JPH0478925B2 - - Google Patents
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- Publication number
- JPH0478925B2 JPH0478925B2 JP18709387A JP18709387A JPH0478925B2 JP H0478925 B2 JPH0478925 B2 JP H0478925B2 JP 18709387 A JP18709387 A JP 18709387A JP 18709387 A JP18709387 A JP 18709387A JP H0478925 B2 JPH0478925 B2 JP H0478925B2
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- light
- angle
- incident
- measuring
- incidence
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Description
【発明の詳細な説明】
[産業上の利用分野]
本発明は、物体への光の入射角度を高精度に測
定する入射角度測定方法に関するものである。DETAILED DESCRIPTION OF THE INVENTION [Industrial Field of Application] The present invention relates to an incident angle measuring method for measuring the incident angle of light onto an object with high precision.
[従来の技術]
従来、光束の物体への入射角度Ψの測定は、一
般に第5図aに示すように、物体1から反射した
反射光が作るスポツトPのスクリーン上の位置と
入射光Iの通過位置とを測定し、その入射光Iと
反射光のなす角度を算出することにより行われて
いた。ところが、この従来方法には次のような欠
点があり、入射角度を高精度に測定するのは、事
実上不可能であつた。[Prior Art] Conventionally, the angle of incidence Ψ of a luminous flux onto an object is generally measured by determining the position of a spot P on a screen formed by the reflected light reflected from an object 1 and the angle of incidence of the incident light I, as shown in FIG. 5a. This was done by measuring the passing position and calculating the angle between the incident light I and the reflected light. However, this conventional method has the following drawbacks, and it is virtually impossible to measure the angle of incidence with high precision.
[発明が解決しようとする問題点]
まず第1に、反射光のスポツトの大きさはそれ
程小さくできないことが挙げられる。この反射光
のスポツトを小さくするには、入射光束の径と発
散角を同時に減少させねばならない。しかし、こ
の両者の積は、光の回折で規定される値以下には
原理的に減少させることはできないので、反射光
のスポツトの大きさは従来方法での測定精度を低
減させる主な原因となつていた。[Problems to be Solved by the Invention] First of all, the size of the spot of reflected light cannot be made so small. In order to reduce the size of this reflected light spot, it is necessary to simultaneously reduce the diameter and divergence angle of the incident light beam. However, in principle, the product of these two cannot be reduced below the value determined by light diffraction, so the size of the reflected light spot is the main cause of reducing measurement accuracy in conventional methods. I was getting used to it.
実際、第5図aの従来方法で1mrad以上の測定
精度を得るのは極めて困難が多く、0.1mrad以上
の精度は達成不可能であつた。また、この方法で
精度を高めようとすると、物体1から反射光スポ
ツトの測定位置までの距離を大きくとらなければ
ならず、実用上の障害となつていた。 In fact, it is extremely difficult to obtain a measurement accuracy of 1 mrad or more using the conventional method shown in FIG. 5a, and it has been impossible to achieve a measurement accuracy of 0.1 mrad or more. Furthermore, if this method were to be used to improve accuracy, it would be necessary to increase the distance from the object 1 to the measurement position of the reflected light spot, which was a practical obstacle.
また、第5図bは、物体1での反射光と透過光
を干渉させて入射角度Ψを測定する従来の入射角
度測定方法を示す。この方法では干渉を用いるの
で測定精度は比較的高いものの、この方法が透過
光や反射光を妨害してしまうという欠点がある。
そのため、この従来方法を他の光学計測のための
光軸調整法として適用するには困難が多い。ま
た、垂直入射に近い入射角度には適用できないと
いうことも大きな欠点であつた。 Further, FIG. 5b shows a conventional method of measuring an incident angle in which the incident angle Ψ is measured by causing reflected light and transmitted light from the object 1 to interfere with each other. Although this method uses interference and has relatively high measurement accuracy, it has the disadvantage that it interferes with transmitted light and reflected light.
Therefore, there are many difficulties in applying this conventional method as an optical axis adjustment method for other optical measurements. Another major drawback was that it could not be applied to angles of incidence close to normal incidence.
