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JPH0515709B2 - - Google Patents
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JPH0515709B2 - - Google Patents

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Publication number
JPH0515709B2
JPH0515709B2 JP32318087A JP32318087A JPH0515709B2 JP H0515709 B2 JPH0515709 B2 JP H0515709B2 JP 32318087 A JP32318087 A JP 32318087A JP 32318087 A JP32318087 A JP 32318087A JP H0515709 B2 JPH0515709 B2 JP H0515709B2
Authority
JP
Japan
Prior art keywords
water
meth
monomer
acrylate
resin composition
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
JP32318087A
Other languages
Japanese (ja)
Other versions
JPH01163174A (en
Inventor
Kazumi Nakamura
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Soken Kagaku KK
Original Assignee
Soken Kagaku KK
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Soken Kagaku KK filed Critical Soken Kagaku KK
Priority to JP32318087A priority Critical patent/JPH01163174A/en
Publication of JPH01163174A publication Critical patent/JPH01163174A/en
Publication of JPH0515709B2 publication Critical patent/JPH0515709B2/ja
Granted legal-status Critical Current

Links

Classifications

    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/027Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Furan Compounds (AREA)
  • Polymerisation Methods In General (AREA)

Description

【発明の詳細な説明】 [産業上の利用分野] 本発明はN−メチロールアクリルアミドの新規
なエーテル化物と、このエーテル化物を単量体成
分として含有する光硬化型樹脂組成物に関する。
本発明の樹脂組成物は水現象が可能な感光性樹脂
製版材料として、あるいはプリント配線板のイン
キなどとして、特に優れた適性を備えている。
DETAILED DESCRIPTION OF THE INVENTION [Industrial Application Field] The present invention relates to a novel etherified product of N-methylolacrylamide and a photocurable resin composition containing this etherified product as a monomer component.
The resin composition of the present invention has particularly excellent suitability as a photosensitive resin plate-making material capable of water phenomenon or as an ink for printed wiring boards.

[従来の技術] 一般に光硬化性があつて、水に溶ける中性液状
の単量体としては、2−ヒドロキシエチル(メ
タ)アクリレート、2−ヒドロキシ−3−プロピ
ル(メタ)アクリレート、トリエチレングリコー
ルメチルエーテル(メタ)アクリレート、メトキ
シメチルアクリルアミド、エトキシエチルアクリ
ルアミド、ジメチルアクリルアミド、アクリロイ
ルモルホリン、ビニルピロリドンなどが知られて
いる。
[Prior Art] In general, photocurable and water-soluble neutral liquid monomers include 2-hydroxyethyl (meth)acrylate, 2-hydroxy-3-propyl (meth)acrylate, and triethylene glycol. Known examples include methyl ether (meth)acrylate, methoxymethyl acrylamide, ethoxyethylacrylamide, dimethyl acrylamide, acryloylmorpholine, and vinylpyrrolidone.

[発明が解決しようとする問題点] 従来の光硬化性にして水に溶ける中性液状単量
体は、(イ)蒸気圧が高く光硬化中に揮散しやすい、
(ロ)光硬化速度が遅い、(ハ)光硬化したポリマーが粘
着性をしめしたり、水に触れると瞬時に溶解、発
泡又は崩壊する、などのいずれかの欠点があり、
これらの欠点を持たない単量体はこれまで知られ
ていない。
[Problems to be solved by the invention] Conventional photocurable, water-soluble neutral liquid monomers have (a) high vapor pressure and are easily volatilized during photocuring;
(b) The photocuring speed is slow; (c) The photocured polymer becomes sticky or instantly dissolves, foams, or collapses when it comes into contact with water.
Monomers that do not have these drawbacks are hitherto unknown.

本発明は上に指摘したような欠点を持たない新
規な光硬化性単量体と、この単量体を主要成分と
して含有する光硬化型樹脂組成物を提供する。
The present invention provides a novel photocurable monomer that does not have the above-mentioned drawbacks, and a photocurable resin composition containing this monomer as a main component.

