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JPH048848B2 - - Google Patents
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JPH048848B2 - - Google Patents

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Publication number
JPH048848B2
JPH048848B2 JP16731283A JP16731283A JPH048848B2 JP H048848 B2 JPH048848 B2 JP H048848B2 JP 16731283 A JP16731283 A JP 16731283A JP 16731283 A JP16731283 A JP 16731283A JP H048848 B2 JPH048848 B2 JP H048848B2
Authority
JP
Japan
Prior art keywords
film
head
thin film
magnetic
ferromagnetic
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP16731283A
Other languages
Japanese (ja)
Other versions
JPS6059518A (en
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP16731283A priority Critical patent/JPS6059518A/en
Priority to US06/577,389 priority patent/US4639806A/en
Priority to DE3404273A priority patent/DE3404273C2/en
Priority to GB08403588A priority patent/GB2146482B/en
Publication of JPS6059518A publication Critical patent/JPS6059518A/en
Publication of JPH048848B2 publication Critical patent/JPH048848B2/ja
Granted legal-status Critical Current

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Classifications

    • GPHYSICS
    • G11INFORMATION STORAGE
    • G11BINFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B5/00Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
    • G11B5/127Structure or manufacture of heads, e.g. inductive
    • G11B5/33Structure or manufacture of flux-sensitive heads, i.e. for reproduction only; Combination of such heads with means for recording or erasing only
    • G11B5/39Structure or manufacture of flux-sensitive heads, i.e. for reproduction only; Combination of such heads with means for recording or erasing only using magneto-resistive devices or effects
    • G11B5/3903Structure or manufacture of flux-sensitive heads, i.e. for reproduction only; Combination of such heads with means for recording or erasing only using magneto-resistive devices or effects using magnetic thin film layers or their effects, the films being part of integrated structures

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  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Magnetic Heads (AREA)

Description

【発明の詳細な説明】 <技術分野> 本発明は、一軸磁気異方性を有する金属強磁性
薄膜の磁化困難軸方向に印加された信号磁界の変
化を磁化容易軸方向の電気抵抗変化として検出す
る磁気抵抗効果素子(以下MP素子と略す。)を
具備して磁気記録媒体に記録された信号磁界の検
出を行う薄膜磁気ヘツド(以下薄膜MRヘツドと
略す。)の構造の改良に関する。
[Detailed Description of the Invention] <Technical Field> The present invention detects a change in a signal magnetic field applied in the direction of the hard axis of magnetization of a metal ferromagnetic thin film having uniaxial magnetic anisotropy as a change in electrical resistance in the direction of the easy axis of magnetization. The present invention relates to an improvement in the structure of a thin film magnetic head (hereinafter referred to as a thin film MR head) which is equipped with a magnetoresistive element (hereinafter referred to as an MP element) to detect a signal magnetic field recorded on a magnetic recording medium.

<従来技術> 従来、薄膜MRヘツドは巻線型のバルク磁気ヘ
ツドと比較して多くの利点があることが知られて
いる。即ち薄膜MRヘツドは磁気テープ等の磁気
記録媒体に書き込まれた信号磁界を受けることに
よつて磁気抵抗効果素子内部の磁化方向が変化
し、内部抵抗がそれに応じて変わり、この内部抵
抗の変化を外部出力として取り出すものであるか
ら、磁束応答型のヘツドであり、従つて磁気記録
媒体の移動速度に依存せずに信号磁界を再生でき
るものである。この薄膜MRヘツドは半導体の微
細加工技術により高集積化、多素子化が容易であ
るので高密度記録が行なわれる固定ヘツド式
PCM録音機の再生用磁気ヘツドとして有望視さ
れている。
<Prior Art> It has been known that thin-film MR heads have many advantages over wire-wound bulk magnetic heads. In other words, when a thin film MR head receives a signal magnetic field written on a magnetic recording medium such as a magnetic tape, the magnetization direction inside the magnetoresistive element changes, and the internal resistance changes accordingly. Since it is taken out as an external output, it is a magnetic flux response type head and can therefore reproduce the signal magnetic field without depending on the moving speed of the magnetic recording medium. This thin-film MR head is a fixed head type that can perform high-density recording because it is easy to achieve high integration and multi-element technology using semiconductor microfabrication technology.
It is seen as a promising magnetic head for playback of PCM recorders.

