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JPH0455135B2 - - Google Patents
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JPH0455135B2 - - Google Patents

Info

Publication number
JPH0455135B2
JPH0455135B2 JP22766287A JP22766287A JPH0455135B2 JP H0455135 B2 JPH0455135 B2 JP H0455135B2 JP 22766287 A JP22766287 A JP 22766287A JP 22766287 A JP22766287 A JP 22766287A JP H0455135 B2 JPH0455135 B2 JP H0455135B2
Authority
JP
Japan
Prior art keywords
surface layer
mold
silicon carbide
base
silicon
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP22766287A
Other languages
Japanese (ja)
Other versions
JPS6472932A (en
Inventor
Shinichiro Hirota
Hiroyuki Sawada
Tatsuro Nakajima
Hideo Wada
Chiharu Ishikura
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Tanaka Kikinzoku Kogyo KK
Original Assignee
Tanaka Kikinzoku Kogyo KK
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Tanaka Kikinzoku Kogyo KK filed Critical Tanaka Kikinzoku Kogyo KK
Priority to JP22766287A priority Critical patent/JPS6472932A/en
Publication of JPS6472932A publication Critical patent/JPS6472932A/en
Publication of JPH0455135B2 publication Critical patent/JPH0455135B2/ja
Granted legal-status Critical Current

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C03GLASS; MINERAL OR SLAG WOOL
    • C03BMANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B11/00Pressing molten glass or performed glass reheated to equivalent low viscosity without blowing
    • C03B11/06Construction of plunger or mould
    • C03B11/08Construction of plunger or mould for making solid articles, e.g. lenses
    • C03B11/084Construction of plunger or mould for making solid articles, e.g. lenses material composition or material properties of press dies therefor
    • C03B11/086Construction of plunger or mould for making solid articles, e.g. lenses material composition or material properties of press dies therefor of coated dies
    • CCHEMISTRY; METALLURGY
    • C03GLASS; MINERAL OR SLAG WOOL
    • C03BMANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B2215/00Press-moulding glass
    • C03B2215/02Press-mould materials
    • C03B2215/08Coated press-mould dies
    • C03B2215/10Die base materials
    • C03B2215/12Ceramics or cermets, e.g. cemented WC, Al2O3 or TiC
    • CCHEMISTRY; METALLURGY
    • C03GLASS; MINERAL OR SLAG WOOL
    • C03BMANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B2215/00Press-moulding glass
    • C03B2215/02Press-mould materials
    • C03B2215/08Coated press-mould dies
    • C03B2215/14Die top coat materials, e.g. materials for the glass-contacting layers
    • C03B2215/26Mixtures of materials covered by more than one of the groups C03B2215/16 - C03B2215/24, e.g. C-SiC, Cr-Cr2O3, SIALON

Landscapes

  • Engineering & Computer Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Manufacturing & Machinery (AREA)
  • Materials Engineering (AREA)
  • Organic Chemistry (AREA)
  • Re-Forming, After-Treatment, Cutting And Transporting Of Glass Products (AREA)

Description

【発明の詳现な説明】[Detailed description of the invention]

