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JPH0458905B2 - - Google Patents
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JPH0458905B2 - - Google Patents

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Publication number
JPH0458905B2
JPH0458905B2 JP20667485A JP20667485A JPH0458905B2 JP H0458905 B2 JPH0458905 B2 JP H0458905B2 JP 20667485 A JP20667485 A JP 20667485A JP 20667485 A JP20667485 A JP 20667485A JP H0458905 B2 JPH0458905 B2 JP H0458905B2
Authority
JP
Japan
Prior art keywords
mol
detection element
gas detection
antimony
gas
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP20667485A
Other languages
Japanese (ja)
Other versions
JPS6267437A (en
Inventor
Yoshiaki Okayama
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nohmi Bosai Ltd
Original Assignee
Nohmi Bosai Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nohmi Bosai Ltd filed Critical Nohmi Bosai Ltd
Priority to JP20667485A priority Critical patent/JPS6267437A/en
Publication of JPS6267437A publication Critical patent/JPS6267437A/en
Publication of JPH0458905B2 publication Critical patent/JPH0458905B2/ja
Granted legal-status Critical Current

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  • Investigating Or Analyzing Materials By The Use Of Fluid Adsorption Or Reactions (AREA)

Description

【発明の詳細な説明】[Detailed description of the invention]

〔産業上の利用分野〕 この発明は、シラン系ガスなどの特殊ガスを選
択的に検出できるガス検出素子とその製造方法に
関するものである。 〔従来技術〕 モノシラン(SiH4)、ジクロルシラン(SiH2
Cl2)、トリクロルシラン(SiHCl3)、ホスフイン
(PH3)、ジボラン(B2H6)やアルシン(AsH3
など、空気などの他の気体と接触混合すると数%
の濃度で自然発火する特殊ガスを検出することが
できるガス検出素子として、本発明者は、先に特
願昭58−157931号(特開昭60−50446号)によつ
て酸化第2すず(SnO2)と白金(Pt)とオキシ
塩化アンチモン(SbOCl)を組成物としてシラン
系ガス雰囲気で後処理した金属酸化物半導体のガ
ス検出素子を、また特願昭59−98818号(特開昭
60−243548号公報)によつてSnO2とパラジウム
(Pd)とアンチモン化合物(Sb化合物)を組成物
としシラン系ガス雰囲気で後処理した金属酸化物
半導体のガス検出素子を提案している。 ところで、これら従来のガス検出素子を濃度が
10ppmのSiH4ガスにさらしたときのSN比と応答
時間は、前者のSnO2−Pt−SbOC1系ガス検出素
子ではSN比が10程度、応答時間は150〜180秒程
度であり、後者のSnO2−Pd−Sb化合物系ガス検
出素子ではSN比が5程度、応答時間は150秒前後
であるという特性を有している。 〔目的と解決手段〕 本発明は、SN比が良好で応答時間の早い、し
かも低濃度の特殊ガスを選択的に検出できるガス
検出素子とその製造方法を目的とするもので、酸
化第2スズ(SnO2)を主材、白金(Pt)とパラ
ジム(Pd)とを触媒、アンチモン化合物(Sb化
合物)を安定材としてPt/Sn=0.5〜8モル%、
Pd/Sn=0.1〜8モル%、Sb/Sn=0〜8モル
%の組成比を有し、20〜400ppmのシラン系ガス
雰囲気で処理してなる金属酸化物半導体と、この
金属酸化物半導体を200〜400℃に加熱する加熱手
段とからなることを特徴とするものである。 また、次の工程の製造方法を特徴とするもので
ある。 SnO2に塩化パラジウム(PdCl2)溶液と塩化
白金酸(H2PtCl6)溶液とをPd/Sn=0.1〜8
モル%、Pt/Sn=0.5〜8モル%となるように
加えて分散させ、乾燥する。 の試料にSb化合物をSb/Sn=0.5〜8モル
%となるように加えて混合する。 の試料に有機溶剤を加えてペースト状に
し、1対の電極が設けられた絶縁体に塗布し乾
燥する。 の素子を、600〜850℃の大気またはアンチ
モン酸化ガスの雰囲気中で5〜30分間焼成す
る。 の素子を、CVD法により20〜400ppmのシ
ラン系ガスで5〜30分間処理する。 の素子を加熱してエージングする。 〔実施例〕 以下、この発明のガス検出素子とその製造方法
について実施例により説明する。 次の製造方法により表に示す実施例2〜8のガ
ス検出素子を制作した。なお、各実施例において
ガス検出素子は8個ずつ製作した。 準備段階として、塩化パラジウム(PdCl2)に
0.2%の塩酸水溶液を加えてPdCl2溶液を作成する
とともに、塩化白金酸(H2PtCl6・6H2O)に純
水を加えてH2PtCl6溶液を作成する。 まず、酸化第2スズ(SnO2)にPdCl2溶液を
Pd/Sn=0.1〜8モル%となるように加え、さら
にH2PtCl6溶液をPt/Sn=0.5〜8モル%となる
ように加えて混合水溶液を作成する。 次に、この混合水溶液を超音波かくはん機によ
つてかくはんしてPdとPtを良く分散させる。そ
の後この分散混合水溶液を真空凍結乾燥器にセツ
トし、−40℃で急速凍結乾燥させる。 そして、この乾燥試料にオキシ塩化アンチモン
(SbOCl)をSb/Sn=0.5〜8モル%となるよう
に加え、乳鉢で約30分間混合して混合試料を得
る。 なお、実施例2〜10における各混合試料のPd,
Pt,SbとSnの組成比は表に示す通りである。 この混合試料に有機溶剤であるイソプロピルア
ルコールを加えてペースト状の混合試料とし、こ
れを1対の電極を有するアルミナ磁器管上に1対
の電極間を覆うように塗布し、その後自然乾燥す
る。
[Industrial Field of Application] The present invention relates to a gas detection element that can selectively detect special gases such as silane gases, and a method for manufacturing the same. [Prior art] Monosilane (SiH 4 ), dichlorosilane (SiH 2
Cl 2 ), trichlorosilane (SiHCl 3 ), phosphine (PH 3 ), diborane (B 2 H 6 ) and arsine (AsH 3 ).
etc., several percent when mixed with other gases such as air.
