JPH0467327U - - Google Patents
Info
- Publication number
- JPH0467327U JPH0467327U JP11135690U JP11135690U JPH0467327U JP H0467327 U JPH0467327 U JP H0467327U JP 11135690 U JP11135690 U JP 11135690U JP 11135690 U JP11135690 U JP 11135690U JP H0467327 U JPH0467327 U JP H0467327U
- Authority
- JP
- Japan
- Prior art keywords
- exhaust
- monitoring device
- pressure monitoring
- exhaust pressure
- pipe
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000012806 monitoring device Methods 0.000 claims description 4
- 238000010926 purge Methods 0.000 claims description 3
- 239000007789 gas Substances 0.000 claims 2
- 239000011261 inert gas Substances 0.000 claims 1
- 238000010586 diagram Methods 0.000 description 2
Description
第１図、第２図はこの考案の実施例をそれぞれ
示すＣＶＤ装置の排気圧力監視装置の概略構成図
、第３図は従来のＣＶＤ装置の排気圧力監視装置
を示す概略構成図である。
図において、１はポンプ、２は圧力ゲージ、３
は導入管、４，７は排気管、５はベントパージガ
ス導入口、８はポンプパージガス導入口である。
なお、各図中の同一符号は同一または相当部分を
示す。
FIGS. 1 and 2 are schematic diagrams of an exhaust pressure monitoring device for a CVD apparatus showing embodiments of this invention, and FIG. 3 is a schematic diagram of a conventional exhaust pressure monitoring device for a CVD apparatus. In the figure, 1 is the pump, 2 is the pressure gauge, and 3
4 and 7 are exhaust pipes, 5 is a vent purge gas inlet, and 8 is a pump purge gas inlet.
Note that the same reference numerals in each figure indicate the same or corresponding parts.
Claims (1)
置において、排気ポンプの入力側または出力側の
排気管と圧力ゲージをつなぐ導入管の任意の位置
に前記排気管内のガスを排出する不活性ガスを導
入するパージガス導入口を設けたことを特徴とす
るＣＶＤ装置の排気圧力監視装置。 In an exhaust pressure monitoring device that monitors the exhaust pressure of a CVD device, an inert gas is introduced into an arbitrary position of an introduction pipe that connects an exhaust pipe and a pressure gauge on the input side or output side of an exhaust pump to discharge the gas in the exhaust pipe. An exhaust pressure monitoring device for a CVD device, characterized in that it is provided with a purge gas inlet.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP11135690U JPH0467327U (en) | 1990-10-23 | 1990-10-23 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP11135690U JPH0467327U (en) | 1990-10-23 | 1990-10-23 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH0467327U true JPH0467327U (en) | 1992-06-15 |
Family
ID=31858793
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP11135690U Pending JPH0467327U (en) | 1990-10-23 | 1990-10-23 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0467327U (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2012160614A (en) * | 2011-02-01 | 2012-08-23 | Tokyo Electron Ltd | Film forming device |
-
1990
- 1990-10-23 JP JP11135690U patent/JPH0467327U/ja active Pending
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2012160614A (en) * | 2011-02-01 | 2012-08-23 | Tokyo Electron Ltd | Film forming device |
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