JPH0445571B2 - - Google Patents
Info
- Publication number
- JPH0445571B2 JPH0445571B2 JP18015184A JP18015184A JPH0445571B2 JP H0445571 B2 JPH0445571 B2 JP H0445571B2 JP 18015184 A JP18015184 A JP 18015184A JP 18015184 A JP18015184 A JP 18015184A JP H0445571 B2 JPH0445571 B2 JP H0445571B2
- Authority
- JP
- Japan
- Prior art keywords
- vacuum
- mgcl
- inert gas
- distillation
- metal
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 238000000034 method Methods 0.000 claims description 25
- 239000007789 gas Substances 0.000 claims description 14
- 239000011261 inert gas Substances 0.000 claims description 14
- 229910052751 metal Inorganic materials 0.000 claims description 14
- 239000002184 metal Substances 0.000 claims description 14
- TWRXJAOTZQYOKJ-UHFFFAOYSA-L Magnesium chloride Chemical compound [Mg+2].[Cl-].[Cl-] TWRXJAOTZQYOKJ-UHFFFAOYSA-L 0.000 claims description 7
- 238000010438 heat treatment Methods 0.000 claims description 7
- 239000003870 refractory metal Substances 0.000 claims description 7
- 238000000926 separation method Methods 0.000 claims description 7
- 229910001629 magnesium chloride Inorganic materials 0.000 claims description 4
- 238000007670 refining Methods 0.000 claims description 3
- 239000007787 solid Substances 0.000 claims description 2
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 claims 2
- 229910052786 argon Inorganic materials 0.000 claims 1
- 238000000746 purification Methods 0.000 claims 1
- 239000011777 magnesium Substances 0.000 description 21
- 238000004821 distillation Methods 0.000 description 13
- 238000001816 cooling Methods 0.000 description 10
- 238000006722 reduction reaction Methods 0.000 description 9
- 238000005292 vacuum distillation Methods 0.000 description 9
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 4
- 238000011109 contamination Methods 0.000 description 4
- 150000002739 metals Chemical class 0.000 description 4
- FYYHWMGAXLPEAU-UHFFFAOYSA-N Magnesium Chemical compound [Mg] FYYHWMGAXLPEAU-UHFFFAOYSA-N 0.000 description 3
- 239000000047 product Substances 0.000 description 3
- ZAMOUSCENKQFHK-UHFFFAOYSA-N Chlorine atom Chemical compound [Cl] ZAMOUSCENKQFHK-UHFFFAOYSA-N 0.000 description 2
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 2
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 2
- 230000007423 decrease Effects 0.000 description 2
- 238000005485 electric heating Methods 0.000 description 2
- 239000012535 impurity Substances 0.000 description 2
- 229910052749 magnesium Inorganic materials 0.000 description 2
- 229910001510 metal chloride Inorganic materials 0.000 description 2
- 229910052757 nitrogen Inorganic materials 0.000 description 2
- 239000001301 oxygen Substances 0.000 description 2
- 229910052760 oxygen Inorganic materials 0.000 description 2
- 239000011541 reaction mixture Substances 0.000 description 2
- 238000007711 solidification Methods 0.000 description 2
- 230000008023 solidification Effects 0.000 description 2
- 239000000126 substance Substances 0.000 description 2
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 2
- 208000034809 Product contamination Diseases 0.000 description 1
- 229910007926 ZrCl Inorganic materials 0.000 description 1
- 239000006227 byproduct Substances 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- 239000007795 chemical reaction product Substances 0.000 description 1
- 239000000460 chlorine Substances 0.000 description 1
- 229910052801 chlorine Inorganic materials 0.000 description 1
- 238000010276 construction Methods 0.000 description 1
- 230000006837 decompression Effects 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- 238000007599 discharging Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000001704 evaporation Methods 0.000 description 1
- 230000008020 evaporation Effects 0.000 description 1
- 239000004744 fabric Substances 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- 239000002245 particle Substances 0.000 description 1
- 230000001737 promoting effect Effects 0.000 description 1
- 238000011946 reduction process Methods 0.000 description 1
- 239000003566 sealing material Substances 0.000 description 1
- 239000010936 titanium Substances 0.000 description 1
Landscapes
- Manufacture And Refinement Of Metals (AREA)
Description
【発明の詳細な説明】
本発明は耐火金属の精製法、特にTiCl4,ZrCl4
のような金属塩化物の溶融マグネシウムによる還
元法(いわゆるクロル法)で得られた反応生成物
から、塩化マグネシウム及び金属マグネシウムを
分離・除去する方法に関する。[Detailed Description of the Invention] The present invention relates to a method for refining refractory metals, particularly TiCl 4 , ZrCl 4
The present invention relates to a method for separating and removing magnesium chloride and magnesium metal from a reaction product obtained by a reduction method of metal chloride with molten magnesium (so-called Kroll method).
