JPH0517524B2 - - Google Patents
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- Publication number
- JPH0517524B2 JPH0517524B2 JP62211606A JP21160687A JPH0517524B2 JP H0517524 B2 JPH0517524 B2 JP H0517524B2 JP 62211606 A JP62211606 A JP 62211606A JP 21160687 A JP21160687 A JP 21160687A JP H0517524 B2 JPH0517524 B2 JP H0517524B2
- Authority
- JP
- Japan
- Prior art keywords
- base material
- electroformed layer
- thin film
- reflecting mirror
- backing
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
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- Optical Elements Other Than Lenses (AREA)
Description
【発明の詳細な説明】 [発明の目的] (産業上の利用分野) 本発明は、反射鏡の製造方法の改良に関する。[Detailed description of the invention] [Purpose of the invention] (Industrial application field) The present invention relates to an improvement in a method for manufacturing a reflecting mirror.
(従来の技術)
従来、光学的鏡面を有する反射鏡を製造するに
は被加工物を直接切削、研削、研磨、鏡面コーテ
イングを行なう方法が実施されている。(Prior Art) Conventionally, in order to manufacture a reflecting mirror having an optical mirror surface, a method of directly cutting, grinding, polishing, and mirror coating a workpiece has been carried out.
ところで、反射鏡の多くは凹形状をなすため、
切削工程において穴ぐり加工が必要である。この
ため、上述した方法により小型の反射鏡を製造す
る場合、バイト寸法による制約を受け、穴ぐり加
工が困難となる。具体的には、穴ぐり加工におい
てその内径が数10mm程度で、長さがその2倍程度
の場合、バイトシヤンクが細くなり、剛性が低
く、その結果加工中にひびり振動を発生して加工
が困難となる。また、研削、研磨工程においても
同様な制約を受け、反射鏡の形状、寸法が制約さ
れ、ひいては小型、高精度化が困難となる。即
ち、研磨によつて表面粗さを向上させる場合、穴
内面の加工が難しく、かつ穴内面の形状、表面粗
さ測定にも制約を受ける。更に、同形状で複数個
の反射鏡を製造する場合、1個づつ前述した煩雑
な工程を繰返す必要があるため、製品精度のばら
つき、生産コストの高騰化を招く問題があつた。 By the way, most reflecting mirrors have a concave shape, so
Hole drilling is required in the cutting process. For this reason, when manufacturing a small-sized reflecting mirror using the method described above, it is restricted by the size of the cutting tool, making drilling difficult. Specifically, when drilling a hole, if the inner diameter is about several tens of millimeters and the length is about twice that length, the bite shank becomes thin and has low rigidity, which results in crack vibrations occurring during drilling, which can cause processing to fail. It becomes difficult. Further, similar restrictions apply to the grinding and polishing processes, which restricts the shape and dimensions of the reflecting mirror, making it difficult to achieve a smaller size and higher precision. That is, when improving the surface roughness by polishing, it is difficult to process the inner surface of the hole, and there are restrictions on the shape of the inner surface of the hole and the measurement of the surface roughness. Furthermore, when manufacturing a plurality of reflecting mirrors having the same shape, it is necessary to repeat the above-described complicated process one by one, which causes problems such as variations in product precision and an increase in production costs.
(発明が解決しようとする問題点)
本発明は、上記従来の問題点を解決するために
なされたもので、加工工程から生じる形状、寸法
の制約を受けることなく、所望する形状、寸法の
反射鏡を高精度で安価かつ量産的に製造し得る方
法を提供しようとするものである。(Problems to be Solved by the Invention) The present invention has been made to solve the above-mentioned conventional problems. The purpose of this invention is to provide a method for mass-producing mirrors with high precision and at low cost.
