JPH051048B2 - - Google Patents
Info
- Publication number
- JPH051048B2 JPH051048B2 JP22897684A JP22897684A JPH051048B2 JP H051048 B2 JPH051048 B2 JP H051048B2 JP 22897684 A JP22897684 A JP 22897684A JP 22897684 A JP22897684 A JP 22897684A JP H051048 B2 JPH051048 B2 JP H051048B2
- Authority
- JP
- Japan
- Prior art keywords
- polymer
- porous
- membrane
- fine particles
- inorganic fine
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
- 239000012528 membrane Substances 0.000 claims description 38
- 239000012510 hollow fiber Substances 0.000 claims description 18
- 239000011248 coating agent Substances 0.000 claims description 16
- 238000000576 coating method Methods 0.000 claims description 16
- 239000000178 monomer Substances 0.000 claims description 16
- 238000000034 method Methods 0.000 claims description 13
- 238000000926 separation method Methods 0.000 claims description 13
- 239000002131 composite material Substances 0.000 claims description 7
- 239000007788 liquid Substances 0.000 claims description 4
- 238000004519 manufacturing process Methods 0.000 claims description 4
- 230000000379 polymerizing effect Effects 0.000 claims 1
- 229920000642 polymer Polymers 0.000 description 32
- 239000010419 fine particle Substances 0.000 description 22
- 239000007789 gas Substances 0.000 description 18
- 239000010408 film Substances 0.000 description 15
- -1 polyxylene oxide Polymers 0.000 description 15
- 239000000243 solution Substances 0.000 description 13
- 239000000203 mixture Substances 0.000 description 11
- 229920005597 polymer membrane Polymers 0.000 description 9
- 239000011148 porous material Substances 0.000 description 9
- 229920005989 resin Polymers 0.000 description 8
- 239000011347 resin Substances 0.000 description 8
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 6
- 239000001257 hydrogen Substances 0.000 description 6
- 229910052739 hydrogen Inorganic materials 0.000 description 6
- VLKZOEOYAKHREP-UHFFFAOYSA-N n-Hexane Chemical compound CCCCCC VLKZOEOYAKHREP-UHFFFAOYSA-N 0.000 description 6
- 230000015572 biosynthetic process Effects 0.000 description 5
- 229920001577 copolymer Polymers 0.000 description 5
- 239000010410 layer Substances 0.000 description 5
- 239000000463 material Substances 0.000 description 5
- 238000000465 moulding Methods 0.000 description 5
- 239000002245 particle Substances 0.000 description 5
- 238000009987 spinning Methods 0.000 description 5
- YCKRFDGAMUMZLT-UHFFFAOYSA-N Fluorine atom Chemical compound [F] YCKRFDGAMUMZLT-UHFFFAOYSA-N 0.000 description 4
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 4
- HSFWRNGVRCDJHI-UHFFFAOYSA-N alpha-acetylene Chemical class C#C HSFWRNGVRCDJHI-UHFFFAOYSA-N 0.000 description 4
- 230000007547 defect Effects 0.000 description 4
- 229910052731 fluorine Inorganic materials 0.000 description 4
- 239000011737 fluorine Substances 0.000 description 4
- 239000012535 impurity Substances 0.000 description 4
- 229920001197 polyacetylene Chemical class 0.000 description 4
- 238000006116 polymerization reaction Methods 0.000 description 4
- 239000011550 stock solution Substances 0.000 description 4
- 239000000126 substance Substances 0.000 description 4
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 3
- MQIUGAXCHLFZKX-UHFFFAOYSA-N Di-n-octyl phthalate Natural products CCCCCCCCOC(=O)C1=CC=CC=C1C(=O)OCCCCCCCC MQIUGAXCHLFZKX-UHFFFAOYSA-N 0.000 description 3
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 3
- BJQHLKABXJIVAM-UHFFFAOYSA-N bis(2-ethylhexyl) phthalate Chemical compound CCCCC(CC)COC(=O)C1=CC=CC=C1C(=O)OCC(CC)CCCC BJQHLKABXJIVAM-UHFFFAOYSA-N 0.000 description 3
- 239000011247 coating layer Substances 0.000 description 3
- 229910001873 dinitrogen Inorganic materials 0.000 description 3
- 239000000428 dust Substances 0.000 description 3
- 230000000694 effects Effects 0.000 description 3
- 238000002156 mixing Methods 0.000 description 3
- 230000035699 permeability Effects 0.000 description 3
- 229920005672 polyolefin resin Polymers 0.000 description 3
- 238000003786 synthesis reaction Methods 0.000 description 3
- 239000010409 thin film Substances 0.000 description 3
- MYRTYDVEIRVNKP-UHFFFAOYSA-N 1,2-Divinylbenzene Chemical compound C=CC1=CC=CC=C1C=C MYRTYDVEIRVNKP-UHFFFAOYSA-N 0.000 description 2
- VXNZUUAINFGPBY-UHFFFAOYSA-N 1-Butene Chemical compound CCC=C VXNZUUAINFGPBY-UHFFFAOYSA-N 0.000 description 2
- QGZKDVFQNNGYKY-UHFFFAOYSA-N Ammonia Chemical compound N QGZKDVFQNNGYKY-UHFFFAOYSA-N 0.000 description 2
- VTYYLEPIZMXCLO-UHFFFAOYSA-L Calcium carbonate Chemical compound [Ca+2].[O-]C([O-])=O VTYYLEPIZMXCLO-UHFFFAOYSA-L 0.000 description 2
- UGFAIRIUMAVXCW-UHFFFAOYSA-N Carbon monoxide Chemical compound [O+]#[C-] UGFAIRIUMAVXCW-UHFFFAOYSA-N 0.000 description 2
- BAPJBEWLBFYGME-UHFFFAOYSA-N Methyl acrylate Chemical compound COC(=O)C=C BAPJBEWLBFYGME-UHFFFAOYSA-N 0.000 description 2
- 239000004698 Polyethylene Substances 0.000 description 2
- TZCXTZWJZNENPQ-UHFFFAOYSA-L barium sulfate Chemical compound [Ba+2].[O-]S([O-])(=O)=O TZCXTZWJZNENPQ-UHFFFAOYSA-L 0.000 description 2
- 229910002091 carbon monoxide Inorganic materials 0.000 description 2
- 239000003054 catalyst Substances 0.000 description 2
- 229920002301 cellulose acetate Polymers 0.000 description 2
- 125000001309 chloro group Chemical group Cl* 0.000 description 2
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 2
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 2
- 239000012299 nitrogen atmosphere Substances 0.000 description 2
- 229920000573 polyethylene Polymers 0.000 description 2
- 229920000139 polyethylene terephthalate Polymers 0.000 description 2
- 239000005020 polyethylene terephthalate Substances 0.000 description 2
- 229920001296 polysiloxane Polymers 0.000 description 2
