JPH0457062B2 - - Google Patents
Info
- Publication number
- JPH0457062B2 JPH0457062B2 JP419483A JP419483A JPH0457062B2 JP H0457062 B2 JPH0457062 B2 JP H0457062B2 JP 419483 A JP419483 A JP 419483A JP 419483 A JP419483 A JP 419483A JP H0457062 B2 JPH0457062 B2 JP H0457062B2
- Authority
- JP
- Japan
- Prior art keywords
- getter
- support
- funnel
- cathode ray
- ray tube
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 230000000087 stabilizing effect Effects 0.000 claims description 2
- 238000010438 heat treatment Methods 0.000 description 4
- 230000006698 induction Effects 0.000 description 4
- 238000000034 method Methods 0.000 description 4
- 229910052788 barium Inorganic materials 0.000 description 3
- DSAJWYNOEDNPEQ-UHFFFAOYSA-N barium atom Chemical compound [Ba] DSAJWYNOEDNPEQ-UHFFFAOYSA-N 0.000 description 3
- 230000000694 effects Effects 0.000 description 2
- 239000011521 glass Substances 0.000 description 2
- 229910052751 metal Inorganic materials 0.000 description 2
- 239000002184 metal Substances 0.000 description 2
- 229910015999 BaAl Inorganic materials 0.000 description 1
- 239000000853 adhesive Substances 0.000 description 1
- 230000001070 adhesive effect Effects 0.000 description 1
- 239000000919 ceramic Substances 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 238000002844 melting Methods 0.000 description 1
- 230000008018 melting Effects 0.000 description 1
- 238000001179 sorption measurement Methods 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J29/00—Details of cathode-ray tubes or of electron-beam tubes of the types covered by group H01J31/00
- H01J29/94—Selection of substances for gas fillings; Means for obtaining or maintaining the desired pressure within the tube, e.g. by gettering
Landscapes
- Vessels, Lead-In Wires, Accessory Apparatuses For Cathode-Ray Tubes (AREA)
Description
【発明の詳細な説明】
〔発明の利用分野〕
本発明はブラウン管のゲツターの支持構体に係
り、特にゲツターをブラウン管のフアンネルに取
付ける場合に好適な支持構体に関する。DETAILED DESCRIPTION OF THE INVENTION [Field of Application of the Invention] The present invention relates to a support structure for a getter of a cathode ray tube, and particularly to a support structure suitable for attaching a getter to a funnel of a cathode ray tube.
ブラウン管のゲツターは管内の残留ガスを吸着
し管内の真空度を良好に保ためにブラウン管の内
部に取付けられるもので、通常使われているもの
は、断面形状がU字形のリングの内部にBaAl4を
入れ、これを真空中で誘導加熱してブラウン管の
内面にガスを吸着するバリウム膜を形成するもの
である。
The getter of a cathode ray tube is installed inside the cathode ray tube to adsorb residual gas inside the tube and maintain a good degree of vacuum inside the tube.The getter of a cathode ray tube is usually installed inside a ring with a U-shaped cross section and BaAl 4 inside. This is heated by induction in a vacuum to form a barium film that adsorbs gas on the inner surface of the cathode ray tube.
ブラウン管はガラスでできており、第1図に示
すように画像を出すパネル1と、漏斗状のフアン
ネル2と、電子銃3を収納する円筒状のネツク4
から成つている。ブラウン管の内部にゲツターを
取付ける方法は種々あるが、そのいくつかの方法
を第1図に重複して示す。 A cathode ray tube is made of glass, and as shown in Figure 1, it has a panel 1 that displays an image, a funnel 2, and a cylindrical neck 4 that houses an electron gun 3.
It consists of There are various methods of attaching a getter inside a cathode ray tube, some of which are shown in duplicate in FIG.
まずゲツター5Aは電子銃3の先端に取付ける
方法である。この方法は取付けが容易であるが、
バリウム膜の形成される面積がゲツターの近傍と
パネルの中央の限られた部分の小さな面積となる
ためにガス吸着能力が比較的に小さくなる弱点が
ある。 First, the getter 5A is attached to the tip of the electron gun 3. This method is easy to install, but
Since the barium film is formed on a small area near the getter and in a limited area in the center of the panel, there is a disadvantage that the gas adsorption capacity is relatively small.
