JPH0482161B2 - - Google Patents
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- Publication number
- JPH0482161B2 JPH0482161B2 JP62033297A JP3329787A JPH0482161B2 JP H0482161 B2 JPH0482161 B2 JP H0482161B2 JP 62033297 A JP62033297 A JP 62033297A JP 3329787 A JP3329787 A JP 3329787A JP H0482161 B2 JPH0482161 B2 JP H0482161B2
- Authority
- JP
- Japan
- Prior art keywords
- thick film
- resistance value
- glass
- resistor
- boride
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
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- Non-Adjustable Resistors (AREA)
Description
〔産業上の利用分野〕
本発明は、厚膜ハイプリツドIC等の用いる厚
膜抵抗組成物、厚膜抵抗体及びそれを用いた厚膜
ハイブリツドICに関する。
〔従来の技術〕
従来、厚膜ハイブリツドIC等に用いられてい
る抵抗体用材料には、空気中で焼成できるものと
してRuO2系材料が一般に用いられていた。従つ
て、導体回路も空気中で焼成されても酸化等の心
配のないAg−Pd系材料が使用されていた。しか
し、Ag−Pd系材料は抵抗値が比較的高く厚膜ハ
イブリツドICの低インビーダンス化を図る上で
のネツクとなつていた。
一方、銅系の回路導体はAg−Pd系に比べて低
インピーダンスであると云う利点があるが、銅は
酸化され易いので、非酸化性雰囲気中例えば窒素
ガス中でないと焼成できない。また、抵抗材料に
上記のRuO2系材料を用いると窒素ガス中では
RuO2が還元されてしまうため使用できないと云
う問題がある。
そこで、銅系の導体回路を有する厚膜ハイブリ
ツドICにおいては抵抗体材料として、6ほう化
物例えばLaB6にガラス粉、有機ビヒクルを加え
たベースト(特公昭59−51721号)が知られてい
る。
しかし、これらは、面積抵抗値で数kΩ/□以
上の抵抗値の安定な低抗体が得られないという問
題があつた。
酸化錫(SnO2)も非酸化性雰囲気中で焼成可
能な抵抗体材料として知られているが、上記6ほ
う化物とは逆に面積抵抗値で数10kΩ/□以下の
安定なものが得られないと云う問題があつた。
〔発明が解決しようとする問題点〕
前記LaB6系抵抗ペーストは、面積抵抗値で数
kΩ/□以上のものが実際には得られいないので、
低抗体皮膜を長くしたり、チツプ低抗体を併用す
るなどしていた。そのためハイブリツドICとし
ての集積度を上げることができず、かつ、チツプ
抵抗体の取り付け等のために製造工程が複雑とな
ると云う問題があつた。
そこで、上記の低抗体材料をそれぞれ用いたも
のでは、得ることができない数kΩ/□〜数
10kΩ/□の範囲内の抵抗値のものを得るために、
酸化錫(SnO2)とLaB6とのブレンドを行なつた
が、両者は焼成の過程で化学反応を起こすため
か、抵抗値が不安定でばらつき、とうてい実用性
のある抵抗体を得ることができなかつた。
本発明の目的は、非酸化性雰囲気中で焼成可能
であり、かつ、使用頻度が高い数kΩ/□〜数
10kΩ/□の抵抗値範囲がカバーでき、抵抗値が
安定な抵抗体を得ることができる厚膜抵抗組成
物、厚膜抵抗体およびを用いた厚膜ハイブリツド
ICを提供することにある。
〔問題点を解決するための手段〕
本発明は厚膜抵抗組成物は、
(a) 周期律表の希土類元素のほう化物を10〜90重
量部と、a族元素の窒化物を90〜10重量部
と、前記成分に対して20〜80重量部の有効量の
ガラス及び有機ビヒクルを含む厚膜抵抗組成
物。
(b) 周期律表の希土類元素のほう化物とa族元
素の窒化物とを有し、有効量のガラスを含む焼
結体である厚膜低抗体。
(c) セラミツクス基板上に、周期律表の希土類元
素のほう化物、a族元素の窒化物、及び有効
量のガラスを含む厚膜抵抗体と、銅導体から成
る厚膜回路とを有する厚膜ハイブリツドIC。
(d) セラミツクス基板上に、周期律表の希土類元
素のほう化物、a族元素の窒化物、及び有効
量のガラスを含む厚膜抵抗体と、銅導体から成
る厚膜回路と、それらを保護する被覆層とを有
する厚膜ハイブリツドICにある。
なお、上記ほう化物成分が多くなると焼成後の
抵抗体の抵抗値は低くなる傾向があり、一方窒化
物成分が多くなると抵抗値は高くなる傾向がある
が、両者の配合比率は必要とする抵抗値に応じて
上記範囲内で任意に選択することができる。
上記の希土類及びa族元素には、Sc、Y、
ランタノイド、Ti、Zr、Hfがある。
また、前記ほう化物成分がランタンボライド