〔産業䞊の利甚分野〕 本発明はガラスをプレス成圢するための成圢型
に関し、特に、プレス成圢埌に研磚を必芁ずしな
い高粟床のガラス成圢䜓を埗るための成圢型に関
する。 〔埓来の技術〕 プレス成圢によりガラス成圢䜓を埗るための成
圢型ずしお、シリコンカヌバむドやシリコンナむ
トラむドを甚いた型特開昭52−45613号公報参
照が知られおいる。たた最近タングステンカヌ
バむドを䞻成分ずする基盀䞊に衚面局ずしお癜金
ず他の貎金属元玠からなる貎金属合金のコヌテむ
ング膜を圢成したもの特開昭60−246230号公報
参照やシリコンからなる基盀䞊に衚面局ずしお
癜金ず他の貎金属元玠からなる貎金属合金のコヌ
テむング膜を圢成したもの特開昭61−242922号
公報参照が提案されおいる。 〔発明が解決しようずする問題点〕 しかしながら、特開昭52−45613号公報におい
お開瀺されたシリコンナむトラむドやシリコンカ
ヌバむドからなる成圢型はその極衚面が酞化局ず
なりやすいため、プレス成圢時にガラスず融着し
やすいずいう欠点があ぀た。 たた特開昭60−246230号公報に開瀺された、タ
ングステンカヌバむド基盀䞊に衚面局ずしお癜金
系貎金属合金局を圢成した成圢型は、長時間に亘
぀お光孊ガラスを高枩䞋で成圢するこずによ぀お
基盀材料であるタングステンカヌバむドが酞化さ
れお面粟床が䜎䞋し、貎金属合金局が剥離しやす
く、たた成圢時のガラス成圢䜓の離型性も良くな
いずいう欠点があ぀た。 たた特開昭61−242922号公報に開瀺された成圢
型においおは、シリコン基盀䞊に衚面局ずしお蚭
けられた䞊蚘癜金系貎金属合金膜がシリコンに察
する付着性に乏しく、䞡者間の熱膚匵係数が倧き
く異なるこずから、数回のプレス成圢で簡単に貎
金属合金膜がシリコン基盀から剥離しおしたい、
か぀、癜金ずむリゞりム、オスミりム、ロゞり
ム、パラゞりム、ルテニりムず云぀た貎金属のみ
の組み合せの衚面局では、プレス成圢時のガラス
成圢䜓の離型性があたりよくないずいう欠点があ
぀た。 埓぀お本発明の目的は、䞊蚘した埓来技術の成
圢型の欠点を解消し、基盀ず衚面局ずの付着性、
ガラス成圢䜓の離型性の党おを同時に満足するガ
ラス成圢䜓の成圢型を提䟛するこずにある。 〔問題点を解決するための手段〕 本発明は䞊蚘の目的を達成するためになされた
ものであり、本発明のガラス成圢䜓の成圢型は基
盀ず衚面局を備え、衚面局が10〜90wtの癜金
ず〜40wtのニツケル及び又はクロムず
〜70wtのシリコンカヌバむドを含む少なくず
も皮の物質で構成されおいるこずを特城ずする
ものである。 以䞋、本発明を詳现に説明する。 本発明のガラス成圢䜓の成圢型は、基盀ず、該
基盀䞊に蚭けられた衚面局ずを備えたものであ
る。 先ず基盀に぀いお説明するず、基盀材料に぀い
おは、基盀ずしお䞀般に芁求される硬床、匷床お
よび耐熱性等を満足するものであれば特に限定さ
れず、シリコンカヌバむド、タングステンカヌバ
むド、シリコン、シリコンナむトラむド、サヌメ
ツトなどが䜿甚可胜である。 埌述するように、これらの材料からなる基盀
を、粟密加工しおから衚面局を0.03〜10ÎŒmコ
ヌテむングするこずにより、たたはおおよその
圢状に加工し、衚面局を〜50ÎŒmコヌテむング
した埌、この衚面局を粟密加工しお仕䞊げるこず
により、本発明の成圢型が埗られる。 基盀ずしおシリコンを甚い、このシリコン基盀
䞊に癜金を含む衚面局を蚭けた堎合には基盀ず衚
面局ずの密着性が十分でないばかりでなく、基盀
のシリコンず衚面局䞭の癜金ずが反応し、衚面に
肌荒れを生ずる。埓぀おシリコンを基盀ずしお甚
いる堎合には、これず衚面局ずの間にシリコンカ
ヌバむドの介圚局を蚭けるこずが必須条件ずな
る。 たた基盀ずしおタングステンカヌバむドを甚い
た堎合には、シリコンカヌバむドの介圚局を蚭け
た方が基盀ず䞭間局ずの間の密着性が向䞊する。
シリコンナむトラむド、サヌメツトなどの堎合に
も、介圚局を蚭けおも良い。 䞀方、シリコンカヌバむドを基盀ずする堎合
は、シリコンカヌバむドが焌結䜓の堎合、焌結䜓
にシリコンカヌバむドのCVD局をコヌテむング
する堎合、焌結䜓にシリコンカヌバむドのCVD
局をコヌテむングし、さらにシリコンカヌバむド
のスパツタリング局をコヌテむングする堎合等が
あるが、ここではこれらのすべおを基盀ず総称す
る。 本発明の成圢型においおは、䞊蚘の基盀又は介
圚局䞊に衚面局が蚭けられ、該衚面局は10〜
90wtの癜金ず〜40wtのニツケル及び又
はクロムず〜70wtのシリコンカヌバむドを
含む少なくずも皮の物質で構成されおいる。 本発明者らは、癜金ずむリゞりム等の貎金属合
金からなる埓来の衚面局では、プレス成圢時のガ
ラス成圢䜓の離型性があたり良くないのに察し、
癜金ずニツケル及び又はクロムずシリコンカヌ
バむドを含む本発明の衚面局においおは、離型性
が著しく向䞊するこずを芋い出した。 本発明の衚面局は、䞊蚘の癜金ずニツケル及
び又はクロムずずもにシリコンカヌバむドを必
須成分ずしお含有するので、衚面局硬床が䞊昇し
疵が぀きにくいずいう利点も有する。 基盀がシリコンカヌバむドである堎合には、衚
面局にもシリコンカヌバむドが含たれおいるこず
から、基盀ず衚面局ずが芪和性、密着性にすぐ
れ、剥離しない。 たた基盀がタングステンカヌバむドである堎合
には、基盀のタングステンカヌバむドず衚面局䞭
のシリコンカヌバむドずがいずれもカヌバむド
炭化物であるずころからそれ盞圓の芪和性が
保蚌され、実甚䞊問題のない密着性が確保され
る。たた衚面局にシリコンカヌバむドが含たれお
いるこずから、基盀タングステンカヌバむド䞭の
バむンダヌであるコバルトの拡散も少ない。タン
グステンカヌバむド基盀ず衚面局ずの密着化及び
タングステンカヌバむドのバむンダヌであるコバ
ルトの非拡散化は、タングステンカヌバむド基盀
ず衚面局の間にシリコンカヌバむドの介圚局を蚭
けるこずにより䞀局向䞊する。 さらに基盀がシリコンである堎合には、基盀ず
衚面局の間にシリコンカヌバむドの介圚局を蚭け
るこずが必須条件であり、これにより基盀ず衚面
局の密着性は十分に保蚌される。基盀がシリコン
である堎合には、䞊蚘介圚局がないず、基盀のシ
リコンが衚面局䞭の癜金ず反応し、衚面の肌荒れ
を惹き起すが、シリコンカヌバむドの介圚局の存
圚により、シリコンず癜金の反応による衚面肌荒
れを防止できる。 本発明の衚面局においお、必須成分の組成範囲
は、癜金が10〜90wt、ニツケル及び又はク
ロムが〜40wt、シリコンカヌバむドが〜
70wtに限定されるが、それぞれの必須成分の
組成範囲は、プレス成圢時のガラス成圢䜓の離型
性、衚面局の基盀ずの密着性非剥離性、衚面
局の硬床等を総合的に考慮しお決定されたもので
ある。なお、基盀ずしお、コバルトをバむンダヌ
ずしお含むタングステンカヌバむドを甚い、シリ
コンカヌバむドの介圚局を蚭けない堎合には、コ
バルトが衚面局に拡散するのを防止するため、衚
面局䞭のシリコンカヌバむドの量を、介圚局を蚭
けた堎合よりも若干倚目にした方が奜たしい。 䞊蚘の癜金ずニツケル及び又はクロムずシリ
コンカヌバむドに加えおロゞりム、むリゞりム、
パラゞりム、金等を加えるず、䞀局高枩のプレス
成圢においおも䜿甚に耐え埗るようになる。 衚面局の圢成はスパツタ法等により行なわれる
のが奜たしい。スパツタ法による衚面局の成圢に
おいおは、衚面局を構成する各物質のタヌゲツト
をそれぞれ䜜成しおも良く、たたシリコンカヌバ
むドタヌゲツトず耇数金属からなる合金タヌゲツ
トを䜜補しおも良い。 衚面局の厚さは、基盀材料ずしお䟋えばシリコ
ンナむトラむド、シリコンカヌバむド及びタング
ステンカヌバむド等を甚い、衚面局圢成埌に高粟
床の非球面加工を行なう堎合には〜50ÎŒmの厚
さにするのが奜たしい。たたシリコンカヌバむド
又はタングステンカヌバむド基盀を粟密加工しお
から衚面局を蚭ける堎合には、その厚さは10ÎŒm
以䞋、特に0.03〜10ÎŒmずするのが良い。基盀材
料ずしお、シリコンを甚い、これをダむダモンド
バむトによる高粟床の非球面切削加工凊理した堎
合には、衚面局は0.03〜10ÎŒmの厚さで良い。 なお、最終圢状が球面の堎合は、基盀材料を鏡
面仕䞊げし、衚面局を厚さ0.03〜10ÎŒmにコヌテ
むングしお、これを最終面ずしお䜿甚しおもよ
い。 〔実斜䟋〕 以䞋、実斜䟋を挙げお本発明を曎に説明する
