JPH0454210B2 - - Google Patents
Info
- Publication number
- JPH0454210B2 JPH0454210B2 JP25512088A JP25512088A JPH0454210B2 JP H0454210 B2 JPH0454210 B2 JP H0454210B2 JP 25512088 A JP25512088 A JP 25512088A JP 25512088 A JP25512088 A JP 25512088A JP H0454210 B2 JPH0454210 B2 JP H0454210B2
- Authority
- JP
- Japan
- Prior art keywords
- optical
- wavelength conversion
- semiconductor laser
- substrate
- fundamental wave
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 230000003287 optical effect Effects 0.000 claims description 93
- 238000006243 chemical reaction Methods 0.000 claims description 48
- 239000004065 semiconductor Substances 0.000 claims description 40
- 239000000758 substrate Substances 0.000 claims description 29
- 239000006096 absorbing agent Substances 0.000 claims description 4
- 229940018489 pronto Drugs 0.000 claims description 3
- 229910013641 LiNbO 3 Inorganic materials 0.000 description 14
- 238000010586 diagram Methods 0.000 description 9
- NBIIXXVUZAFLBC-UHFFFAOYSA-N Phosphoric acid Chemical compound OP(O)(O)=O NBIIXXVUZAFLBC-UHFFFAOYSA-N 0.000 description 4
- WPYMKLBDIGXBTP-UHFFFAOYSA-N benzoic acid Chemical compound OC(=O)C1=CC=CC=C1 WPYMKLBDIGXBTP-UHFFFAOYSA-N 0.000 description 4
- 238000004519 manufacturing process Methods 0.000 description 4
- 239000011248 coating agent Substances 0.000 description 3
- 238000000576 coating method Methods 0.000 description 3
- 230000000644 propagated effect Effects 0.000 description 3
- 230000001681 protective effect Effects 0.000 description 3
- 239000005711 Benzoic acid Substances 0.000 description 2
- 229910000147 aluminium phosphate Inorganic materials 0.000 description 2
- 235000010233 benzoic acid Nutrition 0.000 description 2
- 230000008878 coupling Effects 0.000 description 2
- 238000010168 coupling process Methods 0.000 description 2
- 238000005859 coupling reaction Methods 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 238000000034 method Methods 0.000 description 2
- 229920002120 photoresistant polymer Polymers 0.000 description 2
- 238000010306 acid treatment Methods 0.000 description 1
- 230000005466 cherenkov radiation Effects 0.000 description 1
- 230000001427 coherent effect Effects 0.000 description 1
- 150000001875 compounds Chemical class 0.000 description 1
- XPPKVPWEQAFLFU-UHFFFAOYSA-N diphosphoric acid Chemical compound OP(O)(=O)OP(O)(O)=O XPPKVPWEQAFLFU-UHFFFAOYSA-N 0.000 description 1
- 238000001312 dry etching Methods 0.000 description 1
- 238000005566 electron beam evaporation Methods 0.000 description 1
- 238000005530 etching Methods 0.000 description 1
- 230000010365 information processing Effects 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- 239000011368 organic material Substances 0.000 description 1
- 230000010355 oscillation Effects 0.000 description 1
- 238000000059 patterning Methods 0.000 description 1
- 230000010287 polarization Effects 0.000 description 1
- 238000005498 polishing Methods 0.000 description 1
- 230000001902 propagating effect Effects 0.000 description 1
- 229940005657 pyrophosphoric acid Drugs 0.000 description 1
- 238000007493 shaping process Methods 0.000 description 1
Landscapes
- Semiconductor Lasers (AREA)
Description
【発明の詳細な説明】
産業上の利用分野
本発明は、コヒーレント光を利用する光情報処
理分野、あるいは光応用計測制御分野に使用する
光波長変換素子および短波長レーザ光源に関する
ものである。DETAILED DESCRIPTION OF THE INVENTION Field of Industrial Application The present invention relates to an optical wavelength conversion element and a short wavelength laser light source used in the field of optical information processing using coherent light or the field of optical measurement and control.
