JPH046116B2 - - Google Patents
Info
- Publication number
- JPH046116B2 JPH046116B2 JP59173405A JP17340584A JPH046116B2 JP H046116 B2 JPH046116 B2 JP H046116B2 JP 59173405 A JP59173405 A JP 59173405A JP 17340584 A JP17340584 A JP 17340584A JP H046116 B2 JPH046116 B2 JP H046116B2
- Authority
- JP
- Japan
- Prior art keywords
- adhesive
- oxidizing agent
- insulating substrate
- rubber
- filler
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
Landscapes
- Manufacturing Of Printed Wiring (AREA)
Description
〔発明の利用分野〕
本発明は、表面を金属化した絶縁基板及びその
製造方法に関する。
〔発明の背景〕
従来より、絶縁基板表面を金属化する方法には
無電解めつき法がある。この方法として、絶縁基
板表面のめつきする部分を粗化する方法(特公昭
35−7732号)及びめつき膜との密着力を向上させ
るため、絶縁基板表面にアクリロニトリルブタジ
エン変性合成樹脂(接着剤)を塗布してからめつ
きする方法(特公昭39−15251号)が開発された
が、これらの方法でもめつき膜との密着が十分で
ないため、類似接着剤をクロム−硫酸で清浄化す
る方法(特公昭40−4393号、特公昭40−9664号)、
クロム−硫酸で処理してカルボニル基、カルボキ
シル基を生成すると共に、表面の錨繋効果とでめ
つき膜との密着力を向上させる方法(特公昭45−
9996号)、クロム−硫酸で処理して該接着剤表面
を多孔性構造にする方法(特公昭52−31539号)、
及びクロム−硫酸や過マンガン酸塩で処理してカ
ルボニル基を生成すると共に該接着剤表面を微孔
性にしてめつき膜との密着力を向上させる方法
(特開昭52−15569号)などが提案されている。
これら絶縁基板表面に接着剤を設け、その表面
をクロム−硫酸に代表される酸化剤で処理する方
法では、酸化剤が新しい場合は酸化力が強いため
ゴムを分解、溶解して該接着剤表面にカルボニル
基や、カルボキシル基を生成し、且つ、表面を多
孔性若しくは微孔性にする能力が高い。したがつ
て、めつき膜との密着力が高くなる。しかし、他
方でこの酸化剤は接着剤の処理面積が増大する
と、例えばクロム−硫酸の酸化剤の場合、Cr3+が
増加すると共に、接着剤成分のゴムや樹脂の分解
物、溶解物も蓄積されて次第にその酸化力が低下
し、結果的に、カルボニル基やカルボキシル基の
生成、及び表面の多孔性、微孔性が得られなくな
り、めつき膜との密着力が低下してくる問題があ
る。このため、従来法ではCr3+を還元してCr6+に
戻す技術を併用して酸化剤の寿命を延ばしている
が、接着剤の分解物、溶解物の蓄積に伴う酸化力
の低下を防止することができなかつた。このた
め、従来法ではCr3+、Cr6+量の管理の他に、接着
剤の処理面積をも管理し、規定処理面積に達する
と酸化剤を更新する必要があつた。
〔発明の目的〕
本発明は上述した従来法の問題にかんがみてな
されたもので、酸化剤の酸化力の低下に伴うめつ
き膜との密着力低下を防止する方法に関する。こ
のため、酸化剤で処理した該接着剤表面を新たな
表面構造とすることも提供する。
〔発明の概要〕
本発明を概説すれば、本発明は表面を金属化し
た絶縁基板の製造方法に関する発明であつて、酸
化剤に分解若しくは溶解するゴム、フイラー及び
熱硬化性樹脂を主成分とする接着剤組成物層を絶
縁基板の表面に設ける工程、該接着剤層表面を酸
化剤で処理してその表面付近に存在するゴム、フ
イラー及び熱硬化性樹脂を分解若しくは溶解する
工程、その後表面に付着しているこれら分解物及
び溶解物を、50〜100℃で1〜60分間、湯洗して
除去し、該接着剤層表面をフイラーが除かれた凹
部と、露出したゴム粒子の凸部とを有する構造と
する工程、及びこの表面の一部又は全面に無電解
めつきにより金属を付着させる工程の各工程を包
含することを特徴とする。
本発明の最大特徴は、上述酸化剤の酸化力が低
下してもめつき膜との密着力が低下しない点にあ
る。この特性を引出す構成としては、絶縁基板表
面に設ける接着剤成分を、酸化剤によつて分解、
溶解するものとして従来のゴム(アクリロニトリ
ルブタジエンゴム)以外に、これをフイラー、熱