が、本発明はこの実斜䟋に限定されるものではな
い。 成圢型を収玍したプレス成圢機の構造を瀺す断
面図を第図に瀺す。成圢型は䞊型、䞋型及
び案内型で構成され、䞊型及び䞋型は案内
型内に滑動するように収玍されおおり、この䞊
型ず䞋型ずの間に被成圢ガラス塊がセツト
される。本実斜䟋では案内型は材質をシリコン
カヌバむドずし、倖埄26mm、内埄14mm、高さ40mm
に加工したものを衚面局を蚭けるこずなくそのた
た䜿甚した。たた䞊型及び䞋型は倖埄14mm、
高さ玄20mmで、材質ずしおタングステンカヌバむ
ドのもの、シリコンカヌバむドのもの及びシリコ
ンのものを倚数甚意し、䞀端面を凹圢状に粟研削
し、これを基盀ずした。 なお、本実斜䟋においお、タングステンカヌバ
むド基盀ずしおは、衚面局ずの間にシリコンカヌ
バむドの介圚局を有しないものず有するものの䞡
者を甚意した。たたシリコン基盀ずしおは衚面局
ずの間にシリコンカヌバむドの介圚局を有するも
のを甚意した。 次にこれらの基盀䞊に、癜金ずニツケル及び
又はクロムずシリコンカヌバむドからなる衚面局
又は癜金ずニツケル及び又はクロムずシリコン
カヌバむドず他金属ロゞりム、むリゞりム、パ
ラゞりム又は金からなる衚面局を圢成させお本
発明の各皮成圢型を埗た。 なお比范のため基盀がシリコンカヌバむドで、
衚面局が癜金及びニツケルを含むが、シリコンカ
ヌバむドを含たない成圢型比范実隓䟋No.5c、
基盀がシリコンカヌバむドで、衚面局が癜金を含
むが、シリコンカヌバむド及びニツケルやクロム
を含たない成圢型比范実隓䟋No.12c、12c′及
び基盀がシリコンで、衚面局ずの間にシリコンカ
ヌバむドの介圚局が存圚しない成圢型比范実隓
䟋No.25cを甚意し、比范実隓に䟛した。 衚−には、これらの成圢型の基盀の材料、介
圚局の物質ず膜厚及び衚面局の組成ず膜厚が瀺さ
れおいる。 以䞋に衚−に瀺された各皮成圢型の䜜補方法
のポむントを説明する。 実隓䟋No.〜24及び比范実隓䟋No.5c、12c、12c′ 基盀がシリコンカヌバむド又はタングステンカ
ヌバむドである球面成圢型の䟋である。この成圢
型の䜜補に圓぀おは、基盀を球面に鏡面加工し、
スパツタ法により衚面局を圢成した。 実隓䟋No.25及び比范実隓䟋No.25c 基盀がシリコンである非球面成圢型の䟋であ
る。 基盀を単結晶ダむダモンドバむドで非球面に粟
密切削加工し、次いで実隓䟋No.25の堎合には、シ
リコンカヌバむドの介圚局を蚭けた埌、そしお比
范実隓䟋No.25cの堎合には、これを蚭けずに盎ち
に、衚面局を蚭けお成圢型を完成させた。 次に、このようにしお䜜補した成圢型を甚いた
プレス成圢䟋を第図を参照しながら説明する。
たず、䞊型、䞋型、案内型からなる成圢型
内に、ガラス組成がwtでSiO227.8、Na2O1.8、
K2O1.2、PbO65.2、Al2O32.0、TiO22.0である光
孊ガラス転移枩床435℃の盎埄10mmの球状の
被成圢ガラス塊を入れお、支持棒の䞊に支持
台を介しお配眮し、N2雰囲気にしお、石英
管の倖呚に巻き付けたヒヌタヌにより、
成圢型ず共に被成圢ガラス塊を加熱し、抌し棒
を䞋降させお、500℃で、80Kgcm2の圧力で
30秒間プレスした。その埌圧力を解き、プレス成
圢されたガラス成圢䜓を、䞊型および䞋型ず
接觊させた状態のたた䞊蚘転移枩床たで埐冷し、
次いで宀枩付近たで急冷しお、ガラス成圢䜓を成
圢型から取り出した。 実隓䟋No.〜25の成圢型を甚いお、それぞれ
1000回ず぀プレス成圢を繰り返した結果、いずれ
の実隓䟋に぀いおも、ガラス成圢䜓は離型性が良
奜で、型ずの接觊面においお化孊反応した様子が
認められず、面粗床は100ÅRnax以䞋であり、透
明床も良奜であ぀た。たた、いずれの型も衚面局
の剥離は起こらず、面粟床及び鏡面状態が維持さ
れた。たた衚面局の硬床も高く疵の぀きにくいも
のであ぀た。 䞀方、実隓䟋No.においお、シリコンカヌバむ
ドの量10を零にし、その代りにニツケルの
量を20から30に増加させた比范実隓䟋5cの成
圢型ではプレス成圢を100回行な぀た時点で衚面
局の剥離が認められた。 たた癜金量は同䞀であるが、シリコンカヌバむ
ドを含たない点及びクロムの代りにロゞりム又は
むリゞりムを含む点で実隓No.12の成圢型ず盞違す
る比范実隓䟋No.12c、12c′の成圢型では、最初の
プレス成圢時から離型性が極めお悪か぀た。 たたシリコンカヌバむドの介圚局を圢成しおい
ない点でのみ実隓䟋No.25の成圢型ず盞違する比范
実隓䟋No.25cの成圢型では、衚面の肌荒れが著し
か぀た衚面粗さ500ÅRnax。 なお、䞊述の実隓䟋においお成圢型の衚面局は
わずかに酞化されるこずがあ぀たが、プレス成圢
時のガラス成圢䜓の離型性や衚面粗さに察しお圱
響はないこずが刀明した。 䞊述の実斜䟋においおは、いずれも被成圢ガラ
スずしおプレス枩床が500℃付近のSiO2−Na2O
−K2O−PbO−Al2O3−TiO2系ガラスを䜿甚した
が、被成圢ガラスはこれ等に限定されるものでは
ない。被成圢ガラスずしおは、プレス枩床、即ち
ガラス粘床がほが108−1010ポアズになる枩床が
650℃以䞋が奜たしい。
[Industrial Field of Application] The present invention relates to a mold for press-molding glass, and particularly to a mold for obtaining a high-precision glass molded body that does not require polishing after press-molding. [Prior Art] As a mold for obtaining a glass molded body by press molding, a mold using silicon carbide or silicon nitride (see JP-A-52-45613) is known. Recently, a coating film of a noble metal alloy made of platinum and other noble metal elements is formed as a surface layer on a substrate mainly composed of tungsten carbide (see Japanese Patent Application Laid-Open No. 60-246230), and a substrate made of silicon. A coating film in which a noble metal alloy consisting of platinum and other noble metal elements is formed as a surface layer has been proposed (see Japanese Patent Application Laid-open No. 242922/1983). [Problems to be solved by the invention] However, the mold made of silicon nitride or silicon carbide disclosed in JP-A No. 52-45613 tends to form an oxidized layer on its extreme surface, so it cannot be used with glass during press molding. It had the disadvantage of being easily fused. Furthermore, the mold disclosed in JP-A No. 60-246230, in which a platinum-based noble metal alloy layer is formed as a surface layer on a tungsten carbide base, is made by molding optical glass at high temperatures for a long period of