従来の技術
第6図に従来の光波長変換素子の構成図を示
す。以下0.84μmの波長の基本波に対する高調波
発生(波長0.42μm)について図を用いて詳しく
述べる。[T.Taniuchi and K.yamamoto,
“Second harmonic generation by Cherenkov
radiation in proton−exchanged LiNbO3
optical waveguide”,シーエルイーオ(CLEO)
’86,WR3,1986年、参照].LiNbO3基板1に
形成された埋め込み型光導波路2の入射面5に半
導体レーザからの基本波P1の光を入射すると、
基本波の導波モードの実効屈折率N1と高調波の
実効屈折率N2が等しくなるような条件が満足さ
れるとき、光導波路2からLiNbO3基板1内に高
調波P2の光が効率良く放射され、光波長変換素
子として動作する。 Prior Art FIG. 6 shows a configuration diagram of a conventional optical wavelength conversion element. Below, harmonic generation (wavelength 0.42 μm) for the fundamental wave with a wavelength of 0.84 μm will be described in detail using a diagram. [T.Taniuchi and K.yamamoto,
“Second harmonic generation by Cherenkov
radiation in proton−exchanged LiNbO 3
optical waveguide”, CLEO
'86, WR3, 1986, see]. When the fundamental wave P1 light from the semiconductor laser is incident on the entrance surface 5 of the buried optical waveguide 2 formed on the LiNbO 3 substrate 1,
When the condition that the effective refractive index N1 of the waveguide mode of the fundamental wave is equal to the effective refractive index N2 of the harmonic is satisfied, the light of the harmonic P2 is efficiently radiated from the optical waveguide 2 into the LiNbO 3 substrate 1. and operates as an optical wavelength conversion element.
このような従来の光波長変換素子は埋め込み型
の光導波路を基本構成要素としていた。この埋め
込み型光導波路の製造方法について説明する。強
誘電体基板であるLiNbO3基板1にCrまたはAl等
を蒸着し、フオトプロセスおよびエツチングによ
り幅数μmのスリツトを開けたものを安息香酸中
で熱処理を行い光導波路2となる高屈折率層(基
板との屈折率差ΔNe=0.13程度)を形成してい
た。[J.L.Jackel,C.E.Rice,and J.J.Veselka,
“Proton exchange for high−index
waveguides in LiNbO3 ”Appl.phys.Left.(ア
プライド フイジツクス レター),Vo141,
No.7,pp607−608(1982)]参照
上記安息香酸処理により作製される光波長変換
素子は半導体レーザからの波長0.84μmの基本波
P1に対して導波路の厚み0.5μmで最大変換効率を
示し、導波路の長さを6mm、P1=40mWにした
ときP2=0.4mWの高調波が得られていた。この
場合の変換効率P1/P2は1%である。 Such conventional optical wavelength conversion elements have a buried optical waveguide as a basic component. A method of manufacturing this buried optical waveguide will be explained. Cr or Al is deposited on a LiNbO 3 substrate 1, which is a ferroelectric substrate, and slits of several μm in width are made by photoprocessing and etching, and then heat treated in benzoic acid to form a high refractive index layer that will become the optical waveguide 2. (Refractive index difference ΔNe with the substrate was about 0.13). [JLJackel, CERice, and JJVeselka,
“Proton exchange for high−index
waveguides in LiNbO 3 ”Appl.phys.Left. (Applied Physics Letter), Vo141,
No.7, pp607-608 (1982)] The optical wavelength conversion element produced by the benzoic acid treatment described above is a fundamental wave with a wavelength of 0.84 μm from a semiconductor laser.
For P1, the maximum conversion efficiency was shown at a waveguide thickness of 0.5 μm, and when the waveguide length was 6 mm and P1 = 40 mW, a harmonic of P2 = 0.4 mW was obtained. The conversion efficiency P1/P2 in this case is 1%.