[問題点を解決するための手段] 本発明に係る光硬化性単量体は、下記の〔〕
式で示され、また本発明に係る光硬化型樹脂組成
物は、下記の〔〕式で示される単量体に、光重
合開始剤を配してなる。
[Means for solving the problems] The photocurable monomer according to the present invention has the following []
The photocurable resin composition according to the present invention is formed by disposing a photopolymerization initiator in a monomer represented by the following formula [ ].

本発明の単量体〔〕は、アクリルアミドのN
−メチロール化物と、テトラヒドロフルフリルア
ルコールとをエーテル型縮合させることによつて
容易に調製することができる。
The monomer [ ] of the present invention is acrylamide N
- It can be easily prepared by ether-type condensation of a methylol compound and tetrahydrofurfuryl alcohol.

例えば、アクリルアミドのN−メチロール化物
とテトラヒドロフルフリルアルコールとを、酸触
媒の存在下、ベンゼン、トルエンなどの共沸溶剤
中、80〜120℃の温度で反応させて脱水エーテル
化を行ない、反応生成物を中和後水洗などで触媒
などを除き、次に減圧蒸留又は共沸蒸留などの手
段で脱溶剤を行なうことにより、目的とする単量
体〔〕を得ることができる。
For example, N-methylolated acrylamide and tetrahydrofurfuryl alcohol are reacted in the presence of an acid catalyst in an azeotropic solvent such as benzene or toluene at a temperature of 80 to 120°C to perform dehydration and etherification, resulting in a reaction product. After neutralizing the product, the catalyst and the like are removed by washing with water, and then the target monomer [] can be obtained by removing the solvent by means such as vacuum distillation or azeotropic distillation.

本発明の単量体〔〕は無色、無臭、低粘度、
低揮発性の液体で、水、アセトン、酢酸エチル、
トルエンなどに溶ける。また、これに光重合開始
剤を配合し、ガラス、銅張り積層板、鉄板などの
表面に塗布して光硬化させると、早い時間で硬化
し、被塗布面との密着性が良好で、硬度の高い強
靱な塗膜を形成する。そして、この塗膜は流水に
3分程度浸しても変化がなく、吸湿によつて粘着
性を帯びることもない。
The monomer of the present invention [] is colorless, odorless, low viscosity,
Low volatility liquid, water, acetone, ethyl acetate,
Soluble in toluene etc. In addition, when a photopolymerization initiator is mixed with this and applied to the surface of glass, copper-clad laminates, iron plates, etc. and photocured, it cures quickly, has good adhesion to the surface to be coated, and has a high hardness. Forms a highly tough coating film. This coating film remains unchanged even after being immersed in running water for about 3 minutes, and does not become sticky due to moisture absorption.

ちなみに、低揮発性にして水溶性であるトリエ
チレングリコールメチルエーテル(メタ)アクリ
レート、アクリロイルモルホリン、ビニルピロリ
ドンなどの光硬化塗膜は、水分に感じやすく、流
水に浸すと直ちに溶解して粘着性を示すに至る。
By the way, photocurable coatings made of triethylene glycol methyl ether (meth)acrylate, acryloylmorpholine, vinyl pyrrolidone, etc., which are low volatility and water soluble, are easily sensitive to moisture, and when immersed in running water, they immediately dissolve and become sticky. This leads to the following.

