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JPH0453092B2 - - Google Patents
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JPH0453092B2 - - Google Patents

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Publication number
JPH0453092B2
JPH0453092B2 JP60285336A JP28533685A JPH0453092B2 JP H0453092 B2 JPH0453092 B2 JP H0453092B2 JP 60285336 A JP60285336 A JP 60285336A JP 28533685 A JP28533685 A JP 28533685A JP H0453092 B2 JPH0453092 B2 JP H0453092B2
Authority
JP
Japan
Prior art keywords
furnace body
heating element
wall surface
heating
fixing
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP60285336A
Other languages
Japanese (ja)
Other versions
JPS62144334A (en
Inventor
Shunichi Kageyama
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Tokyo Electron Sagami Ltd
Original Assignee
Tokyo Electron Sagami Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Tokyo Electron Sagami Ltd filed Critical Tokyo Electron Sagami Ltd
Priority to JP28533685A priority Critical patent/JPS62144334A/en
Publication of JPS62144334A publication Critical patent/JPS62144334A/en
Publication of JPH0453092B2 publication Critical patent/JPH0453092B2/ja
Granted legal-status Critical Current

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Description

【発明の詳細な説明】 〔産業上の利用分野〕 この発明は、反応管に収容した半導体ウエーハ
などの被加熱物の加熱処理に用いられる加熱装置
に関する。
DETAILED DESCRIPTION OF THE INVENTION [Field of Industrial Application] The present invention relates to a heating device used for heat treatment of an object to be heated, such as a semiconductor wafer, housed in a reaction tube.

〔従来の技術〕[Conventional technology]

従来、半導体処理において用いられる加熱装置
は、半導体ウエーハを収容する円筒状の反応管の
周面を覆う形態を持ち、その反応管の周面に対し
て均等な加熱を行うための発熱体を配設したもの
である。
Conventionally, heating devices used in semiconductor processing have a configuration that covers the circumferential surface of a cylindrical reaction tube that houses a semiconductor wafer, and a heating element is arranged to uniformly heat the circumferential surface of the reaction tube. It was established.

そして、半導体ウエーハの加熱処理は、半導体
ウエーハを収容した反応管を加熱装置の端面開口
部から挿入して行い、加熱処理を終了した半導体
ウエーハは反応管とともに加熱装置の端面開口部
から引出すようにしている。
The heat treatment of the semiconductor wafer is performed by inserting the reaction tube containing the semiconductor wafer through the end opening of the heating device, and the semiconductor wafer that has undergone the heat treatment is pulled out together with the reaction tube from the end opening of the heating device. ing.

〔発明が解決しようとする問題点〕[Problem that the invention seeks to solve]

ところで、加熱装置に対して反応管を長手方向
に出入させることは、加熱装置の端面側に反応管
を出入させるための反応管の長さ以上のスペース
を必要とするとともに、その出入時間が長く、と
りわけ、冷却のために加熱装置から反応管を引き
出す際に、加熱装置の余熱が反応管内の半導体ウ
エーハに作用し、冷却速度に限界を生じる。
By the way, moving the reaction tube in and out of the heating device in the longitudinal direction requires a space larger than the length of the reaction tube on the end face side of the heating device, and also takes a long time to move the reaction tube in and out. In particular, when the reaction tube is pulled out from the heating device for cooling, residual heat from the heating device acts on the semiconductor wafer inside the reaction tube, putting a limit on the cooling rate.

半導体ウエーハの冷却について、半導体装置に
よつては、その急速冷却の効果が直接にその特性
に影響を与える場合があり、急速冷却の要請が高
まつている。
Regarding the cooling of semiconductor wafers, the effect of rapid cooling may directly affect the characteristics of some semiconductor devices, and the demand for rapid cooling is increasing.

このような要請に応えて、半導体ウエーハの急
速な加熱および冷却を実現するため、炉体を直径
方向に分割可能に構成し、炉体に対して反応管を
その直径方向に着脱するようにした加熱装置が提
案されている。
In response to these demands, in order to achieve rapid heating and cooling of semiconductor wafers, the furnace body was configured to be divisible in the diametrical direction, and the reaction tubes were attached to and removed from the furnace body in the diametrical direction. A heating device has been proposed.

そこで、この発明は、炉体の内壁面に設置され
た発熱素線の垂れ下がりなどの変形を防止した加
熱装置の提供を目的とする。
SUMMARY OF THE INVENTION Therefore, an object of the present invention is to provide a heating device that prevents deformation such as hanging of the heating element wire installed on the inner wall surface of a furnace body.