time. However, tungsten carbide, which is the base material, is oxidized, resulting in a decrease in surface precision, the noble metal alloy layer is likely to peel off, and the molded glass body does not have good releasability during molding. Furthermore, in the mold disclosed in JP-A-61-242922, the platinum-based noble metal alloy film provided as a surface layer on the silicon substrate has poor adhesion to silicon, and the thermal expansion coefficient between the two is large. Due to the difference, the precious metal alloy film easily peels off from the silicon substrate after several press moldings.
In addition, a surface layer made of only a combination of platinum and precious metals such as iridium, osmium, rhodium, palladium, and ruthenium had the disadvantage that the mold release properties of the glass molded product during press molding were not very good. Therefore, an object of the present invention is to eliminate the above-mentioned drawbacks of the prior art molds, and to improve the adhesion between the base and the surface layer.
It is an object of the present invention to provide a mold for a glass molded body that satisfies all of the releasability requirements of a glass molded body at the same time. [Means for Solving the Problems] The present invention has been made to achieve the above object, and the mold for a glass molded article of the present invention includes a base and a surface layer, and the surface layer has a weight of 10 to 90 wt. % platinum and 5-40wt% nickel and/or chromium and 5%
It is characterized by being composed of at least three types of materials containing ~70 wt% silicon carbide. The present invention will be explained in detail below. The mold for a glass molded article of the present invention includes a base and a surface layer provided on the base. First, the base material is not particularly limited as long as it satisfies the hardness, strength, heat resistance, etc. generally required for a base, and examples include silicon carbide, tungsten carbide, silicon, silicon nitride, cermet, etc. is available. As described later, a substrate made of these materials is processed precisely and then coated with a surface layer of 0.03 to 10 ÎŒm, or processed into an approximate shape and coated with a surface layer of 3 to 50 ÎŒm, and then coated with a surface layer of 3 to 50 ÎŒm. By precision processing and finishing, the mold of the present invention can be obtained. When silicon is used as a base and a surface layer containing platinum is provided on the silicon base, not only is the adhesion between the base and the surface layer insufficient, but also the silicon on the base reacts with the platinum in the surface layer. , causing rough skin on the surface. Therefore, when silicon is used as the base, it is essential to provide an intervening layer of silicon carbide between this and the surface layer. Further, when tungsten carbide is used as the base, adhesion between the base and the intermediate layer is improved by providing an intervening layer of silicon carbide.
An intervening layer may also be provided in the case of silicon nitride, cermet, etc. On the other hand, when using silicon carbide as a base, if the silicon carbide is a sintered body, if the sintered body is coated with a silicon carbide CVD layer, the sintered body is coated with a silicon carbide CVD layer.
In some cases, a sputtering layer of silicon carbide is coated, and all of these are collectively referred to as a base. In the mold of the present invention, a surface layer is provided on the base or intervening layer, and the surface layer has a