- 125000001436 propyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])[H] 0.000 description 2
- 238000010926 purge Methods 0.000 description 2
- 238000011084 recovery Methods 0.000 description 2
- 229910052814 silicon oxide Inorganic materials 0.000 description 2
- 239000002904 solvent Substances 0.000 description 2
- 229920005992 thermoplastic resin Polymers 0.000 description 2
- 125000000026 trimethylsilyl group Chemical group [H]C([H])([H])[Si]([*])(C([H])([H])[H])C([H])([H])[H] 0.000 description 2
- UOCLXMDMGBRAIB-UHFFFAOYSA-N 1,1,1-trichloroethane Chemical compound CC(Cl)(Cl)Cl UOCLXMDMGBRAIB-UHFFFAOYSA-N 0.000 description 1
- MIZLGWKEZAPEFJ-UHFFFAOYSA-N 1,1,2-trifluoroethene Chemical group FC=C(F)F MIZLGWKEZAPEFJ-UHFFFAOYSA-N 0.000 description 1
- BQCIDUSAKPWEOX-UHFFFAOYSA-N 1,1-Difluoroethene Chemical compound FC(F)=C BQCIDUSAKPWEOX-UHFFFAOYSA-N 0.000 description 1
- FJVWTSXPGJBZNE-UHFFFAOYSA-N 2,2-diphenylethyl(dimethyl)silane Chemical compound C[SiH](CC(C1=CC=CC=C1)C1=CC=CC=C1)C FJVWTSXPGJBZNE-UHFFFAOYSA-N 0.000 description 1
- OEPOKWHJYJXUGD-UHFFFAOYSA-N 2-(3-phenylmethoxyphenyl)-1,3-thiazole-4-carbaldehyde Chemical compound O=CC1=CSC(C=2C=C(OCC=3C=CC=CC=3)C=CC=2)=N1 OEPOKWHJYJXUGD-UHFFFAOYSA-N 0.000 description 1
- NIXOWILDQLNWCW-UHFFFAOYSA-M Acrylate Chemical class [O-]C(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-M 0.000 description 1
- 229910002012 Aerosil® Inorganic materials 0.000 description 1
- 239000005995 Aluminium silicate Substances 0.000 description 1
- WKBOTKDWSSQWDR-UHFFFAOYSA-N Bromine atom Chemical compound [Br] WKBOTKDWSSQWDR-UHFFFAOYSA-N 0.000 description 1
- 239000004709 Chlorinated polyethylene Substances 0.000 description 1
- 239000004593 Epoxy Substances 0.000 description 1
- 239000005909 Kieselgur Substances 0.000 description 1
- CERQOIWHTDAKMF-UHFFFAOYSA-M Methacrylate Chemical compound CC(=C)C([O-])=O CERQOIWHTDAKMF-UHFFFAOYSA-M 0.000 description 1
- VVQNEPGJFQJSBK-UHFFFAOYSA-N Methyl methacrylate Chemical compound COC(=O)C(C)=C VVQNEPGJFQJSBK-UHFFFAOYSA-N 0.000 description 1
- 229920000571 Nylon 11 Polymers 0.000 description 1
- 229920001007 Nylon 4 Polymers 0.000 description 1
- 229920002292 Nylon 6 Polymers 0.000 description 1
- 229920002302 Nylon 6,6 Polymers 0.000 description 1
- 239000002033 PVDF binder Chemical class 0.000 description 1
- 229920002319 Poly(methyl acrylate) Polymers 0.000 description 1
- 229930182556 Polyacetal Natural products 0.000 description 1
- 239000004952 Polyamide Substances 0.000 description 1
- 239000004962 Polyamide-imide Substances 0.000 description 1
- 239000004693 Polybenzimidazole Substances 0.000 description 1
- 239000004695 Polyether sulfone Substances 0.000 description 1
- 239000004642 Polyimide Substances 0.000 description 1
- 239000004721 Polyphenylene oxide Substances 0.000 description 1
- 239000004743 Polypropylene Substances 0.000 description 1
- 239000004793 Polystyrene Substances 0.000 description 1
- 239000004372 Polyvinyl alcohol Substances 0.000 description 1
- 229910006069 SO3H Inorganic materials 0.000 description 1
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 description 1
- BZHJMEDXRYGGRV-UHFFFAOYSA-N Vinyl chloride Chemical compound ClC=C BZHJMEDXRYGGRV-UHFFFAOYSA-N 0.000 description 1
- YKTSYUJCYHOUJP-UHFFFAOYSA-N [O--].[Al+3].[Al+3].[O-][Si]([O-])([O-])[O-] Chemical compound [O--].[Al+3].[Al+3].[O-][Si]([O-])([O-])[O-] YKTSYUJCYHOUJP-UHFFFAOYSA-N 0.000 description 1
- 150000001242 acetic acid derivatives Chemical class 0.000 description 1
- 125000002252 acyl group Chemical group 0.000 description 1
- 125000003545 alkoxy group Chemical group 0.000 description 1
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 1
- 235000012211 aluminium silicate Nutrition 0.000 description 1
- 125000003368 amide group Chemical group 0.000 description 1
- 150000001412 amines Chemical class 0.000 description 1
- 229910021529 ammonia Inorganic materials 0.000 description 1
- 239000007864 aqueous solution Substances 0.000 description 1
- 239000010425 asbestos Substances 0.000 description 1
- GDTBXPJZTBHREO-UHFFFAOYSA-N bromine Substances BrBr GDTBXPJZTBHREO-UHFFFAOYSA-N 0.000 description 1
- 229910052794 bromium Inorganic materials 0.000 description 1
- CQEYYJKEWSMYFG-UHFFFAOYSA-N butyl acrylate Chemical compound CCCCOC(=O)C=C CQEYYJKEWSMYFG-UHFFFAOYSA-N 0.000 description 1
- 229910000019 calcium carbonate Inorganic materials 0.000 description 1
- 239000000378 calcium silicate Substances 0.000 description 1
- 229910052918 calcium silicate Inorganic materials 0.000 description 1
- OYACROKNLOSFPA-UHFFFAOYSA-N calcium;dioxido(oxo)silane Chemical compound [Ca+2].[O-][Si]([O-])=O OYACROKNLOSFPA-UHFFFAOYSA-N 0.000 description 1
- 239000006229 carbon black Substances 0.000 description 1
- 125000003178 carboxy group Chemical group [H]OC(*)=O 0.000 description 1
- 229920006217 cellulose acetate butyrate Polymers 0.000 description 1
- 239000000919 ceramic Substances 0.000 description 1
- 239000000460 chlorine Substances 0.000 description 1
- 229910052801 chlorine Inorganic materials 0.000 description 1
- 239000004927 clay Substances 0.000 description 1
- 229910052570 clay Inorganic materials 0.000 description 1
- 238000004140 cleaning Methods 0.000 description 1
- 230000003749 cleanliness Effects 0.000 description 1
- 238000005056 compaction Methods 0.000 description 1
- 239000000470 constituent Substances 0.000 description 1
- 238000011109 contamination Methods 0.000 description 1
- 238000004132 cross linking Methods 0.000 description 1
- ZDVLZNOBDJHOOW-UHFFFAOYSA-N dimethyl(2-phenylethynyl)silicon Chemical compound C[Si](C)C#CC1=CC=CC=C1 ZDVLZNOBDJHOOW-UHFFFAOYSA-N 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 125000002573 ethenylidene group Chemical group [*]=C=C([H])[H] 0.000 description 1