発明が解決しようとする課題
上記のような半導体レーザを基本とした光波長
変換素子では光波長変換素子の基本波の入射面お
よび出射面からの戻り光のため半導体レーザの出
力および縦モードが変動し、そのため発生する高
調波の出力が±20%程度の変動を生じ一定になら
ないといつた問題点があつた。特に出射面よりの
戻り光は縦モード変動に大きく寄与していた。そ
のため短波長レーザ光源の実用レベルである
1mW以上の高調波を安定に得ることが困難であ
つた。Problems to be Solved by the Invention In an optical wavelength conversion element based on a semiconductor laser as described above, the output and longitudinal mode of the semiconductor laser fluctuate due to the return light from the entrance surface and output surface of the fundamental wave of the optical wavelength conversion element. However, there was a problem in that the output of the generated harmonics fluctuated by about ±20% and was not constant. In particular, the return light from the exit surface greatly contributed to longitudinal mode fluctuations. Therefore, it is at a practical level for short wavelength laser light sources.
It was difficult to stably obtain harmonics of 1 mW or more.
課題を解決するための手段
本発明は、半導体レーザを基本とした光波長変
換素子の構造に新たな工夫を加えることにより高
調波出射パワーの高出力化および安定化を可能と
するものである。Means for Solving the Problems The present invention makes it possible to increase and stabilize harmonic output power by adding new ideas to the structure of an optical wavelength conversion element based on a semiconductor laser.
そのために本発明の光波長変換装置は、半導体
レーザと、非線形光学効果を有する基板と、前記
基板上に形成した光導波路とを備え、前記半導体
レーザから出射した基本波は、前記光導波路の一
端面から入射して前記光導波路中を伝搬し、前記
光導波路から前記基板中へ高調波を放射し、前記
半導体レーザが高調波重畳されているという手段
を用いるものである。 To this end, the optical wavelength conversion device of the present invention includes a semiconductor laser, a substrate having a nonlinear optical effect, and an optical waveguide formed on the substrate, and the fundamental wave emitted from the semiconductor laser is transmitted to one of the optical waveguides. A method is used in which harmonics are incident on the end face and propagated through the optical waveguide, and are radiated from the optical waveguide into the substrate, so that the semiconductor laser is harmonic-superimposed.
さらに、光導波路の出射部に散乱体または吸収
体とを形成することにより、前記光導波路の出射
部で半導体レーザからの基本波を散乱または吸収
させるという手段を用いるものである。 Furthermore, by forming a scatterer or an absorber at the output part of the optical waveguide, the fundamental wave from the semiconductor laser is scattered or absorbed at the output part of the optical waveguide.
作 用
上記手段により基本波を発生する半導体レーザ
へ高周波重畳することで戻り光による変動が生じ
にくくなり、さらに光波長変換素子の出射部での
戻り光による出力および縦モードの変動が防止で
き、それによつて生じる高調波出力に対しても安
定化が図れる。Effect By superimposing a high frequency on the semiconductor laser that generates the fundamental wave by the above means, fluctuations due to returned light are less likely to occur, and furthermore, fluctuations in the output and longitudinal mode due to returned light at the emission part of the optical wavelength conversion element can be prevented. The resulting harmonic output can also be stabilized.
実施例
実施例の一つとして本発明の光波長変換装置に
用いる光波長変換素子を図を用いて説明する。本
発明の光波長変換素子の実施例構成図を第1図に
示す。この実施例では光波長変換素子として
LiNbO3基板1上に作製したプロトン交換光導波
路を用いたもので、第1図aは光波長変換素子の
斜視図、bは光導波路に平行な面で切つた断面図
である。第1図で1は+Z板(Z軸と垂直に切り
出された基板の+側)のLiNbO3基板、2は燐酸
中でのプロトン交換処理により形成された光導波
路、3は基本波P1の入射部、4は基本波の出射
部である。フオーカスレンズにより集光された基
本波P1は入射部3の入射面5よりLiNbO3基板1
に入る。プロント交換光導波路2は入射面5まで
到達していない。基本波P1の入射部3より入つ
た半導体レーザ光P1は光導波路2内部で高調波
P2に変換され、LiNbO3基板1内に放射される。
このとき高調波P2に変換されずに伝搬していつ
た大部分の基本波は出射部4で散乱される。この
ため半導体レーザには基本波は戻らないため半導
体レーザの出力および縦モードは安定になる。こ
れに伴い高調波の出力も安定となる。Embodiment As one of the embodiments, an optical wavelength conversion element used in the optical wavelength conversion device of the present invention will be described with reference to the drawings. FIG. 1 shows a configuration diagram of an embodiment of the optical wavelength conversion element of the present invention. In this example, as an optical wavelength conversion element.