It is composed of at least three materials including 90 wt% platinum, 5-40 wt% nickel and/or chromium, and 5-70 wt% silicon carbide. The present inventors discovered that while conventional surface layers made of noble metal alloys such as platinum and iridium do not have very good mold release properties of glass molded bodies during press molding,
It has been found that the surface layer of the present invention containing platinum and nickel and/or chromium and silicon carbide has significantly improved mold releasability. Since the surface layer of the present invention contains silicon carbide as an essential component along with the above-mentioned platinum, nickel, and/or chromium, it also has the advantage that the surface layer has increased hardness and is less prone to scratches. When the base is made of silicon carbide, the surface layer also contains silicon carbide, so the base and the surface layer have excellent affinity and adhesion and do not separate. In addition, when the base is made of tungsten carbide, since the tungsten carbide of the base and the silicon carbide in the surface layer are both carbides, a corresponding degree of affinity is guaranteed, and adhesion is ensured without any practical problems. is ensured. Furthermore, since the surface layer contains silicon carbide, there is little diffusion of cobalt, which is a binder in the base tungsten carbide. Adhesion between the tungsten carbide base and the surface layer and non-diffusion of cobalt, which is a binder for tungsten carbide, are further improved by providing an intervening layer of silicon carbide between the tungsten carbide base and the surface layer. Further, when the base is silicon, it is essential to provide an intervening layer of silicon carbide between the base and the surface layer, thereby sufficiently ensuring adhesion between the base and the surface layer. When the base is silicon, without the above intervening layer, the silicon of the base will react with the platinum in the surface layer, causing surface roughening, but due to the presence of the intervening layer of silicon carbide, the interaction between silicon and platinum will occur. Prevents surface roughness caused by reactions. In the surface layer of the present invention, the composition range of essential components is 10 to 90 wt% platinum, 5 to 40 wt% nickel and/or chromium, and 5 to 40 wt% silicon carbide.
Although it is limited to 70wt%, the composition range of each essential component is determined by taking into account the releasability of the glass molded body during press molding, the adhesion of the surface layer to the base (non-peelability), the hardness of the surface layer, etc. The decision was made in consideration of the Note that when using tungsten carbide containing cobalt as a binder as the base and not providing an intervening layer of silicon carbide, the amount of silicon carbide in the surface layer is adjusted to prevent cobalt from diffusing into the surface layer. It is preferable to use a slightly larger number than when an intervening layer is provided. In addition to the above platinum and nickel and/or chromium and silicon carbide, rhodium, iridium,
