JPH0458906B2 - - Google Patents
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- Publication number
- JPH0458906B2 JPH0458906B2 JP21365185A JP21365185A JPH0458906B2 JP H0458906 B2 JPH0458906 B2 JP H0458906B2 JP 21365185 A JP21365185 A JP 21365185A JP 21365185 A JP21365185 A JP 21365185A JP H0458906 B2 JPH0458906 B2 JP H0458906B2
- Authority
- JP
- Japan
- Prior art keywords
- mol
- gas
- atmosphere
- antimony
- sno
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
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- 229910006404 SnO 2 Inorganic materials 0.000 claims description 28
- 238000001514 detection method Methods 0.000 claims description 22
- 229910052787 antimony Inorganic materials 0.000 claims description 13
- XOLBLPGZBRYERU-UHFFFAOYSA-N tin dioxide Chemical class O=[Sn]=O XOLBLPGZBRYERU-UHFFFAOYSA-N 0.000 claims description 13
- 238000004519 manufacturing process Methods 0.000 claims description 11
- 238000001354 calcination Methods 0.000 claims description 10
- BLRPTPMANUNPDV-UHFFFAOYSA-N Silane Chemical compound [SiH4] BLRPTPMANUNPDV-UHFFFAOYSA-N 0.000 claims description 9
- WATWJIUSRGPENY-UHFFFAOYSA-N antimony atom Chemical compound [Sb] WATWJIUSRGPENY-UHFFFAOYSA-N 0.000 claims description 9
- 238000010304 firing Methods 0.000 claims description 8
- 230000003647 oxidation Effects 0.000 claims description 8
- 238000007254 oxidation reaction Methods 0.000 claims description 8
- 229910000077 silane Inorganic materials 0.000 claims description 8
- 238000010438 heat treatment Methods 0.000 claims description 7
- 229910044991 metal oxide Inorganic materials 0.000 claims description 7
- 150000004706 metal oxides Chemical class 0.000 claims description 7
- 239000004065 semiconductor Substances 0.000 claims description 7
- KDLHZDBZIXYQEI-UHFFFAOYSA-N Palladium Chemical compound [Pd] KDLHZDBZIXYQEI-UHFFFAOYSA-N 0.000 claims description 6
- 230000032683 aging Effects 0.000 claims description 6
- 238000000034 method Methods 0.000 claims description 6
- 239000000203 mixture Substances 0.000 claims description 5
- 229910021627 Tin(IV) chloride Inorganic materials 0.000 claims description 4
- ADCOVFLJGNWWNZ-UHFFFAOYSA-N antimony trioxide Chemical compound O=[Sb]O[Sb]=O ADCOVFLJGNWWNZ-UHFFFAOYSA-N 0.000 claims description 4
- 238000005229 chemical vapour deposition Methods 0.000 claims description 4
- 238000001035 drying Methods 0.000 claims description 4
- HPGGPRDJHPYFRM-UHFFFAOYSA-J tin(iv) chloride Chemical compound Cl[Sn](Cl)(Cl)Cl HPGGPRDJHPYFRM-UHFFFAOYSA-J 0.000 claims description 4
- 150000001463 antimony compounds Chemical class 0.000 claims description 3
- 239000000463 material Substances 0.000 claims description 3
- 239000003960 organic solvent Substances 0.000 claims description 3
- 229910052763 palladium Inorganic materials 0.000 claims description 3
- 229910052718 tin Inorganic materials 0.000 claims description 3
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 claims description 2
