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JPH0462138B2 - - Google Patents
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JPH0462138B2 - - Google Patents

Info

Publication number
JPH0462138B2
JPH0462138B2 JP58225662A JP22566283A JPH0462138B2 JP H0462138 B2 JPH0462138 B2 JP H0462138B2 JP 58225662 A JP58225662 A JP 58225662A JP 22566283 A JP22566283 A JP 22566283A JP H0462138 B2 JPH0462138 B2 JP H0462138B2
Authority
JP
Japan
Prior art keywords
electron beam
conductive layer
reading
conductivity
high conductivity
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP58225662A
Other languages
Japanese (ja)
Other versions
JPS60117433A (en
Inventor
Yasuyuki Goto
Nagaaki Etsuno
Akira Shioda
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujitsu Ltd
Original Assignee
Fujitsu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujitsu Ltd filed Critical Fujitsu Ltd
Priority to JP22566283A priority Critical patent/JPS60117433A/en
Publication of JPS60117433A publication Critical patent/JPS60117433A/en
Publication of JPH0462138B2 publication Critical patent/JPH0462138B2/ja
Granted legal-status Critical Current

Links

Classifications

    • GPHYSICS
    • G11INFORMATION STORAGE
    • G11BINFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B9/00Recording or reproducing using a method not covered by one of the main groups G11B3/00 - G11B7/00; Record carriers therefor
    • G11B9/10Recording or reproducing using a method not covered by one of the main groups G11B3/00 - G11B7/00; Record carriers therefor using electron beam; Record carriers therefor

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Optical Record Carriers And Manufacture Thereof (AREA)
  • Optical Recording Or Reproduction (AREA)

Description

【発明の詳細な説明】 (1) 発明の技術分野 本発明は電子ビーム記録用デイスク、詳しくは
書込み読出しに用いるビームを電子ビームで行う
大容量記録デイスクに関する。
DETAILED DESCRIPTION OF THE INVENTION (1) Technical Field of the Invention The present invention relates to an electron beam recording disk, and more particularly to a large capacity recording disk in which an electron beam is used for writing and reading.

(2) 技術の背景 記録の書込みおよび読出しに光デイスクを用い
る技術が知られている。それを第1図の一部断面
を示す斜視図を参照して説明すると、光デイスク
1(それは1つの円板である)に溝2が同心状に
形成され、溝2の間のトラツク3に開口部4が形
成されている。トラツク3はどの位置にあるかは
前以つて定められており、特定のトラツクの上に
デイジタル方式で開口部4を設けるか否かを
“1”と“0”の信号に対応させるとすると、ト
ラツク4に開口部を形成しまたはしないことによ
つて記録の書込みがなされ、またそれを検知する
ことによつて記録の読出しがなされる。
(2) Background of the technology The technology of using optical disks for writing and reading records is known. To explain this with reference to the partially sectional perspective view of FIG. An opening 4 is formed. Assuming that the position of the track 3 is determined in advance, and whether or not an opening 4 is to be provided above a particular track is made to correspond to signals of "1" and "0" in a digital manner, Recording is performed by forming or not forming an opening in the track 4, and reading is performed by detecting this.

溝2の幅は0.7μm〜0.8μm程度に微小化されて
いるが、光ビーム(例えばレーザビーム)を用い
る記録の書込みと読出しでは光ビームの解析限界
に近づいていて光ビームを前記した長さの径より
も小に絞り込むことはできない。そこで光の代り
に電子ビーム(electron beam,EB)を用いる
技術が開発されつつあり、電子ビームは500Å径
にまで絞り込むことができるので、高密度の記録
の書込みと読出しが可能となる。このような電子
ビームを用して作成する記録媒体はEBデイスク
と呼称されるが、本発明はEBデイスクの改良に
係わるものである。
The width of the groove 2 has been miniaturized to about 0.7 μm to 0.8 μm, but when writing and reading records using a light beam (for example, a laser beam), it is approaching the analytical limit of the light beam, and the width of the light beam is reduced to the above-mentioned length. cannot be narrowed down to a diameter smaller than the diameter of Therefore, technology is being developed that uses electron beams (EBs) instead of light, and since electron beams can be focused down to a diameter of 500 Å, it becomes possible to write and read high-density records. A recording medium created using such an electron beam is called an EB disk, and the present invention relates to an improvement of the EB disk.