By adding palladium, gold, etc., it becomes possible to withstand even higher temperature press molding. The surface layer is preferably formed by a sputtering method or the like. In forming the surface layer by the sputtering method, targets for each substance constituting the surface layer may be prepared individually, or an alloy target consisting of a silicon carbide target and a plurality of metals may be prepared. The thickness of the surface layer is preferably 3 to 50 ÎŒm when using silicon nitride, silicon carbide, tungsten carbide, etc. as the base material and performing high-precision aspherical processing after forming the surface layer. . In addition, when providing a surface layer after precision processing a silicon carbide or tungsten carbide substrate, the thickness is 10 ÎŒm.
Below, it is particularly preferable to set it to 0.03 to 10 ÎŒm. When silicon is used as the base material and subjected to highly accurate aspherical cutting using a diamond cutting tool, the surface layer may have a thickness of 0.03 to 10 ÎŒm. In addition, when the final shape is spherical, the base material may be mirror-finished, the surface layer may be coated to a thickness of 0.03 to 10 ÎŒm, and this may be used as the final surface. [Example] The present invention will be further explained below with reference to Examples, but the present invention is not limited to these Examples. A cross-sectional view showing the structure of a press molding machine housing a mold is shown in FIG. The mold is composed of an upper mold 1, a lower mold 2, and a guide mold 3. The upper mold 1 and the lower mold 2 are slidably housed in the guide mold 3, and the upper mold 1 and the lower mold 2 are A glass gob 4 to be formed is set in between. In this example, the guide mold 3 is made of silicon carbide, has an outer diameter of 26 mm, an inner diameter of 14 mm, and a height of 40 mm.
The processed material was used as it was without providing a surface layer. In addition, the outer diameter of upper mold 1 and lower mold 2 is 14 mm.
The height was approximately 20 mm, and a number of materials such as tungsten carbide, silicon carbide, and silicon were prepared, one end surface was finely ground into a concave shape, and this was used as the base. In this example, both tungsten carbide substrates were prepared, one without and one with a silicon carbide intervening layer between it and the surface layer. In addition, a silicon substrate having a silicon carbide intervening layer between the surface layer and the surface layer was prepared. Next, on these bases, platinum, nickel and/or
Alternatively, various molds of the present invention were obtained by forming a surface layer consisting of chromium and silicon carbide or a surface layer consisting of platinum and nickel and/or chromium, silicon carbide and another metal (rhodium, iridium, palladium or gold). For comparison, the base is silicon carbide,
A mold whose surface layer contains platinum and nickel but does not contain silicon carbide (Comparative Experiment No. 5c),
The base is silicon carbide and the surface layer contains platinum but does not contain silicon carbide, nickel or chromium (Comparative Experiment No. 12c, 12c') and the base is silicon with silicon carbide between it and the surface layer. A mold without the intervening layer (Comparative Experiment Example No. 25c) was prepared and subjected to a comparative experiment. Table 1 shows the material of the base of these molds, the substance and thickness of the intervening layer, and the composition and thickness of the surface layer. Below, the key points of the method for manufacturing the various molds shown in Table 1 will be explained. Experimental Examples Nos. 1 to 24 and Comparative Experimental Examples No. 5c, 12c, 12c' These are examples of spherical molds in which the base is silicon carbide or tungsten carbide. When making this mold, the base was mirror-finished into a spherical surface,
