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JPH0521603B2 - - Google Patents
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JPH0521603B2 - - Google Patents

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Publication number
JPH0521603B2
JPH0521603B2 JP63116846A JP11684688A JPH0521603B2 JP H0521603 B2 JPH0521603 B2 JP H0521603B2 JP 63116846 A JP63116846 A JP 63116846A JP 11684688 A JP11684688 A JP 11684688A JP H0521603 B2 JPH0521603 B2 JP H0521603B2
Authority
JP
Japan
Prior art keywords
valve
chamber
liquid
vacuum forming
forming chamber
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
JP63116846A
Other languages
Japanese (ja)
Other versions
JPH01288308A (en
Inventor
Hiroshi Motohashi
Masanori Eto
Shoichi Goda
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Ebara Corp
Ebara Research Co Ltd
Original Assignee
Ebara Research Co Ltd
Ebara Infilco Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Ebara Research Co Ltd, Ebara Infilco Co Ltd filed Critical Ebara Research Co Ltd
Priority to JP63116846A priority Critical patent/JPH01288308A/en
Publication of JPH01288308A publication Critical patent/JPH01288308A/en
Publication of JPH0521603B2 publication Critical patent/JPH0521603B2/ja
Granted legal-status Critical Current

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  • Treatment Of Sludge (AREA)
  • Filtration Of Liquid (AREA)

Description

【発明の詳細な説明】 〔産業上の利用分野〕 本発明は、上水、産業用水、下水、し尿、産業
排水処理における各種液体の過や発生する泥状
物質の過濃縮に適する密閉式の過装置に関す
るものである。
[Detailed Description of the Invention] [Industrial Application Field] The present invention is a closed type device suitable for filtering various liquids and overconcentrating generated muddy substances in the treatment of clean water, industrial water, sewage, human waste, and industrial wastewater. This is related to the

〔従来の技術〕[Conventional technology]

従来、支持部材の外周に布や金属等による
過面を形成し、内部に液を導いて取り出すよう
にした筒状のフイルタエレメントを、密閉槽内に
垂設したバツグフイルタ型の過装置において
は、液側を真空ポンプ等で減圧するか、または
密閉槽内に各種液体や泥状物質(以下原液と総称
する)を圧入して過が行われていた。
Conventionally, in a bag filter type filter device, a cylindrical filter element with a cloth, metal, etc. surface formed around the outer periphery of a support member and a cylindrical filter element suspended inside a closed tank, in which a liquid is guided inside and taken out, Filtration was carried out by reducing the pressure on the liquid side using a vacuum pump or the like, or by pressurizing various liquids or muddy substances (hereinafter collectively referred to as undiluted liquid) into a closed tank.

このような過を継続するうちに、フイルタエ
レメントの過面に原液中の濁質が付着して過
面の通水抵抗が増大した時には、過を中断して
フイルタエレメントの濁質の剥離、洗浄を行つて
いた。
As this process continues, if the turbidity in the stock solution adheres to the surface of the filter element and the water flow resistance on the surface increases, stop the filtration and remove the turbidity from the filter element and clean it. was going there.

フイルタエレメントの濁質の剥離、洗浄は、槽
内に残留している未処理原液の全量を一旦槽外へ
抜き出したのち、フイルタエレメントの内部から
洗浄水又は圧縮空気を逆流させる逆洗方法が用い
られていた。
To remove and clean turbidity from the filter element, a backwashing method is used in which the entire amount of untreated stock solution remaining in the tank is once drawn out of the tank, and then cleaning water or compressed air is flowed back from inside the filter element. It was getting worse.

〔発明が解決しようとする課題〕[Problem to be solved by the invention]

しかしながら前記従来のバツグフイルタ型の
過装置では、フイルタエレメントを逆洗するに先
立つて、槽内に残留している未処理原液の全量を
槽外に抜き出して原液貯槽等へ戻し入れる必要が
あり、さらに洗浄後の過再開に当つては、空に
なつた槽に再び原液を満杯にする操作が必要であ
つたため、操作が煩雑であり、雑時間も長くな
り、処理能力が低下するなどの問題点もあつた。
However, in the conventional bag filter type filtration device, before backwashing the filter element, it is necessary to extract the entire amount of untreated stock solution remaining in the tank out of the tank and return it to the stock solution storage tank, etc. When over-restarting after cleaning, it was necessary to refill the empty tank with stock solution, which caused problems such as complicated operations, longer sloppy time, and reduced processing capacity. It was hot too.