[発明の構成]
(問題点を解決するための手段)
本発明は、貫通する穴を有し、かつ前記穴内面
を鏡面とした反射鏡の製造において、前記反射鏡
の穴と同形状をなす母材を加工する第1工程と、
前記母材の外周面に金属薄膜を形成する第2工程
と、前記母材より大径の穴を有する裏当てかねに
前記母材を同軸に挿入する第3工程と、前記金属
薄膜と前記裏当てかねとの隙間を電鋳層で充填す
る第4工程と、前記裏当てかねが前記電鋳層を介
して一体的に被着された前記母材に急激な温度変
化を与えて前記金属薄膜により鏡面が転写された
前記電鋳層および前記裏当てかねを前記金属薄膜
が形成された前記母材から分離する第5工程とを
具備し、
前記電鋳層は前記母材よりも熱膨張係数が大き
い材料からなり、前記第5工程の分離は前記電鋳
層と前記母材との熱膨張係数の差を利用して行わ
れることを特徴とするものである。[Structure of the Invention] (Means for Solving the Problems) The present invention provides a method for producing a reflecting mirror having a penetrating hole and having an inner surface of the hole as a mirror surface, which has the same shape as the hole of the reflecting mirror. A first step of processing the base material,
a second step of forming a metal thin film on the outer peripheral surface of the base material; a third step of coaxially inserting the base material into a backing ring having a hole larger in diameter than the base material; a fourth step of filling the gap between the backing pin and the backing pin with an electroformed layer; and applying a sudden temperature change to the base material to which the backing pin is integrally adhered via the electroformed layer to form the metal thin film. a fifth step of separating the electroformed layer with a mirror surface transferred thereto and the backing cap from the base material on which the metal thin film is formed, the electroformed layer having a thermal expansion coefficient lower than that of the base material. The electroformed layer is made of a material having a large diameter, and the separation in the fifth step is performed using a difference in coefficient of thermal expansion between the electroformed layer and the base material.
上記母材としては、例えばアンバー合金等を使
用することができる。 As the base material, for example, an amber alloy or the like can be used.
上記母材の外周面に被覆する金属薄膜は、急激
な温度変化を与えて上記電鋳層を剥離する際の剥
離材として作用する。かかる金属薄膜としては、
例えば金(Au)、銅(Cu)、ニツケル(Ni)、ア
ルミニウム(Al)、銀(Ag)、白金(Pt)等を用
いることができる。但し、これら金属薄膜の材質
と上記電鋳層の材質とが同質にならないようにそ
れらの組合わせを選択する必要がある。また、金
属薄膜の厚さについては10Å〜1000Å程度にすれ
ばよい。 The metal thin film coated on the outer circumferential surface of the base material acts as a peeling material when the electroformed layer is peeled off by applying a sudden temperature change. As such a metal thin film,
For example, gold (Au), copper (Cu), nickel (Ni), aluminum (Al), silver (Ag), platinum (Pt), etc. can be used. However, it is necessary to select a combination of the materials of these metal thin films and the material of the electroformed layer so that they are not of the same quality. Further, the thickness of the metal thin film may be approximately 10 Å to 1000 Å.
上記電鋳層は、上記金属薄膜から分離した後に
おいて反射鏡の反射面となる。かかる電鋳層とし
ては、例えばNi、Cr、Ni−Cr合金等を使用する
ことができる。また、電鋳層の厚さは5μm〜30
mm程度とすることが望ましい。なお、上記金属薄
膜への電鋳層の形成に先立つて、反射面の反射特
性を向上する目的で該金属薄膜上に無電解ニツケ
ルめつき膜等の無電解めつき膜を形成してもよ
い。 The electroformed layer becomes a reflective surface of a reflective mirror after being separated from the metal thin film. As such an electroformed layer, for example, Ni, Cr, Ni-Cr alloy, etc. can be used. In addition, the thickness of the electroformed layer is 5 μm to 30 μm.
It is desirable to set it to about mm. Note that, prior to forming the electroformed layer on the metal thin film, an electroless plating film such as an electroless nickel plating film may be formed on the metal thin film for the purpose of improving the reflection characteristics of the reflective surface. .
上記裏当てかねは、被加工物への切削、研磨等
の加工により形成され、その材料は例えばNi、
アンバー合金を使用することができる。 The backing ring is formed by cutting, polishing, etc. the workpiece, and its material is, for example, Ni,
Amber alloy can be used.
上記急激な温度変化を与える手段としては、例
えば裏当てかねを形成した母材を液体窒素等の
冷却媒体に浸漬して急冷する方法、同母材に高
温の加熱ガスを吹付けて急熱する方法、を採用し
得る。 Examples of means for causing the above-mentioned rapid temperature change include immersing the base material on which the backing ring is formed in a cooling medium such as liquid nitrogen to rapidly cool it, and rapidly heating the base material by spraying high-temperature heating gas onto the base material. method may be adopted.
