JPH0448492B2 - - Google Patents
Info
- Publication number
- JPH0448492B2 JPH0448492B2 JP12386090A JP12386090A JPH0448492B2 JP H0448492 B2 JPH0448492 B2 JP H0448492B2 JP 12386090 A JP12386090 A JP 12386090A JP 12386090 A JP12386090 A JP 12386090A JP H0448492 B2 JPH0448492 B2 JP H0448492B2
- Authority
- JP
- Japan
- Prior art keywords
- vacuum
- workpiece
- preliminary
- vacuum chamber
- processing
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 239000007789 gas Substances 0.000 description 5
- 239000000463 material Substances 0.000 description 5
- 238000000034 method Methods 0.000 description 5
- 238000011282 treatment Methods 0.000 description 4
- 239000000654 additive Substances 0.000 description 3
- 238000006243 chemical reaction Methods 0.000 description 3
- 239000002985 plastic film Substances 0.000 description 3
- 229920006255 plastic film Polymers 0.000 description 3
- 238000004804 winding Methods 0.000 description 3
- 230000000694 effects Effects 0.000 description 2
- 239000004744 fabric Substances 0.000 description 2
- 239000011888 foil Substances 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- 239000002184 metal Substances 0.000 description 2
- 238000000465 moulding Methods 0.000 description 2
- 238000009832 plasma treatment Methods 0.000 description 2
- 239000004014 plasticizer Substances 0.000 description 2
- 238000009489 vacuum treatment Methods 0.000 description 2
- 208000005156 Dehydration Diseases 0.000 description 1
- BZHJMEDXRYGGRV-UHFFFAOYSA-N Vinyl chloride Chemical compound ClC=C BZHJMEDXRYGGRV-UHFFFAOYSA-N 0.000 description 1
- 230000002411 adverse Effects 0.000 description 1
- 230000005540 biological transmission Effects 0.000 description 1
- 238000004140 cleaning Methods 0.000 description 1
- 238000011109 contamination Methods 0.000 description 1
- 239000000498 cooling water Substances 0.000 description 1
- 230000018044 dehydration Effects 0.000 description 1
- 238000006297 dehydration reaction Methods 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 238000009434 installation Methods 0.000 description 1
- 238000012423 maintenance Methods 0.000 description 1
- 239000011347 resin Substances 0.000 description 1
- 229920005989 resin Polymers 0.000 description 1
- 239000003381 stabilizer Substances 0.000 description 1
- 238000007740 vapor deposition Methods 0.000 description 1
- 238000005406 washing Methods 0.000 description 1
Landscapes
- Treatments Of Macromolecular Shaped Articles (AREA)
- Physical Or Chemical Processes And Apparatus (AREA)
- Physical Vapour Deposition (AREA)
Description
【発明の詳細な説明】
（産業上の利用分野）
本発明は紙、布、パツド、プラスチツクフイル
ム、メタルフオイル等のシート状長尺物を連続的
に真空処理するための装置に関するものである。DETAILED DESCRIPTION OF THE INVENTION (Field of Industrial Application) The present invention relates to an apparatus for continuous vacuum processing of sheet-like elongated objects such as paper, cloth, pad, plastic film, metal foil, etc. .
（従来技術とその問題点）
従来、これらのシート状長尺物においては、プ
ラズマ処理、蒸着加工、各種の加工または反応前
における脱水処理等のために、屡々真空処理を必
要としてきた。これらの真空処理はバツチ処理等
の比較的小スケールの装置では従来から行われて
きたが、シート状長尺物を連続的に処理するとい
うことになると種々の問題があつた。例えば、軟
質塩化ビニル樹脂フイルムのように、可塑剤、安
定剤、その他の添加剤を含有している場合に、予
め長尺のフイルムを機内にセツトした後、内部を
真空にしていくと、これらの添加剤の揮発、逸散
によつてフイルムの変質が起こるほか、これらの
揮発分やフイルム中に共存するガスの逸散によつ
て真空度を恒常状態に持つていくのに長時間を要
するという状態であつた。特に低温プラズマ処理
は圧力を0.01〜10トルの範囲で数ｋHz〜数百ＭHz
の高周波電力を印加することにより行われ、プラ
ズマ発生のために供給されるガスは均一な処理を
行うために圧力が一定に保持されること、選択さ
れたガス以外のガス、例えば、空気等の混入は極
力回避されること等が重要であるため、この問題
は品質の保持と生産性の両面において重要な問題
となつていた。(Prior Art and its Problems) Conventionally, these sheet-like long objects have often required vacuum treatment for plasma treatment, vapor deposition processing, various processing, dehydration treatment before reaction, and the like. These vacuum treatments have conventionally been carried out in relatively small-scale apparatuses such as batch processing, but various problems have arisen when it comes to continuously processing long sheet-like objects. For example, if a long film such as a soft vinyl chloride resin film contains plasticizers, stabilizers, and other additives, if a long film is placed inside the machine and the inside is evacuated, these The film changes in quality due to the volatilization and dissipation of additives, and it takes a long time to maintain a constant vacuum due to the dissipation of these volatile components and gases coexisting in the film. The situation was as follows. In particular, for low-temperature plasma processing, the pressure is in the range of 0.01 to 10 Torr and the frequency is from several kHz to several hundred MHz.