This device uses a proton exchange optical waveguide fabricated on a LiNbO 3 substrate 1. FIG. 1a is a perspective view of the optical wavelength conversion element, and FIG. 1b is a cross-sectional view taken along a plane parallel to the optical waveguide. In Figure 1, 1 is the LiNbO 3 substrate of the +Z plate (the + side of the substrate cut perpendicular to the Z axis), 2 is the optical waveguide formed by proton exchange treatment in phosphoric acid, and 3 is the incident fundamental wave P1. Section 4 is a fundamental wave emission section. The fundamental wave P1 focused by the focus lens is transmitted to the LiNbO 3 substrate 1 from the entrance surface 5 of the entrance section 3.
to go into. The pronto exchange optical waveguide 2 does not reach the entrance surface 5. Semiconductor laser light P1 entering from the incident part 3 of the fundamental wave P1 generates harmonics inside the optical waveguide 2.
It is converted into P2 and radiated into the LiNbO 3 substrate 1.
At this time, most of the fundamental wave propagating without being converted into harmonics P2 is scattered at the output section 4. Therefore, since the fundamental wave does not return to the semiconductor laser, the output and longitudinal mode of the semiconductor laser become stable. Along with this, the harmonic output also becomes stable.
次にこの光波長変換素子の製造方法について図
を使つて説明する。第2図に本発明の光波長変換
素子の製造工程図を示す。まず入射部3以外の部
分をエツチングによりLiNbO3基板1を2μm程エ
ツチングした。具体的には入射部3の上部をTa
マスクでおおい、ドライエツチングによりエツチ
ングを行つた。次に同図aにおいてLiNbO3基板
1にTaによる保護マスク10を電子ビーム蒸着
により300A蒸着を行つた。次に同図bで保護マ
スク10上に通常のフオトプロセスにより厚み
0.5μmのフオトレジスト11をパターン化した後
CF4によりTaによる保護マスク10をドライエ
ツチングした。次にフオトレジスト11を除去し
た後、同図CでLiNbO3基板1に燐酸の一種であ
るピロ燐酸中で230℃、5分間熱処理(プロトン
交換処理)を行い厚み0.37μmの光導波路2を形
成した後、保護マスク10を除去する。次に光導
波路2に垂直な面を光学研磨し第1図に示される
基本波の入射面5および高調波の出射面6を形成
する。しかる後、出射面6のエツジとなる基本波
の出射部4を荒研磨で基本波が散乱するように荒
す。最後に入射面5に基本波に対する反射防止膜
作製(ARコート)、そして出射面6に高調波に
対するARコートを施すことにより光波長変換素
子が作製できる。この入射面5のARコート5′
は半導体レーザへの戻り光防止のためである。作
製されたこの素子の長さは6mmである。第1図b
で基本波P1として半導体レーザ光(波長0.84μm)
を入射部3より導波させたところシングルモード
伝搬し、波長0.42μmの高調波P2が出射面6より
基板外部に取り出された。半導体レーザと光導波
路との結合効率は55%と従来のもの(40%)に比
べて大幅に向上した。また、出射面6が高調波に
対してARコートされていることにより高調波の
出力が有効に取り出せ15%のアツプが図れた。基
本波40mWの入力で1mWの高調波(波長0.42μm)
を得た。また反射光が大幅に減らすことができた
ため半導体レーザは安定に動作し高調波出力の変
動は±3%以下であつた。さらに半導体レーザに
高調波重畳を行うと高調波出力の変動±1%以下
に抑えることができた。 Next, a method for manufacturing this optical wavelength conversion element will be explained using figures. FIG. 2 shows a manufacturing process diagram of the optical wavelength conversion element of the present invention. First, the LiNbO 3 substrate 1 was etched by approximately 2 μm except for the entrance portion 3. Specifically, the upper part of the entrance part 3 is Ta
It was covered with a mask and etched by dry etching. Next, as shown in FIG. 1A, a protective mask 10 made of Ta was deposited on the LiNbO 3 substrate 1 at a thickness of 300 A by electron beam evaporation. Next, as shown in Figure b, the thickness is
After patterning 0.5μm photoresist 11
The Ta protective mask 10 was dry etched using CF 4 . Next, after removing the photoresist 11, the LiNbO 3 substrate 1 is heat-treated (proton exchange treatment) at 230°C for 5 minutes in pyrophosphoric acid, which is a type of phosphoric acid, to form an optical waveguide 2 with a thickness of 0.37 μm, as shown in FIG. After that, the protective mask 10 is removed. Next, a surface perpendicular to the optical waveguide 2 is optically polished to form a fundamental wave entrance surface 5 and a harmonic output surface 6 shown in FIG. Thereafter, the fundamental wave output section 4, which forms the edge of the output surface 6, is roughened by rough polishing so that the fundamental wave is scattered. Finally, an optical wavelength conversion element can be manufactured by forming an antireflection film (AR coating) on the incident surface 5 for the fundamental wave and applying an AR coating on the output surface 6 for harmonic waves. AR coating 5' on this incident surface 5
This is to prevent light from returning to the semiconductor laser. The length of this fabricated element is 6 mm. Figure 1b
Semiconductor laser light (wavelength 0.84 μm) is used as the fundamental wave P1.