As a gas detection element capable of detecting a special gas that spontaneously combusts at a concentration of A metal oxide semiconductor gas detection element made of a composition of SnO 2 ), platinum (Pt), and antimony oxychloride (SbOCl) and post-treated in a silane-based gas atmosphere was also proposed in Japanese Patent Application No. 59-98818 (Japanese Patent Application No.
No. 60-243548) proposes a metal oxide semiconductor gas detection element that has a composition of SnO 2 , palladium (Pd), and an antimony compound (Sb compound) and is post-treated in a silane gas atmosphere. By the way, these conventional gas detection elements are
When exposed to 10 ppm SiH 4 gas, the former SnO 2 -Pt-SbOC1 gas detection element has an SN ratio of about 10 and a response time of about 150 to 180 seconds, while the latter SnO The 2 -Pd-Sb compound gas detection element has the characteristics of an SN ratio of about 5 and a response time of about 150 seconds. [Objectives and Solutions] The present invention aims to provide a gas detection element that has a good signal-to-noise ratio, has a quick response time, and can selectively detect low concentration special gases, and a method for manufacturing the same. (SnO 2 ) as main material, platinum (Pt) and palladium (Pd) as catalyst, antimony compound (Sb compound) as stabilizer, Pt/Sn = 0.5 to 8 mol%,
A metal oxide semiconductor having a composition ratio of Pd/Sn=0.1 to 8 mol% and Sb/Sn=0 to 8 mol% and treated in a silane gas atmosphere of 20 to 400 ppm, and this metal oxide semiconductor and heating means for heating the temperature to 200 to 400°C. Further, the present invention is characterized by a manufacturing method including the following steps. Add palladium chloride (PdCl 2 ) solution and chloroplatinic acid (H 2 PtCl 6 ) solution to SnO 2 at Pd/Sn=0.1-8.
It is added and dispersed so that Pt/Sn=0.5 to 8 mol% and dried. An Sb compound is added to the sample so that Sb/Sn=0.5 to 8 mol% and mixed. An organic solvent is added to the sample to form a paste, which is applied to an insulator provided with a pair of electrodes and dried. The device is fired for 5 to 30 minutes in air or antimony oxidation gas atmosphere at 600 to 850°C. The device is treated with 20 to 400 ppm silane gas for 5 to 30 minutes by CVD method. The device is heated and aged. [Example] Hereinafter, the gas detection element of the present invention and the manufacturing method thereof will be explained with reference to Examples. Gas detection elements of Examples 2 to 8 shown in the table were manufactured using the following manufacturing method. Note that eight gas detection elements were manufactured in each example. As a preparatory step, palladium chloride (PdCl 2 )
A 0.2% aqueous hydrochloric acid solution is added to create a PdCl 2 solution, and pure water is added to chloroplatinic acid (H 2 PtCl 6 .6H 2 O) to create an H 2 PtCl 6 solution. First, add PdCl 2 solution to stannic oxide (SnO 2 ).
A mixed aqueous solution is prepared by adding Pd/Sn=0.1 to 8 mol% and further adding H2PtCl6 solution to Pt/Sn=0.5 to 8 mol%. Next, this mixed aqueous solution is stirred using an ultrasonic stirrer to disperse Pd and Pt well. Thereafter, this dispersed mixed aqueous solution is placed in a vacuum freeze dryer and rapidly freeze-dried at -40°C. Then, antimony oxychloride (SbOCl) is added to this dry sample so that Sb/Sn=0.5 to 8 mol%, and mixed in a mortar for about 30 minutes to obtain a mixed sample. In addition, Pd of each mixed sample in Examples 2 to 10,
The composition ratios of Pt, Sb and Sn are shown in the table. Isopropyl alcohol, which is an organic solvent, is added to this mixed sample to form a paste-like mixed sample, which is applied onto an alumina porcelain tube having a pair of electrodes so as to cover between the pair of electrodes, and then air-dried.