The gas supplied for plasma generation must be kept at a constant pressure to ensure uniform treatment, and gases other than the selected gas, such as air, etc. Since it is important to avoid contamination as much as possible, this problem has become an important problem in terms of both quality maintenance and productivity.
（課題を解決するための手段）
本発明者らは以上の点を考慮した上で、上記の
ようなシート状長尺物を連続的に真空処理するた
めの装置を開発すべく鋭意研究の結果、本発明を
完成した。(Means for Solving the Problems) The present inventors took the above points into consideration, and as a result of intensive research to develop an apparatus for continuous vacuum processing of the above-mentioned long sheet-like objects. , completed the invention.
すなわち、本発明は真空処理槽に被処理物導入
用予備真空室と被処理物送り出し用予備真空室と
を接続した真空処理装置において、前記被処理物
導入用予備真空室と被処理物送り出し用予備真空
室とを、シールロールとこのシールロールを収納
するハウジングとによつて形成し、真空度が等し
い、詳しくは前記真空処理槽から見て同一番目に
位置する、被処理物導入用予備真空室と被処理物
送り出し用予備真空室とを同一真空ポンプに接続
することを要旨とするものである。 That is, the present invention provides a vacuum processing apparatus in which a preliminary vacuum chamber for introducing a workpiece and a preliminary vacuum chamber for sending out a workpiece are connected to a vacuum processing tank. A preliminary vacuum chamber is formed by a seal roll and a housing that accommodates the seal roll, and has an equal degree of vacuum, specifically, a preliminary vacuum chamber for introducing a workpiece, which is located at the same position as viewed from the vacuum processing tank. The gist is to connect the chamber and a preliminary vacuum chamber for sending out the processed material to the same vacuum pump.
本発明が提案する真空処理装置においては、被
処理物である上記シート状長尺物は被処理物導入
用予備真空室を経て真空処理槽へ連続的に供給さ
れ、かつ短時間に処理されるために可塑剤等の内
部添加剤の揮発等による逸散もなく、また前述し
たようなフイルム中に共存する空気等のガスによ
る悪影響も生じない。 In the vacuum processing apparatus proposed by the present invention, the sheet-like long object as the object to be processed is continuously supplied to the vacuum processing tank via a preliminary vacuum chamber for introducing the object to be processed, and is processed in a short time. Therefore, internal additives such as plasticizers do not escape due to volatilization, and the above-mentioned adverse effects caused by gases such as air coexisting in the film do not occur.
さらにまた、本発明が提案する真空処理装置は
エアーツウエアー（Air to Air）方式で連続的
に処理されるため、前記シート状物の一般的な連
続処理装置であるカレンダー等の各種加工機、押
出機等の各種成形機あるいは反応機等の製造ライ
ンに直結可能であり、低コストでの大量処理を可
能にするものである。 Furthermore, since the vacuum processing apparatus proposed by the present invention processes continuously using an air-to-air method, various processing machines such as a calendar, which is a general continuous processing apparatus for the sheet-like material, It can be directly connected to production lines such as various molding machines such as extruders or reaction machines, and enables mass processing at low cost.
（実施例）
以下、本発明に係わる真空連続処理装置を、プ
ラスチツクフイルムへのプラズマ連続処理装置に
適用した場合について添付の図面に基づいて詳し
く説明する。(Example) Hereinafter, a case in which the vacuum continuous processing apparatus according to the present invention is applied to a plasma continuous processing apparatus for plastic film will be described in detail based on the attached drawings.