- 239000003054 catalyst Substances 0.000 claims description 2
- 239000012212 insulator Substances 0.000 claims description 2
- PIBWKRNGBLPSSY-UHFFFAOYSA-L palladium(II) chloride Chemical compound Cl[Pd]Cl PIBWKRNGBLPSSY-UHFFFAOYSA-L 0.000 claims description 2
- 239000003381 stabilizer Substances 0.000 claims description 2
- 239000011248 coating agent Substances 0.000 claims 1
- 238000000576 coating method Methods 0.000 claims 1
- 239000007789 gas Substances 0.000 description 54
- KFZMGEQAYNKOFK-UHFFFAOYSA-N Isopropanol Chemical compound CC(C)O KFZMGEQAYNKOFK-UHFFFAOYSA-N 0.000 description 15
- 230000004044 response Effects 0.000 description 14
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 10
- 230000000694 effects Effects 0.000 description 7
- 150000001875 compounds Chemical class 0.000 description 6
- 235000019441 ethanol Nutrition 0.000 description 5
- 239000000243 solution Substances 0.000 description 5
- 239000007864 aqueous solution Substances 0.000 description 4
- PDWVXNLUDMQFCH-UHFFFAOYSA-N oxoantimony;hydrochloride Chemical compound Cl.[Sb]=O PDWVXNLUDMQFCH-UHFFFAOYSA-N 0.000 description 4
- 230000007423 decrease Effects 0.000 description 3
- 238000005259 measurement Methods 0.000 description 3
- 239000010453 quartz Substances 0.000 description 3
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 3
- QGZKDVFQNNGYKY-UHFFFAOYSA-N Ammonia Chemical compound N QGZKDVFQNNGYKY-UHFFFAOYSA-N 0.000 description 2
- UGFAIRIUMAVXCW-UHFFFAOYSA-N Carbon monoxide Chemical compound [O+]#[C-] UGFAIRIUMAVXCW-UHFFFAOYSA-N 0.000 description 2
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 2
- 230000004913 activation Effects 0.000 description 2
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 2
- 229910002091 carbon monoxide Inorganic materials 0.000 description 2
- 239000006185 dispersion Substances 0.000 description 2
- 238000004108 freeze drying Methods 0.000 description 2
- NNPPMTNAJDCUHE-UHFFFAOYSA-N isobutane Chemical compound CC(C)C NNPPMTNAJDCUHE-UHFFFAOYSA-N 0.000 description 2
- HWSZZLVAJGOAAY-UHFFFAOYSA-L lead(II) chloride Chemical compound Cl[Pb]Cl HWSZZLVAJGOAAY-UHFFFAOYSA-L 0.000 description 2
- VNWKTOKETHGBQD-UHFFFAOYSA-N methane Chemical compound C VNWKTOKETHGBQD-UHFFFAOYSA-N 0.000 description 2
- 230000035945 sensitivity Effects 0.000 description 2
- OTMSDBZUPAUEDD-UHFFFAOYSA-N Ethane Chemical compound CC OTMSDBZUPAUEDD-UHFFFAOYSA-N 0.000 description 1
- VGGSQFUCUMXWEO-UHFFFAOYSA-N Ethene Chemical compound C=C VGGSQFUCUMXWEO-UHFFFAOYSA-N 0.000 description 1
- 239000005977 Ethylene Substances 0.000 description 1
- XYFCBTPGUUZFHI-UHFFFAOYSA-N Phosphine Chemical compound P XYFCBTPGUUZFHI-UHFFFAOYSA-N 0.000 description 1
- 229910021529 ammonia Inorganic materials 0.000 description 1
- 150000001462 antimony Chemical class 0.000 description 1
- RBFQJDQYXXHULB-UHFFFAOYSA-N arsane Chemical compound [AsH3] RBFQJDQYXXHULB-UHFFFAOYSA-N 0.000 description 1