When the wave was guided through the input section 3, single mode propagation occurred, and a harmonic wave P2 with a wavelength of 0.42 μm was extracted from the output surface 6 to the outside of the substrate. The coupling efficiency between the semiconductor laser and the optical waveguide was 55%, which was significantly improved compared to the conventional one (40%). Furthermore, since the output surface 6 is AR-coated against harmonics, the output of harmonics can be effectively extracted and increased by 15%. 1mW harmonic (wavelength 0.42μm) with fundamental wave 40mW input
I got it. Furthermore, since the amount of reflected light could be significantly reduced, the semiconductor laser operated stably, with fluctuations in harmonic output being less than ±3%. Furthermore, by performing harmonic superposition on the semiconductor laser, it was possible to suppress the variation in harmonic output to less than ±1%.
なお基本波に対してマルチモード伝搬では高周
波の出力が不安定で実用的ではない。また、0.65
〜1.6μmの波長の基本波を用いて本光波長変換素
子による高調波発生を確認した。 Note that multimode propagation is not practical because the high frequency output is unstable compared to the fundamental wave. Also, 0.65
We confirmed harmonic generation by this optical wavelength conversion device using a fundamental wave with a wavelength of ~1.6 μm.
次に本発明の光波長変換装置の実施例について
図を用いて説明する。第3図に短波長レーザ光源
の構成図を示す。第3図で半導体レーザ21は
0.78μmの発振波長のものでCW電源22より一定
電流をまた高調波重畳回路23よりサイン状の高
周波が印加されており平均パワー50mWの基本波
P1が出射されている。この基本波P1がレンズ2
4,25および半波長板26を用いて光波長変換
素子27に入射し高調波P2が発生する。半波長
板26は半導体レーザ21と光波長変換素子27
に形成された光導波路2との偏光方向を一致させ
るために挿入した。また、光導波路2の出射部4
はやすりにより基本波P1が散乱するように荒さ
れている。この光波長変換装置では1mWの高調
波が得られ変換効率は2%であつた。また、高調
波の安定性は±1%以下であつた。第4図に半導
体レーザに対する入射電流波形を示す。本実施例
では同図aのように600MHzのサイン状の波形が
重畳されているが同図b,cのような区形波、三
角波などを用いても半導体レーザの安定化が図れ
波形の形状に大きく依存しない。他に同図dのよ
うに高調波のみでも安定動作が可能である。また
周波数は1MHz程度でも安定動作を確認した。ま
た本実施例ではMgOがドーピングされている基
板を用いると短波長の光に対しても光損傷が防止
でき高調波の出力変動がない。 Next, embodiments of the optical wavelength conversion device of the present invention will be described with reference to the drawings. FIG. 3 shows a configuration diagram of a short wavelength laser light source. In FIG. 3, the semiconductor laser 21 is
The oscillation wavelength is 0.78μm, and a constant current is applied from the CW power supply 22 and a sine-shaped high frequency is applied from the harmonic superimposition circuit 23, and the fundamental wave has an average power of 50mW.