本発明は、真空ポンプ等を使用せずに減圧によ
る過を行い、しかも原液圧入による過をも同
時に加えて過能率を向上し、またフイルタエレ
メントの逆洗に際して槽内の未処理原液の抜き出
しをほとんど必要とせず、1サイクルの時間の短
縮を可能にし、処理能力を増大することができる
過装置を提供することを目的とするものであ
る。
The present invention performs filtration by reducing pressure without using a vacuum pump or the like, and also adds filtration by pressurizing the stock solution at the same time to improve the filtering efficiency, and also makes it possible to remove untreated stock solution from the tank when backwashing the filter element. It is an object of the present invention to provide a processing device that requires almost no processing, can shorten the time for one cycle, and can increase processing capacity.

〔課題を解決するための手段〕[Means to solve the problem]

本発明は、密閉槽1内を仕切板2,3によつて
上部から順に真空形成室4、液室5、過室6
を区画形成し;真空形成室4に該真空形成室4内
の水位を検出する水位計7を備えると共に、空気
抜弁8を連結し、さらに真空形成室4と下方の排
出ピツト11とを開閉弁9を備えた大気脚形成管
10にて大気と遮断可能状態で連通し;真空形成
室4と液室5内上部とを連通弁12を備えた連
通管13にて連通し、該連通管13の真空形成室
4内開口端部を該真空形成室4内の設定高水位以
上の位置とし;液室5に圧縮空気流入弁14を
連結すると共に、液室5を前記大気脚形成管1
0で形成される大気脚以上に下方の液ピツト1
7に液流出弁15を備えた液流出管16にて
大気と遮断可能状態で連通し;過室6内に液
側に支持体を設けた筒状のフイルタエレメント1
8を配備してフイルタエレメント18の液側を
液室5に連通し、過室6と真空形成室4とを
バイパス弁19を備えたバイパス管20にて連通
すると共に、過室6に原液流入弁21及びドレ
ン弁22を連結した;ことを特徴とする過装置
である。
In the present invention, the interior of the sealed tank 1 is arranged in order from the top by partition plates 2 and 3: a vacuum forming chamber 4, a liquid chamber 5, and a liquid chamber 6.
The vacuum forming chamber 4 is equipped with a water level gauge 7 for detecting the water level in the vacuum forming chamber 4, and an air vent valve 8 is connected thereto, and an opening/closing valve is provided between the vacuum forming chamber 4 and the lower discharge pit 11. The vacuum forming chamber 4 and the upper part of the liquid chamber 5 are communicated with the atmosphere through an atmospheric leg forming pipe 10 equipped with a communication valve 12; The opening end in the vacuum forming chamber 4 is set at a position above the set high water level in the vacuum forming chamber 4; a compressed air inlet valve 14 is connected to the liquid chamber 5, and the liquid chamber 5 is connected to the atmospheric leg forming pipe 1.
Liquid pit 1 below the atmospheric leg formed by 0
A liquid outflow pipe 16 equipped with a liquid outflow valve 15 at 7 communicates with the atmosphere in a shut off manner; a cylindrical filter element 1 is provided with a support on the liquid side in the filter chamber 6;
8 is installed to communicate the liquid side of the filter element 18 to the liquid chamber 5, and the over chamber 6 and the vacuum forming chamber 4 are communicated through a bypass pipe 20 equipped with a bypass valve 19, and the raw liquid flows into the over chamber 6. A valve 21 and a drain valve 22 are connected to each other.

