPH0441685B2 - - Google Patents
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- Publication number
- JPH0441685B2 JPH0441685B2 JP5147686A JP5147686A JPH0441685B2 JP H0441685 B2 JPH0441685 B2 JP H0441685B2 JP 5147686 A JP5147686 A JP 5147686A JP 5147686 A JP5147686 A JP 5147686A JP H0441685 B2 JPH0441685 B2 JP H0441685B2
- Authority
- JP
- Japan
- Prior art keywords
- group
- molecular weight
- groups
- formula
- structural formula
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 229920000642 polymer Polymers 0.000 claims description 16
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 claims description 6
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 claims description 4
- 125000000217 alkyl group Chemical group 0.000 claims description 4
- 125000003710 aryl alkyl group Chemical group 0.000 claims description 4
- 125000003118 aryl group Chemical group 0.000 claims description 4
- 239000001257 hydrogen Substances 0.000 claims description 4
- 229910052739 hydrogen Inorganic materials 0.000 claims description 4
- 239000000178 monomer Substances 0.000 claims description 4
- 150000001875 compounds Chemical class 0.000 claims description 3
- 238000004519 manufacturing process Methods 0.000 claims description 3
- 230000000379 polymerizing effect Effects 0.000 claims description 3
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 claims description 2
- 229910052799 carbon Inorganic materials 0.000 claims description 2
- 125000004432 carbon atom Chemical group C* 0.000 claims description 2
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 claims description 2
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 claims description 2
- 238000000862 absorption spectrum Methods 0.000 description 8
- 238000000921 elemental analysis Methods 0.000 description 8
- -1 chlorosilane compound Chemical class 0.000 description 7
- VLKZOEOYAKHREP-UHFFFAOYSA-N n-Hexane Chemical compound CCCCCC VLKZOEOYAKHREP-UHFFFAOYSA-N 0.000 description 7
- WYURNTSHIVDZCO-UHFFFAOYSA-N Tetrahydrofuran Chemical compound C1CCOC1 WYURNTSHIVDZCO-UHFFFAOYSA-N 0.000 description 6
- 239000007788 liquid Substances 0.000 description 5
- 239000000047 product Substances 0.000 description 5
- OZAIFHULBGXAKX-UHFFFAOYSA-N 2-(2-cyanopropan-2-yldiazenyl)-2-methylpropanenitrile Chemical compound N#CC(C)(C)N=NC(C)(C)C#N OZAIFHULBGXAKX-UHFFFAOYSA-N 0.000 description 4
- LXLJJQUMSRUTQD-UHFFFAOYSA-N [(4-ethenylphenyl)-trimethylsilylmethyl]-trimethylsilane Chemical compound C[Si](C)(C)C([Si](C)(C)C)C1=CC=C(C=C)C=C1 LXLJJQUMSRUTQD-UHFFFAOYSA-N 0.000 description 4
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 4
- 238000006243 chemical reaction Methods 0.000 description 4
- 239000001301 oxygen Substances 0.000 description 4
- 229910052760 oxygen Inorganic materials 0.000 description 4
- 125000003808 silyl group Chemical group [H][Si]([H])([H])[*] 0.000 description 4
- 150000003440 styrenes Chemical class 0.000 description 4
- ZWEHNKRNPOVVGH-UHFFFAOYSA-N 2-Butanone Chemical compound CCC(C)=O ZWEHNKRNPOVVGH-UHFFFAOYSA-N 0.000 description 3
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 3
- UHOVQNZJYSORNB-UHFFFAOYSA-N Benzene Chemical compound C1=CC=CC=C1 UHOVQNZJYSORNB-UHFFFAOYSA-N 0.000 description 3