P1 is being emitted. This fundamental wave P1 is the lens 2
4, 25 and the half-wave plate 26, the light enters the optical wavelength conversion element 27 and a harmonic wave P2 is generated. The half-wave plate 26 includes the semiconductor laser 21 and the optical wavelength conversion element 27
This was inserted in order to match the polarization direction with the optical waveguide 2 formed in . In addition, the output part 4 of the optical waveguide 2
The file has been roughened so that the fundamental wave P1 is scattered. With this optical wavelength conversion device, harmonics of 1 mW were obtained and the conversion efficiency was 2%. Further, the stability of harmonics was ±1% or less. FIG. 4 shows the incident current waveform for the semiconductor laser. In this example, a 600MHz sine-shaped waveform is superimposed as shown in figure a, but the semiconductor laser can also be stabilized by using a square wave, a triangular wave, etc. as shown in figure b and c, and the waveform shape does not depend heavily on In addition, stable operation is possible with only harmonics as shown in d of the same figure. We also confirmed stable operation at a frequency of around 1MHz. Furthermore, in this embodiment, by using a substrate doped with MgO, optical damage can be prevented even with short wavelength light, and there is no harmonic output fluctuation.
次に本発明の光波長変換装置を基本波の波長
1.3μmの半導体レーザと波長0.8μmの半導体レー
ザおよび光波長変換素子により構成したものにつ
いて説明する。第5図において31は波長1.3μm
の半導体レーザ、32は波長0.86μmの半導体レ
ーザ、27は光波長変換素子である。この実施例
ではそれぞれの半導体レーザは光波長変換素子に
直接結合されている。つまりレンズを用いない結
合を行つている。入射導波路33,34を伝搬し
た基本波P1,P3はY分岐35で合波され光導波
路2に入りここで変換され和周波P2(波長
0.52μm)として放射される。光導波路2を伝搬
し端部まで達した基本波P1,P3は出射部4で散
乱され、半導体レーザには戻り光がなく安定に動
作する。出射部4はCO2レーザを用いて基本波が
散乱するように加工を行つた。半導体レーザ3
1,32のそれぞれに高周波重畳を行うことによ
り和周波P2がさらに安定に得られた。このよう
に本構成は和周波発生にも有効である。 Next, the optical wavelength conversion device of the present invention is converted to the wavelength of the fundamental wave.
A structure composed of a 1.3 μm semiconductor laser, a 0.8 μm wavelength semiconductor laser, and an optical wavelength conversion element will be described. In Figure 5, 31 is the wavelength of 1.3μm
32 is a semiconductor laser with a wavelength of 0.86 μm, and 27 is an optical wavelength conversion element. In this embodiment, each semiconductor laser is directly coupled to an optical wavelength conversion element. In other words, coupling is performed without using lenses. The fundamental waves P1 and P3 propagated through the input waveguides 33 and 34 are multiplexed at the Y branch 35, enter the optical waveguide 2, and are converted here into the sum frequency P2 (wavelength
0.52μm). The fundamental waves P1 and P3 that have propagated through the optical waveguide 2 and reached the end thereof are scattered by the output section 4, and the semiconductor laser has no returning light and operates stably. The emission section 4 was processed using a CO 2 laser so that the fundamental wave was scattered. Semiconductor laser 3
By superimposing a high frequency on each of 1 and 32, the sum frequency P2 was obtained more stably. In this way, this configuration is also effective for generating sum frequencies.
次に本発明の光波長変換装置を光デイスクの読
み取りに応用した例について説明する。この短波
長レーザ光源により得られた高調波を整形レンズ
により発散光側を平行光になるようにビーム成形
を行い、両側ともに平行光とする。この平行光に
された高調波は偏光ビームスプリツタを通過後、
フオーカシングレンズで集光され光デイスク上に
0.6μmのスポツトを結ぶ。この反射信号は再び偏
光ビームスプリツタを通過後、受光器に入射す
る。波長0.84μm、出力60mWの半導体レーザを
用い1.4mWの高調波が放射された。 Next, an example in which the optical wavelength conversion device of the present invention is applied to reading an optical disk will be described. The harmonics obtained by this short wavelength laser light source are beam-shaped using a shaping lens so that the diverging light side becomes parallel light, so that both sides are parallel light. After this collimated harmonic passes through a polarizing beam splitter,
The light is focused by a focusing lens and onto an optical disk.