さて、元来MR素子は、外部磁界に対し二乗曲
線をもつ感応特性を示すことから、MR素子を再
生ヘツドとして構成する場合には磁化の配向を安
定化する為に素子形状をストライプ状にすると共
に、線型応答特性を得る為に所定のバイアス磁界
をMR素子に印加することが必要である。更に
MR素子に高分解機能を持たせる為に上記ストラ
イプ状のMR素子の上側及び下側に絶縁層を介し
て軟磁性材料(パーマロイ、センダスト等)から
なる薄膜を磁気シールド層として形成することが
必要である。
Now, since an MR element originally exhibits sensitivity characteristics with a square curve to an external magnetic field, when configuring an MR element as a reproduction head, the element shape is made into a stripe shape in order to stabilize the orientation of magnetization. At the same time, it is necessary to apply a predetermined bias magnetic field to the MR element in order to obtain linear response characteristics. Furthermore
In order to provide a high resolution function to the MR element, it is necessary to form a thin film made of a soft magnetic material (permalloy, sendust, etc.) as a magnetic shield layer on the upper and lower sides of the striped MR element with an insulating layer interposed therebetween. It is.

第1図は従来のMRヘツドの斜視図である。同
図で、1は磁気シールド用高透磁率磁性体、2は
バイアス用永久磁石、3はMR素子、4はMR素
子3のリードとなる導体部、5は磁気シールド用
高透磁率磁性体である。同図のヘツドにおいてギ
ヤツプ先端から進入した磁界(矢印A)はMR素
子3に印加されその為、該MR素子3が磁化され
る。
FIG. 1 is a perspective view of a conventional MR head. In the figure, 1 is a high permeability magnetic material for magnetic shielding, 2 is a permanent magnet for bias, 3 is an MR element, 4 is a conductor part that becomes the lead of MR element 3, and 5 is a high permeability magnetic material for magnetic shielding. be. In the head shown in the figure, a magnetic field (arrow A) entering from the tip of the gap is applied to the MR element 3, so that the MR element 3 is magnetized.

このMR素子3内の磁化の方向とMR素子3の
ストライプ長手方向(X軸)のなす角をθ(y)
とするとMR素子3の比抵抗ρ(y)は、 ρ(y)=ρ0+Δρmaxcos2〓 (ρ0:無磁界の比抵抗、Δρmax:最大磁気抵抗
変化率) となり、MR素子3の抵抗Rはトラツク巾をl、
MR素子膜厚をtとして、R=l/t〔∫w pdy 1/ρ(y)〕-1となる。上記MR素子3上の磁化は、 上記磁気シールド1,5内の磁化とも相互作用を
行うものであるが、いずれにしてもMRヘツドの
再生出力にはMR素子3の磁化の挙動が反映され
るものである。ところでMR素子3は入力磁界の
方向が磁化困難軸方向になる様に配置されている
為、MR素子3の磁化が回転モードで動く理想的
な場合には、My(y方向の磁化)はHy(y方向の
磁界)の1次関数となり、MR素子3の出力は入
力磁界に対して、2次関数的に変化する。この様
子を第2図に示す。MR素子3の出力は、高磁界
ではMyの飽和に伴い飽和する。
The angle between the direction of magnetization in this MR element 3 and the stripe longitudinal direction (X axis) of the MR element 3 is θ(y)
Then, the specific resistance ρ(y) of the MR element 3 is ρ(y) = ρ 0 + Δρmax cos2 〓 (ρ 0 : resistivity without magnetic field, Δρmax: maximum rate of change in magnetoresistance), and the resistance R of the MR element 3 is is track width l,
Letting the MR element film thickness be t, R=l/t [∫ w p dy 1/ρ(y)] -1 . The magnetization on the MR element 3 interacts with the magnetization in the magnetic shields 1 and 5, but in any case, the behavior of the magnetization of the MR element 3 is reflected in the reproduction output of the MR head. It is something. By the way, since the MR element 3 is arranged so that the direction of the input magnetic field is in the direction of the hard magnetization axis, in an ideal case where the magnetization of the MR element 3 moves in rotation mode, My (magnetization in the y direction) is Hy. (magnetic field in the y direction), and the output of the MR element 3 changes quadratically with respect to the input magnetic field. This situation is shown in FIG. The output of the MR element 3 is saturated with the saturation of My in a high magnetic field.

