JPH0515677B2 - - Google Patents
Info
- Publication number
- JPH0515677B2 JPH0515677B2 JP14009489A JP14009489A JPH0515677B2 JP H0515677 B2 JPH0515677 B2 JP H0515677B2 JP 14009489 A JP14009489 A JP 14009489A JP 14009489 A JP14009489 A JP 14009489A JP H0515677 B2 JPH0515677 B2 JP H0515677B2
- Authority
- JP
- Japan
- Prior art keywords
- crystal
- quartz ampoule
- crystals
- cadmium telluride
- cdte
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 239000013078 crystal Substances 0.000 claims description 30
- 238000000034 method Methods 0.000 claims description 17
- 239000010453 quartz Substances 0.000 claims description 15
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims description 15
- 239000003708 ampul Substances 0.000 claims description 14
- MARUHZGHZWCEQU-UHFFFAOYSA-N 5-phenyl-2h-tetrazole Chemical compound C1=CC=CC=C1C1=NNN=N1 MARUHZGHZWCEQU-UHFFFAOYSA-N 0.000 claims description 10
- 229910052793 cadmium Inorganic materials 0.000 claims description 8
- 239000002994 raw material Substances 0.000 claims description 5
- 238000004519 manufacturing process Methods 0.000 claims description 3
- 229910052751 metal Inorganic materials 0.000 claims 1
- 239000002184 metal Substances 0.000 claims 1
- 229910004613 CdTe Inorganic materials 0.000 description 10
- 230000005855 radiation Effects 0.000 description 8
- YKYOUMDCQGMQQO-UHFFFAOYSA-L cadmium dichloride Chemical compound Cl[Cd]Cl YKYOUMDCQGMQQO-UHFFFAOYSA-L 0.000 description 6
- 239000000047 product Substances 0.000 description 6
- 230000015572 biosynthetic process Effects 0.000 description 3
- 238000001816 cooling Methods 0.000 description 3
- 238000003786 synthesis reaction Methods 0.000 description 3
- 239000012467 final product Substances 0.000 description 2
- 239000004065 semiconductor Substances 0.000 description 2
- 230000035945 sensitivity Effects 0.000 description 2
- 239000002904 solvent Substances 0.000 description 2
- 238000010521 absorption reaction Methods 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 238000001035 drying Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 238000007710 freezing Methods 0.000 description 1
- 230000008014 freezing Effects 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 238000007689 inspection Methods 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- 238000000465 moulding Methods 0.000 description 1
- 238000010899 nucleation Methods 0.000 description 1
- 239000002244 precipitate Substances 0.000 description 1
- 230000001376 precipitating effect Effects 0.000 description 1
- 238000007789 sealing Methods 0.000 description 1
- 238000005303 weighing Methods 0.000 description 1