第１図はプラズマ連続処理装置の概略縦断面
図、第２図はその概略平面図を示したものであ
る。 FIG. 1 is a schematic vertical sectional view of a continuous plasma processing apparatus, and FIG. 2 is a schematic plan view thereof.
これらの図において、１は紙、布、パツド、プ
ラスチツクフイルム、メタルフオイル等のシート
状長尺物からなる被処理物Ｆを連続的に処理する
ための真空処理槽であつて、この前後に被処理物
導入用予備真空室２と被処理物送り出し用予備真
空室３とが設けられている。両予備真空室２，３
はそれぞれ上下一対のシールロール２−１〜２−
４および３−１〜３−４と、このそれぞれを包囲
するハウジングとからなるシール室２ａ，２ｂ，
２ｃおよび３ａ，３ｂ，３ｃによつて構成されて
いる。 In these figures, reference numeral 1 denotes a vacuum processing tank for continuously processing a workpiece F consisting of a long sheet-like material such as paper, cloth, pad, plastic film, metal foil, etc. A preliminary vacuum chamber 2 for introducing the workpiece and a preliminary vacuum chamber 3 for sending out the workpiece are provided. Both preliminary vacuum chambers 2 and 3
are a pair of upper and lower seal rolls 2-1 to 2-, respectively.
4 and 3-1 to 3-4, and a housing surrounding each of the seal chambers 2a, 2b,
2c, 3a, 3b, and 3c.
真空処理槽１はこれに接続する真空ポンプ４に
より排気管５を通じて真空排気され、上記各シー
ル室２ａ〜２ｃ、３ａ〜３ｃは真空処理槽１から
見て同一番目に位置する２ａと３ａ、２ｂ、３ｂ
および２ｃと３ｃをそれぞれ一対として独立の真
空ポンプ６，８および１０により排気管７，９お
よび１１を通じて真空排気され、装置両側のシー
ル室２ａ，３ａより真空処理槽１に向け各シール
室２ｂ、３ｂおよび２ｃ、３ｃ内の圧力を段階的
に下げて真空処理槽１内の圧力を0.01〜10トルの
所定圧力に保持する。 The vacuum processing tank 1 is evacuated through an exhaust pipe 5 by a vacuum pump 4 connected thereto, and the seal chambers 2a to 2c, 3a to 3c are 2a, 3a, and 2b located at the same position when viewed from the vacuum processing tank 1. , 3b
2c and 3c are each paired as a pair and are evacuated through exhaust pipes 7, 9 and 11 by independent vacuum pumps 6, 8 and 10, and each seal chamber 2b, The pressure inside the vacuum processing tank 1 is maintained at a predetermined pressure of 0.01 to 10 Torr by lowering the pressure inside 3b, 2c, and 3c in stages.
被処理物Ｆは巻出装置１２より被処理物導入用
予備真空室２を経て真空処理槽１へ送られ、そこ
でプラズマ処理された後、被処理物送り出し用予
備真空室３を経て巻取装置１３に巻取られる。 The workpiece F is sent from the unwinding device 12 to the vacuum processing tank 1 via the preliminary vacuum chamber 2 for introducing the workpiece, and after being subjected to plasma treatment there, it passes through the preliminary vacuum chamber 3 for sending out the workpiece and is sent to the winding device. 13.
勿論、本連続処理装置をカレンダー等の各種加
工機、押出機等の各種成形機あるいは各種反応装
置等の他の製造加工ラインに直結させる場合は、
巻出装置１２または巻取装置１３を使用せずに、
被処理物導入用予備真空室２に直接送り込まれる
か、または被処理物送り出し用予備真空室３より
直接送り出される。 Of course, if this continuous processing device is directly connected to other manufacturing processing lines such as various processing machines such as calendars, various molding machines such as extruders, or various reaction devices,
Without using the unwinding device 12 or the winding device 13,
It is directly fed into the preliminary vacuum chamber 2 for introducing the workpiece, or directly sent out from the preliminary vacuum chamber 3 for sending out the workpiece.
各シールロール２−１〜２−４、３−１〜３−
４、後述する真空処理槽１内の処理ドラム２０お
よび巻取装置１３を駆動するための動力は、駆動
モーター１４に直結するラインシヤフト１５を介
して伝達され、それぞれの回転速度は各変速機１
６，１７，１８，２２により調整される。 Each seal roll 2-1 to 2-4, 3-1 to 3-
4. Power for driving the processing drum 20 and winding device 13 in the vacuum processing tank 1, which will be described later, is transmitted via a line shaft 15 directly connected to the drive motor 14, and the rotational speed of each is controlled by each transmission 1.