- YMWUJEATGCHHMB-UHFFFAOYSA-N Dichloromethane Chemical compound ClCCl YMWUJEATGCHHMB-UHFFFAOYSA-N 0.000 description 3
- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 3
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 3
- XEKOWRVHYACXOJ-UHFFFAOYSA-N Ethyl acetate Chemical compound CCOC(C)=O XEKOWRVHYACXOJ-UHFFFAOYSA-N 0.000 description 3
- KFZMGEQAYNKOFK-UHFFFAOYSA-N Isopropanol Chemical compound CC(C)O KFZMGEQAYNKOFK-UHFFFAOYSA-N 0.000 description 3
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 3
- ZMXDDKWLCZADIW-UHFFFAOYSA-N N,N-Dimethylformamide Chemical compound CN(C)C=O ZMXDDKWLCZADIW-UHFFFAOYSA-N 0.000 description 3
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical group [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 3
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 3
- 230000000694 effects Effects 0.000 description 3
- YLQBMQCUIZJEEH-UHFFFAOYSA-N tetrahydrofuran Natural products C=1C=COC=1 YLQBMQCUIZJEEH-UHFFFAOYSA-N 0.000 description 3
- RNFJDJUURJAICM-UHFFFAOYSA-N 2,2,4,4,6,6-hexaphenoxy-1,3,5-triaza-2$l^{5},4$l^{5},6$l^{5}-triphosphacyclohexa-1,3,5-triene Chemical compound N=1P(OC=2C=CC=CC=2)(OC=2C=CC=CC=2)=NP(OC=2C=CC=CC=2)(OC=2C=CC=CC=2)=NP=1(OC=1C=CC=CC=1)OC1=CC=CC=C1 RNFJDJUURJAICM-UHFFFAOYSA-N 0.000 description 2
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 2
- HEDRZPFGACZZDS-UHFFFAOYSA-N Chloroform Chemical compound ClC(Cl)Cl HEDRZPFGACZZDS-UHFFFAOYSA-N 0.000 description 2
- IAZDPXIOMUYVGZ-UHFFFAOYSA-N Dimethylsulphoxide Chemical compound CS(C)=O IAZDPXIOMUYVGZ-UHFFFAOYSA-N 0.000 description 2
- CTQNGGLPUBDAKN-UHFFFAOYSA-N O-Xylene Chemical compound CC1=CC=CC=C1C CTQNGGLPUBDAKN-UHFFFAOYSA-N 0.000 description 2
- 239000003708 ampul Substances 0.000 description 2
- MVPPADPHJFYWMZ-UHFFFAOYSA-N chlorobenzene Chemical compound ClC1=CC=CC=C1 MVPPADPHJFYWMZ-UHFFFAOYSA-N 0.000 description 2
- 239000003063 flame retardant Substances 0.000 description 2
- 229920001002 functional polymer Polymers 0.000 description 2
- 239000011521 glass Substances 0.000 description 2
- FDPIMTJIUBPUKL-UHFFFAOYSA-N pentan-3-one Chemical compound CCC(=O)CC FDPIMTJIUBPUKL-UHFFFAOYSA-N 0.000 description 2
- 150000002978 peroxides Chemical class 0.000 description 2
- 229920006254 polymer film Polymers 0.000 description 2
- 239000003505 polymerization initiator Substances 0.000 description 2
- 238000006116 polymerization reaction Methods 0.000 description 2
- 150000003377 silicon compounds Chemical class 0.000 description 2
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 2
- 239000008096 xylene Substances 0.000 description 2
- SCYULBFZEHDVBN-UHFFFAOYSA-N 1,1-Dichloroethane Chemical compound CC(Cl)Cl SCYULBFZEHDVBN-UHFFFAOYSA-N 0.000 description 1
- RYHBNJHYFVUHQT-UHFFFAOYSA-N 1,4-Dioxane Chemical compound C1COCCO1 RYHBNJHYFVUHQT-UHFFFAOYSA-N 0.000 description 1
- DURPTKYDGMDSBL-UHFFFAOYSA-N 1-butoxybutane Chemical compound CCCCOCCCC DURPTKYDGMDSBL-UHFFFAOYSA-N 0.000 description 1
- XMNIXWIUMCBBBL-UHFFFAOYSA-N 2-(2-phenylpropan-2-ylperoxy)propan-2-ylbenzene Chemical compound C=1C=CC=CC=1C(C)(C)OOC(C)(C)C1=CC=CC=C1 XMNIXWIUMCBBBL-UHFFFAOYSA-N 0.000 description 1
- WFUGQJXVXHBTEM-UHFFFAOYSA-N 2-hydroperoxy-2-(2-hydroperoxybutan-2-ylperoxy)butane Chemical compound CCC(C)(OO)OOC(C)(CC)OO WFUGQJXVXHBTEM-UHFFFAOYSA-N 0.000 description 1