- 229920000840 ethylene tetrafluoroethylene copolymer Polymers 0.000 description 1
- 238000001704 evaporation Methods 0.000 description 1
- 230000008020 evaporation Effects 0.000 description 1
- 239000004744 fabric Substances 0.000 description 1
- 238000001914 filtration Methods 0.000 description 1
- XUCNUKMRBVNAPB-UHFFFAOYSA-N fluoroethene Chemical compound FC=C XUCNUKMRBVNAPB-UHFFFAOYSA-N 0.000 description 1
- NBVXSUQYWXRMNV-UHFFFAOYSA-N fluoromethane Chemical compound FC NBVXSUQYWXRMNV-UHFFFAOYSA-N 0.000 description 1
- 230000004907 flux Effects 0.000 description 1
- 125000000524 functional group Chemical group 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 229910052736 halogen Inorganic materials 0.000 description 1
- 125000005843 halogen group Chemical group 0.000 description 1
- 150000002367 halogens Chemical class 0.000 description 1
- 229920001903 high density polyethylene Polymers 0.000 description 1
- 239000004700 high-density polyethylene Substances 0.000 description 1
- 125000002887 hydroxy group Chemical group [H]O* 0.000 description 1
- 239000003999 initiator Substances 0.000 description 1
- 229910010272 inorganic material Inorganic materials 0.000 description 1
- 239000011147 inorganic material Substances 0.000 description 1
- 239000010954 inorganic particle Substances 0.000 description 1
- NLYAJNPCOHFWQQ-UHFFFAOYSA-N kaolin Chemical compound O.O.O=[Al]O[Si](=O)O[Si](=O)O[Al]=O NLYAJNPCOHFWQQ-UHFFFAOYSA-N 0.000 description 1
- 229920001684 low density polyethylene Polymers 0.000 description 1
- 239000004702 low-density polyethylene Substances 0.000 description 1
- ZLNQQNXFFQJAID-UHFFFAOYSA-L magnesium carbonate Chemical compound [Mg+2].[O-]C([O-])=O ZLNQQNXFFQJAID-UHFFFAOYSA-L 0.000 description 1
- 239000001095 magnesium carbonate Substances 0.000 description 1
- 229910000021 magnesium carbonate Inorganic materials 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 150000002739 metals Chemical class 0.000 description 1
- 239000010445 mica Substances 0.000 description 1
- 229910052618 mica group Inorganic materials 0.000 description 1
- GKTNLYAAZKKMTQ-UHFFFAOYSA-N n-[bis(dimethylamino)phosphinimyl]-n-methylmethanamine Chemical group CN(C)P(=N)(N(C)C)N(C)C GKTNLYAAZKKMTQ-UHFFFAOYSA-N 0.000 description 1
- 239000003921 oil Substances 0.000 description 1
- TWNQGVIAIRXVLR-UHFFFAOYSA-N oxo(oxoalumanyloxy)alumane Chemical compound O=[Al]O[Al]=O TWNQGVIAIRXVLR-UHFFFAOYSA-N 0.000 description 1
- 229920013653 perfluoroalkoxyethylene Polymers 0.000 description 1
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 description 1
- 239000004014 plasticizer Substances 0.000 description 1
- 229920003229 poly(methyl methacrylate) Polymers 0.000 description 1
- 229920002492 poly(sulfone) Polymers 0.000 description 1
- 229920002239 polyacrylonitrile Polymers 0.000 description 1
- 229920002647 polyamide Polymers 0.000 description 1
- 229920006122 polyamide resin Polymers 0.000 description 1
- 229920002312 polyamide-imide Polymers 0.000 description 1
- 229920002480 polybenzimidazole Polymers 0.000 description 1
- 229920001707 polybutylene terephthalate Polymers 0.000 description 1
- 239000004417 polycarbonate Substances 0.000 description 1
- 229920000515 polycarbonate Polymers 0.000 description 1
- 229920001225 polyester resin Polymers 0.000 description 1
- 239000004645 polyester resin Substances 0.000 description 1
- 229920006393 polyether sulfone Polymers 0.000 description 1
- 229920013716 polyethylene resin Polymers 0.000 description 1
- 229920001721 polyimide Polymers 0.000 description 1
- 229920006254 polymer film Polymers 0.000 description 1
- 239000002861 polymer material Substances 0.000 description 1
- 239000002685 polymerization catalyst Substances 0.000 description 1
- 239000004926 polymethyl methacrylate Substances 0.000 description 1
- 229920006324 polyoxymethylene Polymers 0.000 description 1
- 229920006380 polyphenylene oxide Polymers 0.000 description 1
- 229920001155 polypropylene Polymers 0.000 description 1
- 229920002223 polystyrene Polymers 0.000 description 1
- 229920005990 polystyrene resin Polymers 0.000 description 1
- 229920001021 polysulfide Chemical class 0.000 description 1
- 239000005077 polysulfide Chemical class 0.000 description 1
- 150000008117 polysulfides Chemical class 0.000 description 1
- 229920001343 polytetrafluoroethylene Chemical class 0.000 description 1
- 239000004810 polytetrafluoroethylene Chemical class 0.000 description 1
- 229920002635 polyurethane Polymers 0.000 description 1
- 239000004814 polyurethane Substances 0.000 description 1
- 229920002689 polyvinyl acetate Polymers 0.000 description 1
- 239000011118 polyvinyl acetate Substances 0.000 description 1
- 229920002451 polyvinyl alcohol Polymers 0.000 description 1
- 239000004800 polyvinyl chloride Substances 0.000 description 1
- 229920000915 polyvinyl chloride Polymers 0.000 description 1
- 229920001290 polyvinyl ester Polymers 0.000 description 1
- 229920002620 polyvinyl fluoride Chemical class 0.000 description 1
- 229920002981 polyvinylidene fluoride Chemical class 0.000 description 1
- 229920002717 polyvinylpyridine Polymers 0.000 description 1
- 238000000746 purification Methods 0.000 description 1
- 238000007670 refining Methods 0.000 description 1
- 229910052895 riebeckite Inorganic materials 0.000 description 1
- 229920002631 room-temperature vulcanizate silicone Polymers 0.000 description 1
- RMAQACBXLXPBSY-UHFFFAOYSA-N silicic acid Chemical compound O[Si](O)(O)O RMAQACBXLXPBSY-UHFFFAOYSA-N 0.000 description 1
- 235000012239 silicon dioxide Nutrition 0.000 description 1
- 125000001424 substituent group Chemical group 0.000 description 1
- 125000001174 sulfone group Chemical group 0.000 description 1
- 230000009182 swimming Effects 0.000 description 1