クロル法で生成した金属から、これに介在する
未反応の金属マグネシウム及び塩化マグネシウム
を加熱して分離する方法としては、不活性ガスの
循環流にMg及びMgCl2を担持させて系外へ取出
す方法も知られているが(特公昭43−29861号公
報)、真空蒸溜による方法がより一般的に採用さ
れている。 A method for heating and separating unreacted metallic magnesium and magnesium chloride from the metal produced by the Chlor method is to carry Mg and MgCl 2 in a circulating flow of inert gas and take them out of the system. is also known (Japanese Patent Publication No. 43-29861), but a method using vacuum distillation is more commonly adopted.
前者の方法においては、正圧のAr雰囲気中で
操作されるのでMgやMgCl2の蒸発速度が小さい
うえ、これらの物質を担持した循環ガスは冷却さ
れ、固化したMgやMgCl2等はフイルターで捕集
されるため、複雑な装置構成を必要とする。また
捕集されたMgやMgCl2粒子は布に付着してお
り回収に手間を要するうえ、回収物も汚染の度合
が大きいので再利用は困難である、等の欠点があ
つた。 In the former method, since the operation is carried out in a positive pressure Ar atmosphere, the evaporation rate of Mg and MgCl 2 is low, and the circulating gas carrying these substances is cooled, and solidified Mg and MgCl 2 are removed by a filter. Since it is collected, a complicated equipment configuration is required. In addition, the collected Mg and MgCl 2 particles adhere to the cloth, which requires time and effort to collect, and the recovered material is highly contaminated, making it difficult to reuse.
一方真空蒸溜工程においては、系全体を真空ポ
ンプで排気しつゝ、例えばTiの場合は約1000℃
に加熱し続ける。レトルト内に収容したスポンジ
状金属からは、まずMgの蒸気が発生し、これは
レトルト外に設けた冷却部へ導いて凝固させる。
Mgの蒸気が発生している間のレトルト内の圧力
は比較的高く、数+mmHgに達することもあるが、
Mgの大部分が蒸発し尽くし、MgCl2の蒸気が発
生する時期になると、この蒸気圧はMgに比べて
1桁低いので、装置内の真空度はかなり上昇し、
しかもその期間は長い。従つてこの段階で装置の
気密性に欠陥が存在すると、侵入した外気により
製品が汚染されることになる。このような汚染の
危険は精製される金属がTiやその他の耐火金属
のように、酸素や窒素との親和力が強く高真空度
を得るためのゲツターとして用いられるものにお
いては極めて大きい。 On the other hand, in the vacuum distillation process, the entire system is evacuated using a vacuum pump.
Continue heating. First, Mg vapor is generated from the spongy metal housed in the retort, which is led to a cooling section provided outside the retort and solidified.
The pressure inside the retort while Mg vapor is generated is relatively high, sometimes reaching several + mmHg.
When most of the Mg has evaporated and MgCl 2 vapor is generated, the vapor pressure is an order of magnitude lower than that of Mg, so the degree of vacuum inside the device increases considerably.
And that period is long. Therefore, if there is a defect in the airtightness of the device at this stage, the product will be contaminated by the intruding outside air. The risk of such contamination is extremely high when the metal being refined is Ti or other refractory metals, which have a strong affinity for oxygen and nitrogen and are used as getters to obtain a high degree of vacuum.