また単量体〔〕は公知の水溶性単量体2−ヒ
ドロキシエチル(メタ)アクリレート、トリエチ
レングリコールメチルエーテル(メタ)アクリレ
ートなどと相溶するから、これら単量体と適宜混
合のうえ光重合開始剤を溶かし、光硬化させた
り、あるいは過酸化ベンゾイル、アゾビスイソブ
チロニトリルなどのラジカル開始剤を配合し、必
要に応じて水、アセトン、メチルエチルケトン、
酢酸ビニル、トルエンなどの溶剤に溶かして熱重
合させることにより、感湿性を有するポリマーと
か、水溶性のポリマーとか、硬度に変化を持たせ
たポリマーとかを得ることができる。
In addition, since the monomer [] is compatible with known water-soluble monomers such as 2-hydroxyethyl (meth)acrylate and triethylene glycol methyl ether (meth)acrylate, it can be photopolymerized after being appropriately mixed with these monomers. Dissolve the initiator and photo-cure it, or add a radical initiator such as benzoyl peroxide or azobisisobutyronitrile, and add water, acetone, methyl ethyl ketone, or
By dissolving it in a solvent such as vinyl acetate or toluene and thermally polymerizing it, it is possible to obtain moisture-sensitive polymers, water-soluble polymers, and polymers with varying hardness.

本発明に係る光硬化型樹脂組成物は、上記の単
量体〔I〕に加えて光重合開始剤を含有する。光
重合開始剤としては、ベンゾイン、ベンゾインエ
チルエーテル、ベンジル、ベンゾフエノン、ベン
ジルジメチルケタール、ヒドロキシシクロヘキシ
ルフエニルケトン、ジエトキシアセトフエノン、
2−ヒドロキシ−2−メチルプロピオフエノン、
ミヒラーケトン、クロロチオキサントン、ベンゾ
イルベンジルトリメチルアンモニウムクロライド
などを使用することができる。そして、これらの
光重合開始剤は必要に応じてジブチルアミン、ト
リエチルアミン、ジエチルアミノエチルメタクリ
レートなどの増感剤と併用のうえ、0.01〜10重量
%の範囲で組成物に配合される。
The photocurable resin composition according to the present invention contains a photopolymerization initiator in addition to the above monomer [I]. Examples of photopolymerization initiators include benzoin, benzoin ethyl ether, benzyl, benzophenone, benzyl dimethyl ketal, hydroxycyclohexyl phenyl ketone, diethoxyacetophenone,
2-hydroxy-2-methylpropiophenone,
Michler's ketone, chlorothioxanthone, benzoylbenzyltrimethylammonium chloride, etc. can be used. These photopolymerization initiators are used in combination with a sensitizer such as dibutylamine, triethylamine, diethylaminoethyl methacrylate, etc., if necessary, and are blended into the composition in a range of 0.01 to 10% by weight.

本発明の光硬化型樹脂組成物は、基本的には上
記の単量体〔〕と光重合開始剤とで構成される
が、この組成物には単量体〔〕のプレポリマー
を配合することができる。さらに本発明の樹脂組
成物には好ましくは50重量%を越えない範囲で他
種の単量体を第3成分として添加することが可能
である。この場合の単量体としては、2−ヒドロ
キシエチル(メタ)アクリレート、2−ヒドロキ
シ−3−プロピル(メタ)アクリレート、(メタ)
アクリル酸、(メタ)アクリルアミド、トリエチ
レングリコールモノメチルエーテル(メタ)アク
リレート、ジエチレングリコールモノエチルエー
テル(メタ)アクリレート、ジメチルアミノエチ
ル(メタ)アクリレート、メトキシメチルアクリ
ルアミド、エトキシエチルアクリルアミド、(メ
タ)アクリルアミドプロピルトリメチルアンモニ
ウムクロライド、ターシヤリーブチルアクリルア
ミドスルホン酸、スチレンスルホン酸ソーダ、ジ
メチルアクリルアミド、アクリロイルモルホリ
ン、ビニルピロリドン、酢酸ビニルなどが包含さ
れる。
The photocurable resin composition of the present invention is basically composed of the above monomer [] and a photopolymerization initiator, but a prepolymer of the monomer [] is blended into this composition. be able to. Furthermore, other types of monomers can be added as a third component to the resin composition of the present invention, preferably in an amount not exceeding 50% by weight. In this case, the monomers include 2-hydroxyethyl (meth)acrylate, 2-hydroxy-3-propyl (meth)acrylate, (meth)
Acrylic acid, (meth)acrylamide, triethylene glycol monomethyl ether (meth)acrylate, diethylene glycol monoethyl ether (meth)acrylate, dimethylaminoethyl (meth)acrylate, methoxymethylacrylamide, ethoxyethylacrylamide, (meth)acrylamidopropyltrimethylammonium Included are chloride, tert-butylacrylamide sulfonic acid, sodium styrene sulfonate, dimethylacrylamide, acryloylmorpholine, vinylpyrrolidone, vinyl acetate, and the like.