〔作用〕[Effect]

まず、過室6内に原液を供給して過室6を
満杯にし、さらにバイパス管20を経て上部の真
空形成室4内に一定の水位レベルに達するまで供
給を続ける。次に、真空形成室4内の原液の一部
を大気脚形成管10から排出ピツト11に流出す
ることによつて大気脚形成管10を作動させて大
気脚を形成させ、真空形成室4を−hmの負圧に
すれば、この負圧は同時に連通管13を介して
液室5にも及ぶことになつてフイルタエレメント
18の液側が減圧され、フイルタエレメント1
8内外の差圧によつて過室6内の原液が過さ
れる。この時、過室6への原液の供給を続けれ
ば、フイルタエレメント18内外の差圧は一層大
となり、過が能率的に行われる。
First, the stock solution is supplied into the overchamber 6 to fill the overchamber 6, and then continues to be supplied through the bypass pipe 20 into the upper vacuum forming chamber 4 until a certain water level is reached. Next, a part of the stock solution in the vacuum forming chamber 4 flows out from the atmospheric leg forming pipe 10 to the discharge pit 11 to operate the atmospheric leg forming pipe 10 to form an atmospheric leg, and the vacuum forming chamber 4 is -hm, this negative pressure will simultaneously reach the liquid chamber 5 via the communication pipe 13, reducing the pressure on the liquid side of the filter element 18, and reducing the pressure on the liquid side of the filter element 18.
The stock solution in the passage chamber 6 is passed through due to the pressure difference between the inside and outside of the chamber 8. At this time, if the stock solution is continued to be supplied to the filtering chamber 6, the pressure difference between the inside and outside of the filter element 18 will become even larger, and the filtering will be carried out more efficiently.

このような過を継続したのち、フイルタエレ
メント18の表面に捕捉されたケーキを剥離、逆
洗するには、圧縮空気流入弁14から圧縮空気を
過室6内にゆつくりと導いて、過室6内に残
留する原液をバイパス管20から真空形成室4に
設定されたHWLに達するように流入させたの
ち、バイパス管20からの逆流を防ぎ、過室6
内の原液をドレン弁22から槽外にドレンし、フ
イルタエレメント18を圧縮空気でブローし、ケ
ーキを剥離してドレン弁22から槽外に排出す
る。
After continuing such filtration, in order to peel off and backwash the cake trapped on the surface of the filter element 18, compressed air is slowly guided into the filtration chamber 6 from the compressed air inlet valve 14, and the cake is removed from the filtration chamber 6. After flowing the stock solution remaining in the vacuum forming chamber 6 from the bypass pipe 20 to the vacuum forming chamber 4 so as to reach the set HWL, backflow from the bypass pipe 20 is prevented, and the
The stock solution inside is drained from the drain valve 22 to the outside of the tank, the filter element 18 is blown with compressed air, the cake is peeled off, and the cake is discharged from the drain valve 22 to the outside of the tank.

このケーキ排出終了後は、再び前記過のため
の原液の供給が再開される。
After this cake discharge is completed, the supply of the stock solution for the filtration is restarted again.

〔実施例〕〔Example〕

本発明の一実施例を図面に基づいて説明すれ
ば、密閉槽1内は水平の上部仕切板2と下部仕切
板3とによつて、上部から順に真空形成室4、
液室5、過室6が区画され形成されている。
An embodiment of the present invention will be described with reference to the drawings. The inside of the sealed tank 1 is divided into a vacuum forming chamber 4, a vacuum forming chamber 4,
A liquid chamber 5 and a liquid chamber 6 are divided and formed.

真空形成室4には、該室4内の水位を検出する
水位計7が備えられ、また空気抜弁8が連結さ
れ、さらに真空形成室4には開閉弁9を備えた大
気脚形成管10の一端が連結開口され、大気脚形
成管10の他端は排出ピツト11内に水封されて
開口されている。
The vacuum forming chamber 4 is equipped with a water level gauge 7 for detecting the water level in the chamber 4, and is connected to an air vent valve 8. One end is opened for connection, and the other end of the atmospheric leg forming pipe 10 is sealed with water in the discharge pit 11 and opened.