Tie the 0.6μm spots. This reflected signal passes through the polarizing beam splitter again and then enters the photoreceiver. A harmonic of 1.4 mW was emitted using a semiconductor laser with a wavelength of 0.84 μm and an output of 60 mW.
このように本発明の光波長変換装置を用いるこ
とで従来使用していた0.8μm帯の半導体レーザを
用いた光デイスクの読み取り系に比べて半分のス
ポツトに絞ることができ光デイスクの記録密度を
4倍に向上することができる。 In this way, by using the optical wavelength conversion device of the present invention, it is possible to narrow down the spot to half compared to the conventional optical disc reading system using a 0.8 μm band semiconductor laser, and the recording density of the optical disc can be reduced. It can be improved by 4 times.
なお、実施例では出射部で基本波を散乱させた
が、出射部に吸収体を塗布するなどにより基本波
を吸収することも効果的である。また、実施例で
は非線形光学定数の大きなLiNbO3を用いたが、
他にLiTaO3、KNbO3などの強誘電体、MNAな
どの有機物質、またはZnSなどの化合物半導体な
どの非線形光学定数の大きな基板であれば用いる
ことができる。 In the embodiment, the fundamental wave was scattered at the emission part, but it is also effective to absorb the fundamental wave by applying an absorber to the emission part. In addition, although LiNbO 3 with a large nonlinear optical constant was used in the example,
In addition, any substrate having a large nonlinear optical constant such as a ferroelectric material such as LiTaO 3 or KNbO 3 , an organic material such as MNA, or a compound semiconductor such as ZnS can be used.
発明の効果
以上説明したように本発明の光波長変換装置に
よれば、光波長変換素子に入射する基本波を発生
する半導体レーザを高周波印加することにより安
定な高周波パワーが得られる。また、光波長変換
素子での戻り光を防止することにより半導体レー
ザの出力および縦モード変化も起こらず安定にな
おかつ高出力な高調波が発生できる。Effects of the Invention As described above, according to the optical wavelength conversion device of the present invention, stable high frequency power can be obtained by applying high frequency to a semiconductor laser that generates a fundamental wave that is incident on the optical wavelength conversion element. Furthermore, by preventing the return light from the optical wavelength conversion element, the output and longitudinal mode of the semiconductor laser do not change, and stable high-output harmonics can be generated.
第1図a,bは本発明の光波長変換素子の斜視
図、断面図、第2図a〜cは本発明の光波長変換
素子の製造工程図、第3図は本発明の光波長変換
装置の構成図、第4図a〜dは高周波重畳により
印加される電流波形図である。第5図は本発明の
実施例の光波長変換装置の構成図、第6図a,b
は従来の光波長変換素子の平面図、断面図であ
る。
1……LiNbO3基板、2……光導波路、3……
入射部、4……出射部、21……半導体レーザ。
Figures 1 a and b are perspective views and cross-sectional views of the optical wavelength conversion element of the present invention, Figures 2 a to c are manufacturing process diagrams of the optical wavelength conversion element of the present invention, and Figure 3 is an optical wavelength conversion element of the present invention. The configuration diagram of the device and FIGS. 4a to 4d are current waveform diagrams applied by high frequency superimposition. FIG. 5 is a configuration diagram of an optical wavelength conversion device according to an embodiment of the present invention, and FIG. 6 a, b
These are a plan view and a cross-sectional view of a conventional optical wavelength conversion element. 1... LiNbO 3 substrate, 2... Optical waveguide, 3...
Incident part, 4... Output part, 21... Semiconductor laser.