- 239000000454 talc Substances 0.000 description 1
- 229910052623 talc Inorganic materials 0.000 description 1
- BFKJFAAPBSQJPD-UHFFFAOYSA-N tetrafluoroethene Chemical group FC(F)=C(F)F BFKJFAAPBSQJPD-UHFFFAOYSA-N 0.000 description 1
- OGIDPMRJRNCKJF-UHFFFAOYSA-N titanium oxide Inorganic materials [Ti]=O OGIDPMRJRNCKJF-UHFFFAOYSA-N 0.000 description 1
- UDYJJCZCPMQSQG-UHFFFAOYSA-N trimethyl(prop-1-enyl)silane Chemical group CC=C[Si](C)(C)C UDYJJCZCPMQSQG-UHFFFAOYSA-N 0.000 description 1
- AOXOMZYRICNLQZ-UHFFFAOYSA-N trimethyl-[2-[2-(2-trimethylsilylethynyl)phenyl]ethynyl]silane Chemical compound C[Si](C)(C)C#CC1=CC=CC=C1C#C[Si](C)(C)C AOXOMZYRICNLQZ-UHFFFAOYSA-N 0.000 description 1
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 description 1
- 229920002554 vinyl polymer Polymers 0.000 description 1
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D69/00—Semi-permeable membranes for separation processes or apparatus characterised by their form, structure or properties; Manufacturing processes specially adapted therefor
- B01D69/08—Hollow fibre membranes
Landscapes
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Separation Using Semi-Permeable Membranes (AREA)
Description
〔産業上の利用分野〕
本発明は、気体混合物から少なくとも一種類の
気体を分離するための気体分離用複合膜の製造方
法に関するものである。
〔従来の技術〕
混合気体から特定の成分気体を分離することは
工業上重要な操作である。例えば、石油精製業界
での水泳プラントで発生するパージガスからの水
素回収、リフオーマーで発生する水素と一酸化炭
素の混合気体からの水素の分離精製、アンモニア
合成プラント、メタノール合成プラント等のパー
ジガスの水素回収、オキソ合成ガス中の水素と一
酸化炭素のモル比調節等における水素の分離等で
ある。
最近、これらの気体分離に高分子膜を用いるこ
とが試みらるようになつて来た。もしうまく行く
ならば、取扱が簡単で、省エネルギー的な工業的
価値の高い方法だからである。
高分子膜の気体分離への応用については、均質
膜、多孔膜、複合膜等種々の膜について研究が行
われているが、気体分離膜としての提案は次の二
つに大別される。その一つは所望の分離係数を有
する高分子を適当な多孔性支持膜上に極薄膜とし
て形成させるものである。実用上有益な程度に気
体の透過速度を大きくするためには、極薄膜は
1μm以下、望ましくは0.5μm以下の膜厚にしなけ
ればならない。このような極薄膜をピンホール等
の欠陥なく均一に多孔性支持体上に強固に接着し
て形成させるためには、原液の高精度な清浄化、
作業場へのクリーンベンチを用いた高度な清浄化
システムの導入、振動防止対策等を採用したとし
ても、潜在的欠点は埋めることが出来ず、コーテ
イングで2〜3層に欠陥のない膜を形成させるこ
とは至難であり、製造工程も複雑で、コストも高
くつくことを免れず工業的実施には向かないと思
われる。
もう一つの方法は、例えば、特開昭53−86684
号公報に開示されている方法である。この方法
は、或る気体に対して高い分離係数を有する高分
子を用いて該高分子の緻密均質の極薄膜と同程度
の気体透過速度を有するような多孔膜を形成し、
該多孔膜の少なくとも片表面微細孔を分離係数は
低いけれども、気体透過度のより大きい他の高分
子で閉塞させるようにコーテイングすると云うも
のである。
〔発明が解決しようとする問題点〕
しかし、多孔膜中空糸紡糸に用いられる高分子
溶液中には、ゴミ、触媒等多くの不純物を含んで
おり、これらの不純物は紡糸前にフイルターによ
り除去しなければならないが、0.1μm以下のゴミ
を濾去することは、濾過すべき原液量が多量であ
り、濾布の目詰まりにより濾過圧力が上昇するの
で不可能に近い。従つて、不純物を含んだ原液を
紡糸して得られる多孔膜が多くの欠陥を持つこと
は避けられない。それ故膜上にできた欠陥をカバ
ーするために、シリコーン等による膜上コーテイ
ングは不可欠なものである。しかし、この方法で
は、中空糸上のスキン層の厚みを薄く安定に無欠
陥に製造するには適しておらず、又、コーテイン
グ膜製膜は工程が複雑で、操作も難しいと云う難
点を有するものである。
本発明者らは、これらの難点を乗り越えるべく
鋭意努力した結果、本発明をなすに至つた。
〔問題点を解決するための手段〕
即ち、本発明は、支持体多孔性中空糸の片側表
面にモノマー又はモノマー溶液をコーテイングし
て、コーテイング液を支持体多孔膜中に保持さ
せ、次いでモノマーを重合させることを特徴とす
る気体分離用複合膜の製膜方法に関するものであ
る。
以下に本発明を詳細に説明する。
本発明における支持体多孔性中空糸は、走査型
電子顕微鏡により観察される平均孔径が0.5μm以
下、好ましくは0.1μm以下で、かつ、好ましくは
分画分子量1000以上で、空孔率10〜80%のもので
あれば何れも用いられる。
膜の孔径が0.5μmを超える支持体中空糸は、一
般に耐圧力性が弱くなり、かつ、コーテイングの
際、コーテイング溶液中に含まれる多数のゴミの
0.5μm以下のものを取り込むために、無欠陥のコ
ーテイング膜をつくり難いので好ましくない。
又、分画分子量1000未満のものは、支持体膜の透
過抵抗が大きく、得られる複合膜の透過性が小さ
くなり好ましくない。
支持体多孔性中空糸の材質は、上記の条件を満
足するものなら何でも良いが、一般的には高分
子、無機材料、例えば、アルミナ、ガラス、その
他金属、セラミツクス焼結多孔体が含まれる。中
でも高分子材料が好ましい。
多孔膜素材としては、高分子素材が一般的に知
られており、その好ましいものとしては、ポリス
ルホン、ポリエーテルスルホン、ポリアクリロニ
トリル、ポリスチレン、ポリメチルメタアクリレ
ート、ポリメチルアクリレート、塩化ビニル、塩
化ビニリデン、塩素化ポリエチレン、ポリカーボ
ネート、酢酸セルロース、セルロースアセテート
ブチレート等の酢酸セルロースエステル、ナイロ
ン6、ナイロン66、ナイロン4、ナイロン11等の
ポリアミド、ポリベンズイミダゾール等ポリイミ
ド、ポリアミドイミド、ポリアセタール、ポリフ
エニレンオキシド、ポリキシレンオキシド、ポリ
ウレタン、ポリエチレンテレフタレート、ポリア
ルキルメタクリレート、ポリアルキルアクリレー
ト、ポリフエニレンテレフタレート、ポリスルフ
イド、ポリフツ化ビニル、ポリフツ化ビニリデ
ン、ポリ三、又は四フツ化エチレン等のフツ素系
ポリマー、ポリスルフイド、ポリフオスフアゼ
ン、ポリビニルアルコール、ポリビニルエステ
ル、ポリ酢酸ビニル、ポリプロピオンビニル、ポ
リビニルピリジン、ポリカルボジイミド、ポリア
セチレン、ポリトリメチルシリルプロピレン等の
トリメチルシリル基を持つポリアセチレン誘導
体、次の化学式
[Industrial Application Field] The present invention relates to a method for producing a gas separation composite membrane for separating at least one type of gas from a gas mixture. [Prior Art] Separating specific component gases from a gas mixture is an industrially important operation. For example, hydrogen recovery from purge gas generated in swimming plants in the oil refining industry, separation and purification of hydrogen from a mixture of hydrogen and carbon monoxide generated in reformers, hydrogen recovery from purge gas in ammonia synthesis plants, methanol synthesis plants, etc. , separation of hydrogen in adjusting the molar ratio of hydrogen and carbon monoxide in oxo synthesis gas, etc. Recently, attempts have been made to use polymer membranes for these gas separations. If successful, this is because it is an easy-to-handle, energy-saving, and industrially valuable method. Regarding the application of polymer membranes to gas separation, research is being conducted on various membranes such as homogeneous membranes, porous membranes, and composite membranes, but proposals for gas separation membranes can be broadly divided into the following two types. One method is to form a polymer having a desired separation coefficient as an ultrathin film on a suitable porous support membrane. In order to increase the gas permeation rate to a practically useful extent, ultrathin membranes must be
The film thickness must be 1 μm or less, preferably 0.5 μm or less. In order to form such an ultra-thin film uniformly and firmly adhered to a porous support without defects such as pinholes, it is necessary to clean the stock solution with high precision,
Even if we introduce an advanced cleaning system using a clean bench in the workplace, or take measures to prevent vibrations, the potential defects cannot be covered, and coating is required to form a defect-free film in 2 to 3 layers. This would be extremely difficult, the manufacturing process would be complicated, and the cost would be high, making it unsuitable for industrial implementation. Another method is, for example, Japanese Patent Application Laid-Open No. 53-86684.