また、真空形成室4と液室5内の上部とは、
上部仕切板2を貫通し連通弁12を備えた連通管
13で連通され、連通管13の真空形成室4内の
開口端部を真空形成室4内に設定された高水位
HWL以上の位置にしてある。
Furthermore, the upper part of the vacuum forming chamber 4 and the liquid chamber 5 are
The communication pipe 13 penetrates through the upper partition plate 2 and is equipped with a communication valve 12, and the open end of the communication pipe 13 in the vacuum forming chamber 4 is connected to a high water level set in the vacuum forming chamber 4.
It is positioned above HWL.

液室5には、圧縮空気流入弁14が連結さ
れ、また液室5には液流出弁15を備えた
液流出管16の一端が連結開口され、この液流
出管16の他端は前記大気脚形成管10で形成さ
れる大気脚以上に下方にある液ピツト17内に
水封されて開口されている。
A compressed air inflow valve 14 is connected to the liquid chamber 5, and one end of a liquid outflow pipe 16 equipped with a liquid outflow valve 15 is connected and opened to the liquid chamber 5, and the other end of this liquid outflow pipe 16 is connected to the atmosphere. The opening is sealed with water in a liquid pit 17 located below the atmospheric leg formed by the leg forming tube 10.

過室6内には、支持部材の外周に過面を形
成し内部に液を導く複数の筒状のフイルタエレ
メント18が、下部仕切板3に垂設されてフイル
タエレメント18の内部が過室5に連通され、
過室6と真空形成室4とはバイパス弁19を備
えたバイパス管20て連通され、さらに過室6
には原液流入弁21及びドレン弁22が連結され
ている。なお、フイルタエレメント18の支持部
材をコイルスプリングなどの伸縮自在なものとす
ることが好ましい。
Inside the filter chamber 6, a plurality of cylindrical filter elements 18 that form a surface on the outer periphery of the support member and guide the liquid inside are vertically disposed on the lower partition plate 3, so that the inside of the filter element 18 is connected to the filter chamber 5. communicated with
The overchamber 6 and the vacuum forming chamber 4 are communicated with each other through a bypass pipe 20 equipped with a bypass valve 19.
A stock solution inflow valve 21 and a drain valve 22 are connected to the undiluted solution inlet valve 21 and the drain valve 22 . Note that it is preferable that the support member for the filter element 18 be made of a flexible member such as a coil spring.

図中、23は原液流入弁21に連なる原液供給
用のポンプを示す。
In the figure, 23 indicates a pump for supplying the stock solution connected to the stock solution inflow valve 21.

上記のような過装置における操作手順は次の
通りである。
The operating procedure for the above device is as follows.

1 原液の供給(第1図参照) (1) 原液流入弁21、空気抜弁8、バイパス弁1
9、液流出弁15、連通弁12を開とし、そ
の他の弁を閉とする。
1 Supply of stock solution (see Figure 1) (1) Stock solution inflow valve 21, air vent valve 8, bypass valve 1
9. Open the liquid outflow valve 15 and the communication valve 12, and close the other valves.

(2) ポンプ23を稼動し、過室6に原液を供給
し、過室6を満杯としたのち、さらに原液の
供給を続けてバイパス管20を経て真空形成室
4内にも原液を供給する。
(2) After operating the pump 23 and supplying the stock solution to the overchamber 6 and filling the overchamber 6, the stock solution is further supplied to the vacuum forming chamber 4 via the bypass pipe 20. .

(3) 真空形成室4内の原液がある一定のレベル
MWLになつた時点で空気抜弁8及びバイパス
弁19を閉とする。
(3) The stock solution in the vacuum forming chamber 4 is at a certain level.
When the MWL is reached, the air vent valve 8 and the bypass valve 19 are closed.

(4) この時点でポンプ23をそのまま連続して稼
動させても良いし、停止しても良い。
(4) At this point, the pump 23 may be operated continuously or may be stopped.