(作用)
本発明によれば、反射鏡の穴と同形状をなす母
材を加工し、前記母材の外周面に金属薄膜を形成
し、前記母材より大径の穴を有する裏当てかねに
前記母材を同軸に挿入し、さらに前記金属薄膜と
前記裏当てかねとの隙間を電鋳層で充填した後、
前記裏当てかねが前記電鋳層を介して一体的に被
着された前記母材に急激な温度変化を与える。こ
の際、前記電鋳層は前記母材よりも熱膨張係数が
大きい材料からなるため、前記電鋳層と前記母材
との熱膨張係数の差を利用して前記金属薄膜によ
り鏡面が転写された前記電鋳層および前記裏当て
かねを前記金属薄膜が形成された前記母材から分
離することができる。しかも、前記急激な温度変
化を与えることにより前記母材表面に被覆された
金属薄膜が他の部材に比べて急速に温度変化す
る。このため、前記電鋳層と前記母材との熱膨張
係数の差の利用と前記金属薄膜の急速な温度変化
との相乗作用により前記分離操作を確実に行うこ
とが可能になる。その結果、反射面となる電鋳層
と裏当てかねからなる反射鏡を製造することがで
きる。(Function) According to the present invention, a base material having the same shape as the hole of the reflecting mirror is processed, a thin metal film is formed on the outer peripheral surface of the base material, and a backing material having a hole with a larger diameter than the base material is formed. After coaxially inserting the base material into and filling the gap between the metal thin film and the backing cap with an electroformed layer,
The backing pawl applies a rapid temperature change to the base material integrally attached via the electroformed layer. At this time, since the electroformed layer is made of a material with a larger coefficient of thermal expansion than the base material, a mirror surface is transferred by the thin metal film by utilizing the difference in coefficient of thermal expansion between the electroformed layer and the base material. The electroformed layer and the backing cap can be separated from the base material on which the metal thin film is formed. Moreover, by applying the rapid temperature change, the temperature of the metal thin film coated on the surface of the base material changes more rapidly than other members. Therefore, the separation operation can be performed reliably by the synergistic effect of the use of the difference in thermal expansion coefficient between the electroformed layer and the base material and the rapid temperature change of the metal thin film. As a result, a reflecting mirror consisting of an electroformed layer serving as a reflecting surface and a backing layer can be manufactured.
また、前記金属薄膜被覆母材は一旦作製すれ
ば、前記母材を用いて同形状で精度のばらつきの
少ない反射鏡を何個でも製造することができる。 Moreover, once the metal thin film-coated base material is produced, any number of reflecting mirrors having the same shape and less variation in precision can be manufactured using the base material.
さらに、前記裏当てかねは被加工物から機械加
工により作製され、貫通する略円錐台形状の穴を
形成するための穴ぐり加工が必要である。しかし
ながら、前記裏当てかねの内面は反射鏡の製造後
において反射面として機能させないため、前記穴
ぐり加工は被加工物そのものから反射鏡を製造す
る従来法のように精度をそれほど要求されず、し
かもその内面への研磨処理も不要となる。従つ
て、加工工程から生じる形状、寸法の制約を受け
ることなく、所望する形状、寸法の反射鏡を高精
度で安価かつ量産的に製造することができる。 Furthermore, the backing pin is produced by machining from a workpiece, and requires drilling to form a substantially truncated conical hole therethrough. However, since the inner surface of the backing cap does not function as a reflective surface after manufacturing the reflecting mirror, the drilling process does not require as much precision as the conventional method of manufacturing the reflecting mirror from the workpiece itself. Polishing of the inner surface is also unnecessary. Therefore, a reflecting mirror having a desired shape and dimensions can be mass-produced with high precision and at low cost without being subject to constraints on shape and dimensions resulting from processing steps.
(発明の実施例)
以下、本発明の実施例を図面を参照して説明す
る。(Embodiments of the Invention) Hereinafter, embodiments of the present invention will be described with reference to the drawings.
まず、アンバー合金からなる被加工物を切削、
研削、研磨等の機械加工を施して製造すべき反射
鏡に対して反射した略円錐台形状の母材1を作製
した。つづいて、この母材1の外周面に金めつき
処理により厚さ10Åの金(Au)薄膜2を形成し
た(第1図図示)。ひきつづき、アンバー合金か
らなる被加工物を穴ぐり加工、研削して貫通する
略円錐台形状の穴を有する裏当てかね3を作製
し、この裏当てかね3の穴を前記母材1の金薄膜
2の外周面に約3mmの間隔をあけて配置した後、
ニツケル電鋳を施して母材の金薄膜2と裏当てか
ね3内面の間の厚さ3mmのNi電鋳層4を形成し
た(第2図図示)。 First, a workpiece made of amber alloy is cut,
A base material 1 having a substantially truncated conical shape that was reflected by a reflecting mirror to be manufactured was prepared by performing machining such as grinding and polishing. Subsequently, a gold (Au) thin film 2 having a thickness of 10 Å was formed on the outer peripheral surface of the base material 1 by gold plating (as shown in FIG. 1). Subsequently, a backing capacitor 3 having a substantially truncated conical hole passing through the workpiece made of an amber alloy is produced by drilling and grinding, and the hole in the backing capacitor 3 is made of the gold thin film of the base material 1. After placing it on the outer circumferential surface of 2 with an interval of about 3 mm,
Nickel electroforming was performed to form a 3 mm thick Ni electroformed layer 4 between the gold thin film 2 of the base material and the inner surface of the backing cap 3 (as shown in Figure 2).