従つて真空蒸溜工程に用いる装置では高度の気
密性を確保しなければならず、このためこれらの
装置は昇温に先立つて加圧気体による気密性テス
トを行なうのが普通である。しかし構成の複雑な
実際の装置では、このテストに多大の労力及び時
間を要するので現実的でない場合が多く、またシ
ール材の形状によつては排気系を高い正圧状態に
保てない場合がある。 Therefore, a high degree of airtightness must be ensured in the equipment used in the vacuum distillation process, and for this reason, these equipments are usually tested for airtightness using pressurized gas prior to raising the temperature. However, in actual equipment with complex configurations, this test requires a great deal of effort and time and is often impractical, and depending on the shape of the sealing material, it may not be possible to maintain a high positive pressure state in the exhaust system. be.
このように気密性の確認を系全体について完全
に行なうことは困難なことが多く、また真空蒸溜
操作開始後に漏れが生じた場合には系全体が減圧
状態にあるため、漏れ箇所を見つけ出すことは極
めて困難であり、結局真空蒸溜操作による従来の
精密工程では、ある程度の製品汚染は避けられ
ず、良品質製品の歩留りは低かつた。 In this way, it is often difficult to completely check the airtightness of the entire system, and if a leak occurs after the vacuum distillation operation has started, the entire system is under reduced pressure, so it is difficult to find the leak location. This is extremely difficult, and as a result, in the conventional precision process using vacuum distillation, some degree of product contamination is unavoidable, and the yield of high-quality products is low.
従つて本発明の主な目的の一つは上述の両従来
技術の欠点を除去することであり、その要旨は、
Mg及びMgCl2と混在せる耐火金属塊を外気から
隔てられた空間内で加熱し、気化又は液化した
Mg及びMgCl2を固体の金属から分離する方法に
おいて、少くとも、Mg及びMgCl2の分圧が著し
く低下する分離工程の後半期に、該空間内に不活
性ガスの気流を導入し、負圧の不活性ガス雰囲気
で加熱を続行することを特徴とする耐火金属の精
製法にある。 Therefore, one of the main objectives of the present invention is to eliminate the drawbacks of both the above-mentioned prior art, the gist of which is to:
A refractory metal lump mixed with Mg and MgCl 2 is heated in a space separated from the outside air and vaporized or liquefied.
In a method for separating Mg and MgCl 2 from solid metals, at least in the latter half of the separation process when the partial pressures of Mg and MgCl 2 are significantly reduced, an inert gas flow is introduced into the space to create a negative pressure. A refractory metal refining method characterized by continuing heating in an inert gas atmosphere.
本発明の方法に従つて操作を行なうときは、蒸
溜装置の各連結部や、排気系からこの装置への空
気の逆流が防止され、製品金属の汚染は最小限に
抑制される。 When operating according to the method of the present invention, backflow of air from the connections and exhaust system of the distillation apparatus into the apparatus is prevented and contamination of product metals is minimized.
本発明方法の実施に際しては、精製すべき金属
塊は例えば特公昭48−34646号、特開昭58−
174530号に記載されているような装置を利用し
て、蒸溜装置内空間の上方又は下方に置き、下方
又は上方を冷却部として、蒸発したMgやMgCl2
をこゝに固化付着させることができる。或は金属
塩化物のMg還元とかゝる蒸溜操作を同一の装置
内で行なうために、例えば特公昭55−36255号や
USP3684264の各公報に記載の装置を改変し利用
することができる。還元工程を別装置で行なう場
合、内筒を用いる二重筒構成とすれば金属塊の移
送に便利である。 When carrying out the method of the present invention, the metal ingot to be refined is, for example, Japanese Patent Publication No. 48-34646,
Using a device as described in No. 174530, it is placed above or below the internal space of the distillation device, and the bottom or top is used as a cooling section to collect evaporated Mg and MgCl 2 .
can be solidified and adhered here. Alternatively, in order to perform distillation operations such as Mg reduction of metal chlorides in the same apparatus, for example, Japanese Patent Publication No. 55-36255 and
The devices described in each publication of USP3684264 can be modified and used. When the reduction process is performed in a separate device, a double cylinder configuration using an inner cylinder is convenient for transporting the metal lump.