硬化性樹脂まで拡大し、この接着剤組成物を絶縁
基板に塗布、硬化した後、クロム−硫酸等の酸化
剤で処理した後、その表面を湯洗することを特徴
とする。もちろん、上記接着剤に加硫剤、加硫助
剤を添加することは当然である。この方法によ
り、該接着剤の表面は前記従来法の多孔性や微孔
性とは異なり、フイラーが除かれた凹部と、熱硬
化性樹脂が除かれて露出したゴム粒子の凸部とが
均一に形成された新たな構造となる。本発明で行
う湯洗は特に酸化剤が劣化した時に大きな効果と
なつて現われる。すなわち、酸化剤が新しい場合
は、湯洗をしなくても、上記表面構造が得られや
すいが、接着剤の処理面積が増大すると、Cr3+の
増加や接着剤成分の分解物、溶解物の蓄積によつ
て該表面構造が得られにくくなる。この時に湯洗
を行うと、接着剤表面の分解物が除去されて、新
しい酸化剤で処理した場合とほぼ同じ表面構造が
得られる。したがつて、湯洗を行うことで酸化剤
の寿命(接着剤の処理面積)は、約2.7倍まで延
びる。すなわち、酸化剤が劣化しても、湯洗を行
うことでめつき膜の密着力の低下が起らない。こ
の理由の1つとして、酸化剤及び湯洗で処理した
後の本発明の接着剤表面構造が、従来技術の多孔
性、微孔性ではなく、凹部と凸部とが均一に形成
された構造になつていることが考えられる。前記
のように湯洗は、酸化剤が劣化した時に効果を有
するが、工業的には酸化剤処理工程の次に設けて
おくことにより、酸化剤が新しい場合でも処理で
きるようにしておくことができる。
本発明で使用する接着剤成分は、例えば酸化剤
の酸化物であるCr6+に分解するゴム(アクリロニ
トリルブタジエンゴム)と、酸化剤の溶媒である
硫酸に分解、溶解するフイラー(炭酸塩、シリカ
などの微粉末)とレゾール型フエノール樹脂を主
成分として用いる。その他成分としては加硫剤と
して硫黄の微粉末、加硫助剤として酸化亜鉛を用
いる。上記レゾール型フエノール樹脂は、Cr3+が
増加した時でも硫酸で分解しやすく、且つ、後の
湯洗で除去しやすいものとして、フエノール、ホ
ルマリン、触媒としてアンモニア、反応溶媒とし
てキシレンを原料とし、縮合、中和、水抜きをし
た後、硬化剤としてヘキサミンを添加し、次いで
かくはんしながらキシレンを除去して得られるも
のを使用する。
上記接着剤成分の配合比は、ゴム40〜70部、フ
イラー10〜30部、レゾール型フエノール樹脂30〜
60部、加硫剤0.2〜2.0部、加硫助剤0.1〜1.0部が
望ましい(重量部)。この混合物を絶縁基板表面
に塗布する場合、塗布手段によつてこの混合物を
溶剤に溶解、分散して粘度を変える。例えばカー
テンコート法ではメチルイソプチルケトンやメチ
ルエチルケトンに溶解、分散して100〜400cp(25
℃)にする。ロールコート法の場合は100〜200P
(25℃)、デイツプコート法の場合は100〜400P
(25℃)にする。この塗布厚は、硬化後の厚みが
20〜50μmになるように、塗工機のギヤツプ、ス
ピードを自由に変えて調整することができる。
このように、絶縁基板表面に塗布された接着剤
は150〜180℃、90〜200分で硬化できる。次いで、
この接着剤表面を酸化剤で処理する。酸化剤とし
てはクロム−硫酸が望ましく、クロム酸塩20〜
200g/、濃硫酸100〜400ml/を用い、35〜
60℃で使用する。次いで水洗した後、湯洗処理を
行う。湯洗条件は50〜100℃で1〜60分である。
この後の工程は、通常の無電解めき前処理と無電
解めつきにより、該表面を金属化することができ
る。これは実施例で明らかとなろう。
〔発明の実施例〕
以下、本発明を実施例により更に具体的に説明
するが、本発明はこれら実施例に限定されない。
参考例 1
下記第1表に示す2種類の接着剤を作成した。
[Field of Application of the Invention] The present invention relates to an insulating substrate whose surface is metallized and a method for manufacturing the same. [Background of the Invention] Conventionally, there is an electroless plating method as a method for metallizing the surface of an insulating substrate. One way to do this is to roughen the part of the surface of the insulating substrate that will be plated.