さらにまた、本発明の光硬化型樹脂組成物に
は、この樹脂組成物自体の性状又は樹脂組成物か
ら得られる硬化皮膜に別の性能を付与する目的
で、ポリビニルアルコール、カルボキシメチルセ
ルローズ、ヒドロキシエチルセルローズ、メチル
セルローズ、ポリアクリル酸ソーダ、ポリエチレ
ンオキサイド、ポリアクリルアミドなどの各種合
成樹脂やデンプンなどを混合することができ、ま
た通常の光硬化型樹脂組成物と同様に、顔料、安
定剤、酸化防止剤、界面活性剤、濡れ剤、粘度調
整剤などを必要に応じて混合することができる。
Furthermore, in the photocurable resin composition of the present invention, polyvinyl alcohol, carboxymethyl cellulose, hydroxyethyl Various synthetic resins such as cellulose, methylcellulose, sodium polyacrylate, polyethylene oxide, and polyacrylamide, as well as starch, etc. can be mixed, and like normal photocurable resin compositions, pigments, stabilizers, and antioxidants can be mixed. Agents, surfactants, wetting agents, viscosity modifiers, etc. can be mixed as necessary.

本発明の光硬化型樹脂組成物を対象物に塗布す
るに当つては、ロールコーター、刷毛塗り、スク
リーン印刷など任意の塗工方法を採用することが
でき、水、メチルエチルケトン、酢酸エチル、ト
ルエンなどで希釈すれば、スプレー塗装を採用す
ることもできる。しかし、本発明の樹脂組成物は
その組成によつて無溶媒でも低粘度であるので、
溶剤の助けを借りずにそのまま塗布することがで
き、この場合には当然のことながら、光硬化させ
る前に予備乾燥を行なう必要がない。そして、本
発明の樹脂組成物はガラス、銅張り積層板、鋼板
などによく密着し、硬化した際の硬度も高いの
で、感光性樹脂製版材料あるいはプリント配線板
のレジストインキなど、水現象を行なう分野の光
硬化型樹脂として好適である。
When applying the photocurable resin composition of the present invention to an object, any coating method such as a roll coater, brush coating, screen printing, etc. can be adopted, and water, methyl ethyl ketone, ethyl acetate, toluene, etc. If diluted with water, spray painting can also be used. However, because the resin composition of the present invention has a low viscosity even without a solvent due to its composition,
It can be applied directly without the aid of solvents, and in this case there is of course no need for preliminary drying before photocuring. The resin composition of the present invention adheres well to glass, copper-clad laminates, steel plates, etc., and has high hardness when cured, so it can be used as a photosensitive resin plate-making material or resist ink for printed wiring boards, etc. It is suitable as a photocurable resin in the field.