ところで、半導体素子製造や精密機械加工等の
産業分野での加工精度の向上に伴い、光学的な高
精度測定がますます多用されるようになつてい
る。これらの分野では、測定に必要な調整を高精
度に行う必要があるので、物体への光の入射角度
を簡便にかつ精度良く測定することができる方法
が望まれていた。 Incidentally, as processing accuracy improves in industrial fields such as semiconductor element manufacturing and precision machining, optical high-precision measurements are increasingly being used. In these fields, it is necessary to make the necessary adjustments for measurement with high precision, so a method that can easily and accurately measure the angle of incidence of light on an object has been desired.
そこで、本発明の目的は、上述の欠点を除去し
て、簡単な構成で光の物体への入射角度を高精度
で測定する方法を提案することにある。 SUMMARY OF THE INVENTION An object of the present invention is to eliminate the above-mentioned drawbacks and to propose a method for measuring the angle of incidence of light on an object with a simple configuration and with high precision.
[問題点を解決するための手段]
このような目的を達成するために、本発明は、
物体への光の入射角度を測定する方法において、
物体上に回折格子を設け、光の回折格子による回
折光の内の少なくとも1つの回折光を反射体で反
射させて反射光を得て、反射光と少なくとも1つ
の他の回折光との合成光の強度を測定することに
より物体への光の入射角度を測定することを特徴
とする。[Means for solving the problems] In order to achieve such an object, the present invention has the following features:
In a method of measuring the angle of incidence of light on an object,
A diffraction grating is provided on an object, at least one of the diffracted lights by the light diffraction grating is reflected by a reflector to obtain reflected light, and the reflected light is combined with at least one other diffracted light. It is characterized by measuring the angle of incidence of light on an object by measuring the intensity of the light.
[作用]
本発明は、物体上に回折格子を設け、入射光の
回折格子による回折光の内の少なくとも1つを反
射体で反射させ、その反射光と少なくとも1つの
回折光を干渉させた合成光Uの光強度を測定する
ことにより物体への入射光の入射角度Ψを測定す
るようにしたので、合成光Uの光強度が入射角度
Ψに敏感に依存することから、入射角度を高精度
に測定できる。[Function] The present invention provides a synthesis method in which a diffraction grating is provided on an object, at least one of the diffracted lights of the incident light by the diffraction grating is reflected by a reflector, and the reflected light and at least one diffracted light are interfered with each other. The angle of incidence Ψ of the incident light on the object is measured by measuring the light intensity of the light U. Since the light intensity of the composite light U is sensitively dependent on the angle of incidence Ψ, the angle of incidence can be determined with high precision. can be measured.
[実施例]
以下、図面を参照して本発明の実施例を詳細に
説明する。[Example] Hereinafter, an example of the present invention will be described in detail with reference to the drawings.
まず最初に本発明の原理について説明する。 First, the principle of the present invention will be explained.
第1図a,bは、本発明測定方法の原理を示
す。本発明では、本図に示すように、物体1に入
射している光Iの入射角度Ψを測定するため、物
体1上に回折格子Gを配置する。回折格子Gに入
射した光Iから一般には複数個の回折光D1,D2
が得られる。 Figures 1a and 1b illustrate the principle of the measuring method of the present invention. In the present invention, as shown in the figure, a diffraction grating G is placed on the object 1 in order to measure the incident angle Ψ of the light I incident on the object 1. Generally, from the light I incident on the diffraction grating G, a plurality of diffracted lights D 1 , D 2
is obtained.
第1図aでは、この内の回折光D2を反射体2
で反射して反射光Rを得て、その反射光Rを他の
回折光D1と同一方向に進行させて、回折光D1と
反射光Rを互いに干渉させる。この干渉による合
成光Uの強度は、後述のように入射角Ψに敏感に
依存するので、その強度を検出器3で測定すれば
入射角Ψが測定できる。 In Figure 1a, the diffracted light D 2 is transferred to the reflector 2.
The diffracted light D 1 and the reflected light R are caused to interfere with each other by being reflected by the diffracted light D 1 to obtain a reflected light R. The reflected light R is caused to travel in the same direction as the other diffracted light D 1 . The intensity of the combined light U resulting from this interference depends sensitively on the angle of incidence Ψ, as will be described later, so if the intensity is measured by the detector 3, the angle of incidence Ψ can be measured.