2 真空の発生(第2図参照) (1) 開閉弁9を開とすると、真空形成室4内の原
液は大気脚形成管10から排出ピツト11に流
出し、真空形成室4内の水位は降下し、例えば
BWLの位置で排出ピツト11の水位からhmの
大気脚を形成する。即ち、真空形成室4内は水
柱で−hmの真空(圧力−Phとする)となる。
2 Generation of vacuum (see Figure 2) (1) When the on-off valve 9 is opened, the stock solution in the vacuum forming chamber 4 flows out from the atmospheric leg forming pipe 10 to the discharge pit 11, and the water level in the vacuum forming chamber 4 decreases. descend, e.g.
An atmospheric leg of hm is formed from the water level of the discharge pit 11 at the BWL position. That is, the inside of the vacuum forming chamber 4 becomes a vacuum of -hm in the water column (assuming the pressure is -Ph).

(2) この時、真空形成室4と過室5とは連通管
13を介して連通されているため、液室5内
も−hm(−Ph)の真空となり、液ピツト1
7の水位からhmの大気脚を同様に形成する。
(2) At this time, since the vacuum forming chamber 4 and the overchamber 5 are communicated through the communication pipe 13, the inside of the liquid chamber 5 also becomes a vacuum of -hm (-Ph), and the liquid pit 1
Similarly, the atmospheric leg of hm is formed from the water level of 7.

(3) その結果、過室6内の原液はフイルタエレ
メント18を介して−Phの負圧により真空
過され、液は液室6を経て液流出管16
から液ピツト17に流出する。この時の液
流出管16の液室5内における開口端部から
液ピツト17の水位までの高さHmは、H≧
hである。
(3) As a result, the stock solution in the liquid chamber 6 is vacuum filtered through the filter element 18 by the negative pressure of -Ph, and the liquid passes through the liquid chamber 6 into the liquid outlet pipe 16.
The liquid flows out from the liquid into the liquid pit 17. At this time, the height Hm from the open end of the liquid outflow pipe 16 in the liquid chamber 5 to the water level of the liquid pit 17 is H≧
It is h.

(4) なお、ポンプ23が圧力Pで稼動している場
合は、フイルタエレメント18の内外の差圧
ΔPは、 ΔP=P−(−Ph)=P+Ph の圧力で過される。
(4) Note that when the pump 23 is operating at pressure P, the differential pressure ΔP between the inside and outside of the filter element 18 is passed at a pressure of ΔP=P−(−Ph)=P+Ph.

3 過完了(第3図参照) (1) フイルタエレメント18表面に原液中の濁質
がケーキ状に捕捉され、所定の過抵抗を示し
た時点で、開閉弁9、連通弁12及び液流出
弁15を閉とし、かつポンプ23が稼動してい
る場合は停止させて原液流入弁21を閉とす
る。
3. Overflow completion (see Figure 3) (1) When the suspended matter in the stock solution is captured in the form of a cake on the surface of the filter element 18 and a predetermined overresistance is exhibited, the on-off valve 9, the communication valve 12, and the liquid outflow valve are closed. 15 is closed, and if the pump 23 is operating, it is stopped and the stock solution inflow valve 21 is closed.

(2) 次に、圧縮空気流入弁14及び空気抜弁8を
開として圧縮空気をゆつくりと流入させながら
バイパス弁19を開とする。すると、圧縮空気
によつて、過室6内の残存原液はバイパス管
20を経て真空形成室4内に流入し、真空形成
室4内の水位が所定のHWLに達した時は、開
閉弁9を開閉させて原液を排泥ピツト11内に
流出させ、真空形成室4内の水位がHWLを保
持するように調整し、過室6内の水位が
LWLになつた時点で開閉弁9及びバイパス弁
19を閉とする。
(2) Next, open the compressed air inlet valve 14 and air vent valve 8, and open the bypass valve 19 while slowly allowing compressed air to flow in. Then, the remaining stock solution in the overchamber 6 flows into the vacuum forming chamber 4 through the bypass pipe 20 by the compressed air, and when the water level in the vacuum forming chamber 4 reaches a predetermined HWL, the on-off valve 9 is opened. The undiluted solution flows out into the sludge pit 11 by opening and closing, and the water level in the vacuum forming chamber 4 is adjusted to maintain HWL, and the water level in the overchamber 6 is adjusted.
The on-off valve 9 and the bypass valve 19 are closed when the LWL is reached.