- SLLGVCUQYRMELA-UHFFFAOYSA-N chlorosilicon Chemical compound Cl[Si] SLLGVCUQYRMELA-UHFFFAOYSA-N 0.000 description 1
- 230000000052 comparative effect Effects 0.000 description 1
- 230000003247 decreasing effect Effects 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- ZOCHARZZJNPSEU-UHFFFAOYSA-N diboron Chemical compound B#B ZOCHARZZJNPSEU-UHFFFAOYSA-N 0.000 description 1
- BUMGIEFFCMBQDG-UHFFFAOYSA-N dichlorosilicon Chemical compound Cl[Si]Cl BUMGIEFFCMBQDG-UHFFFAOYSA-N 0.000 description 1
- 230000005611 electricity Effects 0.000 description 1
- 239000001257 hydrogen Substances 0.000 description 1
- 229910052739 hydrogen Inorganic materials 0.000 description 1
- 125000004435 hydrogen atom Chemical class [H]* 0.000 description 1
- 230000001771 impaired effect Effects 0.000 description 1
- 238000003780 insertion Methods 0.000 description 1
- 230000037431 insertion Effects 0.000 description 1
- 239000001282 iso-butane Substances 0.000 description 1
- 239000011259 mixed solution Substances 0.000 description 1
- 239000004570 mortar (masonry) Substances 0.000 description 1
- HBEQXAKJSGXAIQ-UHFFFAOYSA-N oxopalladium Chemical compound [Pd]=O HBEQXAKJSGXAIQ-UHFFFAOYSA-N 0.000 description 1
- LIYKJALVRPGQTR-UHFFFAOYSA-M oxostibanylium;chloride Chemical compound [Cl-].[Sb+]=O LIYKJALVRPGQTR-UHFFFAOYSA-M 0.000 description 1
- 229910003445 palladium oxide Inorganic materials 0.000 description 1
- 229910052573 porcelain Inorganic materials 0.000 description 1
- 230000004043 responsiveness Effects 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- ZDHXKXAHOVTTAH-UHFFFAOYSA-N trichlorosilane Chemical compound Cl[SiH](Cl)Cl ZDHXKXAHOVTTAH-UHFFFAOYSA-N 0.000 description 1
- 239000005052 trichlorosilane Substances 0.000 description 1
- 238000007740 vapor deposition Methods 0.000 description 1
Landscapes
- Investigating Or Analyzing Materials By The Use Of Fluid Adsorption Or Reactions (AREA)
Description
〔産業上の利用分野〕
この発明は、シラン系ガスなどの特殊ガスを選
択的に検出できるガス検出素子とその製造方法に
関するものである。
〔従来技術〕
モノシラン(SiH4),ジクロルシラン(SiH2
Cl2),トリクロルシラン(SiHCl3),ホスフイン
(PH3),ジボラン(B2H6)やアルシン(AsH3)
など、空気などの他の気体と接触混合すると数%
の濃度で自然発火する特殊ガスを検出することが
できるガス検出素子として、本発明者は、先に特
願昭59−98818号(特開昭60−243548号公報)に
よつて酸化第2スズ(SnO2)とパラジウム
(Pb)とアンチモン化合物(Sb化合物)を組成物
としシラン系ガス雰囲気で後処理した金属酸化物
半導体のガス検出素子を提案している。
このSnO2−Pb−Sb化合物系ガス検出素子は、
10ppmのSiH4ガスにさらしたときのSN比が5程
度、応答時間が150秒前後であり、エチルアルコ
ール(EtOH)100ppmに対するSiH4ガス10ppm
のガス選択性はR(EtOH 100ppm)/R(SiH4
10ppm)=0.5程度である。
〔目的と解決手段〕
この発明は、応答時間が早く、ガス選択性の良
好な、特殊ガスを選択的に検出できるガス検出素
子とその製造方法を目的とするもので、酸化第2
スズSnO2または塩化第2スズ(SnCl4)が添加さ
れたSnO2を仮焼成して得た活性化酸化第2スズ
(SnO2)を主材とし、パラジウム(Pb)を触媒、
アンチモン(Sb)を安定材としてPb/Sn=0.1〜
8モル%、Sb/Sn=0.5〜8モル%の組成比を有
し、20〜400ppmのシラン系ガス雰囲気で処理し
てなる金属酸化物半導体と、この金属酸化物半導
体を200〜400℃に加熱する加熱手段とからなるこ
とを特徴とするものである。
また、製造方法は次の工程を有することを特徴
とするものである。
SnO2にSnCl4をSnCl4/SnO2=0〜20モル%
となるように添加し、600〜900℃の大気雰囲気
中で仮焼成して活性化SnO2を作成する。
活性化SnO2に酸化パラジウム(PbCl2)溶液
をPb/Sn=0.1〜8モル%となるように加えて
分散させ、乾燥する。
の試料にSb化合物をSb/Sn=0.5〜8モル
%となるように加えて混合する。
の試料に有機溶剤を加えてペースト状に
し、1対の電極が設けられた絶縁体に塗布し乾
燥する。
の素子を、600〜850℃の大気またはアンチ