で、窒化物成分がTiNである組合せが特に好ま
しい。
上記導電性材料は、粉末状で使用されるが、粉
末としては平均粒径0.1〜2μmの範囲のものが好
ましい。
上記の他に、バインダーとしてのガラス及び成
形時の有機ビヒクルは、従来用いられている公知
の材料が使用できる。
ガラスとしては、ほうけい酸系ガラス、例えば
ほうけい酸アルミカルシユウムガラス、ほうけい
酸アルミ亜鉛ガラズ、ほうけい酸アルミバリユウ
ムガラスなどの粉末状のものを、前記導電性材料
成分に対し20〜80重量%の範囲で用いるのがよ
い。抵抗体の抵抗値に合せて配合するのがよい。
また、有機ビヒクルとしては熱分解性の樹脂、
例えばメタアクリル酸系樹脂をテルピネオール、
ブチルカルビトールアセテート等の溶剤に溶解し
たものを用いる。
上記の厚膜抵抗組成物は、セラミツクス基板上
に塗布、例えばスクリーン印刷などの方法によつ
て形成される。しかるのち予備乾燥後、非酸化性
雰囲気中で焼成され厚膜ハイブリツドICが得ら
れる。焼成温度は、配合される抵抗ベーストによ
つても異なるが、850〜950℃が一般的である。
〔作用〕
前記ランタンボライドと酸化錫をブレンドした
ものは、例えば
LaB6+SnO2→Sn+LaO2+B2O3
のような反応が起り、金属Snの生成により所定
の抵抗値のものが得られないばかりか、水に不安
定なB2O3が生成されるために不安定となり、ば
らつく原因になるものと考えられる。
これに対し、本発明においては、それぞれ粒径
が1μm前後の大きさの希土類元素のほう化物と
a族元素の窒化物の2種以上の導電性材料とガ
ラスとを混合し、焼成する。そのため焼成時にほ
う化物と窒化物とが反応し、新規な、およそ数
100オングストロームの粒径の微粒導電物質が生
成する。新たな導電バスが形成されることによつ
て、抵抗体中の導電バスがより多くなり、例えば
ほう化物と窒化物との導電バスが一部切断される
ような場合でも、全体のパスが多いことで抵抗特
性としての抵抗値のばらつきやヒートサイクルに
よる抵抗値変化率等を小さく抑えることが可能に
なる。従つて低抗体としては非常に安定した特性
を示す。
また、焼成後の抵抗体は熱衝撃に対しても抵抗
値の変化が少ないので安定な厚膜ハイブリツド
ICを提供することができる。
〔実施例〕
以下、本発明を実施例により説明する。
実施例 1
粒径2μm以下のLaB6、TiNおよび平均粒径1μ
mのほうけい酸アルミ系ガラスの粉末とを第1表
に示す割合配合し、らい潰機で混合した後、有機
ビヒクルとして20重量%メタアクリル酸系樹脂/
ブチルカルビト−ルアセテート溶液を粉末成分に
対し約20重量%加え、3本ロールを用いて室温で
混練し、ペースト状の本発明の厚膜抵抗組成物を
得た。
次に、第1図に示すようにアルミナ基板1
(0.8mm×72mm×55mm)上に、銅系の導体ペースト
(DuPont社製:9153)を用いてスクリーン印刷法
により導体端子2を形成後、120℃、10分乾燥し、
窒素ガス中で900℃、10分の焼成を行なつた。
次に、前記厚膜抵抗組成物を同様にして、印刷
し抵抗体3を形成した。これを、120℃、10分乾
燥し、次いで窒素ガス中で850、900および950℃
で焼成を行なつて抵抗体を作成した。
第2図に、抵抗値の焼成温度依存性を示す。
第1表に示すとおりの面積抵抗値、抵抗値のば
らつき幅を有する試験用サンプルを得た。試験用
サンプルとしては、ほぼ同じ抵抗値を有する抵抗
体皮膜90個の用いて、1条件の試験に供した。
表から明らかなように、安定で、28Ω/□〜
18MΩ/□の抵抗値をもつた低抗体が得られた。
ここで抵抗値の安定性を示す抵抗値のばらつき
は以下の式により求めた。
抵抗値がばらつき(%)=3σ/R×100
σ(Ω)=√{Σi(Ri−R)2/(n−1)}
上式において、
σ=標準偏差
Ri=各抵抗値
R=平均抵抗値
n=測定した低抗体の数
である。
[Industrial Field of Application] The present invention relates to a thick film resistor composition, a thick film resistor, and a thick film hybrid IC used in a thick film hybrid IC or the like. [Prior Art] Conventionally, RuO 2 -based materials have been generally used as materials for resistors used in thick-film hybrid ICs and the like because they can be fired in air. Therefore, conductive circuits have been made of Ag--Pd materials that are free from oxidation even when fired in air. However, Ag-Pd-based materials have a relatively high resistance