ゲツター5Bはゲツター5Aの弱点をさけるた
めに、電子銃3の先端からスプリング6によつて
フアンネル2の付近に配置してあるが、スプリン
グ6の力で電子銃3が傾いたり、スプリング6を
あまり長くすると不安定になるためにネツク4か
らあまり遠くにつけることができないなどの弱点
があつた。 In order to avoid the weak point of the Getter 5A, the Getter 5B is placed near the funnel 2 from the tip of the electron gun 3 by means of a spring 6. If it was made too long, it would become unstable, so it had some weaknesses, such as not being able to attach it too far from the net 4.
ゲツター5Cはゲツター5A、ゲツター5Bの
弱点をさけるために、フアンネル2の内外面の電
気的導通をとるためにフアンネル2に取付けられ
ている金属製のボタン7にスプリング8によつて
取付けられている。しかし、ボタン7が金属製で
あるために、ゲツター5Cを誘導加熱するときに
ボタン7も同時に誘導加熱し、フアンネル2を破
損する事故をおこすことがある。これをさけるた
めにゲツター5Cをボタン7から離すと位置が不
安定になつて誘導加熱が困難になる弱点があつ
た。 The getter 5C is attached by a spring 8 to a metal button 7 attached to the funnel 2 in order to establish electrical continuity between the inner and outer surfaces of the funnel 2 in order to avoid the weak points of the getters 5A and 5B. . However, since the button 7 is made of metal, when the getter 5C is inductively heated, the button 7 is also inductively heated at the same time, which may cause damage to the funnel 2. In order to avoid this, if the getter 5C is moved away from the button 7, the position becomes unstable and induction heating becomes difficult.
ゲツター5Dがゲツター5A、ゲツター5B、
ゲツター5Cの弱点をさけるために、フアンネル
2の内面にセラミツクスなどの材質のゲツターサ
ポート10を低融点ガラスなどの接着材で取付
け、これにゲツター5Dを取付けるものである。
このために、従来は第2図に示すようにゲツター
5Dを取付けたゲツター支持板11にサポートス
プリング12を取付け、このスプリング12でフ
アンネル2の内表面2aに取付けたゲツターサポ
ート10を挾持してゲツター5Dを支持してい
た。しかし、この方法ではゲツター5Dのフアン
ネル内表面2aとの間隔が不安定でゲツター5D
を誘導加熱する場合に加熱条件が不安定でバリウ
ム飛散量が不安定になる欠点があつた。 Getter 5D is Getter 5A, Getter 5B,
In order to avoid the weak points of the getter 5C, a getter support 10 made of a material such as ceramics is attached to the inner surface of the funnel 2 with an adhesive such as low melting point glass, and the getter 5D is attached to this.
For this purpose, conventionally, a support spring 12 is attached to the getter support plate 11 on which the getter 5D is attached, as shown in FIG. He supported Getztar 5D. However, in this method, the distance between the getter 5D and the funnel inner surface 2a is unstable, and the getter 5D
When induction heating is performed, the heating conditions are unstable and the amount of barium scattered becomes unstable.
本発明の目的は上記の欠点を改良するゲツター
支持構体を提供するものである。
It is an object of the present invention to provide a getter support structure which improves the above-mentioned disadvantages.
本発明は、サポートスプリングがゲツターサポ
ートを挾持してゲツターを支持すると共にサポー
トスプリングとゲツターあるいはゲツター支持板
でゲツターサポートを挾持することによつてフア
ンネル内表面に対するゲツターの位置を安定させ
ることを特徴とする。
The present invention provides for stabilizing the position of the getter with respect to the inner surface of the funnel by having the support spring clamp the getter support to support the getter, and by clamping the getter support between the support spring and the getter or the getter support plate. Features.
以下、本発明の一実施例を第3図、第4図によ
り説明する。第3図に示すようにサポートスプリ
ング22に二つの機能を持たせる。一つの機能は
第2図に示すサポートスプリング12と同様にゲ
ツターサポート10の径小部10aを挾持してゲ
ツター5Dを周方向で挾持支持するものである。
他の一つの機能は、第4図に示した側面図でもわ
かるように、ゲツター支持板21とサポートスプ
リング22でゲツターサポート10の径大部10
bを挾持、すなわちゲツター5Dがゲツターサポ
ート10の軸と平行方向で変位しないように挾持
してフアンネルの内表面2aに対するゲツター5
Dの位置を安定にさせる機能である。この二つの
機能を持たせるために第3図に示した実例ではサ
ポートスプリング22をワイヤースプリングで構
成している。
An embodiment of the present invention will be described below with reference to FIGS. 3 and 4. As shown in FIG. 3, the support spring 22 has two functions. One function is to clamp and support the getter 5D in the circumferential direction by clamping the small diameter portion 10a of the getter support 10, similar to the support spring 12 shown in FIG.