この時、反射光Rと回折光D1の方向は厳密に
一致している必要はなく、互いの干渉が生じる程
度にそろつていれば良い。また、反射体2の表面
は完全な鏡面でなく、多少凹凸を有していても、
合成光Uの強度の検出に充分な強度の反射光Rを
生成できる程度であればよい。さらに、1つの反
射体のみにより反射光Rを回折光D1と直接干渉
させなくとも、複数個の反射体を組み合わせて用
いることにより、反射光Rと回折光D1とを干渉
させてもよい。あるいは、反射体2と検出器3の
間にレンズ等の光学系を介在させ、それによつて
反射光Rと回折光D1を干渉させてもよい。 At this time, the directions of the reflected light R and the diffracted light D1 do not need to be exactly the same, but only need to be aligned to the extent that they interfere with each other. Moreover, even if the surface of the reflector 2 is not a perfect mirror surface and has some unevenness,
It is sufficient that the reflected light R can be generated with sufficient intensity to detect the intensity of the combined light U. Furthermore, instead of directly interfering the reflected light R with the diffracted light D 1 using only one reflector, the reflected light R and the diffracted light D 1 may be caused to interfere with each other by using a combination of multiple reflectors. . Alternatively, an optical system such as a lens may be interposed between the reflector 2 and the detector 3, thereby causing the reflected light R and the diffracted light D1 to interfere with each other.
このように、回折光を用いると、物体1を直接
透過する透過光や物体1に直接反射する反射光に
対してほとんど影響を与えることなく、入射角度
を高精度で測定でき、併設させた他の光学測定系
を全く妨害しないという利点がある。また、回折
光を他の光学測定に用いる場合にも、1つの回折
格子からは一般に複数の回折光が得られるので、
他の光学測定に影響を与えない回折光を選んで、
入射角度の測定に用いればよい。 In this way, by using diffracted light, the incident angle can be measured with high precision without having almost any effect on the transmitted light that directly passes through the object 1 or the reflected light that is directly reflected on the object 1. It has the advantage of not interfering with the optical measurement system at all. Also, when using diffracted light for other optical measurements, generally multiple diffracted lights can be obtained from one diffraction grating, so
Select diffracted light that does not affect other optical measurements,
It can be used to measure the angle of incidence.
ここで、物体1と反射体2は必ずしも異なる物
体である必要はなく、同一の物体の異なる面を反
射体2として用いてもよい。この場合は、第1図
bに示すように、反射体2を回折格子Gと平行に
配設するのが最も有効である。なぜなら、本図に
示すような構成をとると、任意の入射角Ψに対し
て、常に反射光Rの方向を回折光D1の方向と一
致させられるからである。 Here, the object 1 and the reflector 2 do not necessarily have to be different objects, and different surfaces of the same object may be used as the reflector 2. In this case, it is most effective to arrange the reflector 2 parallel to the diffraction grating G, as shown in FIG. 1b. This is because, with the configuration shown in this figure, the direction of the reflected light R can always be made to coincide with the direction of the diffracted light D1 for any incident angle Ψ.
また、この回折格子Gと反射体2の平行配置
は、入射光Iの垂直性(Ψ=0)の検出に有効で
ある。入射光Iが垂直入射に近い場合には、第2
図に示すように、対称的に2つの合成光U1(回折
光D1と反射光R1の合成光)とU2(回折光D2と反
射光R2の合成光)とが得られる。入射角Ψが垂
直からずれた場合には、合成光U1と合成光U2は
異なつた強度変化を示す。従つて、2つの合成光
U1とU2の強度が等しくなる点を各々の検出器3
で検出すれば、その点を極めて高精度に、かつ高
い確度でΨ=0と測定することができる。 Further, the parallel arrangement of the diffraction grating G and the reflector 2 is effective for detecting the perpendicularity (Ψ=0) of the incident light I. When the incident light I is close to normal incidence, the second
As shown in the figure, two composite lights U 1 (combined light of diffracted light D 1 and reflected light R 1 ) and U 2 (combined light of diffracted light D 2 and reflected light R 2 ) are obtained symmetrically. . When the incident angle Ψ deviates from the vertical, the composite light U 1 and the composite light U 2 exhibit different intensity changes. Therefore, the two combined lights
The point where the intensities of U 1 and U 2 are equal is
If the point is detected, it is possible to measure Ψ=0 with extremely high precision and accuracy.