[実施例] 実施例1 (単量体合成) テトラヒドロフルフリルアルコール204g、ト
ルエン284g、ハイドロキノンモノメチルエーテ
ル100mg、無水マレイン酸2.4gを含む溶液を加熱
攪拌し、空気を吹き込みながらN−メチロールア
クリルアミド242gを含む60%水溶液を2時間か
けて滴下共沸脱水させ、脱水が終わるまで還流加
熱を続けた。反応時間6時間で最終反応温度は
102℃であつた。脱水量は203gで、3%のホルム
アルデヒドを含んでいた。これは理論量のエーテ
ル脱水量に相当する。
[Example] Example 1 (Monomer synthesis) A solution containing 204 g of tetrahydrofurfuryl alcohol, 284 g of toluene, 100 mg of hydroquinone monomethyl ether, and 2.4 g of maleic anhydride was heated and stirred, and 242 g of N-methylolacrylamide was added while blowing air. A 60% aqueous solution containing the solution was dropwise azeotropically dehydrated over a period of 2 hours, and reflux heating was continued until the dehydration was completed. The final reaction temperature at a reaction time of 6 hours is
It was 102℃. The amount of dehydrated water was 203g, which contained 3% formaldehyde. This corresponds to the theoretical amount of ether dehydration.

次いで芒硝20%を含む苛性ソーダ水溶液を加え
て60℃で中和すると、主としてトルエンからなる
上層、生成物を含む中層、アリカリ水溶液からな
る下層に分かれるので、中層を分離した。この中
層にメチルエチルケトン150gを加え、20%の芒
硝水で水洗し、未反応のテトラヒドロフルフリル
アルコール及びN−メチロールアクリルアミドを
除き、油分に含まれるトルエン、メチルエチルケ
トン、水を減圧留去し、残油を濾別することによ
り、テトラヒドロフルフリオキシメチルアクルリ
アミド352gを得た。このものの粘度は280cpsで
あつて、トルエン、酢酸エチル、水に可溶であつ
た。また、このものの元素分析及びIR分析の結
果は下記の通りであつた。
Next, when a caustic soda aqueous solution containing 20% of Glauber's salt was added and neutralized at 60°C, the mixture was separated into an upper layer mainly consisting of toluene, a middle layer containing the product, and a lower layer consisting of an alkali aqueous solution, and the middle layer was separated. 150 g of methyl ethyl ketone was added to this middle layer, washed with 20% sodium sulfate water, unreacted tetrahydrofurfuryl alcohol and N-methylolacrylamide were removed, toluene, methyl ethyl ketone, and water contained in the oil were distilled off under reduced pressure, and the remaining oil was removed. By filtering, 352 g of tetrahydrofurfuroxymethyl acrylamide was obtained. This product had a viscosity of 280 cps and was soluble in toluene, ethyl acetate, and water. Further, the results of elemental analysis and IR analysis of this product were as follows.

(イ) 元素分析 C H O N 測定値 57.6% 7.9% 26.5% 8.0% 理論値 58.4% 8.1% 25.9% 7.6% (ロ) IR分析(KBr上液膜) 3420cm-1酸アミドのN−H伸縮振動 1670cm-1酸アミドのC=0伸縮振動 1640cm-1ビニル基CH2=CH−伸縮振動 1540cm-1酸アミドのN−H変角振動 1400cm-1ビニル基CH2=CH−面内変角振動 1085cm-1エーテルC−0−C伸縮振動 実施例2 (単量体合成) テトラヒドロフルフリルアルコール153g、ト
ルエン213g、ハイドロキノンモノメチルエーテ
ル80mg、蓚酸2gを含む溶液に、N−メチロール
アクリルアミド167gを含む75%水溶液を加え、
空気を吹き込みながら加熱攪拌して共沸脱水し、
脱水が終わるまで還流加熱を行なつた。反応時間
5.5時間、最終反応温度は98℃であつた。脱水量
は83.5gで、2.5%のホルムアルデヒドを含んで
いた。これは理論量のエーテル脱水量の97.5%に
相当する。
(a) Elemental analysis C H O N Measured value 57.6% 7.9% 26.5% 8.0% Theoretical value 58.4% 8.1% 25.9% 7.6% (b) IR analysis (liquid film on KBr) 3420cm -1 N-H stretching of acid amide Vibration 1670cm -1 C=0 stretching vibration of acid amide 1640cm -1 vinyl group CH 2 =CH- stretching vibration 1540cm -1 N-H bending vibration of -1 acid amide 1400cm -1 vinyl group CH 2 =CH- in-plane bending Vibration 1085 cm -1 Ether C-0-C stretching vibration Example 2 (monomer synthesis) A solution containing 153 g of tetrahydrofurfuryl alcohol, 213 g of toluene, 80 mg of hydroquinone monomethyl ether, and 2 g of oxalic acid contains 167 g of N-methylolacrylamide 75 Add % aqueous solution,
Azeotropically dehydrated by heating and stirring while blowing air,
Reflux heating was carried out until the dehydration was completed. reaction time
The final reaction temperature was 98°C for 5.5 hours. The amount of dehydrated water was 83.5g and contained 2.5% formaldehyde. This corresponds to 97.5% of the theoretical amount of ether dehydration.

