JPH0523064B2 - - Google Patents
Info
- Publication number
- JPH0523064B2 JPH0523064B2 JP58219070A JP21907083A JPH0523064B2 JP H0523064 B2 JPH0523064 B2 JP H0523064B2 JP 58219070 A JP58219070 A JP 58219070A JP 21907083 A JP21907083 A JP 21907083A JP H0523064 B2 JPH0523064 B2 JP H0523064B2
- Authority
- JP
- Japan
- Prior art keywords
- resin
- adhesion
- solderability
- oxide film
- alloy
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
Classifications
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
- H10W70/00—Package substrates; Interposers; Redistribution layers [RDL]
- H10W70/40—Leadframes
- H10W70/456—Materials
- H10W70/458—Materials of insulating layers on leadframes
Landscapes
- Lead Frames For Integrated Circuits (AREA)
Description
【発明の詳細な説明】
この発明は、たとえばレジンモールド型ICに
おいて樹脂との密着性およびハンダ性にすぐれた
リードフレーム材料に関するものである。現在リ
ードフレーム用金属材料として42合金(42Ni−
Fe)銅合金および純鉄系が使用されているが、
MOS型ICでは42合金がSiチツプとの熱膨張の合
致性、リード強度の点から多く使用されている。
ICはその素子を外部から保護するために、セ
ラミツクや樹脂などの外囲器により一般に封止密
閉されている。そして耐湿性の優れたセラミツク
型は高信頼度のものに使用されるがパツケージの
コストが高くなる欠点がある。一方樹脂封止型は
生産性にすぐれ安価なため、近年多量に使用され
るに至つているが耐湿性がセラミツク型に比べて
劣る欠点が残されていた。この解決の為、樹脂サ
イドの研究や封止条件の検討も行われているが、
リードフレーム材料側でも各種の改善が行われて
いる。
本発明は42合金と樹脂との密着性とハンダ付け
性の両特性を具備したリードフレームを提供する
ことを目的とし、これら両特性について、研究し
たところリードフレーム表面の酸化膜と材料組成
が特許請求の範囲にあるとき、従来合金に比べて
樹脂密着性が優れかつハンダ付け性も良好なもの
が得られた発見に基づくものである。
以下本発明の限定理由を述べる。
Ni30%未満または50%を越えると熱膨張係数
が大きくなりすぎ、Siチツプと整合性が劣つてく
るためNi30〜50%に限定した。
SiとMnはリードフレーム上に樹脂との密着性
のすぐれた酸化膜を形成させる元素であるが、Si
とMnの合計が0.2%未満では形成される酸化膜が
薄く、樹脂との密着性向上に効果がなく、1.5%
を越えると酸化膜が厚くなり、地金と剥離しやす
くなる。そしてMn/Si比が10を越えると表面酸
化物がMn−richとなつて樹脂との密着性が悪く
なり、2未満ではリードフレームとしてメツキ欠
陥のもとになるSi系の介在物比が多くなるため、
Si+Mnを0.2〜1.5%でMn/Si比を2〜10に限定
した。
Alは酸化膜形成を促進する元素であるが、
0.001%未満ではその効果が少なく、0.1%を越え
ると酸化膜が厚くなりすぎ、リードフレームとし
て要求されるハンダ性が劣つてくるため、樹脂密
着性の良好な範囲として0.001〜0.1%に限定し
た。
表面酸化膜の厚みはイオンマイクロアナライザ
ーで深さ方向にSi,Mn,Alを分析し求めたもの
で、20〜150Åに限定したのは、20Å未満では樹
脂との密着性が弱く、150Åを越えるとハンダ性
が劣つてくるためである。
次に実施例により具体例を示す。
表に科学組成を示す合金を7Kg高周波真空誘導
炉で溶解後、鍛造、熱間圧延および冷間圧延によ
つて板厚0.25mmのストリツプを得た。
樹脂との密着性は上記材より0.25mm厚×25mm×
25mmの試料を採取し、900℃×3mmH2ガス中で熱
処理を行つた。しかるのち
図に示すように、試料1の上に11φの穴を有す
る樹脂モールド用薄板治具2(11φの穴つき)を
重ね、ホツトプレート3上で168℃×2mm加熱し、
粉末樹脂4を硬化させた。常温に冷却後、試料1
を固定し、樹脂モールド用薄板治具2を矢印方向
に引張つて密着強度を測定した。
またハンダ性は樹脂密着性テストと同じ試料を
240℃に加熱した溶融ハンダ槽中に2sec浸浸後面
積比で90%以上ハンダがぬれたものをハンダ性良
好とした。
特性評価を行つた結果を表に示す。表より明ら
かなごとく本発明合金は比較合金に比べて樹脂と
の密着強度は約2倍以上の値を示し、かつ酸化膜
厚みが150Å以下ではハンダ性が優れている結果
がえられた。
以上の如く、本発明は樹脂モールド型パツケー
ジにおいて、所定のハンダ性を具備しかつ、樹脂
とリードの接着強度を高め、パツケージの信頼性
を大巾に向上させるもので工業上の効果は大きい
ものである。
【表】DETAILED DESCRIPTION OF THE INVENTION The present invention relates to a lead frame material that has excellent adhesion to resin and solderability, for example in a resin molded IC. Currently, 42 alloy (42Ni−) is used as a metal material for lead frames.
Fe) Copper alloys and pure iron systems are used, but
42 alloy is often used in MOS type ICs due to its thermal expansion compatibility with Si chips and lead strength. In order to protect the IC elements from the outside, they are generally hermetically sealed with an envelope made of ceramic or resin. Ceramic molds with excellent moisture resistance are used for highly reliable products, but they have the disadvantage of increasing the cost of the package. On the other hand, the resin-sealed type has been used in large quantities in recent years because of its excellent productivity and low cost, but it still has the drawback of being inferior in moisture resistance compared to the ceramic type. In order to solve this problem, research on the resin side and examination of sealing conditions are also being conducted.