以上に述べた本発明の測定方法で入射角Ψが測
定できるのは、次のような原理に基づく。すなわ
ち、反射光Rの位相は、反射体2を経たことによ
り、その光路長分だけ遅れを生じている。この位
相遅れΔは反射体2までの距離と回折角θによ
り定まる。回折角θは入射角Ψが変わるとそれに
応じて変化する。従つて、反射光Rを回折光D1
と干渉させて、その反射光Rと回折光D1の合成
光Uの強度変化により、位相遅れΔを測定すれ
ば、入射角Ψを高精度に測定できる。 The reason why the incident angle Ψ can be measured by the measuring method of the present invention described above is based on the following principle. That is, since the reflected light R passes through the reflector 2, the phase of the reflected light R is delayed by the length of its optical path. This phase delay Δ is determined by the distance to the reflector 2 and the diffraction angle θ. The diffraction angle θ changes accordingly as the incident angle Ψ changes. Therefore, the reflected light R is the diffracted light D 1
If the phase delay Δ is measured by the intensity change of the combined light U of the reflected light R and the diffracted light D1 , the incident angle Ψ can be measured with high precision.
例えば、第1図bの例では、以上の相関関係
は、次の式のようになる。 For example, in the example shown in FIG. 1b, the above correlation becomes as shown in the following equation.
まず、回折角θは、
sinθ=nλ/d+sinΨ ……(1)
で与えられる。但し、nは回折光の次数、dは回
折格子Gの周期、λは波長である。ここで、物体
1と反射体2の距離をSとすると、反射光Rの回
折光D1に対する位相遅れΔは、
Δ=4πS/λcosθ ……(2)
(但し、θは回折光D2の回折角)となる。 First, the diffraction angle θ is given by sinθ=nλ/d+sinΨ (1). However, n is the order of the diffracted light, d is the period of the diffraction grating G, and λ is the wavelength. Here, if the distance between the object 1 and the reflector 2 is S, the phase delay Δ of the reflected light R with respect to the diffracted light D 1 is Δ=4πS/λcosθ...(2) (However, θ is the phase delay Δ of the diffracted light D 2 diffraction angle).
従つて、反射光Rを回折光D1と干渉させると
合成光U1の強度はcos2Δに従つて変化するので、
その強度の測定により位相遅れΔ、すなわち入
射角Ψが上述の式(1)、(2)に従つて測定できる。 Therefore, when the reflected light R interferes with the diffracted light D1 , the intensity of the combined light U1 changes according to cos 2 Δ, so
By measuring the intensity, the phase delay Δ, that is, the angle of incidence Ψ can be measured according to the above equations (1) and (2).
例えば、波長632.8nmの光を用いると、S=
100μm程度の短い距離でも、4πS/λは2000程度
の値をとり、容易に10-4radの測定精度を実現で
きる。 For example, when using light with a wavelength of 632.8 nm, S=
Even at a short distance of about 100 μm, 4πS/λ takes a value of about 2000, and a measurement accuracy of 10 -4 rad can be easily achieved.
入射光として、互いに可干渉で周波数と偏光状
態の異なる光I1とI2の合成光を用いると、本発明
のそのままの構成で、位相遅れΔの光ヘテロダ
イン測定を実現でき、測定精度を一層向上させる
ことができる。この場合は、第3図に示すよう
に、検出器3の前に偏光子4を配置した方が、よ
り明瞭なうなり信号が得られる。本発明の極めて
簡単な構成でヘテロダイン測定が可能なのは、回
折格子Gの回折効率および反射体2での反射率
が、光の偏光状態により異なることに基づく。 By using a composite light of lights I 1 and I 2 which are coherent and have different frequencies and polarization states as the incident light, optical heterodyne measurement with a phase delay Δ can be realized with the configuration of the present invention, and the measurement accuracy can be further improved. can be improved. In this case, a clearer beat signal can be obtained by placing a polarizer 4 in front of the detector 3 as shown in FIG. The reason why heterodyne measurement is possible with the extremely simple configuration of the present invention is that the diffraction efficiency of the diffraction grating G and the reflectance at the reflector 2 differ depending on the polarization state of the light.