35-7732) and a method of plating after applying an acrylonitrile butadiene modified synthetic resin (adhesive) to the surface of an insulating substrate was developed (Japanese Patent Publication No. 39-15251). However, even with these methods, adhesion to the plating film was not sufficient, so methods of cleaning similar adhesives with chromium-sulfuric acid (Japanese Patent Publication No. 40-4393, Japanese Patent Publication No. 40-9664),
A method of treating chromium with sulfuric acid to generate carbonyl groups and carboxyl groups, and improving the anchoring effect on the surface and the adhesion with the plated film
9996), a method of making the adhesive surface a porous structure by treating it with chromium-sulfuric acid (Japanese Patent Publication No. 52-31539),
and a method of treating chromium with sulfuric acid or permanganate to generate carbonyl groups and making the surface of the adhesive microporous to improve its adhesion to the plating film (Japanese Patent Application Laid-open No. 15569/1983), etc. is proposed. In these methods, an adhesive is provided on the surface of an insulating substrate and the surface is treated with an oxidizing agent, such as chromium-sulfuric acid.If the oxidizing agent is new, it has a strong oxidizing power, so it decomposes and dissolves the rubber, causing the surface of the adhesive to be treated. It has a high ability to generate carbonyl groups and carboxyl groups and to make the surface porous or microporous. Therefore, the adhesion to the plating film is increased. However, on the other hand, when the treated area of the adhesive increases with this oxidizing agent, for example, in the case of a chromium-sulfuric acid oxidizing agent, Cr 3+ increases, and decomposition products and dissolved products of the rubber and resin components of the adhesive also accumulate. As a result, the oxidizing power gradually decreases, resulting in the formation of carbonyl groups and carboxyl groups, the inability to obtain surface porosity and microporosity, and the problem of reduced adhesion with the plated film. be. For this reason, conventional methods extend the life of the oxidizing agent by reducing Cr 3+ and returning it to Cr 6+ . could not be prevented. For this reason, in the conventional method, in addition to controlling the amounts of Cr 3+ and Cr 6+ , it was also necessary to control the treated area of the adhesive, and to renew the oxidizing agent when the specified treated area was reached. [Object of the Invention] The present invention has been made in view of the problems of the conventional methods described above, and relates to a method for preventing a decrease in adhesion to a plating film due to a decrease in the oxidizing power of an oxidizing agent. For this purpose, it is also provided that the adhesive surface treated with an oxidizing agent is given a new surface structure. [Summary of the Invention] To summarize the present invention, the present invention relates to a method for manufacturing an insulating substrate whose surface is metallized, and the present invention relates to a method for manufacturing an insulating substrate whose surface is metallized, and which includes a rubber, a filler, and a thermosetting resin as main components that decompose or dissolve in an oxidizing agent. a step of providing an adhesive composition layer on the surface of an insulating substrate, a step of treating the surface of the adhesive layer with an oxidizing agent to decompose or dissolve the rubber, filler, and thermosetting resin present near the surface; These decomposed products and dissolved products adhering to the adhesive layer are removed by washing with hot water at 50 to 100°C for 1 to 60 minutes, and the surface of the adhesive layer is removed from the recesses where the filler has been removed and the exposed protrusions of the rubber particles. and a step of attaching metal to a part or the entire surface of this surface by electroless plating. The greatest feature of the present invention is that even if the oxidizing power of the above-mentioned oxidizing agent decreases, the adhesion to the plating film does not decrease. In order to bring out this characteristic, the adhesive component provided on the surface of the insulating substrate is decomposed by an oxidizing agent.