This is the method disclosed in No. This method uses a polymer that has a high separation coefficient for a certain gas to form a porous membrane that has a gas permeation rate comparable to that of a dense, homogeneous, ultrathin membrane of the polymer,
The micropores on at least one surface of the porous membrane are coated with another polymer having a low separation coefficient but a higher gas permeability so as to be occluded. [Problems to be solved by the invention] However, the polymer solution used for porous membrane hollow fiber spinning contains many impurities such as dust and catalysts, and these impurities must be removed by a filter before spinning. However, it is nearly impossible to filter out dust of 0.1 μm or less because the amount of stock solution to be filtered is large and the filtration pressure increases due to clogging of the filter cloth. Therefore, it is inevitable that a porous membrane obtained by spinning a stock solution containing impurities will have many defects. Therefore, coating the film with silicone or the like is essential in order to cover the defects formed on the film. However, this method is not suitable for producing a thin, stable and defect-free skin layer on hollow fibers, and coating membrane formation has the disadvantage that the process is complicated and operation is difficult. It is something. The present inventors have made earnest efforts to overcome these difficulties, and as a result, have achieved the present invention. [Means for Solving the Problems] That is, the present invention coats one surface of a porous hollow fiber support with a monomer or a monomer solution, retains the coating liquid in the porous support membrane, and then removes the monomer. The present invention relates to a method for forming a composite membrane for gas separation, which is characterized by polymerization. The present invention will be explained in detail below. The porous hollow fiber support in the present invention has an average pore diameter of 0.5 μm or less, preferably 0.1 μm or less, as observed by a scanning electron microscope, preferably a molecular weight cut-off of 1000 or more, and a porosity of 10 to 80. % can be used. Support hollow fibers with a membrane pore size exceeding 0.5 μm generally have weak pressure resistance, and during coating, a large amount of dust contained in the coating solution is removed.
Since it is difficult to create a defect-free coating film because it incorporates particles with a diameter of 0.5 μm or less, it is not preferable.
Furthermore, a molecular weight cut-off of less than 1000 is not preferred because the permeation resistance of the support membrane is high and the permeability of the resulting composite membrane is low. The porous hollow fiber support may be made of any material as long as it satisfies the above conditions, but generally includes polymers, inorganic materials such as alumina, glass, other metals, and sintered porous ceramics. Among these, polymeric materials are preferred. Polymer materials are generally known as porous membrane materials, and preferred examples include polysulfone, polyethersulfone, polyacrylonitrile, polystyrene, polymethyl methacrylate, polymethyl acrylate, vinyl chloride, vinylidene chloride, Chlorinated polyethylene, polycarbonate, cellulose acetate esters such as cellulose acetate and cellulose acetate butyrate, polyamides such as nylon 6, nylon 66, nylon 4, and nylon 11, polyimides such as polybenzimidazole, polyamideimide, polyacetal, polyphenylene oxide, Fluorine-based polymers such as polyxylene oxide, polyurethane, polyethylene terephthalate, polyalkyl methacrylate, polyalkyl acrylate, polyphenylene terephthalate, polysulfide, polyvinyl fluoride, polyvinylidene fluoride, polytrifluoroethylene, or polytetrafluoroethylene; Polyacetylene derivatives with trimethylsilyl groups such as phosphazene, polyvinyl alcohol, polyvinyl ester, polyvinyl acetate, polypropion vinyl, polyvinylpyridine, polycarbodiimide, polyacetylene, polytrimethylsilylpropylene, etc., with the following chemical formula
【式】(但し、R1、R2は、
トリメチルシリル基(Si(CH3)3)、フエニル基、
メチル基、エチル基、プロピル基等の脂肪族置換
基である)を繰り返し単位に持つポリマー、又、
これとジトリメチルシリルジエチニルベンゼン、
ジメチルジフエニルエチルシラン等との共重合
体、及びこれらによる架橋を一部含むものも含ま
れる。更に、前記ポリマーを反復単位として持つ
ブロツクポリマー及び前記のものを主骨格鎖に持
つブロツクポリマー、前記すべてのポリマーとポ
リマーにハロゲン基(−F、−Cl、−Br、−I)、
メチル、エチル、プロピル、−COOH、−SO3H、