検出器3へ入射する光の振幅Aは、入射光I1,
I2の角振動数をそれぞれw1,w2とすると、
A=A1(1+αe-i〓)eiw1t+A2(−i
Δ)eiw2t……(3)
となる。ここで、A1,A2はそれぞれ回折光の入
射光I1およびI2成分での振幅、αおよびβはそれ
ぞれ入射光I1およびI2成分での反射光Rの回折光
D1に対する振幅比である。但し、入射光I1とI2と
が共に円偏光のような対称性の高い場合を除い
て、一般にα≠βである。従つて、検出器3で検
出される光強度のうなりの位相φは、位相遅れ
Δと共に
φ=arctan(α−β)sinΔ/1+αβ+(α+β)c
osΔ……(4)
に従つて変化する。よつて、検出光強度のうなり
の位相φを測定することにより、位相遅れΔ、
すなわち入射角Ψを測定できる。 The amplitude A of the light incident on the detector 3 is the incident light I 1 ,
Letting the angular frequencies of I 2 be w 1 and w 2 respectively, A=A 1 (1+αe -i 〓)e iw1t +A 2 (-i
Δ)e iw2t ……(3). Here, A 1 and A 2 are the amplitudes of the diffracted light at the incident light I 1 and I 2 components, respectively, and α and β are the diffracted lights of the reflected light R at the incident light I 1 and I 2 components, respectively.
It is the amplitude ratio to D1 . However, in general, α≠β, except when the incident lights I 1 and I 2 are both highly symmetrical, such as circularly polarized light. Therefore, the phase φ of the beat of the light intensity detected by the detector 3 is expressed as φ=arctan(α−β)sinΔ/1+αβ+(α+β)c together with the phase delay Δ.
osΔ changes according to (4). Therefore, by measuring the phase φ of the beat of the detected light intensity, the phase delay Δ,
In other words, the incident angle Ψ can be measured.
上記のようなヘテロダイン測定方法を用いるこ
とにより、著しく測定精度を向上させることがで
き、容易に10-5rad以上の精度を得ることができ
る。また、この測定方法は、強度測定に比して、
光源強度や検出器の検出感度のゆらぎ等、外部擾
乱の影響をほとんど受けない点でも極めて優れて
いる。 By using the heterodyne measurement method as described above, measurement accuracy can be significantly improved, and an accuracy of 10 -5 rad or more can be easily obtained. Additionally, compared to strength measurement, this measurement method has
It is also extremely superior in that it is almost unaffected by external disturbances such as fluctuations in light source intensity and detector detection sensitivity.
また、上記のヘテロダイン測定に必要な2成分
の入射光I1,I2は種々の公知の方法により発生さ
せることができる。例えば、電気光学素子、音響
光学素子、振動鏡、回転1/4波長板、ゼーマン・
レーザ等を用いれば容易に2成分の入射光I1,I2
を発生させることができる。 Further, the two component incident lights I 1 and I 2 necessary for the above-mentioned heterodyne measurement can be generated by various known methods. For example, electro-optic elements, acousto-optic elements, vibrating mirrors, rotating quarter-wave plates, Zeeman
Using a laser etc., it is easy to separate the two components of incident light I 1 and I 2
can be generated.
また、上述の第3図に示す方法を第2図のよう
な対称的な配置に適用すると、入射光の垂直性の
検出精度を著しく改善できる。この場合に対称的
に得られる2つの合成光U1,U2のうなりの位相
は位相遅れΔに対して互いに逆の依存性を示す。
従つて、合成光U1のうなりの位相φ(U1)と合成
光U2のうなりの位相φ(U2)の差は、上式(4)から
φ(U2)−φ(U1)=2arctan(α−β)s
inΔ/1+αβ+(α+β)cosΔ……(5)
となり、測定精度が向上する。また、この方法に
より、極めて高い測定精度を容易に実現できる。
なぜなら、入射角Ψが0の時には、上式(5)から位
相差φ(U2)−φ(U1)が0となり、検出が容易で
あるからである。 Moreover, if the method shown in FIG. 3 described above is applied to the symmetrical arrangement as shown in FIG. 2, the accuracy of detecting the verticality of incident light can be significantly improved. In this case, the phases of the beats of the two combined lights U 1 and U 2 obtained symmetrically exhibit mutually opposite dependence on the phase delay Δ.
Therefore, the difference between the beat phase φ(U 1 ) of the composite light U 1 and the beat phase φ(U 2 ) of the composite light U 2 is calculated from the above equation (4) as φ(U 2 )−φ(U 1 )=2arctan(α−β)s
inΔ/1+αβ+(α+β)cosΔ...(5) The measurement accuracy improves. Furthermore, this method can easily achieve extremely high measurement accuracy.
This is because when the incident angle Ψ is 0, the phase difference φ(U 2 )−φ(U 1 ) becomes 0 from the above equation (5), and detection is easy.