モン酸化ガスの雰囲気中で5〜30分間焼成す
る。
の素子を、CVD法により、20〜400ppmの
シラン系ガスで5〜30分間処理する。
の素子を加熱してエージングする。
〔作用〕
SnCl4をSnCl4/SnO2=0〜20モル%添加した
SnO2を仮焼成して得た活性化SnO2を主材とした
ことにより、特殊ガス以外のガスに対する感度を
低減させ、かつ特殊ガスへの応答性を早くする作
用がある。
〔実施例〕
以下、この発明のガス検出素子とその製造方法
について実施例により説明する。
実施例1〜10のガス検出素子を次の製造方法に
より製作した。なお、各実施例でのガス検出素子
の製作個数は8個ずつである。
まず、酸化第2スズSnO2に塩化第2スズSnCl4
溶液を、SnCl4/SnO2=0〜10モル%となるよう
に混合し、大気中で600〜900℃の所定温度まで直
線的に昇温させ、所定温度で30分間焼成(以後こ
の焼成を仮焼成という)して活性化SnO2を作成
する。
次に、活性化SnO2に塩化パラジウムPbCl2溶液
をPb/Sn=0.1〜8.0モル%となるように加えて混
合水溶液を作成する。なお、PbCl2溶液は、
PbCl2に例えば0.2%の塩酸水溶液を加えて作成す
る。
この混合水溶液を超音波かくはん機によつてか
くはんし、Pbを良く分散させる。その後、この
分散混合溶液を真空凍結乾燥器にセツトし、−40
℃以下で急速凍結乾燥させて乾燥試料を作成す
る。
そして、この乾燥試料にオキシ塩化アンチモン
(SbOCl)をSb/Sn=1.0〜8モル%となるよう
に加え、乳鉢で約30分間混合して混合試料を得
る。
なお、実施例1〜10における各混合試料のPb,
SbとSnの組成比は後掲の表に示す通りである。
この混合試料に有機溶剤であるイソプロピルア
ルコールを加えてペースト状の混合試料とし、こ
れを1対の電極を有するアルミナ磁器管上に1対
の電極間を覆うように塗布し、その後自然乾燥す
る。
次に、この自然乾燥した素子を700℃にセツト
したアンチモン酸化ガス雰囲気の石英管中で10分
または15分間焼成する。このアンチモン酸化ガス
雰囲気は、後掲の表の焼成雰囲気に示す通り、
2.5mgのSbOClをアルミナボートに載置し、これ
を700℃にセツトされた石英管(内径4cm、電気
炉挿入部50cm)中に30分間入れて蒸発させて作成
したものである。
そして焼成後の素子にヒータを取り付け、この
ヒータに通電して素子を300±50℃に加熱し、大
気中で10時間の1回目のエージングを行う。
さらに、1回目のエージングが終了した素子を
ヒータによつて325±5℃に加熱し、空気中に
50ppmの濃度のSiH4ガスを含んだシラン系ガス
雰囲気中に10分間さらし、CVD法(chemical
vapor deposition method)によつて素子の表面
にSi酸化物を分散させて金属酸化物半導体を得
る。
最後に、この素子をヒータによつて300±50℃
に加熱し、大気中で12時間の2回目のエージング
を行つて各実施例のガス検出素子を完成する。
なお、実施例11は、実施例1〜10と比較を行う
ため、活性化SnO2を用いずに、仮焼成していな
いSnO2を用いて上記製造方法により製作した比
較用のガス検出素子である。
このようにして製作した実施例1〜11のそれぞ
れ8個ずつのガス検出素子について大気中での抵
抗値Roを測定し、各実施例毎に8個の素子の平
均値を求めたことろ表に示す結果が得られた。
[Industrial Field of Application] The present invention relates to a gas detection element that can selectively detect special gases such as silane gases, and a method for manufacturing the same. [Prior art] Monosilane (SiH 4 ), dichlorosilane (SiH 2
Cl 2 ), trichlorosilane (SiHCl 3 ), phosphine (PH 3 ), diborane (B 2 H 6 ) and arsine (AsH 3 )
etc., several percent when mixed with other gases such as air.
As a gas detection element capable of detecting a special gas that spontaneously combusts at a concentration of We have proposed a metal oxide semiconductor gas detection element with a composition of (SnO 2 ), palladium (Pb), and antimony compound (Sb compound) and post-treated in a silane gas atmosphere. This SnO 2 -Pb-Sb compound gas detection element is
When exposed to 10 ppm SiH 4 gas, the SN ratio is about 5, the response time is around 150 seconds, and 10 ppm of SiH 4 gas is used for 100 ppm of ethyl alcohol (EtOH).
The gas selectivity of R(EtOH 100ppm)/R(SiH 4
10ppm) = approximately 0.5. [Objective and solution] The object of the present invention is to provide a gas detection element that has a quick response time, good gas selectivity, and can selectively detect special gases, and a method for manufacturing the same.
The main material is activated stannic oxide (SnO 2 ) obtained by pre-calcining SnO 2 to which tin SnO 2 or stannic chloride (SnCl 4 ) has been added, and palladium (Pb) is used as a catalyst.