上記の各種の装置を用いて本発明方法を実施す
る場合、さらにいくつかの態様が利用可能であ
る。例えば不活性ガスの導入(吹込み)箇所につ
いては、用いるガスの流量が少いこと、また蒸溜
装置のレトルト本体から洩れが生ずることはほと
んどないので、空気の混入防止という本来の目的
からは、不活性ガスの導入(吹込み)は、精製す
べき金属塊に関しては真空吸引側と同じ側(例え
ば装置上方)に行なえば充分である。この場合、
比較的単純な構造の装置が得られる点で有利であ
る。一方、ガスの導入を吸引と反対側に行なえ
ば、導入気流によるMg及びMgCl2の冷却部への
搬送が期待され、これによる減圧蒸溜時間の短縮
が可能になるので、より好ましい。この際、精製
すべき金属塊を容器下方に置き加熱する構成の減
圧蒸溜装置の場合、不活性ガスを導入するための
管は容器壁に沿つて延設し、器底近くに開口を持
つように予め配置しておくのが最適である。例え
ば下方に加熱部を有する専用の蒸溜レトルトを用
い金属を収容した内筒をレトルト内へ配置する場
合には、レトルトの底部に開口を有する導管を設
けておく。また還元操作と蒸溜操作とを共通のレ
トルト(例えば特開昭59−133335に記載のよう
な)を用いて実施する場合には、還元操作時に副
生MgCl2の排出のために用いる配管を、不活性ガ
スの導入として用いることができる。こうするこ
とによつて不活性ガスは導入管を通過する間に、
900℃以上に加熱された炉によつて充分に予熱さ
れるので、MgCl2やMgの凝固を防ぐために導入
ガスを予熱する特別な装置は必要としない。 When carrying out the method of the present invention using the various apparatuses described above, several further embodiments are available. For example, regarding the point where inert gas is introduced (injected), the flow rate of the gas used is small, and there is almost no leakage from the retort body of the distillation device, so from the original purpose of preventing air intrusion, It is sufficient that the inert gas is introduced (injected) on the same side of the metal mass to be purified as the vacuum suction side (for example, above the apparatus). in this case,
This is advantageous in that a device with a relatively simple structure is obtained. On the other hand, it is more preferable to introduce the gas on the side opposite to the suction because it is expected that the introduced airflow will transport Mg and MgCl 2 to the cooling section, thereby making it possible to shorten the vacuum distillation time. At this time, in the case of a vacuum distillation device that heats the metal lump to be purified by placing it below the container, the pipe for introducing the inert gas should extend along the wall of the container and have an opening near the bottom of the container. It is best to place them in advance. For example, when a dedicated distillation retort having a heating section below is used and an inner cylinder containing metal is placed inside the retort, a conduit having an opening is provided at the bottom of the retort. In addition, when the reduction operation and the distillation operation are carried out using a common retort (for example, as described in JP-A-59-133335), the piping used for discharging the by-product MgCl 2 during the reduction operation is It can be used as an inert gas introduction. By doing this, while the inert gas passes through the inlet pipe,
Since it is sufficiently preheated by a furnace heated to over 900°C, there is no need for any special equipment to preheat the introduced gas to prevent solidification of MgCl 2 or Mg.
構造を簡単にするために上記の装置において導
入管の開口を冷却部の下部に設けることができ
る。この場合は導入したガスによつてMg及び
MgCl2の蒸気が多少冷却されることになるが、導
入ガスは少量であるので、蒸気が凝固し落下する
ことはなく、むしろ僅かながら蒸気の冷却壁への
固化付着を促進する作用が見られる。 In order to simplify the structure, the opening of the inlet pipe can be provided in the lower part of the cooling section in the above device. In this case, Mg and
The MgCl 2 vapor will be cooled to some extent, but since the amount of gas introduced is small, the vapor will not solidify and fall, but rather it will have a slight effect of promoting the solidification and adhesion of the vapor to the cooling wall. .
さらに加熱、レトルト部と冷却筒との間の接続
が完全に気密に行なわれる場合には、導入管の開
口部は冷却筒の蓋付近に設けてもよい。これによ
つても蓋部及び真空系配管における洩れによつて
排気が真空系へ逆流することは阻止できる。 Furthermore, if the connection between the heating and retort section and the cooling cylinder is completely airtight, the opening of the introduction pipe may be provided near the lid of the cooling cylinder. This also prevents exhaust gas from flowing back into the vacuum system due to leaks in the lid and vacuum system piping.