- FRIBMENBGGCKPD-UHFFFAOYSA-N 3-(2,3-dimethoxyphenyl)prop-2-enal Chemical compound COC1=CC=CC(C=CC=O)=C1OC FRIBMENBGGCKPD-UHFFFAOYSA-N 0.000 description 1
- 239000004342 Benzoyl peroxide Substances 0.000 description 1
- OMPJBNCRMGITSC-UHFFFAOYSA-N Benzoylperoxide Chemical compound C=1C=CC=CC=1C(=O)OOC(=O)C1=CC=CC=C1 OMPJBNCRMGITSC-UHFFFAOYSA-N 0.000 description 1
- DKPFZGUDAPQIHT-UHFFFAOYSA-N Butyl acetate Natural products CCCCOC(C)=O DKPFZGUDAPQIHT-UHFFFAOYSA-N 0.000 description 1
- 239000005046 Chlorosilane Substances 0.000 description 1
- YIVJZNGAASQVEM-UHFFFAOYSA-N Lauroyl peroxide Chemical compound CCCCCCCCCCCC(=O)OOC(=O)CCCCCCCCCCC YIVJZNGAASQVEM-UHFFFAOYSA-N 0.000 description 1
- XOBKSJJDNFUZPF-UHFFFAOYSA-N Methoxyethane Chemical compound CCOC XOBKSJJDNFUZPF-UHFFFAOYSA-N 0.000 description 1
- FXHOOIRPVKKKFG-UHFFFAOYSA-N N,N-Dimethylacetamide Chemical compound CN(C)C(C)=O FXHOOIRPVKKKFG-UHFFFAOYSA-N 0.000 description 1
- IMNFDUFMRHMDMM-UHFFFAOYSA-N N-Heptane Chemical compound CCCCCCC IMNFDUFMRHMDMM-UHFFFAOYSA-N 0.000 description 1
- RSPISYXLHRIGJD-UHFFFAOYSA-N OOOO Chemical class OOOO RSPISYXLHRIGJD-UHFFFAOYSA-N 0.000 description 1
- OFBQJSOFQDEBGM-UHFFFAOYSA-N Pentane Chemical compound CCCCC OFBQJSOFQDEBGM-UHFFFAOYSA-N 0.000 description 1
- 239000004793 Polystyrene Substances 0.000 description 1
- XBDQKXXYIPTUBI-UHFFFAOYSA-M Propionate Chemical compound CCC([O-])=O XBDQKXXYIPTUBI-UHFFFAOYSA-M 0.000 description 1
- QZQAYMWKEUNFEH-UHFFFAOYSA-N [(4-ethenylphenyl)-triethylsilylmethyl]-triethylsilane Chemical compound CC[Si](CC)(CC)C([Si](CC)(CC)CC)C1=CC=C(C=C)C=C1 QZQAYMWKEUNFEH-UHFFFAOYSA-N 0.000 description 1
- 238000010521 absorption reaction Methods 0.000 description 1
- 150000001298 alcohols Chemical class 0.000 description 1
- 150000001338 aliphatic hydrocarbons Chemical class 0.000 description 1
- 150000001408 amides Chemical class 0.000 description 1
- 150000004945 aromatic hydrocarbons Chemical class 0.000 description 1
- 235000019400 benzoyl peroxide Nutrition 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 238000011088 calibration curve Methods 0.000 description 1
- 239000002131 composite material Substances 0.000 description 1
- 238000001816 cooling Methods 0.000 description 1
- 238000004090 dissolution Methods 0.000 description 1
- 238000001035 drying Methods 0.000 description 1
- 238000010894 electron beam technology Methods 0.000 description 1
- 150000002148 esters Chemical class 0.000 description 1
- 150000002170 ethers Chemical class 0.000 description 1
- WBJINCZRORDGAQ-UHFFFAOYSA-N formic acid ethyl ester Natural products CCOC=O WBJINCZRORDGAQ-UHFFFAOYSA-N 0.000 description 1
- 238000004817 gas chromatography Methods 0.000 description 1
- 238000005227 gel permeation chromatography Methods 0.000 description 1
- 239000003365 glass fiber Substances 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- FUZZWVXGSFPDMH-UHFFFAOYSA-N hexanoic acid Chemical compound CCCCCC(O)=O FUZZWVXGSFPDMH-UHFFFAOYSA-N 0.000 description 1
- 150000002576 ketones Chemical class 0.000 description 1
- 238000006138 lithiation reaction Methods 0.000 description 1
- 150000002642 lithium compounds Chemical class 0.000 description 1
- 238000000034 method Methods 0.000 description 1