Pb/Sn=0.1~ using antimony (Sb) as a stabilizer
A metal oxide semiconductor having a composition ratio of 8 mol% and Sb/Sn = 0.5 to 8 mol% and treated in a 20 to 400 ppm silane-based gas atmosphere and this metal oxide semiconductor heated to 200 to 400°C. It is characterized by comprising a heating means for heating. Further, the manufacturing method is characterized by having the following steps. Add SnCl 4 to SnO 2 SnCl 4 /SnO 2 = 0 to 20 mol%
Activated SnO 2 is created by pre-calcining in an air atmosphere at 600 to 900°C. A palladium oxide (PbCl 2 ) solution is added to the activated SnO 2 so that Pb/Sn=0.1 to 8 mol % and dispersed, followed by drying. An Sb compound is added to the sample so that Sb/Sn=0.5 to 8 mol% and mixed. An organic solvent is added to the sample to form a paste, which is applied to an insulator provided with a pair of electrodes and dried. The device is fired for 5 to 30 minutes in air or antimony oxidation gas atmosphere at 600 to 850°C. The device is treated with 20 to 400 ppm silane gas for 5 to 30 minutes by CVD method. The device is heated and aged. [Effect] SnCl 4 was added at SnCl 4 /SnO 2 = 0 to 20 mol%
By using activated SnO 2 obtained by pre-calcining SnO 2 as the main material, it has the effect of reducing sensitivity to gases other than special gases and increasing responsiveness to special gases. [Example] Hereinafter, the gas detection element of the present invention and the manufacturing method thereof will be explained with reference to Examples. Gas detection elements of Examples 1 to 10 were manufactured by the following manufacturing method. Note that the number of gas detection elements manufactured in each example was eight. First, stannic chloride SnCl 4 is added to stannic oxide SnO 2
The solution was mixed so that SnCl 4 /SnO 2 = 0 to 10 mol%, heated linearly in the air to a predetermined temperature of 600 to 900°C, and baked at the predetermined temperature for 30 minutes (hereinafter, this baking was (Calcination) to create activated SnO 2 . Next, a palladium chloride PbCl2 solution is added to the activated SnO2 so that Pb/Sn=0.1 to 8.0 mol% to create a mixed aqueous solution. In addition, the PbCl 2 solution is
It is created by adding, for example, a 0.2% hydrochloric acid aqueous solution to PbCl2 . This mixed aqueous solution is stirred using an ultrasonic stirrer to disperse Pb well. Thereafter, this dispersed mixed solution was set in a vacuum freeze dryer and dried at −40°C.
Dry samples are prepared by rapid freeze-drying at temperatures below ℃. Then, antimony oxychloride (SbOCl) is added to this dry sample so that Sb/Sn=1.0 to 8 mol%, and mixed in a mortar for about 30 minutes to obtain a mixed sample. In addition, Pb of each mixed sample in Examples 1 to 10,
The composition ratio of Sb and Sn is as shown in the table below. Isopropyl alcohol, which is an organic solvent, is added to this mixed sample to form a paste-like mixed sample, which is applied onto an alumina porcelain tube having a pair of electrodes so as to cover between the pair of electrodes, and then air-dried. Next, this air-dried element is fired for 10 or 15 minutes in a quartz tube set at 700°C in an antimony oxidation gas atmosphere. This antimony oxidation gas atmosphere is as shown in the firing atmosphere in the table below.
It was prepared by placing 2.5 mg of SbOCl on an alumina boat and placing it in a quartz tube (inner diameter 4 cm, electric furnace insertion part 50 cm) set at 700°C for 30 minutes to evaporate it. Then, a heater is attached to the element after firing, and electricity is applied to the heater to heat the element to 300±50°C, and the first aging is performed for 10 hours in the atmosphere. Furthermore, the element that has undergone the first aging is heated to 325±5℃ using a heater, and then placed in the air.
The CVD method (chemical
A metal oxide semiconductor is obtained by dispersing Si oxide on the surface of the device using a vapor deposition method. Finally, this element is heated to 300±50℃ using a heater.
The gas detection element of each example was completed by heating to 100% and performing a second aging in the atmosphere for 12 hours. In addition, in order to compare with Examples 1 to 10, Example 11 is a comparative gas detection element manufactured by the above manufacturing method using SnO 2 that has not been pre-fired without using activated SnO 2 . be. The resistance value Ro in the atmosphere was measured for each of the eight gas detection elements of Examples 1 to 11 manufactured in this way, and the average value of the eight elements was determined for each example. The results shown are obtained.