理想的なMR素子の出力は以上述べたとおりで
あるが、現実の素子においては、Myの変化が回
転モードのみで起ることはなく、MR素子内で磁
区分裂を起し、磁区の移動を伴うことが多い。特
に、第1図のMR素子のトラツク巾が小さくなる
と、静磁エネルギーの関係から、磁区の移動によ
るMyの変化が顕著になつてくる。磁区の移動は
バルク・ハウゼン・ジヤンプ(以下B−jumpと
略す。)と称する。Myの不連続的な変化を伴う。
上記回転モードと磁区の移動が混在する場合の、
MR素子の出力と入力磁界の関係を第3図に示
す。このバルク・ハウゼン・ジヤンプは、再生出
力のノイズとなり、MRヘツドのS/N比を大巾
に劣化させる。従つて良好なMRヘツドを得るた
めには素子のB−jumpを抑制することが不可欠
である。
The output of an ideal MR element is as described above, but in an actual element, changes in My do not occur only in the rotation mode, but rather cause domain splitting within the MR element, causing domain movement. often accompanied by In particular, as the track width of the MR element shown in FIG. 1 becomes smaller, changes in My due to movement of magnetic domains become more noticeable due to the relationship with magnetostatic energy. The movement of magnetic domains is called a Barkhausen jump (hereinafter abbreviated as B-jump). Accompanied by discontinuous changes in My.
When the above rotation mode and magnetic domain movement coexist,
Figure 3 shows the relationship between the output of the MR element and the input magnetic field. This Barkhausen jump becomes noise in the reproduced output and greatly deteriorates the S/N ratio of the MR head. Therefore, in order to obtain a good MR head, it is essential to suppress the B-jump of the element.

従来からこのB−jumpを抑制するためには、
MR素子の容易軸方向(ストライプ長手方向)に
数〔Oe〕の弱い磁界を加えることによつて、
MR素子を単磁区状態にすればよいことが知られ
ている。そして、この容易軸方向への磁界の印加
方法についてはヘツド外部のコイルによる印加
方法、ヘツド外部の永久磁石による印加方法、
MR素子と反強磁性薄膜との反強磁性結合によ
る印加方法等が従来提案されている。第4図は上
記の方法を用いたヘツド構造を示すものであ
る。同図で6はMR素子、7は反強磁性体薄膜、
8は導体部である。
Conventionally, in order to suppress this B-jump,
By applying a weak magnetic field of several [Oe] in the easy axis direction (stripe longitudinal direction) of the MR element,
It is known that it is sufficient to make the MR element into a single magnetic domain state. The method of applying the magnetic field in the easy axis direction includes a method using a coil outside the head, a method using a permanent magnet outside the head,
Application methods using antiferromagnetic coupling between an MR element and an antiferromagnetic thin film have been proposed. FIG. 4 shows a head structure using the above method. In the figure, 6 is an MR element, 7 is an antiferromagnetic thin film,
8 is a conductor portion.

しかし、上記、の方法では、ヘツド外部に
磁界印加手段を持つため、ヘツドのケーシング等
に於いて制約をうける上に、マルチトラツク・ヘ
ツドの場合、ヘツドケース内のヘツドの位置によ
り、印加磁界の大きさが変わること、及び第1図
のシールド型のMRヘツドの場合、印加磁界がシ
ールドの内部まで充分に侵入しないため使用不可
能なことなどの欠点を有する。の方法について
は、の欠点は解消されるものの、以下のよう
な欠点を有している。すなわち、反強磁性膜7が
MR素子6と結合することにより、MR素子の容
易軸方向に磁界は印加されるが、その反面MR素
子の磁気特性の劣化を招く。すなわち、反強磁性
膜7によつてMR素子膜の保磁力HCと異方性磁
界HRが増加する。これは、ヘツドの特性に好ま
しくない影響を与える。又、反強磁性膜7として
はFeMnの薄膜が用いられるが、このFeMn薄膜
は、導電体であり、その為リード8から流入する
電流はMR素子6のみならず反強磁性体7にも分
流し、その結果ヘツドとしての感度が低下してし
まう。
However, in the above method, since the magnetic field applying means is provided outside the head, there are restrictions on the casing of the head, and in the case of a multitrack head, the magnitude of the applied magnetic field depends on the position of the head inside the head case. In the case of the shield type MR head shown in FIG. 1, the applied magnetic field does not penetrate sufficiently into the shield, making it unusable. Although the method described above overcomes the disadvantages of , it still has the following disadvantages. That is, the antiferromagnetic film 7
By coupling with the MR element 6, a magnetic field is applied in the easy axis direction of the MR element, but on the other hand, this causes deterioration of the magnetic properties of the MR element. That is, the antiferromagnetic film 7 increases the coercive force H C and the anisotropic magnetic field H R of the MR element film. This has an undesirable effect on the properties of the head. Further, a FeMn thin film is used as the antiferromagnetic film 7, but this FeMn thin film is a conductor, so the current flowing from the lead 8 is distributed not only to the MR element 6 but also to the antiferromagnetic material 7. As a result, the sensitivity of the head decreases.