(3) 従来技術と問題点 従来の電子ビーム用デイスクは弱い電子ビーム
を照射してその時に反射される二次電子を検知器
によつて読み出していた。そのため読出し用の検
知器を真空系内に置かなければならず、真空系に
おいて余分な体積を必要としていた。そこで前記
二次電子の検知をかかる真空系内に配置される検
知器を用いることなくなしうる電子ビーム記録用
デイスクが要望されている。
(3) Prior Art and Problems Conventional electron beam disks emit a weak electron beam and read out the secondary electrons reflected by a detector. Therefore, the readout detector had to be placed in the vacuum system, which required extra volume in the vacuum system. Therefore, there is a need for an electron beam recording disk that can detect the secondary electrons without using a detector placed in such a vacuum system.

(4) 発明の目的 本発明は上記従来の問題に鑑み、電子ビーム用
デイスクにおいて真空系内に配置された電子ビー
ムの検知器なしで、読出しの行なえる電子ビーム
記録用デイスクを提供することを目的とするもの
である。
(4) Purpose of the Invention In view of the above-mentioned conventional problems, the present invention aims to provide an electron beam recording disk that can be read without an electron beam detector placed in a vacuum system. This is the purpose.

(5) 発明の構成 そしてこの目的は本発明によれば、デイスク基
板上に導電性層と該導電性層の上に電子ビーム照
射により導電率が低導電率から高導電率に変化す
る材料層を形成してなり、記録は電子ビーム照射
により前記材料層に高導電率部を形成することに
よつてなし、読出しは該材料層に前記電子ビーム
より弱い第2の電子ビームを照射し該高導電率部
から前記導電性層を通して流れる電子により発生
する電流を検知してなす構成を特徴とする電子ビ
ーム記録用デイスクを提供することによつて達成
される。
(5) Structure of the Invention According to the present invention, this object is to provide a conductive layer on a disk substrate and a material layer on the conductive layer whose conductivity changes from low conductivity to high conductivity by electron beam irradiation. Recording is performed by forming a high conductivity part in the material layer by electron beam irradiation, and reading is performed by irradiating the material layer with a second electron beam weaker than the electron beam to form a high conductivity part in the material layer. This is achieved by providing an electron beam recording disk characterized by a configuration in which a current generated by electrons flowing from a conductive portion through the conductive layer is detected.

(6) 発明の実施例 以下本発明実施例を図面によつて詳説する。(6) Examples of the invention Embodiments of the present invention will be explained in detail below with reference to the drawings.

本発明者は、電子ビーム記録用デイスクとして
デイスク上の導電性層上に非晶質と結晶質の相転
移により導電率が低電導率から高導電率に変化す
る層を設け、電子ビームによりこの相転移を行つ
て書込みを行い、弱い電子ビームを照射して電子
の流れやすさの差によつて読出しをなすことを考
えた。そして導電率が変化する層としては、
TeGe,TeGeSn,TeGeSSe,AsS,SeGeなどの
元素の組合せによるカルコゲナイド化合物が適し
ていることを確認した。
The present inventor provided a layer whose conductivity changes from low conductivity to high conductivity due to phase transition between amorphous and crystalline on the conductive layer of the disk as an electron beam recording disk. We considered writing by performing a phase transition, irradiating a weak electron beam, and reading by the difference in the ease with which the electrons flow. And as a layer whose conductivity changes,
It was confirmed that chalcogenide compounds made from combinations of elements such as TeGe, TeGeSn, TeGeSSe, AsS, and SeGe are suitable.

本発明の実施例を断面で示す第2図を参照する
と、厚さ2mmのデイスク基板(ガラス基板)21
上に100μmの厚さの導電性層22をアルミニウム
(Al)を真空蒸着法で蒸着することによつて形成
する。しかる後に非晶質層23(例えばTe85
Ge15層)を1000Åの厚さに真空蒸着法で形成す
る。
Referring to FIG. 2, which shows a cross section of an embodiment of the present invention, a disk substrate (glass substrate) 21 with a thickness of 2 mm is shown.
A conductive layer 22 having a thickness of 100 μm is formed thereon by depositing aluminum (Al) using a vacuum evaporation method. After that, an amorphous layer 23 (for example, Te 85
Ge 15 layer) is formed to a thickness of 1000 Å by vacuum evaporation.