〔問題点を解決するための手段〕[Means for solving problems]

この発明の加熱装置は、第1図に示すように、
円筒状の炉体2と、この炉体の内壁面に露出して
設けられた発熱素線4と、この発熱素線の複数本
を固定する如く円弧状凹部6が形成された絶縁性
帯状固定片(固定片8)と、この固定片を固定支
持する押え板10と、この押え板により上記固定
片を介して上記発熱素線を上記炉体に固定する如
く上記炉体の外壁面で固定する固定機構(固定ボ
ルト18及びナツト26)と、この固定機構およ
び上記炉体外壁面間に介在する断熱リング24と
を具備してなるものである。
As shown in FIG. 1, the heating device of this invention has the following features:
A cylindrical furnace body 2, a heating element wire 4 provided exposed on the inner wall surface of the furnace body, and an insulating band-shaped fixing member having an arcuate recess 6 formed therein to secure a plurality of the heating element wires. piece (fixing piece 8), a presser plate 10 that fixedly supports the fixing piece, and the presser plate fixes the heating element wire to the furnace body through the fixing piece on the outer wall surface of the furnace body. The furnace is equipped with a fixing mechanism (fixing bolt 18 and nut 26), and a heat insulating ring 24 interposed between the fixing mechanism and the outer wall surface of the furnace body.

〔作用〕[Effect]

この発明の加熱装置では、炉体の内壁面に発熱
素線が強固に固定されるので、発熱時、炉体の内
壁面からの垂れ下がりなどの発熱素線の変形が防
止でき、発熱温度の均一化や安定化が図られる。
In the heating device of this invention, since the heating element wire is firmly fixed to the inner wall surface of the furnace body, deformation of the heating element wire such as hanging from the inner wall surface of the furnace body during heat generation can be prevented, and the heating temperature is uniform. and stabilization.

〔実施例〕〔Example〕

以下、この発明の実施例を図面を参照して説明
する。
Embodiments of the present invention will be described below with reference to the drawings.

第1図は、この発明の加熱装置の一実施例を示
す。
FIG. 1 shows an embodiment of the heating device of the present invention.

第1図に示すように、炉体2の内壁面には、発
熱体として複数本の発熱素線4が配置され、各発
熱素線4にはその周面の一部を覆う円弧状を成す
凹部6が例えば2箇所に持つ絶縁性材料で形成さ
れた帯状の固定片8が当てられる。すなわち、発
熱素線4は、炉体2と固定片8とで把持されるよ
うにする。そして、この固定片8の外面には固定
片8を固定支持する押え板10を当て、この押え
板10および固定片8にはそれぞれ透孔12,1
4が形成されるとともに、炉体2にも透孔16が
形成されている。これら透孔12,14,16に
対して固定機構としての固定ボルト18を貫通さ
せ、炉体2の外壁面を成す補強板20の外面に突
出させた固定ボルト18にワツヤ22および断熱
リング24を取り付けるとともに、固定ボルト1
8のねじ部に固定ボルト18とともに固定機構を
成すナツト26を取り付ける。
As shown in FIG. 1, a plurality of heating element wires 4 are arranged as heating elements on the inner wall surface of the furnace body 2, and each heating element wire 4 has an arc shape that covers a part of its circumferential surface. A band-shaped fixing piece 8 made of an insulating material is applied to the recess 6, for example, at two locations. That is, the heating element wire 4 is held by the furnace body 2 and the fixed piece 8. A presser plate 10 for fixedly supporting the fixing piece 8 is placed on the outer surface of the fixing piece 8, and the presser plate 10 and the fixing piece 8 have through holes 12 and 1, respectively.
4 is formed, and a through hole 16 is also formed in the furnace body 2. Fixing bolts 18 as a fixing mechanism are passed through these through holes 12, 14, and 16, and a wire 22 and a heat insulating ring 24 are attached to the fixing bolts 18 that protrude from the outer surface of the reinforcing plate 20 that forms the outer wall surface of the furnace body 2. At the same time as installing, fixing bolt 1
A nut 26, which forms a fixing mechanism together with the fixing bolt 18, is attached to the threaded portion of the bolt 8.

したがつて、発熱素線4は、炉体2の内壁面に
対して強固に固定でき、炉体2の下方の内壁面お
よび上方の内壁面の区別なく強固な固定状態が得
られ、発熱素線4の発熱時の垂れ下がりなどの変
形を防止できる。
Therefore, the heating element wire 4 can be firmly fixed to the inner wall surface of the furnace body 2, and a strong fixed state can be obtained without distinction between the lower inner wall surface and the upper inner wall surface of the furnace body 2. Deformation such as hanging of the wire 4 when it generates heat can be prevented.