【表】【table】
【表】
なお、上記の測定ならびに後記の測定のいずれ
の場合にも、各実施例のガス検出素子をヒータに
より325±10℃に加熱して行つた。
次に実施例1〜11の各素子を、それぞれ空気中
に100ppmの濃度の水素(H2),メタン(CH4),
エチレン(C2H4),エタン(C2H6),イソブタン
(iC4H10),アンモニア(NH3),一酸化炭素
(CO),イソプロピルアルコール(iPA),エチル
アルコール(EtOH),を各別に含む各供試ガス
雰囲気中、ならびに空気中に10ppmの濃度の
SiH4ガスを含む供試ガス雰囲気中に順次にさら
し、各供試ガス中での抵抗値Rgならびに応答時
間を測定した。この測定結果から、各実験例毎に
各供試ガスに対するSN比、つまりRo/Rg、な
らびに応答時間について8個の素子の平均値を求
めたところ、表に示す結果が得られた。
この結果から、実施例1〜10のガス検出素子
は、実施例11の素子に比べ、SiH4ガスに対する
SN比にはあまり変化がみられないものの、他の
ガスに対するSN比は2/3〜1/2程度に低下してお
り、SiH4ガスの選択度が大巾に向上しているこ
とがわかる。なお、iPAに対するSiH4の選択度
[Table] In both the above measurements and the measurements described below, the gas detection elements of each example were heated to 325±10° C. with a heater. Next, each element of Examples 1 to 11 was exposed to hydrogen (H 2 ), methane (CH 4 ),
Ethylene (C 2 H 4 ), ethane (C 2 H 6 ), isobutane (iC 4 H 10 ), ammonia (NH 3 ), carbon monoxide (CO), isopropyl alcohol (iPA), ethyl alcohol (EtOH), At a concentration of 10 ppm in each test gas atmosphere and air,
They were sequentially exposed to a test gas atmosphere containing SiH 4 gas, and the resistance value Rg and response time in each test gas were measured. From these measurement results, the average values of the 8 elements for the SN ratio, that is, Ro/Rg, and response time for each sample gas were determined for each experimental example, and the results shown in the table were obtained. From this result, the gas detection elements of Examples 1 to 10 have a higher sensitivity to SiH 4 gas than the element of Example 11.
Although there is not much change in the S/N ratio, the S/N ratio for other gases has decreased to about 2/3 to 1/2, indicating that the selectivity of SiH 4 gas has greatly improved. . In addition, the selectivity of SiH 4 for iPA
【R(iPA)/R(SiH4)】と活性化SnO2を仮焼成
する際の焼成温度との関係を実施例3、6〜8か
ら求めると、第1図に示す通りである。
また、SiH4に対する応答時間は、実施例1〜
10は実施例11に比べて約1/2の時間であり、大巾
に向上していることがわかる。なお、実施例1〜
5から、SnO2のみを仮焼成して作成した活性化
SnO2を用いた場合でも応答時間は十分に早くな
るが、SnO2にさらにSnO4を添加して仮焼成した
活性化SnO2を用いた場合には応答時間がより早
くなることがわかる。この活性化SnO2を作成す
る際のSnCl4/SnO2と応答時間との関係を図に示
すと第2図に示す通りであり、この第2図から、
SnCl4の添加量はSnO2に対し20モル%程度まで大
きな効果があることがわかる。
また、第3図に、各供試ガスに対する応答特性
の代表例として、実施例3のうちの1つのガス検
出素子の応答特性を示す。
ところで、上記製造方法における各種条件は次
の通りである。
活性化SnO2を作成するための所定温度での仮
焼成時間は10分〜数時間の範囲である。
混合水溶液の乾燥は自然乾燥などで行つてもよ
い。この場合には、急速凍結乾燥の場合に比べ、
Pbの分散状態にむらが生じやすく、製品の歩留
りは低下する。
乾燥試料に添加するSbは、SbOClのほかSb2O3
などのSb化合物でよく、その添加量はSb/Sn=
0.5〜8モル%の範囲が適当である。この範囲外
では、素子のPbの活性度が損なわれたり、Roが
小さくなる。
素子を焼成する際のアンチモン酸化ガス雰囲気
は、上記石英管を用いた場合には、0.25〜10mgの
SbOClまたは三酸化アンチモンSb2O3などのSb化
合物を600〜850℃の温度雰囲気に5〜60分間入れ
て作成した雰囲気を使用する。この場合のSb化
合物の量は、Sb2O3のモル数に換算して1×10-9
〜4.5×10-8モル/cm3である。
なお、素子の焼成は大気雰囲気中で行つてもよ
い。この場合、素子を連続して製造すると、アン
チモン酸化ガス雰囲気中の場合に比べ、製造ロツ
ド間での抵抗値のばらつきが大きくなる点を除け
ば差はない。
また、素子を焼成する際の温度と時間は、アン
チモン酸化ガスあるいは大気のいずれの雰囲気で
も、600〜850℃ならびに5〜30分間の範囲であ
る。この範囲外ではPbの活性度が低下する。
CVD法による金属酸化物半導体の分散処理は、
SiH2Cl2などのシラン系ガスで行つてもよく、ま
た、シラン系ガスの濃度範囲は20〜400ppmであ
る。この範囲外の濃度では、特殊ガスに対する選
択度が低下する。なお、この際の処理温度ならび
に時間は150〜850℃、5〜30分間の範囲である。
エージングは、1回目は省略してもよく、2回
目は10時間以上行うことが望ましい。
また、ガス検出を行う際のガス検出素子の加熱
温度範囲は200〜400℃である。この範囲外では、
特殊ガスに対する応答時間が遅くなるとともに、
選択性が低下する。
〔効果〕
この発明によれば、低濃度の特殊ガスを良好な
選択性でかつ早い応答時間で検出可能なガス検出
素子とその製造方法が得られる効果がある。The relationship between [R(iPA)/R(SiH 4 )] and the firing temperature when pre-calcining the activated SnO 2 was determined from Examples 3 and 6 to 8, and is as shown in FIG. In addition, the response time to SiH 4 is from Example 1 to
10 is approximately 1/2 the time compared to Example 11, which indicates a significant improvement. In addition, Example 1~
Activation created by pre-calcining only SnO 2 from 5.