<目的> 本発明は以上の従来技術の欠点を解消する為に
なされたものでありMR素子のリードの下の部分
に保磁力の大きな強磁性体を形成し、上記強磁性
体とMR素子を強磁性結合することにより、MR
素子のストライプ長手方向に弱磁界を印加せしめ
ることによつてMR素子のバルクハウゼンジヤン
プを抑制し、良好なS/N比を有するMRヘツド
を実現することを目的とする。
<Purpose> The present invention has been made in order to eliminate the drawbacks of the above-mentioned conventional techniques. A ferromagnetic material with a large coercive force is formed under the leads of an MR element, and the ferromagnetic material and the MR element are combined. By ferromagnetic coupling, MR
The object of the present invention is to suppress the bulk house jump of an MR element by applying a weak magnetic field in the longitudinal direction of the stripe of the element, and to realize an MR head having a good S/N ratio.

<実施例> 以下、本発明に係るMRヘツドの一実施例につ
いて詳細に説明を行う。
<Example> Hereinafter, an example of the MR head according to the present invention will be described in detail.

第5図は本発明に係る薄膜MRヘツドの一実施
例の構造を示すものであり、同図aは平面図、同
図bは図面aのA−A′切断面での正面断面図、
同図cは側面断面図である。同図で9,17は磁
気シールドの役目をする高透磁率磁性薄膜(通
常、Ni−Znフエライト、Mn−Znフエライト、
センダスト、パーマロイが使用される。)、10,
12,16は層間絶縁材(SiO2,SiN,Al2O3
等)、11はバイアス用薄膜、13はMR素子
(Ni−Fe,Ni−Co等)、15はMR素子13のリ
ードの役目をする導体薄膜(Al,Cu,Au等)、
14は保磁力の大きな強磁性薄膜(Ni−Co,Ni
−Co−P,Co−P,Fe2O5等)で、MR素子13
と強磁性交換結合している。MR素子のような保
持力の小さな(1〜10〔Oe〕程度)膜と、例えば
Co−Pのような保持力の大きな(300〜3K〔Oe〕
程度)膜を積層すると2層境界の強磁性交換結合
により、複合膜の磁気特性は2層の膜の相互作用
により単に2層の膜特性の和にならず、異なつた
ものになる。この様子を第6図に示す。同図aは
MR素子用Ni−Fe単膜(膜厚約500Å)の磁化容
易軸方向のB−H特性であり、同図bは、メツキ
Co−P単膜(膜厚約800Å)のB−H特性であ
る。また、同図cは同図aのNi−Fe膜上に同図
bのメツキCo−P単膜を積層した複合膜の特性
である。同図cよりわかるとおり、強磁性交換結
合した適当な膜厚の二層複合膜においては二層の
膜の境界の交換相互作用により、二層の膜の磁化
方向は一致し、角形比及び保磁力は2つの膜の中
間的な値をとる。1例として500〔Å〕のNi−Fe
(80−20)の蒸着膜の上にCo−Pのメツキ膜の厚
みを変えて積層した場合の複合膜の保磁力を第7
図に示す。Co−Pの膜厚400Å以上で二層複合膜
は、保磁力の大きな複合膜のようにふるまつてい
ることがわかる。見方を変えれば、保磁力の小さ
な磁性膜(Ni−Fe膜)の磁化方向は、保磁力の
大きな磁性膜の(Co−P膜)の磁化方向に固定
されると考えることも可能である。
FIG. 5 shows the structure of an embodiment of the thin film MR head according to the present invention, in which FIG.
Figure c is a side sectional view. In the figure, 9 and 17 are high permeability magnetic thin films (usually Ni-Zn ferrite, Mn-Zn ferrite,
Sendust and permalloy are used. ), 10,
12 and 16 are interlayer insulating materials (SiO 2 , SiN, Al 2 O 3
), 11 is a bias thin film, 13 is an MR element (Ni-Fe, Ni-Co, etc.), 15 is a conductive thin film (Al, Cu, Au, etc.) that serves as a lead for the MR element 13,
14 is a ferromagnetic thin film with a large coercive force (Ni-Co, Ni
-Co-P, Co-P, Fe 2 O 5 , etc.), MR element 13
ferromagnetic exchange coupling. For example, when using a film with a small holding force (about 1 to 10 [Oe]) such as an MR element,
High holding power like Co-P (300~3K [Oe]
When films are stacked, the magnetic properties of the composite film are not simply the sum of the film properties of the two layers but are different due to the interaction of the two layers due to ferromagnetic exchange coupling at the boundary between the two layers. This situation is shown in FIG. Figure a is
This is the B-H characteristic in the direction of the easy axis of magnetization of a Ni-Fe single film (film thickness approximately 500 Å) for MR elements.
This is the B-H characteristic of a Co-P single film (film thickness approximately 800 Å). Figure c shows the characteristics of a composite film in which the single coated Co-P film shown in figure b is laminated on the Ni-Fe film shown in figure a. As can be seen from figure c, in a ferromagnetic exchange-coupled two-layer composite film of an appropriate thickness, the magnetization directions of the two films coincide due to the exchange interaction at the boundary between the two films, and the squareness ratio and The magnetic force takes an intermediate value between the two films. As an example, 500 [Å] Ni-Fe
The coercive force of the composite film when the Co-P plating film with different thickness is laminated on the vapor-deposited film of (80-20) is the seventh
As shown in the figure. It can be seen that the two-layer composite film of Co-P with a film thickness of 400 Å or more behaves like a composite film with a large coercive force. From a different perspective, it is also possible to consider that the magnetization direction of a magnetic film (Ni--Fe film) with a small coercive force is fixed to the magnetization direction of a magnetic film (Co--P film) with a large coercive force.