As can be seen from the side view shown in FIG. 4, another function is that the getter support plate 21 and the support spring 22 support
b, that is, the getter 5D is held against the inner surface 2a of the funnel by holding it so that the getter 5D is not displaced in the direction parallel to the axis of the getter support 10.
This is a function to stabilize the position of D. In order to provide these two functions, the support spring 22 is constructed of a wire spring in the example shown in FIG.
なお、サポートスプリング22はゲツター5D
に直接取付けることも可能で、この構成ではサポ
ートスプリング22とゲツター5Dとでゲツター
サポート10を挾持し、ゲツター5Dがゲツター
サポート10の軸と平行方向で変位しないように
挾持する。またゲツターサポート10も二層の円
筒部分でできている必要はなく角筒でも良い。 In addition, the support spring 22 is Getter 5D.
In this configuration, the getter support 10 is held between the support spring 22 and the getter 5D, and the getter 5D is held so that it does not displace in the direction parallel to the axis of the getter support 10. Also, the getter support 10 does not need to be made of a two-layered cylindrical portion, and may be made of a square tube.
以上述べたように本発明によれば、ブラウン管
の内部にゲツターを取付けるにあたつて、ゲツタ
ー膜を広い面積に作ることができ、また電子銃に
ゲツターを取付けないので電子銃を傾けるなどの
副作用がなく、かつゲツターの取付けが周方向と
軸と平行方向の両方で固定するため取付位置が安
定するので、ゲツターの誘導加熱条件が安定し、
ゲツターの取付方法としては安定した方法を得る
ことができる。
As described above, according to the present invention, when attaching a getter inside a cathode ray tube, the getter film can be formed over a wide area, and since the getter is not attached to the electron gun, side effects such as tilting the electron gun can be avoided. Since the getter is fixed in both the circumferential direction and the direction parallel to the axis, the mounting position is stable, so the induction heating conditions for the getter are stable.
A stable method for attaching the getter can be obtained.
第1図はブラウン管の断面図、第2図は従来の
ゲツター取付構造を示す斜視図、第3図は本発明
の一実施例を示すゲツター取付の斜視図、第4図
は本発明のゲツター取付を示す側面図である。
2……フアンネル、5D……ゲツター、10…
…ゲツターサポート、21……ゲツター支持板、
22……サポートスプリング。
Fig. 1 is a sectional view of a cathode ray tube, Fig. 2 is a perspective view showing a conventional getter mounting structure, Fig. 3 is a perspective view of getter mounting showing an embodiment of the present invention, and Fig. 4 is a getter mounting structure of the present invention. FIG. 2...Funnel, 5D...Getter, 10...
...Getter support, 21...Getter support plate,
22...Support spring.
Claims (1)
ーサポートに、ゲツターに取付けられたサポート
スプリングを取付けてなるゲツター支持構体にお
いて、サポートスプリングがゲツターサポートを
周方向で挾持してゲツターを支持すると共に、サ
ポートスプリングとゲツターあるいはゲツター支
持板でゲツターサポートをその軸と平行方向で挾
持することによつて、フアンネル内表面に対する
ゲツターの位置を安定させることを特徴とするブ
ラウン管のゲツター支持構体。1 In a getter support structure in which a support spring attached to the getter is attached to a getter support fixed to the funnel of a cathode ray tube, the support spring supports the getter by sandwiching the getter support in the circumferential direction, and the support spring A getter support structure for a cathode ray tube, characterized in that the getter support is held between a getter or a getter support plate in a direction parallel to its axis, thereby stabilizing the position of the getter with respect to the inner surface of the funnel.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP419483A JPS59130050A (en) | 1983-01-17 | 1983-01-17 | Getter supporting structure for braun tube |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP419483A JPS59130050A (en) | 1983-01-17 | 1983-01-17 | Getter supporting structure for braun tube |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS59130050A JPS59130050A (en) | 1984-07-26 |
| JPH0457062B2 true JPH0457062B2 (en) | 1992-09-10 |
Family
ID=11577876
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP419483A Granted JPS59130050A (en) | 1983-01-17 | 1983-01-17 | Getter supporting structure for braun tube |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS59130050A (en) |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0614640B2 (en) * | 1984-09-25 | 1994-02-23 | 日本電気株式会社 | Frame synchronization circuit |
-
1983
- 1983-01-17 JP JP419483A patent/JPS59130050A/en active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS59130050A (en) | 1984-07-26 |
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