次に、第2図は、この加熱装置の一実施例の全
体構成を示す。
Next, FIG. 2 shows the overall configuration of one embodiment of this heating device.

この加熱装置は、第2図に示すように、円筒状
を成す炉本体を縦方向に分割して2つの炉体2
A,2Bとし、各炉体2A,2Bは、支持台28
の上面部に一定の間隔で取り付けた支柱30に支
持軸32を介して個別に回動可能に支持されてい
るとともに、開閉機構34を介して開閉および所
望の開度に保持されるようになつている。
As shown in Fig. 2, this heating device is constructed by vertically dividing a cylindrical furnace body into two furnace bodies 2.
A, 2B, and each furnace body 2A, 2B has a support stand 28.
They are individually rotatably supported via support shafts 32 on columns 30 attached at regular intervals on the top surface, and are opened and closed and held at a desired opening degree via an opening/closing mechanism 34. ing.

そして、各炉体2A,2Bの内部には被加熱物
としての半導体ウエーハを入れた円筒状の反応管
を収容する収容部36が形成されている。
Inside each of the furnace bodies 2A and 2B, a housing section 36 is formed to house a cylindrical reaction tube containing a semiconductor wafer as an object to be heated.

各炉体2A,2Bの収容部36は、セラミツク
などの断熱材によつて形成され、この収容部36
の内壁面には、第3図に示すように、発熱体とし
ての発熱素線4が収容部36の湾曲した内壁面に
沿いかつ端部を千鳥状に折り曲げられて配設され
ている。この場合、発熱素線4には、直径6.5mm
程度の比較的太い素線が用いられている。
The housing portion 36 of each furnace body 2A, 2B is formed of a heat insulating material such as ceramic.
As shown in FIG. 3, heating element wires 4 as heating elements are arranged along the curved inner wall surface of the housing portion 36 with their ends bent in a staggered manner. In this case, the heating element wire 4 has a diameter of 6.5 mm.
Relatively thick strands of about 100 mL are used.

そして、発熱素線4は、断熱材料によつて形成
されたスペーサ38によつて一定の間隔に配置さ
れているとともに、炉体2A,2Bに取り付けら
れ、第4図に示すように、第1図に示す固定装置
によつて固定されている。
The heating element wires 4 are arranged at regular intervals by spacers 38 made of a heat insulating material, and are attached to the furnace bodies 2A, 2B, as shown in FIG. It is fixed by the fixing device shown in the figure.

なお、発熱素線4の端子間には、駆動源として
の直流電源が接続され、その電流制御によつて、
特定の温度で発熱させることができる。
Note that a DC power source as a driving source is connected between the terminals of the heating element wire 4, and by controlling the current,
It can generate heat at a specific temperature.

したがつて、発熱素線4は炉体2A,2Bの被
加熱物を収容する収容部36の内壁面に沿つて組
み込まれ、一定の間隔で配設されているので、半
導体ウエーハを収容した反応管などを均等に加熱
して所定の処理を行うことができる。
Therefore, the heating element wires 4 are incorporated along the inner wall surface of the accommodating part 36 that accommodates the objects to be heated in the furnace bodies 2A and 2B, and are arranged at regular intervals, so that the heating element wires 4 are installed along the inner wall surface of the accommodating part 36 that accommodates the objects to be heated in the furnace bodies 2A and 2B, and are arranged at regular intervals. It is possible to uniformly heat pipes and perform predetermined treatments.

また、発熱素線4に6.5mm程度の太い形状のも
のを用いることができるので、固定手段によつて
確実に炉体2A,2Bの内部に強固に固定でき、
炉内温度による変形を防止できるので、温度分布
を均一に維持することができるとともに、安定し
た加熱状態を保持でき、加熱寿命を長くすること
ができる。
In addition, since the heating element wire 4 can be of a thick shape of about 6.5 mm, it can be firmly fixed inside the furnace bodies 2A, 2B by the fixing means.
Since deformation due to the temperature inside the furnace can be prevented, a uniform temperature distribution can be maintained, a stable heating state can be maintained, and the heating life can be extended.

なお、実施例では、被加熱物として半導体ウエ
ーハを加熱する炉体を例にとつて説明したが、こ
の発明の加熱装置は、半導体ウエーハ以外の被加
熱物の加熱処理にも用いることができる。
In the embodiments, a furnace body for heating a semiconductor wafer as an object to be heated has been described as an example, but the heating apparatus of the present invention can also be used for heat treatment of objects to be heated other than semiconductor wafers.