さて、第5図においてはリードの下のNR素子
が、上記強磁性交換結合した複合膜構造を有す
る。そのためリードの下のMR素子の磁化方向
を、第5図の強磁性体14の磁化方向に固定する
ことができる。第5図の強磁性体14の磁化方向
は、10KOe程度の外部磁界を印加して着磁する
ことにより制御することができる。従つて、第5
図においてMR素子のストライプ長手方向に、
10KOe程度の磁界を印加することにより、リー
ドの下のMR素子の磁化、及び強磁性膜14の磁
化の向きを、長手方向にそろえることができる。
この様子を、第8図に示す。但し同図では磁気シ
ールド及びバイアス用薄膜を省略している。同図
で18はMR素子、19は保磁力の大きな強磁性
膜、20はリードである。同図中の矢印Mは、磁
性膜各部の磁化の向きを示す。同図のMR素子1
8の実際に磁界を感ずる部分、すなわちリード2
0とリード20の間の部分は、MR素子18の両
端(すなわちリードの下のMR素子18及び強磁
性膜19)と直接結合し、その為MR素子18の
長手方向に磁界HXが印加される。このMR素子
18の長手方向の磁界HXによりMR素子は単磁
区状態におかれ、B−jumpを抑制することが可
能になる。又、この磁界HXの値は第7図に示す
様に強磁性膜の膜厚を制御することで、又残留磁
化の値を制御することで調節可能である。又、
MR素子18の信号磁界を感じる部分は通常の
MR素子と何等異ることがないため、MR特性の
劣化及びヘツドとしての感度の低下を招く恐れが
全くなく、この点において従来の反強磁性結合を
もちいた方法に比べ優れている。又、直接磁界
HXを印加する強磁性膜とMR素子が結合してい
るため、シールド中においても印加磁界が減衰す
る割合が少く、この点で外部のコイル、もしくは
外部の永久磁石により磁界を印加する方法に比べ
優れている。
Now, in FIG. 5, the NR element below the leads has the above-mentioned ferromagnetic exchange coupled composite film structure. Therefore, the magnetization direction of the MR element under the lead can be fixed to the magnetization direction of the ferromagnetic material 14 shown in FIG. The magnetization direction of the ferromagnetic material 14 shown in FIG. 5 can be controlled by applying an external magnetic field of about 10 KOe to magnetize it. Therefore, the fifth
In the figure, in the longitudinal direction of the stripe of the MR element,
By applying a magnetic field of about 10 KOe, the magnetization of the MR element under the leads and the magnetization of the ferromagnetic film 14 can be aligned in the longitudinal direction.
This situation is shown in FIG. However, the magnetic shield and bias thin film are omitted in this figure. In the figure, 18 is an MR element, 19 is a ferromagnetic film with a large coercive force, and 20 is a lead. Arrows M in the figure indicate the direction of magnetization of each part of the magnetic film. MR element 1 in the same figure
8, the part that actually feels the magnetic field, that is, lead 2
The portion between 0 and the lead 20 is directly coupled to both ends of the MR element 18 (that is, the MR element 18 and the ferromagnetic film 19 under the lead), and therefore a magnetic field HX is applied in the longitudinal direction of the MR element 18. Ru. The magnetic field HX in the longitudinal direction of the MR element 18 places the MR element in a single domain state, making it possible to suppress B-jump. Further, the value of this magnetic field HX can be adjusted by controlling the thickness of the ferromagnetic film and by controlling the value of residual magnetization, as shown in FIG. or,
The part of the MR element 18 that senses the signal magnetic field is the normal one.
Since it is no different from an MR element, there is no risk of deterioration of MR characteristics or reduction of sensitivity as a head, and in this respect it is superior to conventional methods using antiferromagnetic coupling. Also, direct magnetic field
Since the ferromagnetic film that applies H It's better than that.