次いで実施例1に準じた後処理を行ない、テト
ラヒドロフルフリオキシメチルアクリルアミド
255gを得た。このものの粘度は230cpsであり、
元素分析及びIR分析の結果は次の通りであつた。
Next, a post-treatment according to Example 1 was carried out to obtain tetrahydrofurfuroxymethylacrylamide.
Obtained 255g. The viscosity of this stuff is 230cps,
The results of elemental analysis and IR analysis were as follows.

(イ) 元素分析 C H O N 測定値 57.2% 7.8% 26.9% 8.1% (ロ) IR分析(KBr上液膜) 実施例1と同じ吸収パターンであつた。(b) Elemental analysis C H O N Measured value 57.2% 7.8% 26.9% 8.1% (b) IR analysis (liquid film on KBr) The absorption pattern was the same as in Example 1.

実施例 3 実施例1で得たテトラヒドロフルフリオキシメ
チルアクリルアミドに、光重合開始剤ベンゾフエ
ノン2%を溶かし、これをガラス板に30μの厚さ
に塗り、80W/cmのUVランプの下15cmのところ
を毎分4mの速さで走るベルトコンベアに載せ、
1回露光させると、塗工面は直ちに流動性、粘着
性を失い、合計4回の露光を行なつたところ、鉛
筆硬度3Hの平滑な塗膜を得た。この塗膜はクロ
スカツト粘着テープ剥離試験でも剥がれず、トル
エンに浸しても変化がなく、また流水中に3分間
浸しても変化はなかつた。しかし、塗膜の非露光
部は瞬時に水に溶解流出した。
Example 3 Dissolve 2% of the photopolymerization initiator benzophenone in the tetrahydrofurfuroxymethylacrylamide obtained in Example 1, apply this to a thickness of 30μ on a glass plate, and place it 15cm under an 80W/cm UV lamp. Place it on a belt conveyor that runs at a speed of 4 meters per minute.
After one exposure, the coated surface immediately lost its fluidity and tackiness, and after a total of four exposures, a smooth coating film with a pencil hardness of 3H was obtained. This coating did not peel off in a cross-cut adhesive tape peel test, did not change when immersed in toluene, and did not change even when immersed in running water for 3 minutes. However, the unexposed areas of the coating instantly dissolved in water and flowed out.

実施例 4 テトラヒドロフルフリオキシメチルアクリルア
ミドに、光重合開始剤ジエトキシアセトフエノン
2%を溶かし、これを鉄板に30μの厚さに塗り、
実施例1と同様に露光させると、2回の露光で塗
工面は粘着性を失い、合計5回の露光で鉛筆硬度
3Hの平滑な塗膜を得た。この塗膜はクロスカツ
ト粘着テープ剥離試験でも剥がれず、トルエンに
浸しても変化がなく、また流水中に3分間浸して
も変化はなかつた。
Example 4 2% of the photopolymerization initiator diethoxyacetophenone was dissolved in tetrahydrofurfuroxymethylacrylamide, and this was applied to a thickness of 30μ on an iron plate.
When exposed in the same manner as in Example 1, the coated surface lost its tackiness after two exposures, and the pencil hardness decreased after a total of five exposures.
A smooth coating film of 3H was obtained. This coating did not peel off in a cross-cut adhesive tape peel test, did not change when immersed in toluene, and did not change even when immersed in running water for 3 minutes.