- 238000002156 mixing Methods 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- 239000003607 modifier Substances 0.000 description 1
- QYZFTMMPKCOTAN-UHFFFAOYSA-N n-[2-(2-hydroxyethylamino)ethyl]-2-[[1-[2-(2-hydroxyethylamino)ethylamino]-2-methyl-1-oxopropan-2-yl]diazenyl]-2-methylpropanamide Chemical compound OCCNCCNC(=O)C(C)(C)N=NC(C)(C)C(=O)NCCNCCO QYZFTMMPKCOTAN-UHFFFAOYSA-N 0.000 description 1
- 229910052757 nitrogen Inorganic materials 0.000 description 1
- TVMXDCGIABBOFY-UHFFFAOYSA-N octane Chemical compound CCCCCCCC TVMXDCGIABBOFY-UHFFFAOYSA-N 0.000 description 1
- 230000035699 permeability Effects 0.000 description 1
- FWGNVBNJIIHYAR-UHFFFAOYSA-N phenyl(3-phenylbut-2-en-2-yl)silane Chemical compound CC(=C([SiH2]C1=CC=CC=C1)C)C1=CC=CC=C1 FWGNVBNJIIHYAR-UHFFFAOYSA-N 0.000 description 1
- 229920002120 photoresistant polymer Polymers 0.000 description 1
- 229920002223 polystyrene Polymers 0.000 description 1
- 239000002244 precipitate Substances 0.000 description 1
- HJWLCRVIBGQPNF-UHFFFAOYSA-N prop-2-enylbenzene Chemical compound C=CCC1=CC=CC=C1 HJWLCRVIBGQPNF-UHFFFAOYSA-N 0.000 description 1
- 230000009257 reactivity Effects 0.000 description 1
- 229920002545 silicone oil Polymers 0.000 description 1
- 239000002904 solvent Substances 0.000 description 1
- 238000003786 synthesis reaction Methods 0.000 description 1
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 description 1
Landscapes
- Separation Using Semi-Permeable Membranes (AREA)
- Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
Description
【発明の詳細な説明】
(産業上の利用分野)
本発明は、新規な重合体およびその製造法に関
するものであり、さらに詳しくは、有機珪素基を
側鎖に有する新規な重合体およびその製造法に関
するものである。Detailed Description of the Invention (Field of Industrial Application) The present invention relates to a novel polymer and a method for producing the same, and more specifically, a novel polymer having an organosilicon group in its side chain and its production. It is about law.
(従来の技術)
従来からスチレン誘導体は数多く開発合成され
てきており、その重合性を利用し、機能性高分子
の合成等に広く利用されている。(Prior Art) A large number of styrene derivatives have been developed and synthesized in the past, and their polymerizability is utilized to widely utilize them in the synthesis of functional polymers and the like.
珪素原子を有するスチレン誘導体としては、パ
ラートリメチルシリルスチレン、パラートリメチ
ルシリルメチルスチレン、ジメチルフエニルシリ
ルスチレン等が知られている。これらの化合物の
重合体は多数知られているが、シリル基が2ケベ
ンジル基に結合した形のスチレン誘導体の重合体
は、これまで知られていない。 As styrene derivatives having silicon atoms, para-trimethylsilylstyrene, para-trimethylsilylmethylstyrene, dimethylphenylsilylstyrene, etc. are known. Although many polymers of these compounds are known, a polymer of a styrene derivative in which a silyl group is bonded to a 2-kebenzyl group has not been known so far.
このような背景をふまえて検討を重ねた結果、
本発明者らは、シリル基が1ないし2ケベンジル
基に結合した新規なスチレン誘導体の重合体を合
成するに到つた。 As a result of repeated consideration based on this background,
The present inventors have now synthesized a novel styrene derivative polymer in which a silyl group is bonded to one or two kebenzyl groups.
(発明の構成)
本発明は、下記構造式()で示される重合単
位より成り、分子量が1000ないし2000000である
線状高分子に係るものである。(Structure of the Invention) The present invention relates to a linear polymer comprising polymerized units represented by the following structural formula () and having a molecular weight of 1,000 to 2,000,000.