6, 17, 18, and 22.
本発明の真空処理装置によるプラズマ処理は次
の要領で行われる。すなわち、被処理物導入用予
備真空室２を通じて真空処理槽１内に導入された
シート状被処理物Ｆは、まずガイドロール１９を
介して陰極としての処理ドラム２０へ導かれ、こ
の外周方に半円を画いて配列された複数本の陽電
極２１との間に形成されるプラズマによつて処理
される。 Plasma processing using the vacuum processing apparatus of the present invention is performed in the following manner. That is, the sheet-like processed material F introduced into the vacuum processing tank 1 through the preliminary vacuum chamber 2 for introducing the processed material is first guided to the processing drum 20 as a cathode via the guide roll 19, and is The treatment is performed by plasma formed between a plurality of positive electrodes 21 arranged in a semicircle.
この真空処理槽１は第３図に示されるように、
ガイドロール１９、処理ドラム２０、陽電極２１
等の作動系部分をすべて一方の側板２３上に片持
ちで支持し、他方の側板を開閉扉としている。 As shown in FIG. 3, this vacuum processing tank 1 has
Guide roll 19, processing drum 20, positive electrode 21
All of the operating system parts are supported in a cantilever manner on one side plate 23, and the other side plate serves as an opening/closing door.
このような構造の真空処理槽の利点は被処理物
Ｆの装置内への最初の取り付け作業や装置内面の
洗浄、掃除作業等が容易に行えることである。 The advantage of the vacuum processing tank having such a structure is that the initial installation of the object to be processed F into the apparatus, washing the inner surface of the apparatus, cleaning operations, etc. can be easily performed.
また、この真空処理槽では側板２３を回転させ
る構造とすることができ、これによれば同一真空
処理槽により被処理物の表面および裏面の両面の
処理を可能にする。 In addition, this vacuum processing tank can have a structure in which the side plate 23 is rotated, thereby making it possible to process both the front and back surfaces of the object to be processed using the same vacuum processing tank.
第４図は本発明の真空装置の別の実施例を示す
もので、ここでは２つの真空処理槽を並列させた
構造としている。すなわち、第１の真空処理槽１
は通常の配置であるが、第２の真空処理槽１′は
側板２３を180゜回転させた配置となつている。こ
のようにすることによつて、シート状被処理物の
両面をプラズマ処理することができる。 FIG. 4 shows another embodiment of the vacuum apparatus of the present invention, which has a structure in which two vacuum processing vessels are arranged in parallel. That is, the first vacuum processing tank 1
is a normal arrangement, but the second vacuum processing tank 1' is arranged with the side plate 23 rotated by 180 degrees. By doing so, both sides of the sheet-like object can be plasma-treated.
勿論、真空処理槽１を２槽連続して配置するこ
とも可能であり、この場合にはシート状被処理物
の片面を２回処理することができるため、１槽の
場合に比べて処理速度を２倍にすることがきる。 Of course, it is also possible to arrange two vacuum processing tanks 1 in succession, and in this case, one side of the sheet-like processing object can be processed twice, so the processing speed is faster than in the case of one tank. can be doubled.
このように本発明で用いられる真空処理槽の構
造は、作動部分を保持する側板２３を回転するこ
とにより、被処理物のどちらかの面でも処理する
ことができ、装置に多様性を付与することができ
る。 As described above, the structure of the vacuum processing tank used in the present invention allows processing on either side of the object to be processed by rotating the side plate 23 that holds the operating part, giving versatility to the apparatus. be able to.
また、第３図に示される処理ドラム２０および
陽電極２１は冷却水を流すことによつて温調可能
であり、目的とする処理に合せて所定の温度に設
定される。 Further, the temperature of the processing drum 20 and anode 21 shown in FIG. 3 can be controlled by flowing cooling water, and the temperature is set to a predetermined temperature according to the intended processing.
なお、図示した装置は本発明の一態様を例示し
たもので、本発明はこれに限定されるものではな
い。 Note that the illustrated device is an example of one embodiment of the present invention, and the present invention is not limited thereto.