−NH4 +等の置換基を導入した誘導体、またジビ
ニルベンゼンによる架橋物も含まれる。又、前記
ポリマーの異種組合せによる混合物も含まれる。
更に好ましい例としては、無機微粒体を混合し
て、公知の高分子溶融成形手段を用いて、中空糸
等に成形した後、適当な温度条件で或る程度延伸
する方法、或いは高分子と無機微粒体と更に適当
な有機液体を混合して、公知の高分子溶融成形技
術を用いて、中空状に成形した後、該成形物から
有機液体を抽出する方法などにより製造されるも
のである。これらの物及びその製造法の一例は、
特開昭52−70988号、特開昭52−156776号等の公
報に開示されている。
これらの無機微粒体配合高分子多孔膜にあつて
は、無機微粒体の量は10重量%〜80重量%である
ことが望ましい。10重量%未満では、可塑剤を多
く用いて高分子中に均一に分散しても連通した細
孔になりにくく、実用的な多孔膜とはならない。
又80重量%を超すと、膜としての強度が低く実用
的な多孔膜とはなり得ない。
無機微粒体の例としては、カーボンブラツク、
酸化珪素、珪酸カルシウム、珪酸アルミニウム、
酸化アルミニウム、酸化チタン、カオリンクレ
ー、炭酸カルシウム、炭酸マグネシウム、ケイソ
ウ土、タルク、硫酸バリウム、マイカ、アスベス
ト等があり、それらの単独又は2種以上の混合物
を用いることもできる。更に本発明に用いられる
無機微粒体の粒子形状としては、特に限定される
ものではないが、平均粒径0.005〜1μm、比表面
積が30〜800m2/gの微粒子状、又は多孔性粒状
のものが均一で優れた性能の無機微粒体配合高分
子多孔膜を得る場合に好ましいものとなる。
無機微粒体配合高分子多孔膜を構成する高分子
としては、特に限定されるものではないが、例え
ば、エチレン、プロピレン、ブテン−1等の重合
体、又はこれらの一つ又は二つ以上を主要成分と
して含有する共重合体のようなポリオレフイン系
樹脂、フツ化ビニル、フツ化ビニリデン、三フツ
化エチレン或いは四フツカエチレン等の重合体な
いしはこれらを構成成分として含む共重合体等の
群からなるフツ素系樹脂、ポリエチレンテレフタ
レートやポリブチレンテレフタレートのようなポ
リエステル系樹脂、ポリアミド系樹脂、ポリスチ
レン系樹脂、ポリ塩化ビニル及びその他押出成形
可能な多くの熱可塑性樹脂であり、それらの単独
又は2種以上の樹脂の混合物から選ぶことができ
る。
更に成形後にそれらの樹脂を処理し、フツ素、
塩素、臭素のようなハロゲンやヒドロキシル基、
アルコキシ基、アシル基、アミド基、スルホン基
のような官能基を付加することも可能である。無
機微粒体配合高分子多孔膜を製造するのに特に好
ましい高分子の例としては、ポリオレフイン系樹
脂及びフツ素系樹脂が挙げられる。低密度ポリエ
チレンから高密度ポリエチレンにわたる種々のポ
リエチレン、ポリプロピレン、又はそれらの共重
合体は強度、耐薬品性、可撓性等に優れており、
無機微粒体との混合、混練が容易であり、得られ
た混合物から通常の成形加工手段により極めて容
易にシート、フイルム及び中空糸等が成形でき
る。フツ素系樹脂はポリオレフイン系樹脂に比
し、一層耐薬品性、強度及び耐熱性において優れ
ている。フツ素系樹脂の例としては四フツ化エチ
レン−六フツ化プロピレン共重合体、四フツ化エ
チレン−パーフルオロアルコキシエチレン共重合
体、ポリ三フツ化エチレン樹脂、四フツ化エチレ
ン−エチレン共重合体やポリフツ化ビニデン樹脂
がある。
本発明における無機微粒体配合高分子多孔膜
は、膜中の高分子と無機微粒体の界面及び/又は
無機微粒子間に平均孔径0.5μm以下、好ましくは
0.1μ以下、更に好ましくは0.07μm以下の微細な
空隙によつて網状構造の多孔性が付与されてい
る。本発明においては、かかる微細な平均孔径の
多孔膜を用いることが極めて望ましい。無機微粒
体配合の重要性は、次のコーテイング膜形成時に
おいても見られる。
高分子の薄層を支持体多孔膜上に形成させる方
法としては、当該高分子を適当な溶媒に溶解させ
た溶液を公知の手段を用いて多孔膜上に薄くコー
テイング(積層)した後、溶媒を蒸発除去するの
が実用的である。無機微粒体配合多孔膜は、無機
微粒体の存在により、前記高分子液に極めて濡れ
易くなつているので、該高分子溶液を薄く、かつ
比較的一定の厚さで、コーテイングすることが可
能になる。更に、無機微粒体配合高分子多孔膜の
空孔は主として無機微粒体の間隙からなる微細な
網状構造をなしているため、コーテイングされた
前記高分子溶液中の溶媒は表面から蒸発するだけ
でなく、無機微粒子間隙の網状構造を通して極め
て速やかに浸透し裏面からも蒸発除去される。そ
の結果、形成される高分子薄膜は、支持体多孔膜
の空孔内部への入り込みが少なく比較的均一な厚
さでかつ厚さ方向にも均質な極薄膜となる。更に
又無機微粒体とコーテイング層との間のアンカー
効果による支持膜とコートされる気体分離活性薄
膜との接着性向上、或いは支持膜としての多孔膜
の苛酷な温度、圧力等の使用条件下での耐圧密性
の向上など、気体分離膜として実用上重要な改善
がなされる。このような意味から、無機微粒体の
配合は極めて効果の高い重要な要件である。
又、無機微粒体配合高分子多孔膜をアルカリ水
溶液中に浸漬する等により、無機物を溶解除去し
て空孔度を増大させたものも同じように使用する
ことができる。
本発明におけるコーテイング材料は、重合後ポ
リマーを形成するようなモノマーであり、触媒、
開始剤、熱、光により容易に重合を開始できるも
のである。
これらのモノマーの中には、エポキシとアミン
の組合せ、メチルメタクリレート、メチルアクリ
レート、ブチルアクリレート等、シリコーン、室
温重合可能なRTVシリコーン等のモノマーの単
独又は混合物が含まれる。
更に好ましいものとしては、ポリアセチレン系
モノマーがある。ポリアセチレン系モノマーとし
ては、
一般式[Formula] (where R 1 and R 2 are trimethylsilyl group (Si(CH 3 ) 3 ), phenyl group,
Polymers having a repeating unit of aliphatic substituents such as methyl, ethyl, and propyl groups, and
This and ditrimethylsilyldiethynylbenzene,
Also included are copolymers with dimethyldiphenylethylsilane and the like, and those partially containing crosslinking with these. Further, a block polymer having the above polymer as a repeating unit, a block polymer having the above polymer as a main backbone chain, a halogen group (-F, -Cl, -Br, -I) in all of the above polymers,
Methyl, ethyl, propyl, -COOH, -SO3H ,
It also includes derivatives into which substituents such as -NH 4 + have been introduced, and crosslinked products with divinylbenzene. Also included are mixtures of different combinations of the above polymers. More preferable examples include a method in which inorganic fine particles are mixed and formed into hollow fibers using a known polymer melt molding method, and then stretched to a certain extent under appropriate temperature conditions, or a method in which a polymer and an inorganic It is produced by mixing fine particles and a suitable organic liquid, molding the mixture into a hollow shape using known polymer melt molding technology, and then extracting the organic liquid from the molded product. Examples of these products and their manufacturing methods are:
It is disclosed in publications such as JP-A-52-70988 and JP-A-52-156776. In these porous polymer membranes containing inorganic fine particles, the amount of inorganic fine particles is preferably 10% to 80% by weight. If it is less than 10% by weight, even if a large amount of plasticizer is used and it is uniformly dispersed in the polymer, it will be difficult to form continuous pores, and a practical porous membrane will not be obtained.