(式中、R1,R2,R3は水素または炭素数1から
10のアルキル基、アリール基、アラルキル基を表
す。n,mはその和が3となるような1または2
の組合せ。ただし、R1、R2、R3がともにメチル
基であり、n=2、m=1である場合を除く)
−CHn(SiR1R2R3)nはビニル基に対して、オル
ト、メタ、パラいずれの位置であつてもよいが、
パラがより好ましい。また、nとmはその和が3
となるような1または2の組合せであるが、n=
1、m=2の方がシリル基の難燃化等への効果が
より顕著となるため、より好ましい。R1,R2,
R3は水素または炭素数1から10のアルキル基、
アリール基、アラルキル基を表すが、シリル基の
反応性から、メチル基、エチル基、フエニル基の
いずれかであることが好ましい。 (In the formula, R 1 , R 2 , R 3 are hydrogen or from 1 to carbon number
Represents 10 alkyl, aryl, and aralkyl groups. n and m are 1 or 2 such that the sum is 3
A combination of (However, this excludes the case where R 1 , R 2 , and R 3 are all methyl groups, and n = 2 and m = 1) -CHn (SiR 1 R 2 R 3 ) n is ortho to the vinyl group, It can be in either meta or para position, but
Para is more preferred. Also, the sum of n and m is 3
It is a combination of 1 or 2 such that n=
1, m=2 is more preferable because the effect of the silyl group on flame retardation etc. becomes more pronounced. R 1 , R 2 ,
R 3 is hydrogen or an alkyl group having 1 to 10 carbon atoms,
Although it represents an aryl group or an aralkyl group, it is preferably a methyl group, an ethyl group, or a phenyl group in view of the reactivity of the silyl group.
本発明における線状高分子の分子量1000ないし
2000000であるが、より好ましくは10000ないし
2000000である。 The molecular weight of the linear polymer in the present invention is 1000 to
2000000, but more preferably 10000 or more
2000000.
本発明の線状高分子は、構造式()で示され
る単量体を重合させることによつて得ることがで
きる。 The linear polymer of the present invention can be obtained by polymerizing monomers represented by the structural formula ().
上記単量体は、ビニルトルエンを特定の有機リ
チウム化合物で予めメチル基をリチオ化した後、
クロロシラン化合物を系内に添加する方法で製造
される。 The above monomer is obtained by lithiation of the methyl group of vinyltoluene with a specific organic lithium compound, and then
It is manufactured by adding a chlorosilane compound into the system.
重合方法には特に制限はなく、加熱による重合
でも充分可能であるが、重合開始剤を利用するこ
とが好ましい場合が多い。重合開始剤として用い
られるのは、過酸化ベンゾイル、過酸化ラウロイ
ル等の過酸化アシル類、アゾビスイソブチロニト
リル、2,2′−アゾビス(2,4−ジメチルマレ
ロニトリル)等のアゾニトリル類、過酸化ジタ−
シヤリ−ブチル、過酸化ジクミル、ミチルエチル
ケトンパ−オキシド等の過酸化物、クメンヒドロ
ペルオキシド、タ−シヤリ−ヒドロペルオキシ等
のヒドロキシペルオキシド類である。 There are no particular restrictions on the polymerization method, and polymerization by heating is sufficient, but it is often preferable to use a polymerization initiator. The polymerization initiators used include acyl peroxides such as benzoyl peroxide and lauroyl peroxide, azonitrile such as azobisisobutyronitrile and 2,2'-azobis(2,4-dimethylmaleronitrile), peroxide jitter
These include peroxides such as shari-butyl, dicumyl peroxide, and methyl ethyl ketone peroxide, and hydroxyperoxides such as cumene hydroperoxide and tertiary-hydroperoxy.
本発明における重合体は、不活性液体の存在下
で重合を行つて製造することも可能である。不活
性液体としては、ノルマル−ペンタン、ノルマル
−ヘキサン、ノルマル−ヘプタン、ノルマル−オ
クタンを始めとする脂肪族炭化水素類、メタノー
ル、エタノール、イソプロピルアルコールなどの
アルコール類、アセトン、メチルエチルケトン、
ジエチルケトンなどのケトン類、ジエチルエーテ
ル、メチルエチルエーテル、ジブチルエーテル、
ジオキサン、テトラヒドロフラン等のエーテル
類、ベンゼン、トルエン、キシレン等の芳香族炭
化水素類、ギ酸エチル、酢酸エチル、酢酸ブチル
等のエステル類、ジメチルホルムアミド、ジメチ
ルアセトアミドを始めとするアミド類、クロロホ
ルム、塩化メチレン、ジクロルエタン等の脂肪族
ハロゲン化物、クロルベンゼンを始めとする芳香
族ハロゲン化物、また、ジメチルスルホキシド等
の極性液体も用いることができる。なお、これら
の液体は単独ないしは二つ以上の液体の混合物と
して用いることもできる。 The polymer in the present invention can also be produced by polymerizing in the presence of an inert liquid. Inert liquids include aliphatic hydrocarbons such as normal pentane, normal hexane, normal heptane, and normal octane, alcohols such as methanol, ethanol, and isopropyl alcohol, acetone, methyl ethyl ketone,
Ketones such as diethyl ketone, diethyl ether, methyl ethyl ether, dibutyl ether,
Ethers such as dioxane and tetrahydrofuran, aromatic hydrocarbons such as benzene, toluene and xylene, esters such as ethyl formate, ethyl acetate and butyl acetate, amides such as dimethylformamide and dimethylacetamide, chloroform and methylene chloride. , aliphatic halides such as dichloroethane, aromatic halides such as chlorobenzene, and polar liquids such as dimethyl sulfoxide can also be used. Note that these liquids can be used alone or as a mixture of two or more liquids.