次いで、裏当てかね3がNi電鋳層4を介して
一体化された母材1を液体窒素に浸漬して急冷し
たところ、母材1とNi電鋳層4との熱膨張係数
の差により金薄膜2を境にしてNi電鋳層4及び
裏当てかね3が母材1から分離され、第3図に示
すように裏当てかね3とその内面に形成された反
射面として機能するNi電鋳層4とからなる反射
鏡5を製造することができた。 Next, when the base material 1 with the backing cap 3 integrated through the Ni electroformed layer 4 was immersed in liquid nitrogen and rapidly cooled, due to the difference in thermal expansion coefficient between the base material 1 and the Ni electroformed layer 4. The Ni electroformed layer 4 and the backing cap 3 are separated from the base material 1 with the gold thin film 2 as a boundary, and as shown in FIG. A reflecting mirror 5 consisting of a cast layer 4 could be manufactured.
また、上記Ni電鋳層4及び裏当てかね3が分
離された金薄膜2の被覆母材1を用いて上述した
のと同様な処理を複数回行なつたところ、既に製
造した反射鏡を含めて互いに同形状で精度のばら
つきの少ない反射鏡を複数個製造できた。 In addition, when the same process as described above was carried out multiple times using the coated base material 1 of the gold thin film 2 from which the Ni electroformed layer 4 and the backing cap 3 were separated, it was found that even the already manufactured reflector was included. By using this method, we were able to manufacture multiple reflecting mirrors with the same shape and little variation in accuracy.
なお、上記実施例は母材をアンバー合金、電鋳
層をニツケル、裏当てかねをアンバー合金で形成
し、急冷により反射鏡を製造したが、これに限定
されない。例えば、母材をアンバー合金、電鋳層
をニツケル、裏当てかねをニツケル合金で形成
し、これを急熱することによつても実施例と同様
に反射鏡を製造することができる。 In the above embodiment, the base material was made of an amber alloy, the electroformed layer was made of nickel, and the backing cap was made of an amber alloy, and the reflector was manufactured by rapid cooling, but the present invention is not limited thereto. For example, a reflecting mirror can be manufactured in the same manner as in the embodiment by forming the base material from an amber alloy, the electroformed layer from nickel, and the backing ring from a nickel alloy, and rapidly heating them.
上記実施例では、母材の外周面に被覆する金属
薄膜としてAu薄膜を用いたが、Au薄膜の代わり
にCu、Ni、Al、Ag、Ptの薄膜を用いても実施
例と同様な反射鏡を製造することができる。但
し、Ni薄膜を使用する場合にはCrからなる電鋳
層を使用した。 In the above example, an Au thin film was used as the metal thin film covering the outer peripheral surface of the base material, but the same reflective mirror as in the example can be obtained by using a thin film of Cu, Ni, Al, Ag, or Pt instead of the Au thin film. can be manufactured. However, when using a Ni thin film, an electroformed layer made of Cr was used.
[発明の効果]
以上詳述した如く、本発明によれば加工工程か
ら生じる形状、寸法の制約を受けることなく、所
望する形状、寸法の反射鏡を高精度で安価かつ量
産的に製造でき、ひいては光学素子などに有効に
利用し得る等顕著な効果を有する。[Effects of the Invention] As detailed above, according to the present invention, a reflecting mirror with a desired shape and dimensions can be mass-produced with high precision, at low cost, without being subject to constraints on shape and dimensions resulting from the processing process. Furthermore, it has remarkable effects such as being able to be effectively used in optical elements and the like.
第1図〜第3図は、本発明の実施例における反
射鏡の製造工程を示す断面図である。
1…母材、2…金薄膜、3…裏当てかね、4…
Ni電鋳層、5…反射鏡。
1 to 3 are cross-sectional views showing the manufacturing process of a reflecting mirror in an embodiment of the present invention. 1...Base material, 2...Gold thin film, 3...Backing material, 4...