以上、本発明の方法を光の入射角度の測定に適
用する場合について述べたが、本発明の方法は、
光以外に、電磁波やその他の波動に一般的に適用
できることは言うまでもない。 Above, the case where the method of the present invention is applied to the measurement of the incident angle of light has been described, but the method of the present invention
Needless to say, this method can be generally applied to electromagnetic waves and other waves in addition to light.
実際に、次の例について、本発明の測定方法を
用いて測定した結果、光の入射角度を極めて高精
度に測定することができた。 In fact, as a result of measuring the following example using the measuring method of the present invention, it was possible to measure the incident angle of light with extremely high precision.
実施例 1
第1図bで示す配置を用い、厚さ400μmの石
英から成る物体1へのHe−Neレーザ光(波長
632.8nm)Iの入射角度Ψを測定した。物体1上
には、厚さ0.25μm、幅0.2μmのタングステン線
を周期0.76μmで配置して回折格子Gを作製した。
この物体1から約60μm離してシリコン・ウエハ
を平行に設置し、反射体2として用いた。この
時、回折角θ=56°の方向に放射される±1次の
回折光から成る合成光Uの強度を検出器3として
光電子増倍管を用いて測定し、入射角Ψを測定し
た。合成光Uの強度はこの入射角Ψを変化させる
と、ほぼ前述の通りの強度変化を示し、強度を1
%の精度で測定することにより、Ψの測定精度と
して10-4rad以上の値を得た。Example 1 Using the arrangement shown in Figure 1b, He-Ne laser light (wavelength
The incident angle Ψ of 632.8 nm) I was measured. On the object 1, a diffraction grating G was fabricated by arranging tungsten wires having a thickness of 0.25 μm and a width of 0.2 μm at a pitch of 0.76 μm.
A silicon wafer was placed parallel to the object 1 at a distance of about 60 μm and used as the reflector 2. At this time, the intensity of the composite light U consisting of the ±1st-order diffracted light emitted in the direction of the diffraction angle θ=56° was measured using a photomultiplier tube as the detector 3, and the incident angle Ψ was measured. When the incident angle Ψ is changed, the intensity of the composite light U changes almost as described above, and the intensity changes by 1.
By measuring with an accuracy of 10 -4 rad, we obtained a value of Ψ measurement accuracy of 10 -4 rad or more.
実施例 2
さらに、入射光源IにHe−Ne横ゼーマン・レ
ーザを用い、第3図に示す本発明の測定方法に従
つてヘテロダイン測定を行うことにより、さらに
高い測定精度を実現できた。この時に用いたゼー
マン・レーザは互いに直交する偏光方向を有し、
2つの周波数のわずかに異なる光I1,I2を発生す
るものであり、その周波数、すなわちうなりの周
波数は344kHzであつた。この時に上述の第3図
の構成で入射角Ψを変化させると、合成光Uの強
度のうなりの位相(位相差)は第4図に示すよう
に入射角Ψに対し直線的に変化し、10-4rad/度
の入射角度/位相感度を達成できた。また、この
時の位相測定の精度はほぼ0.2°であり、従つて、
入射角度の測定精度は2×10-5rad(ほぼ0.1秒)
と極めて高い値を実現できた。Example 2 Furthermore, even higher measurement accuracy was achieved by using a He--Ne transverse Zeeman laser as the incident light source I and performing heterodyne measurement according to the measurement method of the present invention shown in FIG. The Zeeman lasers used at this time have mutually orthogonal polarization directions,
It generates two lights I 1 and I 2 with slightly different frequencies, and the frequency, that is, the beat frequency, was 344 kHz. At this time, when the incident angle Ψ is changed using the configuration shown in FIG. 3, the phase (phase difference) of the intensity beat of the composite light U changes linearly with respect to the incident angle Ψ, as shown in FIG. An incident angle/phase sensitivity of 10 -4 rad/degree was achieved. Also, the accuracy of phase measurement at this time is approximately 0.2°, therefore,
The measurement accuracy of the incident angle is 2×10 -5 rad (approximately 0.1 seconds)
We were able to achieve an extremely high value.
[発明の効果]
以上説明したように、本発明によれば、極めて
簡単な構成で入射角度の測定精度を著しく改善で
きる。[Effects of the Invention] As described above, according to the present invention, the measurement accuracy of the incident angle can be significantly improved with an extremely simple configuration.