Landscapes
- Crystals, And After-Treatments Of Crystals (AREA)
Description
(産業上の利用分野)
本発明は、放射線検出器、医療用放射線診断装
置、工業用X線非破壊検査装置等に用いられて居
る高抵抗のテルル化カドミウム結晶及びその製造
方法に関するものである。
(従来の技術)
テルル化カドミウム結晶を用いた放射線検出器
は、従来からこの分野で使用されていたSiやGe
を利用した半導体放射線検出器と比較してその禁
制帯幅及び平均原子番号が大きいため、室温作動
が可能であると共に放射線の吸収係数が大きく、
層の厚さが薄くても高い感度を得る事が可能であ
る事もあつて、一般に広く実用的に供せられる様
になつている。
この場合、目的とするテルル化カドミウムの結
晶を入手する為には、あらかじめ合成されていた
CdTeの多結晶を石英アンプル内で一旦Teの融液
中に溶解させた後、再びCdTeを析出させ、600
〜700℃の範囲にて1〜5mm/dayの成長速度を
以て結晶を成長させる事によつて製品を得る移動
ヒータ法(THM法)によるが、CdとTeをモル
比が3:7になる様にした後、1×1018〜1×
1020atoms/cm3の塩化カドミウムを添加した溶液
からCdTeの結晶を析出させ、950〜1000℃の範
囲にて1〜5mm/day成長速度を以て結晶を成長
させる事によつて製品を得るTe溶媒法によるか
していた。
(発明が解決しようとする課題)
然し乍ら、THM法による場合には結晶の入手
に先だつて、あらかじめCdTeの多結晶を必要と
するばかりでなく、多結晶のアンプル挿入に際し
て形状を整える為の成形加工が必要であつて作業
を煩雑にしていると共に、結晶の成長速度も遅
く、結晶の大型化にも適して居なかつた。
Te溶媒法による場合には、製品の純度を確保
する必要から添加される塩化カドミウムの純度を
厳選せねばならず、又、結晶の成長速度が遅くな
ると共に、結晶中に多くのTe析出物が見かけら
れており、製品の性能が問題とされていた。
本発明は、上記の課題を解決し、結晶が大型で
高純度であり、比抵抗値も高く、小型軽量であり
ながら高感度の放射線検出器に利用され得るテル
ル化カドミウム結晶の入手を目的としたものであ
る。
(課題を解決するための手段)
本発明者等は、上記課題を解決する為の手段と
して種々検討の結果、CdとTeの原料の入つた石
英アンプル中にGaが5×1014〜5×1018atoms/
cm3の濃度になるように金属Gaを添加した後、上
記石英アンプルを真空封入し、次いで、ブリツジ
マン法あるいはグラジエント・フリーズ法によつ
てGaを5×1014〜5×10atoms/cm3を含むテルル
化カドミウム結晶を合成し育成して得る事によつ
て、課題の解決に寄与し得る事を見出したもので
ある。
(作用)
本発明にあつては、Cd、Teの原料混合物を石
英アンプル内でGaドープルして真空封入下で加
熱することによつてCdTeの多結晶を合成し、続
いて合成多結晶を種核としてブリツジマン法或は
グラジエント・フリーズ法によつて単結晶を育成
するものであつて、この場合成多結晶並びに育成
単結晶中のGa濃度を5×1014〜5×1018atoms/
cm3とすることにより、後記の高い比抵抗値を示す
のである。また、これらCdTe単結晶は、比較的
大型で高純度である特徴を備えている。Gaの含
濃度が上記の範囲を外れるといずれも得られた
CdTeの結晶の比抵抗値が必要な値に達せず、放
射線検出器に必要とされる1×106〜1×1010Ω・
cmの高抵抗をもつたテルル化カドミウム結晶の入
手が困難となつて、所期の目的が果せなくなる。
又、本発明の実施に当つては高抵抗の結晶を得
る為、CdとTeのモル比としてCd/Teを0.9〜
0.9999とする事が好ましい。
(実施例)
何も純度99.9999%のCdとTeとGaを原料とし
て用い、CdとTeのモル比としてCd/Teが0.9995
である様に、Cdを178g、Teを202g、Gaを0.35
mg秤量して、上記の原料を何れも内径30mmの石英
アンプル中に挿入した後、10-5Torr乃至
10-6Torrの真空度に封入し、更に、上記石英ア
ンプルを合成炉内で1150℃まで加熱してGaドー
プのCdTeを合成した後、上記石英アンプルを結
晶育成炉内に移送し、更に、1100℃から0.4℃/
hrの冷却割合で100時間に亘つて冷却する結晶育
成処理を施した後、上記石英アンプルを50℃/hr
の冷却速度にて室温迄順次冷却するグラジエン
ト・フリーズ法により、上記石英アンプル内に
GaドープのCdTeの単結晶を成長させて製造を得
た。
この様にして得られた本発明の限定範囲濃度の
GaドープのCdTeの単結晶(実施例)と、限定範
囲外のGa濃度及び同じくGaドープなしCdとTe
の配合のみで作成した結晶(実施例)とで比抵抗
値を、Ga濃度を変化させた場合について測定し
た結果を第1表に示す。
(Field of Industrial Application) The present invention relates to a high-resistance cadmium telluride crystal used in radiation detectors, medical radiation diagnostic equipment, industrial X-ray nondestructive inspection equipment, etc., and a method for manufacturing the same. . (Prior technology) Radiation detectors using cadmium telluride crystals are based on Si and Ge crystals, which have traditionally been used in this field.