If it exceeds 80% by weight, the strength of the membrane will be low and it will not be possible to obtain a practical porous membrane. Examples of inorganic fine particles include carbon black,
silicon oxide, calcium silicate, aluminum silicate,
Examples include aluminum oxide, titanium oxide, kaolin clay, calcium carbonate, magnesium carbonate, diatomaceous earth, talc, barium sulfate, mica, and asbestos, and these may be used alone or in a mixture of two or more. Furthermore, the particle shape of the inorganic fine particles used in the present invention is not particularly limited, but may be fine particles with an average particle size of 0.005 to 1 μm and a specific surface area of 30 to 800 m 2 /g, or porous particles. This is preferable when obtaining a porous polymer membrane containing inorganic fine particles with uniform properties and excellent performance. The polymer constituting the porous polymer membrane containing inorganic fine particles is not particularly limited, but for example, polymers such as ethylene, propylene, butene-1, etc., or one or more of these as the main Polyolefin resins such as copolymers contained as components, polymers such as vinyl fluoride, vinylidene fluoride, trifluoroethylene or tetrafluoroethylene, or copolymers containing these as constituent components. thermoplastic resins, polyester resins such as polyethylene terephthalate and polybutylene terephthalate, polyamide resins, polystyrene resins, polyvinyl chloride, and many other thermoplastic resins that can be extruded, either alone or in combination of two or more. You can choose from a mixture of resins. Furthermore, after molding, these resins are processed to produce fluorine,
halogens and hydroxyl groups such as chlorine and bromine,
It is also possible to add functional groups such as alkoxy groups, acyl groups, amide groups, and sulfone groups. Examples of particularly preferable polymers for producing a porous polymer membrane containing inorganic fine particles include polyolefin resins and fluorine resins. Various polyethylenes, polypropylenes, and copolymers thereof, ranging from low-density polyethylene to high-density polyethylene, have excellent strength, chemical resistance, flexibility, etc.
It is easy to mix and knead with inorganic fine particles, and the resulting mixture can be extremely easily molded into sheets, films, hollow fibers, etc. by ordinary molding processing means. Fluorine-based resins are superior to polyolefin-based resins in terms of chemical resistance, strength, and heat resistance. Examples of fluorocarbon resins include tetrafluoroethylene-hexafluoropropylene copolymer, tetrafluoroethylene-perfluoroalkoxyethylene copolymer, polytrifluoroethylene resin, and tetrafluoroethylene-ethylene copolymer. and polyfluorinated vinylidene resin. The porous polymer membrane containing inorganic fine particles in the present invention has an average pore diameter of 0.5 μm or less, preferably at the interface between the polymer and the inorganic fine particles in the membrane and/or between the inorganic fine particles.
The porosity of the network structure is imparted by fine voids of 0.1 μm or less, more preferably 0.07 μm or less. In the present invention, it is extremely desirable to use a porous membrane having such a fine average pore diameter. The importance of blending inorganic fine particles can also be seen in the subsequent formation of the coating film. A method for forming a thin layer of a polymer on a porous membrane support is to thinly coat (laminate) a solution of the polymer dissolved in an appropriate solvent on the porous membrane using known means, and then It is practical to remove it by evaporation. The porous membrane containing inorganic fine particles is extremely easily wetted by the polymer solution due to the presence of the inorganic fine particles, so it is possible to coat the polymer solution in a thin and relatively constant thickness. Become. Furthermore, since the pores of the porous polymer membrane containing inorganic fine particles form a fine network structure consisting mainly of gaps between the inorganic fine particles, the solvent in the coated polymer solution not only evaporates from the surface. , it penetrates extremely quickly through the network structure of the gaps between the inorganic particles, and is also evaporated and removed from the back surface. As a result, the thin polymer film that is formed is an extremely thin film that is less likely to penetrate into the pores of the porous support film, has a relatively uniform thickness, and is also homogeneous in the thickness direction. Furthermore, the anchor effect between the inorganic fine particles and the coating layer improves the adhesion between the support film and the coated gas separation active thin film, or the porous film as a support film can be used under harsh conditions such as temperature and pressure. Important improvements have been made in practical use as gas separation membranes, such as improved compaction resistance. In this sense, the blending of inorganic fine particles is an important requirement for extremely high effectiveness. Furthermore, a porous polymer membrane containing inorganic fine particles may be immersed in an alkaline aqueous solution to dissolve and remove inorganic substances to increase the porosity and may be used in the same manner. The coating material in the present invention is a monomer that forms a polymer after polymerization, a catalyst,
Polymerization can be easily initiated using an initiator, heat, or light. These monomers include epoxy and amine combinations, methyl methacrylate, methyl acrylate, butyl acrylate, etc., silicones, room temperature polymerizable RTV silicones, and other monomers alone or in mixtures. More preferred are polyacetylene monomers. The general formula for polyacetylene monomers is
以下に実施例を示す。
実施例 1
酸化珪素〔アエロジル#200(商品名)、比表面
積175m2/g、平均粒径16μm〕23重量%とジオ
クチルフタレート(DOP)54重量%をヘンシル
ミキサーで混合し、これに高密度ポリエチレン
〔SuntecS−360(登録商標)〕樹脂23重量%を添加
し、再度ヘンシルミキサーで混合した。
該混合物を中空糸紡糸用ノズルから、内部に窒
素ガスを混入し、中空糸を紡糸した。形成された
中空糸は、1,1,1−トリクロロエタン(クロ
ロセン)中で5分間浸漬し、DOPの抽出を行つ
た。得られた中空糸の内径、外径は夫々0.75mm及
び1.35mm、多孔膜の組成は、ポリエチレン樹脂50
重量%、微粉珪酸50重量%、多孔膜の平均孔径
0.02μm、空孔率58%であつた。
次いで本中空糸に以下のコーテイング操作を行
つた。
モノマーとして、
) トリメチルシリルプロピレン、
) ジ(トリメチルシリルエチニル)ベンゼ
ン、
) ジメチル(フエニルエチニル)シラン、
を夫々n−ヘキサン中に溶解し、2重量%溶液と
して、窒素雰囲気下で、該中空糸外表面上に、中
空糸の内側を外側に比べ150mmHg減圧下にして吸
引し、多孔膜中へ浸透せしめ、その後重合触媒と
して、メトキシフエニルカルベンペンタカルボニ
ルタングステンのn−ヘキサン1.2重量%溶液を
調製して、該中空糸上に窒素雰囲気下で更にコー
テイングした。その後60℃の窒素ガスを流し、ま
ずn−ヘキサンを徐々に蒸発させた後に60℃で2
時間窒素ガスを送り続けて重合を完結させた。
得られた複合膜の透過性を測定したところ、
モノマー)は、PO2=5×10-4αO2 N2=3.0、
モノマー)は、PO2=4×10-4αO2 N2=4.0、
モノマー)は、PO2=1×10-4αO2 N2=5.0、であ
つた(Pの単位は、cm2(STP)/cm2・sec・cm
Hg)。
〔発明の効果〕
本発明の効果は次のとおり要約される。
(1) 中空糸紡糸原液を予め濾過する必要がない。
(2) コーテイング用モノマー又はモノマー溶液
は、清浄化したまま不純物汚染がない状態で製
膜できる。
(3) 従つて、複合膜のピンホールが少ない。
(4) コーテイング層は、支持体多孔質中にあり、
確りとアンカリングしているので、コーテイン
グ層を薄膜化しても、強度が大である。
(5) 従つて、大きなフラツクス(Flux)が得ら
れる。
(6) 表面スキン層にキズがついても、表面スキン
層が多孔質細胞中に存在するので損傷が少な
い。
(7) どんなに希薄な溶液でも使用できるため、溶
解度の小さなポリマーもコーテイング用溶液に
使用できる。
(8) フイルムにするとひび割れし易い性質のポリ
マーも使用できる。又、分子量が小さいもの、
フイルムを作り難いもの、結晶化し易いポリマ
ーも使用できる。
(9) 多孔膜支持体は種々の孔径を持つものが選
べ、コーテイング用溶液の清浄度をコントロー
ルできる。又、コーテイング材質と親和性の良
い多孔膜支持体を選べる。
Examples are shown below. Example 1 23% by weight of silicon oxide [Aerosil #200 (trade name), specific surface area 175 m 2 /g, average particle size 16 μm] and 54% by weight of dioctyl phthalate (DOP) were mixed in a Henshil mixer, and this was mixed with high density 23% by weight of polyethylene (Suntec S-360 (registered trademark)) resin was added and mixed again using a Henshil mixer. Nitrogen gas was mixed into the mixture through a hollow fiber spinning nozzle to spin hollow fibers. The formed hollow fibers were immersed in 1,1,1-trichloroethane (chlorocene) for 5 minutes to extract DOP. The inner and outer diameters of the obtained hollow fibers were 0.75 mm and 1.35 mm, respectively, and the composition of the porous membrane was polyethylene resin 50.