A surface layer was formed by a sputtering method. Experimental Example No. 25 and Comparative Experimental Example No. 25c These are examples of aspherical molds whose base is silicon. The base was precision cut into an aspherical surface using single-crystal diamond bide, and then, in the case of Experimental Example No. 25, an intervening layer of silicon carbide was provided, and in the case of Comparative Experimental Example No. 25c, this was The mold was completed by immediately forming a surface layer without forming a surface layer. Next, an example of press molding using the mold thus produced will be described with reference to FIG. 1.
First, in a mold consisting of an upper mold 1, a lower mold 2, and a guide mold 3, glass compositions of wt% SiO 2 27.8, Na 2 O 1.8,
A spherical glass lump 4 with a diameter of 10 mm made of optical glass (transition temperature 435°C) consisting of K 2 O 1.2, PbO 65.2, Al 2 O 3 2.0, and TiO 2 2.0 is placed on the support rod 9. A heater 12 placed through a support stand 10 and wrapped around the outer periphery of a quartz tube 11 in an N 2 atmosphere,
The glass gob 4 to be formed is heated together with the mold, and the push rod 13 is lowered to heat it at 500°C and under a pressure of 80Kg/ cm2.
Pressed for 30 seconds. After that, the pressure is released, and the press-molded glass molded body is slowly cooled to the above transition temperature while in contact with the upper mold 1 and the lower mold 2,
The glass molded body was then rapidly cooled to around room temperature and taken out from the mold. Using the molds of Experimental Examples No. 1 to 25, respectively
As a result of repeating press molding 1000 times, in all experimental examples, the glass molded product had good mold releasability, no chemical reaction was observed on the contact surface with the mold, and the surface roughness was less than 100 ÅR nax . The transparency was also good. In addition, no peeling of the surface layer occurred in any of the molds, and the surface precision and mirror finish were maintained. The surface layer also had high hardness and was resistant to scratches. On the other hand, in Experiment No. 5, the mold of Comparative Experiment 5c, in which the amount of silicon carbide (10%) was reduced to zero and the amount of nickel was increased from 20% to 30%, was press-molded 100 times. Peeling of the surface layer was observed at the time of completion. Furthermore, although the amount of platinum is the same, the molds of Comparative Experiments No. 12c and 12c' are different from the mold of Experiment No. 12 in that they do not contain silicon carbide and contain rhodium or iridium instead of chromium. The mold releasability was extremely poor from the time of initial press molding. In addition, the mold of Comparative Experiment No. 25c, which differs from the mold of Experiment No. 25 only in that no intervening layer of silicon carbide was formed, had a markedly rough surface (surface roughness of 500 ÅR nax ). Although the surface layer of the mold was slightly oxidized in the above-mentioned experimental example, it was found that this had no effect on the releasability or surface roughness of the glass molded product during press molding. In all of the above examples, SiO 2 −Na 2 O with a pressing temperature of around 500°C was used as the glass to be formed.
-K2O -PbO- Al2O3 -TiO2 glass was used, but the glass to be formed is not limited to this. For the glass to be formed, the pressing temperature, that is, the temperature at which the glass viscosity is approximately 10 8 −10 10 poise, is
The temperature is preferably 650°C or lower.