In addition to conventional rubber (acrylonitrile butadiene rubber), this has been expanded to include fillers and thermosetting resins, and after applying this adhesive composition to an insulating substrate and curing, it is treated with an oxidizing agent such as chromium-sulfuric acid. After the treatment, the surface is washed with hot water. Of course, a vulcanizing agent and a vulcanizing aid may be added to the adhesive. With this method, the surface of the adhesive is different from the porosity or microporosity of the conventional method, and the concave portions where the filler is removed and the convex portions of the rubber particles exposed after the thermosetting resin is removed are uniform. A new structure was formed. The hot water washing performed in the present invention is particularly effective when the oxidizing agent has deteriorated. In other words, if the oxidizing agent is new, it is easy to obtain the above surface structure without hot water washing, but if the treated area of the adhesive increases, Cr 3+ increases and the decomposition products and dissolved products of the adhesive components increase. The accumulation of ions makes it difficult to obtain the surface structure. If hot water washing is performed at this time, decomposed products on the surface of the adhesive will be removed, and a surface structure almost the same as that obtained when treated with a fresh oxidizing agent will be obtained. Therefore, by performing hot water washing, the life of the oxidizing agent (the treated area of the adhesive) can be extended by approximately 2.7 times. That is, even if the oxidizing agent deteriorates, hot water washing prevents the adhesion of the plating film from decreasing. One of the reasons for this is that the surface structure of the adhesive of the present invention after treatment with an oxidizing agent and hot water washing is not porous or microporous as in the prior art, but has a structure in which concave portions and convex portions are uniformly formed. It is possible that it has become. As mentioned above, hot water washing is effective when the oxidizing agent has deteriorated, but industrially it is recommended to perform the process after the oxidizing agent treatment step so that the oxidizing agent can be treated even if it is new. can. The adhesive components used in the present invention include, for example, rubber (acrylonitrile butadiene rubber) that decomposes into Cr 6+ , which is an oxide of the oxidizing agent, and filler (carbonate, silica, etc.) that decomposes and dissolves in sulfuric acid, which is the solvent of the oxidizing agent. The main components are a fine powder such as Other ingredients include fine sulfur powder as a vulcanizing agent and zinc oxide as a vulcanizing aid. The above-mentioned resol type phenolic resin is made from phenol, formalin, ammonia as a catalyst, and xylene as a reaction solvent, as it is easy to decompose with sulfuric acid even when Cr 3+ increases, and is easy to remove by washing with hot water afterwards. After condensation, neutralization, and water removal, hexamine is added as a hardening agent, and then xylene is removed while stirring, and the resulting product is used. The blending ratio of the above adhesive components is 40 to 70 parts of rubber, 10 to 30 parts of filler, and 30 to 30 parts of resol type phenolic resin.
Desirably 60 parts, 0.2 to 2.0 parts of vulcanizing agent, and 0.1 to 1.0 parts of vulcanization aid (parts by weight). When this mixture is applied to the surface of an insulating substrate, the mixture is dissolved and dispersed in a solvent by a coating means to change the viscosity. For example, in the curtain coating method, 100 to 400 cp (25
℃). 100-200P for roll coating method
(25℃), 100-400P for dip coat method
(25℃). This coating thickness is determined by the thickness after curing.