Claims (1)
光導波路の一端面から入射して前記光導波路中を
伝搬し、前記光導波路から前記基板中へ高調波を
放射し、 前記半導体レーザが高調波重畳されていること
を特徴とする光波長変換装置。 2 光導波路の他端面に散乱体または吸収体とを
備え、 基本波は前記散乱体または吸収体で散乱または
吸収され、前記基本波の前記半導体レーザへの戻
りを防止することを特徴とする特許請求の範囲第
1項記載の光波長変換装置。 3 非線形光学効果を有する基板としてLiNbx
Ta1-xO3(0≦X≦1)基板を使用したことを特
徴とする特許請求の範囲第1項記載の光波長変換
装置。 4 非線形光学効果を有する基板としてMgOが
ドーピングされたLiNbxTa1-xO3(0≦X≦1)
基板を使用したことを特徴とするる特許請求の範
囲第1項記載の光波長変換装置。 5 光導波路としてプロント交換光導波路を用い
たことを特徴とする特許請求の範囲第1項記載の
光波長変換装置。 6 半導体レーザからの基本波が直接光導波路に
入射することを特徴とする特許請求の範囲第1項
記載の光波長変換装置。 7 非線形光学効果を有する基板に形成したプロ
ント交換光導波路に、前記基板の一部を介して基
本波を入射することを特徴とする特許請求の範囲
第1項記載の光波長変換装置。 8 基本波の入射部に基本波に対する反射防止膜
が形成されていることを特徴とする特許請求の範
囲第1項記載の光波長変換装置。[Claims] 1. A semiconductor laser, a substrate having a nonlinear optical effect, and an optical waveguide formed on the substrate, wherein a fundamental wave emitted from the semiconductor laser enters from one end surface of the optical waveguide. An optical wavelength conversion device, wherein the semiconductor laser propagates through the optical waveguide and radiates harmonics from the optical waveguide into the substrate, and the semiconductor laser is harmonic-superimposed. 2. A patent characterized in that the other end surface of the optical waveguide is provided with a scatterer or an absorber, the fundamental wave is scattered or absorbed by the scatterer or the absorber, and the fundamental wave is prevented from returning to the semiconductor laser. An optical wavelength conversion device according to claim 1. 3 LiNb x as a substrate with nonlinear optical effect
The optical wavelength conversion device according to claim 1, characterized in that a Ta 1-x O 3 (0≦X≦1) substrate is used. 4 LiNb x Ta 1-x O 3 doped with MgO as a substrate with nonlinear optical effect (0≦X≦1)
The optical wavelength conversion device according to claim 1, characterized in that a substrate is used. 5. The optical wavelength conversion device according to claim 1, characterized in that a pronto exchange optical waveguide is used as the optical waveguide. 6. The optical wavelength conversion device according to claim 1, wherein the fundamental wave from the semiconductor laser is directly incident on the optical waveguide. 7. The optical wavelength conversion device according to claim 1, wherein a fundamental wave is incident on a pronto exchange optical waveguide formed on a substrate having a nonlinear optical effect through a part of the substrate. 8. The optical wavelength conversion device according to claim 1, characterized in that an antireflection film for the fundamental wave is formed at the entrance portion of the fundamental wave.
Priority Applications (4)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP63255120A JPH02101438A (en) | 1988-10-11 | 1988-10-11 | Optical wavelength conversion element and short wavelength laser light source |
| US07/354,324 US4951293A (en) | 1988-05-26 | 1989-05-19 | Frequency doubled laser apparatus |
| EP89109241A EP0343591B1 (en) | 1988-05-26 | 1989-05-23 | Visible laser source |
| DE68917785T DE68917785T2 (en) | 1988-05-26 | 1989-05-23 | Laser light source for the visible area. |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP63255120A JPH02101438A (en) | 1988-10-11 | 1988-10-11 | Optical wavelength conversion element and short wavelength laser light source |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH02101438A JPH02101438A (en) | 1990-04-13 |
| JPH0454210B2 true JPH0454210B2 (en) | 1992-08-28 |
Family
ID=17274370
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP63255120A Granted JPH02101438A (en) | 1988-05-26 | 1988-10-11 | Optical wavelength conversion element and short wavelength laser light source |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH02101438A (en) |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2727936B2 (en) * | 1993-10-22 | 1998-03-18 | 日本電気株式会社 | Wavelength converter |
| JP4805550B2 (en) * | 2004-03-31 | 2011-11-02 | 株式会社島津製作所 | Wavelength conversion laser device |
-
1988
- 1988-10-11 JP JP63255120A patent/JPH02101438A/en active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPH02101438A (en) | 1990-04-13 |
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