反応の温度に制限はないが、20℃から120℃程
度が好ましく、さらに好ましくは60℃から100℃
程度である。 There is no limit to the reaction temperature, but it is preferably about 20°C to 120°C, more preferably 60°C to 100°C.
That's about it.
(発明の効果)
本発明によつて得られる新規な重合体()
は、その珪素原子による難燃効果から難燃剤への
利用が考えられるとともに、側鎖の珪素原子を利
用して機能性高分子となり、酸素透過性膜への利
用やフオトレジスト、電子線レジスト用ポリマー
の一成分として有用である。また、このポリマー
を混入することにより、珪素化合物であるシリコ
ーンオイル、グラスフアイバー等との密着性が非
常に良くなり、珪素化合物を使つた複合材料の改
質剤としても有用である。(Effect of the invention) Novel polymer obtained by the invention ()
is considered to be used as a flame retardant due to its flame retardant effect due to its silicon atoms, and it can also be used as a functional polymer by using the silicon atoms in the side chain, and can be used in oxygen permeable films, photoresists, and electron beam resists. Useful as a component of polymers. Furthermore, by incorporating this polymer, adhesion with silicone oil, glass fiber, etc., which are silicon compounds, becomes very good, and it is also useful as a modifier for composite materials using silicon compounds.
(実施例)
以下に本発明の実施例を示すが、これらは本発
明を制限するものではない。(Example) Examples of the present invention are shown below, but these do not limit the present invention.
実施例 1
50mlのアンプルに5.0gの4−ビス(トリメチ
ルシリル)メチルスチレン、20mlのキシレンおよ
び0.05gのアゾビスイソブチロニトリルを入れ、
充分混合溶解させた後、アンプル管内を窒素パー
ジして封管した。これを80℃の水浴中に24時間浸
漬した。冷却後、封管を割つて内容物をヘキサン
中にあけて沈澱を濾別し、ヘキサンで充分洗浄し
た後、真空乾燥して重量を測定したところ、4.9
gであつた。Example 1 5.0 g of 4-bis(trimethylsilyl)methylstyrene, 20 ml of xylene and 0.05 g of azobisisobutyronitrile were placed in a 50 ml ampoule.
After thorough mixing and dissolution, the inside of the ampoule tube was purged with nitrogen and the tube was sealed. This was immersed in a water bath at 80°C for 24 hours. After cooling, the sealed tube was broken and the contents were poured into hexane, the precipitate was filtered out, thoroughly washed with hexane, dried under vacuum, and the weight was determined to be 4.9.
It was hot at g.
この生成物の元素分析値および赤外吸収スペク
トルにおける主なピークは次のとおりである。 The elemental analysis values and main peaks in the infrared absorption spectrum of this product are as follows.
元素分析値(括弧内は理論値を表す)
C:69.05(68.62)
H:10.01(9.98)
Si:20.94(21.40)
赤外吸収スペクトル;3060、3000、2950、
2830、1610、1510、1410、1250、1200、1030、
770、690cm-1
単量体におけるC=C2重結合に由来する吸収
が消失していることから、重合体になつているこ
とが確認された。このものをゲルパ−ミエイシヨ
ンクロマトグラフイーにより、ポリスチレンを検
量線として用いることによつて分子量を測定した
ところ、分子量は1100000であつた。Elemental analysis values (theoretical values are shown in parentheses) C: 69.05 (68.62) H: 10.01 (9.98) Si: 20.94 (21.40) Infrared absorption spectrum; 3060, 3000, 2950,
2830, 1610, 1510, 1410, 1250, 1200, 1030,
Since the absorption derived from the C=C2 double bond in the 770 and 690 cm -1 monomers disappeared, it was confirmed that it had become a polymer. The molecular weight of this product was measured by gel permeation chromatography using polystyrene as a calibration curve, and the molecular weight was found to be 1,100,000.