【衚】【table】

〔発明の効果〕〔Effect of the invention〕

本発明によれば、衚面局ずしお癜金ずニツケル
及び又はクロムずシリコンカヌバむドを䞻成分
ずする物質を甚いるこずにより、プレス成圢時に
おけるガラス成圢䜓の離型性、衚面局ず基盀ずの
密着性非剥離性等が向䞊し、さらに衚面局の
硬床も向䞊した。埓぀お寿呜の長い成圢型を埗る
こずができた。
According to the present invention, by using a substance whose main components are platinum, nickel, and/or chromium and silicon carbide as the surface layer, the releasability of the glass molded body during press molding and the adhesion between the surface layer and the base are improved. (non-peelability) etc. were improved, and the hardness of the surface layer was also improved. Therefore, it was possible to obtain a mold with a long life.

【図面の簡単な説明】[Brief explanation of drawings]

第図は本発明の成圢型を収玍したプレス成圢
機の構造を瀺す断面図である。  䞊型、 䞋型、 案内型、 被成圢
ガラス塊、 支持棒、 支持台、 石
英管、 ヒヌタヌ、 抌し棒、 熱
電察。
FIG. 1 is a sectional view showing the structure of a press molding machine housing a mold of the present invention. DESCRIPTION OF SYMBOLS 1... Upper mold, 2... Lower mold, 3... Guide mold, 4... Glass lump to be formed, 9... Support rod, 10... Support stand, 11... Quartz tube, 12... Heater, 13... Push rod, 14... Thermocouple .

Claims (1)

【特蚱請求の範囲】  基盀ず衚面局を備え、衚面局が10〜90wt
の癜金ず〜40wtのニツケル及び又はクロ
ムず〜70wtのシリコンカヌバむドを含む少
なくずも皮の物質で構成されおいるこずを特城
ずするガラス成圢䜓の成圢型。  基盀がタングステンカヌバむド、シリコンカ
ヌバむド、シリコン、シリコンナむトラむド及び
サヌメツトからなる矀から遞択される、特蚱請求
の範囲第項に蚘茉の成圢型。  基盀ず衚面局ずの間にシリコンカヌバむドの
介圚局が蚭けられおいる、特蚱請求の範囲第項
に蚘茉の成圢型。  衚面局が癜金ずニツケル及び又はクロムず
シリコンカヌバむドずずもにロゞりム、むリゞり
ム、パラゞりム及び金からなる矀から遞択される
少なくずも皮の金属を曎に含む、特蚱請求の範
囲第項に蚘茉の成圢型。
[Claims] 1. Comprising a base and a surface layer, where the surface layer is 10 to 90 wt%
A mold for a glass molded article, characterized in that the mold is made of at least three substances including platinum, nickel and/or chromium in an amount of 5 to 40 wt%, and silicon carbide in an amount of 5 to 70 wt%. 2. The mold according to claim 1, wherein the substrate is selected from the group consisting of tungsten carbide, silicon carbide, silicon, silicon nitride and cermet. 3. The mold according to claim 2, wherein an intervening layer of silicon carbide is provided between the base and the surface layer. 4. The mold according to claim 1, wherein the surface layer further contains at least one metal selected from the group consisting of rhodium, iridium, palladium, and gold in addition to platinum and nickel and/or chromium and silicon carbide. .
JP22766287A 1987-09-11 1987-09-11 Forming die for formed glass body Granted JPS6472932A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP22766287A JPS6472932A (en) 1987-09-11 1987-09-11 Forming die for formed glass body

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP22766287A JPS6472932A (en) 1987-09-11 1987-09-11 Forming die for formed glass body

Publications (2)

Publication Number Publication Date
JPS6472932A JPS6472932A (en) 1989-03-17
JPH0455135B2 true JPH0455135B2 (en) 1992-09-02

Family

ID=16864371

Family Applications (1)

Application Number Title Priority Date Filing Date
JP22766287A Granted JPS6472932A (en) 1987-09-11 1987-09-11 Forming die for formed glass body

Country Status (1)

Country Link
JP (1) JPS6472932A (en)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2007046437A1 (en) 2005-10-19 2007-04-26 The Circle For The Promotion Of Science And Engineering Corrosion-resistant heat-resistant alloy for molding die and die for molding optical device
JP2011201738A (en) * 2010-03-26 2011-10-13 Fujifilm Corp Mold for molding optical element, optical element, and method for manufacturing optical element

Also Published As

Publication number Publication date
JPS6472932A (en) 1989-03-17

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