【表】【table】

〔効果〕〔effect〕

この発明によれば、特殊ガスに対してSN比が
高くかつ応答時間の早い、しかも低濃度の特殊ガ
スを選択的に検出可能なガス検出素子とその製造
方法が得られる効果がある。
According to the present invention, it is possible to obtain a gas detection element that has a high signal-to-noise ratio and a quick response time for special gases, and can selectively detect low concentration special gases, and a method for manufacturing the same.

【図面の簡単な説明】[Brief explanation of the drawing]

図はSiH4ガスに対する応答特性の代表例であ
る。
The figure shows a typical example of response characteristics to SiH 4 gas.

Claims (1)

【特許請求の範囲】 1 酸化第2スズを主材、白金とパラジウムとを
触媒、アンチモン化合物を安定剤としてPt/Sn
=0.5〜0.8モル%、Pd/Sn=0.1〜8モル%、
Sb/Sn=0.5〜8モル%の組成比を有し、25〜
400ppmのシラン系ガス雰囲気で処理されてなる
金属酸化物半導体と、上記金属酸化物半導体を
200〜400℃に加熱する加熱手段とからなることを
特徴とするガス検出素子。 2 酸化第2スズに塩化パラジウム溶液と塩化白
金酸溶液とをPd/Sn=0.1〜8モル%、Pt/Sn=
0.5〜8モル%となるように加えて分散させ、乾
燥させる第1工程と、 第1工程で作成した試料にアンチモン化合物を
Sb/Sn=0.5〜8モル%となるように加えて混合
する第2工程と、 第2工程で作成した試料に有機溶剤を加えてペ
ースト状にし、これを1対の電極が設けられた絶
縁体に塗布し乾燥させる第3工程と、第3工程で
作成した素子を、600〜850℃の大気またはアンチ
モン酸化ガスの雰囲気中で5〜30分間焼成する第
4工程と、 エージングした素子を、CVD法により20〜
400ppmシラン系ガスで5〜30分間処理する第5
工程と、 第5工程で作成した素子を加熱してエージング
する第6工程と、 からなるガス検出素子の製造方法。 3 アンチモン酸化ガス雰囲気は、三酸化アンチ
モンのモル数に換算して1×10-9〜4.5×10-8
ル/cm3のアンチモン化合物を600〜850℃の雰囲気
中に5〜60分間入れて作成したものである特許請
求の範囲第2項記載のガス検出素子の製造方法。
[Claims] 1. Pt/Sn with stannic oxide as the main material, platinum and palladium as a catalyst, and an antimony compound as a stabilizer.
= 0.5 to 0.8 mol%, Pd/Sn = 0.1 to 8 mol%,
Sb/Sn has a composition ratio of 0.5 to 8 mol%, and 25 to
A metal oxide semiconductor treated in a 400ppm silane gas atmosphere and the above metal oxide semiconductor
A gas detection element comprising a heating means for heating to 200 to 400°C. 2. Pd/Sn=0.1-8 mol%, Pt/Sn=
The first step is adding an antimony compound to a concentration of 0.5 to 8 mol%, dispersing, and drying, and adding an antimony compound to the sample prepared in the first step.
The second step is to add and mix Sb/Sn so that it is 0.5 to 8 mol%, and the sample prepared in the second step is made into a paste by adding an organic solvent, and this is applied to an insulator with a pair of electrodes. a third step in which the element prepared in the third step is baked for 5 to 30 minutes in the air at 600 to 850°C or an atmosphere of antimony oxidation gas; and a fourth step in which the aged element is 20~ by CVD method
The fifth step is treatment with 400ppm silane gas for 5 to 30 minutes.
A method for producing a gas detection element, comprising: a sixth step of heating and aging the element produced in the fifth step. 3 The antimony oxidation gas atmosphere is created by placing an antimony compound of 1×10 -9 to 4.5×10 -8 mol/cm 3 in terms of the number of moles of antimony trioxide in an atmosphere at 600 to 850°C for 5 to 60 minutes. A method for manufacturing a gas detection element according to claim 2, wherein the gas detection element is produced.
JP20667485A 1985-09-20 1985-09-20 Gas detection element and manufacture thereof Granted JPS6267437A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP20667485A JPS6267437A (en) 1985-09-20 1985-09-20 Gas detection element and manufacture thereof

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP20667485A JPS6267437A (en) 1985-09-20 1985-09-20 Gas detection element and manufacture thereof

Publications (2)

Publication Number Publication Date
JPS6267437A JPS6267437A (en) 1987-03-27
JPH0458905B2 true JPH0458905B2 (en) 1992-09-18

Family

ID=16527238

Family Applications (1)

Application Number Title Priority Date Filing Date
JP20667485A Granted JPS6267437A (en) 1985-09-20 1985-09-20 Gas detection element and manufacture thereof

Country Status (1)

Country Link
JP (1) JPS6267437A (en)

Also Published As

Publication number Publication date
JPS6267437A (en) 1987-03-27

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