半導体デバイス製造のための微細加工や検査、
あるいは他の精密機械加工のためにしばしば光学
的な計測法が用いられるが、これらの光学計測で
は、測定精度や確度を確保するために、測定に用
いる光の入射角度を厳密に設定する必要がある。
本発明の測定方法を用いれば、高精度の入射角度
測定が容易に行え、上述のような光学測定に必要
な入射角度の設定を完了できる。また、本発明の
測定方法により基準光に対する物体のなす角度を
高精度に測定できるので、複数個の物体のなす角
度を高精度に算出することもできる。 Microfabrication and inspection for semiconductor device manufacturing,
Optical measurement methods are often used for other precision machining, but in order to ensure measurement precision and accuracy, it is necessary to strictly set the incident angle of the light used for measurement. be.
By using the measurement method of the present invention, it is possible to easily measure the angle of incidence with high precision, and to complete the setting of the angle of incidence necessary for optical measurement as described above. Further, since the measuring method of the present invention allows the angle formed by an object with respect to the reference light to be measured with high accuracy, it is also possible to calculate the angle formed by a plurality of objects with high accuracy.
第1図a,b、第2図〜第3図はそれぞれ本発
明の実施例を示す線図、第4図は本発明の方法の
測定結果を表わす図、第5図a,bは従来例の説
明図である。
1……物体、2……反射体、3……検出器、4
……偏光子、I……入射光、D1,D2……回折光、
R……反射光、U1,U2……合成光、G……回折
格子、Ψ……入射角、θ……回折角。
Figures 1 a and b and Figures 2 and 3 are diagrams showing examples of the present invention, Figure 4 is a diagram showing measurement results of the method of the present invention, and Figures 5 a and b are conventional examples. FIG. 1...Object, 2...Reflector, 3...Detector, 4
... Polarizer, I ... Incident light, D 1 , D 2 ... Diffracted light,
R...Reflected light, U1 , U2 ...Synthesized light, G...Diffraction grating, Ψ...Incidence angle, θ...Diffraction angle.
Claims (1)
て、前記物体上に回折格子を設け、前記光の前記
回折格子による回折光の内の少なくとも1つの回
折光を反射体で反射させて反射光を得て、該反射
光と少なくとも1つの他の回折光との合成光の強
度を測定することにより前記物体への光の入射角
度を測定することを特徴とする入射角度測定方
法。 2 前記反射体が前記回折格子と平行に配設され
ていることを特徴とする特許請求の範囲第1項記
載の入射角度測定方法。 3 前記光が互いに可干渉で周波数と偏光状態の
異なる光の合成光であることを特徴とする特許請
求の範囲第1項記載の入射角度測定方法。[Claims] 1. A method for measuring the angle of incidence of light on an object, wherein a diffraction grating is provided on the object, and at least one of the lights diffracted by the diffraction grating is redirected by a reflector. Incident angle measurement, characterized in that the angle of incidence of light on the object is measured by reflecting to obtain reflected light and measuring the intensity of the combined light of the reflected light and at least one other diffracted light. Method. 2. The method of measuring an incident angle according to claim 1, wherein the reflector is arranged parallel to the diffraction grating. 3. The incident angle measuring method according to claim 1, wherein the light is a composite light of mutually coherent light having different frequencies and polarization states.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP18709387A JPS6431007A (en) | 1987-07-27 | 1987-07-27 | Measuring method of incident angle |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP18709387A JPS6431007A (en) | 1987-07-27 | 1987-07-27 | Measuring method of incident angle |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS6431007A JPS6431007A (en) | 1989-02-01 |
| JPH0478925B2 true JPH0478925B2 (en) | 1992-12-14 |
Family
ID=16199983
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP18709387A Granted JPS6431007A (en) | 1987-07-27 | 1987-07-27 | Measuring method of incident angle |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS6431007A (en) |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US9816941B2 (en) | 2016-03-28 | 2017-11-14 | Saudi Arabian Oil Company | Systems and methods for constructing and testing composite photonic structures |
| WO2021234812A1 (en) * | 2020-05-19 | 2021-11-25 | 日本電信電話株式会社 | Angle measurement device and method |
-
1987
- 1987-07-27 JP JP18709387A patent/JPS6431007A/en active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS6431007A (en) | 1989-02-01 |
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