〔発明の効果〕〔Effect of the invention〕

以上説明したように、この発明によれば、炉体
の壁面に対して発熱素線を簡単に固定できるとと
もに、発熱素線の固定を強固にできるので、発熱
時の垂れ下がりなど、発熱素線の変形を防止で
き、発熱温度の均一化とともに、発熱温度の安定
化を図ることができる。
As explained above, according to the present invention, the heating element wire can be easily fixed to the wall surface of the furnace body, and the heating element wire can be firmly fixed, so that the heating element wire can be prevented from sagging when generating heat. Deformation can be prevented, the heat generation temperature can be made uniform, and the heat generation temperature can be stabilized.

【図面の簡単な説明】[Brief explanation of drawings]

第1図はこの発明の加熱装置の一実施例を示す
分解斜視図、第2図はこの発明の加熱装置を示す
斜視図、第3図はこの発明の加熱装置における炉
体内の構成を示す斜視図、第4図は第3図に示し
た加熱装置における発熱素線の固定構造を示す断
面図である。 2,2A,2B……炉体、4……発熱素線、6
……凹部、8……固定片、10……押え板、18
……固定ボルト(固定機構)、24……断熱リン
グ、26……ナツト(固定機構)。
Fig. 1 is an exploded perspective view showing an embodiment of the heating device of the present invention, Fig. 2 is a perspective view showing the heating device of the invention, and Fig. 3 is a perspective view showing the internal configuration of the furnace body in the heating device of the invention. 4 are cross-sectional views showing the fixing structure of the heating element wire in the heating device shown in FIG. 3. 2, 2A, 2B...Furnace body, 4...Heating element wire, 6
... recess, 8 ... fixed piece, 10 ... presser plate, 18
... Fixing bolt (fixing mechanism), 24... Heat insulation ring, 26... Nut (fixing mechanism).

Claims (1)

【特許請求の範囲】 1 円筒状の炉体と、 この炉体の内壁面に露出して設けられた発熱素
線と、 この発熱素線の複数本を固定する如く円弧状凹
部が形成された絶縁性帯状固定片と、 この固定片を固定支持する押え板と、 この押え板により上記固定片を介して上記発熱
素線を上記炉体に固定する如く上記炉体の外壁面
で固定する固定機構と、 この固定機構および上記炉体外壁面間に介在す
る断熱リングと、 を具備してなることを特徴とする加熱装置。
[Scope of Claims] 1. A cylindrical furnace body, a heating element wire provided exposed on the inner wall surface of the furnace body, and an arcuate recess formed to fix a plurality of the heating element wires. an insulating strip-shaped fixing piece; a holding plate that fixes and supports the fixing piece; and a fixing device that fixes the heat-generating wire on the outer wall surface of the furnace body using the holding plate so as to fix the heating element wire to the furnace body via the fixing piece. A heating device comprising: a mechanism; and a heat insulating ring interposed between the fixing mechanism and the outer wall surface of the furnace body.
JP28533685A 1985-12-18 1985-12-18 Fixing device for heating element Granted JPS62144334A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP28533685A JPS62144334A (en) 1985-12-18 1985-12-18 Fixing device for heating element

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP28533685A JPS62144334A (en) 1985-12-18 1985-12-18 Fixing device for heating element

Publications (2)

Publication Number Publication Date
JPS62144334A JPS62144334A (en) 1987-06-27
JPH0453092B2 true JPH0453092B2 (en) 1992-08-25

Family

ID=17690230

Family Applications (1)

Application Number Title Priority Date Filing Date
JP28533685A Granted JPS62144334A (en) 1985-12-18 1985-12-18 Fixing device for heating element

Country Status (1)

Country Link
JP (1) JPS62144334A (en)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2760855B2 (en) * 1989-08-12 1998-06-04 宮城沖電気株式会社 Heating element structure in heat treatment apparatus for semiconductor manufacturing and heat treatment method for semiconductor device
JP2011091386A (en) * 2009-09-24 2011-05-06 Semiconductor Energy Lab Co Ltd Heat treatment apparatus, heat treatment method and method for manufacturing semiconductor device

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5854636Y2 (en) * 1979-08-23 1983-12-13 株式会社リケン Furnace support structure for heater embedded refractory molded body
JPS61287223A (en) * 1985-06-14 1986-12-17 Fujitsu Ltd Heat treating furnace

Also Published As

Publication number Publication date
JPS62144334A (en) 1987-06-27

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