Ni electroformed layer, 5...Reflector.
Claims (1)
した反射鏡の製造において、前記反射鏡の穴と同
形状をなす母材を加工する第1工程と、前記母材
の外周面に金属薄膜を形成する第2工程と、前記
母材より大径の穴を有する裏当てかねに前記母材
を同軸に挿入する第3工程と、前記金属薄膜と前
記裏当てかねとの隙間を電鋳層で充填する第4工
程と、前記裏当てかねが前記電鋳層を介して一体
的に被着された前記母材に急激な温度変化を与え
て前記金属薄膜により鏡面が転写された前記電鋳
層および前記裏当てかねを前記金属薄膜が形成さ
れた前記母材から分離する第5工程とを具備し、 前記電鋳層は前記母材よりも熱膨張係数が大き
い材料からなり、前記第5工程の分離は前記電鋳
層と前記母材との熱膨張係数の差を利用して行わ
れることを特徴とする反射鏡の製造方法。 2 前記金属薄膜は、10Å〜1000Åの厚さを有す
ることを特徴とする特許請求の範囲第1項記載の
反射鏡の製造方法。 3 前記電鋳層は、ニツケルからなり、かつ前記
母材はアンバー合金からなることを特徴とする特
許請求の範囲第1項記載の反射鏡の製造方法。 4 前記第5工程における急激な温度変化は、前
記裏当てかねが前記電鋳層を介して一体的に被着
された前記母材を液体窒素に浸漬することにより
行われることを特徴とする特許請求の範囲第1項
記載の反射鏡の製造方法。[Scope of Claims] 1. In manufacturing a reflecting mirror having a penetrating hole and having a mirrored inner surface of the hole, a first step of processing a base material having the same shape as the hole of the reflecting mirror; a second step of forming a metal thin film on the outer circumferential surface of the material; a third step of coaxially inserting the base material into a backing cap having a hole larger in diameter than the base material; and a fourth step of filling the gap between the backing cap and the base material with an electroformed layer, and applying a sudden temperature change to the base material, on which the backing ring is integrally adhered via the electroformed layer, to create a mirror surface by the metal thin film. a fifth step of separating the transferred electroformed layer and the backing cap from the base material on which the metal thin film is formed, the electroformed layer having a larger coefficient of thermal expansion than the base material. A method for manufacturing a reflecting mirror, wherein the separation in the fifth step is performed using a difference in coefficient of thermal expansion between the electroformed layer and the base material. 2. The method for manufacturing a reflecting mirror according to claim 1, wherein the metal thin film has a thickness of 10 Å to 1000 Å. 3. The method for manufacturing a reflecting mirror according to claim 1, wherein the electroformed layer is made of nickel, and the base material is made of an amber alloy. 4. A patent characterized in that the rapid temperature change in the fifth step is performed by immersing the base material, on which the backing pin is integrally adhered via the electroformed layer, in liquid nitrogen. A method for manufacturing a reflecting mirror according to claim 1.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP21160687A JPS64501A (en) | 1987-03-13 | 1987-08-26 | Production of reflecting mirror |
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP5813187 | 1987-03-13 | ||
| JP62-58131 | 1987-03-13 | ||
| JP21160687A JPS64501A (en) | 1987-03-13 | 1987-08-26 | Production of reflecting mirror |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JPH01501A JPH01501A (en) | 1989-01-05 |
| JPS64501A JPS64501A (en) | 1989-01-05 |
| JPH0517524B2 true JPH0517524B2 (en) | 1993-03-09 |
Family
ID=26399207
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP21160687A Granted JPS64501A (en) | 1987-03-13 | 1987-08-26 | Production of reflecting mirror |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS64501A (en) |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4807516A (en) * | 1987-04-23 | 1989-02-28 | The Boeing Company | Flight control system employing three controllers operating a dual actuator |
| KR101250004B1 (en) * | 2010-07-02 | 2013-04-05 | 최영락 | Reflector by electroforming and method of fabrication the same |
Family Cites Families (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS55131191A (en) * | 1979-03-30 | 1980-10-11 | Toshiba Corp | Preparation of metallic mirror |
| JPS57210994A (en) * | 1981-06-22 | 1982-12-24 | Mitsubishi Electric Corp | Production of reflecting mirror |
-
1987
- 1987-08-26 JP JP21160687A patent/JPS64501A/en active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS64501A (en) | 1989-01-05 |
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