The gap and speed of the coating machine can be adjusted freely to achieve a coating thickness of 20 to 50 μm. In this way, the adhesive applied to the surface of the insulating substrate can be cured in 90 to 200 minutes at 150 to 180°C. Then,
This adhesive surface is treated with an oxidizing agent. As an oxidizing agent, chromium-sulfuric acid is preferable, and chromate 20~
Using 200g/, concentrated sulfuric acid 100~400ml/, 35~
Use at 60℃. Next, after washing with water, a hot water washing process is performed. Hot water washing conditions are 50-100°C for 1-60 minutes.
In the subsequent steps, the surface can be metallized by ordinary electroless plating pretreatment and electroless plating. This will become clear from the examples. [Examples of the Invention] Hereinafter, the present invention will be explained in more detail with reference to Examples, but the present invention is not limited to these Examples. Reference Example 1 Two types of adhesives shown in Table 1 below were prepared.
本発明によれば、酸化剤の寿命(接着剤の処理
面積)が約2.7倍に延びるため、Cr3+をCr6+に還
元する装置が不要となる。なお、酸化剤中のCr6+
を常に規定量にするため、無水クロム酸や、重ク
ロム酸カリウム又は重クロム酸ナトリウムを補充
しながら使用するのは当然である。
また、本発明によれば絶縁基板とめつき膜との
密着力が高いものが得られるので、この発明をプ
リント配線板の製造に利用できる。すなわち、絶
縁基板に接着剤を塗布して、全面に無電解めつき
を行つて回路以外をエツチング除去して回路を形
成する方法、全面に薄く無電解めつきを行い、そ
の上に電解めつきを厚く析出させ、回路以外をエ
ツチング除去して回路を形成する方法、全面に薄
く無電解めつきを行い、次に回路形成部以外にめ
つきレジストを設け、回路形成部を無電解めつき
若しくは電解めつきで厚く析出させ、次にめつき
レジストを除き、露出した薄い無電解めつき膜を
エツチング除去して回路を形成する方法、また、
接着剤上の回路形成部以外にめつきレジストを設
け、回路形成部に無電解めつきのみでめつきを析
出させて回路を形成する方法などに本発明を利用
できる。
According to the present invention, the life of the oxidizing agent (adhesive treatment area) is extended by about 2.7 times, so a device for reducing Cr 3+ to Cr 6+ is not required. In addition, Cr 6+ in the oxidizing agent
It goes without saying that chromic anhydride, potassium dichromate, or sodium dichromate should be used while supplementing to always maintain a specified amount of chromic acid. Further, according to the present invention, a product with high adhesion between an insulating substrate and a plating film can be obtained, so the present invention can be utilized for manufacturing printed wiring boards. In other words, a method in which an adhesive is applied to an insulating substrate, electroless plating is applied to the entire surface, and parts other than the circuit are etched away to form a circuit. A method in which a circuit is formed by depositing a thick layer of plating and etching away the parts other than the circuit. A thin layer of electroless plating is applied to the entire surface, and then a plating resist is applied to areas other than the circuit forming area. A method of forming a circuit by depositing thickly by electrolytic plating, then removing the plating resist, and etching away the exposed thin electroless plated film, and
The present invention can be applied to a method of forming a circuit by providing a plating resist on an adhesive other than the circuit forming part and depositing plating on the circuit forming part only by electroless plating.
第1図は本発明による接着剤組成Aと従来の接
着剤組成Bにおける新しい酸化剤処理後の各接着
剤表面の粒子構造のSEM写真、第2図は本発明
による湯洗処理の有無によるピール強度と酸化剤
の接着剤処理面積との関係を示すグラフ、第3図
は湯洗の有無による各接着剤表面の粒子構造の
SEM写真である。
Figure 1 is an SEM photograph of the particle structure of each adhesive surface after treatment with a new oxidizing agent in adhesive composition A according to the present invention and conventional adhesive composition B, and Figure 2 is a photograph of peeling with and without hot water washing treatment according to the present invention. A graph showing the relationship between strength and adhesive treatment area with oxidizing agent. Figure 3 shows the particle structure of each adhesive surface with and without hot water washing.