value, which has been an obstacle to achieving low impedance in thick-film hybrid ICs. On the other hand, copper-based circuit conductors have the advantage of lower impedance than Ag-Pd-based circuit conductors, but since copper is easily oxidized, it cannot be fired unless in a non-oxidizing atmosphere, such as nitrogen gas. In addition, if the above RuO 2- based material is used as a resistance material, it will not react in nitrogen gas.
There is a problem that RuO 2 cannot be used because it is reduced. Therefore, baset (Japanese Patent Publication No. 51721/1983), which is a hexaboride such as LaB 6 to which glass powder and an organic vehicle are added, is known as a resistor material for thick film hybrid ICs having copper-based conductor circuits. However, these methods have a problem in that stable low-intensity antibodies with a sheet resistance value of several kΩ/□ or more cannot be obtained. Tin oxide (SnO 2 ) is also known as a resistor material that can be fired in a non-oxidizing atmosphere, but contrary to the above-mentioned hexaboride, a stable material with a sheet resistance value of several tens of kΩ/□ or less can be obtained. There was a problem that there was no. [Problems to be solved by the invention] The LaB 6 series resistor paste has a resistance value of several
Since it is not actually possible to obtain more than kΩ/□,
The anti-antibody coating was lengthened, and anti-chip anti-antibodies were also used. Therefore, there were problems in that the degree of integration as a hybrid IC could not be increased, and the manufacturing process became complicated due to the attachment of chip resistors and the like. Therefore, using each of the above-mentioned low antibody materials, it is impossible to obtain several kΩ/□ to several
In order to obtain a resistance value within the range of 10kΩ/□,
We tried blending tin oxide (SnO 2 ) and LaB 6 , but the resistance value was unstable and varied, probably because the two undergo a chemical reaction during the firing process, making it impossible to obtain a very practical resistor. I couldn't do it. The purpose of the present invention is to achieve a firing method that can be fired in a non-oxidizing atmosphere and that is frequently used.