次に第3図を参照すると、Te85Ge15の非晶質
層は蒸着したままの状態では非晶質であり導電率
は10-3〜10-5〔1/Ω〕であるが、この層の一部
分に50KeVに加速した電子ビーム24(スポツ
ト径500Å)を照射すると被照射部分を結晶化す
ることができ、導電率が10°〜10-1〔1/Ω〕の結
晶化した高導電率部23a(図に斜線を付して示
す)が作られる。これは、非晶質材料は高抵抗の
ものであるが、それにパワーが低くパルス幅の長
い電子ビームを照射すると徐冷却したことになり
非晶質材料が結晶質材料に変ることを利用したも
のである。
Next, referring to Figure 3, the amorphous layer of Te 85 Ge 15 is amorphous in the as-deposited state and has a conductivity of 10 -3 to 10 -5 [1/Ω]; When a part of the layer is irradiated with an electron beam 24 (spot diameter 500 Å) accelerated to 50 KeV, the irradiated part can be crystallized, resulting in a crystallized highly conductive material with a conductivity of 10° to 10 -1 [1/Ω]. A section 23a (shown with diagonal lines in the figure) is created. This takes advantage of the fact that amorphous materials have high resistance, but when they are irradiated with a low-power, long-pulse electron beam, they are slowly cooled and the amorphous material turns into a crystalline material. It is.

次に比較的弱い第2の電子ビーム30(第4図
参照、電子ビーム24の強さの1/10)を照射する
と、高導電率部23aでは導電性層22を通して
電子が流れるため電流検出器33(第4図参照)
に電流が流れる。非晶質のままである低導電率部
23bには電流はあまり流れないので、これによ
り読出しが行なえる。なおこのように形成した本
発明実施例の構造は第1図に示した光デイスクの
構造と同じであるが、しかし高密度化されている
点が異なる。
Next, when a relatively weak second electron beam 30 (see FIG. 4, 1/10 of the intensity of the electron beam 24) is irradiated, electrons flow through the conductive layer 22 in the high conductivity part 23a, so that the current detector 33 (see Figure 4)
A current flows through. Since little current flows through the low conductivity portion 23b, which remains amorphous, reading can be performed. The structure of the embodiment of the present invention formed in this way is the same as the structure of the optical disk shown in FIG. 1, but the difference is that the density is increased.

操作においては第4図に示される如く、EBデ
イスク21は電子ビーム装置31内に取り付けら
れ、電流はモータ32の軸を通り電流検知器33
まで流れて信号読出しが行なえる。なお第4図に
おいて、34は電子銃、35はコントローラ、3
6は電子レンズ、37は偏向器、38は排気ポン
プを示す。従来技術において二次電子検知器は符
号39を付して点線で示す如くに配置されていた
ものである。図示の装置は公知のものであるので
それの詳細な説明は省略する。
In operation, as shown in FIG.
The signal can be read out. In FIG. 4, 34 is an electron gun, 35 is a controller, and 3
6 is an electron lens, 37 is a deflector, and 38 is an exhaust pump. In the prior art, the secondary electron detector is designated by the reference numeral 39 and is arranged as shown by the dotted line. Since the illustrated device is well known, detailed description thereof will be omitted.

本実施例においては記録の書き換えが可能であ
る。すなわち、高導電率部23aにパワーは高く
パルス幅が短い電子ビームを照射すると高導電率
部23aは急速に溶融され、その溶融部分は液相
のままで室温にまで急冷されるので非晶質にな
り、最初の第2図に示した状態に戻り、再度情報
を記録することが可能になる。
In this embodiment, recording can be rewritten. That is, when the high conductivity part 23a is irradiated with an electron beam with high power and short pulse width, the high conductivity part 23a is rapidly melted, and the melted part remains in the liquid phase and is rapidly cooled to room temperature, so that it becomes amorphous. The state returns to the state shown in FIG. 2, and information can be recorded again.