It can be seen that although the response time is sufficiently fast even when SnO 2 is used, the response time is even faster when activated SnO 2 is used, which is pre-calcined by adding SnO 4 to SnO 2 . The relationship between SnCl 4 /SnO 2 and response time when creating this activated SnO 2 is shown in Figure 2, and from this Figure 2,
It can be seen that the amount of SnCl 4 added has a large effect up to about 20 mol% relative to SnO 2 . Further, FIG. 3 shows the response characteristics of one gas detection element of Example 3 as a representative example of the response characteristics for each sample gas. By the way, various conditions in the above manufacturing method are as follows. The pre-calcination time at a predetermined temperature to create activated SnO 2 ranges from 10 minutes to several hours. The mixed aqueous solution may be dried by natural drying or the like. In this case, compared to the case of rapid freeze-drying,
The dispersion state of Pb tends to become uneven, and the product yield decreases. Sb added to the dry sample includes SbOCl and Sb 2 O 3
Sb compounds such as
A range of 0.5 to 8 mol% is suitable. Outside this range, the activity of Pb in the element may be impaired or Ro may become small. When the above quartz tube is used, the antimony oxidation gas atmosphere when firing the element is 0.25 to 10 mg.
An atmosphere created by placing an Sb compound such as SbOCl or antimony trioxide Sb 2 O 3 in an atmosphere at a temperature of 600 to 850° C. for 5 to 60 minutes is used. The amount of Sb compound in this case is 1×10 -9 in terms of the number of moles of Sb 2 O 3
~4.5×10 −8 mol/cm 3 . Note that the firing of the element may be performed in an air atmosphere. In this case, there is no difference except that when devices are manufactured continuously, the variation in resistance value between manufacturing rods becomes larger than when the devices are manufactured in an antimony oxidation gas atmosphere. Further, the temperature and time for firing the device are in the range of 600 to 850° C. and 5 to 30 minutes in either antimony oxidation gas or air atmosphere. Outside this range, the activity of Pb decreases. Dispersion treatment of metal oxide semiconductors by CVD method is
Silane gas such as SiH 2 Cl 2 may be used, and the concentration range of the silane gas is 20 to 400 ppm. Concentrations outside this range reduce selectivity to specialty gases. Note that the treatment temperature and time at this time are in the range of 150 to 850°C for 5 to 30 minutes. The first aging may be omitted, and the second aging is preferably performed for 10 hours or more. Further, the heating temperature range of the gas detection element during gas detection is 200 to 400°C. Outside this range,
The response time to special gases is slower and
Selectivity decreases. [Effects] According to the present invention, there is an effect that a gas detection element capable of detecting a low concentration special gas with good selectivity and a fast response time and a method for manufacturing the same can be obtained.
第1図〜第3図はこの発明によるガス検出素子
の特性を示す図で、第1図は選択度と活性化
SnO2の仮焼成温度との関係を、第2図はSnCl4/
SnO2と応答時間との関係を、第3図は実施例3
のうちの1つの素子の各ガスに対する応答特性を
それぞれ示している。
Figures 1 to 3 are diagrams showing the characteristics of the gas detection element according to the present invention, and Figure 1 shows selectivity and activation.
Figure 2 shows the relationship between the pre-calcination temperature of SnO 2 and SnCl 4 /
Figure 3 shows the relationship between SnO 2 and response time in Example 3.
The response characteristics of one of the elements to each gas are shown.