実施例 2
4−ビス(トリメチルシリル)メチルスチレン
の代わりに4−ビス(トリエチルシリル)メチル
スチレンを用いたこと以外は、実施例1とまつた
く同様に反応、操作を行つた。得られた生成物の
収量は4.8gであり、その元素分析値および赤外
吸収スペクトルにおける主なピークは次のとおり
である。Example 2 The reaction and operation were carried out in the same manner as in Example 1, except that 4-bis(triethylsilyl)methylstyrene was used instead of 4-bis(trimethylsilyl)methylstyrene. The yield of the obtained product was 4.8 g, and its elemental analysis values and main peaks in the infrared absorption spectrum were as follows.
元素分析値(括弧内は理論値を表す)
C:72.41(72.75)
H:11.62(11.05)
Si:15.97(16.20)
赤外吸収スペクトル;3060、3030、2950、
2800、1610、1510、1410、1250、1180、1030、
770、690cm-1
また、分子量を実施例1と同様に測定したとこ
ろ、分子量は900000であつた。Elemental analysis values (theoretical values are shown in parentheses) C: 72.41 (72.75) H: 11.62 (11.05) Si: 15.97 (16.20) Infrared absorption spectrum; 3060, 3030, 2950,
2800, 1610, 1510, 1410, 1250, 1180, 1030,
770, 690 cm -1 Moreover, when the molecular weight was measured in the same manner as in Example 1, the molecular weight was 900,000.
実施例 3
4−ビス(トリメチルシリル)メチルスチレン
の代わりに4−トリエチルシリルメチルスチレン
を用いたこと以外は、実施例1とまつたく同様に
反応、操作を行つた。得られた生成物の収量は
4.8gであり、その元素分析値および赤外吸収ス
ペクトルにおける主なピークは次のとおりであ
る。Example 3 The reaction and operation were carried out in the same manner as in Example 1 except that 4-triethylsilylmethylstyrene was used instead of 4-bis(trimethylsilyl)methylstyrene. The yield of the product obtained is
It weighs 4.8g, and its elemental analysis values and main peaks in the infrared absorption spectrum are as follows.
元素分析値(括弧内は理論値を表す)
C:76.75(77.51)
H:11.05(10.41)
Si:12.20(12.08)
赤外吸収スペクトル;3060、3030、2950、
2800、1610、1510、1410、1250、1180、1030、
770、700cm-1
また、分子量を実施例1と同様に測定したとこ
ろ、分子量は1200000であつた。Elemental analysis values (theoretical values are shown in parentheses) C: 76.75 (77.51) H: 11.05 (10.41) Si: 12.20 (12.08) Infrared absorption spectrum; 3060, 3030, 2950,
2800, 1610, 1510, 1410, 1250, 1180, 1030,
770, 700 cm -1 Moreover, when the molecular weight was measured in the same manner as in Example 1, the molecular weight was 1,200,000.
実施例 4
4−ビス(トリメチルシリル)メチルスチレン
の代わりに4−ジメチルフエニルシリルメチルス
チレンを用いたこと以外は、実施例1とまつたく
同様に反応、操作を行つた。得られた生成物の収
量は4.5gであり、その元素分析値および赤外吸
収スペクトルにおける主なピークは次のとおりで
ある。Example 4 The reaction and operation were carried out in the same manner as in Example 1 except that 4-dimethylphenylsilylmethylstyrene was used instead of 4-bis(trimethylsilyl)methylstyrene. The yield of the obtained product was 4.5 g, and its elemental analysis values and main peaks in the infrared absorption spectrum were as follows.
元素分析値(括弧内は理論値を表す)
C:80.69(80.89)
H:8.29(7.99)
Si:11.02(11.13)
赤外吸収スペクトル;3060、3000、2950、
2830、1610、1520、1410、1220、1160、770、
740、700cm-1
また、分子量を実施例1と同様に測定したとこ
ろ、分子量は850000であつた。Elemental analysis values (theoretical values are shown in parentheses) C: 80.69 (80.89) H: 8.29 (7.99) Si: 11.02 (11.13) Infrared absorption spectrum; 3060, 3000, 2950,
2830, 1610, 1520, 1410, 1220, 1160, 770,
740, 700 cm -1 Moreover, when the molecular weight was measured in the same manner as in Example 1, the molecular weight was 850,000.