Various improvements have also been made on the lead frame material side. The purpose of the present invention is to provide a lead frame that has both properties of adhesion between 42 alloy and resin and solderability.As a result of research on both of these properties, the oxide film on the surface of the lead frame and the material composition are patented. The claimed invention is based on the discovery that an alloy with better resin adhesion and better solderability than conventional alloys was obtained. The reasons for the limitations of the present invention will be described below. If Ni is less than 30% or more than 50%, the coefficient of thermal expansion becomes too large and the compatibility with the Si chip deteriorates, so Ni is limited to 30 to 50%. Si and Mn are elements that form an oxide film with excellent adhesion to resin on lead frames, but Si
If the total of
If it exceeds this value, the oxide film will become thicker and will easily separate from the base metal. When the Mn/Si ratio exceeds 10, the surface oxide becomes Mn-rich and the adhesion with the resin deteriorates, while when it is less than 2, there are many Si-based inclusions that cause plating defects in the lead frame. To become
The Mn/Si ratio was limited to 2 to 10 with Si+Mn of 0.2 to 1.5%. Al is an element that promotes oxide film formation,
If it is less than 0.001%, the effect will be small, and if it exceeds 0.1%, the oxide film will become too thick and the solderability required for lead frames will deteriorate, so we limited it to 0.001 to 0.1% as a range for good resin adhesion. . The thickness of the surface oxide film was determined by analyzing Si, Mn, and Al in the depth direction with an ion microanalyzer, and was limited to 20 to 150 Å because the adhesiveness with the resin is weak below 20 Å, and if it exceeds 150 Å. This is because the solderability deteriorates. Next, specific examples will be shown in Examples. The alloy whose chemical composition is shown in the table was melted in a 7 kg high-frequency vacuum induction furnace, and then a strip with a thickness of 0.25 mm was obtained by forging, hot rolling, and cold rolling. Adhesion with resin is 0.25mm thick x 25mm x than the above material
A 25mm sample was taken and heat treated in 900°C x 3mmH2 gas. Then, as shown in the figure, a resin molding thin plate jig 2 (with an 11φ hole) was placed on top of the sample 1, and heated to 168°C x 2mm on a hot plate 3.
Powder resin 4 was cured. After cooling to room temperature, sample 1
was fixed and the thin plate jig 2 for resin molding was pulled in the direction of the arrow to measure the adhesion strength. Also, for solderability, the same sample as the resin adhesion test was used.
Good solderability was achieved if the solder wetted more than 90% of the area after immersion in a molten solder bath heated to 240°C for 2 seconds. The results of the characteristic evaluation are shown in the table. As is clear from the table, the alloys of the present invention exhibited approximately twice as much adhesion strength with the resin as the comparative alloys, and had excellent solderability when the oxide film thickness was 150 Å or less. As described above, the present invention provides a resin molded package with a predetermined solderability, increases the adhesive strength between the resin and the leads, and greatly improves the reliability of the package, which has great industrial effects. It is. 【table】
第1図は樹脂密着強度テストの原理図である。
1……試料、2……樹脂モールド用薄板治具、
3……ホツトプレート、4……樹脂。
FIG. 1 is a diagram showing the principle of the resin adhesion strength test. 1...Sample, 2...Thin plate jig for resin mold,
3...hot plate, 4...resin.
Claims (1)
て、Si+Mn0.2〜1.5%(ただしMn/Si=2〜
10),A10.001〜0.1%と製造上不可避的に混入す
る不純物を含む合金であり、かつその表面酸化膜
の厚みが20〜150Åであることを特徴とする樹脂
との密着性およびハンダ性のすぐれたリードフレ
ーム材料。1 In Ni30~50 (weight% and below are the same)-Fe alloy, Si+Mn0.2~1.5% (however, Mn/Si=2~
10), A10.001~0.1%, which is an alloy containing impurities that are unavoidable during manufacturing, and the thickness of the surface oxide film is 20~150 Å.Adhesion with resin and solderability. Excellent lead frame material.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP58219070A JPS60111448A (en) | 1983-11-21 | 1983-11-21 | Material for lead frame |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP58219070A JPS60111448A (en) | 1983-11-21 | 1983-11-21 | Material for lead frame |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS60111448A JPS60111448A (en) | 1985-06-17 |
| JPH0523064B2 true JPH0523064B2 (en) | 1993-03-31 |
Family
ID=16729793
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP58219070A Granted JPS60111448A (en) | 1983-11-21 | 1983-11-21 | Material for lead frame |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS60111448A (en) |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS61228213A (en) * | 1985-04-01 | 1986-10-11 | Matsushita Electric Ind Co Ltd | Burner |
| JPH07123156B2 (en) * | 1985-08-08 | 1995-12-25 | 住友電気工業株式会社 | Lead frame |
Family Cites Families (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS512895B2 (en) * | 1971-08-06 | 1976-01-29 | ||
| JPS53149810A (en) * | 1977-05-04 | 1978-12-27 | Hitachi Metals Ltd | Alloy for sealing glass |
| JPS55122855A (en) * | 1979-03-12 | 1980-09-20 | Daido Steel Co Ltd | High strength low thermal expansion alloy |
| JPS5842758A (en) * | 1981-09-07 | 1983-03-12 | Daido Steel Co Ltd | Alloy for sealing |
-
1983
- 1983-11-21 JP JP58219070A patent/JPS60111448A/en active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS60111448A (en) | 1985-06-17 |
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