Compared to semiconductor radiation detectors using semiconductors, its forbidden band width and average atomic number are larger, so it can operate at room temperature and has a large radiation absorption coefficient.
Because it is possible to obtain high sensitivity even with a thin layer, it has become widely used in practical applications. In this case, in order to obtain the desired cadmium telluride crystals, it is necessary to
After dissolving CdTe polycrystals in a Te melt in a quartz ampoule, CdTe was precipitated again.
The moving heater method (THM method) is used to obtain a product by growing crystals at a growth rate of 1 to 5 mm/day in the range of ~700°C, but Cd and Te are grown in a molar ratio of 3:7. After that, 1×10 18 ~ 1×
A Te solvent in which the product is obtained by precipitating CdTe crystals from a solution containing 10 to 20 atoms/cm 3 of cadmium chloride, and growing the crystals at a growth rate of 1 to 5 mm/day in the range of 950 to 1000°C. It was according to the law. (Problem to be solved by the invention) However, when using the THM method, not only is CdTe polycrystal required in advance before obtaining the crystal, but also a molding process is required to adjust the shape when inserting the polycrystal into the ampoule. However, the process is complicated, and the growth rate of the crystal is slow, making it unsuitable for increasing the size of the crystal. When using the Te solvent method, the purity of the cadmium chloride added must be carefully selected in order to ensure the purity of the product, and the growth rate of the crystals is slow and many Te precipitates are present in the crystals. The product's performance has been questioned. The present invention aims to solve the above-mentioned problems and to obtain a cadmium telluride crystal that is large in size, highly pure, has a high specific resistance value, and can be used in a small and lightweight radiation detector with high sensitivity. This is what I did. (Means for Solving the Problems) As a result of various studies as a means for solving the above problems, the present inventors found that Ga is present in a quartz ampoule containing Cd and Te raw materials at a concentration of 5×10 14 to 5× 10 18 atoms/
After adding metallic Ga to a concentration of 5×10 14 to 5×10 atoms/cm 3 , the quartz ampoule is vacuum sealed, and then Ga is added to a concentration of 5×10 14 to 5×10 atoms/cm 3 by the Bridgeman method or gradient freeze method. It has been discovered that the synthesis and growth of cadmium telluride crystals can contribute to solving the problem. (Function) In the present invention, polycrystals of CdTe are synthesized by doping a raw material mixture of Cd and Te with Ga in a quartz ampoule and heating it under vacuum sealing, and then seeding the synthesized polycrystals. A single crystal is grown as a nucleus by the Bridgeman method or gradient freeze method, and in this case, the Ga concentration in the grown polycrystal and the grown single crystal is set to 5×10 14 to 5×10 18 atoms/
cm 3 exhibits a high specific resistance value as described below. Furthermore, these CdTe single crystals are characterized by being relatively large and highly pure. All results were obtained when the Ga concentration was outside the above range.
The specific resistance value of the CdTe crystal did not reach the required value, which was 1×10 6 to 1×10 10 Ω・
It has become difficult to obtain cadmium telluride crystals with a high resistance of cm, making it impossible to achieve the intended purpose. In addition, in carrying out the present invention, in order to obtain a high-resistance crystal, the molar ratio of Cd and Te is 0.9 to 0.9.
It is preferable to set it to 0.9999. (Example) Cd, Te, and Ga with a purity of 99.9999% were used as raw materials, and the molar ratio of Cd and Te was 0.9995.
As shown, Cd is 178g, Te is 202g, Ga is 0.35g.
After weighing mg and inserting each of the above raw materials into a quartz ampoule with an inner diameter of 30 mm,
The quartz ampoule was sealed in a vacuum of 10 -6 Torr, and the quartz ampoule was further heated to 1150°C in a synthesis furnace to synthesize Ga-doped CdTe, and then the quartz ampoule was transferred to a crystal growth furnace, and further, 0.4℃ from 1100℃/
After crystal growth treatment of cooling at a cooling rate of hr for 100 hours, the quartz ampoule was heated at 50℃/hr.