一方、精製すべき金属を上部に置き、下部を冷
却部とする形式の減圧蒸溜装置については、導入
管の配置を上記の各場合の逆とすればよい。 On the other hand, for a reduced pressure distillation apparatus in which the metal to be refined is placed in the upper part and the lower part is used as a cooling section, the arrangement of the introduction pipes may be reversed to the above-mentioned cases.
本発明方法においては真空蒸溜操作の少くとも
後段において不活性ガスを導入し、もつて真空系
内の真空度を多少低下せしめ、これによつて、操
作開始前の気密試験では検知が不可能又は困難な
漏洩個所からの僅かな空気の侵入によつて真空蒸
溜操作中に精製金属が汚染されるのを防ぐもので
ある。従つて使用するガスの量は少量で充分に機
能する。例えば蒸溜操作を通じて、排気を続けな
がら1Torr程度の圧力を保つべくArを導入して
もよいが、しかしより大きな蒸溜速度を得る上で
はより減圧下で、即ち導入ガスのより少い状態で
操作することが望ましい。一般に蒸溜操作開始直
前の到達真空度(例えば10-2Torr程度)が、操
作を通じて保たれるようにArガスを投入するの
がよい。 In the method of the present invention, an inert gas is introduced at least in the latter stage of the vacuum distillation operation, thereby reducing the degree of vacuum in the vacuum system to a certain extent, thereby making it impossible to detect or This prevents contamination of refined metals during vacuum distillation operations due to the ingress of small amounts of air through difficult leak points. Therefore, a small amount of gas is enough to function satisfactorily. For example, during a distillation operation, Ar may be introduced to maintain a pressure of around 1 Torr while continuing to evacuation, but to obtain a higher distillation rate it is necessary to operate at a lower pressure, i.e. with less introduced gas. This is desirable. Generally, it is preferable to introduce Ar gas so that the degree of vacuum reached just before the start of the distillation operation (for example, about 10 -2 Torr) is maintained throughout the operation.
このように本発明方法は比較的低い真空度で蒸
溜操作を行うので、高真空度での蒸溜操作におけ
るような大容量の高真空ポンプを必要としないの
で、排気系を簡単な構成にすることができる。ま
た操作前の気密試験を簡略化できるのでこれに要
する時間の短縮及び労力の節約が達成される。 In this way, the method of the present invention performs distillation operation at a relatively low degree of vacuum, and therefore does not require a large-capacity high-vacuum pump unlike distillation operations at a high degree of vacuum, so the exhaust system can be configured simply. I can do it. Furthermore, since the airtightness test before operation can be simplified, the time and labor required for this can be reduced.
本発明方法では蒸溜操作が低真空度で行われる
ために、不純物との蒸気圧の差に基く真空分離操
作の効率自体は多少低下するが、反面、系内に存
在するガスによる熱伝導率の上昇があるため、最
終的な不純物除去効率の低下は少い。また系内に
は常時不活性ガスを導入しているので、排気系に
トラブルを生じて系内を正圧にする必要が生じた
場合にでも精製金属の汚染を未然に防止するため
の適切な対応を速やかに行うことができ、こうし
たトラブルにもかゝわらず、高品質を維持し歩留
りの低下を防止することができる。 In the method of the present invention, since the distillation operation is performed at a low degree of vacuum, the efficiency of the vacuum separation operation itself is somewhat reduced due to the difference in vapor pressure from impurities, but on the other hand, the thermal conductivity due to the gas present in the system is Because of this increase, the final impurity removal efficiency decreases little. In addition, since inert gas is constantly introduced into the system, even if there is a problem with the exhaust system and it becomes necessary to create positive pressure in the system, appropriate measures can be taken to prevent contamination of refined metals. It is possible to take prompt action, maintain high quality, and prevent a decrease in yield despite such troubles.
次に本発明を図面によつて説明する。 Next, the present invention will be explained with reference to the drawings.