（発明の効果）
以上のように、本発明の真空処理装置によれば
真空処理槽内の真空度を各種加工処理を行うのに
必要な0.01〜10トルに調整することを容易にする
と共に、同一装置を用いて被処理物のどちらの面
をも処理することを可能とし、エアーツウエアー
（Air to Air）方式としては画期的なものであ
る。(Effects of the Invention) As described above, according to the vacuum processing apparatus of the present invention, it is easy to adjust the degree of vacuum in the vacuum processing tank to 0.01 to 10 Torr, which is necessary for performing various processing treatments, and This is a revolutionary air-to-air method, as it allows the same device to be used to process either side of the object.
図面はいずれも本発明の真空処理装置の実施例
に係るもので、第１図は第１の実施例の概略縦断
面図、第２図はその概略平面図、第３図は真空処
理槽の側面部分断面図であり、第４図は第２の実
施例の概略縦断面図である。
主要な符号の説明、１……真空処理槽、２……
被処理物導入用予備真空室、３……被処理物送り
出し用予備真空室、２−１〜２−４および３−１
〜３−４……シールロール、４，６，８，１０…
…真空ポンプ。
The drawings all relate to embodiments of the vacuum processing apparatus of the present invention; Fig. 1 is a schematic vertical cross-sectional view of the first embodiment, Fig. 2 is a schematic plan view thereof, and Fig. 3 is a diagram of a vacuum processing tank. FIG. 4 is a schematic longitudinal sectional view of the second embodiment. Explanation of main symbols, 1... Vacuum processing tank, 2...
Preliminary vacuum chamber for introducing the workpiece, 3... Preliminary vacuum chamber for sending out the workpiece, 2-1 to 2-4 and 3-1
~3-4... Seal roll, 4, 6, 8, 10...
…Vacuum pump.
Claims (1)
処理物送り出し用予備真空室とを接続した真空処
理装置において、前記被処理物導入用予備真空室
と被処理物送り出し用予備真空室とを、シールロ
ールとこのシールロールを収納するハウジングと
によつて形成し、真空度が等しい被処理物導入用
予備真空室と被処理物送り出し用予備真空室とを
同一真空ポンプに接続することを特徴とする真空
処理装置。 ２ 前記真空度が等しい被処理物導入用予備真空
室と被処理物送り出し用予備真空室とが、真空処
理槽から見て同一番目に位置する被処理物導入用
予備真空室と被処理物送り出し用予備真空室であ
る特許請求の範囲第１項記載の真空処理装置。[Scope of Claims] 1. A vacuum processing apparatus in which a preliminary vacuum chamber for introducing a workpiece and a preliminary vacuum chamber for sending out a workpiece are connected to a vacuum processing tank, wherein the preliminary vacuum chamber for introducing a workpiece and a preliminary vacuum chamber for sending out a workpiece are connected to a vacuum processing tank. A preliminary vacuum chamber for sending out is formed by a seal roll and a housing that houses the seal roll, and the preliminary vacuum chamber for introducing the workpiece and the preliminary vacuum chamber for sending out the workpiece, which have the same degree of vacuum, are connected to the same vacuum. A vacuum processing device characterized by being connected to a pump. 2. The preliminary vacuum chamber for introducing the workpiece and the preliminary vacuum chamber for sending out the workpiece having the same degree of vacuum are located at the same position as viewed from the vacuum processing tank. The vacuum processing apparatus according to claim 1, which is a preliminary vacuum chamber for use in a vacuum processing apparatus.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP12386090A JPH03267138A (en) | 1990-05-14 | 1990-05-14 | Vacuum treating device |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP12386090A JPH03267138A (en) | 1990-05-14 | 1990-05-14 | Vacuum treating device |
Related Parent Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP8492380A Division JPS5718737A (en) | 1980-06-21 | 1980-06-21 | Apparatus for continuous plasma treatment |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH03267138A JPH03267138A (en) | 1991-11-28 |
| JPH0448492B2 true JPH0448492B2 (en) | 1992-08-06 |
Family
ID=14871183
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP12386090A Granted JPH03267138A (en) | 1990-05-14 | 1990-05-14 | Vacuum treating device |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH03267138A (en) |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN103057133A (en) * | 2011-10-19 | 2013-04-24 | 苏州市奥普斯等离子体科技有限公司 | Treatment method and device for modification plasma on a high polymer material surface |
-
1990
- 1990-05-14 JP JP12386090A patent/JPH03267138A/en active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPH03267138A (en) | 1991-11-28 |
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