The above quartz ampoule was cooled by the gradient freezing method, in which it was sequentially cooled down to room temperature at a cooling rate of
The fabrication was obtained by growing Ga-doped CdTe single crystals. The limited range concentration of the present invention obtained in this way
Single crystal of Ga-doped CdTe (example) and Ga concentration outside the limited range and also Cd and Te without Ga-doping
Table 1 shows the results of measuring the specific resistance value of the crystal (Example) prepared using only the combination of 1 and 2 with varying Ga concentrations.
【表】
第1表より本発明による場合は、最高1.2×109
(Ω・cm)の高い比抵抗値を示し、低いものでも
一般の放射線検出器に必要とされる1×106(Ω・
cm)以上の比抵抗値を発揮することが判る。之に
対し、本発明Gaドープ濃度の上下限に隣接しな
がらも逸脱するものは ×103オーダー(Ω・cm)
程度の低い比抵抗値しか得られず、更にGaドー
プのないものは ×102オーダー(Ω・cm)の低
い値を示し、実用性がないことが判つた。
又、従来から実施されている塩化カドミウム添
加方法に拠る時には、石英アンプルの破損事故に
よる為に最終製品の歩留まりが僅か70%でしか無
かつたのに比較して、本発明に拠る結晶の育成時
には何等の石英アンプルの破損事故も生せず、大
幅に製品の収率を高める事が出来た。
なお、上記と同様な合成処理により得られた合
成済石英アンプルをブリツジマン法にて結晶育成
処理した場合の製品について測定した結果による
と、Ga添加量に対する比抵抗値はいずれもグラ
ジエント・フリーズ法によつた場合の値とほぼ同
様な値を示した。
(発明の効果)
上記の如く、本発明による時は、放射線検出器
等に多くの需要があるテルル化カドミウム単結晶
を比抵抗値が高く比較的大型にして高純度で、し
かも製品歩留まりも高くして容易に入手する事が
出来る為、斯業界に寄与するところ大なるものが
ある。[Table] From Table 1, in the case of the present invention, the maximum is 1.2 × 10 9
(Ω・cm), and even a low resistivity value of 1×10 6 (Ω・cm) is required for general radiation detectors.
It can be seen that it exhibits a resistivity value higher than cm). On the other hand, those that are adjacent to but deviate from the upper and lower limits of the Ga doping concentration of the present invention are ×10 3 order (Ω cm)
Only a relatively low specific resistance value was obtained, and the one without Ga doping showed a low value of the order of ×10 2 (Ω·cm), making it impractical. In addition, when using the conventional method of adding cadmium chloride, the yield of the final product was only 70% due to the accidental breakage of the quartz ampoule, but compared to that, the yield of the final product was only 70%. In some cases, there were no incidents of damage to the quartz ampoules, and the yield of the product was significantly increased. In addition, according to the results of measurements of synthesized quartz ampoules obtained by the same synthesis process as above and subjected to crystal growth treatment using the Bridgeman method, the resistivity values with respect to the amount of Ga added were all the same as those obtained by the gradient-freeze method. The value was almost the same as that for the case of drying. (Effects of the Invention) As described above, according to the present invention, a cadmium telluride single crystal, which is in high demand for radiation detectors, etc., can be made relatively large and have a high specific resistance value, and can be made with high purity and a high product yield. Since it can be easily obtained, it makes a great contribution to this industry.
Claims (1)
特徴とするテルル化カドミウム結晶。 2 CdとTeの原料の入つた石英アンプル中にGa
が5×1014〜5×1018atoms/cm3の濃度になるよ
うに金属Gaを添加した後、上記石英アンプルを
真空封入し、次いで、ブリツジマン法あるいはグ
ラジエント・フリーズ法によつて合成し、育成す
る事を特徴とするテルル化カドミウム結晶の製造
方法。[Claims] A cadmium telluride crystal containing 5×10 14 to 5×10 18 atoms/cm 3 of 1 Ga. 2 Ga in a quartz ampoule containing Cd and Te raw materials.