比較例 1 水溶性のトリエチレングリコールメチルエーテ
ルアクリレートに、ベンソフエノン2%を溶か
し、これをガラス板に厚さ30μで塗り、実施例4
と同様、これに5回の露光を行なつた。得られた
塗膜は鉛筆硬度B以下で粘着性が残り、流水に30
秒浸したところ軟化して一部が溶解した。
Comparative Example 1 2% bensophenone was dissolved in water-soluble triethylene glycol methyl ether acrylate, and this was applied to a glass plate to a thickness of 30μ, Example 4
Similarly, this was exposed five times. The resulting coating film has a pencil hardness of B or less, remains sticky, and has a hardness of 30% when exposed to running water.
When it was soaked for a second, it softened and some of it dissolved.

比較例 2 水溶性のアクリロイルモルホリンに、ベンソフ
エノン2%を溶かし、これをガラス板に厚さ30μ
で塗り、実施例4と同様、これに5回の露光を行
なつた。得られた塗膜は鉛筆硬度3Hでガラス板
によく密着したが、流水に30秒浸したところ塗膜
は一部溶解して発泡した。
Comparative Example 2 Dissolve 2% bensophenone in water-soluble acryloylmorpholine and spread it on a glass plate to a thickness of 30 μm.
As in Example 4, this was exposed five times. The resulting paint film had a pencil hardness of 3H and adhered well to the glass plate, but when immersed in running water for 30 seconds, the paint film partially dissolved and foamed.

Claims (1)

【特許請求の範囲】 1 下記の〔〕式で示されるテトラヒドロフル
フリオキシメチルアクリルアミド。 2 下記の〔〕式で示されるテトラヒドロフル
フリオキシメチルアクリルアミド 及び光重合開始剤を含有する光硬化型樹脂組成
物。
[Claims] 1. Tetrahydrofurfuroxymethylacrylamide represented by the following formula []. 2 Tetrahydrofurfuroxymethylacrylamide represented by the following formula [] and a photocurable resin composition containing a photopolymerization initiator.
JP32318087A 1987-12-18 1987-12-18 Tetrahydrofurfuryloxymethylacrylamide Granted JPH01163174A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP32318087A JPH01163174A (en) 1987-12-18 1987-12-18 Tetrahydrofurfuryloxymethylacrylamide

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP32318087A JPH01163174A (en) 1987-12-18 1987-12-18 Tetrahydrofurfuryloxymethylacrylamide

Publications (2)

Publication Number Publication Date
JPH01163174A JPH01163174A (en) 1989-06-27
JPH0515709B2 true JPH0515709B2 (en) 1993-03-02

Family

ID=18151963

Family Applications (1)

Application Number Title Priority Date Filing Date
JP32318087A Granted JPH01163174A (en) 1987-12-18 1987-12-18 Tetrahydrofurfuryloxymethylacrylamide

Country Status (1)

Country Link
JP (1) JPH01163174A (en)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0273810A (en) * 1988-09-08 1990-03-13 Tokyo Ohka Kogyo Co Ltd Photopolymerizable resin composition
JP4882143B2 (en) * 2000-08-23 2012-02-22 凸版印刷株式会社 Method for manufacturing magnetic visible recording medium
JP4779512B2 (en) * 2004-08-31 2011-09-28 Dic株式会社 Concealment card and method for manufacturing the same
JP4779511B2 (en) * 2004-08-31 2011-09-28 Dic株式会社 Concealment card and method for manufacturing the same

Also Published As

Publication number Publication date
JPH01163174A (en) 1989-06-27

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