Thick film resistor compositions, thick film resistors, and thick film hybrids that can cover a resistance value range of 10 kΩ/□ and obtain resistors with stable resistance values.
The goal is to provide IC. [Means for Solving the Problems] The thick film resistor composition of the present invention comprises: (a) 10 to 90 parts by weight of a boride of a rare earth element in the periodic table and 90 to 10 parts by weight of a nitride of a group A element; parts by weight of glass and an effective amount of 20 to 80 parts by weight of glass and organic vehicle. (b) A thick-film low antibody which is a sintered body containing a boride of a rare earth element and a nitride of a group A element of the periodic table and an effective amount of glass. (c) A thick film having, on a ceramic substrate, a thick film resistor containing a boride of a rare earth element of the periodic table, a nitride of a group A element, and an effective amount of glass, and a thick film circuit made of a copper conductor. Hybrid IC. (d) A thick film resistor containing a boride of a rare earth element in the periodic table, a nitride of a group A element, and an effective amount of glass, a thick film circuit made of a copper conductor, and protecting them on a ceramic substrate. A thick film hybrid IC having a covering layer that Note that as the boride component increases, the resistance value of the resistor after firing tends to decrease, while as the nitride component increases, the resistance value tends to increase. It can be arbitrarily selected within the above range depending on the value. The above rare earths and group a elements include Sc, Y,
There are lanthanoids, Ti, Zr, and Hf. Furthermore, a combination in which the boride component is lanthanum boride and the nitride component is TiN is particularly preferred. The above-mentioned conductive material is used in powder form, and the powder preferably has an average particle size in the range of 0.1 to 2 μm. In addition to the above, conventionally known materials can be used as the glass as the binder and the organic vehicle during molding. As the glass, powdered borosilicate glass, such as aluminum calcium borosilicate glass, aluminum zinc borosilicate glass, and aluminum barium borosilicate glass, is used in a ratio of 20 to 20% of the conductive material component. It is preferable to use it in a range of 80% by weight. It is best to mix it according to the resistance value of the resistor. In addition, as organic vehicles, thermally decomposable resins,
For example, terpineol, methacrylic acid resin,
Use a solution dissolved in a solvent such as butyl carbitol acetate. The thick film resistor composition described above is formed by coating on a ceramic substrate, for example, by a method such as screen printing. Then, after preliminary drying, it is fired in a non-oxidizing atmosphere to obtain a thick film hybrid IC. The firing temperature varies depending on the resistance base to be blended, but is generally 850 to 950°C. [Function] When the above-mentioned blend of lanthanum boride and tin oxide is used, a reaction such as LaB 6 + SnO 2 → Sn + LaO 2 + B 2 O 3 occurs, and a desired resistance value cannot be obtained due to the formation of metal Sn. In addition, it is thought that B 2 O 3 , which is unstable in water, is produced, resulting in instability and variation. In contrast, in the present invention, two or more types of conductive materials, borides of rare earth elements and nitrides of group A elements, each having a particle size of about 1 μm, are mixed with glass and fired. Therefore, during firing, borides and nitrides react, creating new
Fine particles of conductive material with a particle size of 100 angstroms are produced. Due to the formation of new conductive buses, there are more conductive buses in the resistor, for example, even if the conductive bus between boride and nitride is partially cut, the total number of paths is larger. This makes it possible to suppress variations in resistance values as resistance characteristics and the rate of change in resistance value due to heat cycles. Therefore, it exhibits very stable characteristics as a low antibody. In addition, the resistance value of the resistor after firing does not change much even when subjected to thermal shock, making it a stable thick film hybrid.
IC can be provided. [Example] The present invention will be explained below with reference to Examples. Example 1 LaB 6 with a particle size of 2 μm or less, TiN and an average particle size of 1 μm
m of aluminum borosilicate glass powder in the proportions shown in Table 1, mixed in a crusher, and then mixed with 20% by weight methacrylic acid resin/as an organic vehicle.