次に以上説明した薄膜MRヘツド素子の作製方
法の1例について説明する。尚、シールド層9,
17、バイアス用薄膜11等の作製方法は、従来
技術と変らないため省略し、MR素子部のみ詳述
する。まず、基板下地に、Ni−Fe膜(MR)を
均一磁界中でスパンタ法又は蒸着法により200〜
1000〔Å〕の厚さに形成した後、フオトレジスト
を塗布し、マスク合わせをし、露光現像を行いス
トライプ状に加工する。その後、このレジスト層
をマスクとしてNi−Fe膜の露出した部分をエツ
チング除去する。この工程によりMR素子13が
形成される。次にNi−Fe膜13の上のレジスト
を除去した後、更に新たなレジストを塗布し、
MR素子13と導体部15と重なる部分のレジス
トを除去し、窓をあける。その後、基板をCo−
PもしくはNi−Co−Pの無電解メツキ液の中に
つけ、Co−P(又は、Ni−Co−P)の選択メツ
キを行い、約500Åから3000ÅのCo−P(又は、
Ni−Co−P)の薄膜14をMR素子13上に形
成する。この後、レジストを除去する。続いて、
Alを全面に蒸着し、Ni−Fe,Co−P等と選択性
を有するエツチング手段により、フオトエツチン
グを行い導体部15を形成することにより、MR
素子部が完成する。
Next, an example of a method for manufacturing the thin film MR head element described above will be described. In addition, the shield layer 9,
17. The method of manufacturing the bias thin film 11 and the like is the same as the conventional technique, so it will be omitted, and only the MR element portion will be described in detail. First, a Ni-Fe film (MR) is deposited on the base of the substrate by spuntering or vapor deposition in a uniform magnetic field.
After forming the film to a thickness of 1000 Å, photoresist is applied, masks are aligned, and exposure and development are performed to form stripes. Thereafter, using this resist layer as a mask, the exposed portion of the Ni--Fe film is removed by etching. Through this step, the MR element 13 is formed. Next, after removing the resist on the Ni-Fe film 13, a new resist is applied,
The resist in the portion overlapping the MR element 13 and the conductor portion 15 is removed to open a window. After that, the substrate is coated with Co-
Co-P or Ni-Co-P is immersed in an electroless plating solution for selective plating of Co-P (or Ni-Co-P).
A thin film 14 of Ni--Co--P is formed on the MR element 13. After this, the resist is removed. continue,
By depositing Al on the entire surface and photo-etching it using an etching means that is selective to Ni-Fe, Co-P, etc., the conductor part 15 is formed.
The element section is completed.

最後に、Co−P部14及びCo−Pの下のNi−
Fe膜の磁化をNi−Fe膜13の長手方向に固定す
るため、その方向に、10KOe程度の磁界を印加
して着磁する。
Finally, the Co-P section 14 and the Ni under the Co-P
In order to fix the magnetization of the Fe film in the longitudinal direction of the Ni-Fe film 13, a magnetic field of about 10 KOe is applied in that direction to magnetize it.