(3) 次いで、ドレン弁22を開とし、圧縮空気流
入弁14からの圧縮空気でフイルタエレメント
18をブローし、フイルタエレメント18に捕
捉されているケーキを剥離し、ドレン弁22よ
り槽外に排出する。このように、エアブローに
よりフイルタエレメント18からケーキを剥離
するが、フイルタエレメント18の支持体とし
てコイルスプリングなどの伸縮自在なものを使
用すれば、ケーキの剥離は一層効果的に行われ
る。
(3) Next, open the drain valve 22, blow the filter element 18 with compressed air from the compressed air inflow valve 14, peel off the cake captured by the filter element 18, and discharge it from the drain valve 22 to the outside of the tank. do. In this way, the cake is peeled off from the filter element 18 by air blowing, but if a telescopic support such as a coil spring is used as the support for the filter element 18, the cake can be peeled off more effectively.

4 再起動(第4図参照) (1) ドレン弁22を閉とし、バイパス弁19を開
とし、真空形成室4内の原液を自然流下で過
室6内に導く。この時、真空形成室4内の空気
抜きのため、連通弁12を開としておくのが好
ましい。
4. Restart (see Figure 4) (1) Close the drain valve 22, open the bypass valve 19, and guide the stock solution in the vacuum forming chamber 4 into the excess chamber 6 under natural flow. At this time, it is preferable to leave the communication valve 12 open in order to vent air from the vacuum forming chamber 4.

(2) 過室6が原液で満たされるか、あるいは真
空形成室4内の水位がLWLになつた時点で、
バイパス弁19を閉とする。(LWLは大気脚形
成管10の上端より上にする必要がある) (3) 次にポンプ23を稼動し、以下最初の原液の
供給工程に戻る。
(2) When the overchamber 6 is filled with the stock solution or the water level in the vacuum forming chamber 4 reaches LWL,
Bypass valve 19 is closed. (LWL needs to be above the upper end of the atmospheric leg formation tube 10) (3) Next, operate the pump 23 and return to the first stock solution supply step.

〔発明の効果〕〔Effect of the invention〕

以上述べたように本発明の過装置は、コンパ
クトな構造で大気脚を利用して真空ポンプ等を使
用することなく減圧過を行い、しかも原液を圧
入することも同時に可能として過能率を向上
し、またフイルタエレメントに捕捉されたケーキ
の剥離、逆洗に際して未処理原液の抜き出しをほ
とんど必要とせず、1サイクルの時間の短縮を可
能にし、処理能力を増大し、さらに自動化も容易
に行うことができるものである。
As described above, the filtration device of the present invention has a compact structure and uses an atmospheric leg to perform depressurization without using a vacuum pump, etc., and can also simultaneously pressurize undiluted solution, thereby improving the filtration efficiency. In addition, there is almost no need to remove the untreated stock solution during peeling off the cake trapped in the filter element and backwashing, making it possible to shorten one cycle time, increase processing capacity, and facilitate automation. It is possible.

【図面の簡単な説明】[Brief explanation of drawings]

図面は本発明の一実施例を示す構造説明図で、
第1図〜第4図は操作順序の一例を示すものであ
る。 1……密閉槽、2……上部仕切板、3……下部
仕切板、4……真空形成室、5……液室、6…
…過室、7……水位計、8……空気抜弁、9…
…開閉弁、10……大気脚形成管、11……排出
ピツト、12……連通弁、13……連通管、14
……圧縮空気流入弁、15……液流出弁、16
……液流出管、17……液ピツト、18……
フイルタエレメント、19……バイパス弁、20
……バイパス管、21……原液流入弁、22……
ドレン弁、23……ポンプ。
The drawings are structural explanatory diagrams showing one embodiment of the present invention.
1 to 4 show an example of the order of operations. DESCRIPTION OF SYMBOLS 1... Sealed tank, 2... Upper partition plate, 3... Lower partition plate, 4... Vacuum forming chamber, 5... Liquid chamber, 6...
...Overchamber, 7...Water level gauge, 8...Air vent valve, 9...
...Opening/closing valve, 10... Atmospheric leg forming pipe, 11... Discharge pit, 12... Communication valve, 13... Communication pipe, 14
... Compressed air inflow valve, 15 ... Liquid outflow valve, 16
...Liquid outflow pipe, 17...Liquid pit, 18...
Filter element, 19...Bypass valve, 20
... Bypass pipe, 21 ... Raw solution inflow valve, 22 ...
Drain valve, 23...pump.