第1図は本発明方法の実施に適した分離装置の
縦断面図を示す。図において全体を1として示さ
れる減圧分離装置の下部外方には、本質的に密閉
構造で適当な減圧手段(図示せず)に接続した電
熱炉2が配置される。炉2内には縦長の筒体3が
取付けられ、この下部には、クロル法で得られる
生成金属−Mg−MgCl2から成る反応混合物4を
保持した還元反応容器5が収容される。炉2から
突出せる筒体3の上部は、炉内に置かれる下部か
ら分離可能で、頂部には減圧用の排気管6が、周
囲には冷却用の水套7が設置される。筒体3の下
部には器壁に沿つて不活性ガス導入管8が延設さ
れ底部に開口を有する。筒体の中間部には着脱可
能な熱遮蔽具9が取付けられている。筒体3の蓋
10にボルトで固定されて空の還元反応容器11
が吊下げられ、内面にMg,MgCl2等の凝固物を
付着される。このような構成の装置を用いた一実
施例を示せば次のとおりである。 FIG. 1 shows a longitudinal sectional view of a separation device suitable for carrying out the method of the invention. At the lower part of the vacuum separator, which is designated as 1 in the figure as a whole, there is arranged an electric heating furnace 2 of essentially closed construction and connected to suitable vacuum means (not shown). A vertically elongated cylindrical body 3 is installed in the furnace 2, and a reduction reaction vessel 5 holding a reaction mixture 4 consisting of produced metal-Mg- MgCl2 obtained by the Kroll method is accommodated in the lower part of the cylinder. The upper part of the cylindrical body 3 that protrudes from the furnace 2 can be separated from the lower part placed in the furnace, and an exhaust pipe 6 for decompression is installed at the top, and a water canopy 7 for cooling is installed around the top. An inert gas introduction pipe 8 extends along the vessel wall at the lower part of the cylinder 3 and has an opening at the bottom. A removable heat shield 9 is attached to the middle part of the cylinder. An empty reduction reaction vessel 11 is fixed to the lid 10 of the cylinder 3 with bolts.
is suspended, and solidified substances such as Mg and MgCl 2 are adhered to the inner surface. An example using a device having such a configuration is as follows.
実施例
内径2m、深さ4mの本質的に円筒状の空間をも
つ電熱炉に内径1.6m、肉厚32mmのSUS316製の筒
体下部が設置されている。この中に置かれた外形
1.4m、肉厚16mm、全長2.4m、SUS410製の反応容
器にはスポンジチタン約4トンと少量のMgCl2お
よびMgを含む混合物が保持されている。筒体の
上部に、筒体下部に置かれたのと同タイプの(た
だし底板を取除いた)空の還元反応容器を蓋から
吊下げ、筒体の下部に被せて接合する。頂部の管
を通じて真空引きを行ない、炉で筒体下部を950
〜1000℃に加熱する一方、上部を冷却する。Example A lower cylindrical body made of SUS316 with an inner diameter of 1.6 m and a wall thickness of 32 mm is installed in an electric furnace having an essentially cylindrical space with an inner diameter of 2 m and a depth of 4 m. The outline placed inside this
The reaction vessel, which is 1.4 m long, 16 mm thick, and 2.4 m long, made of SUS410, holds approximately 4 tons of titanium sponge and a mixture containing small amounts of MgCl 2 and Mg. An empty reduction reaction vessel of the same type as the one placed at the bottom of the cylinder (but with the bottom plate removed) is suspended from the lid, placed over the bottom of the cylinder, and joined. A vacuum is drawn through the tube at the top, and the lower part of the cylinder is heated to 950°C in a furnace.
Heat to ~1000°C while cooling the top.
上記温度に20時間保持し、真空ポンプの吸引口
における真空度が2×10-2Torrに達した時点で、
筒体下部に沿つて延び底部を開口している導管を
通じて少量のArガスを供給し、上記位置におけ
る真空度を2〜5×10-2Torrに保つた。この状
態を72時間維持して分離操作を完了した。 Maintain the above temperature for 20 hours, and when the degree of vacuum at the suction port of the vacuum pump reaches 2 × 10 -2 Torr,
A small amount of Ar gas was supplied through a conduit extending along the lower part of the cylinder and opening at the bottom to maintain the degree of vacuum at the above position at 2 to 5 x 10 -2 Torr. This state was maintained for 72 hours to complete the separation operation.
得られたスポンジチタン塊全体の平均分析値は
次のとおりであつた。 The average analysis values of the entire titanium sponge mass obtained were as follows.