以上の工程により作成したMRヘツドの出力特
性の1例を第9図に示す。同図aは従来の構造の
MRヘツドの出力の実測値であり、同図bは本発
明に係る上記構造のものである。同図bによれば
B−jumpが完全に抑制されている。尚同図に示
した特性のMRヘツドのストライプ巾は、10
〔μ〕、トラツク巾は50〔μ〕、リードの巾は20〔μ〕
である。従来のMRヘツドの場合トラツクが狭
く、ストライプ巾が広い程、すなわちストライプ
の縦横比(アスペクト比と称す)が、小さい程磁
区分裂が激しくB−jumpが多発するが、本発明
の構造の場合、アスペクト比が小さい程、B−
jump抑制のためのストライプ長手方向の磁界
(HX)が強く印加されB−jumpを強力に押える
ことができる。従つて上記のMRヘツドのストラ
イプの寸法以外の広い形状範囲で、B−jumpの
抑制効果を確認することができた。
FIG. 9 shows an example of the output characteristics of the MR head created through the above steps. Figure a shows the conventional structure.
This is an actual measured value of the output of the MR head, and the figure b shows the above structure according to the present invention. According to figure b, the B-jump is completely suppressed. The stripe width of the MR head with the characteristics shown in the same figure is 10
[μ], track width is 50 [μ], lead width is 20 [μ]
It is. In conventional MR heads, the narrower the track and the wider the stripe width, that is, the smaller the aspect ratio of the stripe, the more severe the magnetic domain splitting becomes and the more B-jumps occur, but in the case of the structure of the present invention, The smaller the aspect ratio, the B-
A strong magnetic field (H x ) in the longitudinal direction of the stripe for suppressing the jump is applied, making it possible to strongly suppress the B-jump. Therefore, it was possible to confirm the effect of suppressing B-jump in a wide range of shapes other than the stripe size of the MR head described above.

以上の説明においては、リードとMR素子の間
に保磁力の大きな強磁性体を配置した場合につい
て、述べたが、第10図のようにMR素子21と
保磁力の大きな磁性体22をリード23に対して
逆転したような構造で同様の効果を生ぜしめるこ
とが可能である。又、シールド型MRヘツドにつ
いて詳細を説明してきたが、バーバーポール型
MRヘツドヨーク・タイプ型MRヘツド、ノンシ
ールド型MRヘツド、更に単なる強磁性膜の磁気
抵抗効果を利用した磁気センサーにも、本発明は
適用可能である。
In the above explanation, a case has been described in which a ferromagnetic material with a large coercive force is placed between the lead and the MR element, but as shown in FIG. It is possible to produce a similar effect with a structure that is reversed. Also, although we have explained the details of the shield type MR head, the barber pole type
The present invention is applicable to MR head yoke type MR heads, non-shielded MR heads, and even magnetic sensors that utilize the magnetoresistive effect of a simple ferromagnetic film.

<効果> 本発明のヘツド構造によれば、バルクハウゼ
ン・ジヤンプを抑制したS/N比の良好なMRヘ
ツドを実現できる。
<Effects> According to the head structure of the present invention, an MR head with a good S/N ratio that suppresses the Barkhausen jump can be realized.

【図面の簡単な説明】[Brief explanation of drawings]

第1図は従来の薄膜MRヘツドの斜視図、第2
図は理想的なMRヘツドの応答特性グラフ図、第
3図は現実のヘツドにおけるB−jumpの発生し
たMRヘツドの応答特性グラフ図、第4図は従来
の反強磁性結合を利用してB−jumpを抑制した
ヘツド構造の斜視図、第5図は本発明に係るヘツ
ド構造の一実施例の構造説明図、第6図は強磁性
交換結合をした複合膜のB−H特性図、第7図は
強磁性交換結合した複合膜の保磁力のグラフ図、
第8図は本発明に係るB−jump抑制機構説明の
ための概念図、第9図はMRヘツドの特性グラフ
図、第10図は本発明の他の実施例の斜視図であ
る。 図中、1:磁気シールド用高透磁率磁性体、
2:バイアス用薄膜、3:MR素子、4:導体
部、5:磁気シールド用高透磁率磁性体、6:
MR素子、7:反強磁性体薄膜、8:導体部、
9:磁気シールド用高透磁率磁性体、10:絶縁
膜、11:バイアス用薄膜、12:絶縁膜、1
3:MR素子、14:保磁力の大きな強磁性薄
膜、15:導体部、16:絶縁膜、17:磁気シ
ールド用高透磁率磁性体、18:MR素子、1
9:保磁力の大きな強磁性薄膜、20:導体部、
21:MR素子、22:保磁力の大きな強磁性薄
膜、23:導体部。
Figure 1 is a perspective view of a conventional thin film MR head, Figure 2 is a perspective view of a conventional thin film MR head.
The figure is a response characteristic graph of an ideal MR head, Figure 3 is a response characteristic graph of an MR head in which a B-jump occurs in an actual head, and Figure 4 is a 5 is a structural explanatory diagram of an embodiment of the head structure according to the present invention. FIG. 6 is a B-H characteristic diagram of a composite film with ferromagnetic exchange coupling. Figure 7 is a graph of the coercive force of a ferromagnetic exchange-coupled composite film.
FIG. 8 is a conceptual diagram for explaining the B-jump suppressing mechanism according to the present invention, FIG. 9 is a characteristic graph of the MR head, and FIG. 10 is a perspective view of another embodiment of the present invention. In the figure, 1: High permeability magnetic material for magnetic shielding,
2: thin film for bias, 3: MR element, 4: conductor part, 5: high magnetic permeability magnetic material for magnetic shielding, 6:
MR element, 7: antiferromagnetic thin film, 8: conductor part,
9: High permeability magnetic material for magnetic shielding, 10: Insulating film, 11: Thin film for bias, 12: Insulating film, 1
3: MR element, 14: ferromagnetic thin film with large coercive force, 15: conductor part, 16: insulating film, 17: high magnetic permeability magnetic material for magnetic shielding, 18: MR element, 1
9: ferromagnetic thin film with large coercive force, 20: conductor part,
21: MR element, 22: ferromagnetic thin film with large coercive force, 23: conductor part.