This is a SEM photo.
Claims (1)
ー及び熱硬化性樹脂を主成分とする接着剤組成物
層を絶縁基板の表面に設ける工程、該接着剤層表
面を酸化剤で処理してその表面付近に存在するゴ
ム、フイラー及び熱硬化性樹脂を分解若しくは溶
解する工程、その後表面に付着しているこれら分
解物及び溶解物を、50〜100℃で1〜60分間湯洗
して除去し、該接着剤層表面をフイラーが除かれ
た凹部と、露出したゴム粒子の凸部とを有する構
造とする工程、及びこの表面の一部又は全面に無
電解めつきにより金属を付着させる工程の各工程
を包含することを特徴とする表面を金属化した絶
縁基板の製造方法。1. A step of providing an adhesive composition layer on the surface of an insulating substrate, the adhesive composition layer mainly consisting of rubber, filler, and thermosetting resin that decomposes or dissolves in an oxidizing agent, and treating the surface of the adhesive layer with an oxidizing agent to remove the adhesive composition near the surface. The step of decomposing or dissolving the rubber, filler and thermosetting resin present on the surface is followed by removing these decomposed products and dissolved products adhering to the surface by washing with hot water at 50 to 100°C for 1 to 60 minutes. Steps of forming the surface of the adhesive layer into a structure having concave portions from which the filler has been removed and convex portions of exposed rubber particles, and attaching metal to part or the entire surface of this surface by electroless plating. A method for manufacturing an insulating substrate with a metalized surface, the method comprising:
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP17340584A JPS6151990A (en) | 1984-08-22 | 1984-08-22 | Method for manufacturing an insulating substrate with a metalized surface |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP17340584A JPS6151990A (en) | 1984-08-22 | 1984-08-22 | Method for manufacturing an insulating substrate with a metalized surface |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS6151990A JPS6151990A (en) | 1986-03-14 |
| JPH046116B2 true JPH046116B2 (en) | 1992-02-04 |
Family
ID=15959812
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP17340584A Granted JPS6151990A (en) | 1984-08-22 | 1984-08-22 | Method for manufacturing an insulating substrate with a metalized surface |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS6151990A (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US11441015B2 (en) | 2018-01-12 | 2022-09-13 | Ajinomoto Co., Inc. | Coated particle |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS6447095A (en) * | 1987-08-18 | 1989-02-21 | Ibiden Co Ltd | Printed wiring board and manufacture thereof |
| JPH0634447B2 (en) * | 1987-08-31 | 1994-05-02 | イビデン株式会社 | Adhesive for additive, base material for additive and printed wiring board using the same |
Family Cites Families (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5724074B2 (en) * | 1972-10-24 | 1982-05-21 | ||
| JPS53100470A (en) * | 1977-02-14 | 1978-09-01 | Hitachi Ltd | Method of producing printed board and coating agent used therefor |
| JPS5420650A (en) * | 1977-07-18 | 1979-02-16 | Hitachi Ltd | Input circuit |
| JPS5724074A (en) * | 1980-07-15 | 1982-02-08 | Toshiba Corp | Program selecting device |
| JPS584733A (en) * | 1981-06-29 | 1983-01-11 | Shin Etsu Chem Co Ltd | Method for producing alkynyl compounds |
| JPS60210449A (en) * | 1984-04-05 | 1985-10-22 | 住友ベークライト株式会社 | Manufacture of laminated board for plating additive |
| JPS60217695A (en) * | 1984-04-13 | 1985-10-31 | 株式会社日立製作所 | Method of treating before electroless plating and method of producing printed circuit board |
-
1984
- 1984-08-22 JP JP17340584A patent/JPS6151990A/en active Granted
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US11441015B2 (en) | 2018-01-12 | 2022-09-13 | Ajinomoto Co., Inc. | Coated particle |
Also Published As
| Publication number | Publication date |
|---|---|
| JPS6151990A (en) | 1986-03-14 |
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