Claims (1)
た酸化第2スズを仮焼成して得た活性化酸化第2
スズを主材、パラジウムを触媒、アンチモンを安
定材としてPb/Sn=0.1〜8モル%、Sb/Sn=
0.5〜8モル%の組成比を有し、20〜400ppmのシ
ラン系ガス雰囲気で処理された金属酸化物半導体
と、この金属酸化物半導体を200〜400℃に加熱す
る加熱手段とからなることを特徴とするガス検出
素子。 2 酸化第2スズに塩化第2スズをSnCl4/SnO2
=0〜20モル%となるように添加し、600〜900℃
の大気雰囲気中で仮焼成して活性化酸化第2スズ
を作成する第1工程と、 活性化酸化第2スズに塩化パラジウム溶液を
Pb/Sn=0.1〜8モル%となるように加えて分散
させ、乾燥させる第2工程と、 第2工程で作成した試料にアンチモン化合物を
Sb/Sn=0.5〜8モル%となるように加えて混合
する第3工程と、 第3工程で作成した試料に有機溶剤を加えてペ
ースト状にし、これを1対の電極を有する絶縁体
に塗布し、乾燥させる第4工程と、 第4工程で作成した素子を、600〜850℃の大気
またはアンチモン酸化ガスの雰囲気中で5〜30分
間焼成する第5工程と、 第5工程で焼成した素子を、CVD法により20
〜400ppmのシラン系ガスで5〜30分間処理する
第6工程と、 第6工程で作成した素子を加熱してエージング
する第7工程と、 からなるガス検出素子の製造方法。 3 アンチモン酸化ガス雰囲気は、三酸化アンチ
モンのモル数に換算して1×10-9〜4.5×10-8モ
ル/cm3のアンチモン化合物を600〜850℃の雰囲気
中に5〜60分間入れて作成したものである特許請
求の範囲第2項記載のガス検出素子の製造方法。[Claims] 1. Activated stannic oxide obtained by pre-calcining stannic oxide to which stannic oxide or stannic chloride has been added.
Main material: tin, palladium as catalyst, antimony as stabilizer, Pb/Sn=0.1-8 mol%, Sb/Sn=
It consists of a metal oxide semiconductor having a composition ratio of 0.5 to 8 mol% and treated in a silane-based gas atmosphere of 20 to 400 ppm, and a heating means for heating this metal oxide semiconductor to 200 to 400°C. Characteristic gas detection element. 2 Adding stannic chloride to stannic oxide as SnCl 4 /SnO 2
= 0 to 20 mol%, 600 to 900℃
The first step is to create activated stannic oxide by pre-calcining in an atmospheric atmosphere, and to add a palladium chloride solution to the activated stannic oxide.
A second step of adding Pb/Sn to a concentration of 0.1 to 8 mol%, dispersing it, and drying it; and adding an antimony compound to the sample prepared in the second step.
A third step is to add and mix Sb/Sn so that it is 0.5 to 8 mol%. An organic solvent is added to the sample prepared in the third step to form a paste, and this is applied to an insulator with a pair of electrodes. a fourth step of coating and drying; a fifth step of firing the element created in the fourth step for 5 to 30 minutes in the air at 600 to 850°C or an atmosphere of antimony oxidation gas; and a fifth step of firing the element in the fifth step. The device was manufactured using the CVD method.
A method for manufacturing a gas detection element, comprising: a sixth step of treating with ~400 ppm silane gas for 5 to 30 minutes; and a seventh step of heating and aging the element produced in the sixth step. 3 The antimony oxidation gas atmosphere is created by placing an antimony compound of 1×10 -9 to 4.5×10 -8 mol/cm 3 in terms of the number of moles of antimony trioxide in an atmosphere at 600 to 850°C for 5 to 60 minutes. A method for manufacturing a gas detection element according to claim 2, wherein the gas detection element is produced.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP21365185A JPS6275245A (en) | 1985-09-28 | 1985-09-28 | Gas detecting element and its production |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP21365185A JPS6275245A (en) | 1985-09-28 | 1985-09-28 | Gas detecting element and its production |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS6275245A JPS6275245A (en) | 1987-04-07 |
| JPH0458906B2 true JPH0458906B2 (en) | 1992-09-18 |
Family
ID=16642692
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP21365185A Granted JPS6275245A (en) | 1985-09-28 | 1985-09-28 | Gas detecting element and its production |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS6275245A (en) |
-
1985
- 1985-09-28 JP JP21365185A patent/JPS6275245A/en active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS6275245A (en) | 1987-04-07 |
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