After adding metal Ga to a concentration of 5×10 14 to 5×10 18 atoms/cm 3 , the quartz ampoule is vacuum sealed, and then synthesized by the Bridgeman method or gradient freeze method, A method for producing a cadmium telluride crystal, which is characterized by growing a cadmium telluride crystal.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP14009489A JPH035399A (en) | 1989-05-31 | 1989-05-31 | Cadmium telluride crystal and its manufacturing method |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP14009489A JPH035399A (en) | 1989-05-31 | 1989-05-31 | Cadmium telluride crystal and its manufacturing method |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH035399A JPH035399A (en) | 1991-01-11 |
| JPH0515677B2 true JPH0515677B2 (en) | 1993-03-02 |
Family
ID=15260814
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP14009489A Granted JPH035399A (en) | 1989-05-31 | 1989-05-31 | Cadmium telluride crystal and its manufacturing method |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH035399A (en) |
Families Citing this family (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| FR2703696B1 (en) * | 1993-04-08 | 1995-06-09 | Eurorad 2 6 Sarl | PROCESS FOR OBTAINING A DOPED CRYSTALLINE MATERIAL BASED ON TELLURE AND CADMIUM AND A DETECTOR COMPRISING SUCH A MATERIAL. |
| FR2836931B1 (en) | 2002-03-05 | 2004-04-30 | Eurorad 2 6 | PROCESS FOR PRODUCING HIGH RESISTIVITY SEMICONDUCTOR CdXTe CRYSTALS AND RESULTING CRYSTALLINE MATERIAL |
| WO2006054580A1 (en) * | 2004-11-18 | 2006-05-26 | Nippon Mining & Metals Co., Ltd. | CdTe COMPOUND SEMICONDUCTOR SINGLE CRYSTAL |
-
1989
- 1989-05-31 JP JP14009489A patent/JPH035399A/en active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPH035399A (en) | 1991-01-11 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| US20090053125A1 (en) | Stabilizing 4H Polytype During Sublimation Growth Of SiC Single Crystals | |
| Földvári et al. | Growth and properties of Bi2TeO5 single crystals | |
| JP4083449B2 (en) | CdTe single crystal manufacturing method | |
| Schieber et al. | Purification, growth, and characterization of alpha mercuric-iodide crystals for gamma-ray detection | |
| Cardetta et al. | Growth and habit of GaSe crystals obtained from vapour by various methods | |
| CN108330543A (en) | A kind of N-type SnSe monocrystalline and preparation method thereof | |
| Su et al. | Growth of ZnTe by physical vapor transport and traveling heater method | |
| KR101830524B1 (en) | Two-dimensional large-area metal chalcogenide single crystals and method for manufactruing the same | |
| US7537659B2 (en) | Method of obtaining a CdTe or CdZnTe single crystal and the single crystal thus obtained | |
| Patel et al. | Growth of AgInSe2 thin films | |
| JPH0515677B2 (en) | ||
| Agarwal et al. | Growth of single crystals of WSe2 by sublimation method | |
| Shanks | The growth of magnesium germanide crystals | |
| Hemmat et al. | Closed System Vapor Growth of Bulk CdS Crystals from the Elemental Constituents | |
| JP2555847B2 (en) | Low resistance semiconductor crystal substrate and manufacturing method thereof | |
| Arivuoli et al. | Growth of bismuth sulpho-iodide single crystals from vapour | |
| Spiesser et al. | Preparation and properties of two indium antimony selenides | |
| US3969182A (en) | Growth of mercuric iodide single crystals from dimethylsulfoxide | |
| JPH0246560B2 (en) | ||
| JPH0416597A (en) | Production of silicon carbide single crystal | |
| US4559217A (en) | Method for vacuum baking indium in-situ | |
| Gospodinov | The growth of HgI2 crystals | |
| Kothiyal et al. | Preparation of non-stoichiometric arsenic sulphide crystals As2S2. 15, and measurement of their electrical conductivity | |
| Wiedemeier et al. | Physical vapor transport and crystal growth of GeSexTe1− x solid solutions | |
| Arivuoli et al. | Growth of bismuth seleno iodide single crystals from the vapour |