実施例 5
実施例1で合成したポリマー1gをテトラヒド
ロフラン20mlに溶解させた後、清浄なガラス表面
に、この溶液を塗りポリマーフイルムを作つた。
溶媒のテトラヒドロフランを20℃で24時間乾燥し
て除去した後、水にガラスを浸漬してポリマーフ
イルムを剥離した後、フイルムを48時間真空乾燥
した。Example 5 After dissolving 1 g of the polymer synthesized in Example 1 in 20 ml of tetrahydrofuran, this solution was applied to a clean glass surface to produce a polymer film.
After removing the solvent tetrahydrofuran by drying at 20° C. for 24 hours, the polymer film was peeled off by immersing the glass in water, and the film was vacuum-dried for 48 hours.
このフイルムの一方の側から空気を加え、反対
側へ通過してくるガスクロマトグラフイー法によ
り測定したところ、酸素の選択透過性(通過後の
酸素分率/初期酸素分率)は3.5であつた。 When measured by gas chromatography, in which air was added to one side of the film and passed through to the other side, the selective permeability of oxygen (oxygen fraction after passing/initial oxygen fraction) was 3.5. .
Claims (1)
り、分子量が1000ないし2000000である線状高分
子。 〔式中、R1,R2,R3は水素または炭素数が1か
ら10のアルキル基、アリール基、アラルキル基を
表す。n,mはその和が3となるような1または
2の組合せ、ただし、R1,R2,R3がともにメチ
ル基であり、n=2、m=1である場合を除く〕 2 構造式()中、n=1、m=2である特許
請求の範囲第1項記載の化合物。 3 構造式()中、R1,R2,R3がメチル基、
エチル基、フエニル基のいずれかである特許請求
の範囲第1項または第2項記載の化合物。 4 下記構造式() で示される単量体を重合させることを特徴とする
下記構造式()で示される重合単位より成り、
分子量が1000ないし2000000である線状高分子の
製造法。 (式中、R1,R2,R3は水素または炭素数1から
10のアルキル基、アリール基、アラルキル基を表
わす。n,mはその和が3となるような1または
2の組合せ。ただし、R1,R2,R3がともにメチ
ル基であり、n=2、m=1である場合を除く。)[Claims] 1. A linear polymer consisting of polymerized units represented by the following structural formula () and having a molecular weight of 1,000 to 2,000,000. [In the formula, R 1 , R 2 , and R 3 represent hydrogen or an alkyl group having 1 to 10 carbon atoms, an aryl group, or an aralkyl group. n and m are a combination of 1 or 2 such that the sum is 3, except when R 1 , R 2 , and R 3 are all methyl groups and n = 2 and m = 1] 2 Structure The compound according to claim 1, wherein in formula (), n=1 and m=2. 3 In the structural formula (), R 1 , R 2 , R 3 are methyl groups,
The compound according to claim 1 or 2, which is either an ethyl group or a phenyl group. 4 Structural formula below () It consists of a polymerized unit represented by the following structural formula (), which is characterized by polymerizing a monomer represented by
A method for producing linear polymers with a molecular weight of 1,000 to 2,000,000. (In the formula, R 1 , R 2 , R 3 are hydrogen or from 1 to carbon number
Represents 10 alkyl groups, aryl groups, and aralkyl groups. n and m are a combination of 1 or 2 whose sum is 3. However, this excludes the case where R 1 , R 2 , and R 3 are all methyl groups, and n=2 and m=1. )
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP5147686A JPS62209111A (en) | 1986-03-11 | 1986-03-11 | Novel polymer and production thereof |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP5147686A JPS62209111A (en) | 1986-03-11 | 1986-03-11 | Novel polymer and production thereof |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS62209111A JPS62209111A (en) | 1987-09-14 |
| JPH0441685B2 true JPH0441685B2 (en) | 1992-07-09 |
Family
ID=12888001
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP5147686A Granted JPS62209111A (en) | 1986-03-11 | 1986-03-11 | Novel polymer and production thereof |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS62209111A (en) |
-
1986
- 1986-03-11 JP JP5147686A patent/JPS62209111A/en active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS62209111A (en) | 1987-09-14 |
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