About 20% by weight of butyl carbitol acetate solution was added to the powder components and kneaded at room temperature using three rolls to obtain a paste-like thick film resistor composition of the present invention. Next, as shown in FIG.
(0.8 mm x 72 mm x 55 mm), a conductor terminal 2 was formed by screen printing using a copper-based conductor paste (manufactured by DuPont: 9153), and then dried at 120°C for 10 minutes.
Firing was performed at 900°C for 10 minutes in nitrogen gas. Next, the thick film resistor composition was printed in the same manner to form a resistor 3. This was dried at 120°C for 10 minutes, then at 850, 900 and 950°C in nitrogen gas.
A resistor was created by firing. FIG. 2 shows the firing temperature dependence of the resistance value. Test samples having sheet resistance values and variation widths of resistance values as shown in Table 1 were obtained. As test samples, 90 resistor films having approximately the same resistance value were used and subjected to a test under one condition. As is clear from the table, it is stable and 28Ω/□~
A low antibody with a resistance value of 18 MΩ/□ was obtained. Here, the variation in resistance value, which indicates the stability of resistance value, was determined using the following formula. Variation in resistance value (%) = 3σ/R×100 σ (Ω) = √ {Σi (Ri−R) 2 / (n−1)} In the above formula, σ = standard deviation Ri = each resistance value R = average Resistance value n=number of low antibodies measured.
【表】【table】
【表】
比較例 1
導電性材料の組成が異なる他は、実施例1同様
にして、厚膜抵抗組成物を作成し、これをアルミ
ナ基板上に印刷後、乾燥、焼成を行なつて抵抗体
を作成した。得られた抵抗体の面積抵抗値、抵抗
値のばらつき幅およびヒートサイクル試験を行な
つた結果を第2表に示す。また、第3図に、抵抗
値の焼成温度依存性を示す。
実施例1に比べ、ガラス分の割合が大きくなる
ほど抵抗値のばらつき幅、ヒートサイクル後の抵
抗値の変化率が大きい。また、抵抗体の焼成温度
し依存性が抵抗値に影響していることが分かる。[Table] Comparative Example 1 A thick film resistor composition was prepared in the same manner as in Example 1, except that the composition of the conductive material was different. After printing this on an alumina substrate, it was dried and fired to form a resistor. It was created. Table 2 shows the sheet resistance value of the obtained resistor, the variation width of the resistance value, and the results of the heat cycle test. Moreover, FIG. 3 shows the firing temperature dependence of the resistance value. Compared to Example 1, the larger the proportion of glass, the larger the range of variation in resistance value and the larger the rate of change in resistance value after heat cycling. It can also be seen that the resistance value is influenced by the firing temperature of the resistor.
【表】
比較例 2
粒径2μm以下の導電性材料およびほうけい酸
アルミ系ガラス粉末と第3表に示す割合に配合
し、実施例1と同様にして厚膜抵抗組成物を作成
した。これらを実施例1と同様に、アルミナ基板
上に印刷し、乾燥、焼成した。これらの特性を第
3表に示す。
本比較例からは、得られた抵抗体の抵抗値のば
らつきが大きい。[Table] Comparative Example 2 A thick film resistor composition was prepared in the same manner as in Example 1 by blending a conductive material with a particle size of 2 μm or less and an aluminum borosilicate glass powder in the proportions shown in Table 3. These were printed on an alumina substrate in the same manner as in Example 1, dried, and fired. These properties are shown in Table 3. From this comparative example, the resistance values of the obtained resistors have large variations.
【表】
〔発明の効果〕
本発明によれば、抵抗体の抵抗値の変化率が少
なく、ヒートサイクルに対しても安定で、任意の
抵抗値を有する原膜ハイブリツドIC、厚膜抵抗
組成物、厚膜抵抗体を提供することができる。[Table] [Effects of the Invention] According to the present invention, a raw film hybrid IC and a thick film resistor composition that have a small rate of change in resistance value of a resistor, are stable against heat cycles, and have an arbitrary resistance value. , a thick film resistor can be provided.