酸素 500ppm
窒素 30ppm
Mg 120ppm
塩素 250ppm
硬さ 80BHN
この品質は、従来の完全気密な装置で得られる
ものとほとんど同等であり、かつ全操業時間につ
いても大差は見られなかつた。 Oxygen 500ppm Nitrogen 30ppm Mg 120ppm Chlorine 250ppm Hardness 80BHN This quality was almost the same as that obtained with a conventional completely airtight device, and there was no major difference in the total operating time.
第1図は本発明方法の実施に適した減圧分離装
置の概略を示す縦断面図である。
1……分離装置(全体)、2……電熱炉、3…
…筒体、4……反応混合物、5……還元反応容
器、6……排気管、7……水套、8……ガス導入
管、9……熱遮蔽具、10……蓋、11……還元
反応容器。
FIG. 1 is a vertical sectional view schematically showing a vacuum separation apparatus suitable for carrying out the method of the present invention. 1... Separation device (whole), 2... Electric heating furnace, 3...
... Cylindrical body, 4 ... Reaction mixture, 5 ... Reduction reaction vessel, 6 ... Exhaust pipe, 7 ... Water mantle, 8 ... Gas introduction pipe, 9 ... Heat shield, 10 ... Lid, 11 ... ...Reduction reaction vessel.
Claims (1)
から隔てられた空間内で加熱し、気化又は液化し
たMg及びMgCl2を固体の金属から分離する方法
において、少くとも、Mg及びMgCl2の分圧が著
しく低下する分離工程の後半期に、該空間内に不
活性ガスの気流を導入し、負圧の不活性ガス雰囲
気で加熱を続行することを特徴とする耐火金属の
精製法。 2 上記不活性ガスがアルゴンを主成分とするガ
スである、特許請求の範囲第1項記載の耐火金属
の精製法。[Claims] 1. A method for heating a refractory metal lump mixed with Mg and MgCl 2 in a space separated from the outside air and separating vaporized or liquefied Mg and MgCl 2 from solid metal, at least: A refractory metal characterized by introducing an inert gas flow into the space during the latter half of the separation process when the partial pressures of Mg and MgCl2 drop significantly, and continuing heating in a negative pressure inert gas atmosphere. Purification method. 2. The method for refining a refractory metal according to claim 1, wherein the inert gas is a gas containing argon as a main component.
Priority Applications (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP18015184A JPS6160839A (en) | 1984-08-29 | 1984-08-29 | Refining method refractory metal |
| BR8504128A BR8504128A (en) | 1984-08-29 | 1985-08-28 | REFRACTORY METAL PURIFICATION PROCESS |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP18015184A JPS6160839A (en) | 1984-08-29 | 1984-08-29 | Refining method refractory metal |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS6160839A JPS6160839A (en) | 1986-03-28 |
| JPH0445571B2 true JPH0445571B2 (en) | 1992-07-27 |
Family
ID=16078288
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP18015184A Granted JPS6160839A (en) | 1984-08-29 | 1984-08-29 | Refining method refractory metal |
Country Status (2)
| Country | Link |
|---|---|
| JP (1) | JPS6160839A (en) |
| BR (1) | BR8504128A (en) |
Families Citing this family (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP3756047B2 (en) * | 2000-08-07 | 2006-03-15 | 住友チタニウム株式会社 | High purity titanium sponge material and method for producing the same |
| JP2006097107A (en) * | 2004-09-30 | 2006-04-13 | Toho Titanium Co Ltd | Method for manufacturing sponge titanium |
| CN100519784C (en) | 2006-05-31 | 2009-07-29 | 刘晓岚 | Apparatus for making sponge iron by direct-cooled combination method |
| DE102006042501B4 (en) * | 2006-09-07 | 2010-11-25 | Eisenmann Anlagenbau Gmbh & Co. Kg | Method and installation for drying objects |
| JP4906121B2 (en) * | 2008-07-02 | 2012-03-28 | 株式会社大阪チタニウムテクノロジーズ | Sponge titanium manufacturing method |
-
1984
- 1984-08-29 JP JP18015184A patent/JPS6160839A/en active Granted
-
1985
- 1985-08-28 BR BR8504128A patent/BR8504128A/en not_active IP Right Cessation
Also Published As
| Publication number | Publication date |
|---|---|
| JPS6160839A (en) | 1986-03-28 |
| BR8504128A (en) | 1986-06-17 |
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