Weight%, fine silicic acid 50% by weight, average pore diameter of porous membrane
It was 0.02 μm and the porosity was 58%. Next, the following coating operation was performed on this hollow fiber. As monomers, ) trimethylsilylpropylene, ) di(trimethylsilylethynyl)benzene, and ) dimethyl(phenylethynyl)silane were each dissolved in n-hexane, and a 2% by weight solution was prepared on the outer surface of the hollow fiber under a nitrogen atmosphere. Above, the inside of the hollow fiber was vacuumed under a reduced pressure of 150 mmHg compared to the outside to infiltrate into the porous membrane, and then a 1.2% by weight solution of methoxyphenylcarbenepentacarbonyltungsten in n-hexane was prepared as a polymerization catalyst. , the hollow fibers were further coated under a nitrogen atmosphere. After that, nitrogen gas at 60°C was flowed to gradually evaporate n-hexane, and then at 60°C for 2 hours.
The polymerization was completed by continuously supplying nitrogen gas for an hour. When the permeability of the obtained composite membrane was measured, it was found that: (monomer): P O2 = 5×10 -4 α O2 N2 = 3.0; (monomer): P O2 = 4×10 -4 α O2 N2 = 4.0; ) was P O2 = 1×10 -4 α O2 N2 = 5.0 (the unit of P is cm 2 (STP)/cm 2・sec・cm
Hg). [Effects of the Invention] The effects of the present invention can be summarized as follows. (1) There is no need to filter the hollow fiber spinning stock solution in advance. (2) Coating monomers or monomer solutions can be used to form films without impurity contamination while being cleaned. (3) Therefore, there are fewer pinholes in the composite membrane. (4) the coating layer is in the porous support;
Because it is firmly anchored, it has great strength even if the coating layer is made thinner. (5) Therefore, a large flux can be obtained. (6) Even if the surface skin layer is scratched, there is little damage because the surface skin layer exists within the porous cells. (7) Since any dilute solution can be used, even polymers with low solubility can be used in the coating solution. (8) Polymers that tend to crack easily when made into films can also be used. Also, those with a small molecular weight,
Polymers that are difficult to form into films and that are easily crystallized can also be used. (9) Porous membrane supports with various pore sizes can be selected to control the cleanliness of the coating solution. In addition, a porous membrane support that has good affinity with the coating material can be selected.
Claims (1)
はモノマー溶液をコーテイングして、コーテイン
グ液を支持体多孔膜中に保持させ、次いでモノマ
ーを重合させることを特徴とする気体分離用複合
膜の製膜方法。1. Film production of a composite membrane for gas separation, characterized by coating one surface of a porous hollow fiber support with a monomer or a monomer solution, retaining the coating liquid in the porous support membrane, and then polymerizing the monomer. Method.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP22897684A JPS61107921A (en) | 1984-11-01 | 1984-11-01 | Manufacture of composite hollow yarn membrane |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP22897684A JPS61107921A (en) | 1984-11-01 | 1984-11-01 | Manufacture of composite hollow yarn membrane |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS61107921A JPS61107921A (en) | 1986-05-26 |
| JPH051048B2 true JPH051048B2 (en) | 1993-01-07 |
Family
ID=16884818
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP22897684A Granted JPS61107921A (en) | 1984-11-01 | 1984-11-01 | Manufacture of composite hollow yarn membrane |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS61107921A (en) |
Families Citing this family (10)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE3880652T2 (en) * | 1987-12-28 | 1993-11-18 | Idemitsu Kosan Co | Selective gas permeation membranes and process for their manufacture. |
| US4828588A (en) * | 1988-04-01 | 1989-05-09 | University Of Cincinnati | Process for preparation of heterogeneous polysiloxane membrane and membrane produced |
| US4863496A (en) * | 1988-04-13 | 1989-09-05 | E. I. Du Pont De Nemours And Co. | Reactive posttreatment for gas separation membranes |
| US5091216A (en) * | 1988-04-13 | 1992-02-25 | E. I. Du Pont De Nemours And Company | Reactive post treatment for gas separation membranes |
| US5160353A (en) * | 1990-08-30 | 1992-11-03 | E. I. Du Pont De Nemours & Company | Gas separation membrane with ultrathin layer |
| JP2003068630A (en) * | 2001-08-29 | 2003-03-07 | Kyocera Corp | Exposure equipment |
| JP4721575B2 (en) * | 2001-08-29 | 2011-07-13 | 京セラ株式会社 | Exposure equipment |
| JP5222869B2 (en) * | 2010-02-25 | 2013-06-26 | 株式会社神鋼環境ソリューション | Separation membrane reforming method and separation membrane reforming apparatus |
| CN102753255B (en) * | 2010-02-25 | 2017-02-08 | 株式会社神钢环境舒立净 | Separation membrane modification method and separation membrane modification device |
| JP6222625B2 (en) | 2012-02-16 | 2017-11-01 | 富士フイルム株式会社 | Composite separation membrane and separation membrane module using the same |
-
1984
- 1984-11-01 JP JP22897684A patent/JPS61107921A/en active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS61107921A (en) | 1986-05-26 |
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