Claims (1)

【特許請求の範囲】 1 一軸異方性を有する金属強磁性薄膜の磁化困
難軸方向に印加される信号磁界の変化を電気抵抗
変化として検出する薄膜磁気ヘツドにおいて、 リード導体部と前記金属強磁性薄膜との重なり
部分に前記金属強磁性薄膜に比して充分保磁力の
大なる強磁性膜を設け、 前記金属強磁性薄膜と前記保磁力の大なる強磁
性膜とを強磁性交換結合せしめたことを特徴とす
る薄膜磁気ヘツド。
[Scope of Claims] 1. A thin film magnetic head that detects a change in a signal magnetic field applied in the direction of the hard axis of magnetization of a metal ferromagnetic thin film having uniaxial anisotropy as a change in electrical resistance, comprising: a lead conductor portion and the metal ferromagnetic film; A ferromagnetic film having a sufficiently larger coercive force than the metal ferromagnetic thin film is provided in the overlapped portion with the thin film, and the metal ferromagnetic thin film and the ferromagnetic film having a larger coercive force are ferromagnetic exchange coupled. A thin film magnetic head characterized by:
JP16731283A 1983-09-09 1983-09-09 Thin film magnetic head Granted JPS6059518A (en)

Priority Applications (4)

Application Number Priority Date Filing Date Title
JP16731283A JPS6059518A (en) 1983-09-09 1983-09-09 Thin film magnetic head
US06/577,389 US4639806A (en) 1983-09-09 1984-02-06 Thin film magnetic head having a magnetized ferromagnetic film on the MR element
DE3404273A DE3404273C2 (en) 1983-09-09 1984-02-08 Thin film magnetic head
GB08403588A GB2146482B (en) 1983-09-09 1984-02-10 Thin film magnetic head

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP16731283A JPS6059518A (en) 1983-09-09 1983-09-09 Thin film magnetic head

Publications (2)

Publication Number Publication Date
JPS6059518A JPS6059518A (en) 1985-04-05
JPH048848B2 true JPH048848B2 (en) 1992-02-18

Family

ID=15847411

Family Applications (1)

Application Number Title Priority Date Filing Date
JP16731283A Granted JPS6059518A (en) 1983-09-09 1983-09-09 Thin film magnetic head

Country Status (1)

Country Link
JP (1) JPS6059518A (en)

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4841398A (en) * 1987-02-17 1989-06-20 Magnetic Peripherals Inc. Non linear magnetoresistive sensor
JP2617185B2 (en) * 1987-06-22 1997-06-04 シャープ株式会社 Thin film magnetic head
US5808843A (en) * 1991-05-31 1998-09-15 Hitachi, Ltd. Magnetoresistance effect reproduction head
JP2857286B2 (en) * 1991-09-27 1999-02-17 シャープ株式会社 Magnetoresistive thin film magnetic head
JPH05266434A (en) * 1992-03-24 1993-10-15 Hitachi Ltd Magnetoresistive effect reproducing head
US5442507A (en) * 1993-09-24 1995-08-15 Matsushita Electric Industrial Co., Ltd. Magnetoresistive magnetic head
US5896251A (en) * 1994-12-26 1999-04-20 Kabushiki Kaisha Toshiba Magnetoresistance effect head with conductor film pair and magnetic field proving film pair disposed between substrate and magnetoresistance effect film
JP4873379B2 (en) * 2008-03-31 2012-02-08 Tdk株式会社 Manufacturing method of multilayer ceramic electronic component

Also Published As

Publication number Publication date
JPS6059518A (en) 1985-04-05

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