第1図は本発明の実施例に用いた試験用抵抗体
の平面図、第2図および第3図は抵抗体の焼成体
温度依存性を示すグラフである。
1……基板、2導体端子、3……抵抗体。
FIG. 1 is a plan view of a test resistor used in an example of the present invention, and FIGS. 2 and 3 are graphs showing the temperature dependence of the resistor on fired body. 1... Board, 2-conductor terminal, 3... Resistor.
Claims (1)
量部と、a族元素の窒化物を90〜10重量部と、
前記成分に対して20〜80重量部の有効量のガラス
及び有機ビヒクルを含むことを特徴とする厚膜抵
抗組成物。 2 周期律表の希土類元素のほう化物とa族元
素の窒化物とを有し、有効量のガラスを含む焼結
体であることを特徴とする厚膜低抗体。 3 セラミツクス基板上に、周期律表の希土類元
素のほう化物、a族元素の窒化物、及び有効量
のガラスを含む厚膜低抗体と、銅導体から成る厚
膜回路とを有することを特徴とする厚膜ハイブリ
ツドIC。 4 セラミツクス基板上に、周期律表の希土類元
素のほう化物、a族元素の窒化物、及び有効量
のガラスを含む厚膜低抗体と、銅導体から成る厚
膜回路と、それらを保護する被覆層とを有するこ
とを特徴とする厚膜ハイブリツドIC。[Claims] 1. 10 to 90 parts by weight of a boride of a rare earth element in the periodic table, 90 to 10 parts by weight of a nitride of a group A element,
A thick film resistor composition comprising an effective amount of glass and an organic vehicle in an amount of 20 to 80 parts by weight based on the above components. 2. A thick-film hypoantibody comprising a boride of a rare earth element and a nitride of a group A element of the periodic table, and is a sintered body containing an effective amount of glass. 3. On a ceramic substrate, a thick film low antibody containing a boride of a rare earth element in the periodic table, a nitride of a group A element, and an effective amount of glass, and a thick film circuit made of a copper conductor are provided. Thick film hybrid IC. 4. On a ceramic substrate, a thick film circuit consisting of a thick film low antibody containing a boride of a rare earth element in the periodic table, a nitride of a group A element, and an effective amount of glass, a copper conductor, and a coating to protect them. A thick film hybrid IC characterized by having a layer.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP62033297A JPS63202001A (en) | 1987-02-18 | 1987-02-18 | Thick film resistor composition, thick film resistor, and thick film hybrid IC |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP62033297A JPS63202001A (en) | 1987-02-18 | 1987-02-18 | Thick film resistor composition, thick film resistor, and thick film hybrid IC |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS63202001A JPS63202001A (en) | 1988-08-22 |
| JPH0482161B2 true JPH0482161B2 (en) | 1992-12-25 |
Family
ID=12382612
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP62033297A Granted JPS63202001A (en) | 1987-02-18 | 1987-02-18 | Thick film resistor composition, thick film resistor, and thick film hybrid IC |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS63202001A (en) |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2723555B2 (en) * | 1987-12-14 | 1998-03-09 | 松下電器産業株式会社 | Glaze resistance material and hybrid integrated circuit device using the same |
| JPH0738325B2 (en) * | 1988-10-21 | 1995-04-26 | 株式会社日立製作所 | Thick film resistor composition and use thereof |
Family Cites Families (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS537699B2 (en) * | 1972-05-23 | 1978-03-20 | ||
| US4225468A (en) * | 1978-08-16 | 1980-09-30 | E. I. Du Pont De Nemours And Company | Temperature coefficient of resistance modifiers for thick film resistors |
-
1987
- 1987-02-18 JP JP62033297A patent/JPS63202001A/en active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS63202001A (en) | 1988-08-22 |
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