(7) 発明の効果 以上詳細に説明した如く本発明によれば、真空
装置内に電子ビーム検出器を設けない装置に使用
可能な電子ビーム記録用デイスクを提供され、ま
たこのデイスクは記録の書き換えが可能である。
なお以上の説明においては、Al導電層とTe85
Ge15の非晶質層を例にとつたが、本発明の適用
範囲はその場合に限定されるものでなく、その他
の材料を用いる場合にも及ぶものである。
(7) Effects of the Invention As described in detail above, according to the present invention, there is provided an electron beam recording disk that can be used in a device that does not include an electron beam detector in a vacuum device, and this disk can also be used to rewrite records. is possible.
In the above explanation, the Al conductive layer and Te 85
Although an amorphous layer of Ge 15 is taken as an example, the scope of application of the present invention is not limited thereto, but also extends to cases where other materials are used.

【図面の簡単な説明】[Brief explanation of the drawing]

第1図は従来の光デイスクの一部断面を示す斜
視図、第2図と第3図は本実施例の一部の断面
図、第4図は第3図に示すデイスクを読み出す装
置の断面図である。 21……ガラス基板、22……導電性層、23
……非晶質層、23a……高導電率部、23b…
…低導電率部、24……電子ビーム、30……電
子ビーム、33……電流検出器。
FIG. 1 is a perspective view showing a partial cross section of a conventional optical disk, FIGS. 2 and 3 are partial cross sections of the present embodiment, and FIG. 4 is a cross section of the device for reading out the disk shown in FIG. It is a diagram. 21... Glass substrate, 22... Conductive layer, 23
...Amorphous layer, 23a...High conductivity part, 23b...
...Low conductivity part, 24...Electron beam, 30...Electron beam, 33...Current detector.

Claims (1)

【特許請求の範囲】 1 デイスク基板上に導電性層と該導電性層の上
に電子ビーム照射により導電率が低導電率から高
導電率に変化する材料層を形成してなり、 記録は電子ビーム照射により前記材料層に高導
電率部を形成することによつてなし、 読出しは該材料層に前記電子ビームより弱い第
2の電子ビームを照射し該高導電率部から前記導
電性層を通して流れる電子により発生する電流を
検知してなす構成を特徴とする電子ビーム記録用
デイスク。
[Scope of Claims] 1. A conductive layer is formed on a disk substrate, and a material layer whose conductivity changes from low conductivity to high conductivity by electron beam irradiation is formed on the conductive layer. Reading is performed by forming a high conductivity part in the material layer by beam irradiation, and reading is performed by irradiating the material layer with a second electron beam weaker than the electron beam and passing through the conductive layer from the high conductivity part. An electron beam recording disk characterized by a configuration that detects the current generated by flowing electrons.
JP22566283A 1983-11-30 1983-11-30 Electron beam recording disc Granted JPS60117433A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP22566283A JPS60117433A (en) 1983-11-30 1983-11-30 Electron beam recording disc

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP22566283A JPS60117433A (en) 1983-11-30 1983-11-30 Electron beam recording disc

Publications (2)

Publication Number Publication Date
JPS60117433A JPS60117433A (en) 1985-06-24
JPH0462138B2 true JPH0462138B2 (en) 1992-10-05

Family

ID=16832806

Family Applications (1)

Application Number Title Priority Date Filing Date
JP22566283A Granted JPS60117433A (en) 1983-11-30 1983-11-30 Electron beam recording disc

Country Status (1)

Country Link
JP (1) JPS60117433A (en)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS62298942A (en) * 1986-06-19 1987-12-26 Canon Inc Recording medium and method and device for recording and reproducing information
US5270990A (en) * 1986-08-15 1993-12-14 Canon Kabushiki Kaisha Tracking error signal detecting apparatus using an electron beam and apparatus for effecting recording/reproduction of information by the utilization of a plurality of electron beams

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5775896A (en) * 1980-10-31 1982-05-12 Toshiba Corp Data recording member
JPS58158056A (en) * 1982-03-16 1983-09-20 Nippon Telegr & Teleph Corp <Ntt> Laser recording medium and its manufacture

Also Published As

Publication number Publication date
JPS60117433A (en) 1985-06-24

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