Claims (1)

【特許請求の範囲】[Claims] 1 密閉槽1内を仕切板2,3によつて上部から
順に真空形成室4、液室5、過室6を区画形
成し;真空形成室4に該真空形成室4内の水位を
検出する水位計7を備えると共に、空気抜弁8を
連結し、さらに真空形成室4と下方の排出ピツト
11とを開閉弁9を備えた大気脚形成管10にて
大気と遮断可能状態で連通し;真空形成室4と
液室5内上部とを連通弁12を備えた連通管13
にて連通し、該連通管13の真空形成室4内開口
端部を該真空形成室4内の設定高水位以上の位置
とし;液室5に圧縮空気流入弁14を連結する
と共に、液室5を前記大気脚形成管10で形成
される大気脚以上に下方の液ピツト17に液
流出弁15を備えた液流出管16にて大気と遮
断可能状態で連通し;過室6内に液側に支持
体を設けた筒状のフイルタエレメント18を配備
してフイルタエレメント18の液側を液室5
に連通し、過室6と真空形成室4とをバイパス
弁19を備えたバイパス管20にて連通すると共
に、過室6に原液流入弁21及びドレン弁22
を連結した;ことを特徴とする過装置。
1 The inside of the sealed tank 1 is divided into a vacuum forming chamber 4, a liquid chamber 5, and a liquid chamber 6 in order from the top by partition plates 2 and 3; the water level in the vacuum forming chamber 4 is detected in the vacuum forming chamber 4. Equipped with a water level gauge 7, an air vent valve 8 is connected, and the vacuum forming chamber 4 and the lower discharge pit 11 are communicated with the atmosphere in a state that can be shut off through an atmospheric leg forming pipe 10 equipped with an on-off valve 9; A communication pipe 13 with a valve 12 communicating between the formation chamber 4 and the upper part of the liquid chamber 5
The opening end of the communication pipe 13 in the vacuum forming chamber 4 is set at a position above the set high water level in the vacuum forming chamber 4; the compressed air inflow valve 14 is connected to the liquid chamber 5, and 5 is communicated with the atmosphere in a shut off manner through a liquid outflow pipe 16 equipped with a liquid outflow valve 15 to a liquid pit 17 located below the atmospheric leg formed by the atmospheric leg forming pipe 10; A cylindrical filter element 18 with a support provided on the side is provided, and the liquid side of the filter element 18 is connected to the liquid chamber 5.
The overchamber 6 and the vacuum forming chamber 4 are connected to each other through a bypass pipe 20 equipped with a bypass valve 19, and the overchamber 6 is connected to an undiluted solution inflow valve 21 and a drain valve 22.
connected;
JP63116846A 1988-05-16 1988-05-16 Filter Granted JPH01288308A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP63116846A JPH01288308A (en) 1988-05-16 1988-05-16 Filter

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP63116846A JPH01288308A (en) 1988-05-16 1988-05-16 Filter

Publications (2)

Publication Number Publication Date
JPH01288308A JPH01288308A (en) 1989-11-20
JPH0521603B2 true JPH0521603B2 (en) 1993-03-25

Family

ID=14697077

Family Applications (1)

Application Number Title Priority Date Filing Date
JP63116846A Granted JPH01288308A (en) 1988-05-16 1988-05-16 Filter

Country Status (1)

Country Link
JP (1) JPH01288308A (en)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4726180B2 (en) * 2004-07-07 2011-07-20 オルガノ株式会社 Filtration device
JP2026016968A (en) * 2024-07-23 2026-02-04 メディカテック株式会社 suction filtration device

Also Published As

Publication number Publication date
JPH01288308A (en) 1989-11-20

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